CN107195584B - Preparation method of display panel, display panel and display device - Google Patents

Preparation method of display panel, display panel and display device Download PDF

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CN107195584B
CN107195584B CN201710391124.0A CN201710391124A CN107195584B CN 107195584 B CN107195584 B CN 107195584B CN 201710391124 A CN201710391124 A CN 201710391124A CN 107195584 B CN107195584 B CN 107195584B
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electrode layer
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light
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CN107195584A (en
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邹建华
王磊
徐苗
陶洪
李洪濛
彭俊彪
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Guang Zhou New Vision Opto Electronic Technology Co ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays

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Abstract

The invention discloses a preparation method of a display panel, the display panel and a display device, wherein the preparation method comprises the following steps: providing a substrate; sequentially forming a first electrode layer, a first transparent electrode layer and a second transparent electrode layer which are stacked on a substrate; photoetching off the second transparent electrode layer except the first sub-pixel region; photoetching the first transparent electrode layer except the first sub-pixel region and the second sub-pixel region and the first electrode layer between the adjacent sub-pixel regions; forming a pixel defining layer between adjacent sub-pixel regions; covering the first transparent electrode layer, the second transparent electrode layer, the first electrode layer of the third sub-pixel region and the pixel defining layer with an organic light-emitting structure layer; forming a second electrode layer on one side of the organic light-emitting structure layer, which is far away from the substrate; and forming an encapsulation layer on the side of the second electrode layer far away from the substrate. The invention improves the problem that the red light, the green light and the blue light emitted by the display panel are difficult to be enhanced simultaneously, and simplifies the preparation process of the display panel.

Description

Preparation method of display panel, display panel and display device
Technical Field
The embodiment of the invention belongs to the technical field of display, and relates to a preparation method of a display panel, the display panel and a display device.
Background
The technology for realizing the colorization of Organic Light-Emitting diodes (OLEDs) includes two main technologies, namely, a microcavity effect RGB pixel independent Light-Emitting technology and a white Light-Emitting material matched color filter technology.
The independent light emission of the microcavity effect RGB pixels requires the utilization of a precise metal shadow mask and a pixel alignment technology to prepare red, green and blue three-primary-color light emission centers of the microcavity effect to realize colorization, and the precise metal shadow mask needs to be used.
The method for combining the white luminescent material and the color filter comprises the steps of firstly preparing a white light-emitting OLED device, then obtaining three primary colors through the color filter, and then combining the three primary colors to realize color display, wherein the preparation process does not need a precise metal shadow mask contraposition technology, can adopt a mature color filter preparation technology of a liquid crystal display, is easy to realize large-scale panel, and is also easy to realize high pixel density, so the method is a full-color technology with potential in the future OLED display preparation technology.
The OLED device can be divided into two structures according to the difference in the direction of light exiting from the device: one is a bottom emission type device and the other is a top emission type device. The light emitted by the top-emitting device is emitted from the top of the device, so that the aperture ratio can be effectively improved without being influenced by the bottom driving panel of the device, and the integration of the device and a bottom driving circuit is facilitated, so that the OLED device with high pixel density generally needs to adopt a top-emitting light-emitting device structure.
In a traditional top emission type white light OLED display panel, the optical cavity lengths corresponding to the sub-pixels are consistent, so that light emitted by a white light organic light emitting layer generates a microcavity effect under the same cavity length, and it is difficult to realize simultaneous RGB enhancement, even RGB cannot emit light simultaneously, and the final colorization of a display device is affected.
At present, transparent conductive electrodes with different thicknesses can be prepared on a red sub-pixel, a green sub-pixel and a blue sub-pixel by adopting a yellow region process on a reflective electrode to realize the adjustment of the RGB optical cavity length. However, the transparent conductive electrode is prepared on each sub-pixel, and a large number of photolithography processes are required, so that the preparation process is complex, and the process difficulty and cost are increased.
Disclosure of Invention
In view of the above, the present invention provides a method for manufacturing a display panel, a display panel and a display device, so as to solve the problem that it is difficult to simultaneously enhance red light, green light and blue light emitted by the display panel, and simplify the manufacturing process of the display panel.
In order to achieve the purpose, the invention adopts the following technical scheme:
in a first aspect, an embodiment of the present invention provides a method for manufacturing a display panel, where the display panel includes a plurality of pixel regions, each of the pixel regions at least includes a first sub-pixel region displaying a first color, a second sub-pixel region displaying a second color, and a third sub-pixel region displaying a third color, and the method includes:
providing a substrate;
sequentially forming a first electrode layer, a first transparent electrode layer and a second transparent electrode layer which are stacked on the substrate;
photoetching off the second transparent electrode layer except the first sub-pixel region;
photoetching the first transparent electrode layer except the first sub-pixel region and the second sub-pixel region and a first electrode layer between the adjacent sub-pixel regions;
forming a pixel defining layer between adjacent sub-pixel regions;
covering an organic light-emitting structure layer on the first transparent electrode layer, the second transparent electrode layer, the first electrode layer of the third sub-pixel region and the pixel defining layer, wherein the organic light-emitting structure layer at least comprises an organic light-emitting layer;
forming a second electrode layer on one side of the organic light-emitting structure layer, which is far away from the substrate;
and sequentially forming a planarization layer and an encapsulation layer on one side of the second electrode layer, which is far away from the substrate.
In a second aspect, an embodiment of the present invention provides a display panel, where the display panel includes a plurality of pixel regions, each of the pixel regions includes at least a first sub-pixel region displaying a first color, a second sub-pixel region displaying a second color, and a third sub-pixel region displaying a third color, and the display panel further includes:
a substrate;
a first electrode layer formed on the substrate;
the first transparent electrode layer is formed in the first sub-pixel area and the second sub-pixel area on one side, far away from the substrate, of the first electrode layer;
the second transparent electrode layer is formed in the first sub-pixel area on one side, far away from the substrate, of the first transparent electrode layer;
a pixel defining layer formed between adjacent sub-pixel regions;
the organic light emitting structure layer covers the first transparent electrode layer, the second transparent electrode layer, the first electrode layer of the third sub-pixel region and the pixel defining layer, and at least comprises an organic light emitting layer;
the second electrode layer is formed on one side, far away from the substrate, of the organic light-emitting structure layer;
and the planarization layer and the packaging layer are stacked on one side, away from the substrate, of the second electrode layer.
In a third aspect, an embodiment of the present invention provides a display device, including the display panel described in the second aspect.
The invention has the beneficial effects that: according to the preparation method of the display panel, the display panel and the display device, the transparent electrode layers with different thicknesses are formed only in the first sub-pixel area and the second sub-pixel area through photoetching, so that the optical cavity lengths corresponding to the sub-pixels in the first sub-pixel area, the second sub-pixel area and the third sub-pixel area are different, the micro-cavity effect generated under the same cavity length is avoided, the red light, the green light and the blue light can be enhanced simultaneously, the transparent electrode layer does not need to be formed in the third sub-pixel area through photoetching, the photoetching process is reduced, the preparation process of the display panel is simplified, and the process difficulty and the cost are reduced.
Drawings
The above and other features and advantages of the present invention will become more apparent to those of ordinary skill in the art by describing in detail exemplary embodiments thereof with reference to the attached drawings, in which:
FIG. 1 is a schematic structural diagram of a conventional display panel;
fig. 2 is a schematic flow chart of a method for manufacturing a display panel according to an embodiment of the present invention;
FIGS. 3a-3g are schematic diagrams of corresponding structures of the respective manufacturing processes of FIG. 2;
FIG. 4 is a schematic flow chart illustrating a method for fabricating a display panel according to another embodiment of the present invention;
FIG. 5 is a schematic structural view of a display panel manufactured by the manufacturing method of FIG. 4;
fig. 6 is a schematic structural diagram of a display device according to an embodiment of the present invention.
Detailed Description
The technical scheme of the invention is further explained by the specific implementation mode in combination with the attached drawings. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Fig. 1 is a schematic structural diagram of a conventional display panel. As shown in fig. 1, a conventional display panel may include a plurality of pixel regions, each of which includes a red sub-pixel region, a green sub-pixel region, and a blue sub-pixel region; the display panel further comprises a substrate 1; the reflecting electrode is positioned on one side of the substrate 1 and comprises a red light reflecting electrode 2 positioned in a red sub-pixel area, a green light reflecting electrode 3 positioned in a green sub-pixel area and a blue light reflecting electrode 4 positioned in a blue sub-pixel area; the transparent electrode is positioned on one side of the reflecting electrode, which is far away from the substrate 1, and comprises a red light transparent electrode 5 positioned on the red light reflecting electrode 2, a green light transparent electrode 6 positioned on the green light reflecting electrode 3 and a blue light transparent electrode 7 positioned on the blue light reflecting electrode 4; an organic light-emitting layer 8 positioned on one side of the transparent electrode far away from the substrate 1; a semitransparent electrode 9 positioned on one side of the organic light-emitting layer 8 far away from the substrate 1; an encapsulation layer 10 covering the translucent electrode 9; and the color filter layer is positioned on one side of the packaging layer 10 far away from the substrate 1 and comprises a red filter R positioned in the red sub-pixel area, a green filter G positioned in the green sub-pixel area and a blue filter B positioned in the blue sub-pixel area.
As can be seen from fig. 1, transparent electrodes are formed on the red light reflective electrode 2, the green light reflective electrode 3 and the blue light reflective electrode 4, and the transparent electrodes have different thicknesses, so that the cavity length h1 of the first microcavity structure on the red light reflective electrode 2, the cavity length h2 of the second microcavity structure on the green light reflective electrode 3 and the cavity length h3 of the third microcavity structure on the blue light reflective electrode 4 are different, which can solve the problem that RGB enhancement is difficult to achieve at the same time due to the microcavity effect generated at the same cavity length.
In order to solve the above problem, embodiments of the present invention provide a method for manufacturing a display panel, and a display device.
Fig. 2 is a schematic flow chart of a manufacturing method of a display panel according to an embodiment of the present invention. The display panel of the embodiment of the invention comprises a plurality of pixel areas, wherein each pixel area at least comprises a first sub-pixel area displaying a first color, a second sub-pixel area displaying a second color and a third sub-pixel area displaying a third color. As shown in fig. 2, the method for manufacturing the display panel may include:
step 101, providing a substrate.
Optionally, the substrate may be a rigid substrate or a flexible substrate, wherein the rigid substrate may be made of glass, the flexible substrate may be made of polyimide, and the thickness of the substrate may be set according to process requirements, product requirements, and the like.
Step 102, referring to fig. 3a, a first electrode layer 12, a first transparent electrode layer 13, and a second transparent electrode layer 14 are sequentially formed on a substrate 11.
Alternatively, for a display panel emitting light from a single side, such as a top emission display panel, the first electrode layer 12 may be used as a reflective electrode layer; for a display panel with double-sided light emission, the first electrode layer 12 may be a transparent electrode layer or a semitransparent electrode layer. The materials of the first transparent electrode layer 13 and the second transparent electrode layer 14 may be the same material or different materials, and optionally, the materials of the first transparent electrode layer 13 and the second transparent electrode layer 14 may be one of IZO and ITO.
Step 103, referring to fig. 3b, the second transparent electrode layer 14 except the first sub-pixel region a is etched away.
For example, a photoresist may be coated on the second transparent electrode layer 14, the photoresist in the first sub-pixel region a is remained after exposure and development, the exposed second transparent electrode layer 14 is etched, and the photoresist is removed to form the second transparent electrode layer 14 in the first sub-pixel region a.
In step 104, referring to fig. 3c, the first transparent electrode layer 13 except the first sub-pixel region a and the second sub-pixel region B, and the first electrode layer 12 between the adjacent sub-pixel regions are etched away.
For example, a photoresist may be coated on the second transparent electrode layer 14 and the first transparent electrode layer 13, the photoresist on the second transparent electrode layer 14 and the first transparent electrode layer 13 of the second sub-pixel region B and the third sub-pixel region C is remained after exposure and development, and the exposed first transparent electrode layer 13 and the first electrode layer 12 below the exposed first transparent electrode layer are etched; and removing the photoresist on the first transparent electrode layer 13 of the third sub-pixel region C, etching the first transparent electrode layer 13 of the third sub-pixel region C, and removing all the photoresist.
Optionally, a photoresist may be coated on the second transparent electrode layer 14 and the first transparent electrode layer 13, the photoresist on the second transparent electrode layer 14 and the first transparent electrode layer 13 of the second sub-pixel region B is remained after exposure and development, and the exposed first transparent electrode layer 13 is etched away; and continuously forming photoresist on the first electrode layer 12 of the third sub-pixel region C, etching away the first electrode layer 12 between adjacent sub-pixel regions, and removing all the photoresist.
Step 105, referring to fig. 3d, a pixel defining layer 15 is formed between the adjacent sub-pixel regions.
Alternatively, the pixel defining layer 15 may be an organic material, and the pixel defining layer may define an opening area (light emitting area) of each sub-pixel area.
Step 106, referring to fig. 3e, the first transparent electrode layer 13, the second transparent electrode layer 14, the first electrode layer 12 of the third sub-pixel region and the pixel defining layer 15 are covered with the organic light emitting structure layer 16.
The organic light emitting structure layer 16 at least includes an organic light emitting layer. Optionally, the organic light emitting layer may be a white organic light emitting layer, and is matched with a color filter to display a color image; the organic light emitting layer may also include red, green, and blue light emitting materials, directly emitting red, green, and blue light. The embodiment of the invention is not particularly limited in this respect, and display panels with different structures can be prepared according to customer requirements.
Alternatively, the organic light emitting structure layer 16 may further include a hole transport layer and a hole generation layer sequentially stacked on the side of the organic light emitting layer close to the substrate 11, and an electron transport layer and an electron generation layer sequentially stacked on the side of the organic light emitting layer away from the substrate.
In this embodiment, the organic light emitting structure layer 16 may be formed on the first transparent electrode layer 13, the second transparent electrode layer 14, the first electrode layer 12 of the third sub-pixel region, and the pixel defining layer 15 by a deposition or evaporation process.
Step 107, referring to fig. 3f, a second electrode layer 17 is formed on the side of the organic light emitting structure layer 16 away from the substrate 11.
In this embodiment, the first electrode layer 12, the second electrode layer 17 and the organic light emitting structure layer 16 form an organic light emitting diode, the first electrode layer 12 may be an anode layer, the second electrode layer 17 may be a cathode layer, and optionally, for a top emission type display panel, the second electrode layer 17 may be a transparent electrode layer or a semitransparent electrode layer.
Step 108, referring to fig. 3g, an encapsulation layer 18 is formed on the side of the second electrode layer 17 away from the substrate 11.
Optionally, the encapsulation layer 18 may be an encapsulation cover plate, or may be a thin film encapsulation layer.
According to the preparation method of the display panel provided by the embodiment of the invention, the transparent electrode layers with different thicknesses are formed only in the first sub-pixel area and the second sub-pixel area through photoetching, so that the optical cavity lengths corresponding to the sub-pixels in the first sub-pixel area, the second sub-pixel area and the third sub-pixel area are different, the micro-cavity effect is avoided under the same cavity length, the red light, the green light and the blue light can be enhanced simultaneously, and the transparent electrode layer is not required to be formed in the third sub-pixel area through photoetching, so that the photoetching process is reduced, the preparation process of the display panel is simplified, and the process difficulty and the cost are reduced.
Optionally, in the above embodiment, the second transparent electrode layer, the first transparent electrode layer, and the first electrode layer may be etched by using a wet etching process. The materials of the first transparent electrode layer and the second transparent electrode layer may be different materials or the same material. When the second transparent electrode layer is etched, the etching rate can be higher, and when the first transparent electrode layer is etched, the etching rate is lower, so that the first electrode layer of the third sub-pixel region is prevented from being over-etched or etched.
Illustratively, when the materials of the first transparent electrode layer and the second transparent electrode layer are different, the etching selection ratio of the second transparent electrode layer to the first transparent electrode layer is greater than 2. Optionally, the second transparent electrode layer is made of IZO, the etching solution may be oxalic acid, and the etching rate is 50 nm/s; the first transparent electrode layer is made of ITO doped with 10% tin oxide, the etching liquid medicine can be aqua regia, the etching rate is 10nm/s, the etching liquid medicine can also be oxalic acid, and the etching rate is 0.1 nm/s. In addition, when the materials of the first transparent electrode layer and the second transparent electrode layer are the same, the first transparent electrode layer can be subjected to heat or light treatment at first, and the second transparent electrode layer is not subjected to heat or light treatment, so that the etching characteristics of the first transparent electrode layer and the second transparent electrode layer are different, and the etching selection ratio of the second transparent electrode layer to the first transparent electrode layer in a specific etching liquid medicine can still be more than 2. Optionally, the first transparent electrode layer and the second transparent electrode layer are made of ITO, and after the first transparent electrode layer is sputtered to form a film, the first transparent electrode layer is subjected to heat treatment at a temperature of more than 200 ℃, the first transparent electrode layer is changed from amorphous ITO into crystalline ITO, and the second transparent electrode layer is still amorphous ITO without heat treatment, so that the first transparent electrode layer and the second transparent electrode layer have different etching characteristics.
Optionally, based on the wet etching scheme, when the first transparent electrode layer is made of ITO doped with 10% tin oxide and the first electrode layer is made of Ti, if the first transparent electrode layer and the first electrode layer are etched simultaneously, the etching solution may be aqua regia, the etching rate of the aqua regia on the first transparent electrode layer is 10nm/s, and the etching rate of the aqua regia on the first electrode layer is 2 nm/s; if the first transparent electrode layer and the first electrode layer are etched respectively, the etching liquid medicine of the first transparent electrode layer can be oxalic acid, the etching rate is 0.1nm/s, the etching liquid medicine of the first electrode layer can be hydrofluoric acid, and the etching rate is 10 nm/s.
Fig. 4 is a schematic flow chart of a method for manufacturing a display panel according to another embodiment of the present invention. Optionally, based on the above scheme, in this embodiment, the organic light emitting layer is a white organic light emitting layer; after the encapsulation layer is formed, the method further comprises the following steps: and forming a color filter layer corresponding to the first sub-pixel area, the second sub-pixel area and the third sub-pixel area on one side of the packaging layer far away from the substrate.
Specifically, as shown in fig. 4, the method for manufacturing the display panel of the embodiment may include:
step 201, a substrate is provided.
Step 202 is to form a first electrode layer, a first transparent electrode layer, and a second transparent electrode layer stacked in this order on a substrate.
Step 203, photo-etching away the second transparent electrode layer except the first sub-pixel region.
Step 204, photo-etching away the first transparent electrode layer except the first sub-pixel region and the second sub-pixel region, and the first electrode layer between the adjacent sub-pixel regions.
Step 205, a pixel definition layer is formed between adjacent sub-pixel regions.
Step 206, covering the first transparent electrode layer, the second transparent electrode layer, the first electrode layer of the third sub-pixel region and the pixel defining layer with an organic light emitting structure layer.
And step 207, forming a second electrode layer on the side, away from the substrate, of the organic light emitting structure layer.
And 208, forming an encapsulation layer on the side, far away from the substrate, of the second electrode layer.
And 209, forming a color filter layer corresponding to the first sub-pixel area, the second sub-pixel area and the third sub-pixel area on the side, away from the substrate, of the packaging layer.
Alternatively, the first sub-pixel region is a red sub-pixel region, the second sub-pixel region is a green sub-pixel region, and the third sub-pixel region is a blue sub-pixel region, and correspondingly, the color filter layer 19 may include a red filter layer R disposed corresponding to the red sub-pixel region, a green filter layer G disposed corresponding to the green sub-pixel region, and a blue filter layer B disposed corresponding to the blue sub-pixel region.
Thus, the display panel according to the method of manufacturing a display panel of the present embodiment may be manufactured as shown in fig. 5. As can be seen from fig. 5, the structure of the display panel of this embodiment is different from that of fig. 3g, in that the organic light emitting layer of this embodiment is a white organic light emitting layer, and a color filter layer 19 is disposed on a light emitting surface of the display panel, for example, a light emitting surface of the encapsulation layer 18, so as to display a color image.
Similarly, in the embodiment, the transparent electrode layers with different thicknesses are formed only in the first sub-pixel region and the second sub-pixel region by photoetching, so that the lengths of the optical cavities corresponding to the sub-pixels in the first sub-pixel region, the second sub-pixel region and the third sub-pixel region are different, the microcavity effect is avoided under the same cavity length, the red light, the green light and the blue light can be simultaneously enhanced, and the transparent electrode layer is not required to be formed in the third sub-pixel region by photoetching, so that the photoetching process is reduced, the preparation process of the display panel is simplified, and the process difficulty and the cost are reduced.
For the content not described in detail in this embodiment, refer to the above embodiments.
In addition, based on the above embodiment, it is considered that after a spectrum of a certain wavelength is enhanced, other nearby spectrums weakened by the optical cavity length appear, so that a color filter layer is further needed to filter out these unwanted peaks in the colorization process (such as the display panel structure shown in fig. 5), and meanwhile, about 50% of light passing through the color filter layer is absorbed, which results in a reduction in the emission brightness and an increase in the power consumption of the display screen; on the other hand, if the color filter layer is processed on the OLED, the color filter layer must be implemented by a process at a temperature of less than 90 ℃, which increases the difficulty of the process. If the color filter layer is manufactured on the external substrate, precise alignment is required to be subsequently attached to the display substrate, and the process is added.
Therefore, based on the method for manufacturing the display panel corresponding to fig. 1, in this embodiment, when the organic light emitting layer is formed, a color quantum dot material may be added to the organic light emitting layer. Optionally, the organic light emitting layer is a white quantum dot light emitting layer, and includes a red quantum dot material, a green quantum dot material and a blue quantum dot material; the white quantum dot light-emitting layer comprises a red light-emitting peak, a green light-emitting peak and a blue light-emitting peak, the difference between the red light-emitting peak and the green light-emitting peak is larger than or equal to the sum of the red half-peak width and the green half-peak width, and the difference between the green light-emitting peak and the blue light-emitting peak is larger than or equal to the sum of the green half-peak width and the blue half-peak width.
The display panel manufactured according to the manufacturing method of the display panel of the present embodiment may refer to fig. 3 g. As can be seen from fig. 3g, the structure of the display panel of this embodiment is different from that of fig. 5 in that the display panel of this embodiment has no color filter layer.
In the scheme of this embodiment, because quantum dot material realizes when luminous, the luminous spectrum is narrow, and color purity is high, after adopting purer colored quantum dot material to synthesize white light, again through first electrode layer reflection and transparent electrode regulation chamber length, corresponding stray peak can not appear, will not need the colored filter layer to filter out irrelevant stray peak like this. Therefore, the structure of the embodiment does not need a color filter layer, and can improve the brightness of the device, reduce power consumption and reduce manufacturing cost.
Optionally, based on the above embodiment, the thickness h of the second transparent electrode layer1The following formula is satisfied:
Figure GDA0001345950830000121
thickness h of the first transparent electrode layer2The following formula is satisfied:
Figure GDA0001345950830000122
the thickness d of the organic light emitting structure layer satisfies the following formula:
Figure GDA0001345950830000123
wherein m is the modulus, λ1Is the central wavelength, lambda, of the light of the first color2Is the central wavelength, λ, of the light of the second color3Is the central wavelength, n, of the light of the third coloroIs the refractive index of the organic light emitting structure layer, n1Is the refractive index of the second transparent electrode layer, n2Is a refractive index of the first transparent electrode layer, θ1Is the sum of the phase shifts, theta, of the reflections of the light of the first color at the surfaces of the first and second electrodes2Is the sum of the phase shifts, θ, of the reflections of the light of the second color at the surfaces of the first and second electrodes3Is the sum of the phase shifts of the reflections of the light of the third color at the surfaces of the first and second electrodes. The value of m in this embodiment may be 1 or 2.
Therefore, the cavity length of the micro-cavity structure of each sub-pixel region can reach the optimal length, and the effect of enhancing the luminescence of each sub-pixel region is further improved.
An embodiment of the present invention further provides a display panel, where the display panel includes a plurality of pixel regions, each pixel region at least includes a first sub-pixel region displaying a first color, a second sub-pixel region displaying a second color, and a third sub-pixel region displaying a third color, and with continued reference to fig. 3g, the display panel further includes:
a substrate 11;
a first electrode layer 12 formed on the substrate 11;
a first transparent electrode layer 13 formed in the first sub-pixel region and the second sub-pixel region on the side of the first electrode layer 12 away from the substrate 11;
a second transparent electrode layer 14 formed in the first sub-pixel region on the side of the first transparent electrode layer 13 away from the substrate 11;
a pixel defining layer 15 formed between adjacent sub-pixel regions;
an organic light emitting structure layer 16 covering the first transparent electrode layer 13, the second transparent electrode layer 14, the first electrode layer 12 of the third sub-pixel region and the pixel defining layer 15, wherein the organic light emitting structure layer 16 at least includes an organic light emitting layer;
a second electrode layer 17 formed on the side of the organic light emitting structure layer 16 away from the substrate 11;
and an encapsulation layer 18 formed on the side of the second electrode layer 17 away from the substrate 11.
The embodiment of the display panel and the embodiment of the method belong to the same inventive concept and have the same functions and beneficial effects.
Optionally, the second transparent electrode layer 14, the first transparent electrode layer 13, and the first electrode layer 12 are etched by using a wet etching process. Wherein, the etching selection ratio of the second transparent electrode layer 14 to the first transparent electrode layer 13 is greater than 2.
Optionally, the first electrode layer 12 is a reflective electrode layer, and the second electrode layer 17 is a transparent electrode layer or a semitransparent electrode layer, so as to implement a top emission type display panel.
Optionally, the thickness h of the second transparent electrode layer 141The following formula is satisfied:
Figure GDA0001345950830000131
thickness h of first transparent electrode layer 132The following formula is satisfied:
Figure GDA0001345950830000141
the thickness d of the organic light emitting structure layer satisfies the following formula:
Figure GDA0001345950830000142
wherein m is the modulus, λ1Is the central wavelength, lambda, of the light of the first color2Is the central wavelength, λ, of the light of the second color3Is the central wavelength, n, of the light of the third coloroIs the refractive index of the organic light emitting structure layer, n1Is the refractive index of the second transparent electrode layer, n2Is a refractive index of the first transparent electrode layer, θ1Is as followsSum of phase shifts, θ, of reflections of light of a color at surfaces of the first and second electrodes2Is the sum of the phase shifts, θ, of the reflections of the light of the second color at the surfaces of the first and second electrodes3Is the sum of the phase shifts of the reflections of the light of the third color at the surfaces of the first and second electrodes. The value of m in this embodiment may be 1 or 2. Therefore, the cavity length of the micro-cavity structure of each sub-pixel region can reach the optimal length, and the effect of enhancing the luminescence of each sub-pixel region is further improved.
Optionally, the organic light emitting layer is a white organic light emitting layer, and referring to fig. 5, the display panel further includes:
and a color filter layer 19 formed on the side of the packaging layer 18 far away from the substrate 11 and arranged corresponding to the first sub-pixel area, the second sub-pixel area and the third sub-pixel area so as to realize colorization of a displayed image.
Optionally, the organic light emitting layer is a white quantum dot light emitting layer, and includes a red quantum dot material, a green quantum dot material and a blue quantum dot material;
the white quantum dot light-emitting layer comprises a red light-emitting peak, a green light-emitting peak and a blue light-emitting peak, the difference between the red light-emitting peak and the green light-emitting peak is larger than or equal to the sum of the red half-peak width and the green half-peak width, and the difference between the green light-emitting peak and the blue light-emitting peak is larger than or equal to the sum of the green half-peak width and the blue half-peak width. Therefore, a color filter layer is not required to be arranged, the brightness of the device can be improved, the power consumption is reduced, and meanwhile, the manufacturing cost is also reduced.
Optionally, the first sub-pixel region is a red sub-pixel region, the second sub-pixel region is a green sub-pixel region, and the third sub-pixel region is a blue sub-pixel region.
The embodiments of the display panel correspond to the embodiments of the method, respectively, and belong to the same inventive concept as the embodiments of the method, and have the same functions and advantages.
An embodiment of the present invention further provides a display device, and as shown in fig. 6, the display device 100 includes the display panel 200 according to any of the embodiments.
The display device 100 may be a mobile phone, a computer, a television, an intelligent wearable display device, and the like, which is not particularly limited in this embodiment.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims (15)

1. A method for manufacturing a display panel, the display panel including a plurality of pixel regions, each of the pixel regions including at least a first sub-pixel region for displaying a first color, a second sub-pixel region for displaying a second color, and a third sub-pixel region for displaying a third color, the method comprising:
providing a substrate;
sequentially forming a first electrode layer, a first transparent electrode layer and a second transparent electrode layer which are stacked on the substrate;
photoetching off the second transparent electrode layer except the first sub-pixel region;
photoetching the first transparent electrode layer except the first sub-pixel region and the second sub-pixel region and a first electrode layer between the adjacent sub-pixel regions;
forming a pixel defining layer between adjacent sub-pixel regions;
covering an organic light-emitting structure layer on the first transparent electrode layer, the second transparent electrode layer, the first electrode layer of the third sub-pixel region and the pixel defining layer, wherein the organic light-emitting structure layer at least comprises an organic light-emitting layer;
forming a second electrode layer on one side of the organic light-emitting structure layer, which is far away from the substrate;
forming an encapsulation layer on one side of the second electrode layer far away from the substrate;
thickness h of the second transparent electrode layer1The following formula is satisfied:
Figure FDA0002303736900000011
thickness h of the first transparent electrode layer2The following formula is satisfied:
Figure FDA0002303736900000012
the thickness d of the organic light emitting structure layer satisfies the following formula:
Figure FDA0002303736900000021
wherein m is the modulus, λ1Is the central wavelength, lambda, of the light of the first color2Is the central wavelength, λ, of the light of the second color3Is the central wavelength, n, of the light of the third coloroIs a refractive index of the organic light emitting structure layer, n1Is the refractive index of the second transparent electrode layer, n2Is a refractive index of the first transparent electrode layer, θ1Is the sum of the phase shifts, θ, of the reflections of the light of the first color at the surfaces of the first and second electrodes2Is the sum of the phase shifts, θ, of the reflection of the light of the second color at the surfaces of the first and second electrodes3Is the sum of the phase shifts of the reflections of the light of the third color at the surfaces of the first and second electrodes.
2. The method for manufacturing a display panel according to claim 1, wherein the second transparent electrode layer, the first transparent electrode layer, and the first electrode layer are etched by a wet etching process.
3. The method for manufacturing a display panel according to claim 2, wherein an etching selection ratio of the second transparent electrode layer to the first transparent electrode layer is greater than 2.
4. The method for manufacturing a display panel according to claim 1, wherein the first electrode layer is a reflective electrode layer, and the second electrode layer is a transparent electrode layer or a semitransparent electrode layer.
5. The method for manufacturing a display panel according to claim 1, wherein the organic light emitting layer is a white organic light emitting layer; after the forming of the encapsulation layer, the method further comprises:
and forming a color filter layer corresponding to the first sub-pixel area, the second sub-pixel area and the third sub-pixel area on one side of the packaging layer far away from the substrate.
6. The method for manufacturing a display panel according to claim 1, wherein the organic light emitting layer is a white quantum dot light emitting layer including a red quantum dot material, a green quantum dot material, and a blue quantum dot material;
the white quantum dot light-emitting layer comprises a red light-emitting peak, a green light-emitting peak and a blue light-emitting peak, the difference between the red light-emitting peak and the green light-emitting peak is larger than or equal to the sum of the red half-peak width and the green half-peak width, and the difference between the green light-emitting peak and the blue light-emitting peak is larger than or equal to the sum of the green half-peak width and the blue half-peak width.
7. The method for manufacturing a display panel according to any one of claims 1 to 6, wherein the first sub-pixel region is a red sub-pixel region, the second sub-pixel region is a green sub-pixel region, and the third sub-pixel region is a blue sub-pixel region.
8. A display panel comprising a plurality of pixel regions, each of the pixel regions comprising at least a first sub-pixel region displaying a first color, a second sub-pixel region displaying a second color, and a third sub-pixel region displaying a third color, the display panel further comprising:
a substrate;
a first electrode layer formed on the substrate;
the first transparent electrode layer is formed in the first sub-pixel area and the second sub-pixel area on one side, far away from the substrate, of the first electrode layer;
the second transparent electrode layer is formed in the first sub-pixel area on one side, far away from the substrate, of the first transparent electrode layer;
a pixel defining layer formed between adjacent sub-pixel regions;
the organic light emitting structure layer covers the first transparent electrode layer, the second transparent electrode layer, the first electrode layer of the third sub-pixel region and the pixel defining layer, and at least comprises an organic light emitting layer;
the second electrode layer is formed on one side, far away from the substrate, of the organic light-emitting structure layer;
the packaging layer is formed on one side, far away from the substrate, of the second electrode layer;
thickness h of the second transparent electrode layer1The following formula is satisfied:
Figure FDA0002303736900000041
thickness h of the first transparent electrode layer2The following formula is satisfied:
Figure FDA0002303736900000042
the thickness d of the organic light emitting structure layer satisfies the following formula:
Figure FDA0002303736900000043
wherein m is the modulus, λ1Is the central wavelength, lambda, of the light of the first color2Is the central wavelength, λ, of the light of the second color3Is a third colorOf the center wavelength of light, noIs a refractive index of the organic light emitting structure layer, n1Is the refractive index of the second transparent electrode layer, n2Is a refractive index of the first transparent electrode layer, θ1Is the sum of the phase shifts, θ, of the reflections of the light of the first color at the surfaces of the first and second electrodes2Is the sum of the phase shifts, θ, of the reflection of the light of the second color at the surfaces of the first and second electrodes3Is the sum of the phase shifts of the reflections of the light of the third color at the surfaces of the first and second electrodes.
9. The display panel according to claim 8, wherein the second transparent electrode layer, the first transparent electrode layer, and the first electrode layer are etched by a wet etching process.
10. The display panel according to claim 9, wherein an etching selection ratio of the second transparent electrode layer to the first transparent electrode layer is greater than 2.
11. The display panel according to claim 8, wherein the first electrode layer is a reflective electrode layer, and wherein the second electrode layer is a transparent electrode layer or a translucent electrode layer.
12. The display panel according to claim 8, wherein the organic light emitting layer is a white organic light emitting layer, the display panel further comprising:
and the color filter layer is formed on one side of the packaging layer, which is far away from the substrate, and is arranged corresponding to the first sub-pixel area, the second sub-pixel area and the third sub-pixel area.
13. The display panel according to claim 8, wherein the organic light emitting layer is a white quantum dot light emitting layer including a red quantum dot material, a green quantum dot material, and a blue quantum dot material;
the white quantum dot light-emitting layer comprises a red light-emitting peak, a green light-emitting peak and a blue light-emitting peak, the difference between the red light-emitting peak and the green light-emitting peak is larger than or equal to the sum of the red half-peak width and the green half-peak width, and the difference between the green light-emitting peak and the blue light-emitting peak is larger than or equal to the sum of the green half-peak width and the blue half-peak width.
14. The display panel according to any one of claims 8 to 13, wherein the first sub-pixel region is a red sub-pixel region, the second sub-pixel region is a green sub-pixel region, and the third sub-pixel region is a blue sub-pixel region.
15. A display device characterized by comprising the display panel according to any one of claims 8 to 14.
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