CN107195584A - A kind of preparation method of display panel, display panel and display device - Google Patents
A kind of preparation method of display panel, display panel and display device Download PDFInfo
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- CN107195584A CN107195584A CN201710391124.0A CN201710391124A CN107195584A CN 107195584 A CN107195584 A CN 107195584A CN 201710391124 A CN201710391124 A CN 201710391124A CN 107195584 A CN107195584 A CN 107195584A
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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Abstract
The invention discloses the preparation method of display panel, display panel and display device, wherein, preparation method includes：Substrate is provided；First electrode layer, first transparency electrode layer and the second transparency electrode layer of stacking are sequentially formed on substrate；The second transparency electrode layer in addition to the first sub-pixel area is fallen in photoetching；The first transparency electrode layer in addition to the first sub-pixel area and the second sub-pixel area, and the first electrode layer between adjacent sub-pixel area are fallen in photoetching；Pixel defining layer is formed between adjacent sub-pixel area；Covered with machine ray structure layer in first transparency electrode layer, second transparency electrode layer, the first electrode layer of the 3rd sub-pixel area and pixel defining layer；The second electrode lay is formed in side of the organic light-emitting structure layer away from substrate；Encapsulated layer is formed in side of the second electrode lay away from substrate.Feux rouges, green glow and the blue light sent present invention improves display panel relatively difficult to achieve is while the problem of strengthening, simplifies the preparation technology of display panel.
Description
Technical field
The embodiment of the present invention belongs to display technology field, is related to a kind of preparation method of display panel, display panel and shows
Showing device.
Background technology
In the technology for realizing Organic Light Emitting Diode (Organic Light-Emitting Diode, OLED) colorization,
Include two kinds of mainstream technologys, i.e. microcavity effect rgb pixel independence luminescence technology, and white luminescent material coordinates colored filter
Technology.
Microcavity effect rgb pixel, which independently lights, to be needed, using accurate metal shadow mask and pixel technique of counterpoint, to prepare microcavity
The red, green, blue three-color light-emitting center of effect, realizes colorization, it is necessary to use accurate metal shadow mask, and use metal shadow mask
Method be difficult to ensure that the positioning precision of sub-pixel, than the display panel of high pixel density relatively difficult to achieve, moreover, precision metallic is shady
Cover is expensive, cost can be caused to increase.
White luminescent material and the combined method of colored filter, prepare the OLED that emits white light, then pass through first
Colored filter obtains three primary colours, and recombinant three primary colours realize colored display, the metal shadow mask pair that preparation process need not be accurate
Position technology, can use the colored filter technology of preparing of ripe liquid crystal display, easily realize that panel maximizes, also compare appearance
High pixel density easily is realized, so being that following prepare in OLED display technology has potential full color technology.
OLED, from the difference of device exit direction, can be divided into two kinds of structures according to light：One kind is bottom emitting type device
Part, another is top emission type device.Top emission type device sent just from the top outgoing of device, this is not just by device
The influence of bottom driving panel improves aperture opening ratio so as to effective, is conducive to the integrated of device and bottom drive circuit, so
The OLED of high pixel density is generally required using top emission light-emitting device structure.
In traditional top emission type white light OLED display panel, the corresponding optical cavity length of each sub-pixel is consistent, causes white light
The light that organic luminous layer is sent, microcavity effect is produced under same chamber length, is strengthened simultaneously than RGB relatively difficult to achieve, in addition RGB all without
Method is while light extraction, the final colorization of influence display device.
At present, can be on reflecting electrode, using yellow light area technique, in red sub-pixel, green sub-pixels and blue sub- picture
Different-thickness transparent conductive electrode is prepared on element to realize the regulation of rgb light chamber length.But, prepared on each sub-pixel
Transparent conductive electrode is, it is necessary to increase more photoetching process, and preparation technology is complicated, adds technology difficulty and cost.
The content of the invention
In view of this, the purpose of the present invention is to propose to a kind of preparation method of display panel, display panel and display device,
To improve feux rouges, green glow and blue light that display panel relatively difficult to achieve sends while the problem of strengthening, simplifies the preparation of display panel
Technique.
To achieve the above object, the present invention is adopted the following technical scheme that：
In a first aspect, the embodiments of the invention provide a kind of preparation method of display panel, the display panel includes many
Individual pixel region, each pixel region at least includes the first sub-pixel area of the first color of display, shows the second of the second color
3rd sub-pixel area of the 3rd color of sub-pixel area and display, including：
Substrate is provided；
First electrode layer, first transparency electrode layer and the second transparency electrode layer of stacking are sequentially formed over the substrate；
The second transparency electrode layer in addition to first sub-pixel area is fallen in photoetching；
The first transparency electrode layer in addition to first sub-pixel area and second sub-pixel area is fallen in photoetching, with
And the first electrode layer between adjacent sub-pixel area；
Pixel defining layer is formed between adjacent sub-pixel area；
In first transparency electrode layer, the second transparency electrode layer, the first electrode layer of the 3rd sub-pixel area
With in the pixel defining layer covered with machine ray structure layer, wherein, the organic light-emitting structure layer at least includes organic light emission
Layer；
The second electrode lay is formed in side of the organic light-emitting structure layer away from the substrate；
Planarization layer and encapsulated layer are sequentially formed in side of the second electrode lay away from the substrate.
Second aspect, the embodiments of the invention provide a kind of display panel, the display panel includes multiple pixel regions, often
The individual pixel region at least includes the first sub-pixel area of the first color of display, the second sub-pixel area for showing the second color and shown
Show the 3rd sub-pixel area of the 3rd color, the display panel also includes：
Substrate；
First electrode layer, is formed over the substrate；
First transparency electrode layer, is formed in first sub-pixel area of the first electrode layer away from the substrate side
With second sub-pixel area；
Second transparency electrode layer, is formed in described first sub- picture of the first transparency electrode layer away from the substrate side
Plain area；
Pixel defining layer, is formed between adjacent sub-pixel area；
Organic light-emitting structure layer, is covered in the first transparency electrode layer, second transparency electrode layer, the 3rd son
In the first electrode layer of pixel region and the pixel defining layer, wherein, the organic light-emitting structure layer at least includes organic light emission
Layer；
The second electrode lay, is formed in side of the organic light-emitting structure layer away from the substrate；
Planarization layer and encapsulated layer, are layered in side of the second electrode lay away from the substrate.
The third aspect, the embodiments of the invention provide a kind of display device, including the display surface described in above-mentioned second aspect
Plate.
The beneficial effects of the invention are as follows：Preparation method, display panel and the display device for the display panel that the present invention is provided,
By being only lithographically formed the transparent electrode layer of different-thickness in the first sub-pixel area and the second sub-pixel area, the first son just may be such that
In pixel region, the second sub-pixel area and the 3rd sub-pixel area the corresponding optical cavity length of each sub-pixel is different, it is to avoid in same chamber
Long lower generation microcavity effect, feux rouges, green glow and blue light can be achieved to be strengthened simultaneously, moreover, without in the 3rd sub-pixel area photoetching shape
Into a transparent electrode layer, photoetching process is reduced, the preparation technology of display panel is simplified, reduces technology difficulty and cost.
Brief description of the drawings
The exemplary embodiment of the present invention will be described in detail by referring to accompanying drawing below, makes one of ordinary skill in the art
Become apparent from the above-mentioned and other feature and advantage of the present invention, accompanying drawing：
Fig. 1 is the structural representation of existing display panel；
Fig. 2 is the schematic flow sheet of the preparation method of display panel provided in an embodiment of the present invention；
Fig. 3 a-3g are the corresponding structural representations of each preparation flows of Fig. 2；
Fig. 4 is the schematic flow sheet of the preparation method of another display panel provided in an embodiment of the present invention；
Fig. 5 is the structural representation of the display panel by Fig. 4 preparation method preparation；
Fig. 6 is the structural representation of display device provided in an embodiment of the present invention.
Embodiment
Further illustrate technical scheme below in conjunction with the accompanying drawings and by embodiment.It may be appreciated
It is that specific embodiment described herein is used only for explaining the present invention, rather than limitation of the invention.Further need exist for explanation
, for the ease of description, part related to the present invention rather than entire infrastructure are illustrate only in accompanying drawing.
Fig. 1 is the structural representation of existing display panel.As shown in figure 1, existing display panel may include multiple pictures
Plain area, each pixel region includes red sub-pixel area, green sub-pixels area and blue subpixels area；The display panel also includes lining
Bottom 1；Reflecting electrode, positioned at the side of substrate 1, including reflection to red light electrode 2 positioned at red sub-pixel area, positioned at green sub- picture
The green reflection electrode 3 in plain area and the blu-ray reflection electrode 4 positioned at blue subpixels area；Transparency electrode, it is remote positioned at reflecting electrode
From the side of substrate 1, including it is feux rouges transparency electrode 5 on reflection to red light electrode 2, green on green reflection electrode 3
Transparent electrode 6 and the blue light transparency electrode 7 on blu-ray reflection electrode 4；Organic luminous layer 8, it is remote positioned at transparency electrode
The side of substrate 1；Semitransparent electrode 9, positioned at side of the organic luminous layer 8 away from substrate 1；Encapsulated layer 10, covers translucent electricity
Pole 9；Chromatic filter layer, positioned at side of the encapsulated layer 10 away from substrate 1, including Red lightscreening plate R positioned at red sub-pixel area,
Green color filter G positioned at the green sub-pixels area and blue color filter B positioned at blue subpixels area.
Reflection to red light electrode 2, green reflection electrode 3 and blu-ray reflection electrode 4 have been respectively formed on it can be seen from Fig. 1
Transparency electrode and thickness difference, so that the long h1 of chamber, the green reflection electrode of the first micro-cavity structure on reflection to red light electrode 2
The long h2 of chamber of the second micro-cavity structure on 3 is different with the long h3 of chamber of the 3rd micro-cavity structure on blu-ray reflection electrode 4, it is possible to resolve because
The problem of producing microcavity effect under same chamber length, and strengthen simultaneously than RGB relatively difficult to achieve, still, on each reflecting electrode
The different transparency electrode of thickness is all prepared, and to etch reflection to red light electrode, green reflection electrode and blu-ray reflection electrode, is needed
Increase more photoetching process, preparation technology is complicated, adds technology difficulty and cost.
In view of the above-mentioned problems, the embodiment of the present invention proposes preparation method, display panel and the display device of display panel.
Fig. 2 is the schematic flow sheet of the preparation method of display panel provided in an embodiment of the present invention.Wherein, the present invention is implemented
The display panel of example includes multiple pixel regions, and each pixel region at least includes the first sub-pixel area of the first color of display, display
3rd sub-pixel area of the 3rd color of the second sub-pixel area and display of the second color.As shown in Fig. 2 the preparation side of display panel
Method may include：
Step 101, offer substrate.
Optionally, substrate can be rigid substrates or flexible base board, wherein, the materials of rigid substrates can be glass, soft
Property substrate material can be polyimides, the thickness of substrate can set according to process requirements and product requirement etc..
Step 102, with reference to Fig. 3 a, first electrode layer 12, the first transparency electrode layer of stacking are sequentially formed on the substrate 11
13 and second transparency electrode layer 14.
Optionally, for the display panel of one side light extraction, such as top emission type display panel, the first electrode layer 12 can be with
Make reflection electrode layer；For the display panel of two-sided light extraction, the first electrode layer 12 can be transparent electrode layer or translucent electricity
Pole layer.The material of first transparency electrode layer 13 and second transparency electrode layer 14 can be same material, or different materials,
Optionally, the material of first transparency electrode layer 13 and second transparency electrode layer 14 can be one kind in IZO and ITO.
Step 103, with reference to Fig. 3 b, photoetching fall in addition to the first sub-pixel area A second transparency electrode layer 14.
Exemplary, retain the first sub-pixel area A after photoresist, exposure imaging can be coated on second transparency electrode layer 14
Interior photoresist, etches away exposed second transparency electrode layer 14, removes photoresist, forms the positioned at the first sub-pixel area A
Two transparent electrode layers 14.
Step 104, with reference to Fig. 3 c, the first transparent electricity in addition to the first sub-pixel area A and the second sub-pixel area B is fallen in photoetching
Pole layer 13, and the first electrode layer 12 between adjacent sub-pixel area.
Exemplary, photoresist, exposure imaging can be coated on second transparency electrode layer 14 and first transparency electrode layer 13
On the first transparency electrode layer 13 for retaining second transparency electrode layer 14 and the second sub-pixel area B and the 3rd sub-pixel area C afterwards
Photoresist, etches away exposed first transparency electrode layer 13 and the below first electrode layer 12 of correspondence position；Remove the 3rd son
Photoresist on pixel region C first transparency electrode layer 13, etches away the 3rd sub-pixel area C first transparency electrode layer 13, goes
Except all photoresists.
Optionally, also photoresist, exposure imaging can be coated on second transparency electrode layer 14 and first transparency electrode layer 13
Retain the photoresist on second transparency electrode layer 14 and the second sub-pixel area B first transparency electrode layer 13 afterwards, etch away sudden and violent
The first transparency electrode layer 13 of dew；Continuation forms photoresist in the 3rd sub-pixel area C first electrode layer 12, etches away adjacent
Sub-pixel area between first electrode layer 12, remove all photoresists.
Step 105, with reference to Fig. 3 d, between adjacent sub-pixel area formed pixel defining layer 15.
Optionally, pixel defining layer 15 can be organic material, and the pixel defining layer can limit the opening of each sub-pixel area
Area (luminous zone).
Step 106, with reference to Fig. 3 e, first transparency electrode layer 13, the 14, the 3rd sub-pixel area of second transparency electrode layer the
Covered with machine ray structure layer 16 on one electrode layer 12 and pixel defining layer 15.
Wherein, organic light-emitting structure layer 16 at least includes organic luminous layer.Optionally, organic luminous layer can have for white light
Machine luminescent layer, coordinates colored filter to show coloured image；Organic luminous layer can also include red illuminating material, green emitting
Material and blue emitting material, directly send feux rouges, green glow and blue light.The embodiment of the present invention is not particularly limited to this, can root
The display panel of different structure is prepared according to customer demand.
Optionally, organic light-emitting structure layer 16 may also include what is stacked gradually positioned at organic luminous layer close to the side of substrate 11
Hole transmission layer and void nucleation layer, and the electron transfer layer and electricity stacked gradually positioned at organic luminous layer away from substrate side
Sub- generation layer.
, can be by deposition or evaporation process in first transparency electrode layer 13, second transparency electrode layer 14, the in the present embodiment
Organic light-emitting structure layer 16 is formed in the first electrode layer 12 and pixel defining layer 15 of three sub-pixel areas.
Step 107, with reference to Fig. 3 f, form the second electrode lay 17 in side of the organic light-emitting structure layer 16 away from substrate 11.
In the present embodiment, first electrode layer 12, the second electrode lay 17 and organic light-emitting structure layer 16 form organic light emission two
Pole pipe, first electrode layer 12 can be anode layer, and the second electrode lay 17 can be cathode layer, optionally, aobvious for top emission type
Show panel, the second electrode lay 17 can be transparent electrode layer or semitransparent electrode layer.
Step 108, with reference to Fig. 3 g, form encapsulated layer 18 in side of the second electrode lay 17 away from substrate 11.
Optionally, encapsulated layer 18 can be encapsulation cover plate, or thin-film encapsulation layer.
The preparation method of display panel provided in an embodiment of the present invention, by only in the first sub-pixel area and the second sub-pixel
Area is lithographically formed the transparent electrode layer of different-thickness, just may be such that the first sub-pixel area, the second sub-pixel area and the 3rd sub-pixel
In area the corresponding optical cavity length of each sub-pixel is different, it is to avoid produce microcavity effect under same chamber length, and feux rouges, green glow can be achieved
Strengthen simultaneously with blue light, moreover, without being lithographically formed a transparent electrode layer in the 3rd sub-pixel area, photoetching process is reduced, letter
Change the preparation technology of display panel, reduce technology difficulty and cost.
Optionally, can be using wet-etching technology to second transparency electrode layer, first transparency electrode layer in above-described embodiment
Performed etching with first electrode layer.Wherein, the material of first transparency electrode layer and second transparency electrode layer can be different materials,
It can also be same material.When etching second transparency electrode layer, etch rate can be very fast, and in etching first transparency electrode
During layer, etch rate should be slower, it is to avoid crosses the first electrode layer for carving or etching into the 3rd sub-pixel area.
Exemplary, when the material of first transparency electrode layer and second transparency electrode layer is different materials, the second transparent electricity
The etching selection ratio of pole layer and first transparency electrode layer is more than 2.Optionally, the material of second transparency electrode layer is IZO, etches medicine
Liquid can be oxalic acid, and etch rate is 50nm/s；The material of first transparency electrode layer is the ITO of 10% tin oxide of doping, etching
Decoction can be chloroazotic acid, and etch rate is 10nm/s, and etching decoction can also be oxalic acid, and etch rate is 0.1nm/s.In addition,
When the material of first transparency electrode layer and second transparency electrode layer is same material, heat first can be carried out to first transparency electrode layer
Or light processing, without carrying out heat or light processing to second transparency electrode layer so that first transparency electrode layer and second transparency electrode
The etching characteristic of layer is different, in specific etching decoction, can still meet the quarter of second transparency electrode layer and first transparency electrode layer
Erosion selection is than being more than 2.Optionally, the material of first transparency electrode layer and second transparency electrode layer is ITO, can be transparent first
After electrode layer spatter film forming, more than 200 DEG C of heat treatment is carried out to first transparency electrode layer, first transparency electrode layer is by amorphous
ITO becomes crystal ITO, and second transparency electrode layer is not thermally treated, is still amorphous ITO so that first transparency electrode layer and second
The etching characteristic of transparent electrode layer is different.
Optionally, based on above-mentioned wet etching scheme, when the material of first transparency electrode layer is 10% tin oxide of doping
ITO, when the material of first electrode layer is Ti, if etched to first transparency electrode layer and first electrode layer simultaneously, etches decoction
Can be chloroazotic acid, its etch rate to first transparency electrode layer is 10nm/s, is 2nm/ to the etch rate of first electrode layer
s；If being etched respectively to first transparency electrode layer and first electrode layer, the etching decoction of first transparency electrode layer can be grass
Acid, etch rate is 0.1nm/s, and the etching decoction of first electrode layer can be hydrofluoric acid, and etch rate is 10nm/s.
Fig. 4 is the schematic flow sheet of the preparation method of another display panel provided in an embodiment of the present invention.Optionally, base
In such scheme, the present embodiment, organic luminous layer is white-light organic light-emitting layer；Also include after encapsulated layer is formed：In envelope
Fill side of the layer away from substrate and form the colour being correspondingly arranged with the first sub-pixel area, the second sub-pixel area and the 3rd sub-pixel area
Filter layer.
Specifically, as shown in figure 4, the preparation method of the display panel of the present embodiment may include：
Step 201, offer substrate.
Step 202, the first electrode layer for sequentially forming on substrate stacking, first transparency electrode layer and second transparency electrode
Layer.
Step 203, photoetching fall the second transparency electrode layer in addition to the first sub-pixel area.
Step 204, photoetching fall the first transparency electrode layer in addition to the first sub-pixel area and the second sub-pixel area, Yi Jixiang
First electrode layer between adjacent sub-pixel area.
Step 205, between adjacent sub-pixel area form pixel defining layer.
Step 206, in first transparency electrode layer, second transparency electrode layer, the first electrode layer of the 3rd sub-pixel area and picture
Covered with machine ray structure layer on plain definition layer.
Step 207, the side formation the second electrode lay in the remote substrate of organic light-emitting structure layer.
Step 208, in side of the second electrode lay away from substrate form encapsulated layer.
Step 209, formed and the first sub-pixel area, the second sub-pixel area and the 3rd son in side of the encapsulated layer away from substrate
The chromatic filter layer that pixel region is correspondingly arranged.
Optionally, above-mentioned first sub-pixel area is red sub-pixel area, and the second sub-pixel area is green sub-pixels area, the 3rd
Sub-pixel area is blue subpixels area specifically, accordingly, chromatic filter layer 19 may include to be correspondingly arranged with red sub-pixel area
Red filter layer R, with the green sub-pixels area green color filter G being correspondingly arranged and the indigo plant being correspondingly arranged with blue subpixels area
Color filtering optical layer B.
Thus, display panel as shown in Figure 5 can be prepared according to the preparation method of the display panel of the present embodiment.From Fig. 5
As can be seen that the structure of the display panel of the present embodiment from unlike Fig. 3 g, the present embodiment for organic luminous layer be white light
Organic luminous layer, in the exiting surface of display panel, is such as provided with chromatic filter layer 19, to show coloured silk in the exiting surface of encapsulated layer 18
Color image.
Likewise, the present embodiment in the first sub-pixel area and the second sub-pixel area by being only lithographically formed the saturating of different-thickness
Prescribed electrode layer, just may be such that the corresponding optics of each sub-pixel in the first sub-pixel area, the second sub-pixel area and the 3rd sub-pixel area
Chamber length is different, it is to avoid produce microcavity effect under same chamber length, and feux rouges, green glow and blue light can be achieved to be strengthened simultaneously, moreover, nothing
A transparent electrode layer need to be lithographically formed in the 3rd sub-pixel area, reduce photoetching process, simplify the preparation technology of display panel,
Reduce technology difficulty and cost.
The content of not detailed description refer to above-described embodiment in the present embodiment.
In addition, based on above-described embodiment, it is contemplated that after the spectrum enhancing of a certain wavelength, nearby there are other by optical cavity length
The spectrum of decrease occurs, and so also needing to chromatic filter layer in colorization process, (as shown in Figure 5 is aobvious to filter out these miscellaneous peaks
Show panel construction), while the light for having about 50% by the light of chromatic filter layer is absorbed, cause luminosity to reduce, improve
Display screen power consumption；Still further aspect, if chromatic filter layer is processed on OLED, just necessarily require chromatic filter layer less than
90 DEG C of techniques are realized, improve the difficulty of technique.It is follow-up to need precision right if chromatic filter layer is produced on the substrate of outside
Position is fitted with display base plate, increases technique process.
Therefore, the preparation method based on the display panel corresponding to Fig. 1, the present embodiment, can when forming organic luminous layer
Colored quanta point material is added in organic luminous layer.Optionally, organic luminous layer is white quantum dot light emitting layer, including red
Quanta point material, green quanta point material and blue quanta point material；White quantum dot light emitting layer includes emitting red light peak, green
Glow peak and blue-light-emitting peak, and the difference at emitting red light peak and green emitting peak is more than or equal to red half-peak breadth and green half-peak
The difference at wide sum, green emitting peak and blue-light-emitting peak is more than or equal to green half-peak breadth and blue half-peak breadth sum.
Fig. 3 g are referred to according to display panel prepared by the preparation method of the display panel of the present embodiment.Can be with from Fig. 3 g
Find out, the structure of the display panel of the present embodiment in the structure of the present embodiment display panel without colored from unlike Fig. 5, filtering
Photosphere.
In the scheme of the present embodiment, when luminous because quanta point material is realized, luminescent spectrum is narrow, and excitation is high, is using
After purer colored quanta point material synthesis white light, then it is long by first electrode layer reflection and transparency electrode regulation chamber, will not
There is corresponding spuious peak, will so not need chromatic filter layer to filter out unrelated spuious peak.Therefore, the knot of the present embodiment
Chromatic filter layer will not be needed in structure, and device brightness can be improved, power consumption is reduced, while reducing manufacturing cost yet.
Optionally, based on above-described embodiment, the thickness h of second transparency electrode layer1Meet equation below：
The thickness h of first transparency electrode layer2Meet equation below：
The thickness d of organic light-emitting structure layer meets equation below：
Wherein, m is modulus, λ1For the centre wavelength of the light of the first color, λ2For the centre wavelength of the light of the second color, λ3
For the centre wavelength of the light of the 3rd color, noFor the refractive index of organic light-emitting structure layer, n1For the refraction of second transparency electrode layer
Rate, n2For the refractive index of first transparency electrode layer, θ1For the first color light in first electrode and the reflection phase of second electrode surface
Move sum, θ2For the second color light in first electrode and the reflection phase shift sum of second electrode surface, θ3For the light of the 3rd color
In first electrode and the reflection phase shift sum of second electrode surface.M value can be 1 or 2 in the present embodiment.
Thus, it may be such that the chamber length of each sub-pixel area micro-cavity structure reaches optimum length, further improve each sub-pixel area
The effect of luminescence enhancement.
The embodiment of the present invention additionally provides a kind of display panel, and the display panel includes multiple pixel regions, each pixel region
At least include showing the first sub-pixel area of the first color, show the second sub-pixel area of the second color and showing the 3rd color
3rd sub-pixel area, can also include with continued reference to Fig. 3 g, display panel：
Substrate 11；
First electrode layer 12, is formed on the substrate 11；
First transparency electrode layer 13, is formed in first sub-pixel area and second of the first electrode layer 12 away from the side of substrate 11
Sub-pixel area；
Second transparency electrode layer 14, is formed in 13 the first sub-pixel area away from the side of substrate 11 of first transparency electrode layer；
Pixel defining layer 15, is formed between adjacent sub-pixel area；
Organic light-emitting structure layer 16, is covered in first transparency electrode 13,14 second transparency electrode of layer layer, the 3rd sub-pixel area
First electrode layer 12 and pixel defining layer 15 on, wherein, organic light-emitting structure layer 16 at least include organic luminous layer；
The second electrode lay 17, is formed in 16 side away from substrate 11 of organic light-emitting structure layer；
Encapsulated layer 18, is formed in side of the second electrode lay 17 away from substrate 11.
The embodiment of this display panel belongs to same inventive concept with above method embodiment, possesses identical function and has
Beneficial effect.
Optionally, second transparency electrode layer 14, first transparency electrode layer 13 and first electrode layer 12 use wet etching work
Skill is performed etching.Wherein, the etching selection ratio of second transparency electrode layer 14 and first transparency electrode layer 13 is more than 2.
Optionally, first electrode layer 12 is reflection electrode layer, and the second electrode lay 17 is transparent electrode layer or semitransparent electrode
Layer, to realize top emission type display panel.
Optionally, the thickness h of second transparency electrode layer 141Meet equation below：
The thickness h of first transparency electrode layer 132Meet equation below：
The thickness d of organic light-emitting structure layer meets equation below：
Wherein, m is modulus, λ1For the centre wavelength of the light of the first color, λ2For the centre wavelength of the light of the second color, λ3
For the centre wavelength of the light of the 3rd color, noFor the refractive index of organic light-emitting structure layer, n1For the refraction of second transparency electrode layer
Rate, n2For the refractive index of first transparency electrode layer, θ1For the first color light in first electrode and the reflection phase of second electrode surface
Move sum, θ2For the second color light in first electrode and the reflection phase shift sum of second electrode surface, θ3For the light of the 3rd color
In first electrode and the reflection phase shift sum of second electrode surface.M value can be 1 or 2 in the present embodiment.Thus, it may be such that
The chamber length of each sub-pixel area micro-cavity structure reaches optimum length, further improves the effect of each sub-pixel area luminescence enhancement.
Optionally, organic luminous layer is white-light organic light-emitting layer, and with reference to Fig. 5, display panel also includes：
Formed side of the encapsulated layer 18 away from substrate 11 and with the first sub-pixel area, the second sub-pixel area and the 3rd sub- picture
The chromatic filter layer 19 that plain area is correspondingly arranged, to realize the coloration of display image.
Optionally, organic luminous layer is white quantum dot light emitting layer, including red quantum dot material, green quanta point material
With blue quanta point material；
White quantum dot light emitting layer include emitting red light peak, green emitting peak and blue-light-emitting peak, and emitting red light peak with
The difference at green emitting peak is more than or equal to the difference of red half-peak breadth and green half-peak breadth sum, green emitting peak and blue-light-emitting peak
More than or equal to green half-peak breadth and blue half-peak breadth sum.Thus, chromatic filter layer can need not be set, and device can be improved
Brightness, reduces power consumption, while also reducing manufacturing cost.
Optionally, above-mentioned first sub-pixel area is red sub-pixel area, and the second sub-pixel area is green sub-pixels area, the 3rd
Sub-pixel area is blue subpixels area.
The embodiment of above-mentioned display panel corresponds to above method embodiment respectively, belongs to same hair with above method embodiment
Bright design, possesses identical function and beneficial effect.
The embodiment of the present invention additionally provides a kind of display device, as shown in fig. 6, the display device 100 is including any of the above-described
The display panel 200 of embodiment.
Wherein, display device 100 can be mobile phone, computer, television set and intelligence wearing display device etc., the present embodiment pair
This is not particularly limited.
Note, above are only presently preferred embodiments of the present invention and institute's application technology principle.It will be appreciated by those skilled in the art that
The invention is not restricted to specific embodiment described here, can carry out for a person skilled in the art it is various it is obvious change,
Readjust and substitute without departing from protection scope of the present invention.Therefore, although the present invention is carried out by above example
It is described in further detail, but the present invention is not limited only to above example, without departing from the inventive concept, also
Other more equivalent embodiments can be included, and the scope of the present invention is determined by scope of the appended claims.
Claims (17)
1. a kind of preparation method of display panel, the display panel includes multiple pixel regions, each pixel region is at least wrapped
Include the first sub-pixel area, the second sub-pixel area of the second color of display and the 3rd son for showing the 3rd color of the first color of display
Pixel region, it is characterised in that including：
Substrate is provided；
First electrode layer, first transparency electrode layer and the second transparency electrode layer of stacking are sequentially formed over the substrate；
The second transparency electrode layer in addition to first sub-pixel area is fallen in photoetching；
The first transparency electrode layer in addition to first sub-pixel area and second sub-pixel area, Yi Jixiang are fallen in photoetching
First electrode layer between adjacent sub-pixel area；
Pixel defining layer is formed between adjacent sub-pixel area；
In first transparency electrode layer, second transparency electrode layer, the first electrode layer of the 3rd sub-pixel area and institute
State covered with machine ray structure layer in pixel defining layer, wherein, the organic light-emitting structure layer at least includes organic luminous layer；
The second electrode lay is formed in side of the organic light-emitting structure layer away from the substrate；
Encapsulated layer is formed in side of the second electrode lay away from the substrate.
2. the preparation method of display panel according to claim 1, it is characterised in that using wet-etching technology to described
Second transparency electrode layer, first transparency electrode layer and the first electrode layer are performed etching.
3. the preparation method of display panel according to claim 2, it is characterised in that the second transparency electrode layer and institute
The etching selection ratio for stating first transparency electrode layer is more than 2.
4. the preparation method of display panel according to claim 1, it is characterised in that the first electrode layer is reflection electricity
Pole layer, the second electrode lay is transparent electrode layer or semitransparent electrode layer.
5. the preparation method of display panel according to claim 1, it is characterised in that the thickness of the second transparency electrode layer
Spend h1Meet equation below：
<mrow>
<msub>
<mi>h</mi>
<mn>1</mn>
</msub>
<mo>=</mo>
<mfrac>
<mrow>
<mfrac>
<mrow>
<msub>
<mi>m&lambda;</mi>
<mn>1</mn>
</msub>
</mrow>
<mn>2</mn>
</mfrac>
<mo>-</mo>
<msub>
<mi>n</mi>
<mi>o</mi>
</msub>
<mo>*</mo>
<mi>d</mi>
<mo>-</mo>
<mfrac>
<mrow>
<msub>
<mi>&lambda;</mi>
<mn>1</mn>
</msub>
<mo>*</mo>
<msub>
<mi>&theta;</mi>
<mn>1</mn>
</msub>
</mrow>
<mrow>
<mn>4</mn>
<mi>&pi;</mi>
</mrow>
</mfrac>
<mo>-</mo>
<msub>
<mi>n</mi>
<mn>2</mn>
</msub>
<mo>*</mo>
<msub>
<mi>h</mi>
<mn>2</mn>
</msub>
</mrow>
<msub>
<mi>n</mi>
<mn>1</mn>
</msub>
</mfrac>
<mo>;</mo>
</mrow>
The thickness h of the first transparency electrode layer2Meet equation below：
<mrow>
<msub>
<mi>h</mi>
<mn>2</mn>
</msub>
<mo>=</mo>
<mfrac>
<mrow>
<mfrac>
<mrow>
<msub>
<mi>m&lambda;</mi>
<mn>2</mn>
</msub>
</mrow>
<mn>2</mn>
</mfrac>
<mo>-</mo>
<msub>
<mi>n</mi>
<mi>o</mi>
</msub>
<mo>*</mo>
<mi>d</mi>
<mo>-</mo>
<mfrac>
<mrow>
<msub>
<mi>&lambda;</mi>
<mn>2</mn>
</msub>
<mo>*</mo>
<msub>
<mi>&theta;</mi>
<mn>2</mn>
</msub>
</mrow>
<mrow>
<mn>4</mn>
<mi>&pi;</mi>
</mrow>
</mfrac>
</mrow>
<msub>
<mi>n</mi>
<mn>2</mn>
</msub>
</mfrac>
<mo>;</mo>
</mrow>
The thickness d of the organic light-emitting structure layer meets equation below：
<mrow>
<mi>d</mi>
<mo>=</mo>
<mfrac>
<mrow>
<msub>
<mi>&lambda;</mi>
<mn>3</mn>
</msub>
<mrow>
<mo>(</mo>
<mfrac>
<mi>m</mi>
<mn>2</mn>
</mfrac>
<mo>-</mo>
<mfrac>
<msub>
<mi>&theta;</mi>
<mn>3</mn>
</msub>
<mrow>
<mn>4</mn>
<mi>&pi;</mi>
</mrow>
</mfrac>
<mo>)</mo>
</mrow>
</mrow>
<msub>
<mi>n</mi>
<mi>o</mi>
</msub>
</mfrac>
<mo>;</mo>
</mrow>
Wherein, m is modulus, λ1For the centre wavelength of the light of the first color, λ2For the centre wavelength of the light of the second color, λ3For
The centre wavelength of the light of three colors, noFor the refractive index of organic light-emitting structure layer, n1For the folding of second transparency electrode layer
Penetrate rate, n2For the refractive index of first transparency electrode layer, θ1For the first color light the first electrode and it is described second electricity
The reflection phase shift sum on pole surface, θ2For the second color light in the first electrode and the reflection phase of the second electrode surface
Move sum, θ3For the 3rd color light in the first electrode and the reflection phase shift sum of the second electrode surface.
6. the preparation method of display panel according to claim 1, it is characterised in that the organic luminous layer has for white light
Machine luminescent layer；Also include after the encapsulated layer is formed：
Formed and first sub-pixel area, second sub-pixel area and institute in side of the encapsulated layer away from the substrate
State the chromatic filter layer that the 3rd sub-pixel area is correspondingly arranged.
7. the preparation method of display panel according to claim 1, it is characterised in that the organic luminous layer is measured for white
Son point luminescent layer, including red quantum dot material, green quanta point material and blue quanta point material；
The white quantum dot light emitting layer include emitting red light peak, green emitting peak and blue-light-emitting peak, and emitting red light peak with
The difference at green emitting peak is more than or equal to the difference of red half-peak breadth and green half-peak breadth sum, green emitting peak and blue-light-emitting peak
More than or equal to green half-peak breadth and blue half-peak breadth sum.
8. the preparation method of the display panel according to claim any one of 1-7, it is characterised in that first sub-pixel
Area is red sub-pixel area, and second sub-pixel area is green sub-pixels area, and the 3rd sub-pixel area is blue subpixels
Area.
9. a kind of display panel, the display panel includes multiple pixel regions, each pixel region at least includes display first
First sub-pixel area of color, the second sub-pixel area for showing the second color and the 3rd sub-pixel area for showing the 3rd color, its
It is characterised by, the display panel also includes：
Substrate；
First electrode layer, is formed over the substrate；
First transparency electrode layer, is formed in the first electrode layer away from first sub-pixel area of the substrate side and institute
State the second sub-pixel area；
Second transparency electrode layer, is formed in first sub-pixel of the first transparency electrode layer away from the substrate side
Area；
Pixel defining layer, is formed between adjacent sub-pixel area；
Organic light-emitting structure layer, is covered in the first transparency electrode layer, second transparency electrode layer, the 3rd sub-pixel
In the first electrode layer in area and the pixel defining layer, wherein, the organic light-emitting structure layer at least includes organic luminous layer；
The second electrode lay, is formed in side of the organic light-emitting structure layer away from the substrate；
Encapsulated layer, is formed in side of the second electrode lay away from the substrate.
10. display panel according to claim 9, it is characterised in that the second transparency electrode layer, described first transparent
Electrode layer and the first electrode layer are performed etching using wet-etching technology.
11. display panel according to claim 10, it is characterised in that the second transparency electrode layer and described first saturating
The etching selection ratio of prescribed electrode layer is more than 2.
12. display panel according to claim 9, it is characterised in that the first electrode layer is reflection electrode layer, described
The second electrode lay is transparent electrode layer or semitransparent electrode layer.
13. display panel according to claim 9, it is characterised in that the thickness h of the second transparency electrode layer1Meet such as
Lower formula：
<mrow>
<msub>
<mi>h</mi>
<mn>1</mn>
</msub>
<mo>=</mo>
<mfrac>
<mrow>
<mfrac>
<mrow>
<msub>
<mi>m&lambda;</mi>
<mn>1</mn>
</msub>
</mrow>
<mn>2</mn>
</mfrac>
<mo>-</mo>
<msub>
<mi>n</mi>
<mi>o</mi>
</msub>
<mo>*</mo>
<mi>d</mi>
<mo>-</mo>
<mfrac>
<mrow>
<msub>
<mi>&lambda;</mi>
<mn>1</mn>
</msub>
<mo>*</mo>
<msub>
<mi>&theta;</mi>
<mn>1</mn>
</msub>
</mrow>
<mrow>
<mn>4</mn>
<mi>&pi;</mi>
</mrow>
</mfrac>
<mo>-</mo>
<msub>
<mi>n</mi>
<mn>2</mn>
</msub>
<mo>*</mo>
<msub>
<mi>h</mi>
<mn>2</mn>
</msub>
</mrow>
<msub>
<mi>n</mi>
<mn>1</mn>
</msub>
</mfrac>
<mo>;</mo>
</mrow>
The thickness h of the first transparency electrode layer2Meet equation below：
<mrow>
<msub>
<mi>h</mi>
<mn>2</mn>
</msub>
<mo>=</mo>
<mfrac>
<mrow>
<mfrac>
<mrow>
<msub>
<mi>m&lambda;</mi>
<mn>2</mn>
</msub>
</mrow>
<mn>2</mn>
</mfrac>
<mo>-</mo>
<msub>
<mi>n</mi>
<mi>o</mi>
</msub>
<mo>*</mo>
<mi>d</mi>
<mo>-</mo>
<mfrac>
<mrow>
<msub>
<mi>&lambda;</mi>
<mn>2</mn>
</msub>
<mo>*</mo>
<msub>
<mi>&theta;</mi>
<mn>2</mn>
</msub>
</mrow>
<mrow>
<mn>4</mn>
<mi>&pi;</mi>
</mrow>
</mfrac>
</mrow>
<msub>
<mi>n</mi>
<mn>2</mn>
</msub>
</mfrac>
<mo>;</mo>
</mrow>
The thickness d of the organic light-emitting structure layer meets equation below：
<mrow>
<mi>d</mi>
<mo>=</mo>
<mfrac>
<mrow>
<msub>
<mi>&lambda;</mi>
<mn>3</mn>
</msub>
<mrow>
<mo>(</mo>
<mfrac>
<mi>m</mi>
<mn>2</mn>
</mfrac>
<mo>-</mo>
<mfrac>
<msub>
<mi>&theta;</mi>
<mn>3</mn>
</msub>
<mrow>
<mn>4</mn>
<mi>&pi;</mi>
</mrow>
</mfrac>
<mo>)</mo>
</mrow>
</mrow>
<msub>
<mi>n</mi>
<mi>o</mi>
</msub>
</mfrac>
<mo>;</mo>
</mrow>
Wherein, m is modulus, λ1For the centre wavelength of the light of the first color, λ2For the centre wavelength of the light of the second color, λ3For
The centre wavelength of the light of three colors, noFor the refractive index of organic light-emitting structure layer, n1For the folding of second transparency electrode layer
Penetrate rate, n2For the refractive index of first transparency electrode layer, θ1For the first color light the first electrode and it is described second electricity
The reflection phase shift sum on pole surface, θ2For the second color light in the first electrode and the reflection phase of the second electrode surface
Move sum, θ3For the 3rd color light in the first electrode and the reflection phase shift sum of the second electrode surface.
14. display panel according to claim 9, it is characterised in that the organic luminous layer is white-light organic light-emitting layer,
The display panel also includes：
Formed side of the encapsulated layer away from the substrate and with first sub-pixel area, second sub-pixel area and
The chromatic filter layer that 3rd sub-pixel area is correspondingly arranged.
15. display panel according to claim 9, it is characterised in that the organic luminous layer is white quantum dot light emitting
Layer, including red quantum dot material, green quanta point material and blue quanta point material；
The white quantum dot light emitting layer include emitting red light peak, green emitting peak and blue-light-emitting peak, and emitting red light peak with
The difference at green emitting peak is more than or equal to the difference of red half-peak breadth and green half-peak breadth sum, green emitting peak and blue-light-emitting peak
More than or equal to green half-peak breadth and blue half-peak breadth sum.
16. the display panel according to claim any one of 9-15, it is characterised in that first sub-pixel area is red
Sub-pixel area, second sub-pixel area is green sub-pixels area, and the 3rd sub-pixel area is blue subpixels area.
17. a kind of display device, it is characterised in that including the display panel as described in claim any one of 9-16.
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