CN107195537A - A kind of cleaning method of monocrystalline silicon buffing sheet - Google Patents
A kind of cleaning method of monocrystalline silicon buffing sheet Download PDFInfo
- Publication number
- CN107195537A CN107195537A CN201710525976.4A CN201710525976A CN107195537A CN 107195537 A CN107195537 A CN 107195537A CN 201710525976 A CN201710525976 A CN 201710525976A CN 107195537 A CN107195537 A CN 107195537A
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- CN
- China
- Prior art keywords
- monocrystalline silicon
- basket
- reviewing
- piece
- piece basket
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910021421 monocrystalline silicon Inorganic materials 0.000 title claims abstract description 74
- 238000004140 cleaning Methods 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims abstract description 28
- 238000005520 cutting process Methods 0.000 claims abstract description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 7
- 239000010703 silicon Substances 0.000 claims abstract description 7
- 238000005406 washing Methods 0.000 claims 1
- 238000005192 partition Methods 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 101100204059 Caenorhabditis elegans trap-2 gene Proteins 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000000686 essence Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention provides a kind of cleaning method of monocrystalline silicon buffing sheet, monocrystalline silicon buffing sheet is cleaned using oblique cutting basket cleaning method.The basket cleaning method of oblique cutting comprises the following steps：(1) the reviewing piece basket equipped with monocrystalline silicon buffing sheet is taken, the monocrystalline silicon buffing sheet in bottom film trap in reviewing piece basket is taken out；(2) monocrystalline silicon buffing sheet in reviewing piece basket is arranged；(3) reviewing piece basket is placed on rewinder with empty piece basket, aligns, take oblique cutting basket special washer, oblique cutting basket special washer is fixed on to the bottom of sky piece basket side, sky piece basket side is lifted up the height of a film trap；(4) reviewing；(5) the empty piece basket that oblique cutting has monocrystalline silicon buffing sheet is placed in cleaning machine and cleaned.The invention provides a kind of cleaning method of monocrystalline silicon buffing sheet, compared with full blue cleaning, effectively reduce adjacent single crystalline in cleaning process it is silicon polished rub the rate of wound, while compared with partition is cleaned, improving cleaning machine production capacity and operating efficiency.
Description
Technical field
The invention belongs to monocrystalline silicon buffing sheet cleaning field, more particularly, to a kind of cleaning method of monocrystalline silicon buffing sheet.
Background technology
Monocrystalline silicon buffing sheet is the basic material for preparing electronic component, as integrated circuit is towards short and small frivolous
Direction is developed, and has turned into inevitable using thinner monocrystalline silicon buffing sheet in encapsulation, thickness is thrown in below 350um 5 cun of monocrystalline silicon
Mating plate, which belongs to, needs cleaning in monocrystalline silicon buffing plate sheet, monocrystalline silicon buffing sheet preparation process, monocrystalline silicon buffing plate sheet is in groove
Easily because front and rear two panels lamination causes burnishing surface to rub wound during full blue cleaning in formula cleaning machine, solution universal at present is partition
Cleaning, but partition cleaning needs to pour out that portion of monocrystalline is silicon polished, the production capacity of cleaning machine has so both been wasted, in operator's hand
The artificial risk for rubbing wound is also increased during dynamic partition.
The content of the invention
In view of this, the present invention is directed to propose a kind of cleaning method of monocrystalline silicon buffing sheet, not waste cleaning machine production
Thin slice cleaning is reduced on the premise of energy rubs the rate of wound.
To reach above-mentioned purpose, the technical proposal of the invention is realized in this way：
A kind of cleaning method of monocrystalline silicon buffing sheet, is carried out clear using the basket cleaning method of oblique cutting to monocrystalline silicon buffing sheet
Wash.
The basket cleaning method of oblique cutting comprises the following steps：(1) the reviewing piece basket equipped with monocrystalline silicon buffing sheet is taken, will be fallen
Monocrystalline silicon buffing sheet in piece piece basket in bottom film trap takes out；(2) monocrystalline silicon buffing sheet in reviewing piece basket is arranged, makes monocrystalline
Silicon polished vertical plane of reference alignment and towards reviewing piece basket U-shaped opening side；(3) reviewing piece basket is placed on empty piece basket
On rewinder and align, take oblique cutting basket special washer, oblique cutting basket special washer is fixed on to the bottom of sky piece basket side, makes sky piece
Basket side is lifted up the height of a film trap；(4) reviewing, monocrystalline silicon buffing sheet is poured into sky piece basket；(5) oblique cutting there is into list
The empty piece basket of crystal silicon polished silicon wafer is placed in cleaning machine and cleaned.
Further, before reviewing, reviewing piece basket and empty piece basket are first checked for, makes reviewing piece basket and the empty skew back of piece basket one
Alignd after a wrong film trap, then promote rewinder handle, the monocrystalline silicon buffing sheet in reviewing piece basket is poured into sky piece basket, examined
The monocrystalline silicon buffing sheet looked into sky piece basket, each monocrystalline silicon buffing sheet both sides are staggered a film trap, oblique to place.
Further, the monocrystalline silicon buffing sheet includes the vertical plane of reference and arcwall face.
Further, the thickness of the oblique cutting basket special washer can be adjusted.
Relative to prior art, a kind of cleaning method of monocrystalline silicon buffing sheet of the present invention has the advantage that：
A kind of cleaning method of monocrystalline silicon buffing sheet of the present invention, will be fallen using rewinder and oblique special washer
The monocrystalline silicon buffing sheet of horizontal positioned, which is tilted, in piece piece basket inserts another sky piece basket, makes monocrystalline silicon buffing sheet left in empty piece basket
The right wrong film trap of two skew backs is placed, and tilted-putted monocrystalline silicon buffing sheet is limited due to the fixation of film trap in empty piece basket
Rocking for monocrystalline silicon buffing sheet has been made, compared with full blue cleaning, adjacent single crystalline in cleaning process has been effectively reduced silicon polished
The rate of wound is rubbed, while compared with partition is cleaned, improving cleaning machine production capacity, effectively improving the operating efficiency of cleaning machine.
Brief description of the drawings
The accompanying drawing for constituting the part of the present invention is used for providing a further understanding of the present invention, schematic reality of the invention
Apply example and its illustrate to be used to explain the present invention, do not constitute inappropriate limitation of the present invention.In the accompanying drawings：
Fig. 1 tilted-putted schematic diagrames in empty piece basket for the monocrystalline silicon buffing sheet described in the embodiment of the present invention；
Fig. 2 is the overlooking the structure diagram of the monocrystalline silicon buffing sheet described in the embodiment of the present invention；
Fig. 3 is the overlooking the structure diagram of the empty piece basket described in the embodiment of the present invention；
Fig. 4 is the main structure diagram of the oblique cutting basket special washer described in the embodiment of the present invention.
Description of reference numerals：
1- sky piece baskets；2- film traps；3- monocrystalline silicon buffing sheets.
Embodiment
It should be noted that in the case where not conflicting, the embodiment in the present invention and the feature in embodiment can phases
Mutually combination.
In the description of the invention, it is to be understood that term " " center ", " longitudinal direction ", " transverse direction ", " on ", " under ",
The orientation or position relationship of the instruction such as "front", "rear", "left", "right", " vertical ", " level ", " top ", " bottom ", " interior ", " outer " are
Based on orientation shown in the drawings or position relationship, it is for only for ease of the description present invention and simplifies description, rather than indicate or dark
Specific orientation must be had, with specific azimuth configuration and operation by showing the device or element of meaning, therefore it is not intended that right
The limitation of the present invention.In addition, term " first ", " second " etc. are only used for describing purpose, and it is not intended that indicating or implying phase
To importance or the implicit quantity for indicating indicated technical characteristic.Thus, the feature for defining " first ", " second " etc. can
To express or implicitly include one or more this feature.In the description of the invention, unless otherwise indicated, " multiple "
It is meant that two or more.
In the description of the invention, it is necessary to illustrate, unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected, or be integrally connected；Can
To be mechanical connection or electrical connection；Can be joined directly together, can also be indirectly connected to by intermediary, Ke Yishi
The connection of two element internals.For the ordinary skill in the art, above-mentioned term can be understood by concrete condition
Concrete meaning in the present invention.
Describe the present invention in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
Embodiment 1
1000 monocrystalline silicon buffing sheets are taken, monocrystalline silicon buffing sheet is cleaned using oblique cutting basket cleaning method, including
Following steps：
Step one：1000 monocrystalline silicon buffing sheets 3 (as shown in Figure 2) are expired to basket in batches to be placed in reviewing piece basket, with suction
Pen takes out the monocrystalline silicon buffing sheet in bottom film trap in reviewing piece basket, is blank state；
Step 2：The monocrystalline silicon buffing sheet in reviewing piece basket is arranged, the vertical plane of reference of monocrystalline silicon buffing sheet is alignd simultaneously
Towards reviewing piece basket U-shaped opening side；
Step 3：Take with the empty piece basket 1 of reviewing piece basket identical (as shown in Figure 3), reviewing piece basket is placed on sky piece basket
On rewinder, make reviewing piece basket relative with the U-shaped opening end of empty piece basket and align, it is ensured that two piece baskets can be fastened, and take oblique cutting basket
Special washer, oblique cutting basket special washer (as shown in Figure 4) is fixed between the bottom of sky piece basket side and rewinder, makes sky piece
Basket side is lifted up the height of a film trap 2；
Step 4：Check reviewing piece basket and empty piece basket, make reviewing piece basket with it is right after empty piece basket one film trap of oblique skew back mistake
Together, rewinder handle is then promoted, the monocrystalline silicon buffing sheet in reviewing piece basket is imported in empty piece basket, empty piece basket is checked after reviewing
In monocrystalline silicon buffing sheet, monocrystalline silicon buffing sheet both sides are staggered a film trap, oblique to place (as shown in Figure 1).
Step 5：The empty piece basket that oblique cutting has monocrystalline silicon buffing sheet is placed in cleaning machine and cleaned, is once placed in cleaning machine
Two piece baskets.
Testing result, which is shown in Table 1, to be detected to 1000 monocrystalline silicon buffing sheets after being cleaned in embodiment 1.
Comparative example 1
1000 monocrystalline silicon buffing sheets are taken, it is expired to basket in batches and is placed in piece basket, piece basket is placed in cleaning machine and cleaned,
Two piece baskets are once placed in cleaning machine.
Testing result, which is shown in Table 1, to be detected to 1000 monocrystalline silicon buffing sheets after being cleaned in comparative example 1.
Comparative example 2
Take 1000 monocrystalline silicon buffing sheets, by its in batches partition be placed in piece basket, by piece basket be placed in cleaning machine clean,
Two piece baskets are once placed in cleaning machine.
Testing result, which is shown in Table 1, to be detected to 1000 monocrystalline silicon buffing sheets after being cleaned in comparative example 2.
Monocrystalline silicon buffing sheet testing result after the embodiment 1 of table 1 and the gained of comparative example 1~2 are cleaned.
According to table 1 it can be seen that a kind of cleaning method of monocrystalline silicon buffing sheet of the present invention and full blue cleaning method phase
Than effectively reduce monocrystalline silicon buffing sheet in cleaning process rubs the rate of wound；Compared with partition cleaning method, cleaning is greatly reduced
Time, cleaning machine production capacity is improved, improve the operating efficiency of cleaning machine.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
God is with principle, and any modification, equivalent substitution and improvements made etc. should be included in the scope of the protection.
Claims (6)
1. a kind of cleaning method of monocrystalline silicon buffing sheet, it is characterised in that：Using the basket cleaning method of oblique cutting to monocrystalline silicon buffing
Piece is cleaned.
2. a kind of cleaning method of monocrystalline silicon buffing sheet according to claim 1, it is characterised in that：The oblique cutting is basket clear
Washing method comprises the following steps：
(1) the reviewing piece basket equipped with monocrystalline silicon buffing sheet is taken, the monocrystalline silicon buffing sheet in bottom film trap in reviewing piece basket is taken
Go out；(2) monocrystalline silicon buffing sheet in reviewing piece basket is arranged, the vertical plane of reference of monocrystalline silicon buffing sheet is alignd and towards reviewing piece
Basket U-shaped opening side；(3) reviewing piece basket is placed on rewinder and alignd with empty piece basket, take oblique cutting basket special washer, will be oblique
The bottom that basket special washer is fixed on sky piece basket side is inserted, sky piece basket side is lifted up the height of a film trap；(4) fall
Piece, monocrystalline silicon buffing sheet is poured into sky piece basket；(5) the empty piece basket that oblique cutting has monocrystalline silicon buffing sheet is placed in cleaning machine clearly
Wash.
3. a kind of cleaning method of monocrystalline silicon buffing sheet according to claim 2, it is characterised in that：It is first before reviewing
Reviewing piece basket and empty piece basket are first checked, makes reviewing piece basket with being alignd after the wrong film trap of the empty skew back of piece basket one, then promotes reviewing
Device handle, the monocrystalline silicon buffing sheet in reviewing piece basket is poured into sky piece basket, checks the monocrystalline silicon buffing sheet in empty piece basket, each
Individual monocrystalline silicon buffing sheet both sides are staggered a film trap, oblique to place.
4. a kind of cleaning method of monocrystalline silicon buffing sheet according to claim 1 or 2, it is characterised in that：The monocrystalline silicon
The size of polished silicon wafer is 5 cun, and thickness is in≤350um.
5. a kind of cleaning method of monocrystalline silicon buffing sheet according to claim 1 or 2, it is characterised in that：The monocrystalline silicon
Polished silicon wafer includes the vertical plane of reference and arcwall face.
6. a kind of cleaning method of monocrystalline silicon buffing sheet according to claim 2, it is characterised in that：The oblique cutting basket is special
The thickness of pad can be adjusted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710525976.4A CN107195537B (en) | 2017-06-30 | 2017-06-30 | cleaning method of monocrystalline silicon polished wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710525976.4A CN107195537B (en) | 2017-06-30 | 2017-06-30 | cleaning method of monocrystalline silicon polished wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107195537A true CN107195537A (en) | 2017-09-22 |
| CN107195537B CN107195537B (en) | 2019-12-17 |
Family
ID=59881707
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710525976.4A Active CN107195537B (en) | 2017-06-30 | 2017-06-30 | cleaning method of monocrystalline silicon polished wafer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107195537B (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202428315U (en) * | 2012-01-10 | 2012-09-12 | 青岛嘉星晶电科技股份有限公司 | Ultrasonic cleaning device |
| CN204897479U (en) * | 2015-08-25 | 2015-12-23 | 广东思绿环保工程有限公司 | Reliable and stable formula ultraviolet disinfection equipment module system that inserts to one side |
| CN106449475A (en) * | 2016-09-29 | 2017-02-22 | 无锡宏纳科技有限公司 | Import structure for wafers |
-
2017
- 2017-06-30 CN CN201710525976.4A patent/CN107195537B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202428315U (en) * | 2012-01-10 | 2012-09-12 | 青岛嘉星晶电科技股份有限公司 | Ultrasonic cleaning device |
| CN204897479U (en) * | 2015-08-25 | 2015-12-23 | 广东思绿环保工程有限公司 | Reliable and stable formula ultraviolet disinfection equipment module system that inserts to one side |
| CN106449475A (en) * | 2016-09-29 | 2017-02-22 | 无锡宏纳科技有限公司 | Import structure for wafers |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107195537B (en) | 2019-12-17 |
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|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20191219 Address after: 214200 Dongfen Avenue, Yixing Economic and Technological Development Zone, Wuxi City, Jiangsu Province Co-patentee after: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Patentee after: Zhonghuan leading semiconductor materials Co.,Ltd. Address before: 300384 in Tianjin Binhai high tech Zone Huayuan Industrial Zone (outer ring road No. 12 in Haitai) Patentee before: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. |
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| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 214200 Dongjia Avenue, Yixing Economic and Technological Development Zone, Wuxi City, Jiangsu Province Patentee after: Zhonghuan Leading Semiconductor Technology Co.,Ltd. Country or region after: China Patentee after: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Address before: 214200 Dongjia Avenue, Yixing Economic and Technological Development Zone, Wuxi City, Jiangsu Province Patentee before: Zhonghuan leading semiconductor materials Co.,Ltd. Country or region before: China Patentee before: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. |