CN202428315U - Ultrasonic cleaning device - Google Patents

Ultrasonic cleaning device Download PDF

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Publication number
CN202428315U
CN202428315U CN2012200126218U CN201220012621U CN202428315U CN 202428315 U CN202428315 U CN 202428315U CN 2012200126218 U CN2012200126218 U CN 2012200126218U CN 201220012621 U CN201220012621 U CN 201220012621U CN 202428315 U CN202428315 U CN 202428315U
Authority
CN
China
Prior art keywords
cleaning
transducer
cage
support
inserting type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2012200126218U
Other languages
Chinese (zh)
Inventor
唐晓辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
QINGDAO ISTARWAFER TECHNOLOGY Co Ltd
Original Assignee
QINGDAO ISTARWAFER TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by QINGDAO ISTARWAFER TECHNOLOGY Co Ltd filed Critical QINGDAO ISTARWAFER TECHNOLOGY Co Ltd
Priority to CN2012200126218U priority Critical patent/CN202428315U/en
Application granted granted Critical
Publication of CN202428315U publication Critical patent/CN202428315U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model relates to the field of cleaning devices, in particular to an ultrasonic cleaning device which is used in the processes of single-sided grinding and polishing of sapphire wafers. The ultrasonic cleaning device comprises an ultrasonic generator 5, a cleaning tank 2, a transducer 7 and an oblique inserting type cleaning cage. The ultrasonic generator 5 is arranged above the cleaning tank 2, the transducer 7 is disposed at the bottom of the cleaning tank 2, the ultrasonic generator 5 and the transducer 7 are electrically connected through a guide line, and the oblique inserting type cleaning cage is mounted in the cleaning tank 2 and fixedly connected with the cleaning tank 2. The oblique inserting type cleaning cage comprises a cage body 4, a support 3 and a block foot 6, wherein an oblique angle is formed between the support 3 and the bottom surface of the cage body 4, and the block foot 6 is vertically disposed at the bottom of the support 3. The ultrasonic cleaning device has the advantages that the quantity of cleaned wafers at a time is increased, the investment costs of devices are reduced, the producing capacity is improved, the efficiency is increased, the processing cost of the wafers is lowered, the scratching and edge bumping of the sapphire wafers are prevented, and the loss rate of the wafers is reduced.

Description

Ultrasonic cleaning equipment
Technical field
The utility model belongs to the cleaning equipment field, particularly a kind of ultrasonic cleaning equipment that is used for sapphire wafer at single face grinding, polishing process.
Background technology
The supersonic wave cleaning machine principle is the high-frequency oscillation signal that is sent by supersonic generator; Convert the high frequency mechanical oscillation to through transducer and propagate into medium---in the cleaning solvent; Ultrasonic wave in cleaning fluid density interphase to previous irradiation; Make liquid flow and produce the micro-bubble that ten hundreds of diameters is 50-500 μ m, the micro-bubble that is present in the liquid vibrates under the effect of sound field.These bubbles form at the negative pressuren zone of ultrasonic wave longitudinal propagation, growth, and at zone of positive pressure, when acoustic pressure reached certain value, bubble increased rapidly, and are closed suddenly then.And when bubble is closed, produce shock wave, and around it, produce thousands of atmospheric pressure, destroy insoluble dirt and they are scattered in the cleaning fluid; When group's particle is being wrapped up in by greasy dirt and is being attached on cleaning part when surface; Oily by emulsification, solids and disengaging, thus reach the purpose that cleaning part purifies.In the process of this being referred to as " cavitation " effect; The bubble closure can form the high temperature of several Baidu and surpass the instantaneous pressure of 1000 air pressure; Continuously producing instantaneous pressure resembles a succession of little " blast " and constantly impacts object surface; The surface of object and the dirt in the slit are peeled off rapidly, thereby reach the purpose of object surface cleaning.
The supersonic wave cleaning machine that uses in the market no matter be single groove or multiple-grooved, the sapphire wafer single face grind and polishing process in cleaning efficiency all very low.
The utility model content
For solving inefficient problem in the sapphire wafer cleaning process that exists in the above-mentioned technology, the utility model provides the ultrasonic cleaning equipment that a kind of cleaning efficiency is high, the wafer loss rate is little.
The technical scheme of the utility model is: a kind of ultrasonic cleaning equipment, comprise supersonic generator 5, and rinse bath 2, transducer 7 and angle-inserting type clean cage.Supersonic generator 5 is arranged at rinse bath 2 tops, and transducer 7 is positioned at the bottom of rinse bath 2, and supersonic generator 5 and transducer 7 are electrically connected through lead, and angle-inserting type cleans cage and places in the said rinse bath 2, is fixedly connected with rinse bath 2.
Said angle-inserting type cleans cage and comprises cage body 4, support 3 and retaining pin 6, support 3 and cage body 4 bottom surface bevels, and retaining pin 6 is vertically installed in support 3 bottoms.
The ceramic disk 8 of placing wafer places angle-inserting type to clean on the support 3 in the cage, and sapphire wafer is bonded on the ceramic disk 8 with wax.
In the said rinse bath 2 cleaning fluid is housed.
Said transducer 7 is magnetic force transducer or PZT (piezoelectric transducer).
The magnetic force transducer is processed by the material that meetings such as nickel or nickel alloy deform in the magnetic field that changes.PZT (piezoelectric transducer) is processed by lead zirconate titanate or other potteries, and its principle is, when piezoelectric was put into the electric field of change in voltage, it can deform, and Here it is so-called " piezo-electric effect ".
The operation principle of the utility model is following: supersonic generator 5 produces high-frequency oscillation signal, and transducer 7 converts higher-order of oscillation electric power signal to acoustic energy signal.When acoustic energy reached certain intensity, cleaning fluid was open in the expansion stage of ripple, produced bubble; And at the compression stage of ripple, therefore just instant exploding or the implosion in cleaning fluid of these bubbles produce impulsive force, is used for clean wafers, and this process is known as " cavitation ".
The beneficial effect of the utility model is:
1, the tilt stand of angle-inserting type cleaning cage can be placed a plurality of ceramic disks, has improved the quantity of a clean wafers, reduces equipment investment cost;
2, improve production capacity, raise the efficiency, reduce the wafer process cost;
3, prevent sapphire wafer is caused scuffing, cracks the limit between the teeth, reduce the coefficient of losses of wafer.
Description of drawings
Fig. 1 is the overall structure sketch map of the utility model;
Fig. 2 is the perspective view that angle-inserting type cleans cage in the utility model.
Wherein, 1, draining valve, 2, rinse bath, 3, support, 4, the cage body, 5, supersonic generator, 6, the retaining pin, 7, transducer, 8, ceramic disk.
The specific embodiment
Specify the utility model below in conjunction with accompanying drawing and embodiment.
Embodiment 1:
Referring to Fig. 1 and Fig. 2, the utility model comprises supersonic generator 5, and rinse bath 2, transducer 7 and angle-inserting type clean cage.Supersonic generator 5 is arranged at rinse bath 2 tops, and transducer 7 is positioned at the bottom of rinse bath 2, and supersonic generator 5 and transducer 7 are electrically connected through lead, and angle-inserting type cleans cage and is welded in the rinse bath 2.
Angle-inserting type cleans cage and comprises cage body 4, support 3 and retaining pin 6, support 3 and cage body 4 bottom surface bevels, and retaining pin 6 is vertically installed in support 3 bottoms.
The ceramic disk 8 of placing wafer places angle-inserting type to clean on the support 3 in the cage, and sapphire wafer is bonded on the ceramic disk 8 with wax.
In the rinse bath 2 cleaning fluid is housed,
Transducer 7 is the magnetic force transducer.
During the utility model work, supersonic generator 5 produces high-frequency oscillation signal, and transducer 7 converts higher-order of oscillation electric power signal to acoustic energy signal.When acoustic energy reached certain intensity, the cleaning fluids in the rinse bath 2 were open in the expansion stage of ripple, produced bubble; And at the compression stage of ripple, therefore just instant exploding or the implosion in cleaning fluid of these bubbles produce impulsive force, and then the wafer on the cleaning ceramic dish 8.
Embodiment 2:
Outside distinguishing down, other are with embodiment 1.
Angle-inserting type cleans cage and is fixed in the rinse bath 2 through screw.
Transducer 7 is a PZT (piezoelectric transducer).

Claims (1)

1. ultrasonic cleaning equipment; Comprise supersonic generator (5), rinse bath (2) and transducer (7), said supersonic generator (5) are arranged at rinse bath (2) top; Transducer (7) is positioned at the bottom of rinse bath (2), and supersonic generator (5) is electrically connected through lead with transducer (7); It is characterized in that comprise that also angle-inserting type cleans cage, it comprises cage body (4), support (3) and retaining pin (6); Support (3) and cage body (4) bottom surface bevel; Retaining pin (6) is vertically installed in support (3) bottom, and said angle-inserting type cleans cage and places in the said rinse bath (2), is fixedly connected with rinse bath (2).
CN2012200126218U 2012-01-10 2012-01-10 Ultrasonic cleaning device Expired - Fee Related CN202428315U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2012200126218U CN202428315U (en) 2012-01-10 2012-01-10 Ultrasonic cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2012200126218U CN202428315U (en) 2012-01-10 2012-01-10 Ultrasonic cleaning device

Publications (1)

Publication Number Publication Date
CN202428315U true CN202428315U (en) 2012-09-12

Family

ID=46777788

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2012200126218U Expired - Fee Related CN202428315U (en) 2012-01-10 2012-01-10 Ultrasonic cleaning device

Country Status (1)

Country Link
CN (1) CN202428315U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103212551A (en) * 2013-04-02 2013-07-24 苏州海铂晶体有限公司 Ultrasonic wave cleaning device for wafer
CN106540910A (en) * 2016-12-09 2017-03-29 苏州爱彼光电材料有限公司 Erratic star wheel piece rack for cleaning
CN107195537A (en) * 2017-06-30 2017-09-22 天津中环领先材料技术有限公司 A kind of cleaning method of monocrystalline silicon buffing sheet
CN116269841A (en) * 2023-05-26 2023-06-23 吉林大学第一医院 Oblique insertion type puncture needle cleaning bracket device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103212551A (en) * 2013-04-02 2013-07-24 苏州海铂晶体有限公司 Ultrasonic wave cleaning device for wafer
CN106540910A (en) * 2016-12-09 2017-03-29 苏州爱彼光电材料有限公司 Erratic star wheel piece rack for cleaning
CN107195537A (en) * 2017-06-30 2017-09-22 天津中环领先材料技术有限公司 A kind of cleaning method of monocrystalline silicon buffing sheet
CN107195537B (en) * 2017-06-30 2019-12-17 天津中环领先材料技术有限公司 cleaning method of monocrystalline silicon polished wafer
CN116269841A (en) * 2023-05-26 2023-06-23 吉林大学第一医院 Oblique insertion type puncture needle cleaning bracket device
CN116269841B (en) * 2023-05-26 2023-08-04 吉林大学第一医院 Oblique insertion type puncture needle cleaning bracket device

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120912

Termination date: 20180110