CN107091611A - A kind of slit micro-displacement measuring device and its measuring method - Google Patents
A kind of slit micro-displacement measuring device and its measuring method Download PDFInfo
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- CN107091611A CN107091611A CN201710347560.8A CN201710347560A CN107091611A CN 107091611 A CN107091611 A CN 107091611A CN 201710347560 A CN201710347560 A CN 201710347560A CN 107091611 A CN107091611 A CN 107091611A
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- 238000006073 displacement reaction Methods 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims description 8
- 230000003287 optical effect Effects 0.000 claims description 4
- 238000009826 distribution Methods 0.000 claims description 2
- 238000005259 measurement Methods 0.000 abstract description 14
- 101700004678 SLIT3 Proteins 0.000 description 6
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000002389 environmental scanning electron microscopy Methods 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
A kind of slit micro-displacement measuring device, including concavees lens（2）, convex lens（1）, slit to be measured（3）And laser beam analyzer（4）, the sensitiveness of behavior and slit width for focal position focused on through the diffraction of slit by planar light, only need plane radiant and laser beam analyzer that the measurement of displacements of slit amount can be achieved, it is to avoid complex appts and complex operations.
Description
Technical field
The technical fields, specifically a kind of slit such as acquisition and the Optical field measurement of light field are focused on the present invention relates to diffraction
Micro-displacement measuring device and its measuring method.
Background technology
Being presently used for the sensor of microdisplacement measurement has the mechanical sensors such as optical-mechanic one, lever measurement formula, also has
The electricity formula sensor such as resistance-type, condenser type, inductance type, and interference formula, polarization type, ESEM formula, laser triangulation etc.
Photoelectric sensor.Wherein, mechanical, resistance sensor is only used for contact type measurement；Capacitance type sensor can be used for nothing
Contact type measurement, but range is smaller, and ratio of precision is relatively low, it is impossible to meet the requirement in high-precision field；And inductance type transducer（Such as
LVDT displacement transducers）Although with the preferable linearity and larger quantities journey, measurement frequency is very low.
Relatively good precise displacement measuring method is laser interferance method, the three-dimensional micro-displacement survey of contact pin type photoelectricity in the prior art
Amount system, has the advantages that to be easy to displacement signal digitlization, measurement accuracy height, good reliability, but it is multiple to there is complicated, operation
Miscellaneous shortcoming, therefore a large amount of micro-displacements are monitored or measurement work brings very big inconvenience to needing.
The content of the invention
The present invention to overcome above-mentioned deficiency, by planar light through the diffraction of slit focus on behavior and slit width for
The sensitiveness of focal position, only needs plane radiant and laser beam analyzer that the measurement of displacements of slit amount can be achieved, it is to avoid
Complex appts and complex operations.
In order to solve the above technical problems, technical scheme is as follows：
A kind of slit micro-displacement measuring device, including concavees lens, convex lens, slit to be measured and laser beam analyzer；The concavees lens
It is located at the light direction that enters of slit to be measured with convex lens, and the concavees lens are located at before convex lens, the concavees lens and convex lens
For being expanded to incident light；The laser beam analyzer is located at the light direction of slit to be measured, and the laser beam analyzer can phase
It is movable to slit to be measured；The concavees lens, the convex lens, the centre bit of the slit to be measured and the laser beam analyzer
In on same straight line.
Further, in addition to guide rail, the laser beam analyzer is moved forward and backward on the guide rail.
Further, the laser beam analyzer is the optical element of the distribution of light intensity of plane where can detecting it.
Further, the focus of the concavees lens and convex lens is overlapped.
Further, the focal length of the convex lens is more than the focal length of concavees lens.
Further, the concavees lens and convex lens are fixed on base.
A kind of measuring method of slit micro-displacement measuring device, comprises the following steps：
S1：The laser that wavelength is 632.8nm is launched by the He-Ne laser, expanded by the concavees lens, the convex lens
Taken after beam and expand slit to be measured described in the normal incidence of spot center part, now it is believed that being planar light through slit section laser,
Diffraction focusing effect can occur after slit.
S2：The laser beam analyzer is moved forward and backward along direction of beam propagation after the slit, light intensity maximum point is looked for, i.e.,
Focus point, measures the focus point with the slit to be measured apart from y；
S3：It is described to substitute into formula apart from y,
It is counter to release slit width x to be measured.
Compared with prior art, the invention has the advantages that：
1st, the present invention uses non-contact measurement mode, and light source uses common plane wave light source.It is used in the present invention
Concavees lens, convex lens, laser beam analyzer are common components, processing technology thereof comparative maturity, without customization, cheap,
Debug easily.
2nd, using planar light through slit diffraction focusing effect and focal position on slit width monotonicity and
Sensitiveness, the focal position of diffraction focusing need to be only measured with analyzer counter can push away surveyed slit width, simultaneously for mm magnitudes
Slit, laser beam analyzer can be detected in m magnitudes, realize the long-range detection of micro-displacement, can greatly reduce dress
This is set to, measurement efficiency is lifted, is the industry services such as industrial production, machine-building.
Brief description of the drawings
Fig. 1 is the slit micro-displacement measuring device schematic diagram in the embodiment of the present invention.
Wherein 1 is convex lens, and 2 be concavees lens, and 3 be slit to be measured, and 4 be laser beam analyzer.
Fig. 2 is the diffraction focal position and slit width graph of a relation in the embodiment of the present invention.
Fig. 3 is that the laser in the embodiment of the present invention focuses on pattern by the diffraction after slit.
Embodiment
Presently preferred embodiments of the present invention is described in detail below in conjunction with the accompanying drawings so that advantages and features of the invention be more easy to by
It will be appreciated by those skilled in the art that so as to make apparent define to protection scope of the present invention.
Embodiment one
A kind of slit micro-displacement measuring device, including concavees lens 2, convex lens 1, slit to be measured 3, guide rail and laser beam analyzer 4, such as
Shown in Fig. 1, concavees lens 2 and convex lens 1 are located at the light direction that enters of slit 3 to be measured, and concavees lens 2 are located at before convex lens 1, recessed
Mirror 2 and convex lens 1 are used to expand incident light；Laser beam analyzer 4 is located at the light direction of slit 3 to be measured, beam analysis
Instrument 4 can slit 3 relatively to be measured move forward and backward；The center of concavees lens 2, the center of convex lens 1, slit to be measured 3, the center of laser beam analyzer 4
It is located along the same line.
Lasing light emitter is 632.8nm wavelength helium neon lasers, and laser beam analyzer 4 is that the light field of plane where can detecting it is strong
The optical element of degree, can show light intensity numerical value, and can be moved on guide rail.
Embodiment two
A kind of measuring method of slit micro-displacement measuring device, using the slit micro-displacement measuring device described in embodiment one, bag
Include following steps：
S1：The laser that wavelength is 632.8nm is launched by He-Ne laser, takes and expands after concavees lens 2, convex lens 1 are expanded
Slit 3 to be measured described in the normal incidence of spot center part, now it is believed that being planar light through slit section laser, after slit
Can occur diffraction focusing effect, light pattern is as shown in Figure 3.
S2：Laser beam analyzer 4 is moved forward and backward along direction of beam propagation after slit 3 to be measured, for the slit of different in width,
Focal position is also different therewith, and focal position as shown in Fig. 2 look for light intensity maximum point, that is, is focused on slit width corresponding relation
Point, measures focus point with slit 3 to be measured apart from y；
S3：By described apart from y substitution formula, it is anti-to release slit width x.Its
Middle e is 2.718281828 ....
Using planar light through slit diffraction focusing effect and focal position on the monotonicity of slit width and quick
Perception, the focal position of diffraction focusing need to be only measured with analyzer counter can push away surveyed slit width, give the monitoring of a large amount of micro-displacements
Or measurement work is brought conveniently, simultaneously for the slit of mm magnitudes, laser beam analyzer can be detected in m magnitudes, real
The long-range detection of existing micro-displacement, can greatly reduce installation cost, lift measurement efficiency, be industrial production, machine-building
Deng industry service.
It is described above, only it is presently preferred embodiments of the present invention and oneself, any formal limitation not is made to the present invention, it is all
It is any simple modification, equivalent variations and the modification made according to the technical spirit of the present invention to above example, still falls within
In the range of technical solution of the present invention.
Claims (7)
1. a kind of slit micro-displacement measuring device, it is characterised in that including concavees lens（2）, convex lens（1）, slit to be measured（3）With
Laser beam analyzer（4）；The concavees lens（2）And convex lens（1）Positioned at slit to be measured（3）Enter light direction, and the concavees lens
（2）Positioned at convex lens（1）Before, the concavees lens（2）And convex lens（1）For being expanded to incident light；The light beam point
Analyzer（4）Positioned at slit to be measured（3）Light direction, the laser beam analyzer（4）Can slit relatively to be measured（3）It is movable；
The concavees lens（2）, the convex lens（1）, the slit to be measured（3）With the laser beam analyzer（4）It is centrally located at same
On straight line.
2. slit micro-displacement measuring device according to claim 1, it is characterised in that also including guide rail, the light beam point
Analyzer（4）Moved forward and backward on the guide rail.
3. slit micro-displacement measuring device according to claim 1, it is characterised in that the laser beam analyzer（4）It is energy
The optical element of the distribution of light intensity of plane where enough detecting it.
4. slit micro-displacement measuring device according to claim 1, it is characterised in that the concavees lens（2）And convex lens
（1）Focus overlap.
5. slit micro-displacement measuring device according to claim 1, it is characterised in that the convex lens（1）Focal length it is big
In concavees lens（2）Focal length.
6. slit micro-displacement measuring device according to claim 1, it is characterised in that the concavees lens（2）And convex lens
（1）It is fixed on base.
7. a kind of measuring method of slit micro-displacement measuring device, it is characterised in that using described in claim any one of 1-6
Slit micro-displacement measuring device, comprises the following steps：
S1：The laser that wavelength is 632.8nm is launched by He-Ne laser, by the concavees lens（2）, the convex lens（1）
Taken after expanding and expand slit to be measured described in the normal incidence of spot center part（3）；
S2：In the slit to be measured（3）Afterwards the laser beam analyzer is moved forward and backward along direction of beam propagation（4）, look for light intensity most
A little louder, i.e. focus point, measures the focus point and the slit to be measured（3）Apart from y；
S3：It is described to substitute into formula apart from y, it is counter to release the slit to be measured（3）It is wide
Spend x.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710347560.8A CN107091611A (en) | 2017-05-17 | 2017-05-17 | A kind of slit micro-displacement measuring device and its measuring method |
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| CN201710347560.8A CN107091611A (en) | 2017-05-17 | 2017-05-17 | A kind of slit micro-displacement measuring device and its measuring method |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112082490A (en) * | 2020-10-21 | 2020-12-15 | 中北大学南通智能光机电研究院 | Displacement sensor based on Talbot image and COMS camera structure |
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| CN2164086Y (en) * | 1993-06-21 | 1994-05-04 | 文建国 | Light intensity distribution graphic measuring instrument |
| US6307635B1 (en) * | 1998-10-21 | 2001-10-23 | The Regents Of The University Of California | Phase-shifting point diffraction interferometer mask designs |
| CN1910489A (en) * | 2004-01-28 | 2007-02-07 | 株式会社东芝 | Laser beam incident optical device |
| JP2013120175A (en) * | 2011-12-09 | 2013-06-17 | Kyushu Institute Of Technology | Method for measuring linear body diameter and slit width dimension |
| CN103256889A (en) * | 2013-06-05 | 2013-08-21 | 中国科学院光电技术研究所 | Positioning device and positioning method for diffraction hole |
| CN203422066U (en) * | 2013-08-05 | 2014-02-05 | 哈尔滨学院 | Device for measuring infinitesimal based on optical diffraction |
| CN104697454A (en) * | 2015-03-23 | 2015-06-10 | 苏州江奥光电科技有限公司 | Filament diameter measurement method and device based on double grating |
| CN105241383A (en) * | 2015-10-26 | 2016-01-13 | 华北电力大学（保定） | Light spot shape detection device and method |
| CN104536125B (en) * | 2015-01-13 | 2017-01-11 | 山东大学 | Longitudinal-separated-reference-added multi-cascade scanning coherent diffraction microscopy imaging device and application |
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2017
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|---|---|---|---|---|
| CN2164086Y (en) * | 1993-06-21 | 1994-05-04 | 文建国 | Light intensity distribution graphic measuring instrument |
| US6307635B1 (en) * | 1998-10-21 | 2001-10-23 | The Regents Of The University Of California | Phase-shifting point diffraction interferometer mask designs |
| CN1910489A (en) * | 2004-01-28 | 2007-02-07 | 株式会社东芝 | Laser beam incident optical device |
| JP2013120175A (en) * | 2011-12-09 | 2013-06-17 | Kyushu Institute Of Technology | Method for measuring linear body diameter and slit width dimension |
| CN103256889A (en) * | 2013-06-05 | 2013-08-21 | 中国科学院光电技术研究所 | Positioning device and positioning method for diffraction hole |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112082490A (en) * | 2020-10-21 | 2020-12-15 | 中北大学南通智能光机电研究院 | Displacement sensor based on Talbot image and COMS camera structure |
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Application publication date: 20170825 |