CN106957748A - 一种pcb电路板水性清洗剂及其制备与应用 - Google Patents
一种pcb电路板水性清洗剂及其制备与应用 Download PDFInfo
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- 239000012459 cleaning agent Substances 0.000 title claims abstract description 42
- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 22
- WUOACPNHFRMFPN-VIFPVBQESA-N (R)-(+)-alpha-terpineol Chemical compound CC1=CC[C@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-VIFPVBQESA-N 0.000 claims abstract description 12
- XFRVVPUIAFSTFO-UHFFFAOYSA-N 1-Tridecanol Chemical compound CCCCCCCCCCCCCO XFRVVPUIAFSTFO-UHFFFAOYSA-N 0.000 claims abstract description 12
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 12
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000012964 benzotriazole Substances 0.000 claims abstract description 12
- 239000013530 defoamer Substances 0.000 claims abstract description 12
- 239000008367 deionised water Substances 0.000 claims abstract description 12
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 12
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 12
- 239000011734 sodium Substances 0.000 claims abstract description 12
- COBPKKZHLDDMTB-UHFFFAOYSA-N 2-[2-(2-butoxyethoxy)ethoxy]ethanol Chemical compound CCCCOCCOCCOCCO COBPKKZHLDDMTB-UHFFFAOYSA-N 0.000 claims abstract description 11
- PFRMOIHERAVMQV-UHFFFAOYSA-N S(=O)(=O)(O)O.C(CCCCC(C)C)[Na] Chemical compound S(=O)(=O)(O)O.C(CCCCC(C)C)[Na] PFRMOIHERAVMQV-UHFFFAOYSA-N 0.000 claims abstract description 11
- RNFAKTRFMQEEQE-UHFFFAOYSA-N Tripropylene glycol butyl ether Chemical compound CCCCOC(CC)OC(C)COC(O)CC RNFAKTRFMQEEQE-UHFFFAOYSA-N 0.000 claims abstract description 11
- 125000002252 acyl group Chemical group 0.000 claims abstract description 11
- 125000005189 alkyl hydroxy group Chemical group 0.000 claims abstract description 11
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims abstract description 11
- PFNFFQXMRSDOHW-UHFFFAOYSA-N spermine Chemical compound NCCCNCCCCNCCCN PFNFFQXMRSDOHW-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229940051841 polyoxyethylene ether Drugs 0.000 claims abstract description 10
- 229920000056 polyoxyethylene ether Polymers 0.000 claims abstract description 10
- POULHZVOKOAJMA-UHFFFAOYSA-M dodecanoate Chemical compound CCCCCCCCCCCC([O-])=O POULHZVOKOAJMA-UHFFFAOYSA-M 0.000 claims abstract description 9
- 229940070765 laurate Drugs 0.000 claims abstract description 9
- 238000004140 cleaning Methods 0.000 claims abstract description 7
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 6
- 238000003756 stirring Methods 0.000 claims description 18
- 239000012224 working solution Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 9
- 239000002994 raw material Substances 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 7
- -1 hydroxyl sulfo group Chemical group 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 4
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 238000012545 processing Methods 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- 238000013019 agitation Methods 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 235000009508 confectionery Nutrition 0.000 claims 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical group CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 7
- 238000005260 corrosion Methods 0.000 abstract description 7
- 239000003344 environmental pollutant Substances 0.000 abstract description 3
- 231100000719 pollutant Toxicity 0.000 abstract description 3
- 238000005406 washing Methods 0.000 abstract description 3
- 239000012752 auxiliary agent Substances 0.000 abstract description 2
- 239000002738 chelating agent Substances 0.000 abstract description 2
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 230000035515 penetration Effects 0.000 abstract description 2
- 239000000843 powder Substances 0.000 abstract description 2
- 239000004094 surface-active agent Substances 0.000 abstract description 2
- XZYHDXZNNDZXSR-UHFFFAOYSA-N n-(1,1-dioxothiolan-3-yl)-n-methyl-2-[(4-phenyl-5-pyridin-4-yl-1,2,4-triazol-3-yl)sulfanyl]acetamide Chemical group N=1N=C(C=2C=CN=CC=2)N(C=2C=CC=CC=2)C=1SCC(=O)N(C)C1CCS(=O)(=O)C1 XZYHDXZNNDZXSR-UHFFFAOYSA-N 0.000 abstract 1
- 238000011161 development Methods 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 229930016911 cinnamic acid Natural products 0.000 description 2
- 235000013985 cinnamic acid Nutrition 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005555 metalworking Methods 0.000 description 2
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 2
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical compound C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 208000017520 skin disease Diseases 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
- C11D1/94—Mixtures with anionic, cationic or non-ionic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/28—Heterocyclic compounds containing nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/04—Carboxylic acids or salts thereof
- C11D1/10—Amino carboxylic acids; Imino carboxylic acids; Fatty acid condensates thereof
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- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
- C11D1/14—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aliphatic hydrocarbons or mono-alcohols
- C11D1/146—Sulfuric acid esters
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- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
- C11D1/721—End blocked ethers
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- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
- C11D1/92—Sulfobetaines ; Sulfitobetaines
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- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
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Abstract
本发明公开了一种PCB电路板水性清洗剂及其制备与应用,由以质量计算的如下组分制备而成:苯骈三氮唑0.5‑1份,月桂酸酰肌胺酸钠2‑4份,异构十三醇聚氧乙烯醚2‑4份,三乙二醇单丁醚5‑6.6份,异辛基硫酸钠1‑2.2份,萜烯醇3‑4.2份,单乙醇胺5‑6份,烷基羟磺基甜菜碱2‑3份,二丙二醇丁醚5‑6.8份,三丙二醇丁醚6‑7.7份,消泡剂0.5份,去离子水54‑68份,以水做清洗介质,添加表面活性剂,助剂,缓蚀剂,螯合剂等一系列以水为基的清洗剂助剂,去除水溶性剂和非极性污染物,同时清洗时不留白粉,确保被清洗的工件避免出现腐蚀现象;此外使用时简单,安全,环保,具有渗透力强,溶解力强的优点,清洗后的洗板水无腐蚀。
Description
技术领域
本发明涉及电子行业的金属加工液领域,尤其是涉及一种PCB电路板水性清洗剂及其制备与应用。
背景技术
随着社会的发展,科技也有着日新月异的变化。特别是电子行业迅猛发展,各种各样的电子产品被开发出来,丰富着人们的生活,供人们娱乐和工作,电子行业的发展离不开PCB电路板的开发,它是重要的电子部件,是电子元器件的支撑体。印制电路板从单层发展到双面板、多层板和挠性板,并不断地向高精度、高密度和高可靠性方向发展。不断缩小体积、减少成本、提高性能,使得印制电路板在未来电子产品的发展过程中,仍然保持强大的生命力。
未来印制电路板生产制造技术发展趋势是在性能上向高密度、高精度、细孔径、细导线、小间距、高可靠、多层化、高速传输、轻量、薄型方向发展。因此随着PCB电路板的发展,带动着金属加工液方面的发展。PCB电路板生产出来并不是光洁如新,需要我们进行清理,那我们就需要用相应的清洗剂进行处理。
目前市面上存在大量的PCB电路板清洗剂,但是都存在一定的问题,一方面存在对PCB电路板上的电子元件以及电路板产生腐蚀现象的问题;另一方面目前市面上存在的电路板清洗剂都是碳氢型的,这款清洗剂存在易燃,危险系数大,对人身安全有威胁、使用时气味大,对人体有一定的伤害的问题。
因此,一款针对以上问题的PCB电路板环保型的水性清洗剂值得研究。
发明内容
发明目的:为了解决现有技术中所存在的问题,本发明提出了一种不仅可以去除PCB电路板上水溶性剂和非极性污染物,同时也能确保被清洗工件未出现腐蚀现象、使用时简单,安全,环保的PCB电路板水性清洗剂及其制备与应用。
技术方案:为达以上目的,本发明采取以下技术方案:一种PCB电路板水性清洗剂,以质量计算包括如下原料组分:苯骈三氮唑0.5-1份,月桂酸酰肌胺酸钠2-4份,异构十三醇聚氧乙烯醚2-4份,三乙二醇单丁醚5-6.6份,异辛基硫酸钠1-2.2份,萜烯醇3-4.2份,单乙醇胺5-6份,烷基羟磺基甜菜碱2-3份,二丙二醇丁醚5-6.8份,三丙二醇丁醚6-7.7份,消泡剂0.5份,去离子水54-68份。
更为优选的,所述消泡剂为非硅抗泡剂。
更为优选的,本发明一种PCB电路板水洗清洗剂以质量计算包括:苯骈三氮唑0.6份,月桂酸酰肌胺酸钠2-4份,异构十三醇聚氧乙烯醚2-4份,三乙二醇单丁醚5-6.6份,异辛基硫酸钠1-2.2份,萜烯醇3-4.2份,单乙醇胺5.5份,烷基羟磺基甜菜碱2-3份,二丙二醇丁醚6份,三丙二醇丁醚6-7.7份,消泡剂0.5份,去离子水55.7-66.4份。
本发明还提出了上述一种PCB电路板水性清洗剂的制备方法,包括如下步骤:
(1)将各原料按照所需比例称量备用;
(2)首先将去离子水,单乙醇胺,烷基羟磺基甜菜碱,苯骈三氮唑混合均匀,在磁力搅拌器20-30rad/s的转速、搅拌温度为40-50℃的条件下进行搅拌,搅拌时间为1h;
(3)向上述混合物中加入月桂酸酰肌胺酸钠,异辛基硫酸钠,萜烯醇,与步骤(2)相同的搅拌条件下继续搅拌0.5h;
(4)向步骤(3)得到的混合物中继续添加异构十三醇聚氧乙烯醚,与步骤(2)相同的搅拌条件下继续搅拌0.5h;
(5)再向步骤(4)的混合物中加入三乙二醇单丁醚,二丙二醇丁醚,三丙二醇丁醚,与步骤(2)相同的搅拌条件下继续搅拌1h,最后加入消泡剂混合均匀得到所需清洗剂。
本发明还提出了上述一种PCB电路板水性清洗剂的应用,采用清洗剂与普通水以1:20或者1:10的比例进行清洗剂工作液的配制,保持工作液温度在50-60℃,采用PCB电路板竖直悬空放置且摆放方向与工作液流动方向一致,确保工作液均匀流过电路板表面,清洗完成后进行烘干处理。
有益效果:本发明提供的一种PCB电路板水性清洗剂及其制备与应用,由以质量计算的如下组分制备而成:苯骈三氮唑0.5-1份,月桂酸酰肌胺酸钠2-4份,异构十三醇聚氧乙烯醚2-4份,三乙二醇单丁醚5-6.6份,异辛基硫酸钠1-2.2份,萜烯醇3-4.2份,单乙醇胺5-6份,烷基羟磺基甜菜碱2-3份,二丙二醇丁醚5-6.8份,三丙二醇丁醚6-7.7份,消泡剂0.5份,去离子水54-68份;以水做清洗介质,添加表面活性剂,助剂,缓蚀剂,螯合剂等一系列以水为基的清洗剂助剂,去除水溶性剂和非极性污染物,同时清洗时不留白粉,确保被清洗的工件避免出现腐蚀现象;此外使用时简单,安全,环保,具有渗透力强,溶解力强的优点,清洗后的洗板水无腐蚀。
具体实施方式
实施例1:
一种PCB电路板水性清洗剂,以质量计算包括如下原料组分:苯骈三氮唑0.6份,月桂酸酰肌胺酸钠3份,异构十三醇聚氧乙烯醚3份,三乙二醇单丁醚5.6份,异辛基硫酸钠1.6份,萜烯醇3.5份,单乙醇胺5.5份,烷基羟磺基甜菜碱2.5份,二丙二醇丁醚6.8份,三丙二醇丁醚6份,消泡剂0.5份,去离子水61.4份。
实施例2:
一种PCB电路板水性清洗剂,以质量计算包括如下原料组分:苯骈三氮唑0.5份,月桂酸酰肌胺酸钠2份,异构十三醇聚氧乙烯醚2份,三乙二醇单丁醚5份,异辛基硫酸钠1份,萜烯醇3份,单乙醇胺5份,烷基羟磺基甜菜碱2份,二丙二醇丁醚5份,三丙二醇丁醚6份,消泡剂0.5份,去离子水68份。
实施例3:
一种PCB电路板水性清洗剂,以质量计算包括如下原料组分:苯骈三氮唑1份,月桂酸酰肌胺酸钠4份,异构十三醇聚氧乙烯醚4份,三乙二醇单丁醚6.6份,异辛基硫酸钠2.2份,萜烯醇4.2份,单乙醇胺6份,烷基羟磺基甜菜碱3份,二丙二醇丁醚7.7份,三丙二醇丁醚7.7份,消泡剂0.5份,去离子水53.1份。
实施例4:
一种PCB电路板水性清洗剂的制备方法,具体包括如下步骤:(1)将各原料按照所需比例称量备用;
(2)首先将去离子水,单乙醇胺,烷基羟磺基甜菜碱,苯骈三氮唑混合均匀,在磁力搅拌器20-30rad/s的转速、搅拌温度为40-50℃的条件下进行搅拌,搅拌时间为1h;
(3)向上述混合物中加入月桂酸酰肌胺酸钠,异辛基硫酸钠,萜烯醇,与步骤(2)相同的搅拌条件下继续搅拌0.5h;
(4)向步骤(3)得到的混合物中继续添加异构十三醇聚氧乙烯醚,与步骤(2)相同的搅拌条件下继续搅拌0.5h;
(5)再向步骤(4)的混合物中加入三乙二醇单丁醚,二丙二醇丁醚,三丙二醇丁醚,与步骤(2)相同的搅拌条件下继续搅拌1h,最后加入消泡剂混合均匀得到所需清洗剂。
实施例5:
将上述实施例4制备的PCB电路板水性清洗剂进行应用:
采用清洗剂与普通水以1:20的比例进行清洗剂工作液的配制,,保持工作液温度在50-60℃,取生产完成后的PCB板,将其竖直放在实验槽中,控制工作液温度保持在55摄氏度,然后搅拌工作液使其流动,看PCB板表面是否清理完成,清理完成后,烘干工件,观察其表面是否有残留,如果无,将其静置一段时间观察是否有生锈现象。取市场一款同类的清洗剂与该清洗剂做比较,在相同的条件下,清洗能力相差无几,但是市场上的清洗剂会出现腐蚀电子元件的情况,且市面上的清洗剂对皮肤有刺激性,使用时间过久容易引发皮肤病,而这款自我研发的清洗剂则无这种现象。,经检测其对松香,胶有很好的溶解性,而且对PCB电路板没有任何腐蚀现象。
此外,使用该款清洗剂,不会散发出任何刺鼻性的气味这样能确保人身安全,同时环保清洁,无残留,节省能源损耗。并且水基清洗剂能多次重复利用,而且水源易找廉价。
应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以作出若干改进,这些改进也应视为本发明的保护范围。
Claims (5)
1.一种PCB电路板水性清洗剂,其特征在于以质量计算包括如下原料组分:苯骈三氮唑0.5-1份,月桂酸酰肌胺酸钠2-4份,异构十三醇聚氧乙烯醚2-4份,三乙二醇单丁醚5-6.6份,异辛基硫酸钠1-2.2份,萜烯醇3-4.2份,单乙醇胺5-6份,烷基羟磺基甜菜碱2-3份,二丙二醇丁醚5-6.8份,三丙二醇丁醚6-7.7份,消泡剂0.5份,去离子水54-68份。
2.根据权利要求1所述的PCB电路板水性清洗剂,其特征在于:所述消泡剂为非硅抗泡剂。
3.根据权利要求1所述的PCB电路板水性清洗剂,其特征在于:以质量计算包括如下原料组分:苯骈三氮唑0.6份,月桂酸酰肌胺酸钠2-4份,异构十三醇聚氧乙烯醚2-4份,三乙二醇单丁醚5-6.6份,异辛基硫酸钠1-2.2份,萜烯醇3-4.2份,单乙醇胺5.5份,烷基羟磺基甜菜碱2-3份,二丙二醇丁醚6份,三丙二醇丁醚6-7.7份,消泡剂0.5份,去离子水55.7-66.4份。
4.如权利要求1所述的PCB电路板水性清洗剂的制备方法,其特征在于包括如下步骤:
(1)将各原料按照所需比例称量备用;
(2)首先将去离子水,单乙醇胺,烷基羟磺基甜菜碱,苯骈三氮唑混合均匀,在磁力搅拌器20-30rad/s的转速、搅拌温度为40-50℃的条件下进行搅拌,搅拌时间为1h;
(3)向上述混合物中加入月桂酸酰肌胺酸钠,异辛基硫酸钠,萜烯醇,与步骤(2)相同的搅拌条件下继续搅拌0.5h;
(4)向步骤(3)得到的混合物中继续添加异构十三醇聚氧乙烯醚,与步骤(2)相同的搅拌条件下继续搅拌0.5h;
(5)再向步骤(4)的混合物中加入三乙二醇单丁醚,二丙二醇丁醚,三丙二醇丁醚,与步骤(2)相同的搅拌条件下继续搅拌1h,最后加入消泡剂混合均匀得到所需清洗剂。
5.如权利要求1所述的PCB电路板水性清洗剂的应用,其特征在于:采用清洗剂与普通水以1:20或者1:10的比例进行清洗剂工作液的配制,保持工作液温度在50-60℃,采用PCB电路板竖直悬空放置且摆放方向与工作液流动方向一致,确保工作液均匀流过电路板表面,清洗完成后进行烘干处理。
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