CN106933027B - 一种涡旋数目可控的环形涡旋阵列掩模板的设计方法 - Google Patents
一种涡旋数目可控的环形涡旋阵列掩模板的设计方法 Download PDFInfo
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- CN106933027B CN106933027B CN201710296453.7A CN201710296453A CN106933027B CN 106933027 B CN106933027 B CN 106933027B CN 201710296453 A CN201710296453 A CN 201710296453A CN 106933027 B CN106933027 B CN 106933027B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/003—Manipulation of charged particles by using radiation pressure, e.g. optical levitation
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/006—Manipulation of neutral particles by using radiation pressure, e.g. optical levitation
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CN201710296453.7A CN106933027B (zh) | 2017-04-28 | 2017-04-28 | 一种涡旋数目可控的环形涡旋阵列掩模板的设计方法 |
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CN201710296453.7A CN106933027B (zh) | 2017-04-28 | 2017-04-28 | 一种涡旋数目可控的环形涡旋阵列掩模板的设计方法 |
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CN106933027A CN106933027A (zh) | 2017-07-07 |
CN106933027B true CN106933027B (zh) | 2020-07-07 |
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CN201710296453.7A Expired - Fee Related CN106933027B (zh) | 2017-04-28 | 2017-04-28 | 一种涡旋数目可控的环形涡旋阵列掩模板的设计方法 |
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Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107065046B (zh) * | 2017-06-28 | 2019-05-03 | 河南科技大学 | 一种基于Mittag-Leffler函数的贝塞尔-高斯光束掩模板 |
CN108037584B (zh) * | 2017-12-27 | 2020-05-15 | 河南科技大学 | 一种v型光束的掩膜板的设计方法 |
CN108681084B (zh) * | 2018-04-03 | 2020-07-24 | 河南科技大学 | 一种可自由调控的角向艾里光束掩模板的设计方法 |
CN108761783B (zh) * | 2018-08-10 | 2020-07-24 | 河南科技大学 | 一种结构可控的紧排列完美涡旋阵列掩膜板的设计方法 |
CN109407193B (zh) * | 2018-12-11 | 2021-02-19 | 中南大学 | 修正螺旋波带片的构造方法及其制成的波带片 |
CN109683339B (zh) * | 2019-01-11 | 2020-11-03 | 中国科学院西安光学精密机械研究所 | 一种用于实现亮核涡旋光束的相位掩模板及光路系统 |
CN111474708B (zh) * | 2020-04-16 | 2022-02-18 | 河南科技大学 | 一种反常环形连接的涡旋阵列掩模板的设计方法 |
CN111965834B (zh) * | 2020-09-15 | 2021-08-31 | 北京理工大学 | 一种可多自由度任意调控的完美涡旋光束阵列生成方法与系统 |
CN112180590B (zh) * | 2020-09-28 | 2022-06-14 | 河南科技大学 | 一种花状光学涡旋阵列掩模板的设计方法 |
CN113534453B (zh) * | 2021-06-29 | 2023-03-24 | 河南科技大学 | 一种可刚体旋转光束的掩模板的设计方法 |
CN114137645B (zh) * | 2021-12-03 | 2023-10-24 | 浙江水晶光电科技股份有限公司 | 衍射光学元件及其制备方法、母版衍射图案的设计方法 |
CN114755822B (zh) * | 2022-03-02 | 2024-02-09 | 中国人民解放军战略支援部队航天工程大学 | 一种基于改进算法制备大拓扑荷数完美涡旋光的方法 |
CN115236787B (zh) * | 2022-08-12 | 2023-05-16 | 浙江师范大学 | 多螺旋相位掩模板、多螺旋光束的生成方法和光调制器 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200807187A (en) * | 2006-07-21 | 2008-02-01 | Promos Technologies Inc | Vortex mask and method for preparing the same and method for preparing a circular pattern using the same |
CN105445943A (zh) * | 2015-12-24 | 2016-03-30 | 河南科技大学 | 一种分数阶完美涡旋光束的产生装置及产生方法 |
CN205620619U (zh) * | 2016-05-10 | 2016-10-05 | 华南师范大学 | 一种产生艾里高斯涡旋光束的装置 |
CN106560738A (zh) * | 2016-06-02 | 2017-04-12 | 河南科技大学 | 一种完美ig涡旋光束的产生装置及产生方法 |
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2017
- 2017-04-28 CN CN201710296453.7A patent/CN106933027B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200807187A (en) * | 2006-07-21 | 2008-02-01 | Promos Technologies Inc | Vortex mask and method for preparing the same and method for preparing a circular pattern using the same |
CN105445943A (zh) * | 2015-12-24 | 2016-03-30 | 河南科技大学 | 一种分数阶完美涡旋光束的产生装置及产生方法 |
CN205620619U (zh) * | 2016-05-10 | 2016-10-05 | 华南师范大学 | 一种产生艾里高斯涡旋光束的装置 |
CN106560738A (zh) * | 2016-06-02 | 2017-04-12 | 河南科技大学 | 一种完美ig涡旋光束的产生装置及产生方法 |
Non-Patent Citations (2)
Title |
---|
Optimal focusing of a beam in a ring vortex;Arrizon, V.et al;《OPTICS COMMUNICATIONS》;20151201;第356卷;全文 * |
完美涡旋光束的产生及其空间自由调控技术;李新忠等;《光学学报》;20161214;第36卷(第10期);全文 * |
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Application publication date: 20170707 Assignee: Luoyang pingconvex Technology Co.,Ltd. Assignor: HENAN University OF SCIENCE AND TECHNOLOGY Contract record no.: X2021980013091 Denomination of invention: A design method of annular vortex array mask with controllable vortex number Granted publication date: 20200707 License type: Exclusive License Record date: 20211125 |
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