CN106929798A - A kind of optical coating takes off depositing process - Google Patents
A kind of optical coating takes off depositing process Download PDFInfo
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- CN106929798A CN106929798A CN201710216595.8A CN201710216595A CN106929798A CN 106929798 A CN106929798 A CN 106929798A CN 201710216595 A CN201710216595 A CN 201710216595A CN 106929798 A CN106929798 A CN 106929798A
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- plating
- product
- coating
- depositing process
- machine
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
Depositing process is taken off the invention discloses a kind of optical coating, the product before plated film is blocked by screen printed pattern, being blocked using characteristic ink or glue need to take off the place of plating, by S1：The design and half tone of shielding patterns make；S2：Printing；S3：Dry solidification；S4：Plating；S5：Cleaning, product after plated film is through over cleaning so as to obtain taking off the effect of plating, implementation method is more simple and easy to do compared with traditional withdrawal plating, from the later stage process problem of decoating liquid, danger during reduction strip to operator's health, it is more environment-friendly and safer, relative to traditional withdrawal plating, it is obtained in that more accurate strip effect pattern or word, allow production to obtain low cost, low energy consumption, yield high, high yield, the effect of safety and environmental protection because of the technique, manufacturing enterprise and consumer demand are met with production at a high speed, stable.
Description
Technical field
The present invention relates to optics field of electroplating, specially a kind of optical coating takes off depositing process.
Background technology
With the continuous improvement of the level of consumption, outward appearance dazzles beautiful commodity into increasing family, consumer to mobile phone,
Panel computer, air-conditioning, small household appliances, cosmetics, the consumption demand also more and more higher of individual character wearing product, by institute in the market
The IT product of circulation, household appliances, cosmetics, wearing product are related to electroplating technology mostly, and when electroplating technology is used product
Part needs to take off plating to carry out feature transformation or sign, therefore it is essential production link to take off depositing process.Traditional takes off
Depositing process need by specialty take off plating machine, specific allotment take off plating solution and take off waste electroplating treatment etc. equipment and flow, own in the industry
Taking off plating liquid medicine has very strong corrosivity, and certain pollution is produced in construction environment, and danger, cost are also brought to artificial operation
High, pollution weight, construction risk and take off and most easily cause product secondary injury during plating, take off precise pattern and word is also difficult
Extremely.Only change, reform existing production Technology, allow production to obtain low cost, low energy consumption, Gao Liang because of the technique
Rate, high yield, the effect of safety and environmental protection, manufacturing enterprise and consumer demand are met with production at a high speed, stable.
The content of the invention
Depositing process is taken off it is an object of the invention to provide a kind of optical coating, with asking for solving to propose in above-mentioned background technology
Topic.
To achieve the above object, the present invention provides following technical scheme：A kind of optical coating takes off depositing process, including following step
Suddenly：
S1：Design shielding patterns simultaneously make half tone：It is designed using CAD, COREIDRAW software, then carries out pattern
Output and the film are made, then film pattern is developed on half tone, and the temperature of development is 25-30 DEG C, and developing time is 25-
35mm；
S2：Printing：Printing machine is debugged, half tone has been arranged on fixed on printing machine screen frame arm, then fallen characteristic ink
Enter on half tone and uniform application, then non-electroplated product is placed on print station, using printing machine by the shielding patterns on half tone
It is printed on non-electroplated product；
S3：Dry solidification：Drying plant is debugged, the non-electroplated product that will be printed is put into drying plant and is dried
It is dry, product is solidified, baking drying time is 6-8 minutes, and baking drying temperature is 60-100 DEG C；
S4：Plating：Coating machine is debugged, coating materials has been put into coating machine, non-electroplated product has then been fixed on coating machine
On, electroplating processes are carried out to non-electroplated product using coating machine；
S5：Cleaning：Product is put into clear water cleaning, scavenging period is 15-20min, and ink is cleaned, you can obtain strip and produce
Product.
Preferably, the non-electroplated product is PC plate, PET sheet, circuit board or glass.
Preferably, the plating mode for being used in the step S4 is optical coating, vacuum coating or optics magnetic control sputtering plating.
Preferably, the characteristic ink is water-based ink or water soluble glue, the model ML- of water-based ink
HS-KB150C, and the main component of water-based ink is：The glycol methyl ether of bis- dipropyls of modified polypropene acid resin 49%-58% two
22-29% and deionized water 20-28%.
Preferably, the coating machine is 1300 type optical electron rifle coating machines, and the line of coating machine is 5.0, and voltage is height
Pressure 85 is pacified, and described membrane material is titanium dioxide and silica, and described printing machine is 3045 type printing machines.
Compared with prior art, the beneficial effects of the invention are as follows：The present invention program is simple, with low cost, implementation method with
Traditional withdrawal plating from the later stage process problem of decoating liquid, is reduced during strip to operator compared to more simple and easy to do
The danger of member's health, it is more environment-friendly and safer, relative to traditional withdrawal plating, it is obtained in that more accurate strip effect pattern or text
Word.
Specific embodiment
The technical scheme in the embodiment of the present invention will be clearly and completely described below, it is clear that described implementation
Example is only a part of embodiment of the invention, rather than whole embodiments.Based on the embodiment in the present invention, this area is common
The every other embodiment that technical staff is obtained under the premise of creative work is not made, belongs to the model of present invention protection
Enclose.
Embodiment one
The present invention provides a kind of technical scheme：A kind of optical coating takes off depositing process, comprises the following steps：
S1：Design shielding patterns simultaneously make half tone：It is designed using CAD, COREIDRAW software, then carries out pattern
Output and the film are made, then film pattern is developed on half tone, and the temperature of development is 27 DEG C, and developing time is 30mm；
S2：Printing：Printing machine is debugged, half tone has been arranged on fixed on printing machine screen frame arm, then fallen characteristic ink
Enter on half tone and uniform application, then non-electroplated product is placed on print station, using printing machine by the shielding patterns on half tone
It is printed on non-electroplated product；
S3：Dry solidification：Drying plant is debugged, the non-electroplated product that will be printed is put into drying plant and is dried
It is dry, product is solidified, baking drying time is 6 minutes, and baking drying temperature is 70 DEG C；
S4：Plating：Coating machine is debugged, coating materials has been put into coating machine, non-electroplated product has then been fixed on coating machine
On, electroplating processes are carried out to non-electroplated product using coating machine；
S5：Cleaning：Product is put into clear water cleaning, scavenging period is 18min, and ink is cleaned, you can obtain strip product.
Wherein, non-electroplated product is PC plate, PET sheet, circuit board or glass, and the plating mode used in step S4 is optics
Plated film, vacuum coating or optics magnetic control sputtering plating, characteristic ink are water-based ink or water soluble glue, the type of water-based ink
Number it is ML-HS-KB150C, and the main component of water-based ink is：Modified polypropene acid resin 53%, the glycol first of two dipropyl two
Ether 25% and deionized water 22%, coating machine are 1300 type optical electron rifle coating machines, and the line of coating machine is 5.0, and voltage is
High pressure 85 is pacified, and described membrane material is titanium dioxide and silica, and described printing machine is 3045 type printing machines.
Specific strip parameter and result are as shown in table 1：
The withdrawal plating parameter of table 1 and test result
Embodiment two
The present invention provides a kind of technical scheme：A kind of optical coating takes off depositing process, comprises the following steps：
S1：Design shielding patterns simultaneously make half tone：It is designed using CAD, COREIDRAW software, then carries out pattern
Output and the film are made, then film pattern is developed on half tone, and the temperature of development is 27 DEG C, and developing time is 30mm；
S2：Printing：Printing machine is debugged, half tone has been arranged on fixed on printing machine screen frame arm, then fallen characteristic ink
Enter on half tone and uniform application, then non-electroplated product is placed on print station, using printing machine by the shielding patterns on half tone
It is printed on non-electroplated product；
S3：Dry solidification：Drying plant is debugged, the non-electroplated product that will be printed is put into drying plant and is dried
It is dry, product is solidified, baking drying time is 7 minutes, and baking drying temperature is 80 DEG C；
S4：Plating：Coating machine is debugged, coating materials has been put into coating machine, non-electroplated product has then been fixed on coating machine
On, electroplating processes are carried out to non-electroplated product using coating machine；
S5：Cleaning：Product is put into clear water cleaning, scavenging period is 18min, and ink is cleaned, you can obtain strip product.
Wherein, non-electroplated product is PC plate, PET sheet, circuit board or glass, and the plating mode used in step S4 is optics
Plated film, vacuum coating or optics magnetic control sputtering plating, characteristic ink are water-based ink or water soluble glue, the type of water-based ink
Number it is ML-HS-KB150C, and the main component of water-based ink is：Modified polypropene acid resin 53%, the glycol first of two dipropyl two
Ether 25% and deionized water 22%, coating machine are 1300 type optical electron rifle coating machines, and the line of coating machine is 5.0, and voltage is
High pressure 85 is pacified, and described membrane material is titanium dioxide and silica, and described printing machine is 3045 type printing machines.
Specific strip parameter and result are as shown in table 2：
The withdrawal plating parameter of table 2 and test result
Embodiment three
The present invention provides a kind of technical scheme：A kind of optical coating takes off depositing process, comprises the following steps：
S1：Design shielding patterns simultaneously make half tone：It is designed using CAD, COREIDRAW software, then carries out pattern
Output and the film are made, then film pattern is developed on half tone, and the temperature of development is 27 DEG C, and developing time is 30mm；
S2：Printing：Printing machine is debugged, half tone has been arranged on fixed on printing machine screen frame arm, then fallen characteristic ink
Enter on half tone and uniform application, then non-electroplated product is placed on print station, using printing machine by the shielding patterns on half tone
It is printed on non-electroplated product；
S3：Dry solidification：Drying plant is debugged, the non-electroplated product that will be printed is put into drying plant and is dried
It is dry, product is solidified, baking drying time is 7 minutes, and baking drying temperature is 80 DEG C；
S4：Plating：Coating machine is debugged, coating materials has been put into coating machine, non-electroplated product has then been fixed on coating machine
On, electroplating processes are carried out to non-electroplated product using coating machine；
S5：Cleaning：Product is put into clear water cleaning, scavenging period is 18min, and ink is cleaned, you can obtain strip product.
Wherein, non-electroplated product is PC plate, PET sheet, circuit board or glass, and the plating mode used in step S4 is optics
Plated film, vacuum coating or optics magnetic control sputtering plating, characteristic ink are water-based ink or water soluble glue, the type of water-based ink
Number it is ML-HS-KB150C, and the main component of water-based ink is：Modified polypropene acid resin 53%, the glycol first of two dipropyl two
Ether 25% and deionized water 22%, coating machine are 1300 type optical electron rifle coating machines, and the line of coating machine is 5.0, and voltage is
High pressure 85 is pacified, and described membrane material is titanium dioxide and silica, and described printing machine is 3045 type printing machines.
Specific strip parameter and result are as shown in table 3：
The withdrawal plating parameter of table 3 and test result
Result by above-mentioned three groups of embodiments with reference to above-mentioned table 1, table 2 and table 3 shows, compared with common strip scheme,
The present invention is more environmentally-friendly, is conducive to protecting the safety and environmental protection of strip operating personnel, and coating stripping technology method of the invention exists
Baking drying time is 6 minutes, and when baking drying temperature is 70 DEG C, PC plate and circuit board are obtained in that clear flawless strip
Pattern, coating stripping technology method of the invention is 7 minutes in baking drying time, and when baking drying temperature is 80 DEG C, PET sheet can
Clear flawless strip pattern is obtained, coating stripping technology method of the invention is 8 minutes in baking drying time, and baking dries temperature
Spend for 90 DEG C when, glass is obtained in that clear flawless strip pattern.
Although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
Understanding can carry out various changes, modification, replacement to these embodiments without departing from the principles and spirit of the present invention
And modification, the scope of the present invention be defined by the appended.
Claims (5)
1. a kind of optical coating takes off depositing process, it is characterised in that comprise the following steps：
S1：Design shielding patterns simultaneously make half tone：It is designed using CAD, COREIDRAW software, then carries out pattern output
Made with the film, then film pattern is developed on half tone, the temperature of development is 25-30 DEG C, and developing time is 25-
35mm；
S2：Printing：Printing machine is debugged, half tone has been arranged on fixed on printing machine screen frame arm, characteristic ink has then been poured into net
In version and uniform application, then non-electroplated product is placed on print station, is printed the shielding patterns on half tone using printing machine
In on non-electroplated product；
S3：Dry solidification：Drying plant is debugged, the non-electroplated product that will be printed is put into drying plant is dried, right
Product is solidified, and baking drying time is 6-8 minutes, and baking drying temperature is 60-100 DEG C；
S4：Plating：Coating machine is debugged, coating materials has been put into coating machine, then non-electroplated product has been fixed on coating machine, made
Electroplating processes are carried out to non-electroplated product with coating machine；
S5：Cleaning：Product is put into clear water cleaning, scavenging period is 15-20min, and ink is cleaned, you can obtain strip product.
2. a kind of optical coating according to claim 1 takes off depositing process, it is characterised in that the non-electroplated product is PC
Plate, PET sheet, circuit board or glass.
3. a kind of optical coating according to claim 1 takes off depositing process, it is characterised in that the electricity used in the step S4
Plating mode is optical coating, vacuum coating or optics magnetic control sputtering plating.
4. a kind of optical coating according to claim 1 takes off depositing process, it is characterised in that the characteristic ink is water solubility
Ink or water soluble glue, the model ML-HS-KB150C of water-based ink, and the main component of water-based ink are：Change
Property polyacrylic resin 49%-58%, the glycol methyl ether 22-29% of two dipropyl two and deionized water 20-28%.
5. a kind of optical coating according to claim 1 takes off depositing process, it is characterised in that：The coating machine is 1300 type light
Electron gun coating machine is learned, the line of coating machine is 5.0, and voltage is pacified for high pressure 85, described membrane material is titanium dioxide and dioxy
SiClx, described printing machine is 3045 type printing machines.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710216595.8A CN106929798A (en) | 2017-04-05 | 2017-04-05 | A kind of optical coating takes off depositing process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710216595.8A CN106929798A (en) | 2017-04-05 | 2017-04-05 | A kind of optical coating takes off depositing process |
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| CN106929798A true CN106929798A (en) | 2017-07-07 |
Family
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| CN201710216595.8A Pending CN106929798A (en) | 2017-04-05 | 2017-04-05 | A kind of optical coating takes off depositing process |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109423607A (en) * | 2017-09-01 | 2019-03-05 | 福建省辉锐电子技术有限公司 | A method of coated cover-plate is prepared using continuous magnetron sputtering sedimentation |
| CN110819957A (en) * | 2019-11-26 | 2020-02-21 | 天津北玻玻璃工业技术有限公司 | Method for producing coated pattern glass |
| CN111778483A (en) * | 2019-04-04 | 2020-10-16 | 北京小米移动软件有限公司 | Coating treatment method, substrate and electronic equipment |
| CN113025140A (en) * | 2021-03-09 | 2021-06-25 | 长沙蓝思新材料有限公司 | Vacuum electroplating thermosetting dissolving type protective oil and vacuum electroplating process |
| CN113320305A (en) * | 2020-02-28 | 2021-08-31 | 深圳市万普拉斯科技有限公司 | Logo making method and terminal |
| CN113651544A (en) * | 2021-08-20 | 2021-11-16 | 杭州美迪凯光电科技股份有限公司 | Strip-shaped optical glass multi-surface graphical optical coating processing technology |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109423607A (en) * | 2017-09-01 | 2019-03-05 | 福建省辉锐电子技术有限公司 | A method of coated cover-plate is prepared using continuous magnetron sputtering sedimentation |
| CN111778483A (en) * | 2019-04-04 | 2020-10-16 | 北京小米移动软件有限公司 | Coating treatment method, substrate and electronic equipment |
| CN111778483B (en) * | 2019-04-04 | 2023-05-09 | 北京小米移动软件有限公司 | Coating processing method, substrate and electronic equipment |
| CN110819957A (en) * | 2019-11-26 | 2020-02-21 | 天津北玻玻璃工业技术有限公司 | Method for producing coated pattern glass |
| CN110819957B (en) * | 2019-11-26 | 2021-12-14 | 天津北玻玻璃工业技术有限公司 | Method for producing coated pattern glass |
| CN113320305A (en) * | 2020-02-28 | 2021-08-31 | 深圳市万普拉斯科技有限公司 | Logo making method and terminal |
| CN113025140A (en) * | 2021-03-09 | 2021-06-25 | 长沙蓝思新材料有限公司 | Vacuum electroplating thermosetting dissolving type protective oil and vacuum electroplating process |
| CN113651544A (en) * | 2021-08-20 | 2021-11-16 | 杭州美迪凯光电科技股份有限公司 | Strip-shaped optical glass multi-surface graphical optical coating processing technology |
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