CN113320305A - Logo making method and terminal - Google Patents
Logo making method and terminal Download PDFInfo
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- CN113320305A CN113320305A CN202010134749.0A CN202010134749A CN113320305A CN 113320305 A CN113320305 A CN 113320305A CN 202010134749 A CN202010134749 A CN 202010134749A CN 113320305 A CN113320305 A CN 113320305A
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- logo
- layer
- hydrosol
- base material
- screen printing
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- 238000000034 method Methods 0.000 title description 34
- 239000010410 layer Substances 0.000 claims abstract description 102
- 239000000463 material Substances 0.000 claims abstract description 59
- 238000007650 screen-printing Methods 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 38
- 239000012459 cleaning agent Substances 0.000 claims abstract description 34
- 239000011247 coating layer Substances 0.000 claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 claims abstract description 28
- 239000002994 raw material Substances 0.000 claims abstract description 9
- 239000011521 glass Substances 0.000 claims description 70
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 48
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 45
- 150000002500 ions Chemical class 0.000 claims description 26
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 23
- 239000000377 silicon dioxide Substances 0.000 claims description 23
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 19
- 239000001301 oxygen Substances 0.000 claims description 19
- 229910052760 oxygen Inorganic materials 0.000 claims description 19
- 229910052786 argon Inorganic materials 0.000 claims description 18
- 229910052681 coesite Inorganic materials 0.000 claims description 14
- 229910052906 cristobalite Inorganic materials 0.000 claims description 14
- 229910052682 stishovite Inorganic materials 0.000 claims description 14
- 229910052905 tridymite Inorganic materials 0.000 claims description 14
- 238000001035 drying Methods 0.000 claims description 12
- 229910009815 Ti3O5 Inorganic materials 0.000 claims description 10
- 238000007639 printing Methods 0.000 claims description 10
- 239000004408 titanium dioxide Substances 0.000 claims description 10
- 235000012239 silicon dioxide Nutrition 0.000 claims description 9
- 229910000831 Steel Inorganic materials 0.000 claims description 8
- 239000010959 steel Substances 0.000 claims description 8
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000002585 base Substances 0.000 abstract description 17
- 239000002253 acid Substances 0.000 abstract description 8
- 239000003513 alkali Substances 0.000 abstract description 7
- 238000002360 preparation method Methods 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 description 37
- 238000000576 coating method Methods 0.000 description 27
- 239000011248 coating agent Substances 0.000 description 23
- 229920002799 BoPET Polymers 0.000 description 15
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 15
- 239000012528 membrane Substances 0.000 description 13
- 239000007888 film coating Substances 0.000 description 12
- 238000009501 film coating Methods 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 7
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 230000007935 neutral effect Effects 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000012216 screening Methods 0.000 description 4
- 238000007689 inspection Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000007747 plating Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000010023 transfer printing Methods 0.000 description 2
- 150000001447 alkali salts Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011143 downstream manufacturing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000008131 herbal destillate Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/12—Stencil printing; Silk-screen printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/26—Printing on other surfaces than ordinary paper
- B41M1/34—Printing on other surfaces than ordinary paper on glass or ceramic surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/0027—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using protective coatings or layers by lamination or by fusion of the coatings or layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
Abstract
The invention relates to a Logo manufacturing method and a terminal. The Logo manufacturing method comprises the following steps: providing a substrate; forming a hydrosol layer and a hollowed Logo pattern on a base material by using hydrosol as a raw material in a screen printing mode; performing vacuum coating on the base material from one side of the base material on which the hydrosol layer is formed to form a coating layer, wherein the coating layer covers the hollowed Logo pattern and the hydrosol layer; and removing the hydrosol layer on the base material by adopting a cleaning agent to obtain the Logo. The Logo prepared by the Logo preparation method is rich in color, high-temperature resistant and acid and alkali resistant.
Description
Technical Field
The invention relates to a Logo manufacturing method and a terminal.
Background
In the past, the 3D glass of the mobile phone forms Logo by adopting Logo thermal transfer printing, mirror silver screen printing and other modes. The Logo obtained by adopting a screen printing mirror silver mode is mainly mirror silver, and the color is single. And the mirror surface silver has no acid and alkali resistance, and has great influence on the yield of upstream and downstream processes. The Logo obtained by the thermal transfer printing technology is rich in color but not high in temperature resistance.
Disclosure of Invention
Therefore, there is a need for a method for producing a Logo that can enrich the color of the Logo, resist high temperature, and resist acid and alkali.
In addition, a terminal comprising the Logo is also provided.
A Logo manufacturing method comprises the following steps:
providing a substrate;
forming a hydrosol layer and a hollowed Logo pattern on the base material by using hydrosol as a raw material and adopting a screen printing mode;
performing vacuum coating on the base material from one side of the base material on which the hydrosol layer is formed to form a coating layer, wherein the coating layer covers the hollowed Logo pattern and the hydrosol layer; and
and removing the hydrosol layer on the base material by adopting a cleaning agent to obtain the Logo.
In one embodiment, the step of forming the hydrosol layer and the hollowed Logo pattern on the substrate by using hydrosol as a raw material and adopting a screen printing mode comprises the following steps:
printing the hydrosol on the base material by adopting a screen printing mode to form a first layer and the hollowed Logo pattern;
and continuously printing the hydrosol on the first layer by adopting a screen printing mode to form a second layer to obtain the hydrosol layer, wherein the projection of the second layer on the base material is superposed with the projection of the first layer on the base material.
In one embodiment, in the step of printing the hydrosol on the substrate by using a screen printing method, the screen used is a steel wire mesh screen, the tension of the steel wire mesh screen is 5N-8N, and the mesh number is 280-350.
In one embodiment, after the step of forming the hydrosol layer and the hollowed Logo pattern on the substrate by adopting a screen printing mode, the method further comprises a drying step, wherein the drying temperature is 90-150 ℃, and the drying time is 1-30 min.
In one embodiment, the thickness of the hydrosol layer is 12-15 μm.
In one embodiment, the pH value of the cleaning agent is 7-9.
In one embodiment, the step of vacuum coating the substrate from the side of the substrate on which the hydrosol layer is formed further comprises a step of ion cleaning the substrate on which the hydrosol layer is formed.
In one embodiment, the process parameters in the step of performing ion cleaning on the substrate on which the hydrosol layer is formed are as follows: the degree of vacuum was 5.0X 10-5torr, voltage is 100V-110V, anode current is 5A-7A, and argon flow is 20 sccm-30 sccm.
In one embodiment, the step of vacuum coating the substrate from the side of the substrate on which the hydrosol layer is formed comprises: sequentially with SiO2、Ti3O5、SiO2、Ti3O5And SiO2Forming a first silicon dioxide film, a first titanium dioxide film, a second silicon dioxide film, a second titanium dioxide film and a third silicon dioxide film on one side of the substrate on which the hydrosol layer is formed to obtain the coating layer; wherein, in the step of forming the first silicon oxide film, the second silicon oxide film and the third silicon oxide film, a degree of vacuum is 2.0 × 10-5torr～8.0×10-5torr, in the step of forming the first titanium dioxide film and the second titanium dioxide film, the degree of vacuum is 2.0 x 10- 5torr～8.0×10-5torr, the ion voltage is 100V-110V, the anode current is 5A-7A, the argon flow is 10 sccm-15 sccm, and the oxygen flow is 7 sccm-12 sccm.
In one embodiment, the substrate is selected from one of glass, film sheet, ceramic, and plastic.
In one embodiment, the temperature in the step of removing the hydrosol layer on the substrate by using the cleaning agent is 60-100 ℃.
In one embodiment, after the step of forming the hydrosol layer and the hollowed Logo pattern on the substrate by screen printing, and before the step of vacuum-coating the substrate from the side of the substrate on which the hydrosol layer is formed, the method further includes: and pasting a film on the base material to shield the area, on which the hydrosol layer and the hollowed Logo pattern are not formed, of the base material.
A terminal comprises a shell, wherein the shell comprises the Logo prepared by the Logo preparation method.
According to the manufacturing method of the Logo, the Logo is hollowed out by silk-screen printing of the hydrosol layer on the surface of the base material. And then carrying out vacuum coating on the base material, and covering the film layer on the part of the silk-screen hydrosol and the hollowed Logo part. And finally, removing the hydrosol layer by using a cleaning agent to obtain the Logo coating layer. Compared with a screen printing mode of mirror silver, the color of the obtained Logo can be enriched by adjusting the film material used in vacuum coating. And the proof acid and alkali and high temperature resistance of the Logo formed by adopting a vacuum coating mode are better. Therefore, the Logo manufacturing method can enable the obtained Logo to be rich in color, high-temperature resistant and acid and alkali resistant.
Drawings
Fig. 1 is a schematic process flow diagram of a Logo manufacturing method according to an embodiment.
Detailed Description
In order that the invention may be more fully understood, reference will now be made to the following description taken in conjunction with the accompanying drawings. The detailed description sets forth the preferred embodiments of the invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
Referring to fig. 1, a Logo manufacturing method according to an embodiment includes the following steps:
step S110: a substrate is provided.
Specifically, the substrate is selected from one of glass, film sheet, ceramic and plastic. In one embodiment, the substrate is glass.
Step S120: the method is characterized in that hydrosol is used as a raw material, and a silk-screen printing mode is adopted to form a hydrosol layer and a hollowed Logo pattern on a base material.
Specifically, the hydrosol is selected from one of Japanese Seiko hydrosol, Tao protective ink and Sanxin Meitai hydrosol.
The hydrosol is not deformed and volatilized at high temperature (below 200 ℃), so that the hydrosol can resist the high temperature and ion bombardment conditions in the subsequent vacuum coating process. The hydrosol also has the advantage of being easily cleaned by a weakly alkaline cleaning agent, so that the hydrosol is easily removed in the subsequent steps.
In one embodiment, the proportion of the hydrosol is further optimized, so that the hydrosol is more fully contacted with a screen printing plate used in the screen printing process, the precision of the formed hollow Logo coating is higher, and the Logo coating layer with higher precision is conveniently formed in a vacuum coating mode subsequently. In one embodiment, the thickness of the hydrosol layer is 12 μm to 15 μm.
And in the step of printing the hydrosol on the base material by adopting a screen printing mode, the used screen printing plate is a steel screen printing plate. Specifically, the tension of the steel wire screen plate is 5N-8N, and the mesh number is 280-350 meshes. The steel silk screen plate has excellent plane stability, the size of the manufactured graph is stable, and a hollow Logo pattern with high precision can be formed on a base material by the steel silk screen plate in the embodiment.
Specifically, step S120 includes:
step S122: and printing hydrosol on the base material by adopting a screen printing mode to form a first layer and a hollowed Logo pattern.
Step S124: and continuously printing the hydrosol on the first layer by adopting a screen printing mode to form a second layer to obtain the hydrosol layer, wherein the projection of the second layer on the base material is superposed with the projection of the first layer on the base material.
After step S122 and before step S124, a drying step is further included. The drying temperature is 90-150 ℃, and the drying time is 1-30 min.
After step S124 and before step S130, a drying step is further included. The drying temperature is 90-150 ℃. The drying time is 1 min-30 min.
The Logo patterns are hollowed out in a mode of silk-screen two-layer hydrosol, so that no hollowed-out point can be guaranteed, and the phenomenon that the hydrosol is printed unevenly in the process of one-time printing is avoided, so that part of the coating layer is prevented from being formed at the hollowed-out point of the hydrosol layer in the subsequent vacuum coating process. Therefore, in the embodiment, a mode of silk-screening two layers of hydrosols is adopted, so that a Logo coating layer can be conveniently formed on the base material in a vacuum coating mode subsequently.
Step S130: and carrying out vacuum coating on the base material from the side of the base material on which the hydrosol layer is formed to form a coating layer, wherein the coating layer covers the hollowed Logo pattern and the hydrosol layer.
Specifically, the method further comprises the step of cleaning the substrate before the step of vacuum coating the substrate from the side of the substrate on which the hydrosol layer is formed. Specifically, the step of cleaning the substrate comprises: under vacuum of 5.0X 10-5And carrying out ion cleaning on the substrate under the condition of torr. The voltage of the ion cleaning is controlled to be 100V-110V, the anode current is 5A-7A, the argon flow is 20 sccm-30 sccm, and the cleaning time is 10 min.
Further, before the step of performing the ion cleaning on the substrate, after the step S120, the method further includes: and (3) pasting a film on the base material to shield the area on the base material where the hydrosol layer and the hollowed Logo pattern are not formed. By pasting the film on the substrate, the region which is not provided with the water-soluble glue layer and the hollowed Logo pattern on the substrate can be protected from forming a coating film layer in the subsequent vacuum coating process. In one embodiment, in the step of laminating the substrate, the film used is a PET film (polyester film).
In the actual production process, before the step of pasting the film on the substrate, the method further comprises the step of cleaning the substrate by using neutral cleaning liquid so as to ensure that the hollowed-out Logo pattern area is clean. In addition, neutral cleaning liquid cannot damage the hydrosol layer.
In one embodiment, step S130 includes: sequentially with SiO2、Ti3O5、SiO2、Ti3O5And SiO2And forming a first silicon dioxide film, a first titanium dioxide film, a second silicon dioxide film, a second titanium dioxide film and a third silicon dioxide film on one side of the substrate on which the hydrosol layer is formed to obtain the coating layer. Specifically, the vacuum degree in the vacuum coating process is 2.0 × 10-5torr～8.0×10-5torr. Heating is not carried out in the vacuum coating process.
Specifically, when the film material is SiO2Meanwhile, the vacuum coating conditions further include: and (4) normally coating without filling oxygen and argon. When the coating material is TiO plated2Meanwhile, the vacuum coating conditions further include: adding ions to assist in coating. Specifically, the ion voltage is 100V-110V, the anode current is 5A-7A, the argon flow is 10 sccm-15 sccm, and the oxygen flow is 7 sccm-12 sccm.
In one embodiment, SiO deposition is used2、TiO2、SiO2、TiO2And SiO2The method (2) can obtain a blue coating film. It is understood that in other embodiments, other combinations of coatings may be used to adjust the color of the resulting coating.
The coating layer formed by adopting the vacuum coating mode not only can adjust the color of the coating layer by adjusting the composition of the coating layer, thereby enriching the color of the finally obtained Logo coating layer, but also has stable performance, such as good hardness, high and low temperature resistance, acid, alkali, salt and the like resistance, thereby stabilizing the performance of the finally obtained Logo coating layer.
The traditional coating technology can obtain a coating layer with gorgeous color and stable performance, but the traditional coating technology is applied to a single small area part of the whole surface to form the coating layer, so that the coating technology has difficulty. In the embodiment, the hydrosol layer is formed by adopting a hydrosol silk-screen method, the Logo patterns are hollowed out, and then vacuum coating is performed, so that the difficulty of forming a coating layer in a single small area is overcome.
Step S140: and removing the hydrosol layer on the base material by adopting a cleaning agent to obtain the Logo.
Wherein the pH value of the cleaning agent is 7-9.
Specifically, the cleaning agent is at least one selected from a mountain wind cleaning agent, a zeekang cleaning agent and a water source cleaning agent. The wind cleaning agent for mountain is produced by environmental protection technology of mountain company Limited. The Zikang cleaning agent is the cleaning agent produced by Shenzhen Zekang science and technology Limited. The water thought cleaning agent is the cleaning agent produced by Shenzhen water thought science and technology Limited. The cleaning agent can remove the hydrosol layer on the base material and simultaneously remove the coating layer formed on the hydrosol layer, thereby obtaining the Logo of the coating layer. In addition, the cleaning agent is weak in alkalinity, and has small damage to a finally obtained coating layer Logo.
Further, the step of removing the hydrosol layer on the substrate by using the cleaning agent further comprises a heating step. In one embodiment, the heating temperature is 60 ℃ to 100 ℃. Further, the heating temperature was 80 ℃. Heating when getting rid of the hydrosol on the substrate can improve the effect of getting rid of the hydrosol layer of cleaner, and improves and get rid of efficiency.
Specifically, in actual production, the step of removing the hydrosol layer on the substrate is performed on a deplating line. The temperature of the deplating line is set to be 60-100 ℃, the flow rate of the base material is 1m/s, and the pH of the deplating liquid is 7-9. The deplating liquid is the cleaning agent.
In the embodiment, the specific hydrosol is adopted to be silkscreened on the base material, so that the hydrosol can be easily removed through the cleaning agent, and in the process of removing the hydrosol layer by the cleaning agent, the coating layer covered on the hydrosol layer can be removed, and the damage to the Logo coating layer is small.
The Logo manufacturing method at least has the following advantages:
(1) according to the manufacturing method of the Logo, the Logo is hollowed out by silk-screen printing of the hydrosol layer on the surface of the base material. And then carrying out vacuum coating on the base material, and covering the film layer on the part of the silk-screen hydrosol and the hollowed Logo part. And finally, removing the hydrosol layer by using a cleaning agent to obtain the Logo coating layer.
(2) Compared with a screen printing mirror silver mode, the Logo manufacturing method has the advantage that the color of the obtained Logo can be enriched by adjusting the film material used in vacuum coating. And the proof acid and alkali and high temperature resistance of the Logo formed by adopting a vacuum coating mode are better.
(3) According to the manufacturing method of the Logo, the hydrosol layer is firstly silkscreened on the surface of the base material, the hydrosol is good in high-temperature resistance and is easy to remove through the cleaning agent, so that the hydrosol layer cannot be damaged in the subsequent vacuum coating process, and after the Logo is covered by the vacuum coating, the hydrosol layer can be removed through the cleaning agent, the cleaning agent has small damage to the film layer in the Logo area, and the integrity of the film layer in the Logo area is kept.
(4) The Logo manufacturing method is simple in process and easy for industrial production.
In other embodiments, the present application further provides a terminal capable of at least implementing a multimedia function, where the terminal includes a housing, and the housing includes a Logo manufactured by the Logo manufacturing method according to the above embodiment.
The following are specific examples:
the experimental equipment used in examples 1 to 3 was as follows: horizontal cleaning line, 5cm x 5cm magnet, combined 2700 coating machine, automatic coating cutting machine, combined 1650AF coating machine, screen printing machine and oven.
The experimental samples used in this example are as follows: 100 kang ning third generation glass mobile phone back shell and Ti3O5Film material, SiO2Membrane material, Japanese fine hydrosol, neutral cleaning liquid and cleaning agent.
Example 1
The Logo of this embodiment is produced by the following steps:
hollow Logo pattern of silk screen printing
(1) The method comprises the steps of taking hydrosol produced by Japanese fine works as a raw material, selecting 350 meshes of screen printing plates and 7N of screen printing plate tension, and placing the screen printing plates on a screen printing machine for screen printing of 3d glass. The Logo area was 1cm x 4cm in size and the first hydrosol layer was set to a 2cm x 6cm hydrosol area.
(2) And (3) placing the silk-screened 3d glass in a horizontal tunnel furnace at 90 ℃, baking for 1min to obtain a first hydrosol layer, taking out, and cooling to the normal temperature.
(3) And (5) silk-screening the hydrosol for the second time at the same position of the 3d glass by taking the number of the screen meshes as 350 meshes and the tension of the screen as 7N.
(4) And (5) putting the 3d glass subjected to the second silk-screen printing into an oven at 150 ℃ for baking for 30min to form a second hydrosol layer, taking out, and cooling to the normal temperature.
(5) And cleaning the 3d glass by using neutral cleaning liquid on a horizontal cleaning line to obtain the hollow Logo clean glass, and then sticking a PET film by using a film sticking machine to ensure that the PET film is stuck to the area of the glass, which is not provided with the hollow Logo pattern and the hydrosol layer, at the Logo position and the position of the PET film is stuck to the hydrosol layer by 0.5 cm.
(II) vacuum coating
(1) Taking four strips of glass coated with a film, taking 6 pieces of glass in each strip, placing the glass on four umbrella stands of a film coating machine along the axial direction of the umbrella stands with a PET film facing upwards, and fixing the glass on the PET film by using magnets.
(2) The coating machine is vacuumized at 5.0 x 10-5And (3) carrying out ion cleaning under the vacuum condition of torr, wherein the voltage of the ion cleaning is controlled to be 100V, the anode current is 5A, the argon flow is 20sccm, and the cleaning time is 10 min.
(3) The vacuum degree reaches 2.0 multiplied by 10-5And (4) carrying out vacuum coating when the torr is carried out, and not heating in the coating process. The whole-course APC pressure maintaining is 8.0 multiplied by 10-5torr, firstly, SiO under the condition of not filling oxygen and argon2Forming first SiO on the glass surface as film material2And (3) a membrane. Then with Ti3O5Adding ion assistance to the film material, and settingThe ion-assisted voltage is 100V, the anode current is 5A, the argon flow is 10sccm, the oxygen flow is 7sccm, and the glass is plated with first SiO2Forming a first TiO on one side surface of the film2And (3) a membrane. Then forming a second SiO on the glass surface under the condition of normal film coating without oxygen and argon2And (3) a membrane. Then adding ion assistance, setting the voltage of the ion assistance to be 100V, the anode current to be 5A, the argon flow to be 10sccm and the oxygen flow to be 7sccm, and forming second TiO on the glass2And (3) a membrane. Finally, under the condition of normal coating without oxygen and argon, forming third SiO on the surface of the glass2And (6) film forming to obtain a film coating layer.
(4) And taking out the base material after the film coating is finished and placing the base material in a tray.
(III) removing the hydrosol layer
(1) And tearing off the PET film from the film-coated glass, putting the film-coated glass into a horizontal deplating line, and cleaning, wherein the temperature of the deplating line in the cleaning process is set to be 80 ℃, the moving speed of the glass on the horizontal deplating line is 1m/s, and the pH value of a cleaning agent used in the deplating process is 7, so that the glass with the Logo is obtained.
(2) And taking the deplated glass off a tray for inspection.
Example 2
The Logo of this embodiment is produced by the following steps:
hollow Logo pattern of silk screen printing
(1) The method comprises the steps of taking hydrosol produced by Japanese fine processing as a raw material, selecting 280 meshes of screen printing plates and 5N of screen printing plate tension, and placing the screen printing plates on a screen printing machine for screen printing of 3d glass. The Logo area was 1cm x 4cm in size and the first hydrosol layer was set to a 2cm x 6cm hydrosol area.
(2) And (3) placing the silk-screened 3d glass in a horizontal tunnel furnace at 120 ℃, baking for 5min to obtain a first hydrosol layer, taking out, and cooling to the normal temperature.
(3) And silk-screening the hydrosol for the second time at the same position of the 3d glass by taking the number of the screen meshes as 280 meshes and the tension as 5N.
(4) And (5) putting the 3d glass subjected to the second silk-screen printing into an oven at 150 ℃ for baking for 30min to form a second hydrosol layer, taking out, and cooling to the normal temperature.
(5) And cleaning the 3d glass by using neutral cleaning liquid on a horizontal cleaning line to obtain the hollow Logo clean glass, and then sticking a PET film by using a film sticking machine to ensure that the PET film is stuck to the area of the glass, which is not provided with the hollow Logo pattern and the hydrosol layer, at the Logo position and the position of the PET film is stuck to the hydrosol layer by 0.5 cm.
(II) vacuum coating
(1) Taking four strips of glass coated with the film, taking 6 pieces of glass in each strip, enabling the pet film to face upwards, placing the glass on four umbrella frames of a film coating machine along the axial direction of the umbrella frames, and fixing the glass on the pet film by using magnets.
(2) The coating machine is vacuumized at 5.0 x 10-5And (3) carrying out ion cleaning under the vacuum condition of a torr, wherein the voltage of the ion cleaning is controlled to be 110V, the anode current is 7A, the argon flow is 30sccm, and the cleaning time is 15 min.
(3) The vacuum degree reaches 2.0 multiplied by 10-5And (4) carrying out vacuum coating when the torr is carried out, and not heating in the coating process. The whole-course APC pressure maintaining is 8.0 multiplied by 10-5torr, firstly, SiO under the condition of not filling oxygen and argon2Forming first SiO on the glass surface as film material2And (3) a membrane. Then with Ti3O5Adding ion assist for coating material, setting the voltage of the ion assist to be 110V, the anode current to be 7A, the argon flow to be 15sccm, the oxygen flow to be 12sccm, and plating first SiO on the glass2Forming a first TiO on one side surface of the film2And (3) a membrane. Then forming a second SiO on the glass surface under the condition of normal film coating without oxygen and argon2And (3) a membrane. Adding ion assistance, setting the voltage of the ion assistance to be 105V, the anode current to be 6A, the argon flow to be 12sccm and the oxygen flow to be 10sccm, and forming second TiO on the glass2And (3) a membrane. Finally, under the condition of normal coating without oxygen and argon, forming third SiO on the surface of the glass2And (6) film forming to obtain a film coating layer.
(4) And taking out the base material after the film coating is finished and placing the base material in a tray.
(III) removing the hydrosol layer
(1) And tearing off the PET film from the film-coated glass, putting the film-coated glass into a horizontal deplating line, and cleaning, wherein the temperature of the deplating line in the cleaning process is set to be 80 ℃, the moving speed of the glass on the horizontal deplating line is 1m/s, and the pH value of a cleaning agent used in the deplating process is 9, so that the glass with the Logo is obtained.
(2) And taking the deplated glass off a tray for inspection.
Example 3
The Logo of this embodiment is produced by the following steps:
hollow Logo (I) silk screen printing
(1) The method comprises the steps of taking hydrosol produced by Japanese fine work as a raw material, selecting screen printing plates with the mesh number of 320 meshes and the tension of 6N, and placing the screen printing plates on a screen printing machine for screen printing of 3d glass. The Logo area was 1cm x 4cm in size and the first hydrosol layer was set to a 2cm x 6cm hydrosol area.
(2) And (3) placing the silk-screened 3d glass in a horizontal tunnel furnace at 100 ℃, baking for 15min to obtain a first hydrosol layer, taking out, and cooling to the normal temperature.
(3) And (5) silk-screening the hydrosol for the second time at the same position of the 3d glass by taking the number of the screen meshes as 320 meshes and the tension of the screen as 6N.
(4) And (5) putting the 3d glass subjected to the second silk-screen printing into an oven at 140 ℃ for baking for 30min to form a second hydrosol layer, taking out, and cooling to the normal temperature.
(5) And cleaning the 3d glass by using neutral cleaning liquid on a horizontal cleaning line to obtain the hollow Logo clean glass, and then sticking a PET film by using a film sticking machine to ensure that the PET film is stuck to the area of the glass, which is not provided with the hollow Logo pattern and the hydrosol layer, at the Logo position and the position of the PET film is stuck to the hydrosol layer by 0.5 cm.
(II) vacuum coating
(1) Taking four strips of glass coated with the film, taking 6 pieces of glass in each strip, enabling the pet film to face upwards, placing the glass on four umbrella frames of a film coating machine along the axial direction of the umbrella frames, and fixing the glass on the pet film by using magnets.
(2) The coating machine is vacuumized at 5.0 x 10-5Ion cleaning is carried out under the vacuum condition of torr, the voltage of the ion cleaning is controlled to be 105V, the anode current is 6A, the argon flow is 25sccm, and the cleaning time is 20 min.
(3) The vacuum degree reaches 2.0 multiplied by 10-5And (4) carrying out vacuum coating when the torr is carried out, and not heating in the coating process. Whole process APC pressure maintaining is 8.0 multiplied by 10-5torr, firstly, SiO under the condition of not filling oxygen and argon2Forming first SiO on the glass surface as film material2And (3) a membrane. Then with Ti3O5Adding ion assist for coating material, setting the voltage of the ion assist to be 105V, the anode current to be 6A, the argon flow to be 12sccm, the oxygen flow to be 10sccm, and plating first SiO on the glass2Forming a first TiO on one side surface of the film2And (3) a membrane. Then forming a second SiO on the glass surface under the condition of normal film coating without oxygen and argon2And (3) a membrane. Adding ion assistance, setting the voltage of the ion assistance to be 105V, the anode current to be 6A, the argon flow to be 12sccm and the oxygen flow to be 10sccm, and forming second TiO on the glass2And (3) a membrane. Finally, under the condition of normal coating without oxygen and argon, forming third SiO on the surface of the glass2And (6) film forming to obtain a film coating layer.
(4) And taking out the base material after the film coating is finished and placing the base material in a tray.
(III) removing the hydrosol layer
(1) And tearing off the PET film from the film-coated glass, putting the film-coated glass into a horizontal deplating line, and cleaning, wherein the temperature of the deplating line in the cleaning process is set to be 80 ℃, the moving speed of the glass on the horizontal deplating line is 1m/s, and the pH value of a cleaning agent used in the deplating process is 8, so that the glass with the Logo is obtained.
(2) And taking the deplated glass off a tray for inspection.
It should be noted that the vacuum evaporation coating machines are used in the vacuum coating processes in examples 1 to 3, and other vacuum coating devices such as a vacuum sputtering coating machine can also be used for vacuum coating, which is not described herein again.
Comparative example 1
The Logo of comparative example 1 was prepared similarly to the Logo of example 1, except that: the Logo of comparative example 1 was fabricated without the first step and the third step, and the vacuum coating of the second step was directly performed on the glass.
The substrates fabricated in example 1 and comparative example 1 were tested according to the test methods shown in table 1 below, and the data shown in table 1 below were obtained.
Table 1 table of test data of substrates fabricated in example 1 and comparative example 1
As can be seen from table 1, the substrate treated by the Logo manufacturing method of example 1 has good hardness, good acid and alkali salt resistance, high and low temperature resistance, and stable performance.
It should be noted that the Logo prepared in example 1 is used in the above test, and the performance of the Logo prepared in examples 2 and 3 is equivalent to that of example 1, and the description thereof is omitted.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. A Logo manufacturing method is characterized by comprising the following steps:
providing a substrate;
forming a hydrosol layer and a hollowed Logo pattern on the base material by using hydrosol as a raw material and adopting a screen printing mode;
performing vacuum coating on the base material from one side of the base material on which the hydrosol layer is formed to form a coating layer, wherein the coating layer covers the hollowed Logo pattern and the hydrosol layer; and
and removing the hydrosol layer on the base material by adopting a cleaning agent to obtain the Logo.
2. The Logo production method according to claim 1, wherein the step of forming the hydrosol layer and the hollowed Logo pattern on the substrate by using hydrosol as a raw material and adopting a screen printing mode comprises the following steps:
printing the hydrosol on the base material by adopting a screen printing mode to form a first layer and the hollowed Logo pattern;
and continuously printing the hydrosol on the first layer by adopting a screen printing mode to form a second layer to obtain the hydrosol layer, wherein the projection of the second layer on the base material is superposed with the projection of the first layer on the base material.
3. The Logo production method according to claim 2, wherein in the step of printing the hydrosol on the base material by screen printing, the screen printing plate is a steel wire screen printing plate, the tension of the steel wire screen printing plate is 5N-8N, and the mesh number is 280-350.
4. The Logo manufacturing method according to claim 1, wherein the step of forming the hydrosol layer and the hollowed-out Logo pattern on the substrate by screen printing further comprises a drying step, wherein the drying temperature is 90-150 ℃, and the drying time is 1-30 min.
5. The Logo production method according to any one of claims 1 to 4, wherein the thickness of the hydrosol layer is 12 to 15 μm.
6. The Logo production method according to claim 1, wherein the pH of the cleaning agent is 7 to 9.
7. The Logo production method according to claim 1, wherein the step of vacuum coating the substrate from the side of the substrate on which the hydrosol layer is formed to form a coating layer comprises: sequentially with SiO2、Ti3O5、SiO2、Ti3O5And SiO2Forming a first silicon dioxide film, a first titanium dioxide film, a second silicon dioxide film, a second titanium dioxide film and a third silicon dioxide film on one side of the substrate on which the hydrosol layer is formed to obtain the coating layer; wherein, in the step of forming the first silicon oxide film, the second silicon oxide film and the third silicon oxide film, a degree of vacuum is 2.0 × 10-5torr～8.0×10-5torr, in the step of forming the first titanium dioxide film and the second titanium dioxide film, the degree of vacuum is 2.0 x 10-5torr～8.0×10-5torr, the ion voltage is 100V-110V, the anode current is 5A-7A, the argon flow is 10 sccm-15 sccm, and the oxygen flow is 7 sccm-12 sccm.
8. The Logo production method according to claim 1, wherein the substrate is one selected from glass, film sheet, ceramic and plastic.
9. The Logo production method according to claim 1, wherein the temperature in the step of removing the hydrosol layer on the substrate with a cleaning agent is 60 ℃ to 100 ℃.
10. A terminal comprising a housing containing a Logo produced by the Logo production method according to any one of claims 1 to 9.
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Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1782129A (en) * | 2004-12-02 | 2006-06-07 | 周贤福 | Hollowed-out mercury film coating process |
| TW200821400A (en) * | 2006-11-10 | 2008-05-16 | Wen Wang | A method to process a vacuum metallization pattern on plastic substrate |
| CN101303418A (en) * | 2007-05-10 | 2008-11-12 | 宝镇光电科技股份有限公司 | Colorful optical filter film coating manufacture process and products thereof |
| CN101786390A (en) * | 2010-02-10 | 2010-07-28 | 蹤家祥 | Fabrication method for painted wooden door |
| CN103396011A (en) * | 2013-08-14 | 2013-11-20 | 芜湖长信科技股份有限公司 | Manufacturing method of OGS (one glass solution) capacitive touch screen with vacuum-plated colour film border |
| CN103997860A (en) * | 2014-04-23 | 2014-08-20 | 奥士康精密电路（惠州）有限公司 | Selective surface treatment process method |
| CN104355550A (en) * | 2014-10-31 | 2015-02-18 | 天津南玻节能玻璃有限公司 | Glass with mirror surface pattern effect and preparation method thereof |
| CN106569293A (en) * | 2016-10-31 | 2017-04-19 | 杨亦进 | Manufacture method for manufacturing film-plated lens provided with patterns |
| CN106830705A (en) * | 2017-01-23 | 2017-06-13 | 伯恩光学(惠州)有限公司 | The preparation method of glass panel surface coating figure |
| CN106929798A (en) * | 2017-04-05 | 2017-07-07 | 东莞市元升光学有限公司 | A kind of optical coating takes off depositing process |
| CN108930014A (en) * | 2018-07-31 | 2018-12-04 | 厦门腾诺光学科技有限公司 | A kind of production method of lens surface pattern plated film |
| CN110819957A (en) * | 2019-11-26 | 2020-02-21 | 天津北玻玻璃工业技术有限公司 | Method for producing coated pattern glass |
-
2020
- 2020-02-28 CN CN202010134749.0A patent/CN113320305A/en active Pending
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1782129A (en) * | 2004-12-02 | 2006-06-07 | 周贤福 | Hollowed-out mercury film coating process |
| TW200821400A (en) * | 2006-11-10 | 2008-05-16 | Wen Wang | A method to process a vacuum metallization pattern on plastic substrate |
| CN101303418A (en) * | 2007-05-10 | 2008-11-12 | 宝镇光电科技股份有限公司 | Colorful optical filter film coating manufacture process and products thereof |
| CN101786390A (en) * | 2010-02-10 | 2010-07-28 | 蹤家祥 | Fabrication method for painted wooden door |
| CN103396011A (en) * | 2013-08-14 | 2013-11-20 | 芜湖长信科技股份有限公司 | Manufacturing method of OGS (one glass solution) capacitive touch screen with vacuum-plated colour film border |
| CN103997860A (en) * | 2014-04-23 | 2014-08-20 | 奥士康精密电路（惠州）有限公司 | Selective surface treatment process method |
| CN104355550A (en) * | 2014-10-31 | 2015-02-18 | 天津南玻节能玻璃有限公司 | Glass with mirror surface pattern effect and preparation method thereof |
| CN106569293A (en) * | 2016-10-31 | 2017-04-19 | 杨亦进 | Manufacture method for manufacturing film-plated lens provided with patterns |
| CN106830705A (en) * | 2017-01-23 | 2017-06-13 | 伯恩光学(惠州)有限公司 | The preparation method of glass panel surface coating figure |
| CN106929798A (en) * | 2017-04-05 | 2017-07-07 | 东莞市元升光学有限公司 | A kind of optical coating takes off depositing process |
| CN108930014A (en) * | 2018-07-31 | 2018-12-04 | 厦门腾诺光学科技有限公司 | A kind of production method of lens surface pattern plated film |
| CN110819957A (en) * | 2019-11-26 | 2020-02-21 | 天津北玻玻璃工业技术有限公司 | Method for producing coated pattern glass |
Non-Patent Citations (1)
| Title |
|---|
| 吕乃康等: "《厚膜混合集成电路》", 30 June 1990, 西安交通大学出版社 * |
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