CN106908862A - A kind of device of generation gas with various temperature plasma photonic crystal - Google Patents
A kind of device of generation gas with various temperature plasma photonic crystal Download PDFInfo
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- CN106908862A CN106908862A CN201710297088.1A CN201710297088A CN106908862A CN 106908862 A CN106908862 A CN 106908862A CN 201710297088 A CN201710297088 A CN 201710297088A CN 106908862 A CN106908862 A CN 106908862A
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- gas
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- photonic crystal
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
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Abstract
The invention provides a kind of device of generation gas with various temperature plasma photonic crystal.Described device includes that vacuum reaction chamber, water electrode and plasma occur power supply.Two water electrodes are provided with vacuum reaction room, copper annulus is provided with the water electrode；There is power supply and electrically connected with water electrode by copper annulus in plasma；Be provided with special solid frame between two water electrodes, the frame by a diameter of 1mm of 10*10-20*20 hole it is evenly distributed form, preferably 16*16, two neighboring hole at intervals of 1mm.The plasma photon crystal of gas with various temperature can be produced using the present invention.The present invention realizes the plasma photon crystal of gas with various temperature first, increased the selection mode to light modulation, and this propagation to light is controlled and the method that adjusts realizes variation, convenient purification, high efficiency to beam modulation, this is with a wide range of applications in industrial circle.
Description
Technical field
It is specifically a kind of to produce gas with various temperature the present invention relates to plasma application technology and optical technical field
Spend the device of plasma photon crystal.
Background technology
Photonic crystal, also known as forbidden photon band material, is by certain week by two kinds of dielectric materials of differing dielectric constant in space
Phase（Size is in optical wavelength magnitude）Formed a kind of artificial " crystal " structure of arrangement.The dielectric constant of photonic crystal is space
Periodic function, if dielectric coefficient is sufficiently strong to the periodic modulation of photon, the photon energy propagated in the photonic crystal also has
Band structure, photon " forbidden band " is occurred between band and band, and the photon that frequency falls in forbidden band can not be propagated in crystal.Photon
The location and shape of forbidden band depend on the refractive index proportioning of dielectric material in photonic crystal and the sky of different dielectric coefficient material
Between than and " lattice " structure etc..Current conventional photonic crystal, after completing, its forbidden photon band position also determines that,
I.e. selectable optical band is it has been determined that if it is desired to change bandgap center position, it is necessary to remake crystal, be difficult to realize to electromagnetic wave
Adjustability control.
Used as a kind of new photonic crystal, plasma photon crystal is compared to the maximum feature of conventional photonic crystals
Its structure has space-time adjustable, and then makes its corresponding photon band gap（Band gap）It is adjustable.People can be by regulation etc.
The lattice parameter of gas ions photonic crystal, dielectric constant, lattice symmetry and time cycle etc., change its position of energy band and width
Degree, and then make the light that frequency falls into the band gap forbid propagating, realize the control propagated the selection of light frequency and light.More than being based on
Characteristic, plasma photon crystal is numerous in wave filter, plasma antenna, photoswitch and Plasma Stealth etc. in recent years
Electromagnetic wave control field has a wide range of applications, and gets more and more people's extensive concerning.But as a typical non-linear phenomena, etc.
Gas ions photonic crystal is very sensitive to experiment condition.Control parameter（Gas componant, gas pressure, applied voltage and frequency, electricity
Geometry and size etc.）Slight change, it will develop out different plasma photon crystals.That is, plasma
The unstability of body photonic crystal is unfavorable for the application in future.
At present, usual plasma photonic crystal is alternately arranged by plasma spot figure and gas and constituted.First patent
Realized in ZL200610102333.0 by thickness plasma channel and gas（Gas at i.e. non-region of discharge）Self-organizing
The plasma photon crystal of formation；Realized by plasma column, plasma in first patent ZL201010523218.7
Piece and gas（The non-region of discharge of correspondence）The plasma photon crystal of formation.However, above-mentioned patent is forming plasma light
Gas temperature during sub- crystal in discharge air-gap is all identical, there is not been reported in the prior art produce gas with various temperature grade from
Daughter photonic crystal.
The content of the invention
It is an object of the invention to provide a kind of device of generation gas with various temperature plasma photonic crystal, to fill up
Not yet there is this technological gap for producing gas with various temperature plasma photonic crystal in the prior art.
The object of the present invention is achieved like this：A kind of device of generation gas with various temperature plasma photonic crystal,
Electrically connected including vacuum reaction chamber, two water electrodes being arranged in the vacuum reaction room and with the water electrode etc. from
There is power supply in daughter；Solid frame is provided between two water electrodes, plane and two institutes where the solid frame
The axial line for stating water electrode is vertical；The circle that some diameters are 1mm is uniformly placed with the interior zone of the solid frame
Through hole, the spacing between two neighboring through hole is 1mm；All through holes constitute foursquare matrix arrangement structure.
Preferably, the interior zone in the solid frame is uniformly placed with 10*10-20*20 manhole.More preferably
, uniformly it is placed with 16*16 manhole in the interior zone of the solid frame.
Preferably, the thickness of the solid frame is 1mm ~ 3mm.It is furthermore preferred that the thickness of the solid frame is 1mm.
Preferably, the region that all through holes are constituted is region of discharge；The area of the region of discharge is less than the water electrode
Area of section；Area of section of the gross area of the solid frame more than the water electrode.
Preferably, be marked with discharge gas in the vacuum reaction room, the discharge gas be the adjustable air of air pressure or
The mixed gas of air and argon gas；The air pressure of discharge gas is 0.1 ~ 0.55 standard atmospheric pressure in the vacuum reaction room.
The present invention is provided with special solid frame between two water electrodes, is uniformly arranged in the interior zone of solid frame
The manhole of some a diameter of 1mm is furnished with, the minimum spacing between two neighboring through hole is 1mm；All through holes constitute square
The matrix arrangement structure of shape.Plane where solid frame is vertical with the axial line of two water electrodes；Solid frame internal discharge
Region area（That is the through hole gross area）Less than the area of section of water electrode, section of the solid frame gross area more than the water electrode
Area.When the voltage that plasma occurs power supply reaches gas breakdown threshold value, produced in two region of discharges of water power interpolar
Raw discharge wire, and the plasma photon crystal of gas with various temperature can be produced in adjacent through hole.It should be noted that just
In the matrix form through hole of square structure, the through hole of the circle of outermost one by border because being influenceed, therefore the plasma in adjacent through-holes
Body photonic crystal may not have different gas temperatures.Uniformly being arranged due to through hole can be with direct convenience to light beam
Propagation is controlled and adjusts, and this through hole can be such that the plasma photon crystal to be formed more stablizes, in industrial circle
There is wider application prospect.
The present invention realizes the plasma photon crystal with gas with various temperature first.Plasma photon crystal is not
But band gap properties and Local Characteristic with photonic crystal, also with characteristics such as the controllable, abnormal refractions of time-varying, can particularly lead to
The parameter and external parameter that change plasma are crossed so as to the characteristic with comparalive ease to band gap regulates and controls.Gas temperature conduct
One important external parameter, is an important controllable factor of plasma photon crystal tunability.It is different by obtaining
Gas temperature and change the plasma photon crystal of band gap properties, will be a kind of new modulator approach for propagating light selectivity.
The plasma photon crystal with gas with various temperature produced by the present invention, can increase the selection mode to light modulation, nothing
By being all with a wide range of applications in experimental study afterwards or in commercial Application.
Brief description of the drawings
Fig. 1 is the structural representation of the device of generation gas with various temperature plasma photonic crystal in the present invention.
Fig. 2 is the front view of solid frame in Fig. 1.
Fig. 3 is the schematic diagram of the luminescence of plasma spot figure of the gas with various temperature produced by the embodiment of the present invention 2.
Fig. 4 is the two-dimensional rotary spectrogram of nitrogen molecular ion in two neighboring through hole in the embodiment of the present invention 2.
Fig. 5 is the Three dimensional rotation spectrogram of nitrogen molecular ion in two neighboring through hole in the embodiment of the present invention 2.
Fig. 6 is the schematic diagram of the luminescence of plasma spot figure of the gas with various temperature produced by the embodiment of the present invention 3.
Fig. 7 is the two-dimensional rotary spectrogram of nitrogen molecular ion in two neighboring through hole in the embodiment of the present invention 3.
Fig. 8 is the Three dimensional rotation spectrogram of nitrogen molecular ion in two neighboring through hole in the embodiment of the present invention 3.
In figure：1st, vacuum reaction chamber, 2, water electrode, 3, glass catch, 4, copper ring, 5, plasma there is power supply, 6, solid
Body frame, 7, air inlet, 8, gas outlet.
Specific embodiment
Embodiment 1, a kind of device of generation gas with various temperature plasma photonic crystal.
As shown in figure 1, the device of generation gas with various temperature plasma photonic crystal provided by the present invention is specifically：
Two closed dielectric containers are symmetrical arranged in a horizontal columnar vacuum reaction chamber 1, in closed dielectric container
Interior water filling, constitutes the relative water electrode 2 of two pole plates.There is power supply with the plasma outside vacuum reaction chamber 1 in two water electrodes 2
5 electrical connections.In the present embodiment, water electrode 2 is made up of by setting the block of glass catch 3 at two ends lucite tube,
Water is filled in lucite tube, while setting copper ring 4 in lucite tube.Two copper rings 4 respectively by power line with wait from
There is positive pole and the negative pole electrical connection of power supply 5 in daughter.The thickness of glass catch 3 between 1.5mm ~ 5mm, as discharge medium.
Air inlet 7 and gas outlet 8 are provided with the wall body of vacuum reaction chamber 1.
Solid frame 6, the place plane of solid frame 6 and two axle center of water electrode 2 are provided between two water electrodes 2
Line is vertical, and two end faces of water electrode 2 are close in two sides of solid frame 6 respectively（Solid frame 6 and water electrode 2 in Fig. 1
Separation is to observe for convenience）.With reference to Fig. 2, the concrete structure of solid frame 6 is：Using a flat board as solid frame body,
The manhole of some a diameter of 1mm in matrix arrangement is offered on solid frame body（Through hole or hole）, this
A little through holes constitute region of discharge（Or discharging gap）, the minimum spacing between two neighboring through hole is 1mm.On solid frame
Region of discharge is just to water electrode 2；The area of region of discharge is less than the area of section of water electrode 2, and the gross area of solid frame
（That is the area of solid frame body）It is greater than the area of section of water electrode 2.
In the present embodiment 16*16 manhole is offered on solid frame body.Outermost manhole is away from solid
The distance at the edge of frame 6 is not limited, that is to say, that the shape of the edge of solid frame 6 is not limited, and can be circle, or
Square, or other rule or irregular shape in Fig. 2 etc..
Discharging gap between two water electrodes 2 is cut into corresponding equal in magnitude, diameter by the interior zone of solid frame 6
It is the uniform pores of the 16*16 of 1mm, the minimum spacing of adjacent pores is 1mm.Discharging gap is just to two water electrodes 2, and electric discharge
Cross-sectional area of the interval area less than water electrode 2（That is end area）.The thickness of solid frame 6 can be 1mm ~ 3mm.It is preferred that
, the thickness of solid frame 6 is 1mm.The material of solid frame 6 can be resin material.
Discharge gas is marked with vacuum reaction chamber 1, discharge gas can be the mixed gas of air or air and argon gas.
The air pressure of discharge gas is adjustable, and the air pressure of general control discharge gas is 0.1 ~ 0.55 standard atmospheric pressure.Plasma occurs
Between 3-6.5kV, frequency is 50 ~ 60kHz to the voltage amplitude of power supply 5.There is the switch of power supply 5, regulation in open plasma
Its voltage is to certain value, you can the plasma spot figure with different structure is produced in the discharging gap between two water electrodes 2.
In adjacent hole, the plasma photon crystal of gas with various temperature can be produced.
Apparatus of the present invention are discussed in detail with specific embodiment below and produce gas with various temperature plasma photonic crystal
Process.
Embodiment 2
With reference to Fig. 1 and Fig. 2, a vacuum reaction chamber 1 is set, air inlet 7 and gas outlet are opened up on the wall body of vacuum reaction chamber 1
8, and the relative water electrode 2 of two pole plates is installed in vacuum reaction chamber 1.Water electrode 2 is sealed and noted by both sides glass catch 3
The lucite tube of full water is constituted, and built-in copper ring 4 occurs power supply 5 and electrically connects with the plasma outside vacuum reaction chamber 1.
The solid frame 6 that thickness is 1mm is provided between two water electrodes 2, solid frame 6 is resin material, its institute
It is vertical with the axial line of two water electrodes 2 in plane, and two end faces of water electrode 2 are close in both sides.In the inside of solid frame 6
Region opens up the manhole of 16*16 a diameter of 1mm, and minimum spacing between adjacent through-holes is 1mm.In solid frame 6
The face area of the area less than water electrode 2 of the region of discharge that 16*16, portion manhole is constituted, and region of discharge is just to two
Water electrode 2.Face area of the gross area of solid frame 6 more than water electrode 2.
By air inlet 7 to being passed through discharge gas in vacuum reaction chamber 1.Specifically, the electric discharge being passed through in the present embodiment
Gas is air, and discharge gas air pressure P=0.3atm, voltage amplitude is 4.72kV, and discharge frequency is 51kHz.Closure switch, etc.
There is power supply 5 and act on two water electrodes 2 in gas ions, can produce the alternate luminescence of plasma spot figure of single two point（Or put
Electrical filament）, as shown in Figure 3.In Fig. 3, in addition to the circle luminescence of plasma spot figure of outermost one, internal luminescence of plasma spot figure is
Single-point is presented and two point is alternately arranged structure, i.e.,：Two neighboring through hole（Or hole）Interior luminescence of plasma pattern formation
Difference, one is single discharge wire（Correspondence single-point structure）, another is two beam discharges silk（Correspondence two point structure）.
Nitrogen molecular ion in two neighboring through hole when being discharged in collection the present embodiment（N2 +）Rotation spectrum, gained two dimension turn
Dynamic spectrum is as shown in figure 4, gained Three dimensional rotation spectrum is as shown in Figure 5.In Fig. 4 and Fig. 5, single-point etc. in curve corresponding diagram shown in S 3
The luminous spot figure of gas ions, two point luminescence of plasma spot figure in curve corresponding diagram shown in D 3.According to rotation spectrum in Fig. 4 and Fig. 5
The corresponding rotation temperature about 510K of curve shown in S can be measured, the corresponding temperature that rotates of curve shown in D is about 580K.Therefore, originally
The device of invention can produce the plasma photon crystal of gas with various temperature, and in addition to the ring through hole of outermost one, internal is logical
Gas temperature in hole in two through holes of arbitrary neighborhood is different, and the structure that is arranged alternately.
Embodiment 3
The present embodiment compared with Example 2, except that：Discharge gas is the mixed gas of air and argon gas, argon gas volume
Content is 30%, and voltage amplitude is 2.72kV.There is power supply 5 and act on two water electrodes 2 in closure switch, plasma, can produce
The raw list alternate luminescence of plasma spot figure of two point, as shown in Figure 6.Fig. 6 is similar with Fig. 3, is also except outermost one encloses plasma
Outside the luminous spot figure of body, internal luminescence of plasma spot figure shows single-point and the alternate arrangement architecture of two point, i.e.,：It is two neighboring
Through hole（Or hole）Interior luminescence of plasma pattern formation is different, and one is single discharge wire（Correspondence single-point structure）, separately
One is two beam discharges silk（Correspondence two point structure）.
Collection the present embodiment in discharge when two neighboring through hole in nitrogen molecular ion rotation spectrum, gained two-dimensional rotary light
Spectrum is as shown in fig. 7, gained Three dimensional rotation spectrum is as shown in Figure 8.In Fig. 7 and Fig. 8, single-point plasma in curve corresponding diagram shown in S 6
The luminous spot figure of body, two point luminescence of plasma spot figure in curve corresponding diagram shown in D 6.Can be surveyed according to rotation spectrum in Fig. 7 and Fig. 8
Obtain the corresponding temperature that rotates of curve shown in S and be about 420K, the corresponding temperature that rotates of curve shown in D is about 500K.Therefore, this implementation
Corresponding gas temperature is also different at single-point and two point in example.
Claims (7)
1. a kind of device for producing gas with various temperature plasma photonic crystal, including vacuum reaction chamber, be arranged on it is described true
There is power supply in two water electrodes in empty reative cell and the plasma electrically connected with the water electrode；It is characterized in that, two
Solid frame is provided between the individual water electrode, plane where the solid frame is hung down with two axial lines of the water electrode
Directly；Uniformly be placed with the manhole that some diameters are 1mm in the interior zone of the solid frame, two neighboring through hole it
Between spacing be 1mm；All through holes constitute foursquare matrix arrangement structure.
2. it is according to claim 1 produce gas with various temperature plasma photonic crystal device, it is characterized in that, in institute
The interior zone for stating solid frame is uniformly placed with 10*10-20*20 manhole.
3. it is according to claim 2 produce gas with various temperature plasma photonic crystal device, it is characterized in that, in institute
The interior zone for stating solid frame is uniformly placed with 16*16 manhole.
4. it is according to claim 1 produce gas with various temperature plasma photonic crystal device, it is characterized in that, it is described
The thickness of solid frame is 1mm ~ 3mm.
5. it is according to claim 4 produce gas with various temperature plasma photonic crystal device, it is characterized in that, it is described
The thickness of solid frame is 1mm.
6. it is according to claim 1 produce gas with various temperature plasma photonic crystal device, it is characterized in that, own
The region that through hole is constituted is region of discharge；Area of section of the area of the region of discharge less than the water electrode；The solid
Area of section of the gross area of frame more than the water electrode.
7. it is according to claim 1 produce gas with various temperature plasma photonic crystal device, it is characterized in that, in institute
State and discharge gas is marked with vacuum reaction room, the discharge gas is the gaseous mixture of the adjustable air of air pressure or air and argon gas
Body；The air pressure of discharge gas is 0.1 ~ 0.55 standard atmospheric pressure in the vacuum reaction room.
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| CN201710297088.1A CN106908862B (en) | 2017-04-28 | 2017-04-28 | A kind of device generating gas with various temperature plasma photonic crystal |
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| CN201710297088.1A CN106908862B (en) | 2017-04-28 | 2017-04-28 | A kind of device generating gas with various temperature plasma photonic crystal |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107094348A (en) * | 2017-07-03 | 2017-08-25 | 河北大学 | A kind of alternation plasma discharge apparatus |
| CN107105567A (en) * | 2017-07-03 | 2017-08-29 | 河北大学 | A kind of alternation plasma-discharge process |
| CN110794510A (en) * | 2019-10-24 | 2020-02-14 | 南京航空航天大学 | Tunable plasma photonic crystal fiber device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100118407A1 (en) * | 2008-11-10 | 2010-05-13 | Corporation For National Research Initiatives | Method of reflecting impinging electromagnetic radiation and limiting heating caused by absorbed electromagnetic radiation using engineered surfaces on macro-scale objects |
| CN102012538A (en) * | 2010-10-28 | 2011-04-13 | 河北大学 | Method for generating plasma photonic crystals with four indexes of refraction |
| CN103592700A (en) * | 2013-11-11 | 2014-02-19 | 河北大学 | Device and method for producing novel plasma photonic crystal with five refractive indexes |
| CN104507250A (en) * | 2014-12-31 | 2015-04-08 | 中国科学院空间科学与应用研究中心 | Plasma photonic crystal generating device |
| CN106199769A (en) * | 2016-07-12 | 2016-12-07 | 河北大学 | A kind of device and method producing rotating hexagon plasma photon crystal |
-
2017
- 2017-04-28 CN CN201710297088.1A patent/CN106908862B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100118407A1 (en) * | 2008-11-10 | 2010-05-13 | Corporation For National Research Initiatives | Method of reflecting impinging electromagnetic radiation and limiting heating caused by absorbed electromagnetic radiation using engineered surfaces on macro-scale objects |
| CN102012538A (en) * | 2010-10-28 | 2011-04-13 | 河北大学 | Method for generating plasma photonic crystals with four indexes of refraction |
| CN103592700A (en) * | 2013-11-11 | 2014-02-19 | 河北大学 | Device and method for producing novel plasma photonic crystal with five refractive indexes |
| CN104507250A (en) * | 2014-12-31 | 2015-04-08 | 中国科学院空间科学与应用研究中心 | Plasma photonic crystal generating device |
| CN106199769A (en) * | 2016-07-12 | 2016-12-07 | 河北大学 | A kind of device and method producing rotating hexagon plasma photon crystal |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107094348A (en) * | 2017-07-03 | 2017-08-25 | 河北大学 | A kind of alternation plasma discharge apparatus |
| CN107105567A (en) * | 2017-07-03 | 2017-08-29 | 河北大学 | A kind of alternation plasma-discharge process |
| CN107094348B (en) * | 2017-07-03 | 2019-01-22 | 河北大学 | A kind of alternation plasma discharge apparatus |
| CN110794510A (en) * | 2019-10-24 | 2020-02-14 | 南京航空航天大学 | Tunable plasma photonic crystal fiber device |
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