CN100434935C - Method for generating plasma photon crystal having three refractivities - Google Patents
Method for generating plasma photon crystal having three refractivities Download PDFInfo
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- CN100434935C CN100434935C CNB2006101023330A CN200610102333A CN100434935C CN 100434935 C CN100434935 C CN 100434935C CN B2006101023330 A CNB2006101023330 A CN B2006101023330A CN 200610102333 A CN200610102333 A CN 200610102333A CN 100434935 C CN100434935 C CN 100434935C
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Abstract
The invention relates to a method to generate three refraction rates plasma photonic crystal, which uses the following discharge device to reach the goal: the basic structure of discharge device includes two symmetric closed dielectric containers, and between the two containers setting the discharge gap, in the containers, setting discharge electrode fuses, and importing the water into the containers to form the discharge electrodes; by changing the discharge conditions, including changing the applied voltage frequency and amplitude, and the discharge gap shape border and aspect ratio, discharging will produce three refraction rates plasma photonic crystal structure with different cycles, and different lattice constants. Since the electronic density in the plasma channel has the three orders of 1015cm, theoretical studies indicating that such high electronic density is enough to enable the plasma photonic crystal having band gap structure, to prevent the spread of certain frequency lights, and having frequency-selective optical switching function, which has a broad application prospects in the industrial field.
Description
Technical field
The present invention relates to method and two water electrode medium barrier discharge device that a kind of generation has three kinds of refraction rates plasma photonic, belong to plasma applicating technology field and optical field.
Background technology
Photonic crystal also is photonic bandgap material, is a kind of novel artificial periodic modulation dielectric structure.Usually the two kinds of different materials alternate cycle arrangement by high low-refraction forms.Because its periodic existence produces photonic band gap (Band gap), thereby the light that makes frequency fall into this band gap forbids propagating the control that realization is propagated the selection and the light of light frequency.The control that the change of this space periodicity is propagated for light has vital role, has only the light of certain frequency just can be propagated by total ban in certain periodic photonic crystal, when its periodically-varied, the light that can forbid has also just become.Based on above characteristic, at present photonic crystal has been widely used in many fields, realizes directions such as switch control, far-infrared laser as usefulness, the spontaneous radiation that improves optical fiber, and is expected to be applied to the design etc. of high-speed computer.Yet the periodicity of photonic crystal is generally manually fixing, realizes by making dielectric rod array or airport array on flat board usually.Also need to make the crystal template again if change original periodicity, cumbersome.Therefore, change the method for making of photonic crystal, realize the photonic crystal of new structure, need not the artificial fixed cycle, and can to regulate it easily periodically be that people thirst for realizing.
Dielectric barrier discharge is named voltolising again, is a kind of typical nonequilibrium state AC gas discharge, and its principal feature is to have at least an electrode to be coated with dielectric.Dielectric barrier discharge has been applied to many industrial circles widely at present, enjoys people's attention as ozone manufacturing, plasma television PDP, Atomospheric pressure glow discharge etc.Recently, it is found that the periodic structure that plasma channel in the dielectric barrier discharge (discharge silk) can the self-organization formation rule, thereby opened up another brand-new development space for the application of dielectric barrier discharge.
Summary of the invention
The objective of the invention is to utilize water to do electrode, in the dielectric barrier discharge of band edge circle, obtain by the thickness plasma channel and not the region of discharge self-organization form, have three kinds of refraction rates plasma photonic.
The object of the present invention is achieved like this: this generation has the method for three kinds of refraction rates plasma photonic, it is characterized in that: it is to adopt following electric discharge device to realize: basic structure of discharge device comprises the dielectric container of two symmetric closed, discharging gap is set in the middle of two containers, the sparking electrode lead-in wire is set in the container, injects water in the container and form sparking electrode; By changing shape, the aspect ratio that discharging condition comprises the frequency, amplitude and the discharging gap border that change impressed voltage, discharge will produce the three kinds of refraction rates plasma photonic structures that have that periodicity difference, grating constant do not wait.
Described generation has the method for three kinds of refraction rates plasma photonic, and the end face of the dielectric container of described electric discharge device is the transparent plate material, and cylinder is cavity cylinder or prism, and the transparent plate end face of two containers is symmetrical arranged; Dielectric container is glass or quartz glass or plastic material making.
Described generation has the method for three kinds of refraction rates plasma photonic, and the dielectric container of described electric discharge device is provided with water injection hole.
Described generation has the method for three kinds of refraction rates plasma photonic, and the discharging gap border of described electric discharge device is cylinder or the prism that connects two dielectric container end faces, by glass or quartz glass or plastic material making; Be sealed with argon gas, helium or argon gas and AIR MIXTURES in the cavity.
Described generation has the method for three kinds of refraction rates plasma photonic, it is the closed circuit lead-in wire corresponding with the dielectric container cylindrical shape that the sparking electrode lead-in wire is set in the dielectric container of described electric discharge device, the high-pressure side of high-voltage power supply is connected with two contact conductors respectively with earth terminal, and the discharging gap border is glass or quartz glass or plastic material making.
Described generation has the method for three kinds of refraction rates plasma photonic, described discharging condition comprises that electric voltage frequency is 10-100kHz, voltage amplitude is 1-10kV, discharge will produce two kinds of plasma channels that thickness does not wait, and periodically arrange self-organization with region of discharge not and form the crystal structure with three kinds of refractive indexes.
Described generation has the method for three kinds of refraction rates plasma photonic, and described discharging condition comprises that electric voltage frequency is chosen as 45-80kHz, and voltage amplitude is chosen as 3.6-4.4kV.
In the plasma photon crystal of method discharge generation of the present invention since the gas ions passage that do not wait of thickness and not the electron density and the electron temperature of region of discharge all do not wait, to anaclasis also difference, thereby realized the periodic arrangement of three kinds of different refractivities.When not having discharge generation, the light of all frequencies can pass through, and when discharging condition suitable, form behind the plasma photon crystal owing to exist the forbidden band level structure to make the light of some frequency forbid propagating.Can change the grating constant of plasma photon crystal by regulating discharge parameter, the energy level that promptly changes photonic crystal distributes, and then selects the light of which frequency to be under an embargo easily.Plasma photon crystal self-organization in two water electrode medium barrier discharges forms, and does not rely on artificial fixedly grating constant.Sparking electrode is transparent and plasma photon crystal itself is luminous, therefore can directly observe the change procedure of grating constant.Device is simple, easily make, safeguard well, easy to use and be with a wide range of applications at industrial circle.
Description of drawings
Fig. 1 is a water electrode medium barrier discharge device structural representation of the present invention
Among the figure: 1, dielectric container end face 2, dielectric container cylinder
3, water injection hole 4, contact conductor 5, water or other liquid
6, discharging gap 7, discharging gap border
The synoptic diagram of three kinds of refraction rates plasma photonic that produce at discharging gap when Fig. 2 is discharge
Among the figure: 8, thin plasma channel
9, thick plasma channel
10, the zone of discharge off generation
Fig. 3 is the A-A view of Fig. 2
Among the figure: the grating constant of α, plasma photon crystal
Fig. 4 is three kinds of refraction rates plasma photonic photos
Discharging condition: impressed voltage U=4.2kV frequency f=62kHz border aspect ratio R=1 grating constant α=5.4mm
Fig. 4 a, Fig. 4 b, Fig. 4 c, Fig. 4 d, Fig. 4 e, Fig. 4 f are the three kinds of refraction rates plasma photonic photos that have that obtain under the different discharging conditions
Among the figure:
(a) voltage amplitude U=3.5kV, frequency f=52kHZ, R=0.25, grating constant a=7mm;
(b) U=4.5kV, frequency f=52kHZ, R=0.375, a=5.6mm;
(c) U=4kV, frequency f=52kHZ, R=0.5; A=5.6mm;
(d) U=4kV, frequency f=52kHZ, R=1, a=5.6mm;
(e) U=4.1kV, frequency f=52kHZ, R=1.25, a=5.6mm;
(f) U=4.7kV, frequency f=52kHz, R=1.625, a=4.7mm;
Embodiment
The method for making of water electrode medium barrier discharge device shown in Fig. 1 of the present invention is to utilize silica gel sealing to make two symmetrically arranged dielectric containers with hollow tubular dielectric cylinder 2 dull and stereotyped transparent dielectric end face 1 together, by water filling aperture 3 with seal cavity fills with water or other liquid, between two containers discharging gap 6 is set, gases such as sealing argon gas, helium, argon gas and AIR MIXTURES in the chamber, the high-pressure side of high-voltage power supply and earth terminal are connected with the contact conductor 4 of two water electrodes being provided with in the container respectively.Discharging gap 6 length can be regulated by the thickness on discharging gap border 7.Along with the rising of impressed voltage, the breakdown formation discharge of the gas between air gap shows as many bright discharge silks.When electric voltage frequency is in 45kHz to 80kHz, during to 4.4kV, discharge will produce two kinds of plasma channels that thickness does not wait to voltage amplitude at 3.6kV.These two kinds of plasma channels are periodically arranged self-organization with region of discharge not and are formed the crystal structure with three kinds of refractive indexes.The grating constant that discharging conditions such as the shape on frequency, amplitude and the border of change impressed voltage, aspect ratio are regulated plasma photon crystal, can change the bandgap structure of plasma photon crystal, select the light of which frequency to be forbidden, and then control the propagation of light by crystal.Above-mentioned plasma photon crystal has the quadrilateral symmetry, and its grating constant α (distance of two a little bigger or two points in the corresponding diagram 3) is in mm between the scope of cm magnitude, shown in Fig. 2,3.
In the crystallogram shown in Fig. 4 and Fig. 4 a thereafter, Fig. 4 b, Fig. 4 c, Fig. 4 d, Fig. 4 e, Fig. 4 f, because the gas ions passage that do not wait of thickness (8,9 the point in the corresponding diagram, a little bigger) respectively and not the electron density and the electron temperature of region of discharge (black regions in 10 corresponding diagram) all do not wait, thereby to anaclasis also difference.The refractive index of region of discharge 10 is not 1, and the refractive index of plasma channel 9 interior focusings is between 0～1, and the refractive index in carefully passage 8 interior refractive index ratios are known a little about is slightly little, thereby has realized the plasma photon crystal of three kinds of different refractivities.
The border 7 of dielectric container of the present invention and discharging gap is glass or quartz glass or plastic material making, the boundary shape of dielectric container and discharging gap is cylinder or prism, and the length of discharging gap 6 changes the cylinder height realization by the border 7 of regulating discharging gap.
Listed examples of the present invention be intended to further to illustrate method that this generation has three kinds of refraction rates plasma photonic and use water electrode medium barrier discharge device structure and realize the process of discharge, and protection scope of the present invention is not constituted any restriction.All can obtain producing with the embodiment of the invention with via claims of the present invention and have three kinds of refraction rates plasma photonic.
Claims (7)
1, a kind of generation has the method for three kinds of refraction rates plasma photonic, it is characterized in that: it is to adopt following electric discharge device to realize: basic structure of discharge device comprises the dielectric container of two symmetric closed, discharging gap (6) is set in the middle of two containers, sealing argon gas, helium or argon gas and AIR MIXTURES in the discharging gap is provided with the sparking electrode lead-in wire in the container
(4), inject water (5) in the container and form sparking electrode; By changing shape, the aspect ratio that discharging condition comprises frequency, amplitude and discharging gap (6) border (7) that changes impressed voltage, discharge will produce the three kinds of refraction rates plasma photonic structures that have that periodicity difference, grating constant do not wait.
2, described generation has the method for three kinds of refraction rates plasma photonic according to claim 1, it is characterized in that: the end face of the dielectric container of described electric discharge device (1) is the transparent plate material, cylinder is cavity cylinder or prism (2), and the transparent plate end face of two containers is symmetrical arranged; Dielectric container is that glass or plastic material are made.
3, described generation has the method for three kinds of refraction rates plasma photonic according to claim 1, and it is characterized in that: the dielectric container of described electric discharge device is provided with water injection hole (3).
4, described generation has the method for three kinds of refraction rates plasma photonic according to claim 1, it is characterized in that: the discharging gap border (7) of described electric discharge device is cylinder or the prism that connects two dielectric container end faces, is made by glass or plastic material.
5, described generation has the method for three kinds of refraction rates plasma photonic according to claim 1, it is characterized in that: it is the closed circuit lead-in wire corresponding with the dielectric container cylindrical shape that sparking electrode lead-in wire (4) is set in the dielectric container of described electric discharge device, the high-pressure side of high-voltage power supply is connected with two contact conductors (4) respectively with earth terminal, and discharging gap border (7) are that glass or plastic material are made.
6, described generation has the method for three kinds of refraction rates plasma photonic according to claim 1, it is characterized in that: described discharging condition comprises that electric voltage frequency is 10-100kHz, voltage amplitude is 1-10kV, discharge will produce two kinds of plasma channels that thickness does not wait, and periodically arrange self-organization with region of discharge not and form the crystal structure with three kinds of refractive indexes.
7, described generation has the method for three kinds of refraction rates plasma photonic according to claim 6, and it is characterized in that: described discharging condition comprises that electric voltage frequency is chosen as 45-80kHz, and voltage amplitude is chosen as 3.6-4.4kV.
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Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101576596B (en) * | 2009-06-10 | 2011-01-05 | 河北大学 | Method for testing dynamic homogeneity of slot discharging plasmas |
| CN102012538B (en) * | 2010-10-28 | 2012-01-11 | 河北大学 | Method for generating plasma photonic crystals with four indexes of refraction |
| CN102213796B (en) * | 2011-06-15 | 2013-05-15 | 河北大学 | Method and special device for generating time oscillation plasma photonic crystal |
| CN102565939B (en) * | 2012-01-10 | 2013-04-17 | 河北大学 | Device and method for generating nested plasma photonic crystals with multiple nesting structures |
| CN102647844B (en) * | 2012-04-28 | 2015-02-25 | 河北大学 | Device and method for generating large-gap and atmospheric-pressure at low voltage and discharging uniformly |
| CN103728674B (en) * | 2014-01-10 | 2015-08-26 | 河北大学 | A kind ofly produce apparatus and method that are artificial and self-organization compound plasma photonic crystal simultaneously |
| CN104507250B (en) * | 2014-12-31 | 2017-03-08 | 中国科学院空间科学与应用研究中心 | A kind of generation device of plasma photon crystal |
| CN105223648B (en) * | 2015-10-30 | 2018-04-17 | 河北大学 | A kind of apparatus and method for producing three layers of plasma photon crystal |
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| JP2001091912A (en) * | 1999-09-24 | 2001-04-06 | Toshiba Corp | Optical element and demultiplexer |
| CN1491527A (en) * | 2001-02-12 | 2004-04-21 | Se�������幫˾ | Apparatus for generating low temperature plasma at atmospheric pressure |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001091912A (en) * | 1999-09-24 | 2001-04-06 | Toshiba Corp | Optical element and demultiplexer |
| CN1491527A (en) * | 2001-02-12 | 2004-04-21 | Se�������幫˾ | Apparatus for generating low temperature plasma at atmospheric pressure |
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| 大气压介质阻挡放电中的自组织斑图结构. 董丽芳等.物理学报，第51卷第10期. 2002 |
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