CN205883684U - Produce plasma photonic crystal's of humorous defect mould of continuously adjustable device - Google Patents
Produce plasma photonic crystal's of humorous defect mould of continuously adjustable device Download PDFInfo
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- CN205883684U CN205883684U CN201620802527.0U CN201620802527U CN205883684U CN 205883684 U CN205883684 U CN 205883684U CN 201620802527 U CN201620802527 U CN 201620802527U CN 205883684 U CN205883684 U CN 205883684U
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- plasma
- continuously adjustable
- photon crystal
- aluminium oxide
- oxide ceramics
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Abstract
The utility model relates to a produce plasma photonic crystal's of humorous defect mould of continuously adjustable device, including discharge power supply, frame, install alumina ceramics stick array and plasma discharge pipe on the frame, the frame includes upper and lower parallel arrangement's two the 1st organic glass boards and connects a plurality of stay tubes of two the 1st organic glass boards, alumina ceramics stick array all passes two the 1st organic glass boards with the plasma discharge pipe, plasma discharge manages and lies in between the alumina ceramics stick array, the plasma discharge pipe is connected with discharge power supply. The utility model has the advantages of simple structure, convenient operation, defect mould continuously adjustable festival, research for plasma photonic crystal provides more wide space, is expected to produce in industrial application important effect.
Description
Technical field
This utility model relates to technical field of plasma, particularly relate to a kind of grade producing continuously adjustable Defect Modes from
The device of daughter photonic crystal.
Background technology
Plasma photon crystal is the periodic distribution by plasma autologous density or hands over other dielectric material
Wrong periodic arrangement and the novel tuneable photonic crystal of one that formed.It not only has the character of general photonic crystal, but also
Embody the characteristic of plasma, can effectively control its band gap by changing plasma parameter or externally-applied magnetic field.If at adjustable band
Constructing suitable defect in the plasma photon crystal of gap, then can form the device such as tunable filter and waveguide, this is in engineering side
Mask has important application.Particularly, by regulating space or the time parameters such as electron density, lattice paprmeter, symmetry easily,
Can manual control plasma photon crystal photon band gap, it is achieved to special natures such as the controls of different frequency electromagnetic wave so that
Plasma photon crystal has good application prospect on microwave to the control of terahertz wave band, as Plasma Stealth,
The fields such as wave filter, plasma antenna and photoswitch.But existing Defect Modes cannot continuously adjustabe so that plasma photon is brilliant
The range of application of body is restricted.
Utility model content
This utility model overcomes the deficiencies in the prior art, it is provided that a kind of plasma producing continuously adjustable Defect Modes
The device of photonic crystal so that plasma photon crystal has application prospect in terms of laser instrument, resonator cavity, wavelength-division multiplex.
For reaching above-mentioned purpose, the technical solution adopted in the utility model is: a kind of produce continuously adjustable Defect Modes
The device of plasma photon crystal, including discharge power supply, framework, installation aluminium oxide ceramics rod array on said frame and
Plasma discharge tube, described framework includes two the first poly (methyl methacrylate) plates be arrangeding in parallel up and down and connects two described the
Multiple stay tubes of one poly (methyl methacrylate) plate, described aluminium oxide ceramics rod array and plasma discharge tube both pass through two described
One poly (methyl methacrylate) plate, described plasma discharge tube between described aluminium oxide ceramics rod array, described plasma discharge
Pipe is connected with described discharge power supply.
In one preferred embodiment of this utility model, produce the dress of the plasma photon crystal of continuously adjustable Defect Modes
Put farther include described aluminium oxide ceramics rod array include multiple aluminium oxide ceramics rod, multiple described aluminium oxide ceramics rod in three
Angle lattice arrangement.
In one preferred embodiment of this utility model, produce the dress of the plasma photon crystal of continuously adjustable Defect Modes
Put a diameter of 6mm, a length of 150mm farther including described aluminium oxide ceramics rod.
In one preferred embodiment of this utility model, produce the dress of the plasma photon crystal of continuously adjustable Defect Modes
Put farther include described plasma discharge tube include sealed silica envelope, electricity in be located in described sealed silica envelope two
Pole, be filled with in described sealed silica envelope pressure be 650Pa, purity be the argon of 99.99%.
In one preferred embodiment of this utility model, produce the dress of the plasma photon crystal of continuously adjustable Defect Modes
Put farther include the pipe thickness of described sealed silica envelope be 1mm, external diameter be 12mm, a length of 250mm.
In one preferred embodiment of this utility model, produce the dress of the plasma photon crystal of continuously adjustable Defect Modes
Putting and farther including a described stay tube is aluminum square tube, a length of 130mm of described stay tube.
In one preferred embodiment of this utility model, produce the dress of the plasma photon crystal of continuously adjustable Defect Modes
Put the bottom of described first poly (methyl methacrylate) plate farther including to be positioned at lower section and be closely fitted with the second poly (methyl methacrylate) plate, described the
The thickness of two poly (methyl methacrylate) plates is 10mm.
This utility model solves defect present in background technology, and this utility model uses inner electrode, and discharge mould
Formula is low pressure glow discharge, makes to produce little heat in plasma discharge processes, and plasma discharge tube can continue
Producing the plasma of stable and uniform, this utility model has simple in construction simultaneously, easy to operate, and Defect Modes is continuously adjustable
Advantage, the research for plasma photon crystal provides the most wide space, is expected to produce in commercial Application important
Effect.
Accompanying drawing explanation
With embodiment, this utility model is further illustrated below in conjunction with the accompanying drawings.
Fig. 1 is the axonometric chart of preferred embodiment of the present utility model；
Fig. 2 is the top view of preferred embodiment of the present utility model；
Fig. 3 is the structural representation of the plasma discharge tube of preferred embodiment of the present utility model；
Fig. 4 is the plasma photon crystal Defect Modes modified-image of preferred embodiment of the present utility model.
Detailed description of the invention
Being described in further detail this utility model presently in connection with drawings and Examples, these accompanying drawings are simplification
Schematic diagram, illustrates basic structure of the present utility model the most in a schematic way, and therefore it only shows the structure relevant with this utility model
Become.
As it is shown in figure 1, the device of a kind of plasma photon crystal producing continuously adjustable Defect Modes, including electric discharge electricity
Source 1, framework, the aluminium oxide ceramics rod array being arranged on framework and plasma discharge tube 2, preferably discharge power supply 1 use south
The CPT-2000K plasma power source special that Jing Su Man produces, its output voltage is 0-30kV, output frequency range of accommodation
About at 5-20kHz, framework includes two the first poly (methyl methacrylate) plates 4 be arrangeding in parallel up and down and connects two the first lucites
Multiple stay tubes 6 of plate 4, have at two first according to the arrangement position of aluminium oxide ceramics rod array and plasma discharge tube 2
Boring corresponding through hole (not shown) on machine glass plate 4, aluminium oxide ceramics rod array and plasma discharge tube 2 both pass through
Two the first poly (methyl methacrylate) plates 4, plasma discharge tube 2, between aluminium oxide ceramics rod array, forms a defect, wait from
Daughter discharge tube 2 is connected with discharge power supply.
As in figure 2 it is shown, this utility model preferential oxidation aluminum ceramic rod array includes multiple aluminium oxide ceramics rod 8, multiple oxygen
Change aluminum ceramic rod 8 to arrange in triangular crystal lattice.Further preferably aluminium oxide ceramics rod 8 is solid cylinder, and purity is 99.5%, surface
Coarse, its a diameter of 6mm, a length of 150mm.Spacing between two the first poly (methyl methacrylate) plates 4 is 130mm, preferably props up stay tube 6
For aluminum square tube, a length of 130mm of a stay tube 6.The bottom of the first poly (methyl methacrylate) plate 4 being positioned at lower section is closely fitted with second to be had
Machine glass plate 10, the thickness of the second poly (methyl methacrylate) plate 10 is 10mm, is used for supporting aluminium oxide ceramics rod 8 and plasma discharge tube
2.In order to improve the steadiness of plasma discharge tube 2, this utility model preferably with organic glue by plasma discharge tube 2 with
Two the first poly (methyl methacrylate) plates 4 are fixed.
As it is shown on figure 3, the preferred plasma discharge tube of this utility model 2 includes sealed silica envelope 12, is located at sealing quartz
Two interior electrodes 14 in pipe 12, be filled with in sealed silica envelope 12 pressure be 650Pa, the argon of purity 99.99%, in two
Electrode 14 is connected with discharge power supply 1, electrode 14 ground connection in one of them.The pipe thickness of sealed silica envelope 12 is 1mm, external diameter
For 12mm, a length of 250mm, interior electrode 14 is preferably round copper pipe.Plasma discharge tube 2 uses inner electrode, and discharge mould
Formula is low pressure glow discharge, makes to produce little heat in plasma discharge processes, can persistently produce simultaneously stablize equal
Even plasma.
This utility model in use, first opens discharge power supply 1；Change the discharging condition at plasma discharge tube 2 two ends.
Different discharging conditions is respectively as follows: discharge voltage 20kV, frequency 10kHz；Discharge voltage 22 kV, frequency 12kHz；Discharge voltage
24 kV, frequency 14kHz；Discharge voltage 26 kV, frequency 16kHz；Discharge voltage 30 kV, frequency 20kHz.Along with discharge voltage
Increase, corresponding plasma electron density change is followed successively by 1 × 1011cm-3、3×1011cm-3、5×1011cm-3、7×
1011cm-3、9×1011cm-3。
This utility model is applied to the magnitude of voltage at plasma discharge tube 2 two ends by regulation, changes plasma with this
Body electron density, thus realize the regulation and control of plasma photonic band gap, discharge current changes the most therewith simultaneously, utilizes
ArI(2P2→1S5) plasma electron density in Stark broadening plasma photonic crystal in spectrum is measured,
Along with the increase of discharge voltage, corresponding plasma electron density is changed to 1 × 1011cm-3-9×1011cm-3, utilize oscillography
Discharge current is measured by device, and discharge current scope, at 20mA-100mA, utilizes the Agilent PNA-L net that model is 5230C
The absorbance of plasma photon crystal measured by network analyser, measures plasma photon crystal absorbance and defect intuitively
The change of mould.Figure 4, it is seen that the effective energy gap of this model is at 7.2GHz-10.5GHz, along with plasma is close
The increase of degree, resonant frequency corresponding to transmission peaks moves to high frequency direction, the scope of regulation from 7.7GHZ to 8.5GHz, simulation knot
Fruit demonstrates that density is 1011cm-3The plasma of magnitude microwave in regulation GHz range is in this deficiency photonic crystal
Transmission characteristic time shown good effect, regulation is simple, and degree of accuracy is high.This has emphatically in arrowband, pole frequency-selecting filter
Apply, for development VHD optical WDM communication technology and superhigh precision optical information measuring instrument, there is important answering
By value.
Above according to desirable embodiment of the present utility model for enlightening, by above-mentioned description, related personnel is complete
Various change and amendment can be carried out in the range of without departing from this utility model technological thought.This utility model
The content that is not limited in description of technical scope, it is necessary to determine technical scope according to right.
Claims (7)
1. the device of the plasma photon crystal producing continuously adjustable Defect Modes, it is characterised in that include electric discharge electricity
Source, framework, installation aluminium oxide ceramics rod array on said frame and plasma discharge tube, described framework includes putting down up and down
Two the first poly (methyl methacrylate) plates of row setting and multiple stay tubes of two described first poly (methyl methacrylate) plates of connection, described oxidation
Aluminum ceramic rod array and plasma discharge tube both pass through two described first poly (methyl methacrylate) plates, described plasma discharge tube position
Between described aluminium oxide ceramics rod array, described plasma discharge tube is connected with described discharge power supply.
The device of the plasma photon crystal of generation continuously adjustable Defect Modes the most according to claim 1, its feature
Being, described aluminium oxide ceramics rod array includes multiple aluminium oxide ceramics rod, and multiple described aluminium oxide ceramics rod is in triangular crystal lattice
Arrangement.
The device of the plasma photon crystal of generation continuously adjustable Defect Modes the most according to claim 2, its feature
It is, a diameter of 6mm, a length of 150mm of described aluminium oxide ceramics rod.
The device of the plasma photon crystal of generation continuously adjustable Defect Modes the most according to claim 1, its feature
It is, two interior electrodes that described plasma discharge tube includes sealed silica envelope, is located in described sealed silica envelope, described close
Envelope quartz ampoule in be filled with pressure be 650Pa, purity be the argon of 99.99%.
The device of the plasma photon crystal of generation continuously adjustable Defect Modes the most according to claim 4, its feature
Being, the pipe thickness of described sealed silica envelope is 1mm, external diameter is 12mm, a length of 250mm.
The device of the plasma photon crystal of generation continuously adjustable Defect Modes the most according to claim 1, its feature
Being, described stay tube is aluminum square tube, a length of 130mm of described stay tube.
The device of the plasma photon crystal of generation continuously adjustable Defect Modes the most according to claim 1, its feature
It is, is positioned at the bottom of described first poly (methyl methacrylate) plate of lower section and is closely fitted with the second poly (methyl methacrylate) plate, described second organic
The thickness of glass plate is 10mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620802527.0U CN205883684U (en) | 2016-07-28 | 2016-07-28 | Produce plasma photonic crystal's of humorous defect mould of continuously adjustable device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620802527.0U CN205883684U (en) | 2016-07-28 | 2016-07-28 | Produce plasma photonic crystal's of humorous defect mould of continuously adjustable device |
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| Publication Number | Publication Date |
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| CN205883684U true CN205883684U (en) | 2017-01-11 |
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| CN201620802527.0U Expired - Fee Related CN205883684U (en) | 2016-07-28 | 2016-07-28 | Produce plasma photonic crystal's of humorous defect mould of continuously adjustable device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106028614A (en) * | 2016-07-28 | 2016-10-12 | 苏州大学 | Device for producing continuous tunable defect mode plasma photonic crystals and method thereof |
| CN107105567A (en) * | 2017-07-03 | 2017-08-29 | 河北大学 | A kind of alternation plasma-discharge process |
-
2016
- 2016-07-28 CN CN201620802527.0U patent/CN205883684U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106028614A (en) * | 2016-07-28 | 2016-10-12 | 苏州大学 | Device for producing continuous tunable defect mode plasma photonic crystals and method thereof |
| CN106028614B (en) * | 2016-07-28 | 2018-09-25 | 苏州大学 | Generate the device and method of the plasma photon crystal of continuously adjustable Defect Modes |
| CN107105567A (en) * | 2017-07-03 | 2017-08-29 | 河北大学 | A kind of alternation plasma-discharge process |
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| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170111 Termination date: 20190728 |
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| CF01 | Termination of patent right due to non-payment of annual fee |