CN102012538A - Method for generating plasma photonic crystals with four indexes of refraction - Google Patents
Method for generating plasma photonic crystals with four indexes of refraction Download PDFInfo
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- CN102012538A CN102012538A CN 201010523218 CN201010523218A CN102012538A CN 102012538 A CN102012538 A CN 102012538A CN 201010523218 CN201010523218 CN 201010523218 CN 201010523218 A CN201010523218 A CN 201010523218A CN 102012538 A CN102012538 A CN 102012538A
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Abstract
The invention discloses a method for generating plasma photonic crystals with four indexes of refraction. A water electrode dielectric barrier discharge device is adopted, and the discharge conditions comprise that: (1) a discharge gap is made of quartz glass and has a square shape; (2) the discharge voltage magnitude is 6kV and the frequency is 53kHz; and (3) the air pressure of the discharge gap is 0.64*105Pa, and the argon content is 96 percent. By using water as an electrode in dielectric barrier discharge with a boundary, the plasma photonic crystals with four indexes of refraction consisting of a plasma column, a plasma sheet and an undischarged area through self assembly are obtained by regulating the discharge conditions. The plasma photonic crystals have wide application prospects in industrial production.
Description
Technical field
The present invention relates to method and two water electrode medium barrier discharge device that a kind of generation has four kinds of refraction rates plasma photonic, belong to plasma applicating technology field and optical field.
Background technology
Plasma photon crystal is the New-type photon crystal that a kind of plasma and other medium period arrangements form.The characteristics of plasma photon crystal maximum are to have space-time adjustable and photon band gap (Band gap).People can be by regulating the different space-time parameters of plasma photon crystal, comprise grating constant, specific inductive capacity, lattice symmetry, time cycle etc., change it and can be with position and width, and then the light that makes frequency fall into this band gap forbids propagating the control that realization is propagated the selection and the light of light frequency.Based on above characteristic, plasma photon crystal has widely in numerous electromagnetic wave controls fields such as wave filter, plasma antenna, photoswitch and plasma are stealthy and uses in recent years, gets more and more people's extensive concerning.
At present, owing to made technology limitation, conventional plasma photon crystal is generally two kinds of refractive indexes and alternately arranges and constitute, and symmetry is generally simple symmetric such as quadrilateral or hexagon, and range of application is narrower, and practicality is relatively poor.
The applicant formerly patent 200610048262.0 discloses a kind of water electrode medium barrier discharge device, and the applicant another formerly patent 200610102333.0 adopt above-mentioned water electrode medium barrier discharge device to realize the superlattice plasma photon crystal of three kinds of refractive index cycle arrangements first.But above-mentioned patented technology and the preparation of failing to realize having four kinds of refraction rates plasma photonic.
Summary of the invention
The technical problem to be solved in the present invention provides the method that a kind of generation has four kinds of refraction rates plasma photonic, in the dielectric barrier discharge of band edge circle, utilize water to do electrode, by regulating discharging condition, obtain by plasma column, plasma sheet and not the region of discharge self-organization form have four kinds of refraction rates plasma photonic.
For solving the problems of the technologies described above, the technical solution used in the present invention is:
A kind of generation has the method for four kinds of refraction rates plasma photonic, its basic structure of discharge device that adopts comprises the two symmetric closed dielectric container, discharging gap is set in the middle of two dielectric containers, inject water in the dielectric container and form sparking electrode, the sparking electrode lead-in wire is set in the dielectric container simultaneously; Discharging condition is as follows: 1. square is made and be shaped as to discharging gap by quartz glass; 2. the sparking voltage amplitude is that 6kV, frequency are 53kHz; 3. discharge air-gap air pressure is 0.64 * 10
5Pa, argon content is 96%, wherein said discharge air-gap air pressure is the air pressure in the discharging gap sealed cavity.
As a kind of optimal technical scheme of the present invention, sealing argon gas and AIR MIXTURES in the described discharging gap.
Adopt the beneficial effect that technique scheme produced to be: the present invention and patent 200610102333.0(generation formerly have the method for three kinds of refraction rates plasma photonic) compare, has following beneficial effect: 1. variation more on the structure, testing result shows, under discharging condition of the present invention, can produce three kinds of plasma channels (comprising two kinds of plasma columns and a kind of plasma sheet), they and not region of discharge periodically arrange self-organization and form and to have four kinds of refraction rates plasma photonic, thereby, plasma photon crystal of the present invention not only contains the plasma column in the patent 200610102333.0 formerly, also include plasma sheet, for the research of plasma photon crystal provides more wide space; 2. preparation method of the present invention is easier in operation, need not repeatedly to change discharging condition, and fixing suitable discharge parameter can obtain to have four kinds of refraction rates plasma photonic, make the present invention more formerly technology more help commercial Application; 3. the prepared plasma photon crystal visualize more on analytical approach of the present invention, by direct measurement plasma emission spectroscopy, utilization reflects the different of refractive index to the mensuration of electron density and vibration temperature, can reflect change of refractive more intuitively.
Description of drawings
Fig. 1 is the synoptic diagram of electric discharge device used in the present invention; Among the figure, 1, dielectric container 2, discharging gap 3, the border 4 of discharging gap, sparking electrode lead-in wire;
Fig. 2 is the prepared practical photograph with four kinds of refraction rates plasma photonic of the present invention;
Fig. 3 is the prepared front elevational schematic with four kinds of refraction rates plasma photonic of the present invention;
Fig. 4 is the prepared schematic perspective view with four kinds of refraction rates plasma photonic of the present invention;
Fig. 5 is the ArI(2P that the A shown in Fig. 3,4, B, three kinds of plasma channels of C are launched
2→ 1S
5) broadening and the frequency displacement comparison diagram of spectrum line;
Fig. 6 is the nitrogen molecular second positive Bands crack (C that the A shown in Fig. 3,4, B, three kinds of plasma channels of C are launched
) comparison diagram of spectrum line.
Embodiment
Following examples describe the present invention in detail.
The present invention is the method that has three kinds of refraction rates plasma photonic in the applicant's the 200610102333.0(of patent formerly generation) the basis on realize by improving discharging condition.But the 200610048262.0(of patent formerly water electrode medium barrier discharge device of electric discharge device REFERENCE TO RELATED people of the present invention).
A kind of generation has the method for four kinds of refraction rates plasma photonic, its basic structure of discharge device that adopts comprises two symmetric closed dielectric container 1, in the middle of two dielectric containers 1 discharging gap 2 is set, sealing argon gas and AIR MIXTURES in this discharging gap 2, inject water in the dielectric container 1 and form sparking electrode, sparking electrode lead-in wire 4 is set in the dielectric container 1 simultaneously; Discharging condition is specific as follows: 1. square is made and be shaped as to discharging gap 2 by quartz glass; 2. the sparking voltage amplitude is that 6kV, frequency are 53kHz; 3. discharge air-gap air pressure is 0.64 * 10
5Pa, argon content is 96%, wherein said discharge air-gap air pressure is the air pressure in discharging gap 2 sealed cavities.
By the mensuration of electron density and vibration temperature being analyzed the refractive index of present embodiment products obtained therefrom, at first measure plasma emission spectroscopy, utilize ArI(2P
2→ 1S
5) Stark broadening and frequency displacement estimation electron density in the spectrum, and utilize the nitrogen molecular second positive Bands crack (C
) spectral measurement molecular vibration temperature; Measurement result is referring to accompanying drawing, Fig. 3 is the front elevational schematic of the plasma photon crystal of present embodiment, Fig. 4 is its schematic perspective view, among the figure, A is the plasma column that is positioned at the quadrilateral structure cell center of plasma photon crystal, B is the plasma column that is positioned at the quadrilateral structure cell summit of plasma photon crystal, and C is a plasma sheet, and D is the discharge off generation area; Fig. 5 is the ArI(2P that the A shown in Fig. 3,4, B, three kinds of plasma channels of C are launched
2→ 1S
5) broadening and the frequency displacement comparison diagram of spectrum line, the result shows that the electron density of these three kinds of plasma channels is descending to be A, B, C successively, according to the specific inductive capacity formula
, wherein
The specific inductive capacity that different as can be known electron densities is corresponding different, thereby further corresponding different refractive indexes, the respectively corresponding three kinds of refractive indexes of these three kinds of plasma channels, they and not the region of discharge self-organization form and have four kinds of refraction rates plasma photonic; Fig. 6 is the nitrogen molecular second positive Bands crack (C that the A shown in Fig. 3,4, B, three kinds of plasma channels of C are launched
) comparison diagram of spectrum line, by calculating as can be known, the vibration temperature of these three kinds of plasma channels is descending to be C, B, A successively.
The plasma photon crystal of present embodiment preparation is because the electron density in the plasma channel is all 10
15Cm
-3Magnitude, theoretical research show that so high electron density is enough to make plasma photon crystal bandgap structure to occur, stop the propagation of some frequencies of light, play the effect of frequency selectivity photoswitch; When not having discharge generation, the light of all frequencies can pass through, and when discharging condition suitable, form behind the plasma photon crystal owing to exist the forbidden band level structure to make the light of some frequency forbid propagating; The present invention is with a wide range of applications on commercial production.
Foregoing description only proposes as the enforceable technical scheme of the present invention, not as the single restrictive condition to its technical scheme itself.
Claims (2)
1. a generation has the method for four kinds of refraction rates plasma photonic, its basic structure of discharge device that adopts comprises two symmetric closed dielectric container (1), discharging gap (2) is set in the middle of two dielectric containers (1), inject water in the dielectric container (1) and form sparking electrode, in the dielectric container (1) sparking electrode lead-in wire (4) is set simultaneously; It is characterized in that discharging condition is as follows: 1. square is made and be shaped as to discharging gap (2) by quartz glass; 2. the sparking voltage amplitude is that 6kV, frequency are 53kHz; 3. discharge air-gap air pressure is 0.64 * 10
5Pa, argon content is 96%, wherein said discharge air-gap air pressure is the air pressure in discharging gap (2) sealed cavity.
2. generation according to claim 1 has the method for four kinds of refraction rates plasma photonic, it is characterized in that: sealing argon gas and AIR MIXTURES in the described discharging gap (2).
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| CN2010105232187A CN102012538B (en) | 2010-10-28 | 2010-10-28 | Method for generating plasma photonic crystals with four indexes of refraction |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102213796A (en) * | 2011-06-15 | 2011-10-12 | 河北大学 | Method and special device for generating time oscillation plasma photonic crystal |
| CN102565939A (en) * | 2012-01-10 | 2012-07-11 | 河北大学 | Device and method for generating nested plasma photonic crystals with multiple structures |
| CN105223648A (en) * | 2015-10-30 | 2016-01-06 | 河北大学 | The apparatus and method of a kind of generation three layers of plasma photon crystal |
| CN106908862A (en) * | 2017-04-28 | 2017-06-30 | 河北大学 | A kind of device of generation gas with various temperature plasma photonic crystal |
| CN107037506A (en) * | 2017-04-28 | 2017-08-11 | 河北大学 | A kind of method for producing gas with various temperature plasma photonic crystal |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1937881A (en) * | 2006-09-12 | 2007-03-28 | 河北大学 | Water electrode medium barrier discharge device |
| CN101013163A (en) * | 2006-12-28 | 2007-08-08 | 河北大学 | Method for generating plasma photon crystal having three refractivities |
| WO2010023925A1 (en) * | 2008-09-01 | 2010-03-04 | 独立行政法人科学技術振興機構 | Plasma etching method, plasma etching device and photonic crystal manufacturing method |
-
2010
- 2010-10-28 CN CN2010105232187A patent/CN102012538B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1937881A (en) * | 2006-09-12 | 2007-03-28 | 河北大学 | Water electrode medium barrier discharge device |
| CN101013163A (en) * | 2006-12-28 | 2007-08-08 | 河北大学 | Method for generating plasma photon crystal having three refractivities |
| WO2010023925A1 (en) * | 2008-09-01 | 2010-03-04 | 独立行政法人科学技術振興機構 | Plasma etching method, plasma etching device and photonic crystal manufacturing method |
Non-Patent Citations (3)
| Title |
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| 《光学技术》 20040531 李伟等 等离子体光子晶体 263-266 1-2 第30卷, 第3期 2 * |
| 《光电工程》 20100228 刘菘等 可调缺陷层等离子体光子晶体的滤波特性分析 146-150 1-2 第37卷, 第2期 2 * |
| 《北京理工大学学报》 20090831 范伟丽等 超晶格结构等离子体光子晶体 173-175 1-2 第29卷, 第增刊2期 2 * |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102213796A (en) * | 2011-06-15 | 2011-10-12 | 河北大学 | Method and special device for generating time oscillation plasma photonic crystal |
| CN102213796B (en) * | 2011-06-15 | 2013-05-15 | 河北大学 | Method and special device for generating time oscillation plasma photonic crystal |
| CN102565939A (en) * | 2012-01-10 | 2012-07-11 | 河北大学 | Device and method for generating nested plasma photonic crystals with multiple structures |
| CN102565939B (en) * | 2012-01-10 | 2013-04-17 | 河北大学 | Device and method for generating nested plasma photonic crystals with multiple nesting structures |
| CN105223648A (en) * | 2015-10-30 | 2016-01-06 | 河北大学 | The apparatus and method of a kind of generation three layers of plasma photon crystal |
| CN106908862A (en) * | 2017-04-28 | 2017-06-30 | 河北大学 | A kind of device of generation gas with various temperature plasma photonic crystal |
| CN107037506A (en) * | 2017-04-28 | 2017-08-11 | 河北大学 | A kind of method for producing gas with various temperature plasma photonic crystal |
| CN107037506B (en) * | 2017-04-28 | 2018-11-06 | 河北大学 | A method of generating gas with various temperature plasma photonic crystal |
| CN106908862B (en) * | 2017-04-28 | 2019-01-01 | 河北大学 | A kind of device generating gas with various temperature plasma photonic crystal |
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| CN102012538B (en) | 2012-01-11 |
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