CN106893993A - 溅射镀膜设备及其镀膜腔室 - Google Patents
溅射镀膜设备及其镀膜腔室 Download PDFInfo
- Publication number
- CN106893993A CN106893993A CN201710136620.1A CN201710136620A CN106893993A CN 106893993 A CN106893993 A CN 106893993A CN 201710136620 A CN201710136620 A CN 201710136620A CN 106893993 A CN106893993 A CN 106893993A
- Authority
- CN
- China
- Prior art keywords
- pedestal
- support
- coating chamber
- sample
- antetheca
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710136620.1A CN106893993B (zh) | 2017-03-08 | 2017-03-08 | 溅射镀膜设备及其镀膜腔室 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710136620.1A CN106893993B (zh) | 2017-03-08 | 2017-03-08 | 溅射镀膜设备及其镀膜腔室 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106893993A true CN106893993A (zh) | 2017-06-27 |
CN106893993B CN106893993B (zh) | 2019-01-25 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710136620.1A Active CN106893993B (zh) | 2017-03-08 | 2017-03-08 | 溅射镀膜设备及其镀膜腔室 |
Country Status (1)
Country | Link |
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CN (1) | CN106893993B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109136857A (zh) * | 2018-09-18 | 2019-01-04 | 武汉科瑞达真空科技有限公司 | 一种新型连续蒸发镀膜生产线 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201116306Y (zh) * | 2007-10-24 | 2008-09-17 | 钰衡科技股份有限公司 | 连续式镀膜设备的自转载具 |
US20080276451A1 (en) * | 2007-05-09 | 2008-11-13 | Solyndra, Inc. | Method of and apparatus for inline deposition of materials on a non-planar surface |
CN102560408A (zh) * | 2012-01-20 | 2012-07-11 | 纳峰真空镀膜(上海)有限公司 | 连续真空镀膜装置 |
CN102598130A (zh) * | 2009-08-26 | 2012-07-18 | 威科仪器股份有限公司 | 用于在磁记录介质上制作图案的系统 |
CN104611676A (zh) * | 2015-01-12 | 2015-05-13 | 宜昌南玻显示器件有限公司 | 磁控溅射镀膜设备及ito玻璃的制备方法 |
CN105980594A (zh) * | 2014-01-14 | 2016-09-28 | A·K·希萨莫夫 | 薄膜涂覆方法及实施该方法的生产线 |
CN106048551A (zh) * | 2016-07-19 | 2016-10-26 | 沈阳大学 | 真空镀膜机工件托架 |
-
2017
- 2017-03-08 CN CN201710136620.1A patent/CN106893993B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080276451A1 (en) * | 2007-05-09 | 2008-11-13 | Solyndra, Inc. | Method of and apparatus for inline deposition of materials on a non-planar surface |
CN201116306Y (zh) * | 2007-10-24 | 2008-09-17 | 钰衡科技股份有限公司 | 连续式镀膜设备的自转载具 |
CN102598130A (zh) * | 2009-08-26 | 2012-07-18 | 威科仪器股份有限公司 | 用于在磁记录介质上制作图案的系统 |
CN102560408A (zh) * | 2012-01-20 | 2012-07-11 | 纳峰真空镀膜(上海)有限公司 | 连续真空镀膜装置 |
CN105980594A (zh) * | 2014-01-14 | 2016-09-28 | A·K·希萨莫夫 | 薄膜涂覆方法及实施该方法的生产线 |
CN104611676A (zh) * | 2015-01-12 | 2015-05-13 | 宜昌南玻显示器件有限公司 | 磁控溅射镀膜设备及ito玻璃的制备方法 |
CN106048551A (zh) * | 2016-07-19 | 2016-10-26 | 沈阳大学 | 真空镀膜机工件托架 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109136857A (zh) * | 2018-09-18 | 2019-01-04 | 武汉科瑞达真空科技有限公司 | 一种新型连续蒸发镀膜生产线 |
CN109136857B (zh) * | 2018-09-18 | 2020-10-02 | 武汉科瑞达真空科技有限公司 | 一种新型连续蒸发镀膜生产线 |
Also Published As
Publication number | Publication date |
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CN106893993B (zh) | 2019-01-25 |
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PB01 | Publication | ||
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GR01 | Patent grant | ||
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TR01 | Transfer of patent right |
Effective date of registration: 20190603 Address after: 710000 Building No. 2, Unit 23, Unit 1 2301, Wangzu Qujiang No. 2, South Jinhua Road, South Huangqutou South Road, South of Yanxiang Road, Qujiang New Area, Xi'an City, Shaanxi Province Patentee after: Xi'an Lianzhong Yijian Beauty Building Engineering Management Co.,Ltd. Address before: 518055 No. 1068, Xue Yuan Avenue, Xili University Town, Nanshan District, Shenzhen, Guangdong Patentee before: SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY |
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CP03 | Change of name, title or address |
Address after: 710000 Floor 26, Qujiang C Block, Wangzuo, Yanxiang Road, Qujiang New Area, Xi'an City, Shaanxi Province Patentee after: Xi'an Zhongyijian Technology Co.,Ltd. Address before: 710000 Building No. 2, Unit 23, Unit 1 2301, Wangzu Qujiang No. 2, South Jinhua Road, South Huangqutou South Road, South of Yanxiang Road, Qujiang New Area, Xi'an City, Shaanxi Province Patentee before: Xi'an Lianzhong Yijian Beauty Building Engineering Management Co.,Ltd. |
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CP03 | Change of name, title or address | ||
CP01 | Change in the name or title of a patent holder |
Address after: 710000 Floor 26, Qujiang C Block, Wangzuo, Yanxiang Road, Qujiang New Area, Xi'an City, Shaanxi Province Patentee after: Xi'an Zhongyijian Technology Group Co.,Ltd. Address before: 710000 Floor 26, Qujiang C Block, Wangzuo, Yanxiang Road, Qujiang New Area, Xi'an City, Shaanxi Province Patentee before: Xi'an Zhongyijian Technology Co.,Ltd. |
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CP01 | Change in the name or title of a patent holder |