CN106757360A - 磷化铟多晶水平合成装置及压力平衡控制方法 - Google Patents
磷化铟多晶水平合成装置及压力平衡控制方法 Download PDFInfo
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- CN106757360A CN106757360A CN201611227646.9A CN201611227646A CN106757360A CN 106757360 A CN106757360 A CN 106757360A CN 201611227646 A CN201611227646 A CN 201611227646A CN 106757360 A CN106757360 A CN 106757360A
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B28/00—Production of homogeneous polycrystalline material with defined structure
- C30B28/04—Production of homogeneous polycrystalline material with defined structure from liquids
- C30B28/06—Production of homogeneous polycrystalline material with defined structure from liquids by normal freezing or freezing under temperature gradient
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
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Claims (7)
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CN201611227646.9A CN106757360B (zh) | 2016-12-27 | 2016-12-27 | 磷化铟多晶水平合成装置及压力平衡控制方法 |
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CN201611227646.9A CN106757360B (zh) | 2016-12-27 | 2016-12-27 | 磷化铟多晶水平合成装置及压力平衡控制方法 |
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CN106757360A true CN106757360A (zh) | 2017-05-31 |
CN106757360B CN106757360B (zh) | 2023-10-03 |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107434244A (zh) * | 2017-09-13 | 2017-12-05 | 南京金美镓业有限公司 | 一种磷化铟合成装置的复合热屏蔽结构 |
CN107604440A (zh) * | 2017-09-13 | 2018-01-19 | 南京金美镓业有限公司 | 一种抑制石英容器对磷化铟熔体污染的方法 |
CN107747125A (zh) * | 2017-09-20 | 2018-03-02 | 广东先导先进材料股份有限公司 | 磷化铟多晶合成的压力控制装置及方法 |
CN107829141A (zh) * | 2017-11-10 | 2018-03-23 | 北京鼎泰芯源科技发展有限公司 | 富铟磷化铟多晶料的循环利用方法 |
CN114808129A (zh) * | 2021-01-21 | 2022-07-29 | 陕西铟杰半导体有限公司 | 一种用于磷化铟多晶生长的加热装置 |
CN114808120A (zh) * | 2021-01-19 | 2022-07-29 | 铟杰(上海)半导体技术有限公司 | 一种磷化铟多晶生产的压力控制装置及方法 |
Citations (5)
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---|---|---|---|---|
US4783320A (en) * | 1985-11-25 | 1988-11-08 | The United States Of America As Represented By The Secretary Of The Air Force | Rapid synthesis of indium phosphide |
JPH07257998A (ja) * | 1994-02-07 | 1995-10-09 | Sumitomo Metal Mining Co Ltd | リン化ガリウム多結晶の製造方法及びその装置 |
CN101905137A (zh) * | 2010-07-26 | 2010-12-08 | 中国计量学院 | 石英管内外气压平衡反应装置 |
CN201873774U (zh) * | 2010-12-03 | 2011-06-22 | 北京有色金属研究总院 | 一种用于合成GaAs半导体的水平合成炉 |
CN102337583A (zh) * | 2011-11-04 | 2012-02-01 | 湖南顶立科技有限公司 | 一种晶体硅铸锭炉压力控制系统及方法 |
-
2016
- 2016-12-27 CN CN201611227646.9A patent/CN106757360B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4783320A (en) * | 1985-11-25 | 1988-11-08 | The United States Of America As Represented By The Secretary Of The Air Force | Rapid synthesis of indium phosphide |
JPH07257998A (ja) * | 1994-02-07 | 1995-10-09 | Sumitomo Metal Mining Co Ltd | リン化ガリウム多結晶の製造方法及びその装置 |
CN101905137A (zh) * | 2010-07-26 | 2010-12-08 | 中国计量学院 | 石英管内外气压平衡反应装置 |
CN201873774U (zh) * | 2010-12-03 | 2011-06-22 | 北京有色金属研究总院 | 一种用于合成GaAs半导体的水平合成炉 |
CN102337583A (zh) * | 2011-11-04 | 2012-02-01 | 湖南顶立科技有限公司 | 一种晶体硅铸锭炉压力控制系统及方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107434244A (zh) * | 2017-09-13 | 2017-12-05 | 南京金美镓业有限公司 | 一种磷化铟合成装置的复合热屏蔽结构 |
CN107604440A (zh) * | 2017-09-13 | 2018-01-19 | 南京金美镓业有限公司 | 一种抑制石英容器对磷化铟熔体污染的方法 |
CN107747125A (zh) * | 2017-09-20 | 2018-03-02 | 广东先导先进材料股份有限公司 | 磷化铟多晶合成的压力控制装置及方法 |
CN107829141A (zh) * | 2017-11-10 | 2018-03-23 | 北京鼎泰芯源科技发展有限公司 | 富铟磷化铟多晶料的循环利用方法 |
CN114808120A (zh) * | 2021-01-19 | 2022-07-29 | 铟杰(上海)半导体技术有限公司 | 一种磷化铟多晶生产的压力控制装置及方法 |
CN114808129A (zh) * | 2021-01-21 | 2022-07-29 | 陕西铟杰半导体有限公司 | 一种用于磷化铟多晶生长的加热装置 |
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CN106757360B (zh) | 2023-10-03 |
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Inventor after: Zhao Youwen Inventor after: Duan Manlong Inventor before: Yang Cuibai Inventor before: Zhao Youwen Inventor before: Duan Manlong Inventor before: Chen Bingzhen Inventor before: Liu Tong Inventor before: Lu Wei Inventor before: Yang Jun |
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Effective date of registration: 20170807 Address after: 100080 Haidian District street, Haidian, building B, block 10, level 340, level 3, Applicant after: BEIJING DINGTAI XINYUAN TECHNOLOGY DEVELOPMENT Co.,Ltd. Address before: 519085 Guangdong province Zhuhai city road two Jinding Industrial Area high-tech zone on the south side of A1 building, Rui Applicant before: ZHUHAI DINGTAI XINYUAN CRYSTAL CO.,LTD. |
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Effective date of registration: 20170823 Address after: 519085 Guangdong province Zhuhai city road two Jinding Industrial Area high-tech zone on the south side of A1 building, Rui Applicant after: ZHUHAI DINGTAI XINYUAN CRYSTAL CO.,LTD. Address before: 100080 Haidian District street, Haidian, building B, block 10, level 340, level 3, Applicant before: BEIJING DINGTAI XINYUAN TECHNOLOGY DEVELOPMENT Co.,Ltd. |
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