CN106646681A - Photonic crystal nano-fluid sensor, preparation method and application thereof - Google Patents
Photonic crystal nano-fluid sensor, preparation method and application thereof Download PDFInfo
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Abstract
The present invention belongs to the sensor field and discloses a micro-electro-mechanical system-based photonic crystal nano-fluid sensor. The micro-electro-mechanical system-based photonic crystal nano-fluid sensor includes a photoresist layer, a silicon wafer substrate, a first refractive index material film layer, a second refractive index material film layer and a polymer material sealing layer; the top of the second refractive index material film layer is provided with a square waveform gate structure; the gate structure includes a plurality of through grooves and a plurality of protrusions, wherein the through grooves and the protrusions are arranged alternately; the photoresist layer, the silicon wafer substrate, the first refractive index material film layer and the second refractive index material film layer commonly form a sensor base body layer; and a fluid inlet and a fluid outlet are arranged on the sensor base body layer. The sensor of the invention is a photonic crystal-based nano-fluid sensor. With the sensor adopted, the problems of high quantity of consumed detection objects, long detection time and low test precision of a traditional photonic crystal sensor can be solved, and the problems of functional singleness, instable structure and few channels of a traditional nano-fluid sensor can be solved.
Description
Technical field
The invention belongs to sensor field, more particularly, to a kind of photonic crystal nanometer fluid sensor, its preparation side
Method and application.
Background technology
Photonic crystal and nanometer fluid passage be two classes in biochemistry, life science and medical field it is widely studied with
Using emerging sensor.Photonic crystal be it is a kind of by different refractivity coefficient material constituted with periodic grating knot
Structure, its intermediate layer is made up of the higher material of relative rate coefficient.According to material, screen periods and photon crystal structure
Difference, and because of the presence of photon band gap so that photonic crystal can couple generation resonance with the light wave of CF and then change
The direction of propagation of resonance wave；Meanwhile, strengthen can the local electric field of optical grating construction with the light wave of photonic crystal resonance.Photon is brilliant
Body sensor is detected with the reciprocation of analyte using surface grating region, is characterized in not disturbing analyte
Or destruction, can realize without label detection according to the deviant of resonance crest.Professor Cunningham in the U.S. favorably uses up
Sub- crystal carries out a series of biochemical molecule detections (U.S.Patent 6,990,259 [P], U.S.Patent as sensor
7,742,662[P]).Nano fluid sensor has small volume, while table bulk area can promote in nanometer fluid passage than big
The nanometer fluid passage inner surface of analyte grating in the short period of time tested.In the recent period, many research institutions, application
Patent prepared by nano-fluid, and carried out with nano fluid sensor biochemical analysis experiment (U.S.Patent 8,105,
471 [P]), the correlation properties of nano-fluid make it easier to carry out low concentration small molecule, protein, gene and DNA detection, have
The characteristics of accuracy of detection is high and time-consuming few
But, the weak point of photonic crystal class sensor is not high for the detection longer, limit detectable concentration of required time, especially
It is the field that molecule combination is needed in bioprotein molecule, antigen and genetic test etc.；Meanwhile, nanometer fluid passage structure
Making require harsh, have that preparation difficulty is big, high cost, the low feature of yield rate.How high-precision low cost is produced completely
The nanometer fluid passage of sufficient demand is the key technology problem of nano-sensor development field.Meanwhile, how to improve low concentration little
Molecular Detection precision, reduction detection time are the main bugbears of current photonic crystal sensors field face.
The content of the invention
For the disadvantages described above or Improvement requirement of prior art, the invention provides a kind of photonic crystal nanometer sensing fluid flow
Device, its preparation method and application, two kinds of technologies of photonic crystal and nanometer fluid passage are combined, and are constructed brilliant based on photon
The nano fluid sensor of body structure；Photonic crystal is integrated among nano-fluid, photonic crystal can be made full use of and received
The good characteristic of rice fluid passage, while detection zone is defined in the micro of nanometer fluid passage, can be more accurately
The correlation properties of detection study object.
For achieving the above object, it is proposed, according to the invention, there is provided a kind of photonic crystal nanometer based on microelectromechanical systems
Fluid sensor, it is characterised in that the photonic crystal nanometer fluid sensor includes being set gradually according to order from the bottom to top
Photoresist layer, silicon wafer substrate, first refractive index material film layers, the second refraction materials film layer and polymeric material envelope
Layer is connect, the top of the second refraction materials film layer is provided with the optical grating construction of square waveform, and the optical grating construction includes many
Individual groove and it is multiple raised and they be alternately arranged, the bottom of the raised top and the first refractive index material film layers
End contact, the photoresist layer, silicon wafer substrate, first refractive index material film layers and the second refraction materials film layer are total to
With sensor base layer is constituted, the flow inlet that connects with all grooves is provided with the sensor base layer and goes out head piece.
Preferably, the thickness h of described first refractive index material film layers1For 1 μm -5 μm, the second refraction materials film
Layer thickness h2For 50nm-500nm, noble metal film layer thickness h3For 10nm-50nm, photosensitive material thin film layer thickness h4For
200nm-500nm, photoresist layer thickness h6For 1 μm -3 μm.
Preferably, the first refractive index material is SiO2Or SiOxNy。
Preferably, the polymeric material be PDMS, PMMA or SU8 glue.
Preferably, the second refraction materials film is ZnS, Si3N4, TiO2, ZnO or tellurate glass.
Preferably, the second refraction materials film layer visible light wave range specific refractivity is ng, first refractive index material
The visible light wave range specific refractivity of material film layer is nl, the visible light wave range specific refractivity of optical grating construction is nc, polymeric material
The visible light wave range specific refractivity of the bed of material is nup, effective visible light wave range refractive index system of photonic crystal nanometer fluid sensor
Number is neff, and they meet following relation：
max{nl, nc, nup}<neff<ng
Wherein, max represents the maximum in be possible to value.
Preferably, the visible light wave range specific refractivity of the first refractive index material film layers is
1.4-1.6, the visible light wave range refraction coefficient of the second refraction materials film layer is 1.8-2.8, described poly-
The visible light wave range specific refractivity of compound is 1.4-1.6.
According to another aspect of the present invention, a kind of preparation method of photonic crystal nanometer fluid sensor is additionally provided,
Characterized in that, comprising the following steps：
(1) first refractive index material film layers are deposited：First refractive index material is deposited on into the upper surface of silicon wafer substrate
And make first refractive index material be paved with the upper surface of the silicon wafer substrate, thickness is obtained for h1First refractive index material film
Layer, wherein, the length of the silicon wafer substrate, width and height are respectively a, b and h0；
(2) the second refraction materials film layer is deposited：Second refraction materials are deposited on into the upper of first refractive index material
Surface simultaneously makes the second refraction materials be paved with the upper surface of the first refractive index material film layers, obtains thickness for h2Second
Refraction materials film layer, the visible light wave range specific refractivity of the second refraction materials film layer is more than first folding
Penetrate the visible light wave range specific refractivity of rate material film layers；
(3) sputter noble metal film layer：By noble metal sputter is in the upper surface of the second refraction materials film layer and makes institute
The upper surface that noble metal is paved with the second refraction materials film layer is stated, thickness is obtained for h3Noble metal film layer；
(4) gluing：Photosensitive material is spin-coated on into the upper surface of noble metal film layer and to be paved with the photosensitive material described
The upper surface of noble metal film layer, obtains thickness for h4Photosensitive material thin film layer, the photosensitive material thin film layer, noble metal are thin
Film layer and the second refraction materials film layer collectively form nano-fluid circulation layer；
(5) nano-fluid circulation layer is etched：By direction etching from top to bottom, etch on nano-fluid circulation layer
Go out a plurality of groove being parallel to each other, so as to form one raised by each groove, all grooves and all projection sides of being collectively forming
The optical grating construction of waveform, wherein, the height of the groove is h5And h3+h4＜ h5＜ h2+h3+h4；
(6) post-process：Photosensitive material thin film layer is removed using organic solvent, and using the noble metal of noble metal solvent cleaning
Film layer；
(7) etching is imported and exported：Photoresist is spin-coated on into the bottom surface of the silicon wafer substrate and the silicon wafer chip base is paved with
The lower surface at bottom, so as to form thickness for h6Photoresist layer, the photoresist layer, silicon wafer substrate, first refractive index material
Film layer and the second refraction materials film layer collectively form sensor base layer, then by direction from bottom to up, etch and lose
Wear the sensor base layer, so as to etch on the sensor base layer flow inlet that connects with all grooves and with
What all grooves were connected goes out head piece；
(8) sealing-in：Sealing-in is carried out in the upper surface paving one layer of polymeric material of the second refraction materials film layer, is gathered
Compound material sealing layer, the length and width of the polymeric material sealing layer is respectively a and b.
Preferably, in step (5), first etching and photosensitive material thin film layer described in eating thrown, obtain a plurality of first groove, then
Per the groove of bar first, etching and noble metal film layer described in eating thrown, obtain a plurality of second groove, then again described in every etching
Second refraction materials film layer, obtains a plurality of 3rd groove, first groove of corresponding position, the second groove and the 3rd
Groove is collectively forming the groove.
According to another aspect of the present invention, photonic crystal nanometer fluid sensor test nano-fluid concentration is additionally provided
Method, it is characterised in that comprise the following steps：
(1) nano-fluid is imported in the photonic crystal nanometer fluid sensor by flow inlet, then whole photon is brilliant
The effective refractive index coefficient n of body nano fluid sensor sensoreffCan rise；
(2) it is brilliant to photon using a branch of coaxial polarized white light vertical incidence after nano-fluid is completely into all grooves
The upper surface of body nano fluid sensor, using spectrometer with incident light identical path on receive reflecting light, then in light
A branch of resonance light wave is collected on spectrometer, the crest value of the light wave that resonates is λm, by λmThe frequency displacement variable quantity of value can then obtain nanometer
The concentration of fluid.
In general, by the contemplated above technical scheme of the present invention compared with prior art, can obtain down and show
Beneficial effect：
1) sensor prepared by is, based on the nano fluid sensor of photonic crystal, successfully to solve traditional photon brilliant
Body sensor consumption detectable substance is excessive, the problem that detection time length, measuring accuracy be not high, meanwhile, also eliminate Conventional nano stream
The few problem of body sensor single function, structural instability, passage；
2) prepare that sensor adopts for the associated materials and process program based on MEMS, the dimensional accuracy of preparation is high, material
The chemical inertness of material is high, physical arrangement is stable, can make prepared sensor and initial design with very high consistent
Property；
3) detected material can be directly entered all grooves by passing in and out head piece, and the effective refractive index coefficient for making sensor is sent out
Changing, so as to the huge table bulk area ratio for being dependent on nanometer fluid passage is used for quickly detecting, detects real-time, sensitivity
It is high；
4) there is significant humidification in the optical grating construction local area electric field of photonic crystal nanometer fluid sensor, work as utilization
When sensor carries out fluorescence analysis experiment, Fluorescence Increasing effect substantially, survey by the limting concentration for being advantageously implemented low concentration small molecule
Examination；
5) photonic crystal nanometer fluid sensor Stability Analysis of Structures, possess photonic crystal without label detection performance and local
Electric-field enhancing characteristic, while detection zone is defined in the micro of nanometer fluid passage.
Description of the drawings
Fig. 1 (a)～Fig. 1 (j) is that the present invention prepares each object that the technique of photonic crystal nanometer fluid sensor is obtained
Schematic diagram, wherein Fig. 1 (a)～Fig. 1 (d) is the schematic diagram for extracting nano-fluid circulation layer, and Fig. 1 (e)～Fig. 1 (g) receives for etching
The schematic diagram of meter Liu Ti circulation layers, Fig. 1 (h) is the schematic diagram for removing residue；Fig. 1 (i)～Fig. 1 (j) is to form import and go out
The process of product, it is to eventually pass through the schematic diagram after encapsulation to scheme (k)；
Fig. 2 (a)～Fig. 2 (c) is respectively in the present invention front view of photonic crystal nanometer fluid sensor, right view and faces upward
View.
Fig. 3 is the axonometric drawing of photonic crystal nanometer fluid sensor in the present invention.
Fig. 4 is the SEM ESEM views of the photonic crystal nanometer fluid sensor of one embodiment of the invention：A () is
The optical grating construction figure that electron beam lithography photosensitive material is formed；B () is formed by the noble metal film layer of reactive ion beam etching (RIBE)
Metal grating structure；C () is tied by the photon crystal grating that the second refraction materials film layer of reactive ion beam etching (RIBE) is formed
Structure.
Fig. 5 is the reflection resonance wavelength collection of illustrative plates of photonic crystal nanometer fluid sensor in the present invention.
Specific embodiment
In order that the objects, technical solutions and advantages of the present invention become more apparent, it is right below in conjunction with drawings and Examples
The present invention is further elaborated.It should be appreciated that specific embodiment described herein is only to explain the present invention, and
It is not used in the restriction present invention.As long as additionally, technical characteristic involved in invention described below each embodiment
Not constituting conflict each other just can be mutually combined.
With reference to Fig. 1～Fig. 3, a kind of photonic crystal nanometer fluid sensor based on microelectromechanical systems, the photon is brilliant
Body nano fluid sensor includes photoresist layer 14, silicon wafer substrate 1, the first folding set gradually according to order from the bottom to top
Penetrate rate material film layers 2, the second refraction materials film layer 3 and polymeric material sealing layer 4, and their length and width
Equal, the top of the second refraction materials film layer 3 is provided with the optical grating construction of square waveform, and the optical grating construction includes
Multiple grooves and it is multiple raised and they be alternately arranged, the raised top and the first refractive index material film layers 2
Bottom face contact, the photoresist layer 14, silicon wafer substrate 1, the refraction materials of first refractive index material film layers 2 and second
Film layer 3 collectively forms sensor base layer, and on the sensor base layer flow inlet connected with all grooves is provided with
10 and go out head piece 11.
According to another aspect of the present invention, the preparation side of described photonic crystal nanometer fluid sensor is additionally provided
Method, comprises the following steps：
(1) first refractive index material film layers 2 are deposited：With reference to Fig. 1 (a), using chemical vapour deposition technique, by first refractive
Rate material is deposited on the upper surface of silicon wafer substrate 1 and makes first refractive index material be paved with the upper surface of the silicon wafer substrate 1,
Thickness is obtained for h1First refractive index material film layers 2, wherein, the length of the silicon wafer substrate 1, width and height are respectively
For a, b and h0；
(2) the second refraction materials film layer 3 is deposited：With reference to Fig. 1 (b), using chemical vapour deposition technique, by the second refraction
Rate material is deposited on the upper surface of first refractive index material and to make the second refraction materials be paved with the first refractive index material thin
The upper surface of film layer 2, obtains thickness for h2The second refraction materials film layer 3, the second refraction materials film layer 3
Visible light wave range specific refractivity of the visible light wave range specific refractivity more than the first refractive index material film layers 2；
(3) sputter noble metal film layer 12：With reference to Fig. 1 (c), cladding process is sputtered using electro beam physics, noble metal is splashed
It is plated in the upper surface of the second refraction materials film layer 3 and makes the noble metal be paved with the second refraction materials film layer 3
Upper surface, obtain thickness for h3Noble metal film layer 12；
(4) gluing：With reference to Fig. 1 (d), photosensitive material is spin-coated on into the upper surface of noble metal film layer 12 and is made described photosensitive
Material is paved with the upper surface of the noble metal film layer 12, obtains thickness for h4Photosensitive material thin film layer 13, the photosensitive material
Material film layer 13, the refraction materials film layer 3 of noble metal film layer 12 and second collectively form nano-fluid circulation layer；
(5) nano-fluid circulation layer is etched：With reference to Fig. 1 (e)～Fig. 1 (g), by direction etching from top to bottom, described
The a plurality of groove 7 being parallel to each other is etched on nano-fluid circulation layer, the width of groove 7 is b1, so as in each side shape of groove 7
Raised into one, raised width is b2, all grooves 7 and all projections be collectively forming the optical grating construction of square waveform, wherein, it is described
The height of groove 7 is h5And h3+h4＜ h5＜ h2+h3+h4, i.e. the non-eating thrown of the second refraction materials film layer, what it was etched
Partial height is h21, the height of non-etched portions is h22；Wherein, the etching of the second refraction materials film layer 3 highly affects
The effective refractive index coefficient for being ultimately formed sensor, therefore, different etching depth will produce different brilliant based on photon
The resonant wavelength of body, can be according to the change of etch thicknesses, the initial resonant wavelength gone needed for setting；
(6) post-process：With reference to Fig. 1 (h), photosensitive material thin film layer is removed using organic solvent, and using noble metal solvent
The noble metal film layer 12 of removing；Wherein, photosensitive material thin film layer is the nanometer grating structure graph mould for preparing required
Plate, noble metal film layer be for etch the second index film layer material, both at the material requested of preparation process,
It is not used to constitute sensor itself, so to dispose after again technique is completed；
(7) etching is imported and exported：With reference to Fig. 1 (i) and Fig. 1 (j)：Photoresist is spin-coated on into going to the bottom for the silicon wafer substrate 1
Face is simultaneously paved with the lower surface of the silicon wafer substrate 1, so as to form thickness for h6Photoresist layer 14, the photoresist layer 14,
Silicon wafer substrate 1, the refraction materials film layer of first refractive index material film layers 2 and second collectively form sensor base layer,
Again by direction from bottom to up, photoresist is etched using photoetching process, using deep reaction ibl etched silicon wafer base
Bottom, using reactive ion beam etching (RIBE) method etching first refractive index material film layers 2 and first refractive index material film layers 3, etching
And sensor base layer described in eating thrown, so as to etch the influent stream connected with all grooves 7 on the sensor base layer
Mouthfuls 10 and go out head piece 11 with all grooves 7 are connected, flow inlet 10, go out head piece 11 and all grooves 7 collectively form nanometer stream
Body passage；
(8) sealing-in：With reference to Fig. 1 (k), enter in the upper surface paving one layer of polymeric material of the second refraction materials film layer 3
Row sealing-in, obtains polymeric material sealing layer 4, and the length and width of the polymeric material sealing layer 4 is respectively a and b.
Further, in step (5), using electron beam lithography, first etching and photosensitive material thin film layer 13 described in eating thrown, obtain
To a plurality of first groove, reactive ion beam method is recycled, in etching and noble metal film layer described in eating thrown per the groove of bar first
12, a plurality of second groove is obtained, reactive ion beam etching (RIBE) method is then recycled, the second refraction materials film layer 3 is etched,
Obtain a plurality of 3rd groove, first groove of corresponding position, the second groove and the 3rd groove are collectively forming the groove
7, every groove 7 is exactly the passage of a nano-fluid flowing, therefore optical grating construction has plurality of passages.
Further, the thickness h of described first refractive index material film layers 21For 1 μm -5 μm, the second refraction materials are thin
The thickness h of film layer 32For 50nm-500nm, the thickness h of noble metal film layer 123For 10nm-50nm, the thickness h of photosensitive material thin film layer 134
For 200nm -500nm, the thickness h of photoresist layer 146For 1 μm -3 μm.
Further, the first refractive index material is SiO2Or SiOxNy。
Further, the polymeric material be PDMS, PMMA or SU8 glue.
Further, second refraction materials are ZnS, Si3N4, TiO2, ZnO or tellurate glass.
Further, when a branch of coaxial, polarization white light beam vertical incidence sensor, the resonant wavelength of its reflection is set to
λ0, the cycle of the optical grating construction of square waveform is Λ (cycle of the cycle reference square wave of optical grating construction), then meet following relation：
Λ×neff=λ0
Further, the visible light wave range specific refractivity of the second refraction materials film layer 3 is ng, first refractive index material
The visible light wave range specific refractivity of material film layer 2 is nl, the visible light wave range specific refractivity of optical grating construction is nc, polymer
The visible light wave range specific refractivity of material layer is nupAnd effective visible light wave range folding of photonic crystal nanometer fluid sensor
Rate coefficient is penetrated for neff, and they meet following relation：
max{nl, nc, nup}<neff<ng
Wherein, max represents the maximum in be possible to value.
By above-mentioned relation formula, the interval range of the final effective refractive index coefficient of sensor is may indicate that, so that system
Author at the beginning of design sensor, the value to effective refractive index coefficient, and being had by its sensor resonant wavelength for being determined
Individual accurate valuation scope.
Further, the visible light wave range refraction coefficient of the second refraction materials film layer 3 is
1.8-2.8, the visible light wave range specific refractivity of the first refractive index material film layers 2 is 1.4-1.6, described
The visible light wave range specific refractivity of polymer is 1.4-1.6.
According to another aspect of the present invention, a kind of photonic crystal nanometer fluid sensor is additionally provided, by the preparation
Method is made.
According to another aspect of the present invention, described photonic crystal nanometer fluid sensor test nanometer stream is additionally provided
The method of bulk concentration, comprises the following steps：
(1) nano-fluid is imported in the photonic crystal nanometer fluid sensor by flow inlet 10, then whole photon
The effective refractive index coefficient n of crystalline nanometric fluid sensor sensoreffCan rise；
(2) it is brilliant to photon using a branch of coaxial polarized white light vertical incidence after nano-fluid is completely into all grooves 7
The upper surface of body nano fluid sensor, using spectrometer with incident light identical path on receive reflecting light, then in light
A branch of resonance light wave is collected on spectrometer, the crest value of the light wave that resonates is λm, by λmThe frequency displacement variable quantity of value can then obtain nanometer
The concentration of fluid.
Fig. 4 is the surface sweeping electron microscope of the photonic crystal nanometer fluid sensor of the embodiment of the present invention, and Fig. 4 (a) is photosensitive material
The optical grating construction that material is formed Jing after electron beam lithography, Fig. 4 (b) is that precious metal material is formed after reactive ion beam etching (RIBE)
Optical grating construction, Fig. 4 (c) is the screen periods structure chart formed after the reacted ion beam etching of the second refraction materials.
Fig. 5 is the resonant wavelength collection of illustrative plates of the photonic crystal nanometer fluid sensor of the embodiment of the present invention.As seen from the figure, exist
The resonance spectrum of two different frequencies.When photonic crystal the second refraction materials film layer 3 thickness more than 300nm when, its
High order resonance spectrum can manifest.
As it will be easily appreciated by one skilled in the art that the foregoing is only presently preferred embodiments of the present invention, not to
The present invention, all any modification, equivalent and improvement made within the spirit and principles in the present invention etc. are limited, all should be included
Within protection scope of the present invention.
Claims (10)
1. a kind of photonic crystal nanometer fluid sensor based on microelectromechanical systems, it is characterised in that the photonic crystal nano
Rice fluid sensor includes photoresist layer, silicon wafer substrate, the first refractive index material set gradually according to order from the bottom to top
Material film layer, the second refraction materials film layer and polymeric material sealing layer, the top of the second refraction materials film layer
End is provided with the optical grating construction of square waveform, the optical grating construction include multiple grooves and it is multiple raised and they be alternately arranged,
The raised top contacts with the bottom face of the first refractive index material film layers, the photoresist layer, silicon wafer substrate,
First refractive index material film layers and the second refraction materials film layer collectively form sensor base layer, the sensor base
The flow inlet that connects with all grooves is provided with layer and goes out head piece.
2. photonic crystal nanometer fluid sensor according to claim 1, it is characterised in that described first refractive index material
The thickness h of material film layer1For 1 μm -5 μm, the second refraction materials thin film layer thickness h2For 50nm-500nm, noble metal film layer
Thickness h3For 10nm-50nm, photosensitive material thin film layer thickness h4For 200nm-500nm, photoresist layer thickness h6For 1 μm -3 μm.
3. photonic crystal nanometer fluid sensor according to claim 1, it is characterised in that the first refractive index material
For SiO2Or SiOxNy。
4. photonic crystal nanometer fluid sensor according to claim 1, it is characterised in that the polymeric material is
PDMS, PMMA or SU8 glue.
5. photonic crystal nanometer fluid sensor according to claim 1, it is characterised in that second refraction materials
Film is ZnS, Si3N4, TiO2, ZnO or tellurate glass.
6. photonic crystal nanometer fluid sensor according to claim 1, it is characterised in that second refraction materials
Film layer visible light wave range specific refractivity is ng, the visible light wave range specific refractivity of first refractive index material film layers is nl,
The visible light wave range specific refractivity of optical grating construction is nc, the visible light wave range specific refractivity of polymer material layer is nup, light
Effective visible light wave range specific refractivity of sub- crystalline nanometric fluid sensor is neff, and they meet following relation：
max{nl, nc, nup}<neff<ng
Wherein, max represents the maximum in be possible to value.
7. photonic crystal nanometer fluid sensor according to claim 1, it is characterised in that the first refractive index material
The visible light wave range specific refractivity of film layer is 1.4-1.6, and the visible light wave range of the second refraction materials film layer is rolled over
It is 1.8-2.8 to penetrate coefficient, and the visible light wave range specific refractivity of the polymer is 1.4-1.6.
8. a kind of preparation method of photonic crystal nanometer fluid sensor, it is characterised in that comprise the following steps：
(1) first refractive index material film layers are deposited：First refractive index material is deposited on into the upper surface of silicon wafer substrate and is made
First refractive index material is paved with the upper surface of the silicon wafer substrate, obtains thickness for h1First refractive index material film layers,
Wherein, the length of the silicon wafer substrate, width and height are respectively a, b and h0；
(2) the second refraction materials film layer is deposited：Second refraction materials are deposited on into the upper surface of first refractive index material
And make the second refraction materials be paved with the upper surface of the first refractive index material film layers, thickness is obtained for h2Second refraction
Rate material film layers, the visible light wave range specific refractivity of the second refraction materials film layer is more than the first refractive index
The visible light wave range specific refractivity of material film layers；
(3) sputter noble metal film layer：By noble metal sputter is in the upper surface of the second refraction materials film layer and makes described expensive
Metal is paved with the upper surface of the second refraction materials film layer, obtains thickness for h3Noble metal film layer；
(4) gluing：Photosensitive material is spin-coated on into the upper surface of noble metal film layer and makes the photosensitive material is paved with your gold
The upper surface of category film layer, obtains thickness for h4Photosensitive material thin film layer, the photosensitive material thin film layer, noble metal film layer
Nano-fluid circulation layer is collectively formed with the second refraction materials film layer；
(5) nano-fluid circulation layer is etched：By direction etching from top to bottom, etch on nano-fluid circulation layer many
The groove that bar is parallel to each other, so as to formation one is raised by each groove, all grooves and all projections are collectively forming square waveform
Optical grating construction, wherein, the height of the groove is h5And h3+h4＜ h5＜ h2+h3+h4；
(6) post-process：Photosensitive material thin film layer is removed using organic solvent, and using the noble metal film of noble metal solvent cleaning
Layer；
(7) etching is imported and exported：Photoresist is spin-coated on into the bottom surface of the silicon wafer substrate and the silicon wafer substrate is paved with
Lower surface, so as to form thickness for h6Photoresist layer, the photoresist layer, silicon wafer substrate, first refractive index material film
Layer and the second refraction materials film layer collectively form sensor base layer, then by direction from bottom to up, etching and eating thrown institute
State sensor base layer, so as to etch on the sensor base layer flow inlet that connects with all grooves and with it is all
What groove was connected goes out head piece；
(8) sealing-in：Sealing-in is carried out in the upper surface paving one layer of polymeric material of the second refraction materials film layer, polymer is obtained
Material sealing layer, the length and width of the polymeric material sealing layer is respectively a and b.
9. preparation method according to claim 8, it is characterised in that in step (5), first etching and photosensitive material described in eating thrown
Material film layer, obtains a plurality of first groove, then in etching and noble metal film layer described in eating thrown per the groove of bar first, obtains many
The groove of bar second, then obtains a plurality of 3rd groove, corresponding position in every etching the second refraction materials film layer again
First groove, the second groove and the 3rd groove be collectively forming the groove.
10. the method that the photonic crystal nanometer fluid sensor described in claim 1 tests nano-fluid concentration, its feature exists
In comprising the following steps：
(1) nano-fluid is imported in the photonic crystal nanometer fluid sensor by flow inlet, then whole photonic crystal nano
The effective refractive index coefficient n of rice fluid sensor sensoreffCan rise；
(2) after nano-fluid is completely into all grooves, using a branch of coaxial polarized white light vertical incidence to photonic crystal nano
Rice fluid sensor upper surface, using spectrometer with incident light identical path on receive reflecting light, then in spectrometer
On collect a branch of resonance light wave, the crest value of the light wave that resonates is λm, by λmThe frequency displacement variable quantity of value can then obtain nano-fluid
Concentration.
Priority Applications (1)
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