CN106586951A - Shock wave excitation apparatus capable of realizing excitation of MEMS microstructure in vacuum environment - Google Patents
Shock wave excitation apparatus capable of realizing excitation of MEMS microstructure in vacuum environment Download PDFInfo
- Publication number
- CN106586951A CN106586951A CN201610867460.3A CN201610867460A CN106586951A CN 106586951 A CN106586951 A CN 106586951A CN 201610867460 A CN201610867460 A CN 201610867460A CN 106586951 A CN106586951 A CN 106586951A
- Authority
- CN
- China
- Prior art keywords
- plate
- elastic base
- microstructure
- shock wave
- mems
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005284 excitation Effects 0.000 title claims abstract description 27
- 230000035939 shock Effects 0.000 title claims abstract description 23
- 238000009434 installation Methods 0.000 claims abstract description 33
- 238000003825 pressing Methods 0.000 claims description 12
- 238000007789 sealing Methods 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims description 8
- 238000009413 insulation Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 239000003292 glue Substances 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims 3
- 238000009827 uniform distribution Methods 0.000 claims 3
- 229910052571 earthenware Inorganic materials 0.000 claims 2
- 239000003990 capacitor Substances 0.000 abstract description 12
- 239000005304 optical glass Substances 0.000 abstract description 10
- 238000012360 testing method Methods 0.000 abstract description 6
- 230000005540 biological transmission Effects 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 3
- 238000013519 translation Methods 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0035—Testing
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
Abstract
本发明公开了一种可在真空环境下对MEMS微结构进行激励的激波激励装置,包括基板,在基板上设有手动三轴位移台和支座,在手动三轴位移台的Z轴溜板上设有指向微结构单元的针电极单元;所述微结构单元包括安装套,在安装套的安装孔内一端压装有弹性底座,弹性底座为圆环形薄片状并在其中部设有环形凸台,在弹性底座内通过绝缘套镶装有板电极,弹性底座内侧安装有MEMS微结构;在安装孔内另一端压装有光学玻璃板;在安装套外壁沿径向设有真空接头;所述针电极和板电极分别与高压电容的两极电联接,所述高压电容的两极分别电联接至高压电源的正负极。该装置结构安装牢固,操作简便安全,便于在真空环境下测试微结构的动态特性参数。
The invention discloses a shock wave excitation device capable of exciting MEMS microstructures in a vacuum environment. The needle electrode unit pointing to the microstructure unit is provided on the board; the microstructure unit includes a mounting sleeve, and an elastic base is pressed at one end of the mounting hole of the mounting sleeve, and the elastic base is in the shape of a circular sheet with a The ring-shaped boss is equipped with a plate electrode through an insulating sleeve in the elastic base, and a MEMS microstructure is installed on the inner side of the elastic base; an optical glass plate is pressed into the other end of the installation hole; a vacuum joint is arranged radially on the outer wall of the installation sleeve ; The needle electrode and the plate electrode are respectively electrically connected to the two poles of the high-voltage capacitor, and the two poles of the high-voltage capacitor are respectively electrically connected to the positive and negative poles of the high-voltage power supply. The structure of the device is firmly installed, the operation is simple and safe, and it is convenient to test the dynamic characteristic parameters of the microstructure in a vacuum environment.
Description
技术领域technical field
本发明属于微型机械电子系统技术领域,特别涉及一种可在真空环境下对MEMS微结构进行激励的激波激励装置。The invention belongs to the technical field of micromechanical electronic systems, and in particular relates to a shock wave excitation device capable of exciting MEMS microstructures in a vacuum environment.
背景技术Background technique
由于MEMS微器件具有成本低、体积小和重量轻等优点,使其在汽车、航空航天、信息通讯、生物化学、医疗、自动控制和国防等诸多领域都有着广泛的应用前景。对于很多MEMS器件来说,其内部微结构的微小位移和微小变形是器件功能实现的基础,因此对这些微结构的振幅、固有频率、阻尼比等动态特性参数进行精确测试已经成为开发MEMS产品的重要内容。Due to the advantages of low cost, small size and light weight, MEMS microdevices have broad application prospects in many fields such as automobile, aerospace, information communication, biochemistry, medical treatment, automatic control and national defense. For many MEMS devices, the micro-displacement and micro-deformation of their internal microstructures are the basis for the realization of device functions. Therefore, accurate testing of dynamic characteristic parameters such as the amplitude, natural frequency, and damping ratio of these microstructures has become the key to developing MEMS products. important content.
为了测试微结构的动态特性参数,首先需要使微结构产生振动,也就是需要对微结构进行激励。由于MEMS微结构具有尺寸小、重量轻和固有频率高等特点,传统机械模态测试中的激励方法和激励装置无法被应用在MEMS微结构的振动激励当中。近二十年来,国内外的研究人员针对MEMS微结构的振动激励方法进行了大量的探索,研究出了一些可用于MEMS微结构的激励方法以及相应的激励装置。其中,佘东生等在《基于激波的MEMS微结构底座冲击激励方法研究》一文中介绍了一种基于激波的底座激励装置,该装置具有激励带宽大,适用范围广等优点,具备很好的应用潜力。不过该装置仍然存在着下列缺点:第一,在装置中使用了一个十字弹簧片作为承载微结构的底座结构,微结构及其安装结构被粘接到十字弹簧片的顶部中心位置,当对微结构进行激励时,十字弹簧片会产生较大的弯曲变形;一方面这会引起微结构安装板的变形,导致微结构的损坏;另一方面这会使微结构的安装板和十字弹簧片之间已固化的胶水承受很大的拉力,在进行多次激励后,胶水容易开裂,微结构安装板会产生松动,脱离十字弹簧片;第二,在装置中,十字弹簧片、陶瓷片和板电极之间上下叠加布置,且在相邻的二个零件之间均使用胶水粘接的方式进行固定,这种粘接结构不够牢靠,在经过多次放电后,各层之间容易脱离;第三,在装置中,进给机构只能手动调节,不能实现自动进给,导致放电操作繁琐且安全性差;第四,由于微结构是完全暴露在空气中的,在需要测试微结构在真空环境下的动态特性时,由于无法在真空环境下进行放电,该装置便无法满足需求。In order to test the dynamic characteristic parameters of the microstructure, it is first necessary to make the microstructure vibrate, that is, to excite the microstructure. Due to the small size, light weight and high natural frequency of MEMS microstructures, the excitation methods and excitation devices in traditional mechanical mode testing cannot be applied to the vibration excitation of MEMS microstructures. In the past two decades, researchers at home and abroad have made a lot of explorations on the vibration excitation methods of MEMS microstructures, and have developed some excitation methods and corresponding excitation devices that can be used for MEMS microstructures. Among them, She Dongsheng et al. introduced a shock-based base excitation device in the article "Shock Wave-Based MEMS Microstructure Base Shock Excitation Method". This device has the advantages of large excitation bandwidth and wide application range. application potential. However, this device still has the following disadvantages: first, a cross spring is used in the device as a base structure for carrying microstructures, and the microstructure and its installation structure are bonded to the top center of the cross spring. When the structure is excited, the cross spring will produce a large bending deformation; on the one hand, this will cause the deformation of the microstructure mounting plate, resulting in damage to the microstructure; on the other hand, this will make the gap between the microstructure mounting plate and the cross spring The cured glue between them bears a lot of tension. After multiple excitations, the glue is easy to crack, and the microstructure mounting plate will loosen and break away from the cross spring piece; secondly, in the device, the cross spring piece, ceramic piece and plate The electrodes are stacked up and down, and are fixed by glue bonding between two adjacent parts. This bonding structure is not strong enough, and after multiple discharges, the layers are easy to separate from each other; Third, in the device, the feeding mechanism can only be adjusted manually, and cannot realize automatic feeding, resulting in cumbersome discharge operation and poor safety; fourth, since the microstructure is completely exposed to the air, when it is necessary to test the microstructure in a vacuum environment When the dynamic characteristics are lower, since the discharge cannot be performed in a vacuum environment, the device cannot meet the demand.
发明内容Contents of the invention
本发明所要解决的技术问题是提供一种可在真空环境下对MEMS微结构进行激励的激波激励装置,该装置结构安装牢固,操作简便安全,便于在真空环境下测试MEMS微结构的动态特性参数。The technical problem to be solved by the present invention is to provide a shock wave excitation device that can excite MEMS microstructures in a vacuum environment. The structure of the device is firmly installed, easy and safe to operate, and it is convenient to test the dynamic characteristics of MEMS microstructures in a vacuum environment. parameter.
为解决上述问题,本发明采用如下技术方案:In order to solve the above problems, the present invention adopts the following technical solutions:
一种可在真空环境下对MEMS微结构进行激励的激波激励装置,包括基板,在基板上设有手动三轴位移台和支座,在手动三轴位移台的Z轴溜板上设有针电极单元;所述针电极单元包括用于连接Z轴溜板的直角连接板,在直角连接板上设有二块相互平行的支撑板,在二块支撑板之间设有平行布置的导向轴和丝杠并在导向轴上套设有传动板,传动板与丝杠之间通过丝母连接,在其中一块支撑板外侧设有与丝杠同轴连接的步进电机,在传动板上端通过陶瓷管绝缘安装有针电极,针电极指向设置在支座上端的微结构单元;A shock wave excitation device that can excite MEMS microstructures in a vacuum environment, including a substrate, on which a manual three-axis displacement platform and a support are arranged, and on the Z-axis slide plate of the manual three-axis displacement platform. Needle electrode unit; the needle electrode unit includes a right-angle connecting plate for connecting the Z-axis sliding plate, two support plates parallel to each other are arranged on the right-angle connection plate, and guides arranged in parallel are provided between the two support plates The shaft and the lead screw are provided with a drive plate on the guide shaft. The drive plate and the lead screw are connected by a screw nut. A stepping motor coaxially connected with the lead screw is provided on the outside of one of the support plates. A needle electrode is installed through the insulation of the ceramic tube, and the needle electrode points to the microstructure unit arranged on the upper end of the support;
所述微结构单元包括安装在支座上端的安装套,在安装套内设有阶梯状安装孔,在安装孔内对应针电极一端通过第一压板密封压装有弹性底座,弹性底座夹持在第一压板与安装孔内的环形阶梯之间,弹性底座为圆环形薄片状并在其中部设有环形凸台,在弹性底座外侧中心孔内通过绝缘套镶装有板电极,弹性底座内侧通过微结构安装板安装有MEMS微结构;在安装孔内另一端通过第二压板密封压装有光学玻璃板,所述安装孔通过光学玻璃板和弹性底座形成一个密闭腔体,所述MEMS微结构位于该密闭腔体内;在安装套外壁沿径向设有一个与密闭腔体相通的真空接头;The microstructure unit includes an installation sleeve installed on the upper end of the support, and a stepped installation hole is provided in the installation sleeve, and an elastic base is sealed and pressed on the end of the corresponding needle electrode in the installation hole through the first pressure plate, and the elastic base is clamped on the Between the first pressure plate and the annular step in the installation hole, the elastic base is in the shape of a circular sheet with an annular boss in the middle, and a plate electrode is inlaid in the center hole outside the elastic base through an insulating sleeve, and the inner side of the elastic base The MEMS microstructure is installed through the microstructure mounting plate; the other end of the mounting hole is sealed and pressed with an optical glass plate through the second pressure plate, and the mounting hole forms a closed cavity through the optical glass plate and the elastic base. The MEMS microstructure The structure is located in the airtight cavity; a vacuum joint communicating with the airtight cavity is arranged radially on the outer wall of the installation sleeve;
所述针电极和板电极分别与高压电容的两极电联接,在针电极和高压电容之间设有第一空气开关控制通断;所述高压电容的两极分别电联接至高压电源的正负极,并通过第二空气开关控制通断。The needle electrode and the plate electrode are respectively electrically connected to the two poles of the high-voltage capacitor, and a first air switch is provided between the needle electrode and the high-voltage capacitor to control on-off; the two poles of the high-voltage capacitor are respectively electrically connected to the positive and negative poles of the high-voltage power supply , and the on-off is controlled by the second air switch.
作为进一步优选,所述陶瓷管垂直穿过传动板并通过设在传动板上端的顶丝固定。As a further preference, the ceramic tube passes through the transmission plate vertically and is fixed by a jacking wire arranged at the upper end of the transmission plate.
作为进一步优选,所述支座为阶梯轴状,其下端为大径端并套设有法兰盘,法兰盘与基板通过螺钉连接并将支座固定在基板上,支座上端与安装套通过螺纹连接。As a further preference, the support is in the shape of a stepped shaft, the lower end of which is a large-diameter end and is covered with a flange, the flange is connected to the base plate by screws and the support is fixed on the base plate, the upper end of the support is connected to the mounting sleeve Connected by thread.
作为进一步优选,所述第一压板通过圆周均布的螺钉固定在安装孔内对应针电极一端的端口内,在安装套内对应第一压板一端的环形阶梯面上设有圆形定位卡槽,所述弹性底座通过间隙配合设在定位卡槽内并通过圆周均布在第一压板上的顶丝固定。As a further preference, the first pressure plate is fixed in the port corresponding to one end of the needle electrode in the installation hole by screws uniformly distributed around the circumference, and a circular positioning slot is provided on the annular step surface corresponding to one end of the first pressure plate in the installation sleeve, The elastic base is arranged in the positioning slot through clearance fit and fixed by top wires evenly distributed on the first pressing plate.
作为进一步优选,在所述安装孔内两端的环形阶梯面与光学玻璃板和弹性底座之间分别夹设有密封圈,以提高密闭腔体的密封性。As a further preference, sealing rings are interposed between the annular stepped surfaces at both ends of the installation hole, the optical glass plate and the elastic base, so as to improve the sealing performance of the closed cavity.
作为进一步优选,所述弹性底座的中心孔为锥形盲孔,所述绝缘套外缘为锥形且与所述锥形盲孔锥度配合插接并粘接,绝缘套内壁与板电极外缘之间通过相互配合的圆锥面插接并粘接,以增强板电极安装的牢固性。As a further preference, the central hole of the elastic base is a tapered blind hole, the outer edge of the insulating sleeve is tapered and is fitted and bonded with the taper of the tapered blind hole, the inner wall of the insulating sleeve is connected to the outer edge of the plate electrode They are plugged and bonded through the conical surfaces that cooperate with each other to enhance the firmness of the plate electrode installation.
作为进一步优选,所述微结构安装板通过圆周均布的螺钉连接在弹性底座内侧的中心处,MEMS微结构粘接在微结构安装板上。As a further preference, the microstructure mounting plate is connected to the center of the inner side of the elastic base by screws uniformly distributed around the circumference, and the MEMS microstructure is bonded to the microstructure mounting plate.
本发明的有益效果是:The beneficial effects of the present invention are:
(1)由于弹性底座为圆环形薄片状并在其中部设有环形凸台,当对MEMS微结构进行激励时,弹性底座中心区域不会出现弯曲变形,这样就不会使安装在弹性底座内侧中心处的微结构安装板产生变形,也就不会出现微结构和微结构安装板相脱离的现象。(1) Since the elastic base is in the shape of a circular sheet and has a ring-shaped boss in the middle, when the MEMS microstructure is excited, the central area of the elastic base will not be bent and deformed, so that it will not make the elastic base installed on the elastic base The microstructure mounting plate at the inner center is deformed, so that the microstructure and the microstructure mounting plate will not separate from each other.
(2)由于弹性底座的中心孔为阶梯状,其外侧大孔内通过绝缘套镶装有板电极,因此板电极安装更加牢固,经过多次放电后,各零件之间也不会脱离。(2) Since the central hole of the elastic base is stepped, and the plate electrode is inlaid in the large hole on the outside through the insulating sleeve, the plate electrode is installed more firmly, and the parts will not be separated after multiple discharges.
(3)由于在手动三轴位移台的Z轴溜板上设有由步进电机驱动位移的针电极单元,因此同时具有手动进给和自动进给两种功能;在激波激励实验的准备阶段,可以使用手动进给的方式调节针电极与板电极的相对位置,在进行激波激励实验时,可以控制步进电机通过自动进给的方式进行放电,这样既保证了能够灵活地调节两个电极之间的相对位置,又保证了在进行放电实验时的安全性,操作简便安全。(3) Since the needle electrode unit driven by the stepping motor is installed on the Z-axis sliding plate of the manual three-axis translation stage, it has two functions of manual feeding and automatic feeding; in the preparation of the shock wave excitation experiment stage, the relative position of the needle electrode and the plate electrode can be adjusted by manual feeding, and the stepper motor can be controlled to discharge by automatic feeding during the shock wave excitation experiment, which ensures the flexible adjustment of the two electrodes. The relative position between the two electrodes ensures the safety during the discharge experiment, and the operation is simple and safe.
(4)由于所述安装套内的安装孔通过光学玻璃板和弹性底座形成一个密闭腔体,所述MEMS微结构位于该密闭腔体内,在安装套外壁设有真空接头,因此可通过真空接头对MEMS微结构加载真空环境,并可以通过放电产生激波对微结构进行激励;将弹性底座设计成密闭腔体的一部分,解决了在真空环境下无法使用激波对MEMS微结构进行激励的难题。(4) Since the installation hole in the installation sleeve forms a closed cavity through the optical glass plate and the elastic base, the MEMS microstructure is located in the airtight cavity, and a vacuum joint is provided on the outer wall of the installation sleeve, so it can pass through the vacuum joint. The vacuum environment is applied to the MEMS microstructure, and the shock wave can be generated by the discharge to excite the microstructure; the elastic base is designed as a part of the closed cavity, which solves the problem that the shock wave cannot be used to excite the MEMS microstructure in a vacuum environment .
附图说明Description of drawings
图1是本发明的立体结构示意图。Fig. 1 is a schematic diagram of the three-dimensional structure of the present invention.
图2是本发明的前视图。Figure 2 is a front view of the present invention.
图3是图2的右视图。Fig. 3 is a right side view of Fig. 2 .
图4是本发明针电极单元的立体结构图。Fig. 4 is a three-dimensional structure diagram of the needle electrode unit of the present invention.
图5是本发明微结构单元的立体结构图。Fig. 5 is a three-dimensional structure diagram of the microstructure unit of the present invention.
图6是图3中微结构单元的局部放大图。FIG. 6 is a partially enlarged view of the microstructure unit in FIG. 3 .
图7是图6的A-A剖视图。Fig. 7 is a cross-sectional view along line A-A of Fig. 6 .
图8是本发明的电路方框图。Fig. 8 is a circuit block diagram of the present invention.
图中:1.基板,2.手动三轴位移台,3.底板,4.螺钉,5.微结构单元,501.真空接头,502.安装套,503.螺钉,504.第一压板,505.顶丝,506.弹性底座,507.板电极,508.绝缘套,509.螺钉,510.第二压板,511.光学玻璃板,512.密封圈,513.MEMS微结构,514.螺钉,515.微结构安装板,6.针电极单元,601.直角连接板,602.步进电机,603.螺钉,604.螺钉,605.支撑板,606.导向轴,607.丝母,608.螺钉,609.轴套,610.传动板,611.顶丝,612.陶瓷管,613.针电极,614.丝杠,7.法兰盘,8.支座,9.第一空气开关,10.第二空气开关,11.高压电容,12.高压电源。In the figure: 1. base plate, 2. manual three-axis translation stage, 3. bottom plate, 4. screw, 5. microstructure unit, 501. vacuum joint, 502. mounting sleeve, 503. screw, 504. first pressure plate, 505 .Top wire, 506. Elastic base, 507. Plate electrode, 508. Insulation sleeve, 509. Screw, 510. Second pressure plate, 511. Optical glass plate, 512. Sealing ring, 513. MEMS microstructure, 514. Screw, 515. Microstructure mounting plate, 6. Needle electrode unit, 601. Right-angle connecting plate, 602. Stepper motor, 603. Screw, 604. Screw, 605. Support plate, 606. Guide shaft, 607. Screw nut, 608. Screw, 609. Shaft sleeve, 610. Transmission plate, 611. Top wire, 612. Ceramic tube, 613. Needle electrode, 614. Lead screw, 7. Flange, 8. Support, 9. The first air switch, 10. Second air switch, 11. High voltage capacitor, 12. High voltage power supply.
具体实施方式detailed description
如图1-图3所示,本发明涉及的一种可在真空环境下对MEMS微结构进行激励的激波激励装置,包括基板1,在基板1上设有手动三轴位移台2和一个支座8,所述手动三轴位移台2安装在一个底板3上,该底板3通过螺钉4固定在基板1上。在手动三轴位移台2的Z轴溜板上安装有针电极单元6。As shown in Figures 1-3, the present invention relates to a shock wave excitation device that can excite MEMS microstructures in a vacuum environment, including a substrate 1, on which a manual three-axis translation stage 2 and a The support 8, the manual three-axis displacement table 2 is installed on a base plate 3, and the base plate 3 is fixed on the base plate 1 by screws 4. A needle electrode unit 6 is installed on the Z-axis slide plate of the manual three-axis displacement table 2 .
如图4所示,所述针电极单元6包括通过螺钉固定在Z轴溜板上的直角连接板601,在直角连接板601上通过螺钉固定有二块相互平行的支撑板605,在二块支撑板605之间设有上下平行布置的导向轴606和丝杠614,并在导向轴606上套设有传动板610,在传动板610上对应导向轴606处镶装有与导向轴606滑动配合的轴套609,导向轴606两端通过螺钉604固定在二块支撑板605上,丝杠614可旋转地安装在二块支撑板605之间,传动板610与丝杠614之间通过使用螺钉608固定在传动板610上的丝母607连接,在其中一块支撑板605外侧通过螺钉603固定有与丝杠614同轴连接的步进电机602,在传动板610上端通过陶瓷管612绝缘安装有针电极613,所述陶瓷管612垂直穿过传动板610并通过设在传动板610上端的顶丝611固定。针电极613后部镶装在陶瓷管612内,针电极613前端针尖指向设置在支座8上端的微结构单元5。As shown in Figure 4, the needle electrode unit 6 includes a right-angle connecting plate 601 fixed on the Z-axis sliding plate by screws, and two supporting plates 605 parallel to each other are fixed on the right-angle connecting plate 601 by screws. A guide shaft 606 and a lead screw 614 arranged in parallel up and down are arranged between the support plates 605, and a transmission plate 610 is sleeved on the guide shaft 606, and the corresponding guide shaft 606 on the transmission plate 610 is inlaid with a guide shaft 606 to slide. Cooperating bushing 609, the two ends of guide shaft 606 are fixed on the two support plates 605 by screws 604, the lead screw 614 is rotatably installed between the two support plates 605, and the transmission plate 610 and the lead screw 614 are connected by using The screw 608 is fixed on the screw nut 607 on the transmission plate 610, and the stepping motor 602 coaxially connected with the lead screw 614 is fixed on the outside of one of the support plates 605 by a screw 603, and the upper end of the transmission plate 610 is installed insulated through a ceramic tube 612 There is a needle electrode 613 , and the ceramic tube 612 vertically passes through the driving plate 610 and is fixed by a top wire 611 arranged at the upper end of the driving plate 610 . The rear part of the needle electrode 613 is embedded in the ceramic tube 612 , and the tip of the front end of the needle electrode 613 points to the microstructure unit 5 arranged on the upper end of the support 8 .
如图5-图7所示,所述微结构单元5包括安装在支座8上端的安装套502,所述支座8为阶梯轴状,其下端为大径端并套设有法兰盘7,法兰盘7与基板1通过螺钉连接并将支座8固定在基板1上,支座8上端与设置在安装套502底面上的螺孔通过螺纹连接。在安装套502内设有阶梯状安装孔,安装孔中部内径远小于其两端端口内径,在安装孔内对应针电极613一端通过第一压板504密封压装有弹性底座506,弹性底座506夹持在第一压板504与安装孔内的环形阶梯之间,弹性底座506为圆环形薄片状并在其中部设有环形凸台,在弹性底座506的中心孔内对应针电极613一端通过绝缘套508镶装有板电极507,弹性底座506内侧通过微结构安装板515安装有MEMS微结构513;在安装孔内另一端通过第二压板510密封压装有光学玻璃板511,所述安装孔通过光学玻璃板511和弹性底座506形成一个密闭腔体,所述MEMS微结构513位于该密闭腔体内;在安装套502外壁沿径向安装有一个与密闭腔体相通的真空接头501。As shown in Figures 5-7, the microstructure unit 5 includes a mounting sleeve 502 mounted on the upper end of the support 8, the support 8 is in the shape of a stepped shaft, and its lower end is a large-diameter end and is sleeved with a flange 7. The flange 7 is connected to the base plate 1 by screws and the support 8 is fixed on the base plate 1 , and the upper end of the support 8 is screwed to the screw hole provided on the bottom surface of the mounting sleeve 502 . A stepped installation hole is provided in the installation sleeve 502, the inner diameter of the middle part of the installation hole is much smaller than the inner diameter of the ports at both ends, and an elastic base 506 is sealed and pressed by the first pressing plate 504 in the installation hole corresponding to the end of the needle electrode 613, and the elastic base 506 is clamped. Hold between the first pressure plate 504 and the annular step in the installation hole, the elastic base 506 is in the shape of a circular thin sheet and has an annular boss in the middle, and one end of the corresponding needle electrode 613 in the central hole of the elastic base 506 passes through the insulation The sleeve 508 is inlaid with a plate electrode 507, and the inside of the elastic base 506 is equipped with a MEMS microstructure 513 through a microstructure mounting plate 515; the other end of the mounting hole is sealed and pressed with an optical glass plate 511 through a second pressure plate 510, and the mounting hole An airtight cavity is formed by the optical glass plate 511 and the elastic base 506, and the MEMS microstructure 513 is located in the airtight cavity; a vacuum joint 501 communicating with the airtight cavity is installed radially on the outer wall of the installation sleeve 502 .
所述第一压板504通过圆周均布的螺钉503固定在安装孔内对应针电极613一端的端口内,在安装套502内对应第一压板504一端的环形阶梯面上设有圆形定位卡槽,所述弹性底座506通过间隙配合设在定位卡槽内并通过圆周均布在第一压板504上的顶丝505固定,通过旋紧顶丝可进一步压紧弹性底座506。所述第二压板510通过圆周均布的螺钉509与安装套502连接并将光学玻璃板511固定在所述安装孔另一端的端口内。在所述安装孔内两端的环形阶梯面与光学玻璃板511和弹性底座506之间分别夹设有密封圈512,以提高密闭腔体的密封性。The first pressing plate 504 is fixed in the port corresponding to one end of the needle electrode 613 in the installation hole through the screws 503 evenly distributed on the circumference, and a circular positioning slot is provided on the annular step surface corresponding to the end of the first pressing plate 504 in the installation sleeve 502 , the elastic base 506 is arranged in the positioning slot through clearance fit and fixed by the top screws 505 evenly distributed on the first pressing plate 504 around the circumference, and the elastic base 506 can be further compressed by tightening the top screws. The second pressing plate 510 is connected to the installation sleeve 502 through the screws 509 evenly distributed around the circumference, and the optical glass plate 511 is fixed in the port at the other end of the installation hole. Sealing rings 512 are interposed between the annular stepped surfaces at both ends of the installation hole, the optical glass plate 511 and the elastic base 506 to improve the sealing performance of the airtight cavity.
所述弹性底座506的中心孔为锥形盲孔,所述绝缘套508外缘为锥形且与所述锥形盲孔锥度配合插接并粘接,绝缘套508内壁与板电极507外缘之间通过相互配合的圆锥面插接并粘接,以增强板电极507安装的牢固性。所述绝缘套508优选为陶瓷套。所述微结构安装板515中心设有通孔并通过圆周均布的螺钉514连接在弹性底座506内侧的中心处,MEMS微结构513粘接在微结构安装板515上。The central hole of the elastic base 506 is a tapered blind hole, the outer edge of the insulating sleeve 508 is tapered and fits and is bonded with the taper of the tapered blind hole, the inner wall of the insulating sleeve 508 and the outer edge of the plate electrode 507 They are plugged and bonded through mutually matched conical surfaces to enhance the firmness of the installation of the plate electrode 507 . The insulating sleeve 508 is preferably a ceramic sleeve. The center of the microstructure mounting plate 515 is provided with a through hole and is connected to the center of the inner side of the elastic base 506 by screws 514 uniformly distributed around the circumference, and the MEMS microstructure 513 is glued on the microstructure mounting plate 515 .
如图8所示,该激波激励装置还设有高压电容11和高压电源12,所述针电极613和板电极507分别与高压电容11的两极通过导线电联接,在板电极507上设有用于连接导线的螺孔。在针电极613和高压电容11之间设有第一空气开关9控制通断;所述高压电容11的两极分别电联接至高压电源12的正负极,并通过第二空气开关10控制通断。As shown in Figure 8, the shock wave excitation device is also provided with a high-voltage capacitor 11 and a high-voltage power supply 12, the needle electrode 613 and the plate electrode 507 are respectively electrically connected to the two poles of the high-voltage capacitor 11 through wires, and the plate electrode 507 is provided with a Screw holes for connecting wires. A first air switch 9 is provided between the needle electrode 613 and the high-voltage capacitor 11 to control on-off; the two poles of the high-voltage capacitor 11 are electrically connected to the positive and negative poles of the high-voltage power supply 12, and are controlled on-off by the second air switch 10 .
使用时,首先将第一空气开关9和第二空气开关10全部置于断开状态,调节手动三轴位移台2使针电极613的针尖对准板电极507的中心位置,并保证它们之间的距离大于高压电容11充分充电后的最大空气击穿间隙;其次,使用真空泵连接真空接头501,对所述密闭腔体内部抽真空;再次,闭合第二空气开关10,使用高压电源12为高压电容11充电,当充电完成后再断开第二空气开关10;最后,闭合第一空气开关9,控制步进电机602,使针电极613缓慢接近板电极507,当针电极613的针尖和板电极507之间的距离满足当前充电电压下的空气击穿条件时,空气间隙被击穿,完成放电并产生激波,实现对MEMS微结构在真空环境下的冲击激励。When in use, first place the first air switch 9 and the second air switch 10 in the off state, adjust the manual three-axis displacement stage 2 so that the needle tip of the needle electrode 613 is aligned with the center position of the plate electrode 507, and ensure that the distance between them The distance is greater than the maximum air breakdown gap after the high-voltage capacitor 11 is fully charged; secondly, use a vacuum pump to connect the vacuum connector 501 to evacuate the inside of the airtight cavity; thirdly, close the second air switch 10, and use the high-voltage power supply 12 for high-voltage The capacitor 11 is charged, and when the charging is completed, the second air switch 10 is disconnected; finally, the first air switch 9 is closed, and the stepper motor 602 is controlled to make the needle electrode 613 slowly approach the plate electrode 507, when the needle tip of the needle electrode 613 and the plate When the distance between the electrodes 507 satisfies the air breakdown condition under the current charging voltage, the air gap is broken down, the discharge is completed and a shock wave is generated, and the shock excitation of the MEMS microstructure in a vacuum environment is realized.
尽管本发明的实施方案已公开如上,但其并不仅仅限于说明书和实施方式中所列运用,它完全可以被适用于各种适合本发明的领域,对于熟悉本领域的人员而言,可容易地实现另外的修改,因此在不背离权利要求及等同范围所限定的一般概念下,本发明并不限于特定的细节和这里示出与描述的图例。Although the embodiment of the present invention has been disclosed as above, it is not limited to the use listed in the specification and implementation, it can be applied to various fields suitable for the present invention, and it can be easily understood by those skilled in the art Therefore, the invention is not limited to the specific details and examples shown and described herein without departing from the general concept defined by the claims and their equivalents.
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610867460.3A CN106586951B (en) | 2016-09-30 | 2016-09-30 | It is a kind of can be under vacuum conditions to MEMS micro-structures into the shock wave exciting bank of row energization |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610867460.3A CN106586951B (en) | 2016-09-30 | 2016-09-30 | It is a kind of can be under vacuum conditions to MEMS micro-structures into the shock wave exciting bank of row energization |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106586951A true CN106586951A (en) | 2017-04-26 |
CN106586951B CN106586951B (en) | 2018-06-08 |
Family
ID=58556073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610867460.3A Expired - Fee Related CN106586951B (en) | 2016-09-30 | 2016-09-30 | It is a kind of can be under vacuum conditions to MEMS micro-structures into the shock wave exciting bank of row energization |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106586951B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109437097A (en) * | 2018-12-17 | 2019-03-08 | 大连理工大学 | Ultrasonic excitation device loaded in high-temperature environment and working method thereof |
CN109827727A (en) * | 2018-12-17 | 2019-05-31 | 大连理工大学 | Shock wave base excitation device loaded in high-temperature environment and working method thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1666952A (en) * | 2005-03-29 | 2005-09-14 | 华中科技大学 | Dynamic test loading device for MEMS wafer or device |
CN1710428A (en) * | 2005-06-08 | 2005-12-21 | 大连理工大学 | High-load micro-component dynamic characteristic test device |
CN101476970A (en) * | 2009-01-14 | 2009-07-08 | 大连理工大学 | Seat excitation apparatus used for MEMS dynamic characteristics test |
US20140352403A1 (en) * | 2013-05-30 | 2014-12-04 | MCube Inc. | Centrifuge mems stiction test system and method |
CN204608008U (en) * | 2015-04-24 | 2015-09-02 | 苏州大学 | The MEMS system of the unicellular excitation of a kind of scleroblast and detection |
-
2016
- 2016-09-30 CN CN201610867460.3A patent/CN106586951B/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1666952A (en) * | 2005-03-29 | 2005-09-14 | 华中科技大学 | Dynamic test loading device for MEMS wafer or device |
CN1710428A (en) * | 2005-06-08 | 2005-12-21 | 大连理工大学 | High-load micro-component dynamic characteristic test device |
CN101476970A (en) * | 2009-01-14 | 2009-07-08 | 大连理工大学 | Seat excitation apparatus used for MEMS dynamic characteristics test |
US20140352403A1 (en) * | 2013-05-30 | 2014-12-04 | MCube Inc. | Centrifuge mems stiction test system and method |
CN204608008U (en) * | 2015-04-24 | 2015-09-02 | 苏州大学 | The MEMS system of the unicellular excitation of a kind of scleroblast and detection |
Non-Patent Citations (1)
Title |
---|
佘东生 等: "基于激波的MEMS微结构底座冲击激励方法研究", 《仪器仪表学报》 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109437097A (en) * | 2018-12-17 | 2019-03-08 | 大连理工大学 | Ultrasonic excitation device loaded in high-temperature environment and working method thereof |
CN109827727A (en) * | 2018-12-17 | 2019-05-31 | 大连理工大学 | Shock wave base excitation device loaded in high-temperature environment and working method thereof |
CN109827727B (en) * | 2018-12-17 | 2020-05-19 | 大连理工大学 | Shock wave base excitation device loaded in high-temperature environment and working method thereof |
Also Published As
Publication number | Publication date |
---|---|
CN106586951B (en) | 2018-06-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106477518B (en) | A kind of shock wave exciting bank that can enter row energization to MEMS metal micro structures in high temperature environments | |
CN106586951B (en) | It is a kind of can be under vacuum conditions to MEMS micro-structures into the shock wave exciting bank of row energization | |
WO2016101458A1 (en) | Vacuum cell aligning device and cell aligning method | |
TW202341231A (en) | Semiconductor processing equipment | |
CN106629584B (en) | A kind of contactless shock wave exciting bank for MEMS metal micro structure dynamic characteristic tests | |
CN108120578B (en) | A kind of triple axle exciting bank that shock loading can be loaded to MEMS micro-structure | |
CN216000914U (en) | Ultrasonic motor stator piezoceramics compression fittings | |
CN108217587A (en) | For the four-axle type seat excitation apparatus of MEMS micro-structure dynamic characteristics test | |
CN214851831U (en) | Forming process equipment for electrostatic loudspeaker diaphragm | |
CN108036912A (en) | Exciting device outside a kind of MEMS micro-structure triple axle pieces based on inverse piezoelectric effect | |
CN106315507B (en) | A focused shock wave excitation device for non-contact excitation of MEMS microstructures | |
CN108168814B (en) | A four-axis vibration excitation device that can excite MEMS microstructures off-chip | |
CN108181069B (en) | A MEMS microstructure four-axis dynamic loading device based on piezoelectric ceramics | |
CN108217590A (en) | For the triple axle seat excitation apparatus of MEMS micro-structure dynamic characteristics test | |
CN106430086B (en) | It is a kind of to enter the focusing shock wave exciting bank of row energization to MEMS micro-structurals in water | |
CN108168816A (en) | It is a kind of can dynamic driving MEMS micro-structures triple axle exciting bank | |
CN106370372B (en) | A kind of focusing shock wave exciting bank for the test of MEMS micro-structure dynamic characteristics | |
CN108217589B (en) | A three-axis dynamic loading device for MEMS microstructure based on piezoelectric ceramics | |
CN108163805B (en) | Three-axis vibration excitation device for testing the dynamic characteristics of MEMS microstructures | |
CN108163804B (en) | A four-axis excitation device that can dynamically drive MEMS microstructures | |
CN106477519B (en) | A kind of shock wave exciting bank for MEMS micro-structurals encourage in contactless water | |
CN219649615U (en) | Automobile engine connecting rod aperture honing frock clamp | |
CN108217583A (en) | A kind of MEMS micro-structure triple axle exciting banks with mobile base structure | |
CN106629585A (en) | MEMS (micro-electromechanical system) microstructure non-contact excitation device based on shock waves | |
CN218965293U (en) | Vacuum pump disassembling jig |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180608 Termination date: 20180930 |