CN106504966A - A kind of integrated array electronic rifle and electron beam selective melting rapid forming system - Google Patents
A kind of integrated array electronic rifle and electron beam selective melting rapid forming system Download PDFInfo
- Publication number
- CN106504966A CN106504966A CN201610906011.5A CN201610906011A CN106504966A CN 106504966 A CN106504966 A CN 106504966A CN 201610906011 A CN201610906011 A CN 201610906011A CN 106504966 A CN106504966 A CN 106504966A
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- China
- Prior art keywords
- electron beam
- integrated
- array
- electronic rifle
- box body
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/488—Schematic arrangements of the electrodes for beam forming; Place and form of the elecrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
- H01J29/503—Three or more guns, the axes of which lay in a common plane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/02—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused
- H01J31/06—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused with more than two output electrodes, e.g. for multiple switching or counting
Abstract
The present invention relates to increasing material manufacturing technical field of processing equipment, more particularly to a kind of integrated array electronic rifle and electron beam selective melting rapid forming system, by multiple e-book transmitter units are carried out ordered arrangement according to array way, so as to each electron beam generating unit is responsible for a region, the electron beam emission unit of the different array positions of control carries out accurate scan shaping to powder bed diverse location, the electron beam quality of beam of each electron beam generating unit is guaranteed, regional is by effectively linking, so as on the premise of part forming precision and quality is ensured, solve the problems, such as that existing powder bed electron beam selective melting quickly shaping device can not produce larger part as electron beam deflection angle is excessive, realize that the powder bed electron beam constituency of large scale parts quickly manufactures.
Description
Technical field
The present invention relates to increasing material manufacturing technical field of processing equipment, more particularly to a kind of integrated array electronic rifle and electronics
Beam selective melting rapid forming system.
Background technology
Increases material manufacturing technology also known as 3D printing or Rapid Prototyping technique.It is a kind of based on mathematical model file,
With metal dust, metal wire material or can cohesive plastic or other material, come constructed object by way of successively stacking accumulation
Technology.Fast Forming Technique is widely used in the fields such as Making mold, industrial design, is now increasingly used for some products
Directly manufacture, be particularly the application (such as hip joint or tooth, or some airplane components) of some high values.
Metallic element method for quickly forming and manufacturing mainly have selective laser sintering (SLS), selective laser fusing (SLM),
The sides such as laser coaxial powder feeding is directly manufactured, electron beam fuse shaping (EBAM), powder bed electron beam selective melting shaping (EBM)
Method.This several method all has limitation in various degree, such as several increasing material manufacturing method and electricity for adopting laser for thermal source
The shaping of beamlet selective melting is all that these method formed precisions are high, but can not manufacture as raw shaping material using metal dust
The part of large-size.The shaping of electron beam fuse, is shaped although forming speed is fast as raw shaping material using metal wire material
Precision is relatively low, it is difficult to the higher part of figuration manufacture precision, is simply possible to use in the manufacture of part blank.
In order to the accuracy of manufacture is high, reliable in quality metallic element, generally shaped from powder bed electron beam selective melting
Technology, mainly has advantages below：
Formation of parts dimensional accuracy is high, reaches final use state, shorten after simple surface treatment and machining
Product development cycle；
Electron beam imperceptible can be focused on, and, up to 8000mm/s, forming speed is fast for scanning burn-off rate；
Electron beam can be preheated to powder bed, made part forming process be maintained at a higher temperature, reduced part
The occurrence probability of the defects such as residual stress height that thermal stress causes, crackle, deformation.
Existing electron beam selective melting forming technique is all to realize single electron beam in certain area by deflection coil
The fusing shaping of metal dust accurate scan.Electron beam is not to be exactly perpendicularly to working surface after deflection coil, but with
Vertical direction forms an angle.As the increase of deflection of a beam of electrons angle, electron beam quality of beam decline to a great extent, electromagnetic calibration is
Cannot guarantee that quality of beam meets the needs of shaping.In addition, deflection of a beam of electrons angle increases powder bed shaped region edge
Beam spot has certain deformation, causes melting pool shape and Energy distribution that deviation occurs, so as to cause formation of parts precision and forming quality
Difference.Using mechanical movement mobile electron rifle or powder cylinder, as mechanical movement speed is slow, shaping efficiency will be substantially reduced, same to time shift
Dynamic electron gun or powder cylinder make equipment electrically and mechanically complex structure, and the operational reliability for easily causing equipment declines.Simple increase
The number of electron gun, is effectively connected as the problem of arrangement space cannot also make each electron gun be responsible for region.
In a word, on the premise of the parts accuracy of manufacture and quality is ensured, scan not by electron beam electromagnetic deflection merely
The parts of large-size can be produced；The simple number for increasing electron gun cannot also manufacture the parts of large-size.
Content of the invention
For overcoming drawbacks described above, it is that this present invention proposes a kind of integrated array electronic rifle.
A kind of integrated array electronic rifle, including an integrated box body and multiple independent electron beam generating units；Many
The individual electron beam generating unit is evenly arranged in integrated box body.
As one kind preferably, multiple independent electron beam generating units are arranged in one with N × M rectangular array forms
Change in casing.
Further, multiple independent vacuum chambers are provided with the integrated box body, and the independent vacuum chamber is located at one
Change the top of casing, the electron beam generating unit is installed in the independent vacuum room.
Used as a kind of improvement, the side of the integrated box body is provided with vacuum system interface, in order to connect vacuum system；Institute
State, for vacuum system to each independent vacuum chamber evacuation.
Further, the integrated box body bottom also includes a shared Electron Beam Focusing scanning vacuum chamber, the electricity
Beamlet is focused on scanning vacuum chamber and is communicated with each independent vacuum chamber by anode hole respectively.
Specifically, the electron beam generating unit includes high-voltage cable joint, cathode filament, grid, anode.
Specifically, alignment coil, focus coil and scanning coil are set gradually below each anode hole.
A kind of electron beam selective melting rapid forming system, including above-mentioned integrated array electronic rifle, also includes high pressure
Power supply, electron gun control system, vacuum system, the high voltage power supply are used for providing height to described electron beam generating unit respectively
Pressure；The electron gun control system is in order to controlling the grid of each electron beam generating unit, beam alignment coil, focal line
Circle, scanning coil are adjusted line size adjustment, beam spot calibration, Electron Beam Focusing and accurate scan action；The vacuum system
System is in order to whole formation system evacuation.
Used as further improving, the electron gun control system is arranged according to the quantity of independent electrical beamlet transmitter unit and array
Powder bed is divided into corresponding array scanning region by cloth position, the corresponding block array scanning area of each independent electrical beamlet transmitter unit
Domain, the independent electrical beamlet transmitter unit controlled above respective regions by electron gun control system corresponding array scanning region is entered
Row accurate scan shapes.
A kind of integrated array electronic rifle of the present invention, by being had multiple electron beam emission units according to array way
Sequence arrange, and control the electron beam emission unit of different array positions its corresponding powder bed position region is carried out accurate scan into
Shape, each electron beam generating unit electron beam quality of beam are guaranteed, and so as to be responsible for a region, regional passes through
Effectively it is connected, so as to, on the premise of part forming precision and quality is ensured, solve existing powder bed electron beam selective melting
Quickly shaping device realizes the powder bed of large scale parts due to the excessive problem that can not produce larger part of electron beam deflection angle
Formula electron beam constituency quickly manufactures.
Description of the drawings
For ease of explanation, the present invention is described in detail by following preferred embodiments and accompanying drawing.
Fig. 1 is a kind of integrated array electronic rifle cross-sectional view of the present invention；
Fig. 2 is a kind of electron beam selective melting rapid forming system cross-sectional view of the invention；
Fig. 3 is a kind of electron beam generating unit arrangement schematic diagram of integrated array electronic rifle of the present invention；
Fig. 4 is a kind of electron beam selective melting rapid forming system powder bed array scanning area distribution schematic diagram of the invention.
Specific embodiment
In order that the objects, technical solutions and advantages of the present invention become more apparent, below in conjunction with drawings and Examples, right
The present invention is further elaborated.It should be appreciated that specific embodiment described herein is only in order to explain the present invention, and
It is not used in the restriction present invention.
As shown in figure 1, a kind of integrated array electronic rifle 20 of the present invention, including an integrated box body 3 and multiple independences
Electron beam generating unit, multiple electron beam generating units are evenly arranged in integrated box body 3；Wherein integrated box body 3 is
Vacuum chamber, and be divided into upper and lower two parts, top set up separately and put multiple independent vacuum chambers 8 for installing electron beam generating unit,
Bottom is divided into electron beam scanning vacuum chamber 2；It is open with one above each independent vacuum chamber 8, opening lower section is provided with high-tension electricity
Cable joint 6 is used for the high tension cable 7 for connecting outside access；The high-voltage cable joint 6 carries out encapsulation process with opening, and the other end connects
Connect grid 5 and negative electrode 10；8 bottom of the independent vacuum chamber is provided with anode hole 11, and 3 bottom of the integrated box body also includes one
Shared Electron Beam Focusing scanning vacuum chamber, the Electron Beam Focusing scanning vacuum chamber are true with each independence respectively by anode hole 11
Empty room 8 is communicated；The top of anode hole 11 is provided with anode 4, and the electric energy that high tension cable 7 is conveyed by the negative electrode 10 is with the shape of electron beam
Formula is sent to anode 4, is disposed with alignment coil 13, focus coil 14 and scanning coil 15 below the anode hole 11；Institute
State 2 bottom of electron beam scanning vacuum chamber and be provided with electron gun base plate 1, the electron gun base plate 1 each independent electrical beamlet corresponding occurs
Device offers a through hole, passes through for electron beam 19.
As a kind of preferred, as shown in figure 3, multiple independent electron beam generating units are with N × M rectangular array forms
Be arranged in integrated box body 3, array format can be 1 × 2 rectangular array, 2 × 2 rectangular arrays, 2 × 3 rectangular arrays or 3 ×
The arrangement modes such as 3 rectangular arrays.
Used as a kind of optimal way, the side of the integrated box body 3 is provided with the first vacuum system interface 12, in order to connect
Vacuum system；Intercommunicating pore 9 is additionally provided between the independent vacuum chamber 8, for vacuum system to 8 evacuation of each independent vacuum chamber.
Specifically, the electron beam generating unit includes 7 high tension cable of high tension cable, 7 joint 6,10 filament of negative electrode, grid
5th, anode 4.
As shown in Fig. 2 a kind of electron beam selective melting rapid forming system, including above-mentioned integrated array electronic rifle
20, also include high voltage power supply (not shown), electron gun control system (not shown), vacuum system (not shown), the high-tension electricity
Source provides high pressure to described electron beam generating unit respectively by high tension cable 7；The electron gun control system is in order to controlling
The grid 5 of each electron beam generating unit, beam alignment coil 13, focus coil 14, scanning coil 15 are adjusted line
Size adjustment, beam spot calibration, Electron Beam Focusing and accurate scan action；The vacuum system is in order to taking out very to whole formation system
Empty.The lower section joint forming vacuum chamber 18 of integrated array electronic rifle 20, the side for shaping vacuum chamber 18 is provided with the second vacuum
System interface 24, in order to connect vacuum system；Powder bed carrying platform 16, powder bed carrying platform are provided with the shaping vacuum chamber 18
Place forming part to be processed on 16, arrange below powder bed carrying platform 16 powder bed elevating mechanism 21 be used for by be processed into
Shape part 17 is delivered to forming position；The side of the powder bed carrying platform 16 is provided with power spreading device 22, the powdering dress
The top for putting 22 is provided with powder cabin 23, and the powder cabin 23 carries out powder feeding, and powder is uniformly laid on shaping to be processed by dust feeder
On part 17.
As further improving, as shown in figure 4, number of the electron gun control system according to independent electrical beamlet transmitter unit
Powder bed is divided into corresponding array scanning region by amount and array arrangement position, the corresponding one piece of battle array of each independent electrical beamlet transmitter unit
Column scan region, the independent electrical beamlet transmitter unit controlled above respective regions by electron gun control system corresponding array is swept
Retouching region carries out accurate scan shaping.Using a kind of electron beam selective melting rapid forming system of the present invention, can be effective
Reduce the deflection angle of electron beam, it is ensured that the beam spot shape of electron beam quality of beam and shaped region edge, so as to change
Melting pool shape and Energy distribution during kind electron beam scanning fusing shaping.
A kind of integrated array electronic rifle 20 of the present invention, by by multiple independent electrical beamlet transmitter units according to array way
Ordered arrangement is carried out, so as to each electron beam generating unit is responsible for an array scanning region, the different array positions of control
Independent electrical beamlet transmitter unit carries out accurate scan shaping to powder bed difference array scanning region, each electron beam generating unit
Electron beam quality of beam is guaranteed, and regional is connected by effective, so as to ensure part forming precision and quality
On the premise of, solve existing powder bed electron beam selective melting quickly shaping device and can not give birth to as electron beam deflection angle is excessive
The problem of larger part is produced, realizes that the powder bed electron beam constituency of large scale parts quickly manufactures.
Work(is moved than not possessing the movement of powder bed and electron beam gun using the producible metal parts size of assembly of the invention
The accessory size of the electron beam selective melting equipment production of energy is big more than 3 times.
Presently preferred embodiments of the present invention is the foregoing is only, not in order to limit the present invention, all in essence of the invention
Interior made any modification of god and principle, equivalent and improvement etc., should be included in the interior of protection scope of the present invention.
Claims (9)
1. a kind of integrated array electronic rifle, it is characterised in that send out including an integrated box body and multiple independent electron beams
Raw unit；Multiple electron beam generating units are evenly arranged in integrated box body.
2. integrated array electronic rifle as claimed in claim 1, it is characterised in that multiple independent electron beams occur single
Unit is arranged in integrated box body with N × M rectangular array forms.
3. integrated array electronic rifle as claimed in claim 2, it is characterised in that be provided with the integrated box body multiple
Independent vacuum chamber, the independent vacuum chamber are located at the top of integrated box body, and the electron beam generating unit is installed on described only
In vertical vacuum room.
4. integrated array electronic rifle as claimed in claim 3, it is characterised in that the side of the integrated box body is provided with very
Empty system interface, in order to connect vacuum system；Intercommunicating pore is additionally provided between the independent vacuum chamber, for vacuum system to each only
Vertical vacuum chamber.
5. integrated array electronic rifle as claimed in claim 4, it is characterised in that the integrated box body bottom also includes
Individual shared Electron Beam Focusing scanning vacuum chamber, the Electron Beam Focusing scanning vacuum chamber are true with each independence respectively by anode hole
Empty room is communicated.
6. integrated array electronic rifle as claimed in claim 5, it is characterised in that the electron beam generating unit includes high pressure
Cable connector, cathode filament, grid, anode.
7. integrated array electronic rifle as claimed in claim 6, it is characterised in that set gradually calibration below each anode hole
Coil, focus coil and scanning coil.
8. a kind of electron beam selective melting rapid forming system, including the integrated array electronic rifle as described in claim 1-7,
Characterized in that, also include high voltage power supply, electron gun control system, vacuum system, the high voltage power supply is used for respectively to described
Electron beam generating unit provide high pressure；The electron gun control system in order to control each electron beam generating unit grid,
Beam alignment coil, focus coil, scanning coil are adjusted line size adjustment, beam spot calibration, Electron Beam Focusing and essence
True scanning motion；The vacuum system is in order to whole formation system evacuation.
9. electron beam selective melting rapid forming system as claimed in claim 8, it is characterised in that the electron gun control system
Unite, according to the quantity of independent electrical beamlet transmitter unit and array arrangement position, powder bed is divided into corresponding array scanning region, each
The corresponding block array scanning area of independent electrical beamlet transmitter unit, controls the independence above respective regions by electron gun control system
Electron beam emission unit carries out accurate scan shaping to corresponding array scanning region.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610906011.5A CN106504966B (en) | 2016-10-18 | 2016-10-18 | A kind of integration array electronic rifle and electron beam selective melting rapid forming system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610906011.5A CN106504966B (en) | 2016-10-18 | 2016-10-18 | A kind of integration array electronic rifle and electron beam selective melting rapid forming system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106504966A true CN106504966A (en) | 2017-03-15 |
| CN106504966B CN106504966B (en) | 2018-05-22 |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107030356A (en) * | 2017-05-03 | 2017-08-11 | 桂林电子科技大学 | Multi-functional combined numerically controlled vacuum electron beam process equipment |
| CN109411319A (en) * | 2018-11-16 | 2019-03-01 | 合肥飞帆等离子科技有限公司 | A kind of novel plasma cathode electronics electron gun and 3D printer |
| CN110052609A (en) * | 2019-05-29 | 2019-07-26 | 中国航空制造技术研究院 | The coaxial fuse deposition formation equipment of electron beam tow |
| CN110838427A (en) * | 2019-11-20 | 2020-02-25 | 中国航空制造技术研究院 | Electronic gun device for fuse wire additive manufacturing |
| CN112379639A (en) * | 2020-09-28 | 2021-02-19 | 西安增材制造国家研究院有限公司 | Control system and control method of multi-electron gun EBSM (electron beam modulating) equipment |
| CN112397363A (en) * | 2020-09-28 | 2021-02-23 | 西安增材制造国家研究院有限公司 | Electron gun beam spot correction device and correction method |
| WO2022166631A1 (en) * | 2021-02-02 | 2022-08-11 | 湖州超群电子科技有限公司 | Electron beam 3d printing system and method of use thereof |
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| CN106504966B (en) | 2018-05-22 |
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