CN106783479A - A kind of electron gun and it is applied to its electron beam selective melting device - Google Patents
A kind of electron gun and it is applied to its electron beam selective melting device Download PDFInfo
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- CN106783479A CN106783479A CN201611092584.5A CN201611092584A CN106783479A CN 106783479 A CN106783479 A CN 106783479A CN 201611092584 A CN201611092584 A CN 201611092584A CN 106783479 A CN106783479 A CN 106783479A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/484—Eliminating deleterious effects due to thermal effects, electrical or magnetic fields; Preventing unwanted emission
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/40—Radiation means
- B22F12/41—Radiation means characterised by the type, e.g. laser or electron beam
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/20—Direct sintering or melting
- B22F10/28—Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/40—Radiation means
- B22F12/44—Radiation means characterised by the configuration of the radiation means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
- B22F12/40—Radiation means
- B22F12/49—Scanners
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
- B22F10/30—Process control
- B22F10/36—Process control of energy beam parameters
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
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- Manufacturing & Machinery (AREA)
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- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
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- Electron Sources, Ion Sources (AREA)
Abstract
The present invention provides a kind of electron gun, it includes cathode electrode unit, anode unit, grid unit and double focusing coil unit, the cathode electrode unit escapes thermoelectron after being heated, the grid unit is used to converge the thermoelectron and control through the thermoelectron quantity of the anode unit, the anode unit is arranged at the cathode electrode unit lower section, its center offers anodes centre hole, the double focusing coil unit, for being converged to the thermoelectron through the anodes centre hole, the double focusing coil unit includes one-level magnetic focusing coil and two grades of magnetic focusing coils, the one-level magnetic focusing coil is converged first to the thermoelectron through the anodes centre hole, obtain small convergent angle electron beam, two grades of magnetic focusing coils carry out secondary focusing to the small convergent angle electron beam, obtain the electron beam with fine beam spot diameter,.The present invention also provides a kind of electron beam selective melting device using above-mentioned electron gun.
Description
Technical field
The present invention can be used for the material increasing field of metallic element, more particularly to a kind of electron gun and be applied to its electricity
Beamlet selective melting device.
Background technology
Increases material manufacturing technology also known as 3D printing or RP technique.It is one kind with three-dimensional digital model file as base
Plinth, with metal dust, metal wire material or can cohesive plastic or other material, come constructed object by way of successively stacking accumulation
Technology.Metal increasing material manufacturing method mainly has selective laser sintering, selective laser fusing, the shaping of electron beam fuse, electron beam
The methods such as selective melting shaping.Wherein, electron beam selective melting shaping and selective laser fusing belongs to powder bed rapid shaping system
Make method.Compared to other rapid shaping techniques, compared to having, parts size precision is high, surface quality in powder bed rapid shaping direction
Good advantage, is one of Main way of rapid shaping technique development.
Electron beam selective melting shaping produces metal dust rapid melting, rapid solidification using electron gun launching electronics
3D solid metal parts.Principle is the electron bombardment metal powder layer that high-speed motion is produced by high voltage electric field, high-energy electricity
Kinetic energy is converted into heat energy after son and metal dust interaction makes metal molten.
But the high-speed motion of electronics can bring detrimental effect in powder bed melting process.High-speed motion electron bombardment gold
The defeated and dispersed phenomenon of serious powder occurs during category powder.Defeated and dispersed, the influence printout dimensional accuracy of this metal dust, or even meeting
Lead to not shape, burn substrate etc..Problem above is generally solved using the method for process optimization, i.e.,：Increase metal bisque pre-
Thermal process selects the larger metal dust of granularity.But this settling mode can increase processing step, reduce profiled member size
Precision.Most direct solution is to be improved by equipment, in reducing manufacturing process by the precise control of electron beam
The defeated and dispersed problem of powder.It is improved equipment to reduce the kinetic energy of the movement velocity, reduction electronic action of electronics on metal dust
Where key point, but accelerating potential reduction can cause Electron Beam Focusing difficulty to increase, and beam spot size is mutually strained greatly.
As shown in figure 1, electron gun be by negative electrode, anode, grid and one-level focus on magnetic coil constitute, be electron beam produce,
Transmitting, the device for converging.Electron gun operation principle:Thermoelectron is excited out after negative electrode is heated to uniform temperature, in anode and cathode
Between electrical potential difference under accelerate movement through and enter magnetic field after anode, and the process that electronics is converged is realized under one-level magnetic fields.
But focusing is only existed in certain range region, can be dissipated beyond rear electron beam.The reasons such as hot initial velocity are additionally, since, low
Under accelerating potential, electron beam divergence more serious, difficulty focusing.The one-level focus coil of electron gun, although converge can be very strong,
It is big due to angle can be focused on, it is difficult to accomplish to remain able to vernier focusing at lower voltages, obtain the beam spot of very small diameter；Simultaneously
The need for the beam spot quality of electron beam meets electron beam increasing material manufacturing when cannot also ensure that deflection angle is larger.High voltage condition
Under, Electron Beam Focusing is relatively easily controlled.But the high-speed motion electronics produced under accelerating potential high, when metal powder bed is bombarded
Big kinetic energy can be produced, the defeated and dispersed so as to influence formed precision of metal dust is caused.
The content of the invention
In order to solve the above mentioned problem of prior art, it is necessary to provide a kind of when both can avoid electron bombardment metal dust
The powder for causing is defeated and dispersed and can refine the electron gun of lectron beam spot diameter.
The present invention also provides a kind of electron beam selective melting device using above-mentioned electron gun.
The present invention solve technical problem provide technical scheme be：
A kind of electron gun, it includes cathode electrode unit, anode unit, grid unit and double focusing coil unit,
The cathode electrode unit escapes thermoelectron after being heated；
The grid unit, for converging the thermoelectron and control through the thermoelectron quantity of the anode unit；
The anode unit is arranged at the cathode electrode unit lower section, and its center offers anodes centre hole, the anode list
Potential difference is produced between the first and cathode electrode unit, the thermoelectron for converging the grid unit accelerates across the anodes centre
Hole；
The double focusing coil unit, for being converged to the thermoelectron through the anodes centre hole, the double focusing
Focal line coil unit includes one-level magnetic focusing coil and two grades of magnetic focusing coils, and the one-level magnetic focusing coil is to through the anode
The thermoelectron of centre bore is converged first, obtains small convergent angle electron beam, and two grades of magnetic focusing coils are to the small convergence
Angle electron beam carries out secondary focusing, obtains the electron beam with fine beam spot diameter,.
In the embodiment of the present invention, the cup type with theoretical radian of perforate centered on the grid unit, and cover completely
The cathode electrode unit.
In the embodiment of the present invention, the grid unit forms negative electricity potential difference with the cathode electrode unit, can be described by regulation
Negative electricity potential difference come control the thermoelectron through the anode unit quantity.
In the embodiment of the present invention, the double focusing coil unit is arranged at the anodes centre hole lower section.
In the embodiment of the present invention, the convergence beam spot diameter, of the small convergent angle electron beam is rz=(Q1/P) × remin,
Wherein, Q1 is that one-level focuses on beam spot to one-level focus coil centre distance；P is that beam spot to one-level is focused at anode hole
Focus coil centre distance, remin is the electronic beam radius focused at anode hole.
In the embodiment of the present invention, the beam spot diameter, of the electron beam of the fine beam spot diameter, is r=(Q2/Q1) × rz,
Wherein, Q2 is distance of the secondary focusing beam spot to secondary focusing hub of a spool；Q1 be one-level focus coil center with
The distance of secondary focusing hub of a spool.
In the embodiment of the present invention, also including high-voltage cable joint, the high-voltage cable joint is used for respectively by the negative electrode
Unit and the grid unit are connected with high voltage power supply.
In the embodiment of the present invention, the cathode electrode unit is arranged at the electron gun the top.
In the embodiment of the present invention, the electron gun also includes electron gun shell and true with what the electron gun shell was connected
Empty system pipeline.
The present invention also provides a kind of electron beam selective melting device, and it includes vacuum forming chamber, vacuum system, control system
System, high-voltage power apparatus and above-mentioned electron gun.
Compared with prior art, electron gun reasonable Arrangement double focusing in magnetic field according to theoretical calculation that the present invention is provided
The one-level of magnetic coil unit, secondary focusing coil, want so as to realize that electron beam quality of beam in molding flat everywhere reaches
Ask, it is ensured that can still be obtained in the case of low accelerating voltage with beam spot diameter, as accelerating potential lower class high, apply in electronics
In Shu Xuanqu melting process, electronic kinetic energy can be both reduced, it is to avoid the powder caused during electron bombardment metal dust is defeated and dispersed, and energy
Refinement lectron beam spot diameter, so as to can select the more tiny metal dust for melt molding, is finally reached raising printing
The purpose of part formed precision and surface quality.
Brief description of the drawings
Fig. 1 is the electron beam pattern constraint schematic diagram of the electron gun of prior art.
Fig. 2 is the structure chart of the electron gun of the embodiment of the present invention, wherein：20- electron guns；21- high-voltage cable joints；22-
Cathode electrode unit；23- grid units；24- anode units；25- double focusing coil units；51- one-levels focus on magnetic coil；Bis- grades of 52-
Focus on magnetic coil；26- vacuum system pipelines；27- electron gun shells.
Fig. 3 is the electron beam pattern constraint schematic diagram of the electron gun in Fig. 2.
Fig. 4 is the structure chart of the electron beam selective melting device for installing electron gun of the present invention, wherein：20- electron guns；30-
Vacuum forming chamber；40- vacuum systems；50- control systems；60- high voltage power supplies；31- powder cabins；32- powder bed.
Specific embodiment
Also referring to Fig. 2 and Fig. 3, electron gun provided in an embodiment of the present invention 20 includes high-voltage cable joint 21, negative electrode
Unit 22, grid unit 23, anode unit 24, double focusing coil unit 25, vacuum system pipeline 26 and electron gun shell 27.
The cathode electrode unit 22 is arranged at the top of the electron gun 20, and the cathode electrode unit 22 passes through the high-tension cable
Produce negative potential after joint 21 and external high pressure power electric connection, and escape thermoelectron after it is heated.
The grid unit 23, for converging the thermoelectron and control through the number of hot electrons of the anode unit 24
Amount, by the high-voltage cable joint 21 and external high pressure power electric connection.Perforate has centered on the grid unit 23
The cup type of theoretical radian, and the cathode electrode unit 22 is covered completely.The grid unit 23 forms negative with the cathode electrode unit 22
Potential difference, to control the thermionic convergence quantity by adjusting the negative electricity potential difference.
The anode unit 24 is arranged at the lower section of the cathode electrode unit 22, and its center offers anodes centre hole.The sun
Pole unit 24 is in zero point position, and its potential difference produced between the cathode electrode unit 22 makes the thermoelectron in the negative electrode
Single 2 yuan accelerate and and the anode unit 24 between by passing through the anodes centre hole after the grid unit；
The double focusing coil unit 25, it is described double for being converged to the thermoelectron through the anodes centre hole
Focus coil unit 5 includes one-level magnetic focusing coil 51 and two grades of magnetic focusing coils 52, and the one-level magnetic focusing coil 51 pairs is worn
The thermoelectron for crossing the anodes centre hole is converged first, obtains small convergent angle electron beam, two grades of magnetic focusing coils 52
Secondary focusing is carried out to the small convergent angle electron beam, the electron beam with fine beam spot diameter, is obtained.Wherein, the one-level magnetic
Focus coil 51 and two grades of magnetic focusing coils 52 are connected with control power supply, and are adjusted by magnetic coil by controlling power supply
Exciting current, so as to adjust the focus level of electron beam.The vacuum system pipeline 26 is connected with the electron gun shell 27
Connect, the vacuum system pipeline 26 is further connected with outside pump group.The pump group is by the vacuum system pipeline 26
Vacuumized inside electron gun shell 27, there is provided meet electron beam and produce and transmitting condition of high vacuum degree.
The operation principle of above-mentioned electron gun 20 is：In the course of work, the cathode electrode unit 22 and the anode unit 24 it
Between electrical potential difference by the cathode electrode unit 22 thermoelectron pull out, the thermoelectron launched through the grid unit 23 converge after
Form electron beam and pass through the anodes centre hole.The electron beam without magnetic field without electric field in the case of moved along inertia slope,
Dissipated under physical factor effect simultaneously.Realize focusing on first through the one-level magnetic focusing coil 51, then it is poly- through two grades of magnetic
Focal line circle 52 completes Second Aggregation, finally realizes electron beam farthest focusing.
As shown in figure 4, being the structural representation of the electron beam selective melting device of the embodiment of the present invention.The electron beam choosing
Area's melting appartus include electron gun 20, vacuum forming chamber 30, vacuum system 40, control system 50 and high voltage power supply 60.It is described true
Powder cabin 31, powder bed 32 is provided with empty forming room 30.The electron gun 20 forms sealing and docks with the vacuum forming chamber 30.Institute
State powder cabin 31 and sent on powder bed 32 described in electron-beam melting for providing metal dust to powder bed 32, the electron gun 20
Metal dust, carries out forming processes.The specific work process of the electron beam selective melting device is as follows：
The vacuum system 40 starts, and the electron gun 20 is reached specified vacuum degree with the vacuum forming chamber 30；
The powder cabin 31 provides the metal powder of setting thickness on powder bed 32 according to design requirement；
According to metal dust particle diameter and minimum theoretical beam spot diameter, that technique is set, calculating Single Electron and clashing into flies powder
This parameter value is simultaneously given the high voltage power supply 60 by scattered critical accelerating potential by the control system 50, by the height
Voltage source 60 adjusts electrical potential difference between the cathode electrode unit 22 and the anode unit 24；
Adjust the magnitude of voltage of the grid unit 23 by the high voltage power supply 60, correct the cathode electrode unit 22 with it is described
The electrical potential difference of grid unit 23 come obtain process stipulation met metal bisque melt line value；
The exciting current value of the one-level magnetic focusing coil 51 and two grades of magnetic focusing coils 52 is adjusted respectively to adjust
The focus level of electron beam controls to project to the beam spot size of metal bisque, until obtain the tool for meeting beam spot quality requirements
There is the electron beam of fine beam spot diameter,.
The beam spot diameter, Size calculation of the electron beam with fine beam spot diameter, is as follows：
1. 51 pairs of diverging electronics launched from electrostatic field of the one-level magnetic focusing coil are converged first, obtain small meeting
Poly- angle electron beam, it is rz=(Q1/P) × remin that it converges beam spot diameter,
Wherein：Q1 is that one-level focuses on beam spot to one-level focus coil centre distance；P is that beam spot to one-level is focused at anode hole
Focus coil centre distance, remin is the electronic beam radius focused at anode hole.
2. the electron beam that two grades of magnetic focusing coils 52 pairs have formed small convergent angle carries out secondary focusing, further refinement
The focus level of electronics, finally gives the electron beam with fine beam spot diameter, and the beam spot diameter, of the electron beam is r=(Q2/
Q1) × rz,
Wherein：Q2 is distance of the secondary focusing beam spot to secondary focusing hub of a spool；Q1 be one-level focus coil center with
The distance of secondary focusing hub of a spool.
Powder bed 32 sets the metal dust of thickness described in the electron-beam melting with fine focus, prints object
Part.
In sum, the electron gun that the present invention is provided reasonable Arrangement double focusing magnetic coil list in magnetic field according to theoretical calculation
One-level, the secondary focusing coil of unit, so as to realize that electron beam quality of beam in molding flat everywhere reaches requirement, it is ensured that
Can still be obtained in the case of low accelerating voltage with beam spot diameter, as accelerating potential lower class high, apply electron beam constituency melt
During, can both reduce electronic kinetic energy, it is to avoid the powder caused during electron bombardment metal dust is defeated and dispersed, electron beam can be refined again
Beam spot diameter, so as to can select the more tiny metal dust for melt molding, is finally reached raising printout formed precision
And the purpose of surface quality.
Above content is to combine specific preferred embodiment further description made for the present invention, it is impossible to assert
Specific implementation of the invention is confined to these explanations.For general technical staff of the technical field of the invention,
On the premise of not departing from present inventive concept, some simple deduction or replace can also be made, should be all considered as belonging to of the invention
Protection domain.
Claims (10)
1. a kind of electron gun, it is characterised in that including cathode electrode unit, anode unit, grid unit and double focusing coil unit,
The cathode electrode unit escapes thermoelectron after being heated；
The grid unit, for converging the thermoelectron and control through the thermoelectron quantity of the anode unit；
The anode unit is arranged at cathode electrode unit lower section, and its center offers anodes centre hole, the anode unit with
Potential difference is produced between the cathode electrode unit, the thermoelectron for converging the grid unit accelerates across the anodes centre hole；
The double focusing coil unit, for being converged to the thermoelectron through the anodes centre hole, the double focusing focal line
Coil unit includes one-level magnetic focusing coil and two grades of magnetic focusing coils, and the one-level magnetic focusing coil is to through the anodes centre
The thermoelectron in hole is converged first, obtains small convergent angle electron beam, and two grades of magnetic focusing coils are to the small convergent angle electricity
Beamlet carries out secondary focusing, obtains the electron beam with fine beam spot diameter,.
2. electron gun according to claim 1, it is characterised in that perforate with theoretical arc centered on the grid unit
The cup type of degree, and the cathode electrode unit is covered completely.
3. electron gun according to claim 2, it is characterised in that the grid unit and the cathode electrode unit form negative electricity
Potential difference, can control the thermoelectron quantity through the anode unit by adjusting the negative electricity potential difference.
4. electron gun according to claim 1, it is characterised in that the double focusing coil unit is arranged in the anode
Heart hole lower section.
5. electron gun according to claim 1, it is characterised in that the convergence beam spot diameter, of the small convergent angle electron beam is
Rz=(Q1/P) × remin,
Wherein, Q1 is that one-level focuses on beam spot to one-level focus coil centre distance；P is to focus on beam spot at anode hole to be focused on to one-level
Hub of a spool distance, remin is the electronic beam radius focused at anode hole.
6. electron gun according to claim 5, it is characterised in that the beam spot diameter, of the electron beam of the fine beam spot diameter,
It is r=(Q2/Q1) × rz,
Wherein, Q2 is distance of the secondary focusing beam spot to secondary focusing hub of a spool；Q1 is one-level focus coil center and two grades
The distance at focus coil center.
7. electron gun according to claim 1, it is characterised in that also including high-voltage cable joint, the high-tension cable connects
For with high voltage power supply to be connected for the cathode electrode unit and the grid unit respectively by head.
8. electron gun according to claim 1, it is characterised in that the cathode electrode unit is arranged at the electron gun and most goes up
Side.
9. electron gun according to claim 1, also including electron gun shell and true with what the electron gun shell was connected
Empty system pipeline.
10. a kind of electron beam selective melting device, it is characterised in that including vacuum forming chamber, vacuum system, control system, height
Electron gun in piezoelectricity source device and claim 1-9 described in any one.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201611092584.5A CN106783479A (en) | 2016-12-01 | 2016-12-01 | A kind of electron gun and it is applied to its electron beam selective melting device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201611092584.5A CN106783479A (en) | 2016-12-01 | 2016-12-01 | A kind of electron gun and it is applied to its electron beam selective melting device |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109175371A (en) * | 2018-11-02 | 2019-01-11 | 西安赛隆金属材料有限责任公司 | A kind of ferromagnetic concentrator and powder bed electron beam selective melting former |
| CN111712898A (en) * | 2017-12-22 | 2020-09-25 | 阿尔卡姆公司 | Electron beam source and application thereof |
| CN111957959A (en) * | 2020-08-11 | 2020-11-20 | 天津清研智束科技有限公司 | Electron beam additive manufacturing device and method |
| CN112084688A (en) * | 2020-08-18 | 2020-12-15 | 中国电子产品可靠性与环境试验研究所（（工业和信息化部电子第五研究所）（中国赛宝实验室）） | Cathode life prediction method |
| CN114178668A (en) * | 2021-12-01 | 2022-03-15 | 西北工业大学 | Pen type handheld electron beam gun special for space welding |
| CN117733305A (en) * | 2024-02-20 | 2024-03-22 | 四川华束科技有限公司 | Sealed-off type electron gun and non-vacuum electron beam welding robot |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111712898A (en) * | 2017-12-22 | 2020-09-25 | 阿尔卡姆公司 | Electron beam source and application thereof |
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| CN111957959A (en) * | 2020-08-11 | 2020-11-20 | 天津清研智束科技有限公司 | Electron beam additive manufacturing device and method |
| CN112084688A (en) * | 2020-08-18 | 2020-12-15 | 中国电子产品可靠性与环境试验研究所（（工业和信息化部电子第五研究所）（中国赛宝实验室）） | Cathode life prediction method |
| CN112084688B (en) * | 2020-08-18 | 2023-10-03 | 中国电子产品可靠性与环境试验研究所（（工业和信息化部电子第五研究所）（中国赛宝实验室）） | Cathode life prediction method |
| CN114178668A (en) * | 2021-12-01 | 2022-03-15 | 西北工业大学 | Pen type handheld electron beam gun special for space welding |
| CN117733305A (en) * | 2024-02-20 | 2024-03-22 | 四川华束科技有限公司 | Sealed-off type electron gun and non-vacuum electron beam welding robot |
| CN117733305B (en) * | 2024-02-20 | 2024-04-26 | 四川华束科技有限公司 | Sealed-off type electron gun and non-vacuum electron beam welding robot |
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Application publication date: 20170531 |