CN106371297A - 显影液成分浓度测定装置及方法、显影液管理装置及方法 - Google Patents

显影液成分浓度测定装置及方法、显影液管理装置及方法 Download PDF

Info

Publication number
CN106371297A
CN106371297A CN201510994050.0A CN201510994050A CN106371297A CN 106371297 A CN106371297 A CN 106371297A CN 201510994050 A CN201510994050 A CN 201510994050A CN 106371297 A CN106371297 A CN 106371297A
Authority
CN
China
Prior art keywords
developer solution
value
density
concentration
mentioned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510994050.0A
Other languages
English (en)
Chinese (zh)
Inventor
中川俊元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hirama Rika Kenkyusho Ltd
Hirama Laboratories Co Ltd
Original Assignee
Hirama Rika Kenkyusho Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hirama Rika Kenkyusho Ltd filed Critical Hirama Rika Kenkyusho Ltd
Publication of CN106371297A publication Critical patent/CN106371297A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
    • G01N9/36—Analysing materials by measuring the density or specific gravity, e.g. determining quantity of moisture
CN201510994050.0A 2015-07-22 2015-12-25 显影液成分浓度测定装置及方法、显影液管理装置及方法 Pending CN106371297A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015144970A JP6713658B2 (ja) 2015-07-22 2015-07-22 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法
JP2015-144970 2015-07-22

Publications (1)

Publication Number Publication Date
CN106371297A true CN106371297A (zh) 2017-02-01

Family

ID=57880824

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510994050.0A Pending CN106371297A (zh) 2015-07-22 2015-12-25 显影液成分浓度测定装置及方法、显影液管理装置及方法

Country Status (4)

Country Link
JP (1) JP6713658B2 (ja)
KR (1) KR20170011961A (ja)
CN (1) CN106371297A (ja)
TW (1) TWI688836B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108344662A (zh) * 2017-01-23 2018-07-31 株式会社平间理化研究所 显影液的二氧化碳浓度显示装置及显影液管理装置
CN108957967A (zh) * 2017-05-26 2018-12-07 株式会社平间理化研究所 显影液的浓度管理装置以及基板的显影处理系统

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6505534B2 (ja) * 2015-07-22 2019-04-24 株式会社平間理化研究所 現像液の管理方法及び装置
JP2018120897A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置
WO2022074820A1 (ja) * 2020-10-09 2022-04-14 三菱重工業株式会社 分析システム及び管理システム、並びに分析方法、並びに分析プログラム

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1373393A (zh) * 2001-02-06 2002-10-09 长濑产业株式会社 显影液制造装置及显影液制造方法
CN1379285A (zh) * 2001-02-06 2002-11-13 株式会社平间理化研究所 精制显影液制造装置及精制显影液制造方法
WO2002093264A1 (en) * 2001-05-11 2002-11-21 Kodak Polychrome Graphics Company Ltd. Developer for alkaline-developable lithogaphic printing plates
JP2005070351A (ja) * 2003-08-22 2005-03-17 Nagase & Co Ltd 現像液供給方法及び装置
CN101563654A (zh) * 2006-11-30 2009-10-21 三菱化学工程株式会社 显影液的浓度调节方法、调制装置和显影液
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法
JP2012225709A (ja) * 2011-04-18 2012-11-15 Toshiba Corp 二酸化炭素濃度測定装置、二酸化炭素濃度測定方法、及び二酸化炭素回収システム

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2561578B2 (ja) 1991-08-07 1996-12-11 株式会社平間理化研究所 現像液管理装置
CN1327888A (zh) * 2000-06-09 2001-12-26 株式会社平间理化研究所 基板表面处理装置
JP3610045B2 (ja) * 2001-02-06 2005-01-12 株式会社平間理化研究所 精製現像液製造装置及び精製現像液製造方法
JP6081458B2 (ja) * 2012-06-29 2017-02-15 富士フイルム株式会社 現像処理廃液濃縮方法及び現像処理廃液のリサイクル方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1373393A (zh) * 2001-02-06 2002-10-09 长濑产业株式会社 显影液制造装置及显影液制造方法
CN1379285A (zh) * 2001-02-06 2002-11-13 株式会社平间理化研究所 精制显影液制造装置及精制显影液制造方法
WO2002093264A1 (en) * 2001-05-11 2002-11-21 Kodak Polychrome Graphics Company Ltd. Developer for alkaline-developable lithogaphic printing plates
JP2005070351A (ja) * 2003-08-22 2005-03-17 Nagase & Co Ltd 現像液供給方法及び装置
CN101563654A (zh) * 2006-11-30 2009-10-21 三菱化学工程株式会社 显影液的浓度调节方法、调制装置和显影液
CN103852978A (zh) * 2006-11-30 2014-06-11 三菱化学工程株式会社 显影液的浓度调节方法、调制装置和显影液
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法
JP2012225709A (ja) * 2011-04-18 2012-11-15 Toshiba Corp 二酸化炭素濃度測定装置、二酸化炭素濃度測定方法、及び二酸化炭素回収システム

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108344662A (zh) * 2017-01-23 2018-07-31 株式会社平间理化研究所 显影液的二氧化碳浓度显示装置及显影液管理装置
CN108957967A (zh) * 2017-05-26 2018-12-07 株式会社平间理化研究所 显影液的浓度管理装置以及基板的显影处理系统

Also Published As

Publication number Publication date
TW201704900A (zh) 2017-02-01
KR20170011961A (ko) 2017-02-02
JP6713658B2 (ja) 2020-06-24
JP2017028090A (ja) 2017-02-02
TWI688836B (zh) 2020-03-21

Similar Documents

Publication Publication Date Title
CN106371297A (zh) 显影液成分浓度测定装置及方法、显影液管理装置及方法
CN103852978B (zh) 显影液的浓度调节方法、调制装置和显影液
CN106371296A (zh) 显影液成分浓度测定方法及装置、显影液管理方法及装置
CN103868822A (zh) 一种湿法脱硫吸收塔内浆液密度测量装置
TWI676086B (zh) 顯影液之管理方法及裝置
CN107213824A (zh) 一种制造车用尿素溶液的方法及装置
CN108345183A (zh) 显影液管理装置
CN108344662A (zh) 显影液的二氧化碳浓度显示装置及显影液管理装置
CN207502917U (zh) 显影液的浓度管理装置以及基板的显影处理系统
CN108345186A (zh) 显影液管理装置
CN108345168A (zh) 显影装置
CN108345185A (zh) 显影液的浓度监视装置及显影液管理装置
JP2018120893A (ja) 現像液の成分濃度測定装置、及び現像液管理装置
JP2018120901A (ja) 現像装置
CN108345184A (zh) 显影装置
JP2018120894A (ja) 現像液の濃度監視装置、及び現像液管理装置
CN115165669A (zh) 一种同外观双浮子高度差在线式液体密度计
JPH11100684A (ja) エッチング液の比重測定装置
JPS6022653A (ja) 塩素イオン濃度測定装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20170201