CN106353967B - 防尘薄膜组件收纳容器以及防尘薄膜组件的取出方法 - Google Patents
防尘薄膜组件收纳容器以及防尘薄膜组件的取出方法 Download PDFInfo
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- CN106353967B CN106353967B CN201610537309.3A CN201610537309A CN106353967B CN 106353967 B CN106353967 B CN 106353967B CN 201610537309 A CN201610537309 A CN 201610537309A CN 106353967 B CN106353967 B CN 106353967B
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- needle
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- dustproof film
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Packaging Frangible Articles (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015-139398 | 2015-07-13 | ||
| JP2015139398A JP6351178B2 (ja) | 2015-07-13 | 2015-07-13 | ペリクル収納容器およびペリクルの取り出し方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106353967A CN106353967A (zh) | 2017-01-25 |
| CN106353967B true CN106353967B (zh) | 2019-12-03 |
Family
ID=57843108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610537309.3A Active CN106353967B (zh) | 2015-07-13 | 2016-07-08 | 防尘薄膜组件收纳容器以及防尘薄膜组件的取出方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6351178B2 (ko) |
| KR (1) | KR102610556B1 (ko) |
| CN (1) | CN106353967B (ko) |
| TW (1) | TWI588598B (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107512472B (zh) * | 2017-09-14 | 2023-02-10 | 国网吉林省电力有限公司电力科学研究院 | 粉尘采样用无尘滤膜储备盒及其使用方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03117692U (ko) * | 1990-02-15 | 1991-12-05 | ||
| JPH0640482A (ja) * | 1991-12-25 | 1994-02-15 | Hitachi Ltd | 搬送用トレイ |
| JPH0645965A (ja) | 1992-07-24 | 1994-02-18 | Nec Corp | 復号器 |
| JP4497845B2 (ja) | 2003-06-04 | 2010-07-07 | 旭化成イーマテリアルズ株式会社 | 大型ペリクルの収納方法 |
| JP4391435B2 (ja) | 2005-03-22 | 2009-12-24 | 信越化学工業株式会社 | ペリクル収納容器 |
| JP4649363B2 (ja) * | 2006-04-19 | 2011-03-09 | 信越化学工業株式会社 | ペリクル収納容器 |
| JP5051840B2 (ja) * | 2007-11-22 | 2012-10-17 | 信越化学工業株式会社 | ペリクル収納容器内にペリクルを保管する方法 |
| JP2011034020A (ja) * | 2009-08-06 | 2011-02-17 | Shin-Etsu Chemical Co Ltd | ペリクル収納容器 |
| JP5528190B2 (ja) * | 2010-04-23 | 2014-06-25 | 信越化学工業株式会社 | ペリクル収納容器 |
| JP5586559B2 (ja) * | 2011-10-28 | 2014-09-10 | 信越化学工業株式会社 | ペリクル収容容器 |
| JP5586560B2 (ja) * | 2011-10-28 | 2014-09-10 | 信越化学工業株式会社 | ペリクル収容容器 |
| JP5864399B2 (ja) * | 2012-10-22 | 2016-02-17 | 信越化学工業株式会社 | ペリクル収納容器 |
-
2015
- 2015-07-13 JP JP2015139398A patent/JP6351178B2/ja active Active
-
2016
- 2016-06-27 KR KR1020160080136A patent/KR102610556B1/ko active IP Right Grant
- 2016-07-07 TW TW105121476A patent/TWI588598B/zh active
- 2016-07-08 CN CN201610537309.3A patent/CN106353967B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN106353967A (zh) | 2017-01-25 |
| TWI588598B (zh) | 2017-06-21 |
| KR102610556B1 (ko) | 2023-12-07 |
| JP6351178B2 (ja) | 2018-07-04 |
| KR20170008154A (ko) | 2017-01-23 |
| TW201704854A (zh) | 2017-02-01 |
| JP2017021229A (ja) | 2017-01-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |