CN106319473A - Cigs太阳能电池薄膜生产线 - Google Patents
Cigs太阳能电池薄膜生产线 Download PDFInfo
- Publication number
- CN106319473A CN106319473A CN201610786190.3A CN201610786190A CN106319473A CN 106319473 A CN106319473 A CN 106319473A CN 201610786190 A CN201610786190 A CN 201610786190A CN 106319473 A CN106319473 A CN 106319473A
- Authority
- CN
- China
- Prior art keywords
- thin film
- chamber
- roller
- line
- sub
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 85
- 238000001704 evaporation Methods 0.000 claims abstract description 34
- 230000008020 evaporation Effects 0.000 claims abstract description 34
- 238000000576 coating method Methods 0.000 claims abstract description 17
- 239000011248 coating agent Substances 0.000 claims abstract description 15
- 230000005540 biological transmission Effects 0.000 claims abstract description 10
- 239000010409 thin film Substances 0.000 claims description 127
- 239000010408 film Substances 0.000 claims description 107
- 238000004544 sputter deposition Methods 0.000 claims description 76
- 238000005096 rolling process Methods 0.000 claims description 48
- 230000007704 transition Effects 0.000 claims description 36
- 238000001816 cooling Methods 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 20
- 230000033228 biological regulation Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 4
- 230000009123 feedback regulation Effects 0.000 claims description 2
- 238000001514 detection method Methods 0.000 abstract description 13
- 239000013067 intermediate product Substances 0.000 abstract description 2
- 238000012544 monitoring process Methods 0.000 abstract description 2
- 238000009792 diffusion process Methods 0.000 abstract 1
- 238000009776 industrial production Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 41
- 238000010438 heat treatment Methods 0.000 description 24
- 230000000694 effects Effects 0.000 description 18
- 230000008569 process Effects 0.000 description 18
- 238000009834 vaporization Methods 0.000 description 15
- 230000008016 vaporization Effects 0.000 description 15
- 238000001755 magnetron sputter deposition Methods 0.000 description 14
- 238000005516 engineering process Methods 0.000 description 10
- 238000007738 vacuum evaporation Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 230000008901 benefit Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- 230000009471 action Effects 0.000 description 6
- 230000009977 dual effect Effects 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 210000004379 membrane Anatomy 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000011669 selenium Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 210000002469 basement membrane Anatomy 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 2
- 231100000252 nontoxic Toxicity 0.000 description 2
- 230000003000 nontoxic effect Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 238000005118 spray pyrolysis Methods 0.000 description 2
- 238000004781 supercooling Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 206010054949 Metaplasia Diseases 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000000441 X-ray spectroscopy Methods 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- -1 and vacuum is low Substances 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 238000004500 asepsis Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000011143 downstream manufacturing Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000015689 metaplastic ossification Effects 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 231100000289 photo-effect Toxicity 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- IRPLSAGFWHCJIQ-UHFFFAOYSA-N selanylidenecopper Chemical compound [Se]=[Cu] IRPLSAGFWHCJIQ-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610786190.3A CN106319473B (zh) | 2016-08-31 | 2016-08-31 | Cigs太阳能电池薄膜生产线 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610786190.3A CN106319473B (zh) | 2016-08-31 | 2016-08-31 | Cigs太阳能电池薄膜生产线 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106319473A true CN106319473A (zh) | 2017-01-11 |
CN106319473B CN106319473B (zh) | 2019-04-16 |
Family
ID=57789454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610786190.3A Active CN106319473B (zh) | 2016-08-31 | 2016-08-31 | Cigs太阳能电池薄膜生产线 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106319473B (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108831956A (zh) * | 2018-06-14 | 2018-11-16 | 浙江尚越新能源开发有限公司 | 柔性太阳能电池铜铟镓硒制造设备 |
CN109913810A (zh) * | 2017-12-13 | 2019-06-21 | 湘潭宏大真空技术股份有限公司 | 真空磁控溅射镀膜生产线 |
CN109920865A (zh) * | 2017-12-13 | 2019-06-21 | 湘潭宏大真空技术股份有限公司 | 一种制备薄膜太阳能电池的方法 |
CN109957779A (zh) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | 薄膜太阳能电池前电极连续式磁控溅射单面镀膜生产线 |
CN112599643A (zh) * | 2020-12-30 | 2021-04-02 | 尚越光电科技股份有限公司 | 一种tco镀膜机的开压、方阻在线监测系统 |
CN112952000A (zh) * | 2019-12-10 | 2021-06-11 | 中国科学院大连化学物理研究所 | 一种用于制备钙钛矿太阳电池的团簇式沉积系统 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107794510B (zh) * | 2016-08-31 | 2020-01-07 | 湘潭宏大真空技术股份有限公司 | 柔性薄膜立式真空镀膜生产线 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102024870A (zh) * | 2010-04-19 | 2011-04-20 | 福建欧德生光电科技有限公司 | 半导体薄膜太阳能电池的制造系统和方法 |
CN102110732A (zh) * | 2010-11-30 | 2011-06-29 | 苏州新区科兴威尔电子有限公司 | 柔性薄膜太阳能光电池及其大规模连续自动化生产方法 |
CN102610700A (zh) * | 2012-04-05 | 2012-07-25 | 复旦大学 | 一种卷对卷方式制作柔性薄膜太阳能电池的方法 |
CN202730224U (zh) * | 2012-07-23 | 2013-02-13 | 陈晓东 | 一种柔性薄膜太阳能电池导电膜沉积设备 |
CN103290385A (zh) * | 2013-05-24 | 2013-09-11 | 深圳市生波尔机电设备有限公司 | 卷对卷立式磁控镀膜装置 |
CN204198131U (zh) * | 2014-10-29 | 2015-03-11 | 高忠青 | 一种镀锡铜线的自动收线装置 |
CN206022406U (zh) * | 2016-08-31 | 2017-03-15 | 湘潭宏大真空技术股份有限公司 | Cigs太阳能电池薄膜生产线 |
-
2016
- 2016-08-31 CN CN201610786190.3A patent/CN106319473B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102024870A (zh) * | 2010-04-19 | 2011-04-20 | 福建欧德生光电科技有限公司 | 半导体薄膜太阳能电池的制造系统和方法 |
CN102110732A (zh) * | 2010-11-30 | 2011-06-29 | 苏州新区科兴威尔电子有限公司 | 柔性薄膜太阳能光电池及其大规模连续自动化生产方法 |
CN102610700A (zh) * | 2012-04-05 | 2012-07-25 | 复旦大学 | 一种卷对卷方式制作柔性薄膜太阳能电池的方法 |
CN202730224U (zh) * | 2012-07-23 | 2013-02-13 | 陈晓东 | 一种柔性薄膜太阳能电池导电膜沉积设备 |
CN103290385A (zh) * | 2013-05-24 | 2013-09-11 | 深圳市生波尔机电设备有限公司 | 卷对卷立式磁控镀膜装置 |
CN204198131U (zh) * | 2014-10-29 | 2015-03-11 | 高忠青 | 一种镀锡铜线的自动收线装置 |
CN206022406U (zh) * | 2016-08-31 | 2017-03-15 | 湘潭宏大真空技术股份有限公司 | Cigs太阳能电池薄膜生产线 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109913810A (zh) * | 2017-12-13 | 2019-06-21 | 湘潭宏大真空技术股份有限公司 | 真空磁控溅射镀膜生产线 |
CN109920865A (zh) * | 2017-12-13 | 2019-06-21 | 湘潭宏大真空技术股份有限公司 | 一种制备薄膜太阳能电池的方法 |
CN109957779A (zh) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | 薄膜太阳能电池前电极连续式磁控溅射单面镀膜生产线 |
CN108831956A (zh) * | 2018-06-14 | 2018-11-16 | 浙江尚越新能源开发有限公司 | 柔性太阳能电池铜铟镓硒制造设备 |
CN108831956B (zh) * | 2018-06-14 | 2023-12-15 | 浙江尚越新能源开发有限公司 | 柔性太阳能电池铜铟镓硒制造设备 |
CN112952000A (zh) * | 2019-12-10 | 2021-06-11 | 中国科学院大连化学物理研究所 | 一种用于制备钙钛矿太阳电池的团簇式沉积系统 |
CN112599643A (zh) * | 2020-12-30 | 2021-04-02 | 尚越光电科技股份有限公司 | 一种tco镀膜机的开压、方阻在线监测系统 |
CN112599643B (zh) * | 2020-12-30 | 2022-05-10 | 尚越光电科技股份有限公司 | 一种tco镀膜机的开压、方阻在线监测系统 |
Also Published As
Publication number | Publication date |
---|---|
CN106319473B (zh) | 2019-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106319473B (zh) | Cigs太阳能电池薄膜生产线 | |
CN107794510A (zh) | 柔性薄膜立式真空镀膜生产线 | |
CN101958371B (zh) | 铜铟镓硒薄膜太阳能电池制备装置 | |
CN105720132B (zh) | 一种柔性衬底上制备cigs吸收层碱金属掺杂方法 | |
CN103560169B (zh) | 一种大型太阳能薄膜电池片组件生产工艺及设备 | |
CN103074583B (zh) | 一种cigs薄膜电池的激光沉积制备工艺 | |
KR20100126717A (ko) | 태양 전지의 제조 방법 | |
US8927322B2 (en) | Combinatorial methods for making CIGS solar cells | |
US20150228823A1 (en) | Apparatus and methods of mixing and depositing thin film photovoltaic compositions | |
CN102482796A (zh) | 掺杂的透明导电氧化物 | |
CN206022406U (zh) | Cigs太阳能电池薄膜生产线 | |
CN103367523A (zh) | 薄膜太阳能电池的吸收层制作装置及其制作方法 | |
CN103866239A (zh) | 一种线性蒸发源装置 | |
WO2014012383A1 (zh) | 一种铜铟镓硒薄膜太阳能电池的制备方法 | |
WO2013185506A1 (zh) | 一种铜铟镓硒薄膜太阳能电池的制备方法 | |
EP2402478B1 (en) | Method of forming a conductive transparent oxide film. | |
EP2385151A1 (en) | System and methods for high-rate co-sputtering of thin film layers on photovoltaic module substrates | |
EP2381010B1 (en) | Methods for high-rate sputtering of a compound semiconductor on large area substrates | |
CN105006501A (zh) | Cigs基薄膜太阳能电池的制备方法及制备装置 | |
CN105514218A (zh) | 一种制备铜铟镓硒吸收层的在线监测方法 | |
CN103346213A (zh) | 一种太阳能电池吸收层的制备方法 | |
CN203553200U (zh) | 一种大型太阳能薄膜电池片组件生产设备 | |
US20120024692A1 (en) | Mixed sputtering targets and their use in cadmium sulfide layers of cadmium telluride vased thin film photovoltaic devices | |
US20130252367A1 (en) | System and process for forming thin film photovoltaic device | |
CN103531661B (zh) | 一种(220)取向的铜铟镓硒薄膜制备方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20170616 Address after: On the ground floor on the east side of Jiaxing city in Zhejiang province 314000 Xiuzhou Industrial Park and Jiaxing Science Park Kang Road PV 6 floor Applicant after: Asahi new energy Limited by Share Ltd Applicant after: Xiangtan Hongda Vacuum Technology Co., Ltd. Address before: 411100 Hunan province Xiangtan City Jiuhua Industrial Park Shengshi Road No. 8 Applicant before: Xiangtan Hongda Vacuum Technology Co., Ltd. |
|
CB03 | Change of inventor or designer information | ||
CB03 | Change of inventor or designer information |
Inventor after: Huang Le Inventor after: Zhu Jiakuan Inventor after: Zhu Haisheng Inventor after: Huang Guoxing Inventor after: Gao Jinlong Inventor after: Liu Jiepeng Inventor after: Sun Guihong Inventor after: Huang Xia Inventor after: Xiao Xudong Inventor before: Huang Le Inventor before: Zhu Haisheng Inventor before: Huang Guoxing Inventor before: Sun Guihong Inventor before: Huang Xia |
|
GR01 | Patent grant | ||
GR01 | Patent grant |