CN106206938A - 相变化存储装置及其制造方法 - Google Patents
相变化存储装置及其制造方法 Download PDFInfo
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- CN106206938A CN106206938A CN201510293396.8A CN201510293396A CN106206938A CN 106206938 A CN106206938 A CN 106206938A CN 201510293396 A CN201510293396 A CN 201510293396A CN 106206938 A CN106206938 A CN 106206938A
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- Prior art keywords
- phase
- heater
- change memory
- groove
- manufacture method
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000000463 material Substances 0.000 claims abstract description 89
- 230000004888 barrier function Effects 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 18
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 15
- 229910052787 antimony Inorganic materials 0.000 claims description 14
- 229910052714 tellurium Inorganic materials 0.000 claims description 12
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 12
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 229910052732 germanium Inorganic materials 0.000 claims description 10
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 229910052719 titanium Inorganic materials 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 8
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 229910010037 TiAlN Inorganic materials 0.000 claims description 4
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 150000001786 chalcogen compounds Chemical class 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 230000008859 change Effects 0.000 abstract description 17
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000007772 electrode material Substances 0.000 description 15
- 239000012071 phase Substances 0.000 description 13
- 238000005516 engineering process Methods 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000000231 atomic layer deposition Methods 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000012782 phase change material Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 150000004770 chalcogenides Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000013049 sediment Substances 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910001245 Sb alloy Inorganic materials 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910001215 Te alloy Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
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Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201510293396.8A CN106206938B (zh) | 2015-06-01 | 2015-06-01 | 相变化存储装置及其制造方法 |
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CN201510293396.8A CN106206938B (zh) | 2015-06-01 | 2015-06-01 | 相变化存储装置及其制造方法 |
Publications (2)
Publication Number | Publication Date |
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CN106206938A true CN106206938A (zh) | 2016-12-07 |
CN106206938B CN106206938B (zh) | 2019-01-18 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021092942A1 (zh) * | 2019-11-15 | 2021-05-20 | 江苏时代全芯存储科技股份有限公司 | 内存单元及其制造方法 |
WO2022111254A1 (en) * | 2020-11-25 | 2022-06-02 | International Business Machines Corporation | Integrated phase change memory cell projection liner and etch stop layer |
WO2022123366A1 (en) * | 2020-12-08 | 2022-06-16 | International Business Machines Corporation | Phase change memory cell |
US11476418B2 (en) | 2020-12-08 | 2022-10-18 | International Business Machines Corporation | Phase change memory cell with a projection liner |
WO2024060645A1 (en) * | 2022-09-22 | 2024-03-28 | International Business Machines Corporation | Phase change memory cell sidewall heater |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101232074A (zh) * | 2007-01-25 | 2008-07-30 | 财团法人工业技术研究院 | 相变存储装置及其制造方法 |
CN101330126A (zh) * | 2007-06-19 | 2008-12-24 | 财团法人工业技术研究院 | 相变化存储单元结构及其制造方法 |
CN101820048A (zh) * | 2009-02-18 | 2010-09-01 | 财团法人工业技术研究院 | 相变化存储装置及其制造方法 |
CN101847687A (zh) * | 2009-03-27 | 2010-09-29 | 力晶半导体股份有限公司 | 相变化内存组件及其制造方法 |
-
2015
- 2015-06-01 CN CN201510293396.8A patent/CN106206938B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101232074A (zh) * | 2007-01-25 | 2008-07-30 | 财团法人工业技术研究院 | 相变存储装置及其制造方法 |
CN101330126A (zh) * | 2007-06-19 | 2008-12-24 | 财团法人工业技术研究院 | 相变化存储单元结构及其制造方法 |
CN101820048A (zh) * | 2009-02-18 | 2010-09-01 | 财团法人工业技术研究院 | 相变化存储装置及其制造方法 |
CN101847687A (zh) * | 2009-03-27 | 2010-09-29 | 力晶半导体股份有限公司 | 相变化内存组件及其制造方法 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021092942A1 (zh) * | 2019-11-15 | 2021-05-20 | 江苏时代全芯存储科技股份有限公司 | 内存单元及其制造方法 |
WO2022111254A1 (en) * | 2020-11-25 | 2022-06-02 | International Business Machines Corporation | Integrated phase change memory cell projection liner and etch stop layer |
US11456417B2 (en) | 2020-11-25 | 2022-09-27 | International Business Machines Corporation | Integrated phase change memory cell projection liner and etch stop layer |
GB2616551A (en) * | 2020-11-25 | 2023-09-13 | Ibm | Integrated phase change memory cell projection liner and etch stop layer |
WO2022123366A1 (en) * | 2020-12-08 | 2022-06-16 | International Business Machines Corporation | Phase change memory cell |
US11456415B2 (en) | 2020-12-08 | 2022-09-27 | International Business Machines Corporation | Phase change memory cell with a wrap around and ring type of electrode contact and a projection liner |
US11476418B2 (en) | 2020-12-08 | 2022-10-18 | International Business Machines Corporation | Phase change memory cell with a projection liner |
GB2617734A (en) * | 2020-12-08 | 2023-10-18 | Ibm | Phase change memory cell |
WO2024060645A1 (en) * | 2022-09-22 | 2024-03-28 | International Business Machines Corporation | Phase change memory cell sidewall heater |
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Publication number | Publication date |
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CN106206938B (zh) | 2019-01-18 |
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Effective date of registration: 20170531 Address after: No. 188 East Huaihe Road, Huaiyin District, Jiangsu, Huaian Applicant after: Jiangsu times all core storage technology Co.,Ltd. Applicant after: BEING ADVANCED MEMORY TAIWAN LIMITED Address before: 315000 Zhejiang city of Ningbo province Yinzhou Industrial Park (New Yinzhou District Jiang Shan Zhen Zhang Yu Cun) Applicant before: NINGBO ADVANCED MEMORY TECHNOLOGY Corp. Applicant before: BEING ADVANCED MEMORY TAIWAN LIMITED |
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Address after: No. 601, Changjiang East Road, Huaiyin District, Huaian, Jiangsu Co-patentee after: BEING ADVANCED MEMORY TAIWAN LIMITED Patentee after: JIANGSU ADVANCED MEMORY TECHNOLOGY Co.,Ltd. Address before: 223300 No. 188 Huaihe East Road, Huaiyin District, Huaian City, Jiangsu Province Co-patentee before: BEING ADVANCED MEMORY TAIWAN LIMITED Patentee before: Jiangsu times all core storage technology Co.,Ltd. |
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CP03 | Change of name, title or address |
Address after: 802, unit 4, floor 8, building 2, yard 9, FengHao East Road, Haidian District, Beijing Patentee after: Beijing times full core storage technology Co.,Ltd. Patentee after: BEING ADVANCED MEMORY TAIWAN LIMITED Address before: 223300 No. 601 East Changjiang Road, Huaiyin District, Huaian City, Jiangsu Province Patentee before: JIANGSU ADVANCED MEMORY TECHNOLOGY Co.,Ltd. Patentee before: BEING ADVANCED MEMORY TAIWAN LIMITED |
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Effective date of registration: 20220831 Address after: 802, unit 4, floor 8, building 2, yard 9, FengHao East Road, Haidian District, Beijing Patentee after: Beijing times full core storage technology Co.,Ltd. Address before: Room 802, unit 4, floor 8, building 2, yard 9, FengHao East Road, Haidian District, Beijing 100094 Patentee before: Beijing times full core storage technology Co.,Ltd. Patentee before: BEING ADVANCED MEMORY TAIWAN LIMITED |