CN106112703A - A kind of error compensating method of ion beam processing workpiece - Google Patents
A kind of error compensating method of ion beam processing workpiece Download PDFInfo
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- CN106112703A CN106112703A CN201610504489.5A CN201610504489A CN106112703A CN 106112703 A CN106112703 A CN 106112703A CN 201610504489 A CN201610504489 A CN 201610504489A CN 106112703 A CN106112703 A CN 106112703A
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- processing
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B39/00—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
- C23F4/04—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00 by physical dissolution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Abstract
The present invention relates to the error compensating method of a kind of ion beam processing workpiece.Error compensating method comprises the following steps；1) first graphic data of acquisition processing workpiece sample is measured；2) processing workpiece sample is carried out ion beam processing；3) the processing workpiece sample after processing is measured, obtain second graphic data；4) calculate acquisition face shape and remove data, the sweep time of face shape removal data with ion beam is carried out mathematical relationship matching acquisition and removes error relationship function；5) processing workpiece calibration is obtained machined surface graphic data；6) planning ion beam residence time data in scanning track；7) the residence time compensating approach removing error relationship function to processing workpiece is utilized.The present invention is effectively increased the precision of ion beam processing；Simultaneously without detecting the temperature of the scanning tracing point in processing workpiece in the actual course of processing, method is simpler, economical and effective.
Description
Technical field
The invention belongs to ion beam processing field, be specifically related to the error compensating method of a kind of ion beam processing workpiece.
Background technology
At present, the ultimate principle of ion beam fabrication technology is to utilize ion sputtering principle, is sent in wide beam low energy ion source
The ion beam bombardment part to be processed surface with gaussian shape, during bombardment, when surface of the work atom obtain enough
When energy can break away from dissimulated electricity energy, surface of the work will be departed from.
In ion beam polishing or ion beam etching of Fresnel, in ion source, gas produces plasma, ion by ionization
Source and ion beam temperature are the highest, when ion beam constantly bombards surface of the work, workpiece material by the thermal shock effect of ion beam,
Temperature constantly raises.According to the mechanics of materials and Material Intensity Science, the rising of material temperature, the strength characteristics of material itself and
Between lattice, dislocation energy changes, thus the destruction of material is removed energy and changed, thus causes the change of material removing rate,
This clearance change caused by variations in temperature can bring mismachining tolerance, thus affects machining accuracy.
Summary of the invention
The technical problem to be solved in the present invention is to provide during one can remove ion beam processing variations in temperature to adding
The error compensating method of the ion beam processing workpiece of the impact of work Workpiece Machining Accuracy.
In order to solve above-mentioned technical problem, a kind of technical scheme that the present invention uses is: a kind of ion beam processing workpiece
Error compensating method, comprises the following steps；
1) choose processing workpiece sample, measure the face shape figure of processing workpiece sample, obtain first figurate number of processing workpiece sample
According to；
2) processing workpiece sample is processed in ion beam process equipment；
3) the processing workpiece sample after processing is measured, obtain second graphic data of the processing workpiece sample after processing；
4) second graphic data and first graphic data are subtracted each other acquisition face shape and remove data, face shape is removed data and ion beam
Sweep time carry out mathematical relationship matching and obtain processing workpiece sample material and remove the removal error of error and sweep time and close
It it is function；
5) processing workpiece is measured the machined surface graphic data of acquisition processing workpiece；
6) planning ion beam residence time data in scanning track are calculated according to machined surface graphic data；
7) by remove error relationship function to processing workpiece residence time compensating approach obtain compensate after processing resident time
Between revise data；
8) processing residence time correction data importing ion beam process equipment will be processed the processed of workpiece.
Concrete, described processing workpiece sample is identical with the material of processing workpiece.
Concrete, step 1), 3) and 5) in be that employing laser interferometer carries out the measurement of face shape figure and obtains first shape
Data, second graphic data and machined surface graphic data.
Further, step 2) include procedure below:
2.1) to processing workpiece sample planning ion-beam scanning track and sweep time, ion beam process equipment generates scanning
Code；
2.2) processing workpiece sample is carried out ion-beam scanning；
2.3), after ion-beam scanning completes, take out from ion beam process equipment, constant temperature, cooling.
Concrete, step 2.1) in press the planning on processing workpiece sample of grating track scanning mode and formed and scan track.
Scanning track includes multiple scanning tracing point, and described scan code includes the two-dimensional coordinate scanning tracing point；
Step 2.2) intermediate ion bundle scanning be by scanning track S to processing workpiece sample carry out at the uniform velocity traverse scanning, ion beam from
The scanning tracing point of the head end of scanning track starts until the scanning tracing point of end terminates.
Concrete, in step 4), face shape removes packet containing the two-dimensional coordinate of scanning tracing point and going of scanning tracing point
Except amount error, scan the removal amount error one-dimensional matrix R sequentially forming removal amount error by scanning track of tracing point,
R=[r1, r2 ..., rm],
The sweep time of ion beam sequentially forms one-dimensional matrix T sweep time by scanning track,
T=[t1, t2 ..., tm],
Wherein, t1=0, tm be the lineal measure of scanning pattern divided by scanning speed,
One-dimensional matrix R and the mode retouching time one-dimensional matrix T employing mathematical relationship matching to removal amount error, it is thus achieved that processing
Workpiece sample material removes the removal error relationship function of error and sweep time.
Concrete, in step 6), the two-dimensional coordinate scanning tracing point according to ion beam forms residence time functional relation
For:
,
Wherein, (x, y) for the two-dimensional coordinate of scanning tracing point, D is residence time, and Z is machined surface graphic data, and Rel is for removing letter
Matrix number.
Further, in step 7), form the one-dimensional square of residence time according to ion-beam scanning tracing point and residence time
Battle array D, D=[1,2 ..., i ...], the i-th point during wherein i is scanning track；
By the functional relation of the residence time after removing the compensating approach that error relationship function is formed it is:
Wherein Doffset(i) it is the residence time after compensating approach, D(i) it is the residence time planned,For removing
Error relationship function.
The scope of the present invention, however it is not limited to the technical scheme of the particular combination of above-mentioned technical characteristic, also should contain simultaneously
Other technical scheme that lid is carried out combination in any by above-mentioned technical characteristic or its equivalent feature and formed.Such as features described above and basis
(but not limited to) disclosed in application has the technical characteristic of similar functions and replaces mutually and the technical scheme etc. that formed.
Owing to technique scheme is used, the present invention compared with prior art has the advantage that
The present invention, by extracting the ion beam processing time relation that affects on material removing rate, is formed and removes error relationship function,
By removing each residence time scanning tracing point in error relationship function correction-compensation ion-beam scanning track and then indirectly real
Existing workpiece temperature changes the error compensation caused, and is effectively increased the precision of ion beam processing；Simultaneously without processed in reality
In journey, the temperature to the scanning tracing point in processing workpiece detects, and method is simpler, economical and effective.
Accompanying drawing explanation
Fig. 1 is the scanning track schematic diagram of ion-beam scanning processing workpiece sample.
Detailed description of the invention
The error compensating method of a kind of ion beam processing workpiece of the present invention, comprises the following steps；
1) choose the processing workpiece sample identical with processing workpiece material, use laser interferometer to measure processing workpiece sample
Face shape figure, obtain processing workpiece sample first graphic data M1.In the present embodiment, use the quartz unit of Φ 100mm bore
Part is as processing workpiece sample.
2) processing workpiece sample is processed in ion beam process equipment, specifically includes:
2.1) processing workpiece sample being loaded in ion beam process equipment, ion beam process equipment being carried out debugging operations until locating
In can machining state；
2.2) to processing workpiece sample planning ion-beam scanning track and sweep time, ion beam process equipment generates scanning
Code.In the present embodiment, form scanning track S by the planning on processing workpiece sample of grating track scanning mode, scan track S
As shown in Figure 1.Scanning track S includes multiple scanning tracing point A, and described scan code includes the two dimension seat scanning tracing point A
Mark；
2.3) processing workpiece sample being carried out ion-beam scanning, in the present embodiment, ion-beam scanning is to processing by scanning track
Workpiece sample carries out at the uniform velocity traverse scanning, and ion beam starts until the scanning of end from the scanning tracing point of the head end of scanning track
Tracing point terminates, and the two-dimensional coordinate of scanning tracing point is (xi, yi).
2.4), after ion-beam scanning completes, take out from ion beam process equipment, constant temperature, cooling.
3) use laser interferometer to measure in the processing workpiece sample after processing, obtain the processing work after processing
Second graphic data M2 of part sample；
4) second graphic data M2 and first graphic data M1 are subtracted each other acquisition face shape and removed error information, face shape is removed error
DataProcessing workpiece sample material removal error and scanning is obtained with carrying out mathematical relationship matching the sweep time of ion beam
The removal error relationship function of time.Face shape removes error informationComprise the two-dimensional coordinate (x of scanning tracing pointi, yi) and
The removal amount error of scanning tracing point, the removal amount error of scanning tracing point sequentially forms removal amount error by scanning track
One-dimensional matrix R,
R=[r1, r2 ..., rm],
The sweep time of ion beam by scanning track sequentially form sweep time one-dimensional matrix T, T=[t1, t2 ..., tm], its
In, t1=0, tm be the lineal measure of scanning pattern divided by scanning speed,
One-dimensional matrix R and the mode retouching time one-dimensional matrix T employing mathematical relationship matching to removal amount error, it is thus achieved that processing
Workpiece sample material is removed and the removal error relationship function of sweep time:
。
5) processing workpiece use laser interferometer measure machined surface graphic data Z obtaining processing workpiece；
6) planning ion beam residence time data in scanning track are calculated according to machined surface graphic data.Concrete, according to from
The two-dimensional coordinate of the scanning tracing point of son bundle forms residence time functional relation and is:,
Wherein, (x, y) scans the two-dimensional coordinate of tracing point, and D is residence time, and Z is machined surface graphic data, and Rel is for removing function
Matrix.
7) processing obtained the residence time compensating approach of processing workpiece after compensating by removing error relationship function is stayed
Stay time complexity curve data.Concrete, the one-dimensional matrix D of residence time, D is formed according to ion-beam scanning tracing point and residence time
=[1,2 ..., i ...], the i-th point during wherein i is scanning track；
By the functional relation of the residence time after removing the compensating approach that error relationship function is formed it is:
Wherein Doffset(i) it is the residence time after compensating approach, D(i) it is the residence time planned,For removing
Error relationship function.
8) processing residence time correction data importing ion beam process equipment will be processed the processed of workpiece.
The present invention, by extracting the ion beam processing time relation that affects on material removing rate, is formed and removes error relationship letter
Number, by removing each residence time scanning tracing point in error relationship function correction-compensation ion-beam scanning track, and then
Connect and realize the error compensation that workpiece temperature change causes, be effectively increased the precision of ion beam processing；Simultaneously without adding actual
During work, the temperature to the scanning tracing point in processing workpiece detects, and method is simpler, economical and effective.
As it has been described above, we are illustrated fully according to spirit of the invention, but the present invention is not limited to above-mentioned reality
Execute example and implementation.The practitioner of correlative technology field can carry out different in the range of the technological thought of the present invention is permitted
Change and enforcement.
Claims (8)
1. the error compensating method of an ion beam processing workpiece, it is characterised in that:
Comprise the following steps；
1) choose processing workpiece sample, measure the face shape figure of processing workpiece sample, obtain first figurate number of processing workpiece sample
According to；
2) processing workpiece sample is processed in ion beam process equipment；
3) the processing workpiece sample after processing is measured, obtain second graphic data of the processing workpiece sample after processing；
4) second graphic data and first graphic data are subtracted each other acquisition face shape and remove data, face shape is removed data and ion beam
Sweep time carry out mathematical relationship matching and obtain the removal error of processing workpiece sample material removal amount error and sweep time
Relation function；
5) processing workpiece is measured the machined surface graphic data of acquisition processing workpiece；
6) planning ion beam residence time data in scanning track are calculated according to machined surface graphic data；
7) processing obtained the residence time compensating approach of processing workpiece after compensating by removal amount error relationship function is resident
Time complexity curve data；
8) processing residence time correction data importing ion beam process equipment will be processed the processed of workpiece.
The error compensating method of a kind of ion beam processing workpiece the most according to claim 1, it is characterised in that: described processing
Workpiece sample is identical with the material of processing workpiece.
The error compensating method of a kind of ion beam processing workpiece the most according to claim 1, it is characterised in that: step 1),
3) it is to use laser interferometer carry out the measurement of face shape figure and obtain first graphic data, second graphic data and processing in and 5)
Face graphic data.
The error compensating method of a kind of ion beam processing workpiece the most according to claim 1, it is characterised in that: step 2) in
Including procedure below:
2.1) to processing workpiece sample planning ion-beam scanning track and sweep time, ion beam process equipment generates scanning
Code；
2.2) processing workpiece sample is carried out ion-beam scanning；
2.3), after ion-beam scanning completes, take out from ion beam process equipment, constant temperature, cooling.
The error compensating method of a kind of ion beam processing workpiece the most according to claim 4, it is characterised in that: step 2.1)
In press grating track scanning mode processing workpiece sample on planning formed scanning track, scanning track include multiple scanning track
Point, described scan code includes the two-dimensional coordinate scanning tracing point；
Step 2.2) intermediate ion bundle scanning be by scanning track to processing workpiece sample carry out at the uniform velocity traverse scanning, ion beam is from sweeping
The scanning tracing point of the head end retouching track starts until the scanning tracing point of end terminates.
The error compensating method of a kind of ion beam processing workpiece the most according to claim 5, it is characterised in that: step 4)
In, face shape removes the packet two-dimensional coordinate containing scanning tracing point and the removal amount error of scanning tracing point, scanning tracing point
Removal amount error by scanning track the one-dimensional matrix R sequentially forming removal amount,
R=[r1, r2 ..., rm],
The sweep time of ion beam sequentially forms one-dimensional matrix T sweep time by scanning track,
T=[t1, t2 ..., tm],
Wherein, t1=0, tm be the lineal measure of scanning pattern divided by scanning speed,
One-dimensional matrix R and the mode retouching time one-dimensional matrix T employing mathematical relationship matching to removal amount error, it is thus achieved that processing
Workpiece sample material removes the removal error relationship function of error and sweep time.
The error compensating method of a kind of ion beam processing workpiece the most according to claim 6, it is characterised in that: in step 6)
Forming residence time functional relation according to the two-dimensional coordinate of the scanning tracing point of ion beam is:
,
Wherein, (x, y) for the two-dimensional coordinate of scanning tracing point, D is residence time, and Z is machined surface graphic data, and Rel is for removing letter
Matrix number.
The error compensating method of a kind of ion beam processing workpiece the most according to claim 7, it is characterised in that: step 7)
In, the one-dimensional matrix D of residence time is formed according to ion-beam scanning tracing point and residence time, D=[1,2 ..., i ...], wherein
I is the i-th point in scanning track；
By the functional relation of the residence time after removing the compensating approach that error relationship function is formed it is:
Wherein Doffset(i) it is the residence time after compensating approach, D(i) it is the residence time planned,For removing
Error relationship function.
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108044408A (en) * | 2017-11-24 | 2018-05-18 | 中国科学院长春光学精密机械与物理研究所 | Suitable for the Workpiece's Tack Error calibration and compensation method of ion beam polishing |
| CN109437599A (en) * | 2018-12-11 | 2019-03-08 | 北京控制工程研究所 | A kind of spacecrafts rendezvous sensor superhigh precision mirror integral formula processing method |
| CN109623560A (en) * | 2018-12-14 | 2019-04-16 | 中国兵器科学研究院宁波分院 | The method of determination ion beam polishing process parameter for six axis movement polishing system |
| CN109656197A (en) * | 2018-11-13 | 2019-04-19 | 上海狮迈科技有限公司 | A kind of high energy beam manufacturing tolerance modification method and device |
| CN110677972A (en) * | 2019-10-17 | 2020-01-10 | 中国人民解放军国防科技大学 | Plasma generator for SiC optical mirror processing and application method thereof |
| CN111002111A (en) * | 2019-12-10 | 2020-04-14 | 中国空气动力研究与发展中心设备设计及测试技术研究所 | Sub-nanometer precision ion beam polishing-oriented surface shape error optimization removal method |
| CN114118439A (en) * | 2021-11-09 | 2022-03-01 | 北京得瑞领新科技有限公司 | Training data generation method, system and storage medium of decision level prediction model |
| CN115157272A (en) * | 2022-09-08 | 2022-10-11 | 山东芯合机器人科技有限公司 | Automatic programming system based on visual scanning |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108044408A (en) * | 2017-11-24 | 2018-05-18 | 中国科学院长春光学精密机械与物理研究所 | Suitable for the Workpiece's Tack Error calibration and compensation method of ion beam polishing |
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| CN109623560A (en) * | 2018-12-14 | 2019-04-16 | 中国兵器科学研究院宁波分院 | The method of determination ion beam polishing process parameter for six axis movement polishing system |
| CN109623560B (en) * | 2018-12-14 | 2021-09-14 | 中国兵器科学研究院宁波分院 | Method for determining ion beam polishing process parameters for six-axis motion polishing system |
| CN110677972A (en) * | 2019-10-17 | 2020-01-10 | 中国人民解放军国防科技大学 | Plasma generator for SiC optical mirror processing and application method thereof |
| CN111002111A (en) * | 2019-12-10 | 2020-04-14 | 中国空气动力研究与发展中心设备设计及测试技术研究所 | Sub-nanometer precision ion beam polishing-oriented surface shape error optimization removal method |
| CN114118439A (en) * | 2021-11-09 | 2022-03-01 | 北京得瑞领新科技有限公司 | Training data generation method, system and storage medium of decision level prediction model |
| CN115157272A (en) * | 2022-09-08 | 2022-10-11 | 山东芯合机器人科技有限公司 | Automatic programming system based on visual scanning |
| CN115157272B (en) * | 2022-09-08 | 2022-11-22 | 山东芯合机器人科技有限公司 | Automatic programming system based on visual scanning |
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Address after: 21-1 # (Industrial Park), No. 469 Qingyun North Road, Puxing Street, Xinjin District, Chengdu City, Sichuan Province, 610000 Patentee after: Sichuan Zhizhen Precision Optics Co.,Ltd. Address before: 215636 Suzhou Zhizhen Precision Optics Co., Ltd., Haiba Road, Daxin Town, Zhangjiagang, Suzhou City, Jiangsu Province Patentee before: SUZHOU ZHIZHEN PRECISION OPTICAL Co.,Ltd. |
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