CN106855895B - A kind of complex-curved removal function computational methods based on ion beam technology - Google Patents

A kind of complex-curved removal function computational methods based on ion beam technology Download PDF

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CN106855895B
CN106855895B CN201610590627.6A CN201610590627A CN106855895B CN 106855895 B CN106855895 B CN 106855895B CN 201610590627 A CN201610590627 A CN 201610590627A CN 106855895 B CN106855895 B CN 106855895B
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ion
function
ion beam
complex
beam current
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CN106855895A (en
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张学军
唐瓦
薛栋林
邓伟杰
尹小林
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/20—Design optimisation, verification or simulation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F17/00—Digital computing or data processing equipment or methods, specially adapted for specific functions
    • G06F17/10—Complex mathematical operations
    • G06F17/16—Matrix or vector computation, e.g. matrix-matrix or matrix-vector multiplication, matrix factorization
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2119/00—Details relating to the type or aim of the analysis or the optimisation
    • G06F2119/18—Manufacturability analysis or optimisation for manufacturability

Abstract

The present invention disclose a kind of complex-curved removal function computational methods based on ion beam technology, and one, measure ion beam current in the ion concentration distribution d at ion gun L0；2nd, datum plane removal function of the ion gun running parameter selected at distance L is obtained by removing Function experiment；And demarcated to removing function, obtain ion concentration and the coefficient of correspondence Matrix C of material removing rate；3rd, ion beam current is measured in the ion concentration distribution d at ion gun La, it is calculated and removes function F with the plane at ion gun L corresponding to ion beam current concentration distribution；4th, measurement ion beam current concentration space is distributed and is normalized to obtain ion beam current spatial distribution matrix Id；5th, calculate complex-curved surface curvature radius change and matrix ω is obtained to the influence for removing function；6th, function F, ion beam current spatial distribution matrix I are removed according to planedWith matrix ω, obtain removing function R；The present invention can remove function to ion beam polishing change during complex-curved is accurately calculated.

Description

A kind of complex-curved removal function computational methods based on ion beam technology
Technical field
The invention belongs to the technical field of complex surface machining, and in particular to a kind of based on the complex-curved of ion beam technology Remove function computational methods.
Background technology
The current complex-curved Processing Strategies of heavy caliber mainly have two kinds, first, means are removed using the material of contact, Including the small abrasive nose technology based on CCOS principles, stress disk technology etc.；Second, contactless optical manufacturing means, including ion Precursor reactant method, ion beam polishing method.It is microcosmic to be formed in minute surface certain depth that the material of contact processing method removes principle Material damage (pressure, shearing force) simultaneously realizes that material removes based on this, and such method material removal efficiency is higher, material is gone Except stability is preferable.But influence factor is more in process, temperature, abrasive concentration, pressure and bistrique speed of related movement Deng the change that may cause material removal efficiency, optical manufacturing certainty is reduced.Especially in the complex-curved light of heavy caliber Learn in process, be difficult to be brought into close contact between bistrique and minute surface, cause to remove function change substantially, meeting while optical manufacturing Other face shape errors are introduced, reduce processing efficiency and limitation Accuracy of finish.Ion beam polishing method is launched using ion gun Ion beam bombardment material surface with certain energy and line spatial distribution realizes that material removes.Energetic ions incident is to minute surface Afterwards, splash effect occurs in certain depth, i.e. incident ion transfers energy to minute surface atom by cascade collision, works as atom Component of the kinetic energy of acquisition along mirror normal direction will fly away from minute surface when being more than material binding energy, the material for forming atom magnitude is gone Remove.Compared with contact processing method, ion beam polishing method material remove precision is higher, stability is more preferable, controllability more preferably.And not Print-through, edge effect and the machining spur in contact processing be present.In the complex-curved optical manufacturing process of heavy caliber Intermediate ion line can be brought into close contact with curved surface, will not introduce new face shape error in process, this method more suitable for The complex-curved high accuracy processing of heavy caliber.But during ion beam polishing is complex-curved, it, which will remove function, to occur Significant change to it, it is necessary to carry out calculating the accuracy for compensating and can ensureing ion beam polishing.
The content of the invention
In view of this, the invention provides a kind of complex-curved removal function computational methods based on ion beam technology, energy Enough changes for removing function during complex-curved to ion beam polishing are accurately calculated, so as to realize ion beam polishing system Complex-curved high accuracy is polished.
Realize that technical scheme is as follows：
A kind of complex-curved removal function computational methods based on ion beam technology, comprise the following steps：
Step 1: selecting one group of ion gun running parameter, measurement ion beam current is in the ion concentration at ion gun L point Cloth d0；
Step 2: obtain datum plane of the ion gun running parameter selected at distance L by removing Function experiment Remove function；And to the ion concentration distribution d0Function is removed with datum plane to be demarcated, and obtains ion concentration and material The coefficient of correspondence Matrix C of clearance；
Step 3: being needed to set ion gun running parameter according to processing, measurement ion beam current is in the ion at ion gun L Concentration distribution da, usage factor Matrix C, it is calculated and the plane at ion gun L corresponding to ion beam current concentration distribution Remove function F；
Step 4: the ion gun running parameter described in optional step three, the concentration space distribution of measurement ion beam current is gone forward side by side Row normalized, obtain ion beam current spatial distribution matrix Id；
Step 5: calculate complex-curved surface curvature radius change obtains matrix ω to the influence for removing function；
Step 6: function F, ion beam current spatial distribution matrix I are removed according to planedWith matrix ω, obtain each resident Curved surface at point removes function R, completes the complex-curved calculating for removing function.
Further,
Wherein, ImaxFor the current peak at ion gun z, exp is the exponential function using e the bottom of as, ηx、ηyTied for scanning The fruit x in laboratory coordinate respectively, the Gaussian Profile coefficient on y directions.
Further,
Wherein, a is ion energy average incident depth, and σ, μ are respectively projectile energy in material internal meridian direction and arc Swear the breadth coefficient on direction, aσ=a/ σ, aμ=a/ μ, h (x, y) are the complex-curved mathematical expression in laboratory coordinate Formula.
Further, R=ω IdF
Beneficial effect：
The present invention to removing function by carrying out the resident material removal of single-point and measurement experiment without that can carry out standard online True survey calculation；The whole factors for influenceing curved surface removal function change are introduced into computation model, obtain the higher removal of accuracy Function information.This method clear physical concept, data processing and mathematical operation are simple, and experimental implementation is simple and easy, remove function Testing cost is very low, and the testing time is short, further improves the complex-curved processing convergence efficiency of heavy caliber.The present invention can be real Now using the high accuracy polishing complex-curved to heavy caliber of three axle ion beam polishing systems, and processing convergency factor is high, accuracy is good, Reduce the time cost and financial cost of complex-curved optical manufacturing.
Brief description of the drawings
Fig. 1 is the inventive method flow chart.
Embodiment
The present invention will now be described in detail with reference to the accompanying drawings and examples.
As shown in figure 1, the invention provides a kind of complex-curved removal function computational methods based on ion beam technology, sheet Equipment used in inventive method includes three axle ion beam polishers, Faraday cup, minute surface to be processed and computer, its Computer Data are carried out with Faraday cup to be connected.Faraday cup is the absolute measurement device under a kind of vacuum, can measure charged particle stream Current strength, and the Current calculation that can be obtained by Faraday cup measurement goes out the quantity of incoming particle.For energy phase Same particle, faraday cup measures current value and incident ion charge number are linear.In laboratory coordinate, according to method The scanning result is drawn, the concentration distribution of incident ion beam current can be described by its electric current Distribution value.Faraday cup can only obtain Obtain the spatial distribution of ion beam current, it is impossible to which direct measurement benchmark removes function information.Scan to obtain ion gun by Faraday cup The distributed in three dimensions situation of working space intermediate ion line, based on the ion concentration at relevant work distance, be calculated from Benchmark in beamlet polishing process removes function information, realizes the on-line measurement for removing function.
Ion beam current act on it is complex-curved during, curved surface removes the benchmark obtained in function and plane and removes function Distinguish larger, causing the principal element of this change includes：Influence that surface geometry feature deposits to ion energy, curved surface Ion concentration changes and ion incidence Parameters variation.Obtained with reference to the face shape feature calculation of curved surface to be processed, act on curved surface not With the ion concentration distribution at dwell point.Consider above-mentioned three kinds of reasons, ion beam can be calculated on complex-curved Removal function transformation matrices at each dwell point.Function is removed to datum plane to be modified, just can obtain using this matrix Function information is accurately removed in complex-curved polishing process.Processing residence time is calculated based on this, and material removes accurate Property it is high, ensure that process has more preferable convergence.The present invention comprises the following steps：
Step 1: selecting one group of ion gun running parameter, measurement ion beam current is in the ion concentration at ion gun L point Cloth d0；
Step 2: obtain datum plane of the ion gun running parameter selected at distance L by removing Function experiment Remove function；And to the ion concentration distribution d0Function is removed with datum plane to be demarcated, and obtains ion concentration and material The coefficient of correspondence Matrix C of clearance；
Step 3: being needed to set ion gun running parameter according to processing, measurement ion beam current is in the ion at ion gun L Concentration distribution da, usage factor Matrix C, it is calculated and the plane at ion gun L corresponding to ion beam current concentration distribution Remove function F；
Step 4: the ion gun running parameter described in optional step three, the concentration space distribution of measurement ion beam current is gone forward side by side Row normalized, obtain ion beam current spatial distribution matrix Id；
Wherein, ImaxFor the current peak at ion gun z, exp is the exponential function using e the bottom of as, ηx、ηyTied for scanning The fruit x in laboratory coordinate respectively, the Gaussian Profile coefficient on y directions.
Step 5: calculate complex-curved surface curvature radius change obtains matrix ω to the influence for removing function；
Wherein, a is ion energy average incident depth, and σ, μ are respectively projectile energy in material internal meridian direction and arc Swear the breadth coefficient on direction, aσ=a/ σ, aμ=a/ μ, h (x, y) are the complex-curved mathematical expression in laboratory coordinate Formula.
Step 6: function F, ion beam current spatial distribution matrix I are removed according to planedWith matrix ω, obtain each resident Curved surface at point removes function R.R=ω IdF。
In summary, presently preferred embodiments of the present invention is these are only, is not intended to limit the scope of the present invention. Within the spirit and principles of the invention, any modification, equivalent substitution and improvements made etc., it should be included in the present invention's Within protection domain.

Claims (2)

1. a kind of complex-curved removal function computational methods based on ion beam technology, it is characterised in that comprise the following steps：
Step 1: selecting one group of ion gun running parameter, measurement ion beam current is in the ion concentration distribution d at ion gun L0；
Step 2: obtain datum plane removal of the ion gun running parameter selected at distance L by removing Function experiment Function；And to the ion concentration distribution d0Function is removed with datum plane to be demarcated, and is obtained ion concentration and is removed with material The coefficient of correspondence Matrix C of rate；
Step 3: being needed to set ion gun running parameter according to processing, measurement ion beam current is in the ion concentration at ion gun L It is distributed da, usage factor Matrix C, it is calculated and is removed with the plane at ion gun L corresponding to ion beam current concentration distribution Function F；
Step 4: the ion gun running parameter described in optional step three, measurement ion beam current concentration space is distributed and returned One change is handled, and obtains ion beam current spatial distribution matrix Id；
Wherein, ImaxFor the current peak at ion gun z, exp is the exponential function using e the bottom of as, ηx、ηyFor scanning result point The x not in laboratory coordinate, the Gaussian Profile coefficient on y directions；
Step 5: calculate complex-curved surface curvature radius change obtains matrix ω to the influence for removing function；
Wherein, a is ion energy average incident depth, and σ, μ are respectively projectile energy in material internal meridian direction and sagitta of arc side Upward breadth coefficient, aσ=a/ σ, aμ=a/ μ, h (x, y) are the complex-curved mathematic(al) representation in laboratory coordinate；
Step 6: function F, ion beam current spatial distribution matrix I are removed according to planedWith matrix ω, obtain at each dwell point Curved surface removes function R, completes the complex-curved calculating for removing function.
2. a kind of complex-curved removal function computational methods based on ion beam technology as claimed in claim 1, its feature exist In R=ω IdF。
CN201610590627.6A 2016-07-25 2016-07-25 A kind of complex-curved removal function computational methods based on ion beam technology Active CN106855895B (en)

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CN107622151B (en) * 2017-09-01 2020-11-27 中国科学院长春光学精密机械与物理研究所 Automatic ion source emergent ion beam flow aperture changing device and design method
CN110340807B (en) * 2018-04-04 2021-10-26 香港理工大学 Material removal method, control system, fluid jet polishing system and storage medium
CN109623560B (en) * 2018-12-14 2021-09-14 中国兵器科学研究院宁波分院 Method for determining ion beam polishing process parameters for six-axis motion polishing system
CN112257219A (en) * 2020-08-20 2021-01-22 合肥工业大学 Method for removing sulfide corrosion layer on blade surface by arc spot plasma
CN113560963B (en) * 2021-09-24 2022-01-28 摩高光学科技(佛山)有限公司 Multi-ion source cooperative processing mark inhibition method and device and electronic equipment

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