CN106855895A - A kind of complex-curved removal function computational methods based on ion beam technology - Google Patents

A kind of complex-curved removal function computational methods based on ion beam technology Download PDF

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CN106855895A
CN106855895A CN201610590627.6A CN201610590627A CN106855895A CN 106855895 A CN106855895 A CN 106855895A CN 201610590627 A CN201610590627 A CN 201610590627A CN 106855895 A CN106855895 A CN 106855895A
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ion beam
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CN106855895B (en
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张学军
唐瓦
薛栋林
邓伟杰
尹小林
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/20—Design optimisation, verification or simulation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F17/00—Digital computing or data processing equipment or methods, specially adapted for specific functions
    • G06F17/10—Complex mathematical operations
    • G06F17/16—Matrix or vector computation, e.g. matrix-matrix or matrix-vector multiplication, matrix factorization
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2119/00—Details relating to the type or aim of the analysis or the optimisation
    • G06F2119/18—Manufacturability analysis or optimisation for manufacturability

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Abstract

The present invention disclose a kind of complex-curved removal function computational methods based on ion beam technology, and one, measure ion beam current in the ion concentration distribution d at ion gun L0；2nd, the ion gun running parameter selected is obtained in the datum plane removal function at L by removing Function experiment；And removal function is demarcated, obtain the coefficient of correspondence Matrix C of ion concentration and material removing rate；3rd, measurement ion beam current is in the ion concentration distribution d at ion gun La, it is calculated and removes function F with apart from the plane corresponding to ion beam current concentration distribution at ion gun L；4th, measurement ion beam current concentration space is distributed and is normalized and obtains ion beam current spatial distribution matrix Id；5th, calculate complex-curved surface curvature radius change and matrix ω is obtained to the influence for removing function；6th, function F, ion beam current spatial distribution matrix I are removed according to planedWith matrix ω, removal function R is obtained；The present invention can remove function to ion beam polishing change during complex-curved is accurately calculated.

Description

A kind of complex-curved removal function computational methods based on ion beam technology
Technical field
The invention belongs to the technical field of complex surface machining, and in particular to a kind of based on the complex-curved of ion beam technology Removal function computational methods.
Background technology
The current complex-curved Processing Strategies of heavy caliber mainly have two kinds, and one is the material removal means for utilizing contact, Including the small abrasive nose technology based on CCOS principles, etc. stress disk technology；Two is contactless optical manufacturing means, including ion Precursor reactant method, ion beam polishing method.The material removal principle of contact processing method is to form microcosmic in minute surface certain depth Material damage (pressure, shearing force) simultaneously realizes that material is removed based on this, and such method material removal efficiency is higher, material goes Except stability is preferable.But influence factor is more in process, temperature, abrasive concentration, pressure and bistrique speed of related movement Deng the change for being likely to result in material removal efficiency, optical manufacturing certainty is reduced.Especially in the light that heavy caliber is complex-curved Learn in process, be difficult to be brought into close contact between bistrique and minute surface, cause removal function change obvious, meeting while optical manufacturing Other face shape errors are introduced, processing efficiency and limitation Accuracy of finish is reduced.Ion beam polishing method is launched using ion gun Ion beam bombardment material surface with certain energy and line spatial distribution realizes that material is removed.Energetic ions incident is to minute surface Afterwards, there is splash effect, i.e. incident ion in certain depth and minute surface atom is transferred energy to by cascade collision, work as atom The kinetic energy of acquisition will fly away from minute surface when being more than material binding energy along the component in mirror normal direction, and the material for forming atom magnitude goes Remove.Compared with contact processing method, precision is higher for the removal of ion beam polishing method material, stability more preferably, controllability more preferably.And not There is print-through, edge effect and the machining spur in contact processing.In the complex-curved optical manufacturing process of heavy caliber Intermediate ion line can be brought into close contact with curved surface, will not in process introduce new face shape error, the method more suitable for The complex-curved high accuracy processing of heavy caliber.But during ion beam polishing is complex-curved, its removal function will occur Significant change to it, it is necessary to carry out calculating the accuracy for compensating and can ensureing ion beam polishing.
The content of the invention
In view of this, the invention provides a kind of complex-curved removal function computational methods based on ion beam technology, energy Enough changes for removing function during complex-curved to ion beam polishing are accurately calculated, so as to realize ion beam polishing system Complex-curved high accuracy is polished.
Realize that technical scheme is as follows：
A kind of complex-curved removal function computational methods based on ion beam technology, comprise the following steps：
Step one, selected one group of ion gun running parameter, measurement ion beam current is in the ion concentration at ion gun L point Cloth d0；
Step 2, the ion gun running parameter selected is obtained in the datum plane at L by removing Function experiment Removal function；And to the ion concentration distribution d0Demarcated with datum plane removal function, obtained ion concentration and material The coefficient of correspondence Matrix C of clearance；
Step 3, according to processing need set ion gun running parameter, measurement ion beam current in the ion at ion gun L Concentration distribution da, usage factor Matrix C, be calculated with apart from the plane corresponding to ion beam current concentration distribution at ion gun L Removal function F；
Ion gun running parameter described in step 4, optional step three, measurement ion beam current concentration space distribution is gone forward side by side Row normalized, obtains ion beam current spatial distribution matrix Id；
Step 5, the complex-curved surface curvature radius change of calculating obtain matrix ω to the influence for removing function；
Step 6, function F, ion beam current spatial distribution matrix I are removed according to planedWith matrix ω, obtain each and be resident Curved surface removal function R at point, completes the calculating of complex-curved removal function.
Further,
Wherein, ImaxIt is the current peak at ion gun z, exp is the exponential function as bottom, η with ex、ηyFor scanning is tied The fruit x in laboratory coordinate, the Gaussian Profile coefficient on y directions respectively.
Further,
Wherein, a is ion energy average incident depth, and σ, μ are respectively projectile energy in material internal meridian direction and arc Breadth coefficient on arrow direction, aσ=a/ σ, aμ=a/ μ, h (x, y) is the complex-curved mathematical expression in laboratory coordinate Formula.
Further, R=ω IdF
Beneficial effect：
The present invention to removal function with measurement experiment by carrying out the resident material removal of single-point without that just can carry out online standard True survey calculation；Whole factors of curved surface removal function change will be influenceed to introduce computation model, obtain accuracy removal higher Function information.The method clear physical concept, data processing and mathematical operation are simple, and experimental implementation is simple and easy to apply, remove function Testing cost is very low, and the testing time is short, further improves the complex-curved processing convergence efficiency of heavy caliber.The present invention can be real Now three axle ion beam polishing systems of the utilization high accuracy polishing complex-curved to heavy caliber, and processing convergency factor is high, accuracy is good, Reduce the time cost and financial cost of complex-curved optical manufacturing.
Brief description of the drawings
Fig. 1 is the inventive method flow chart.
Specific embodiment
Develop simultaneously embodiment below in conjunction with the accompanying drawings, and the present invention will be described in detail.
As shown in figure 1, the invention provides a kind of complex-curved removal function computational methods based on ion beam technology, this Equipment used by inventive method includes three axle ion beam polishers, Faraday cup, minute surface to be processed and computer, its Computer Data cube computation is carried out with Faraday cup.Faraday cup is the absolute measurement device under a kind of vacuum, can measure charged particle stream Current strength, and the Current calculation that can be obtained by Faraday cup measurement goes out the quantity of incoming particle.For energy phase Same particle, faraday cup measures current value is linear with incident ion charge number.In laboratory coordinate, according to method Drawing the concentration distribution of the scanning result, incident ion beam current can be described by its electric current Distribution value.Faraday cup can only be obtained Obtain the spatial distribution of ion beam current, it is impossible to which direct measurement benchmark removes function information.Scanned by Faraday cup and obtain ion gun The distributed in three dimensions situation of working space intermediate ion line, based on the ion concentration at relevant work distance, be calculated from Benchmark removal function information in beamlet polishing process, realizes the on-line measurement of removal function.
Ion beam current act on it is complex-curved during, the benchmark removal function obtained in curved surface removal function and plane Difference is larger, and causing the principal element of this change includes：Influence, curved surface that surface geometry feature is deposited to ion energy Ion concentration changes and ion incidence Parameters variation.Obtained with reference to the face shape feature calculation of curved surface to be processed, act on curved surface not With the ion concentration distribution at dwell point.Consider above-mentioned three kinds of reasons, ion beam can be calculated on complex-curved Removal function transformation matrices at each dwell point.Datum plane removal function is modified using this matrix, just can be obtained Function information is accurately removed in complex-curved polishing process.Processing residence time is calculated based on this, and material removal is accurate Property is high, it is ensured that process has more preferable convergence.The present invention is comprised the following steps：
Step one, selected one group of ion gun running parameter, measurement ion beam current is in the ion concentration at ion gun L point Cloth d0；
Step 2, the ion gun running parameter selected is obtained in the datum plane at L by removing Function experiment Removal function；And to the ion concentration distribution d0Demarcated with datum plane removal function, obtained ion concentration and material The coefficient of correspondence Matrix C of clearance；
Step 3, according to processing need set ion gun running parameter, measurement ion beam current in the ion at ion gun L Concentration distribution da, usage factor Matrix C, be calculated with apart from the plane corresponding to ion beam current concentration distribution at ion gun L Removal function F；
Ion gun running parameter described in step 4, optional step three, measurement ion beam current concentration space distribution is gone forward side by side Row normalized, obtains ion beam current spatial distribution matrix Id；
Wherein, ImaxIt is the current peak at ion gun z, exp is the exponential function as bottom, η with ex、ηyFor scanning is tied The fruit x in laboratory coordinate, the Gaussian Profile coefficient on y directions respectively.
Step 5, the complex-curved surface curvature radius change of calculating obtain matrix ω to the influence for removing function；
Wherein, a is ion energy average incident depth, and σ, μ are respectively projectile energy in material internal meridian direction and arc Breadth coefficient on arrow direction, aσ=a/ σ, aμ=a/ μ, h (x, y) is the complex-curved mathematical expression in laboratory coordinate Formula.
Step 6, function F, ion beam current spatial distribution matrix I are removed according to planedWith matrix ω, obtain each and be resident Curved surface removal function R at point.R=ω IdF。
In sum, presently preferred embodiments of the present invention is these are only, is not intended to limit the scope of the present invention. All any modification, equivalent substitution and improvements within the spirit and principles in the present invention, made etc., should be included in of the invention Within protection domain.

Claims (4)

1. a kind of complex-curved removal function computational methods based on ion beam technology, it is characterised in that comprise the following steps：
Step one, selected one group of ion gun running parameter, measurement ion beam current is in the ion concentration distribution d at ion gun L0；
Step 2, the ion gun running parameter selected by removing Function experiment acquisition are removed in the datum plane at L Function；And to the ion concentration distribution d0Demarcated with datum plane removal function, obtain ion concentration and removed with material The coefficient of correspondence Matrix C of rate；
Step 3, according to processing need set ion gun running parameter, measurement ion beam current in the ion concentration at ion gun L Distribution da, usage factor Matrix C, be calculated with apart from corresponding to ion beam current concentration distribution at ion gun L plane remove Function F；
Ion gun running parameter described in step 4, optional step three, measurement ion beam current concentration space is distributed and is returned One change is processed, and obtains ion beam current spatial distribution matrix Id；
Step 5, the complex-curved surface curvature radius change of calculating obtain matrix ω to the influence for removing function；
Step 6, function F, ion beam current spatial distribution matrix I are removed according to planedWith matrix ω, obtain at each dwell point Curved surface removes function R, completes the calculating of complex-curved removal function.
2. a kind of complex-curved removal function computational methods based on ion beam technology as claimed in claim 1, its feature exists In,
Wherein, ImaxIt is the current peak at ion gun z, exp is the exponential function as bottom, η with ex、ηyIt is scanning result point X, the Gaussian Profile coefficient on y directions not in laboratory coordinate.
3. a kind of complex-curved removal function computational methods based on ion beam technology as claimed in claim 1, its feature exists In,
ω = { 1 + a 2 ( a σ a μ ) 2 ( ∂ 2 h ( x , y ) ∂ x 2 + ∂ 2 h ( x , y ) ∂ y 2 ) - 1 4 ( a σ 2 a μ 2 - a σ 4 a μ 4 - 1 ) [ ( ∂ 2 h ( x , y ) ∂ x ) 2 + ( ∂ h ( x , y ) ∂ y ) 2 ] }
Wherein, a is ion energy average incident depth, and σ, μ are respectively projectile energy in material internal meridian direction and sagitta of arc side Upward breadth coefficient, aσ=a/ σ, aμ=a/ μ, h (x, y) is the complex-curved mathematic(al) representation in laboratory coordinate.
4. a kind of complex-curved removal function computational methods based on ion beam technology as claimed in claim 1, its feature exists In R=ω IdF。
CN201610590627.6A 2016-07-25 2016-07-25 A kind of complex-curved removal function computational methods based on ion beam technology Active CN106855895B (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107622151A (en) * 2017-09-01 2018-01-23 中国科学院长春光学精密机械与物理研究所 Ion gun is emitted ion beam current bore automatic conversion and design method
CN109623560A (en) * 2018-12-14 2019-04-16 中国兵器科学研究院宁波分院 The method of determination ion beam polishing process parameter for six axis movement polishing system
CN110340807A (en) * 2018-04-04 2019-10-18 香港理工大学 Material removal method, control system, fluid injection polishing system and storage medium
CN112257219A (en) * 2020-08-20 2021-01-22 合肥工业大学 Method for removing sulfide corrosion layer on blade surface by arc spot plasma
CN113560963A (en) * 2021-09-24 2021-10-29 摩高光学科技(佛山)有限公司 Multi-ion source cooperative processing mark inhibition method and device and electronic equipment

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CN101898324A (en) * 2010-07-28 2010-12-01 中国人民解放军国防科学技术大学 Method for polishing ion beam with high-gradient mirror surface
CN102092929A (en) * 2010-12-08 2011-06-15 中国人民解放军国防科学技术大学 Ion beam figuring processing method for aspheric surface processing
CN105328535A (en) * 2015-09-29 2016-02-17 中国人民解放军国防科学技术大学 Nanometer-precision optical curved-face ion beam processing method based on non-linear modeling

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CN101644915A (en) * 2009-08-26 2010-02-10 中国人民解放军国防科学技术大学 Computer-control polishing method based on removal function prediction model
CN101898324A (en) * 2010-07-28 2010-12-01 中国人民解放军国防科学技术大学 Method for polishing ion beam with high-gradient mirror surface
CN102092929A (en) * 2010-12-08 2011-06-15 中国人民解放军国防科学技术大学 Ion beam figuring processing method for aspheric surface processing
CN105328535A (en) * 2015-09-29 2016-02-17 中国人民解放军国防科学技术大学 Nanometer-precision optical curved-face ion beam processing method based on non-linear modeling

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107622151A (en) * 2017-09-01 2018-01-23 中国科学院长春光学精密机械与物理研究所 Ion gun is emitted ion beam current bore automatic conversion and design method
CN107622151B (en) * 2017-09-01 2020-11-27 中国科学院长春光学精密机械与物理研究所 Automatic ion source emergent ion beam flow aperture changing device and design method
CN110340807A (en) * 2018-04-04 2019-10-18 香港理工大学 Material removal method, control system, fluid injection polishing system and storage medium
CN109623560A (en) * 2018-12-14 2019-04-16 中国兵器科学研究院宁波分院 The method of determination ion beam polishing process parameter for six axis movement polishing system
CN109623560B (en) * 2018-12-14 2021-09-14 中国兵器科学研究院宁波分院 Method for determining ion beam polishing process parameters for six-axis motion polishing system
CN112257219A (en) * 2020-08-20 2021-01-22 合肥工业大学 Method for removing sulfide corrosion layer on blade surface by arc spot plasma
CN112257219B (en) * 2020-08-20 2024-05-03 合肥工业大学 Method for removing sulfide corrosion layer on surface of blade by utilizing arc plasma
CN113560963A (en) * 2021-09-24 2021-10-29 摩高光学科技(佛山)有限公司 Multi-ion source cooperative processing mark inhibition method and device and electronic equipment

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