CN106031992A - Method and apparatus for manufacturing glass substrate - Google Patents
Method and apparatus for manufacturing glass substrate Download PDFInfo
- Publication number
- CN106031992A CN106031992A CN201510124559.XA CN201510124559A CN106031992A CN 106031992 A CN106031992 A CN 106031992A CN 201510124559 A CN201510124559 A CN 201510124559A CN 106031992 A CN106031992 A CN 106031992A
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- China
- Prior art keywords
- glass substrate
- abrasive particle
- holding member
- face
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Surface Treatment Of Glass (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The invention provides a method and an apparatus for manufacturing a glass substrate. According to the invention, the polishing efficiency of the glass substrate can be improved. In a method for manufacturing the glass substrate, an end part of the glass substrate sandwiched by a pair of abrasive grain holding members is brought into contact with magnetic abrasive grains rotating around a rotary shaft to process the end part of the glass substrate. An abrasive grain holding space, which is a recess recessed radially outward of the rotary shaft, is formed between the end part of the glass substrate and the abrasive grain holding members. Since the magnetic abrasive grains of the abrasive grain holding space can stay in the abrasive grain holding space, they can intensively contact with the end surface near a main surface of the glass substrate. Consequently, this method enables uniform polishing of the whole end surface of the glass substrate, whereby the polishing efficiency of the glass substrate can be improved.
Description
Technical field
The present invention relates to the manufacture method of glass substrate and the manufacture device of glass substrate.
Background technology
Glass substrate is cut into the size of regulation in its manufacturing process.Such as, liquid crystal display, plasma shows
The manufacturing process of the glass substrate of the flat faced displays such as device comprises following operation: be referred to as the large-scale glass of mother glass
Form line on glass substrate, cut.On the facet of glass substrate, it is usually formed trickle crackle and non-
The edge of Chang Ruili.This facet such as carries out grinding in the way of cross section becomes R shape, additionally, by using
The attrition process of abrasive wheel is finish-machined to mirror-like.
In patent documentation 1 (No. 2012/067587 publication of International Publication), disclose as glass substrate
The attrition process of the end face of facet uses the technology of magnetic fluid.In the attrition process using magnetic fluid, will
The magnetic fluid comprising magnetic abrasive particle is maintained between pair of magnet, connects with magnetic fluid at the end face making glass substrate
Under the state touched, the end face of glass substrate is made relatively to move with magnetic fluid, thus the end face of grinding glass substrate.
In the attrition process carried out based on magnetic fluid, magnetic abrasive particle is followed the shape of machined object and is ground adding
Work, therefore, the damage to machined object is smaller.Therefore, use in the attrition process to the end face of glass substrate
In the case of maintaining the abrasive wheel of magnetic fluid, compared with using the abrasive wheel attrition process comprising diamond abrasive grain,
Available smoother end face.
Prior art literature
Patent documentation
Patent documentation 1: No. 2012/067587 publication of International Publication
Summary of the invention
The problem that invention is to be solved
But, in using the attrition process carried out based on maintaining the abrasive wheel of magnetic fluid, generally, grind making
Emery wheel, under the state that rotary shaft rotates, makes the end of glass substrate contact with magnetic fluid.The abrasive wheel rotated is protected
The magnetic abrasive particle comprised in the magnetic fluid held is extruded by glass substrate, and squeezed returns to glass substrate.Thus, magnetic
Gonosome abrasive particle and glass substrate are each other by active force.Therefore, the end face of glass substrate is ground from magnetic abrasive particle
Pressure and be ground.But, grinding pressure when magnetic abrasive particle and the ends contact of glass substrate is less, in order to logical
Cross the end face that attrition process obtains smoothing, need to make magnetic abrasive particle be fully contacted with the end of glass substrate.Therefore,
In the attrition process employing magnetic fluid, process time is the most elongated, thus it requires improve the grinding of glass substrate
Efficiency.
It is an object of the invention to, it is provided that can improve the grinding efficiency of glass substrate glass substrate manufacture method and
The manufacture device of glass substrate.
Means for solving the above
The manufacture method of the glass substrate of the present invention is following method: make to be maintained at what magnet field forming portion part was formed
Under the state that magnetic abrasive particle in magnetic field and magnet field forming portion part rotate together about rotary shaft, make 1 or multiple glass
The end of substrate contacts with magnetic abrasive particle, is processed the end of glass substrate.The manufacture method of this glass substrate
There is preparatory process and manufacturing procedure.In preparatory process, make a pair first type surface of abrasive particle holding member and glass substrate
Contact respectively, utilize a pair abrasive particle holding member clamping glass substrate.In manufacturing procedure, make to be kept by a pair abrasive particle
The end of the glass substrate of parts clamping contacts with magnetic abrasive particle, is processed the end of glass substrate.Passing through
Being formed with abrasive particle between end and the abrasive particle holding member of manufacturing procedure processing and keep space, this abrasive particle keeps space to be court
To the recess that outside radially of the axis of rotation is recessed.
The manufacture method of this glass substrate is that the end making glass substrate contacts with the magnetic abrasive particle rotated around rotary shaft
The method being processed.The processing of the end of glass substrate is following processing: comprises glass substrate and carries out
The surface in the corner of chamfering is ground at the end face of interior glass substrate.A pair abrasive particle holding member clamping is utilized to be added
The glass substrate of work.Between the end of glass substrate and abrasive particle holding member, it is formed with abrasive particle keeps space.Around rotation
The magnetic abrasive particle that axle rotates is extruded by glass substrate, and is pressed back into glass substrate.Therefore, magnetic abrasive particle is by glass
Glass substrate is towards outside extrusion radially of the axis of rotation.Abrasive particle keeps space to be recessed recessed towards outside radially of the axis of rotation
Portion, therefore, even if abrasive particle keeps the magnetic abrasive particle in space to be radially oriented outside extrusion, it is also possible to be trapped in abrasive particle
Keep in space.Be trapped in abrasive particle keep the magnetic abrasive particle in space can with the first type surface of glass substrate near end
Face intensively contacts.And in the case of there is not abrasive particle holding space, even if magnetic abrasive particle and the master of glass substrate
The end contact of near surface, intensively can not contact with the end face near the first type surface of glass substrate.Additionally, glass
The thickness direction central part of the end face of glass substrate is the region that magnetic abrasive particle intensively contacts originally.Therefore, this glass
The manufacture method of substrate can the whole end face of grinding glass substrate equably, therefore, it is possible to improve grinding of glass substrate
Mill efficiency.
Additionally, in the manufacture method of the glass substrate of the present invention, it is preferred that abrasive particle holding member has space shape
One-tenth face, this formation face, space together forms abrasive particle holding space with the first type surface of glass substrate.
In the manufacture method of this glass substrate, abrasive particle holding member is can to form abrasive particle to keep the single portion in space
Part.
Additionally, in the manufacture method of the glass substrate of the present invention, it is preferred that in manufacturing procedure, to multiple glass
The end of glass substrate is processed.In this case, by glass substrate and the alternately stacking of abrasive particle holding member.
The manufacture method of this glass substrate, it is possible to once grind the end face of multiple glass substrates, therefore, it is possible to improve glass
The grinding efficiency of glass substrate.
Additionally, in the manufacture method of the glass substrate of the present invention, abrasive particle holding member preferably has the 1st holding member
With the 2nd holding member.1st holding member and major surface contacts, and there is the 1st formation face.2nd holding member with
1st holding member contact, and there is the 2nd formation face.Abrasive particle keep space be by the first type surface of glass substrate, the 1st
Formation face and the 2nd forms the space that face is formed.
In the manufacture method of this glass substrate, abrasive particle holding member is kept two parts in space by forming abrasive particle
Constitute.
Additionally, in the manufacture method of the glass substrate of the present invention, it is preferred that in manufacturing procedure, to multiple glass
The end of glass substrate is processed.In this case, by glass substrate and the alternately stacking of abrasive particle holding member.Additionally,
Be there are a pair the 1st holding members and by a pair the 1st holding member folders by the abrasive particle holding member of a pair glass substrate clamping
The 2nd holding member held.It is to have to be added by manufacturing procedure by the 2nd holding member of a pair the 1st holding member clampings
The glass substrate of the end of work.
In the manufacture method of this glass substrate, by glass substrate and the 1st holding member alternately stacking.Therefore, should
The manufacture method of glass substrate can once grind the end face of multiple glass substrates, therefore, it is possible to improve glass substrate
Grinding efficiency.
Additionally, in the manufacture method of the glass substrate of the present invention, glass substrate preferably has diagonal angle and has carried out chamfering
End.
The manufacture method of this glass substrate can be ground diagonal section equably and carry out glass substrate whole of chamfering
End face.
The manufacture method of the plate-like articles of the present invention is following method: make to be maintained at what magnet field forming portion part was formed
Under the state that magnetic abrasive particle in magnetic field and magnet field forming portion part rotate together about rotary shaft, make 1 or multiple tabulars
The end of article contacts with magnetic abrasive particle, is processed the end of plate-like articles.The manufacture method of this plate-like articles
There is preparatory process and manufacturing procedure.In preparatory process, make a pair first type surface of abrasive particle holding member and plate-like articles
Contact respectively, and utilize a pair abrasive particle holding member clamping plate-like articles.In manufacturing procedure, make to be protected by a pair abrasive particle
The end of the plate-like articles holding parts clamping contacts with magnetic abrasive particle, is processed the end of plate-like articles.Logical
Crossing and be formed with abrasive particle holding space between end and the abrasive particle holding member of manufacturing procedure processing, this abrasive particle holding space is
Towards the recess that outside radially of the axis of rotation is recessed.
The manufacture device of the glass substrate of the present invention has rotary shaft, magnet field forming portion part and magnetic abrasive particle.Magnetic field shape
Become parts to be connected with rotary shaft, and rotate around rotary shaft.The magnetic field that magnetic abrasive particle is formed by magnet field forming portion part keeps.
Magnetic abrasive particle, when rotating together about rotary shaft with magnet field forming portion part, presss from both sides with by a pair abrasive particle holding member
The ends contact of the glass substrate held, is processed the end of glass substrate.At the end by magnetic abrasive machining
It is formed with abrasive particle between portion and abrasive particle holding member and keeps space, outside this abrasive particle keeps space to be directed towards radially of the axis of rotation
The recess that side is recessed.
This glass substrate manufacture device can the whole end face of grinding glass substrate equably, therefore, it is possible to improve glass
The grinding efficiency of glass substrate.
Invention effect
The manufacture method of the glass substrate of the present invention and the manufacture device of glass substrate can improve the grinding of glass substrate
Efficiency.
Accompanying drawing explanation
Fig. 1 is the flow chart of the manufacture method of the glass substrate of the 1st embodiment.
Fig. 2 is by the melting process schematic diagram to the device of cutting action.
Fig. 3 is the skeleton diagram of lapping device.
Fig. 4 is the outside drawing of abrasive wheel.
Fig. 5 is the sectional view of abrasive wheel.
Fig. 6 is a part for the sectional view of glass substrate unit.
Fig. 7 is the enlarged drawing of the vicinity in flux concentrating space.
Fig. 8 is the figure of the lapping device being shown as comparative example.
Fig. 9 is a part for the sectional view of the glass substrate unit of variation 1A.
Figure 10 is a part for the sectional view of the glass substrate unit of variation 1B.
Figure 11 is a part for the sectional view of the glass substrate unit of the 2nd embodiment.
Figure 12 is the enlarged drawing of the vicinity in flux concentrating space.
Figure 13 is a part for the sectional view of the glass substrate unit of variation 2A.
Label declaration
21 rotary shafts；22 the 1st magnet field forming portion parts (magnet field forming portion part)；23 the 2nd magnet field forming portion part (magnetic
Field forms parts)；92 glass substrates；The end face (end of glass substrate) of 92a glass substrate；92b glass base
The face, main side of plate；93 abrasive particle holding members；94 formation face, spaces；95 abrasive particles keep space；96 magnetic abrasive particles；
193 abrasive particle holding members；194 formation face, spaces；195 abrasive particles keep space；393 abrasive particle holding members；393a
1st holding member；393b the 2nd holding member；394a the 1st forms face；394b the 2nd forms face；395 mills
Grain keeps space；493 abrasive particle holding members；493a the 1st holding member；493b the 2nd holding member (glass base
Plate)；494a the 1st forms face；495 abrasive particles keep space
Detailed description of the invention
＜ the 1st embodiment ＞
Referring to the drawings, the manufacture method of the glass substrate of the 1st embodiment as the present invention is illustrated.This reality
The manufacture method of the glass substrate executing mode comprises draws method (オ バ Off ロ ダ ウ Application De ロ to utilizing under overflow
Method) operation that is ground of the end face of glass substrate that produces.
(1) summary of the manufacturing process of glass substrate
First, the manufacturing process of glass substrate is illustrated.Glass substrate shows as liquid crystal display, plasma
The glass substrate of the flat faced display such as device and organic el display (FPD), the glass substrate of touch panel,
The glass substrate etc. of the glass substrate of solar battery panel and protection uses.Glass substrate such as has
The thickness of 0.2mm～0.8mm, and there is longitudinal 680mm～2200mm and the chi of horizontal 880mm～2500mm
Very little.
As an example of glass substrate 10, the glass substrate of the composition with following (a)～(j) can be enumerated.
(a)SiO2: 50 mass %～70 mass %,
(b)Al2O3: 10 mass %～25 mass %,
(c)B2O3: 1 mass %～18 mass %,
(d) MgO:0 mass %～10 mass %,
(e) CaO:0 mass %～20 mass %,
(f) SrO:0 mass %～20 mass %,
(g) BaO:0 mass %～10 mass %,
(h) RO:5 mass %～20 mass % (R is at least one selected from Mg, Ca, Sr and Ba),
(i)R’2O:0 mass %～2.0 mass % (R ' at least one selected from Li, Na and K),
J () is from SnO2、Fe2O3And CeO2In at least one metal-oxide selected.
Additionally, the glass with above-mentioned composition allows that other micro constitutent exists less than in the range of 0.1 mass %.
Fig. 1 is an example of the flow chart of the manufacturing process illustrating glass substrate.The manufacturing process of glass substrate is mainly by melting
Chemical industry sequence (step S1), clarification operation (step S2), agitating procedure (step S3), molding procedure (step S4),
Annealing operation (step S5), cutting action (step S6), grinding process (step S7), grinding step (step
S8) constitute.Fig. 2 is by the schematic diagram of the glass substrate manufacture device 100 of melting process S1～cutting action S6.
Glass substrate manufacture device 100 by melting appartus 101, clarifier 102, agitating device 103, shaped device 104,
Cutter sweep 105 is constituted.
In melting process S1, utilize melting appartus 101, by heater meanses such as heaters, make frit melt
Change, generate the melten glass 90 of the high temperature of 1500 DEG C～1600 DEG C.Frit is modulated to substantially to obtain
The glass of desired composition.Herein, " substantially " refer to allow that other micro constitutent is at the model less than 0.1 mass %
Enclose interior existence.
In clarification operation S2, utilize clarifier 102, make the melten glass 90 generated in melting process S1
Further heat up, thus carry out the clarification of melten glass 90.In clarifier 102, the temperature of melten glass 90
Rise to 1600 DEG C～1750 DEG C, preferably rise to 1650 DEG C～1700 DEG C.In clarifier 102, melted glass
The O comprised in glass 902、CO2And SO2Small bubble absorb because of the SnO comprised in frit2Deng clarifier
Reduction and the O that produces2And grow up, float to the liquid level of melten glass 90 and disappear.
In agitating procedure S3, agitating device 103 is utilized to stir the melten glass 90 of clarification in clarification operation S2,
Make to become to homogenize on chemically and thermally.In agitating device 103, melten glass 90 flows along vertical direction,
The agitator pivoted stirs, and the flow export from the bottom being arranged on agitating device 103 is transported to downstream work
Sequence.Additionally, in agitating procedure S3, glass making oxygen enrichment zirconium etc., have and the mean specific gravity of melten glass 90
The glass ingredient of different proportion is removed from agitating device 103.
In molding procedure S4, utilize shaped device 104, draw method by under overflow, stir among agitating procedure S3
Melten glass 90 after mixing molds glass tape 91.Specifically, shunt from the top slime flux of forming unit
Melten glass 90, below the sidewall flow direction of forming unit, collaborates in the lower end of forming unit, thus, continuously
Mold glass tape 91.Melten glass 90, before flowing into molding procedure S4, is cooled to be suitable for based on overflowing
Flow down the temperature of the molding drawing method, such as 1200 DEG C.
In annealing operation S5, carry out temperature control so that utilize shaped device 104 continuous in molding procedure S4
The glass tape 91 that ground generates is not deformed and distorts, and is annealed to below annealing point.
In cutting action S6, utilize cutter sweep 105, the glass tape of room temperature will be annealed in annealing operation S5
91 are cut by each specific length.When glass tape 91 is cut, glass tape 91 forms delineation
Line, makes tensile stress concentrate on score line, is cut off by glass tape 91.Score line generally profit is formed with the following method:
Diamond cutter is used mechanically to be formed；And, by make use of the heating of laser and chilling to make initial
Be full of cracks development.In cutting action S6, further, the glass tape 91 after cutting by the length of each regulation cuts
For the size of regulation, obtain glass substrate 92.
In grinding process S7, the end face of the glass substrate 92 that grinding obtains in cutting action S6, to glass base
Plate 92 carries out chamfering.Corner between end face and the first type surface of the glass substrate 92 cut in cutting action S6,
It is formed with the sharpest keen edge.In grinding process S7, skive etc. is used to carry out grinding glass substrate 92
Corner, thus, remove corner formed edge.The end of the glass substrate 92 of chamfering by grinding corner
The cross sectional shape in face becomes R shape.
Additionally, in grinding process S7, use skive etc. to carry out the end face of grinding glass substrate 92 so that glass
The working width of the end face of glass substrate 92 is in the range of regulation.Skive e.g. utilizes the gold comprising ferrum
The bonding agent belonging to class fixes the metal bonded wheel of the diamond abrasive grain that granularity is #400.The processing of end face
Width be the distance between outermost end and end face and the border of first type surface of the end face of the chamfering of glass substrate 92
Big value.When chamfer machining, the power that the end face of glass substrate 92 is subject to from skive etc., from the outermost of end face
Hold and taper into towards end face and the border of first type surface.Therefore, in the case of working width is excessive, glass substrate
Region near the end face of 92 and the border of first type surface is not the most by abundant grinding, and end face is not processed equably.
On the other hand, in the case of working width is too small, it is possible to can not fully remove the corner shape at glass substrate 92
The edge become.Set the thickness of glass substrate 92 as t in the case of, the scope of the above-mentioned regulation of working width is preferred
For 1/50t～t, more preferably 1/20t～1/2t, more preferably 1/10t～1/3t.Additionally, at grinding process S7
In, the arithmetic average roughness Ra that the cross grinding of glass substrate 92 preferably becomes the end face of glass substrate 92 is 0.1
μm～0.2 μm.Additionally, in grinding process S7, it is also possible to come glass base utilizing metal bonded wheel
After the end face of plate 92 carries out a grinding, utilizing resin bond wheel to carry out secondary grinding, wherein, resin is tied
The bonding agent of mixture emery wheel is more soft than the bonding agent of metal bonded wheel.
In grinding step S8, grind the end face of the glass substrate 92 of chamfering in grinding process S7.In grinding
On the end face of the glass substrate 92 of chamfering in operation S7, it is formed to comprise and is referred to as fine crack and horizontal crackle
The layer of trickle crackle.This layer is referred to as affected layer or fragile destruction layer.When being formed with affected layer, meeting
The breakdown strength making the end face of glass substrate 92 declines.Grinding step S8 is to remove affected layer, improving glass
The breakdown strength of the end face of glass substrate 92 and carry out.In grinding step S8, preferably by the end of glass substrate 92
Face is ground to the thickness of affected layer less than 3 μm.Additionally, in grinding step S8, preferably by glass substrate
The end surface grinding of 92 becomes the arithmetic average roughness Ra of the end face of glass substrate 92 to be below 10nm.
After grinding step S8, carry out the matting of glass substrate 92 and check operation.Finally, glass is tied up
Substrate 92, the supply of material is to FPD manufacturer etc..FPD manufacturer forms TFT on the surface of glass substrate 92
Deng semiconductor element, produce FPD.
(2) details of grinding step
It follows that the milled processed of the end face 92a of the glass substrate 92 carried out in grinding step S8 is illustrated.
In grinding step S8, lapping device 10 is utilized to carry out the end face 92a of grinding glass substrate 92.Fig. 3 is to grind dress
Put the skeleton diagram of 10.Lapping device 10 carries glass substrate unit 80 described later, and in glass substrate unit 80
A pair end face 92a of the glass substrate 92 comprised is ground.The end face 92a of glass substrate 92 is along glass base
The end face on the long limit of plate 92.
Glass substrate unit 80 is made up of 1 glass substrate 92 and a pair abrasive particle holding member 93.As it is shown on figure 3,
Glass substrate unit 80 is the unit utilizing a pair abrasive particle holding member 93 clamping glass substrate 92.
Lapping device 10 mainly has conveying mechanism 12 and grinding mechanism 14.Conveying mechanism 12 is along glass substrate
The long limit of 92, the mechanism of conveying glass substrate unit 80.Conveying mechanism 12 has unit fixed station 82.Glass base
Slab element 80 is fixed on the upper surface of unit fixed station 82.Conveying mechanism 12 makes to be fixed with glass substrate unit 80
Unit fixed station 82 along regulation direction move, thus conveying glass substrate unit 80.Thus, conveying mechanism 12
The glass substrate 92 comprised in glass substrate unit 80 can be carried along the long limit of glass substrate 92.
Grinding mechanism 14 with a pair end face 92a phase respectively of glass substrate 92 of comprising in glass substrate unit 80
To mode be arranged on the both sides of glass substrate unit 80.Grinding mechanism 14 has abrasive wheel 20.Grinding mechanism 14
Push the abrasive wheel 20 rotated towards glass substrate unit 80, carry out the glass comprised in grinding glass substrate unit 80
The end face 92a of substrate 92.In figure 3, utilize arrow to illustrate direction that unit fixed station 82 moves and abrasive wheel 20
The direction rotated.
(2-1) structure of abrasive wheel
It follows that the structure of abrasive wheel 20 is illustrated.In the following description, " conveying direction " is glass base
The long side direction of the end face 92a of the long side direction of plate 92, i.e. glass substrate 92, is to utilize conveying mechanism 12 defeated
Send the direction of glass substrate 92." width " is the direction on the surface along glass substrate 92 and is and conveying side
To vertical direction." vertical direction " is the direction vertical with the surface of glass substrate 92.In the accompanying drawings, conveying side
Illustrating to by " y-axis ", width is illustrated by " x-axis ", and vertical direction is illustrated by " z-axis ".Will be with vertical
The vertical plane in direction is referred to as " horizontal plane ".The first type surface of glass substrate 92 and plane-parallel.
Abrasive wheel 20 is used in grinding glass substrate unit 80 the end face 92a of the glass substrate 92 comprised.Fig. 4
It it is the outside drawing of abrasive wheel 20.Fig. 5 is the xz plane along the central shaft 21a comprising rotary shaft 21, by abrasive wheel
20 cuttings and the sectional view that obtains.In fig. 5 it is shown that the cross section of glass substrate unit 80 is as reference.Such as figure
Shown in 5, the end face 92a of the glass substrate 92 comprised in glass substrate unit 80 is chamfered to be R shape.Abrasive wheel
20 mainly have rotary shaft the 21, the 1st magnet field forming portion part the 22, the 2nd magnet field forming portion part 23 and slurry 24.
(2-1-1) rotary shaft
Rotary shaft 21 is the axle for making abrasive wheel 20 rotate.Abrasive wheel 20 revolves around the central shaft 21a of rotary shaft 21
Turn.Central shaft 21a is parallel with vertical direction.As it is shown on figure 3, the direction of rotation of abrasive wheel 20 is to make glass substrate
The direction that unit 80 moves towards the direction in opposite direction carried with glass substrate unit 80.Rotary shaft 21 is with magnetic
The logical mode being not centered on rotary shaft 21, by the rustless steel steel molding of the nonmagnetic materials such as SUS304.Hereinafter, will
The radial direction of rotary shaft 21, i.e. vertical with the central shaft 21a of rotary shaft 21 direction are referred to as " radially ".Additionally, close
Two points on straight line radially, by the side at some place bigger for the distance away from central shaft 21a, referred to as " footpath is outside
Side ", the distance away from central shaft 21a is referred to as " radially inner side " compared with the side at point place.
Rotary shaft 21 is connected with rotary shaft drive division (not shown), revolves around central shaft 21a with desired rotary speed
Turn.Rotary shaft 21 is connected with rotary shaft travel mechanism (not shown), to comprise relative in glass substrate unit 80
Glass substrate 92 end face 92a closer and farther from mode move.
(2-1-2) the 1st magnet field forming portion part
As it is shown in figure 5, the 1st magnet field forming portion part 22 has the cylindrical shape of the through hole formed along vertical direction
Parts.The through hole of the through 1st magnet field forming portion part 22 of rotary shaft 21.1st magnet field forming portion part 22 is consolidated
It is scheduled in rotary shaft 21.1st magnet field forming portion part 22 is the Magnet such as permanent magnet and electric magnet, and it is along vertical direction
Magnetization, and upside is S pole and downside is N pole.Hereinafter, the upper surface of the 1st magnet field forming portion part 22 is referred to as
1 magnetic field, top formation face 22a, is referred to as the lower surface of the 1st magnet field forming portion part 22 the 1st low magnetic fields and forms face
22b。
(2-1-3) the 2nd magnetic forming portion material
As it is shown in figure 5, the 2nd magnet field forming portion part 23 is the cylinder with the through hole formed along vertical direction
The parts of shape.The through hole of the through 2nd magnet field forming portion part 23 of rotary shaft 21.2nd magnet field forming portion part 23 quilt
It is fixed in rotary shaft 21.2nd magnet field forming portion part 23 is the Magnet such as permanent magnet and electric magnet, and it is along vertical side
To magnetization, upside is S pole and downside is N pole.Hereinafter, the upper surface of the 2nd magnet field forming portion part 23 is referred to as
2 magnetic field, top formation face 23a, are referred to as the lower surface of the 2nd magnet field forming portion part 23 the 2nd low magnetic fields and form face
23b。
1st magnet field forming portion part 22 has the size identical with the 2nd magnet field forming portion part 23.As it is shown in figure 5, the
1 magnet field forming portion part 22 is arranged on above the vertical direction of the 2nd magnet field forming portion part 23.In vertical direction,
1st low magnetic fields of the 1st magnet field forming portion part 22 forms face 22b and the 2nd top of the 2nd magnet field forming portion part 23
The distance of the spaced apart regulation of formation face, magnetic field 23a.That is, the 1st low magnetic fields forms face 22b and the 2nd magnetic field, top
Formation face 23a is relative.
1st magnet field forming portion part the 22 and the 2nd magnet field forming portion part 23 is in formation magnetic field, space about.Thus,
Abrasive wheel 20 is in formation magnetic field, space about.Especially, at the 1st bottom magnetic of the 1st magnet field forming portion part 22
The space that field is formed between face 22b and the 2nd magnetic field, top formation face 23a of the 2nd magnet field forming portion part 23 is magnetic flux
The flux concentrating space 27 concentrated, this magnetic flux is the magnetic flux in the magnetic field that abrasive wheel 20 is formed.Week at abrasive wheel 20
Being formed with the magnetic circuit of the closed-loop path as the magnetic line of force in the space enclosed, the magnetic line of force is the imaginary line representing magnetic field.Magnetic
Logical centralized space 27 is the space of the part comprising magnetic circuit.In flux concentrating space 27, exist from the 1st bottom
Formation face, magnetic field 22b is towards the magnetic line of force of the vertical direction of the 2nd magnetic field, top formation face 23a.
Additionally, the 1st magnet field forming portion part 22 and the 2nd magnet field forming portion part 23 can be upside for N pole and under
Side is the Magnet of S pole.That is, as long as the 1st magnet field forming portion part 22 is configured to relative with the 2nd magnet field forming portion part 23
Magnetic pole difference.
(2-1-4) slurry
Slurry 24 is the mixture of magnetic abrasive particle or magnetic abrasive particle and liquid.Slurry 24 is by abrasive wheel
20 formed magnetic fields and be maintained in flux concentrating space 27.It is maintained at the slurry in flux concentrating space 27
24 have slurry face 24a.Slurry face 24a is filled with the surface of the radial outside of the slurry 24 in flux concentrating space 27.
Magnetic abrasive particle is the grinding abrasive particle for grinding glass substrate 92 fragile material such as grade.Magnetic abrasive particle such as by
The microgranule of the magnetic such as ferrum oxide and ferrite is constituted.In the case of using ferrite as magnetic abrasive particle, it is not required to
It is used for the additive of anti-oxidation so that for the usage amount decline of the additive that oxidation prevents, therefore, it is suppressed that
In time rotten of magnetic abrasive particle.
Liquid for example, water, hydrocarbon, esters, ethers and the fluohydric acid gas mixed with magnetic abrasive particle.Grind with magnetic
The liquid of grain mixing can be with water as main constituent and add the liquid of hydrocarbon, esters, ethers and fluohydric acid gas etc..
The liquid mixed with magnetic abrasive particle is preferably water.By using water, it is possible to the milled processed of suppression glass substrate 92
In slurry 24 temperature rise.
In order to suppress the coagulation of magnetic abrasive particle, the interfacial agent of below 0.5wt% can be added in slurry 24.
Interfacial agent for example, fatty acid ester.Additionally, in order to suppress the composition of slurry 24 to change, can be in slurry
The propylene glycol less than 3.0wt% is added in 24.
About the magnetic abrasive particle of slurry 24, such as, use the carbonyl iron dust of BASF society.Carbonyl iron dust is just
Spherical shape, has diameter 1 μm～the particle size distribution of 8 μm.Slurry 24 is the most mixed in this magnetic abrasive particle
Close interfacial agent, antirust agent, wetting agent, viscosifier and water and be made.In addition it is also possible in slurry 24
In the further non magnetic slurry such as mixed oxidization cerium, aluminium oxide and silicon dioxide, to realize the raising of abrasive power.
Preferably, the peakflux density of magnetic abrasive particle is more than 1.0T, and maximum permeability is more than 3.0H/m.
In the case of the concentration of the magnetic abrasive particle comprised in slurry 24 is less than 85%, it is preferred that maximum magnetic flux is close
Degree is more than 1.3T, and maximum permeability is more than 3.3H/m, and peakflux density is more preferably more than 1.6T.
(2-2) structure of glass substrate unit
It follows that the detailed construction of glass substrate unit 80 is illustrated.Fig. 6 is cuing open of glass substrate unit 80
A part for view.Fig. 6 shows the end face 92a of the glass substrate 92 comprised in glass substrate unit 80 and a pair
First type surface 92b.The end face 92a of glass substrate 92 comprises the corner by grinding glass substrate 92 and chamfering becomes R shape
The surface of shape.
Hereinafter, when observing at the center of the width from first type surface 92b, the direction at end face 92a place is referred to as " wide
Outside degree direction ", when observing from end face 92a, the direction at the place, center of the width of first type surface 92b is claimed
Make " inside width ".Additionally, as shown in Figure 6, using the point as first type surface 92b Yu the border of end face 92a
It is referred to as point (tip) 92c, the point at the center of the vertical direction as end face 92a is referred to as top 92d.Vertical side
Upwards, end face 92a, from the sharp 92c of a side, extends to the sharp 92c of the opposing party via top 92d.
In glass substrate unit 80, utilize a pair abrasive particle holding member 93 clamping glass substrate 92.Glass substrate
A pair first type surface 92b of 92 respectively with the major surface contacts of abrasive particle holding member 93.Abrasive particle holding member 93 is relative
Fix in glass substrate 92.Abrasive particle holding member 93 is by the plate of the material molding of nonmagnetic material.Abrasive particle holding member
93 is with the material of same degree or to be more difficult to the material molding ground by with glass substrate 92 than glass substrate 92.
Abrasive particle holding member 93 has formation face, space 94.Formation face, space 94 is as connecing from first type surface 92b
The point touched is towards the inclined plane gradually left from first type surface 92b outside width.First type surface 92b is formed with space
Angle between face 94 for example, 45 °.Formation face, space 94 and glass substrate 92 at abrasive particle holding member 93
First type surface 92b between be formed abrasive particle keep space 95.Abrasive particle keeps space 95 to be directed towards inside width recessed
The recess entered.Outermost abrasive particle about width keeps the size of vertical direction in space 95, can basis
The radius r of the R shape in the corner of the chamfering of glass substrate 92 determines.Such as, width is outermost
Abrasive particle keeps the size of the vertical direction in space 95 can be in the range of r/2～r.Additionally, about abrasive particle maintaining part
The position of the position of point that part 93 contacts with glass substrate 92, the i.e. point that formation face, space 94 contacts with first type surface 92b
Put, it is also possible to determine according to distance t in the x-axis direction till playing top 92d from point 92c.Such as, from point
The distance in x-axis direction till 92c plays the point that formation face, space 94 contacts with first type surface 92b can be t/2～t
In the range of.
End inside the width in formation face, space 94, i.e., formation face, space 94 contacts with first type surface 92b
Point is positioned at than sharp 92c by the position inside width.End outside the width in formation face, space 94 is positioned at
Than sharp 92c by the position outside width.Additionally, the end outside the width in formation face, space 94 will not
It is positioned at than top 93 by the position outside width.
(2-3) action of lapping device
To in grinding step S8, the glass substrate 92 comprised in lapping device 10 grinding glass substrate unit 80
The operation of end face 92a illustrate.First, in grinding process S7, utilize conveying mechanism 12 to carry out bull ladle and contain
The glass substrate unit 80 of the glass substrate 92 of chamfering.The glass substrate unit 80 carried along conveying direction
Move closer to the abrasive wheel 20 of grinding mechanism 14.The position of a pair abrasive wheel 20 can be set by grinding mechanism 14 in advance
It is set to be consistent with the size of the width of glass substrate unit 80.Additionally, grinding mechanism 14 can utilize sensor
The feelings of abrasive wheel 20 are fully approached etc. the end face 92a detecting the glass substrate 92 comprised in glass substrate unit 80
The situation that condition or end face 92a contact with abrasive wheel 20, makes rotate centered by the central shaft 21a of rotary shaft 21 to grind
Emery wheel 20 moves to end face 92a.
As it is shown in figure 5, glass substrate unit 80 is inserted into slurry 24 from slurry face 24a.At glass substrate unit
80 are inserted under the state in slurry 24, utilize conveying mechanism 12, carry glass substrate unit along conveying direction
80.Thus, the end face 92a of the glass substrate 92 comprised in glass substrate unit 80 contacts with slurry 24
Under state, abrasive wheel 20 and end face 92a are along conveying direction relative movement.The end face 92a collision of glass substrate 92
The magnetic abrasive particle comprised in the slurry 24 rotated together with abrasive wheel 20, is thus ground.
In addition it is also possible to do not make glass substrate unit 80 move along conveying direction, and make abrasive wheel 20 along conveying direction
Mobile, make abrasive wheel 20 and end face 92a along conveying direction relative movement.In addition it is also possible to make glass substrate unit
80 and these both sides of abrasive wheel 20 move along conveying direction, make abrasive wheel 20 move along conveying direction is relative with end face 92a
Dynamic.
(3) feature
The manufacture method of the glass substrate of present embodiment, comprises following grinding step S8: make to utilize under overflow and draw
The end face 92a of the glass substrate 92 that method produces contacts with magnetic abrasive particle and is ground.Comprise magnetic abrasive particle
Slurry 24 by abrasive wheel 20 the 1st magnet field forming portion part the 22 and the 2nd magnet field forming portion part 23 formed magnetic
And be maintained in flux concentrating space 27.Utilizing lapping device 10, glass substrate unit 80 is inserted into grinding
Time in slurry 24, the magnetic abrasive particle comprised in slurry 24 is maintained in flux concentrating space 27 and around rotary shaft
21 rotate.The end face 92a of the glass substrate 92 comprised in glass substrate unit 80 is by grinding with the magnetic rotated
Grain contacts and is ground.
Fig. 7 is the enlarged drawing of the vicinity in the flux concentrating space 27 shown in Fig. 5.In the figure 7, with circle schematically
The magnetic abrasive particle 96 comprised in slurry 24 is shown.It practice, magnetic abrasive particle 96 is than the circle shown in Fig. 7
Little microgranule.
A pair abrasive particle holding member 93 clamping is utilized to have the substrate 92 of the end face 92a being ground by lapping device 10.
Between glass substrate 92 and abrasive particle holding member 93, it is formed with abrasive particle keeps space 95.It is maintained at flux concentrating
In space 27 and the end face of the magnetic abrasive particle 96 that the rotates glass substrate 92 to being inserted in flux concentrating space 27
92a applies grinding pressure.In the figure 7, the direction of grinding pressure that magnetic abrasive particle 96 produces is shown with arrow.
Specifically, make the magnetic abrasive particle 96 that mobility is restricted towards the magnetic field because of flux concentrating space 27, pressure
Enter the glass substrate 92 as grinding charge, thus, as the radially inner side in the bulged-in direction of glass substrate 92
The grinding pressure of rightabout radial outside acts on end face 92a.End face 92a is bent into R shape along vertical direction
Shape, therefore, on end face 92a, grinding pressure easily acts on the region vertical with the direction of grinding pressure, and grinds
Mill pressure is difficult to act on the region substantial parallel with the direction of grinding pressure.
Abrasive particle keeps space 95 to be directed towards the recess that radial outside is recessed.Therefore, even if being difficult to act as at grinding pressure
Region in, abrasive particle keeps the magnetic abrasive particle 96 in space 95 also to be able to be trapped in partly abrasive particle and keeps space
In 95.Thus, abrasive particle keep space 95 magnetic abrasive particle 96 can with point 92c near end face 92a concentrate
Ground contact.That is, keep in space 95 owing to magnetic abrasive particle 96 is trapped in abrasive particle so that magnetic abrasive particle 96 energy
Enough it is fully ground the end face 92a near point 92c.
Additionally, the direction of grinding pressure that end face 92a near the 92d of top produces with magnetic abrasive particle 96 is substantially
Vertically.Therefore, magnetic abrasive particle 96 can intensively contact with the end face 92a near the 92d of top.
Therefore, playing in the whole region till the 92d of top from point 92c, the end face 92a energy of glass substrate 92
Enough intensively contact with magnetic abrasive particle 96.Therefore, lapping device 10 can grinding glass substrate 92 equably
Whole end face 92a, therefore, it is possible to improve the grinding efficiency of glass substrate 92.
Herein, as comparative example, existing lapping device is illustrated, in existing lapping device, there is no profit
With a pair abrasive particle holding member 93 clamping glass substrate 92, there is not abrasive particle and keep the milled processed in space 95.
Fig. 8 is the figure being shown as comparative example, is the figure illustrating the lapping device removing abrasive particle holding member 93 from Fig. 7.
In fig. 8, for convenience, the reference marks identical with Fig. 7 is used.In fig. 8, in the same manner as Fig. 7, use arrow
Head illustrates the direction of the grinding pressure that magnetic abrasive particle 96 produces.As shown in Figure 8, in this lapping device, even if
Magnetic abrasive particle 96 contacts with the end face 92a near point 92c, the magnetic abrasive particle grinding pressure to end face 92a effect
Power is relatively low, it is impossible to intensively contact with the end face 92a near point 92c.Therefore, in this lapping device, in order to
It is fully ground the end face 92a near point 92c, needs the long period.Additionally, this lapping device can not grind equably
The whole end face 92a of glass substrate 92.
Above, the manufacture method of the glass substrate of present embodiment, to the glass clamped by a pair abrasive particle holding member 93
The end face 92a of glass substrate 92 is ground, thereby, it is possible to the whole end face 92a of grinding glass substrate 92 equably,
The grinding efficiency of glass substrate 92 can be improved.
(4) variation
Above, the manufacture method of the glass substrate of present embodiment is illustrated, but the invention is not restricted to above-mentioned reality
Execute mode, without departing from the scope of the subject in the invention, various improvement and change can be carried out.
(4-1) variation 1A
In the present embodiment, glass substrate unit 80 has 1 glass substrate 92.But, glass substrate unit
80 can also have multiple glass substrates 92.Fig. 9 is the one of the sectional view of the glass substrate unit 180 of this variation
Part.As it is shown in figure 9, in glass substrate unit 180, glass substrate 92 is handed over abrasive particle holding member 193
Alternately stacking.2 glass substrates 92 are utilized to clamp a part for abrasive particle holding member 193.By 2 glass substrates
The abrasive particle holding member 193 of 92 clampings has: form abrasive particle between the first type surface 92b of a glass substrate 92
Keep the formation face, space 194 in space 195；And and the first type surface 92b of another glass substrate 92 between formed
Abrasive particle keeps the formation face, space 194 in space 195.
In this variation, in the same manner as embodiment, glass substrate unit 180 is inserted in slurry 24,
This slurry 24 is maintained in the flux concentrating space 27 of abrasive wheel 20.The magnetic mill comprised in slurry 24
Grain is maintained in flux concentrating space 27 and rotates.Multiple glass substrates 92 comprised in glass substrate unit 180
End face 92a contact with the magnetic abrasive particle of rotation and be ground.
Additionally, the glass substrate unit 180 being alternately laminated with glass substrate 92 and abrasive particle holding member 193 is inserted
Enter in slurry 24, the end face 92a of glass substrate 92 is processed, therefore, work in-process glass substrate
92 is the most pliable.Therefore, the manufacture method of the glass substrate of this variation be suitable for having the thickness less than 0.3mm,
The processing of the end face 92a of the relatively thin glass substrate 92 of the thickness of such as 0.05mm～0.2mm.
Therefore, the end of multiple glass substrates 92 can be once ground according to the manufacture method of the glass substrate of this variation
Face 92a, thus, it is possible to improve the grinding efficiency of glass substrate 92.
(4-2) variation 1B
In the present embodiment, the abrasive particle holding member 93 comprised in glass substrate unit 80 has formation face, space
94.Formation face, space 94 is as from the point contacted with first type surface 92b towards outside width and gradually from master meter
The inclined plane that face 92b leaves.First type surface in the formation face, space 94 of abrasive particle holding member 93 with glass substrate 92
It is formed with abrasive particle between 92b and keeps space 95.
But, abrasive particle holding member 93 can also have formation face, other shapes of space 94.Specifically, abrasive particle
Holding member 93 can have can and the first type surface 92b of glass substrate 92 between form abrasive particle and keep space 95
Arbitrary formation face, space 94.Figure 10 is a part for the sectional view of the glass substrate unit 280 of this variation.Glass
Glass base board unit 280 is the unit utilizing a pair abrasive particle holding member 293 to clamp 1 glass substrate 92.
As shown in Figure 10, abrasive particle holding member 293 has formation face, space 294.Formation face, space 294 by with glass
The 1st formation face 294a and the parallel with first type surface 92b the 2nd vertical for first type surface 92b of glass substrate 92 forms face
294b is constituted.Between the formation face, space 294 and the first type surface 92b of glass substrate 92 of abrasive particle holding member 293
It is formed with abrasive particle and keeps space 295.Abrasive particle keeps space 295 to have the abrasive particle with embodiment and keeps space 95 phase
Same effect.
(4-3) variation 1C
The lapping device 10 of present embodiment is for carrying out the end of glass substrate 92 carried out in grinding step S8
The device of the attrition process of face 92a.But, lapping device 10 can also be as being used for carrying out at grinding process S7
In the device of the chamfer machining of glass substrate 92 that carries out use.
(4-4) variation 1D
The end face 92a of lapping device 10 grinding glass substrate 92 of present embodiment.But, lapping device 10 is also
Can be with the end face of other plate-like articles such as abrasive metal plate and ceramic wafer.
＜ the 2nd embodiment ＞
Referring to the drawings, the manufacture method of the glass substrate of the 2nd embodiment as the present invention is illustrated.1st
Embodiment and the structure that the difference is that only glass substrate unit 80 of present embodiment.Therefore, omit about
The explanation of the structure identical with the 1st embodiment.The lapping device the 10 and the 1st used in the present embodiment is implemented
The lapping device 10 of mode is identical.
(1) structure of glass substrate unit
Figure 11 is a part for the sectional view of the glass substrate unit 380 of present embodiment.Glass substrate unit 380
It is made up of 1 glass substrate 92 and a pair abrasive particle holding member 393.Abrasive particle holding member 393 is protected by 1 the 1st
Hold parts 393a and 1 the 2nd holding member 393b to constitute.1st holding member 393a and the 2nd holding member 393b
It is by the plate of the material molding of nonmagnetic material.
A pair first type surface 92b of glass substrate 92 respectively with the major surface contacts of the 1st holding member 393a.1st protects
Hold a pair first type surface of parts 393a respectively with the first type surface 92b and the 2nd holding member 393b of glass substrate 92
Major surface contacts.I.e., as shown in figure 11, glass substrate unit 380 is following unit: glass substrate 92 is by one
To the 1st holding member 393a clamping, and clamped by a pair the 2nd holding member 393b.Additionally, the 1st holding member
393a and the 2nd holding member 393b fixes relative to glass substrate 92.
1st holding member 393a has the 1st formation face 394a.1st forms face 394a corresponding to the 1st holding member
The end face of 393a.2nd holding member 393b has the 2nd formation face 394b.2nd forms face 394b corresponding to the
A part for the first type surface of 2 holding member 393b.1st formation face 394a is vertical with the 2nd formation face 394b.Glass
Glass base board unit 380 has abrasive particle and keeps space 395.Abrasive particle keeps space 395 to be by the master meter of glass substrate 92
Face 92b, the 1st formation face 394a and the 2nd form the space that face 394b is formed.Abrasive particle keeps space 395 to be directed towards
The recess that radial outside is recessed.
The point that 1st formation face 394a and first type surface 92b contacts is positioned at than sharp 92c by the position inside width.
End outside 2nd width forming face 394b is positioned at than sharp 92c by the position outside width.Additionally,
End outside 2nd width forming face 394b will not be positioned at than top 93 by the position outside width.
(2) feature
Figure 12 be with and relevant identical for Fig. 7 flux concentrating space 27 of the 1st embodiment near enlarged drawing.
In fig. 12, schematically show, with circle, the magnetic abrasive particle 96 comprised in slurry 24.It practice, magnetic
Abrasive particle 96 is the microgranule less than the circle shown in Figure 12.
A pair abrasive particle holding member 393 clamping is utilized to have the glass base of the end face 92a being ground by lapping device 10
Plate 92.Between glass substrate 92 and abrasive particle holding member 393, it is formed with abrasive particle keeps space 395.It is maintained at
In flux concentrating space 27 and the magnetic abrasive particle 96 that rotates is to the glass substrate being inserted in flux concentrating space 27
The end face 92a of 92 applies grinding pressure.In fig. 12, with arrow, the grinding pressure that magnetic abrasive particle 96 produces is shown
The direction of power.If specifically describing, mobility is made to be restricted towards the magnetic field because of flux concentrating space 27
Magnetic abrasive particle 96, is pressed into the glass substrate 92 as grinding charge, thus, bulged-in as glass substrate 92
The grinding pressure of the rightabout radial outside of the radially inner side in direction acts on end face 92a.End face 92a is along lead
Nogata is to being bent into R shape, and therefore, on end face 92a, grinding pressure easily acts on the direction with grinding pressure
Vertical region, and grinding pressure is difficult to act on the region substantial parallel with the direction of grinding pressure.
Abrasive particle keeps space 395 to be directed towards the recess that radial outside is recessed.Therefore, even if being difficult to operation at grinding pressure
Region in, abrasive particle keeps the magnetic abrasive particle 96 in space 395 also to be able to be trapped in partly abrasive particle and keeps space 395
In.Thus, abrasive particle keep space 395 magnetic abrasive particle 96 can with point 92c near end face 92a intensively
Contact.That is, keep in space 395 because magnetic abrasive particle 96 is trapped in abrasive particle so that magnetic abrasive particle 96 can fill
Divide the end face 92a near ground point 92c.
Additionally, the direction of grinding pressure that end face 92a near the 92d of top produces with magnetic abrasive particle 96 is substantially
Vertically.Therefore, magnetic abrasive particle 96 can the most intensively contact with the end face 92a near the 92d of top.
Therefore, playing in the whole region till the 92d of top from point 92c, the end face 92a energy of glass substrate 92
Enough contacted by higher grinding pressure from magnetic abrasive particle 96.Therefore, lapping device 10 can be equably
The whole end face 92a of grinding glass substrate 92, therefore, it is possible to improve the grinding efficiency of glass substrate 92.
(3) variation
Above, the manufacture method of the glass substrate of present embodiment is illustrated, but the present invention, it is not limited to above-mentioned
Embodiment, without departing from the scope of the subject in the invention, it is possible to implement various improvement and change.
(3-1) variation 2A
In the present embodiment, glass substrate unit 380 has 1 glass substrate 92.But, glass substrate list
Unit 380 can also have multiple glass substrates 92.Figure 13 is the sectional view of the glass substrate unit 480 of this variation
A part.As shown in figure 13, in glass substrate unit 480, by glass substrate 92 and abrasive particle holding member
493 alternately stackings.In fig. 13, a pair glass substrate 92 the abrasive particle holding member 493 clamped is by a pair
1st holding member 493a and the glass base of the 2nd holding member 493b by a pair the 1st holding member 493a clampings
Plate 92 is constituted.That is, glass substrate unit 480 is by glass substrate the 92 and the 1st holding member 493a alternately
The unit being laminated.
In fig. 13, as the glass substrate 92 of the 2nd holding member 493b comprised in abrasive particle holding member 493
First type surface 92b there is the 2nd effect identical for formation face 394b of the 2nd holding member 393b with embodiment.
The 1st holding member 493a comprised in abrasive particle holding member 493 has the 1st formation face 494a.Thus, glass base
Slab element 480 has first type surface 92b by 2 the most adjacent glass substrates 92 and is sandwiched between
The abrasive particle that the 1st formation face 494a of the 1st holding member 493a is formed keeps space 495.
In this variation, in the same manner as embodiment, glass substrate unit 480 is inserted in slurry 24,
This slurry 24 is maintained in the flux concentrating space 27 of abrasive wheel 20.The magnetic mill comprised in slurry 24
Grain is maintained in flux concentrating space 27 and rotates.Multiple glass substrates 92 comprised in glass substrate unit 480
End face 92a contact with the magnetic abrasive particle of rotation and be ground.
Additionally, the glass substrate unit 480 being alternately laminated with glass substrate 92 and abrasive particle holding member 493 is inserted
Enter in slurry 24, the end face 92a of glass substrate 92 is processed, therefore, work in-process glass substrate
92 is the most pliable.Therefore, the manufacture method of the glass substrate of this variation be suitable for having the thickness less than 0.3mm,
The processing of the end face 92a of the relatively thin glass substrate 92 of the thickness of such as 0.05mm～0.2mm.
Therefore, the manufacture method of the glass substrate of this variation, it is possible to once grind the end face of multiple glass substrates 92
92a, therefore, it is possible to improve the grinding efficiency of glass substrate 92.
(3-2) variation 2B
In the present embodiment, the 2nd holding member 393b comprised in abrasive particle holding member 393 is by nonmagnetic material
The plate of material molding.But, the 2nd holding member 393b can also be glass substrate 92.
(3-3) variation 2C
The lapping device 10 of present embodiment is for carrying out the end of glass substrate 92 carried out in grinding step S8
The device of the attrition process of face 92a.But, lapping device 10 can also be as being used for carrying out at grinding process S7
In the device of the chamfer machining of glass substrate 92 that carries out use.
(3-4) variation 2D
The end face 92a of lapping device 10 grinding glass substrate 92 of present embodiment.But, lapping device 10 is also
Can be with the end face of other plate-like articles such as abrasive metal plate and ceramic wafer.
Claims (8)
1. a manufacture method for glass substrate, makes the magnetic that is maintained in the magnetic field formed by magnet field forming portion part
Under the state that gonosome abrasive particle and described magnet field forming portion part rotate together about rotary shaft, make 1 or multiple glass substrates
End contacts with described magnetic abrasive particle, is processed described end, wherein, and the manufacture method of described glass substrate
There is following operation:
Preparatory process, makes abrasive particle holding member contact respectively with a pair first type surface of described glass substrate, utilizes a pair institute
State abrasive particle holding member and clamp described glass substrate；And
Manufacturing procedure, makes the described end by the described glass substrate of abrasive particle holding member clamping described in a pair and described magnetic
Gonosome abrasive particle contacts, and is processed described end,
Between the described end processed by described manufacturing procedure and described abrasive particle holding member, it is formed with abrasive particle keep
Space, this abrasive particle keep space be directed towards described in the recessed recess in outside radially of the axis of rotation.
The manufacture method of glass substrate the most according to claim 1, wherein,
Described abrasive particle holding member has formation face, space, and this formation face, space and described first type surface together form described mill
Grain keeps space.
The manufacture method of glass substrate the most according to claim 2, wherein,
In described manufacturing procedure, the described end of glass substrate multiple described is processed,
By described glass substrate and described abrasive particle holding member alternately stacking.
The manufacture method of glass substrate the most according to claim 1, wherein,
Described abrasive particle holding member has:
1st holding member, itself and described major surface contacts, and there is the 1st formation face；
2nd holding member, it contacts with described 1st holding member, and has the 2nd formation face,
Described abrasive particle keeps space by described first type surface, the described 1st forms face and the described 2nd and form face and formed
Space.
The manufacture method of glass substrate the most according to claim 4, wherein,
In described manufacturing procedure, the described end of glass substrate multiple described is processed,
By described glass substrate and described abrasive particle holding member alternately stacking,
Had by the described abrasive particle holding member of glass substrate clamping described in a pair:
1st holding member described in a pair；And
By described 2nd holding member of the 1st holding member clamping described in a pair,
It is to have to be processed by described manufacturing procedure by described 2nd holding member of the 1st holding member clamping described in a pair
The described glass substrate of described end.
6. according to the manufacture method of the glass substrate described in any one in Claims 1 to 5, wherein,
Described glass substrate has diagonal angle and has carried out the described end of chamfering.
7. a manufacture method for plate-like articles, it has a following operation:
Make the magnetic abrasive particle that is maintained in the magnetic field formed by magnet field forming portion part and described magnet field forming portion part
Together about under the state that rotary shaft rotates, the end of 1 or multiple plate-like articles is made to contact with described magnetic abrasive particle,
Being processed described end, wherein, the manufacture method of described plate-like articles has a following operation:
Preparatory process, makes abrasive particle holding member contact respectively with a pair first type surface of described plate-like articles, utilizes a pair institute
State abrasive particle holding member and clamp described plate-like articles；And
Manufacturing procedure, makes the described end by the described plate-like articles of abrasive particle holding member clamping described in a pair and described magnetic
Gonosome abrasive particle contacts, and is processed described end,
Between the described end processed by described manufacturing procedure and described abrasive particle holding member, it is formed with abrasive particle and keeps
Space, this abrasive particle keep space be directed towards described in the recessed recess in outside radially of the axis of rotation.
8. a manufacture device for glass substrate, it has:
Rotary shaft；
Magnet field forming portion part, it is connected with described rotary shaft, and rotates around described rotary shaft；
Magnetic abrasive particle, its magnetic field formed by described magnet field forming portion part keeps,
Described magnetic abrasive particle is when rotating together about described rotary shaft with described magnet field forming portion part, and by one
Ends contact to the glass substrate of abrasive particle holding member clamping, is processed described end,
By between described end and the described abrasive particle holding member of described magnetic abrasive machining, it is formed with abrasive particle and keeps
Space, this abrasive particle keep space be directed towards described in the recessed recess in outside radially of the axis of rotation.
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| JP2014199371A JP6342768B2 (en) | 2014-09-29 | 2014-09-29 | Glass substrate manufacturing method, plate-shaped article manufacturing method, and glass substrate manufacturing apparatus |
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| CN114102378A (en) * | 2021-11-08 | 2022-03-01 | 常熟市金诺精工模具有限公司 | High temperature resistant glass dish circulation apparatus for producing |
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| JPH05237764A (en) * | 1992-02-26 | 1993-09-17 | Mitsubishi Materials Corp | Shaping method for inner periphery edge grinding wheel base metal |
| JP2001113447A (en) * | 1999-10-18 | 2001-04-24 | Ishii Hyoki Corp | Edge grinding device for semiconductor wafer |
| CN101249623A (en) * | 2007-02-20 | 2008-08-27 | 昭和电工株式会社 | Grinding method and grinding device of circular disk shape substrate |
| WO2014051127A1 (en) * | 2012-09-28 | 2014-04-03 | Hoya株式会社 | Method for manufacturing glass substrate for magnetic disk |
| CN103769956A (en) * | 2012-10-25 | 2014-05-07 | 安瀚视特控股株式会社 | Method for manufacturing glass substrate and magnetic fluid for polishing glass substrate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114102378A (en) * | 2021-11-08 | 2022-03-01 | 常熟市金诺精工模具有限公司 | High temperature resistant glass dish circulation apparatus for producing |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6342768B2 (en) | 2018-06-13 |
| CN106031992B (en) | 2018-11-06 |
| JP2016069214A (en) | 2016-05-09 |
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