CN106031992B - The manufacturing method of the manufacturing method of glass substrate, the manufacturing device of glass substrate and plate-like articles - Google Patents
The manufacturing method of the manufacturing method of glass substrate, the manufacturing device of glass substrate and plate-like articles Download PDFInfo
- Publication number
- CN106031992B CN106031992B CN201510124559.XA CN201510124559A CN106031992B CN 106031992 B CN106031992 B CN 106031992B CN 201510124559 A CN201510124559 A CN 201510124559A CN 106031992 B CN106031992 B CN 106031992B
- Authority
- CN
- China
- Prior art keywords
- glass substrate
- abrasive grain
- holding member
- face
- space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Surface Treatment Of Glass (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The present invention provides the manufacturing device of the manufacturing method and glass substrate of glass substrate, in accordance with the invention it is possible to improve the grinding efficiency of glass substrate.The manufacturing method of the glass substrate is following method：The end for the glass substrate being clamped by a pair of of abrasive grain holding member is set to be contacted with the magnetic substance abrasive grain rotated around rotary shaft, to be processed to the end of glass substrate.Abrasive grain is formed between the end of glass substrate and abrasive grain holding member keeps space, the abrasive grain that space is kept to be directed towards recess portion outside recessed radially of the axis of rotation.Abrasive grain keeps the magnetic substance abrasive grain in space that can be trapped in abrasive grain holding space, is intensively contacted therefore, it is possible to the end face near the main surface with glass substrate.Therefore, this method can equably grind the entire end face of glass substrate, therefore, it is possible to improve the grinding efficiency of glass substrate.
Description
Technical field
The present invention relates to the manufacturers of the manufacturing method of glass substrate, the manufacturing device of glass substrate and plate-like articles
Method.
Background technology
Glass substrate is cut into defined size in its manufacturing process.For example, liquid crystal display, plasma display
The manufacturing process of the glass substrate of equal flat-panel monitors includes following process：In the large-size glass substrate referred to as mother glass
Upper formation scribing line, to be cut.On the cut surface of glass substrate, it is usually formed subtle crackle and very sharp keen side
Edge.The cut surface is for example ground in such a way that section becomes R shapes, in addition, the attrition process by using abrasive wheel is come
It is finish-machined to mirror-like.
In patent document 1 (No. 2012/067587 bulletin of International Publication No.), disclose in the cutting as glass substrate
The technology of magnetic fluid is used in the attrition process of the end face in face.To include magnetism in the attrition process using magnetic fluid
The magnetic fluid of body abrasive grain is maintained between a pair of magnet, in the state of so that the end face of glass substrate is contacted with magnetic fluid,
So that the end face of glass substrate is relatively moved with magnetic fluid, thus grinds the end face of glass substrate.Based on magnetic fluid into
In capable attrition process, magnetic substance abrasive grain follows the shape of machined object and is ground processing, therefore, to the damage of machined object
Hinder smaller.Therefore, the case where in the attrition process to the end face of glass substrate using the abrasive wheel for maintaining magnetic fluid
Under, compared with using the abrasive wheel attrition process comprising diamond abrasive grain, smoother end face can be obtained.
Existing technical literature
Patent document
Patent document 1：No. 2012/067587 bulletin of International Publication No.
Invention content
Problems to be solved by the invention
But in using the attrition process carried out based on the abrasive wheel for maintaining magnetic fluid, in general, making grinding
Wheel makes the end of glass substrate be contacted with magnetic fluid in the state that rotary shaft rotates.The magnetic kept in the abrasive wheel of rotation
The magnetic substance abrasive grain for including in property fluid is squeezed out by glass substrate, and is squeezed and is returned to glass substrate.Magnetic substance abrasive grain and glass as a result,
Glass substrate is each other by active force.Therefore, the end face of glass substrate is ground from magnetic substance abrasive grain by grinding pressure.But
It is that the grinding pressure when end of magnetic substance abrasive grain and glass substrate contacts is smaller, it is smooth in order to be obtained by attrition process
End face, need the end for making magnetic substance abrasive grain and glass substrate to come into full contact with.Therefore, add in the grinding for having used magnetic fluid
In work, process time be easy it is elongated, thus it requires improve glass substrate grinding efficiency.
The object of the present invention is to provide the manufacturing method of the glass substrate for the grinding efficiency that can improve glass substrate and
The manufacturing device of glass substrate.
The means used to solve the problem
The manufacturing method of the glass substrate of the present invention is following method：Make to be maintained at the formation of magnet field forming portion part
Magnetic substance abrasive grain in magnetic field in the state that rotary shaft rotates, makes 1 or multiple glass substrates together with magnet field forming portion part
End contacted with magnetic substance abrasive grain, the end of glass substrate is processed.The manufacturing method of the glass substrate, which has, to be prepared
Process and manufacturing procedure.In preparatory process, abrasive grain holding member is made to be contacted respectively with a pair of of main surface of glass substrate, utilized
Glass substrate is clamped in a pair of of abrasive grain holding member.In manufacturing procedure, make the glass substrate being clamped by a pair of of abrasive grain holding member
End contacted with magnetic substance abrasive grain, the end of glass substrate is processed.In the end and mill processed by manufacturing procedure
It is formed with abrasive grain between grain holding member and keeps space, it is towards outside recessed recessed radially of the axis of rotation which, which keeps space,
Portion.
The manufacturing method of the glass substrate is that the end of glass substrate is made to be contacted with the magnetic substance abrasive grain rotated around rotary shaft
Come the method being processed.The processing of the end of glass substrate is following processing：What it is to glass substrate includes to have carried out chamfering
Corner surface including the end face of glass substrate be ground.Processed glass is clamped using a pair of of abrasive grain holding member
Substrate.It is formed with abrasive grain between the end of glass substrate and abrasive grain holding member and keeps space.The magnetism rotated around rotary shaft
Body abrasive grain is squeezed out by glass substrate, and is pressed back into glass substrate.Therefore, magnetic substance abrasive grain by glass substrate towards the diameter of rotary shaft
It squeezes out outward.It is towards recess portion outside recessed radially of the axis of rotation, therefore, even if abrasive grain keeps space that abrasive grain, which keeps space,
Magnetic substance abrasive grain squeezed out towards radial outside, can also be trapped in abrasive grain keep space in.It is trapped in abrasive grain and keeps space
In magnetic substance abrasive grain can intensively be contacted with the end face near the main surface of glass substrate.And there is no abrasive grains to keep empty
Between in the case of, can not be with glass substrate even if magnetic substance abrasive grain is contacted with the end face near the main surface of glass substrate
End face near main surface intensively contacts.In addition, the thickness direction central portion of the end face of glass substrate is magnetic substance mill originally
The region that grain intensively contacts.Therefore, the manufacturing method of the glass substrate can equably grind the entire end face of glass substrate,
Therefore, it is possible to improve the grinding efficiency of glass substrate.
In addition, in the manufacturing method of the glass substrate of the present invention, it is preferred that abrasive grain holding member is formed with space
The main surface of face, the space forming face and glass substrate is formed together abrasive grain and keeps space.
In the manufacturing method of the glass substrate, abrasive grain holding member is the single portion that can be formed abrasive grain and keep space
Part.
In addition, in the manufacturing method of the glass substrate of the present invention, it is preferred that in manufacturing procedure, to multiple glass
The end of substrate is processed.In this case, glass substrate and abrasive grain holding member are alternately laminated.
The manufacturing method of the glass substrate can once grind the end face of multiple glass substrates, therefore, it is possible to improve glass
The grinding efficiency of substrate.
In addition, the present invention glass substrate manufacturing method in, abrasive grain holding member preferably have the 1st holding member and
2nd holding member.1st holding member is contacted with main surface, and has the 1st forming face.2nd holding member and the 1st holding member
Contact, and there is the 2nd forming face.It is the main surface, the 1st forming face and the 2nd forming face shape by glass substrate that abrasive grain, which keeps space,
At space.
In the manufacturing method of the glass substrate, abrasive grain holding member keeps two components in space by that can form abrasive grain
It constitutes.
In addition, in the manufacturing method of the glass substrate of the present invention, it is preferred that in manufacturing procedure, to multiple glass
The end of substrate is processed.In this case, glass substrate and abrasive grain holding member are alternately laminated.In addition, by a pair
The abrasive grain holding member of glass substrate clamping has a pair of 1st holding member and is kept by the 2nd of a pair of 1st holding member clamping
Component.The 2nd holding member by a pair of 1st holding member clamping is the glass base with the end processed by manufacturing procedure
Plate.
In the manufacturing method of the glass substrate, glass substrate and the 1st holding member are alternately laminated.Therefore, the glass
The manufacturing method of glass substrate can once grind the end face of multiple glass substrates, therefore, it is possible to improve the grinding effect of glass substrate
Rate.
In addition, in the manufacturing method of the glass substrate of the present invention, glass substrate, which preferably has, has diagonally carried out chamfering
End.
The manufacturing method of the glass substrate can equably be ground diagonal section carried out chamfering glass substrate it is entire
End face.
The manufacturing method of the plate-like articles of the present invention is following method：Make to be maintained at the formation of magnet field forming portion part
Magnetic substance abrasive grain in magnetic field in the state that rotary shaft rotates, makes 1 or multiple plate-like articles together with magnet field forming portion part
End contacted with magnetic substance abrasive grain, the end of plate-like articles is processed.The manufacturing method of the plate-like articles, which has, to be prepared
Process and manufacturing procedure.In preparatory process, abrasive grain holding member is made to be contacted respectively with a pair of of main surface of plate-like articles, and profit
Plate-like articles are clamped with a pair of of abrasive grain holding member.In manufacturing procedure, make the plate object being clamped by a pair of of abrasive grain holding member
The end of product is contacted with magnetic substance abrasive grain, is processed to the end of plate-like articles.The end that is processed by manufacturing procedure with
It is formed with abrasive grain between abrasive grain holding member and keeps space, it is outside recessed radially of the axis of rotation which keeps space to be directed towards
Recess portion.
The manufacturing device of the glass substrate of the present invention has rotary shaft, magnet field forming portion part and magnetic substance abrasive grain.Magnetic field shape
At component and rotation axis connection, and rotated around rotary shaft.The magnetic field that magnetic substance abrasive grain is formed by magnet field forming portion part is kept.It is magnetic
Body abrasive grain together with magnet field forming portion part around rotary shaft in the state of rotating, with the glass being clamped by a pair of of abrasive grain holding member
The end of substrate contacts, and is processed to the end of glass substrate.It is kept with abrasive grain in the end by magnetic substance abrasive machining
Abrasive grain is formed between component keeps space, the abrasive grain that space is kept to be directed towards recess portion outside recessed radially of the axis of rotation.
The manufacturing device of the glass substrate can equably grind the entire end face of glass substrate, therefore, it is possible to improve glass
The grinding efficiency of glass substrate.
Invention effect
The manufacturing method of glass substrate and the manufacturing device of glass substrate of the present invention can improve the grinding of glass substrate
Efficiency.
Description of the drawings
Fig. 1 is the flow chart of the manufacturing method of the glass substrate of the 1st embodiment.
Fig. 2 is the schematic diagram for carrying out melting process to the device of cutting action.
Fig. 3 is the skeleton diagram of grinding device.
Fig. 4 is the outside drawing of abrasive wheel.
Fig. 5 is the sectional view of abrasive wheel.
Fig. 6 is a part for the sectional view of glass substrate unit.
Fig. 7 is the enlarged drawing near flux concentrating space.
Fig. 8 is the figure for the grinding device for being shown as comparative example.
Fig. 9 is a part for the sectional view of the glass substrate unit of variation 1A.
Figure 10 is a part for the sectional view of the glass substrate unit of variation 1B.
Figure 11 is a part for the sectional view of the glass substrate unit of the 2nd embodiment.
Figure 12 is the enlarged drawing near flux concentrating space.
Figure 13 is a part for the sectional view of the glass substrate unit of variation 2A.
Label declaration
21 rotary shafts；22 the 1st magnet field forming portion parts (magnet field forming portion part)；23 the 2nd magnet field forming portion part (magnet field forming portions
Part)；92 glass substrates；The end face (end of glass substrate) of 92a glass substrates；The main side face of 92b glass substrates；93 abrasive grains are protected
Hold component；94 space forming faces；95 abrasive grains keep space；96 magnetic substance abrasive grains；193 abrasive grain holding members；194 spaces are formed
Face；195 abrasive grains keep space；393 abrasive grain holding members；The 1st holding members of 393a；The 2nd holding members of 393b；The 1st shapes of 394a
At face；The 2nd forming faces of 394b；395 abrasive grains keep space；493 abrasive grain holding members；The 1st holding members of 493a；493b the 2nd is protected
Hold component (glass substrate)；The 1st forming faces of 494a；495 abrasive grains keep space
Specific implementation mode
The 1st embodiment > of <
With reference to attached drawing, the manufacturing method of the glass substrate of the 1st embodiment as the present invention is illustrated.This implementation
The manufacturing method of the glass substrate of mode includes to using drawing method (オ ー バ ー フ ロ ー ダ ウ Application ド ロ ー methods under overflow) system
The process that the end face for the glass substrate produced is ground.
(1) summary of the manufacturing process of glass substrate
First, the manufacturing process of glass substrate is illustrated.Glass substrate is as liquid crystal display, plasma display
With the glass substrate of flat-panel monitors (FPD), the glass substrate of touch panel, the solar cell face such as organic el display
The glass substrate of plate and the glass substrate of protection etc. use.The glass substrate such as thickness with 0.2mm~0.8mm,
And the size with longitudinal direction 680mm~2200mm and transverse direction 880mm~2500mm.
As an example of glass substrate 10, the glass substrate of the composition with following (a)~(j) can be enumerated.
(a)SiO2：The 50 mass % of mass %~70,
(b)Al2O3：The 10 mass % of mass %~25,
(c)B2O3：The 1 mass % of mass %~18,
(d)MgO：The 0 mass % of mass %~10,
(e)CaO：The 0 mass % of mass %~20,
(f)SrO：The 0 mass % of mass %~20,
(g)BaO：The 0 mass % of mass %~10,
(h)RO：5 mass of mass %~20 % (R be selected from Mg, Ca, Sr and Ba at least one kind of),
(i)R’2O：0 mass of mass %~2.0 % (R ' be selected from Li, Na and K at least one kind of),
(j) from SnO2、Fe2O3And CeO2In at least one kind of metal oxide for selecting.
In addition, the glass with above-mentioned composition allows other micro constitutents to exist in the range of less than 0.1 mass %.
Fig. 1 is an example of the flow chart for the manufacturing process for showing glass substrate.The manufacturing process of glass substrate is mainly by melting
Chemical industry sequence (step S1), clarification process (step S2), agitating procedure (step S3), molding procedure (step S4), annealing operation (step
Rapid S5), cutting action (step S6), grinding process (step S7), grinding process (step S8) constitute.Fig. 2 is to carry out smelter
The schematic diagram of the glass substrate manufacturing device 100 of sequence S1~cutting action S6.Glass substrate manufacturing device 100 is by melting appartus
101, clarifier 102, agitating device 103, molding machine 104, cutter device 105 are constituted.
In melting process S1, glass raw material is set to melt by heating meanss such as heaters using melting appartus 101, it is raw
At the melten glass 90 of 1500 DEG C~1600 DEG C of high temperature.Glass raw material is modulated to substantially obtain desired composition
Glass.Herein, " substantial " refers to that other micro constitutents is allowed to exist in the range of less than 0.1 mass %.
In clarifying process S2, using clarifier 102, make the melten glass generated in melting process S1 90 into one
Step heating, thus carries out the clarification of melten glass 90.In clarifier 102, the temperature rise of melten glass 90 is to 1600 DEG C
~1750 DEG C, preferably rise to 1650 DEG C~1700 DEG C.In clarifier 102, the O that includes in melten glass 902、CO2With
SO2Small bubble absorb the SnO because including in glass raw material2The O for waiting the reduction of fining agents and generating2And grow up, it floats to molten
Melt the liquid level of glass 90 and disappears.
In agitating procedure S3, the stirring of agitating device 103 clear melten glass 90 in clarifying process S2 is utilized so that
Become to homogenize on chemically and thermally.In agitating device 103, melten glass 90 is flowed along vertical direction, is pivoted
Blender stirs, and is transported to downstream process from the outflux being arranged in the bottom of agitating device 103.In addition, in Beater operator
In sequence S3, make glass of oxygen enrichment zirconium etc., the glass ingredient with the proportion different from the mean specific gravity of melten glass 90 from stirring
It mixes and is removed in device 103.
In molding procedure S4, using molding machine 104, by drawing method under overflow, after being stirred from agitating procedure S3
Melten glass 90 in mold glass tape 91.Specifically, from the melten glass 90 that the top slime flux of forming unit shunts,
Lower section is flowed to along the side wall of forming unit, collaborates in the lower end of forming unit, continuously molds glass tape 91 as a result,.It is molten
Melt glass 90 before flowing into molding procedure S4, is cooled to and is suitable for the molding temperature based on method is drawn under overflow, such as
1200℃。
In annealing operation S5, controlled into trip temperature so that continuously given birth in molding procedure S4 using molding machine 104
At glass tape 91 be not deformed and distort, and be annealed to annealing point or less.
In cutting action S6, using cutter device 105, the glass tape 91 of room temperature will be annealed in annealing operation S5
It is cut by each specific length.When being cut to glass tape 91, score line is formed on glass tape 91, stretching is made to answer
Power concentrates on score line, and glass tape 91 is cut off.Score line usually profit is formed with the following method：Using diamond cutter with
Mechanical system is formed；And initial cracking is set to develop by using heating and the chilling of laser.In cutting action S6
In, further, it will be cut into defined size by the glass tape 91 after each defined length cutting, obtain glass substrate 92.
In grinding process S7, it is ground the end face of the glass substrate 92 obtained in cutting action S6, to glass substrate 92
Carry out chamfering.Corner between the end face and main surface of the glass substrate 92 cut in cutting action S6 is formed with very sharp
The edge of profit.In grinding process S7, it is ground the corner of glass substrate 92 using skive etc., is removed as a result, at angle
The edge that portion is formed.The cross sectional shape of the end face for the glass substrate 92 being chamfered by being ground corner becomes R shapes.
In addition, in grinding process S7, the end face of glass substrate 92 is ground using skive etc. so that glass base
The working width of the end face of plate 92 is in the range of regulation.Skive is, for example, to utilize the combination for wrapping iron-containing metal class
Agent come fix granularity be #400 diamond abrasive grain made of metal bonded wheel.The working width of end face is glass substrate 92
The end face being chamfered outermost end and the distance between end face and the boundary of main surface maximum value.In chamfer machining, glass
The power that the end face of glass substrate 92 is subject to from skive etc., from the outermost end of end face towards end face and the boundary of main surface by
Gradual change is small.Therefore, in the case where working width is excessive, the region of the end face of glass substrate 92 and the near border of main surface
It is possible that not being ground fully, end face is not processed equably.On the other hand, in the case where working width is too small, it is possible to
It cannot fully remove at the edge of the corner of glass substrate 92 formation.In the case where the thickness for setting glass substrate 92 is t, processing
Width it is above-mentioned as defined in range preferably from 1/50t~t, more preferably 1/20t~1/2t, further preferably 1/10t~1/
3t.In addition, in grinding process S7, preferably the cross grinding of glass substrate 92 is put down at the arithmetic of the end face of glass substrate 92
Equal roughness Ra is 0.1 μm~0.2 μm.In addition, in grinding process S7, can also using metal bonded wheel come pair
The end face of glass substrate 92 carries out after being once ground, and carries out secondary grinding using resin bond wheel, wherein resin-bonded
The bonding agent of agent grinding wheel is more soft than the bonding agent of metal bonded wheel.
In grinding process S8, the end face for the glass substrate 92 being chamfered in grinding process S7 is ground.In grinding process
On the end face for the glass substrate 92 being chamfered in S7, it is formed with comprising the subtle crackle referred to as fine crack and horizontal crackle
Layer.The layer is referred to as affected layer or fragile destruction layer.When being formed with affected layer, the end of glass substrate 92 can be made
The breakdown strength in face declines.Grinding process S8 is that the destruction of the end face in order to remove affected layer, raising glass substrate 92 is strong
Degree and carry out.In grinding process S8, the cross grinding of glass substrate 92 is preferably less than 3 μ at the thickness of affected layer
m.In addition, in grinding process S8, preferably by the end surface grinding of glass substrate 92 at the arithmetic average of the end face of glass substrate 92
Roughness Ra is 10nm or less.
The cleaning process and inspection operation of glass substrate 92 are carried out after grinding process S8.Finally, glass base is tied up
Plate 92 is supplied to FPD manufacturers etc..FPD manufacturers form the semiconductor elements such as TFT on the surface of glass substrate 92,
Produce FPD.
(2) details of grinding process
Next, being illustrated to the milled processed of the end face 92a of the glass substrate 92 carried out in grinding process S8.?
In grinding process S8, the end face 92a of glass substrate 92 is ground using grinding device 10.Fig. 3 is the skeleton diagram of grinding device 10.
Grinding device 10 conveys aftermentioned glass substrate unit 80, and a pair of the glass substrate 92 to including in glass substrate unit 80
End face 92a is ground.The end face 92a of glass substrate 92 is the end face along the long side of glass substrate 92.
Glass substrate unit 80 is made of 1 glass substrate 92 and a pair of of abrasive grain holding member 93.As shown in figure 3, glass
Base board unit 80 is that unit made of glass substrate 92 is clamped using a pair of of abrasive grain holding member 93.
Grinding device 10 mainly has conveying mechanism 12 and grinding mechanism 14.Conveying mechanism 12 is along glass substrate 92
Long side, the mechanism of conveying glass substrate unit 80.Conveying mechanism 12 has unit fixed station 82.Glass substrate unit 80 is consolidated
It is scheduled on the upper surface of unit fixed station 82.Conveying mechanism 12 makes the unit fixed station 82 for being fixed with glass substrate unit 80 along rule
Fixed direction movement, thus conveys glass substrate unit 80.Conveying mechanism 12 can be along the long side of glass substrate 92 as a result,
To convey the glass substrate 92 for including in glass substrate unit 80.
Mechanism 14 is ground with opposite respectively with a pair of of the end face 92a for the glass substrate 92 for including in glass substrate unit 80
Mode is arranged in the both sides of glass substrate unit 80.Grinding mechanism 14 has abrasive wheel 20.Mechanism 14 is ground towards glass substrate
Unit 80 pushes the abrasive wheel 20 of rotation, to grind the end face 92a for the glass substrate 92 for including in glass substrate unit 80.Scheming
In 3, the direction that unit fixed station 82 moves and the direction that abrasive wheel 20 rotates are shown using arrow.
The structure of (2-1) abrasive wheel
Next, being illustrated to the structure of abrasive wheel 20.In the following description, " conveying direction " is glass substrate 92
Long side direction, the i.e. long side direction of the end face 92a of glass substrate 92, be to convey glass substrate 92 using conveying mechanism 12
Direction." width direction " is the direction along the surface of glass substrate 92 and is the direction vertical with conveying direction." vertical side
To " it is the direction vertical with the surface of glass substrate 92.In the accompanying drawings, conveying direction shows that width direction is by " x by " y-axis "
Axis " shows that vertical direction is shown by " z-axis ".The plane vertical with vertical direction is referred to as " horizontal plane ".The master of glass substrate 92
Surface is parallel with horizontal plane.
Abrasive wheel 20 be used to grind the end face 92a for the glass substrate 92 for including in glass substrate unit 80.Fig. 4 is to grind
The outside drawing of emery wheel 20.Fig. 5 is the xz planes along the central shaft 21a comprising rotary shaft 21, obtained from abrasive wheel 20 is cut
Sectional view.In fig. 5 it is shown that the section of glass substrate unit 80 is as reference.As shown in figure 5, in glass substrate unit 80
Including the end face 92a of glass substrate 92 be chamfered to be R shapes.Abrasive wheel 20 mainly there is rotary shaft 21, the 1st magnetic field to be formed
Component 22, the 2nd magnet field forming portion part 23 and slurry 24.
(2-1-1) rotary shaft
Rotary shaft 21 is the axis for making abrasive wheel 20 rotate.Central shaft 21a rotation of the abrasive wheel 20 around rotary shaft 21.In
Mandrel 21a is parallel with vertical direction.As shown in figure 3, the direction of rotation of abrasive wheel 20 be make glass substrate unit 80 towards with glass
The direction that 80 transported side of base board unit moves in the opposite direction.Rotary shaft 21 is not centered on the side of rotary shaft 21 with magnetic flux
Formula is molded by the stainless steel steel of the nonmagnetic materials such as SUS304.Hereinafter, by the radial direction of rotary shaft 21, i.e. in rotary shaft 21
Direction vertical mandrel 21a is referred to as " radial direction ".In addition, about two points on radial straight line, by the distance away from central shaft 21a
Side where larger point is referred to as " radial outside ", and the distance away from central shaft 21a is referred to as " radial direction compared with the side where dot
Inside ".
Rotary shaft 21 is connect with rotary shaft driving portion (not shown), is rotated around central shaft 21a with desired rotary speed.Rotation
Shaft 21 is connect with rotary shaft mobile mechanism (not shown), with relative to the glass substrate 92 for including in glass substrate unit 80
End face 92a closer and farther from mode move.
(2-1-2) the 1st magnet field forming portion part
As shown in figure 5, the 1st magnet field forming portion part 22 has the portion of the cylindrical shape of the through hole formed along vertical direction
Part.Rotary shaft 21 penetrates through the through hole of the 1st magnet field forming portion part 22.1st magnet field forming portion part 22 is fixed in rotary shaft 21.
1st magnet field forming portion part 22 is the magnet such as permanent magnet and electromagnet, is magnetized along vertical direction, and upside is the poles S and downside
For the poles N.Hereinafter, the upper surface of the 1st magnet field forming portion part 22 is referred to as the 1st top magnetic field forming face 22a, the 1st magnetic field is formed
The lower surface of component 22 is referred to as the 1st low magnetic fields forming face 22b.
(2-1-3) the 2nd magnet field forming portion material
As shown in figure 5, the 2nd magnet field forming portion part 23 is the cylindrical shape with the through hole formed along vertical direction
Component.Rotary shaft 21 penetrates through the through hole of the 2nd magnet field forming portion part 23.2nd magnet field forming portion part 23 is fixed on rotary shaft 21
On.2nd magnet field forming portion part 23 is the magnet such as permanent magnet and electromagnet, is magnetized along vertical direction, and upside is the poles S and downside
For the poles N.Hereinafter, the upper surface of the 2nd magnet field forming portion part 23 is referred to as the 2nd top magnetic field forming face 23a, the 2nd magnetic field is formed
The lower surface of component 23 is referred to as the 2nd low magnetic fields forming face 23b.
1st magnet field forming portion part 22 has size identical with the 2nd magnet field forming portion part 23.As shown in figure 5, the 1st magnetic field
Forming member 22 is arranged above the vertical direction of the 2nd magnet field forming portion part 23.In the vertical direction, in the 1st magnet field forming portion
The 1st low magnetic fields forming face 22b's and the 2nd top magnetic field forming face 23a of the 2nd magnet field forming portion part 23 of part 22 is spaced apart rule
Fixed distance.That is, the 1st low magnetic fields forming face 22b is opposite with the 2nd top magnetic field forming face 23a.
1st magnet field forming portion part 22 and the 2nd magnet field forming portion part 23 form magnetic field in surrounding space.It grinds as a result,
Wheel 20 forms magnetic field in surrounding space.Especially, the 1st low magnetic fields forming face 22b of the 1st magnet field forming portion part 22 with
Space between 2nd top magnetic field forming face 23a of the 2nd magnet field forming portion part 23 is the flux concentrating space 27 of flux concentrating,
The magnetic flux is the magnetic flux in the magnetic field that abrasive wheel 20 is formed.It is formed with closing as the magnetic line of force in the space around abrasive wheel 20
The magnetic circuit in circuit is closed, the magnetic line of force is the imaginary line for indicating magnetic field.Flux concentrating space 27 is the sky of the part comprising magnetic circuit
Between.In flux concentrating space 27, there is the lead from the 1st low magnetic fields forming face 22b towards the 2nd top magnetic field forming face 23a
Histogram to the magnetic line of force.
In addition, it is the poles N and downside is the poles S that the 1st magnet field forming portion part 22 and the 2nd magnet field forming portion part 23, which can be upside,
Magnet.That is, as long as the 1st magnet field forming portion part 22 and the 2nd magnet field forming portion part 23 are configured to opposite magnetic pole difference.
(2-1-4) slurry
Slurry 24 is the mixture of magnetic substance abrasive grain or magnetic substance abrasive grain and liquid.Slurry 24 is by abrasive wheel 20
The magnetic field of formation and be maintained in flux concentrating space 27.The slurry 24 being maintained in flux concentrating space 27 has slurry
Face 24a.Pulp surface 24a is filled with the surface of the radial outside of the slurry 24 in flux concentrating space 27.
Magnetic substance abrasive grain is the grinding abrasive grain for grinding the fragile materials such as glass substrate 92.Magnetic substance abrasive grain is for example by oxygen
The particle for changing the magnetic substances such as iron and ferrite is constituted.In the case where using ferrite as magnetic substance abrasive grain, need not be used for
Prevent the additive of oxidation so that the usage amount for aoxidizing the additive prevented declines, therefore, it is suppressed that magnetic substance abrasive grain
At any time rotten.
The liquid mixed with magnetic substance abrasive grain is, for example, water, hydrocarbon, esters, ethers and hydrogen fluoride.With magnetic substance abrasive grain
Mixed liquid can be using water as principal component and liquid made of adding hydrocarbon, esters, ethers and hydrogen fluoride etc..With magnetism
The liquid of body abrasive grain mixing is preferably water.By using water, the slurry 24 in the milled processed of glass substrate 92 can be inhibited
Temperature rise.
In order to inhibit the agglutination of magnetic substance abrasive grain, 0.5wt% interfacial agents below can be added in slurry 24.
Interfacial agent is, for example, aliphatic ester.In addition, in order to inhibit the composition of slurry 24 to change, can add in slurry 24
Add the propylene glycol less than 3.0wt%.
About the magnetic substance abrasive grain of slurry 24, such as the carbonyl iron dust using BASF societies.Carbonyl iron dust is sphere
Shape, the size distribution with 1 μm~8 μm of diameter.Slurry 24 is to properly mix interfacial agent in the magnetic substance abrasive grain, prevent
Rust agent, wetting agent, tackifier and water and be made.In addition it is also possible to further mixed oxidization cerium, oxidation in slurry 24
The non magnetic slurry such as aluminium and silica, to realize the raising of abrasive power.
Preferably, the peakflux density of magnetic substance abrasive grain is 1.0T or more, and maximum permeability is 3.0H/m or more.?
The concentration for the magnetic substance abrasive grain for including in slurry 24 is less than in the case of 85%, it is preferred that peakflux density 1.3T
More than, maximum permeability is 3.3H/m or more, and peakflux density is more preferably 1.6T or more.
The structure of (2-2) glass substrate unit
Next, being illustrated to the detailed construction of glass substrate unit 80.Fig. 6 is the sectional view of glass substrate unit 80
A part.Fig. 6 shows the end face 92a and a pair of of main surface 92b for the glass substrate 92 for including in glass substrate unit 80.Glass
The end face 92a of glass substrate 92 include by grinding glass substrate 92 corner by chamfering at R shapes surface.
Hereinafter, when from the center of the width direction of main surface 92b, the direction where the 92a of end face is referred to as " width
On the outside of direction ", when from the 92a of end face, the direction where the center of the width direction of main surface 92b is referred to as " width side
Inwardly ".In addition, as shown in fig. 6, by point (tip) 92c is referred to as the point of main surface 92b and the boundary of end face 92a, will make
It is referred to as top 92d for the point at the center of the vertical direction of end face 92a.In the vertical direction, end face 92a is from the sharp 92c of a side,
The sharp 92c of another party is extended to via top 92d.
In glass substrate unit 80, glass substrate 92 is clamped using a pair of of abrasive grain holding member 93.Glass substrate 92
A pair of of main surface 92b is contacted with the main surface of abrasive grain holding member 93 respectively.Abrasive grain holding member 93 is relative to glass substrate 92
It is fixed.Abrasive grain holding member 93 is the molding plate of material by nonmagnetic material.Abrasive grain holding member 93 be by with glass substrate 92
The material that grinding is more difficult to the material of same degree or than glass substrate 92 is molding.
Abrasive grain holding member 93 has space forming face 94.Space forming face 94 is contacted with from main surface 92b
Point is towards width direction outside and gradually from the inclined surface that main surface 92b leaves.Between main surface 92b and space forming face 94
Angle is, for example, 45 °.It is formed between the space forming face 94 of abrasive grain holding member 93 and the main surface 92b of glass substrate 92
There is abrasive grain to keep space 95.Abrasive grain keeps space 95 to be directed towards recess portion recessed on the inside of width direction.Most about width direction
The abrasive grain in outside keeps the size of the vertical direction in space 95, can be according to the R shapes in the corner of glass substrate 92 being chamfered
Radius r determine.For example, it can be r/2 that the outermost abrasive grain of width direction, which keeps the size of the vertical direction in space 95,
In the range of~r.In addition, position, the i.e. space forming face 94 of the point contacted with glass substrate 92 about abrasive grain holding member 93
The position of the point contacted with main surface 92b, can also according to from sharp 92c play top 92d until x-axis direction distance t come
It determines.For example, can be at a distance from x-axis direction until playing the point that space forming face 94 is contacted with main surface 92b from sharp 92c
In the range of t/2~t.
End on the inside of the width direction of space forming face 94, that is, the point that space forming face 94 is contacted with main surface 92b
In the position than sharp 92c on the inside of width direction.End on the outside of the width direction of space forming face 94 is located at than sharp 92c by wide
Spend the position on the outside of direction.In addition, the end on the outside of the width direction of space forming face 94 will not be located at leans on width than top 92d
Position on the outside of direction.
The action of (2-3) grinding device
To in grinding process S8, grinding device 10 grinds the end for the glass substrate 92 for including in glass substrate unit 80
The process of face 92a illustrates.First, it in grinding process S7, is conveyed comprising the glass being chamfered using conveying mechanism 12
The glass substrate unit 80 of substrate 92.Grinding mechanism 14 is moved closer to along the transported glass substrate unit of conveying direction 80
Abrasive wheel 20.The position of a pair of of abrasive wheel 20 can be set in advance as the width with glass substrate unit 80 by grinding mechanism 14
The size in direction is consistent.In addition, grinding mechanism 14 can detect the glass for including in glass substrate unit 80 using sensor etc.
The case where the case where end face 92a of glass substrate 92 fully approaches abrasive wheel 20 or end face 92a are contacted with abrasive wheel 20 makes to rotate
The abrasive wheel 20 rotated centered on the central shaft 21a of axis 21 is moved to end face 92a.
As shown in figure 5, glass substrate unit 80 is inserted into from pulp surface 24a in slurry 24.It is inserted in glass substrate unit 80
In the state of entering into slurry 24, using conveying mechanism 12, along conveying direction conveying glass substrate unit 80.As a result, in glass
In the state that the end face 92a for the glass substrate 92 for including in glass base board unit 80 is contacted with slurry 24, abrasive wheel 20 and end face
92a is relatively moved along conveying direction.The end face 92a of glass substrate 92 collides the slurry 24 rotated together with abrasive wheel 20
In include magnetic substance abrasive grain, be thus ground.
In addition it is also possible to which glass substrate unit 80 is not made to be moved along conveying direction, and abrasive wheel 20 is made to be moved along conveying direction
It is dynamic, so that abrasive wheel 20 and end face 92a is relatively moved along conveying direction.In addition it is also possible to make glass substrate unit 80 and abrasive wheel
20 this both sides move along conveying direction, and abrasive wheel 20 and end face 92a is made to be relatively moved along conveying direction.
(3) feature
The manufacturing method of the glass substrate of present embodiment, including following grinding process S8：Make using drawing method under overflow
The end face 92a of the glass substrate 92 produced is contacted with magnetic substance abrasive grain and is ground.Include the slurry of magnetic substance abrasive grain
24 are maintained at magnetic flux collection by the magnetic field that the 1st magnet field forming portion part 22 of abrasive wheel 20 and the 2nd magnet field forming portion part 23 are formed
In middle space 27.When glass substrate unit 80 is inserted into slurry 24 using grinding device 10, include in slurry 24
Magnetic substance abrasive grain be maintained in flux concentrating space 27 and around rotary shaft 21 rotate.Include in glass substrate unit 80
The end face 92a of glass substrate 92 is ground by with the contact of the magnetic substance abrasive grain of rotation.
Fig. 7 is the enlarged drawing near flux concentrating space 27 shown in fig. 5.In the figure 7, it is schematically shown and is ground with circle
The magnetic substance abrasive grain 96 for including in defibrination 24.In fact, magnetic substance abrasive grain 96 is the particle smaller than circle shown in Fig. 7.
There is the substrate 92 for the end face 92a being ground by grinding device 10 using the clamping of a pair of of abrasive grain holding member 93.?
It is formed with abrasive grain between glass substrate 92 and abrasive grain holding member 93 and keeps space 95.It is maintained in flux concentrating space 27 simultaneously
The magnetic substance abrasive grain 96 of rotation applies grinding pressure to the end face 92a for being inserted into the glass substrate 92 in flux concentrating space 27.
In the figure 7, the direction of the grinding pressure of the generation of magnetic substance abrasive grain 96 is shown with arrow.Specifically, towards because of flux concentrating sky
Between 27 magnetic field and the magnetic substance abrasive grain 96 that makes mobility be restricted, be pressed into the glass substrate 92 as grinding charge, as a result,
The grinding pressure of the radial outside of the opposite direction of the radially inner side in the direction being pressed into as glass substrate 92 acts on end face
92a.End face 92a is bent into R shapes along vertical direction, and therefore, on the 92a of end face, grinding pressure is easy to act on and grind
The vertical region in the direction of pressure, and grinding pressure is difficult to act on the region substantial parallel with the direction of grinding pressure.
Abrasive grain keeps space 95 to be directed towards the recessed recess portion of radial outside.Therefore, even if being difficult to work in grinding pressure
Region in, abrasive grain keep space 95 magnetic substance abrasive grain 96 also can locally be trapped in abrasive grain keep space 95 in.By
This, abrasive grain keeps the magnetic substance abrasive grain 96 in space 95 that can intensively be contacted with the end face 92a near sharp 92c.That is, due to magnetism
Body abrasive grain 96 is trapped in abrasive grain and keeps in space 95 so that magnetic substance abrasive grain 96 can be fully ground the end face near sharp 92c
92a。
In addition, the direction for the grinding pressure that the end face 92a near the 92d of top is generated with magnetic substance abrasive grain 96 is substantially hung down
Directly.Therefore, magnetic substance abrasive grain 96 can be contacted intensively with the end face 92a near the 92d of top.
Therefore, in the whole region until playing top 92d from sharp 92c, the end face 92a of glass substrate 92 can be with magnetic
Property body abrasive grain 96 intensively contacts.Therefore, grinding device 10 can equably grind the entire end face 92a of glass substrate 92, because
This, can improve the grinding efficiency of glass substrate 92.
Herein, as comparative example, existing grinding device is illustrated, in existing grinding device, is not utilized
Glass substrate 92 is clamped in a pair of of abrasive grain holding member 93, carries out that the milled processed that abrasive grain keeps space 95 is not present.Fig. 8 is to show
It is the figure for showing to remove the grinding device of abrasive grain holding member 93 from Fig. 7 as the figure of comparative example.In fig. 8, for side
Just, using reference marks same as figure 7.In fig. 8, in the same manner as Fig. 7, grinding for the generation of magnetic substance abrasive grain 96 is shown with arrow
Grind the direction of pressure.As shown in figure 8, in the grinding device, even if magnetic substance abrasive grain 96 connects with the end face 92a near point 92c
It touches, the grinding pressure that magnetic substance abrasive grain acts on end face 92a is relatively low, cannot intensively be connect with the end face 92a near sharp 92c
It touches.Therefore, in the grinding device, in order to be fully ground the end face 92a near sharp 92c, the long period is needed.In addition, this grinds
Mill apparatus cannot equably grind the entire end face 92a of glass substrate 92.
More than, the manufacturing method of the glass substrate of present embodiment, to the glass being clamped by a pair of of abrasive grain holding member 93
The end face 92a of substrate 92 is ground, and thereby, it is possible to equably grind the entire end face 92a of glass substrate 92, can improve glass
The grinding efficiency of glass substrate 92.
(4) variation
More than, the manufacturing method of the glass substrate of present embodiment is illustrated, but the present invention is not limited to above-mentioned realities
Mode is applied, without departing from the scope of the subject in the invention, various improvement and change can be carried out.
(4-1) variation 1A
In the present embodiment, glass substrate unit 80 has 1 glass substrate 92.But, glass substrate unit 80
There can be multiple glass substrates 92.Fig. 9 is a part for the sectional view of the glass substrate unit 180 of this variation.Such as Fig. 9 institutes
Show, in glass substrate unit 180, glass substrate 92 and abrasive grain holding member 193 are alternately laminated.Utilize 2 glass bases
A part for abrasive grain holding member 193 is clamped in plate 92.The abrasive grain holding member 193 being clamped by 2 glass substrates 92 has：?
The space forming face 194 that abrasive grain keeps space 195 is formed between the main surface 92b of a glass substrate 92；And with it is another
The space forming face 194 that abrasive grain keeps space 195 is formed between the main surface 92b of a glass substrate 92.
In this variation, in the same manner as embodiment, glass substrate unit 180 is inserted into slurry 24, this grinds
Defibrination 24 is maintained in the flux concentrating space 27 of abrasive wheel 20.The magnetic substance abrasive grain for including in slurry 24 is maintained at magnetic
In logical centralized space 27 and rotate.The end face 92a for multiple glass substrates 92 for including in glass substrate unit 180 and rotation
Magnetic substance abrasive grain is contacted and is ground.
In addition, the glass substrate unit 180 for being alternately laminated glass substrate 92 and abrasive grain holding member 193 is inserted into
In slurry 24, the end face 92a of glass substrate 92 is processed, therefore, work in-process glass substrate 92 is not pliable.Cause
This, the manufacturing method of the glass substrate of this variation is suitable for having the thickness, such as 0.05mm~0.2mm for being less than 0.3mm
The processing of the end face 92a of the relatively thin glass substrate 92 of thickness.
Therefore, the manufacturing method of glass substrate according to this modification can once grind the end face of multiple glass substrates 92
92a, thus, it is possible to improve the grinding efficiency of glass substrate 92.
(4-2) variation 1B
In the present embodiment, the abrasive grain holding member 93 for including in glass substrate unit 80 has space forming face 94.
Space forming face 94 is gradually left from main surface 92b with from the point contacted with main surface 92b towards width direction outside
Inclined surface.It is formed with abrasive grain between the space forming face 94 of abrasive grain holding member 93 and the main surface 92b of glass substrate 92
Keep space 95.
But, abrasive grain holding member 93 can also have other shapes of space forming face 94.Specifically, abrasive grain is kept
Component 93 can have the arbitrary space shape that abrasive grain holding space 95 can be formed between the main surface 92b of glass substrate 92
At face 94.Figure 10 is a part for the sectional view of the glass substrate unit 280 of this variation.Glass substrate unit 280 is to utilize
Unit made of 1 glass substrate 92 is clamped in a pair of of abrasive grain holding member 293.
As shown in Figure 10, abrasive grain holding member 293 has space forming face 294.Space forming face 294 by with glass substrate
The 1st vertical 92 main surface 92b forming face 294a and the 2nd forming face 294b parallel with main surface 92b are constituted.In abrasive grain
It is formed with abrasive grain between the space forming face 294 of holding member 293 and the main surface 92b of glass substrate 92 and keeps space 295.Mill
Grain keeps space 295 to have effect identical with the abrasive grain of embodiment holding space 95.
(4-3) variation 1C
The grinding device 10 of present embodiment is the end face of the glass substrate 92 for carried out in grinding process S8
The device of the attrition process of 92a.But grinding device 10 can also be used as the glass for carried out in grinding process S7
The device of the chamfer machining of glass substrate 92 uses.
(4-4) variation 1D
The grinding device 10 of present embodiment grinds the end face 92a of glass substrate 92.But grinding device 10 can also be ground
Grind the end face of other plate-like articles such as metallic plate and ceramic wafer.
The 2nd embodiment > of <
With reference to attached drawing, the manufacturing method of the glass substrate of the 2nd embodiment as the present invention is illustrated.1st is real
Apply the structure that the difference is that only glass substrate unit 80 of mode and present embodiment.Therefore, it omits and implements about with the 1st
The explanation of the identical structure of mode.The grinding device 10 of the grinding device 10 and the 1st embodiment that use in the present embodiment
It is identical.
(1) structure of glass substrate unit
Figure 11 is a part for the sectional view of the glass substrate unit 380 of present embodiment.Glass substrate unit 380 is by 1
It opens glass substrate 92 and a pair of of abrasive grain holding member 393 is constituted.Abrasive grain holding member 393 is by 1 the 1st holding member 393a and 1
The 2nd holding member 393b is opened to constitute.1st holding member 393a and the 2nd holding member 393b is molded by the material of nonmagnetic material
Plate.
A pair of of main surface 92b of glass substrate 92 is contacted with the main surface of the 1st holding member 393a respectively.1st maintaining part
A pair of of main surface of part 393a is contacted with the main surface of the main surface 92b of glass substrate 92 and the 2nd holding member 393b respectively.
That is, as shown in figure 11, glass substrate unit 380 is following unit：Glass substrate 92 is by the 1st holding member 393a folders of a pair
It holds, and by the 2nd holding member 393b clampings of a pair.In addition, the 1st holding member 393a and the 2nd holding member 393b are relative to glass
Glass substrate 92 is fixed.
1st holding member 393a has the 1st forming face 394a.1st forming face 394a corresponds to the 1st holding member 393a
End face.2nd holding member 393b has the 2nd forming face 394b.2nd forming face 394b is corresponding to the 2nd holding member 393b's
A part for main surface.1st forming face 394a is vertical with the 2nd forming face 394b.There is glass substrate unit 380 abrasive grain to keep empty
Between 395.It is the main surface 92b, the 1st forming face 394a and the 2nd forming face 394b shapes by glass substrate 92 that abrasive grain, which keeps space 395,
At space.Abrasive grain keeps space 395 to be directed towards the recessed recess portion of radial outside.
The point that 1st forming face 394a is contacted with main surface 92b is located at the position on the inside of width direction than sharp 92c.2nd shape
It is located at the position than sharp 92c on the outside of width direction at the end on the outside of the width direction of face 394b.In addition, the 2nd forming face
End on the outside of the width direction of 394b will not be located at the position than top 92d on the outside of width direction.
(2) feature
Figure 12 is the enlarged drawing near flux concentrating space identical with the 1st relevant Fig. 7 of embodiment 27.Scheming
In 12, the magnetic substance abrasive grain 96 for including in slurry 24 is schematically shown with circle.In fact, magnetic substance abrasive grain 96 is to compare Figure 12
Shown in the small particle of circle.
There is the glass substrate for the end face 92a being ground by grinding device 10 using the clamping of a pair of of abrasive grain holding member 393
92.It is formed with abrasive grain between glass substrate 92 and abrasive grain holding member 393 and keeps space 395.It is maintained at flux concentrating sky
Between in 27 and the magnetic substance abrasive grain 96 that rotates applies to the end face 92a for the glass substrate 92 being inserted into flux concentrating space 27
Grinding pressure.In fig. 12, the direction of the grinding pressure of the generation of magnetic substance abrasive grain 96 is shown with arrow.If specifically describing,
Towards the magnetic substance abrasive grain 96 that mobility is restricted is made because of the magnetic field in flux concentrating space 27, it is pressed into as grinding charge
Glass substrate 92, the radial outside of the opposite direction of the radially inner side in the direction being pressed into as a result, as glass substrate 92 are ground
Mill pressure acts on end face 92a.End face 92a is bent into R shapes along vertical direction, therefore, on the 92a of end face, grinding pressure
It is easy to act on the region vertical with the direction of grinding pressure, and grinding pressure is difficult to act on and the direction of grinding pressure essence
Upper parallel region.
Abrasive grain keeps space 395 to be directed towards the recessed recess portion of radial outside.Therefore, even if being difficult to operation in grinding pressure
In region, abrasive grain keeps the magnetic substance abrasive grain 96 in space 395 also can locally be trapped in abrasive grain holding space 395.By
This, abrasive grain keeps the magnetic substance abrasive grain 96 in space 395 that can intensively be contacted with the end face 92a near sharp 92c.That is, because of magnetism
Body abrasive grain 96 is trapped in abrasive grain and keeps in space 395 so that magnetic substance abrasive grain 96 can be fully ground the end face near sharp 92c
92a。
In addition, the direction for the grinding pressure that the end face 92a near the 92d of top is generated with magnetic substance abrasive grain 96 is substantially hung down
Directly.Therefore, magnetic substance abrasive grain 96 most can be contacted intensively with the end face 92a near the 92d of top.
Therefore, in the whole region until playing top 92d from sharp 92c, the end face 92a of glass substrate 92 can be from magnetic
Property body abrasive grain 96 is contacted by higher grinding pressure.Therefore, grinding device 10 can equably grind glass substrate
92 entire end face 92a, therefore, it is possible to improve the grinding efficiency of glass substrate 92.
(3) variation
More than, the manufacturing method of the glass substrate of present embodiment is illustrated, but the present invention, is not limited to above-mentioned reality
Mode is applied, without departing from the scope of the subject in the invention, it is possible to implement various improvement and change.
(3-1) variation 2A
In the present embodiment, glass substrate unit 380 has 1 glass substrate 92.But glass substrate unit 380
There can also be multiple glass substrates 92.Figure 13 is a part for the sectional view of the glass substrate unit 480 of this variation.Such as figure
Shown in 13, in glass substrate unit 480, glass substrate 92 and abrasive grain holding member 493 are alternately laminated.In fig. 13,
The abrasive grain holding member 493 being clamped by a pair of of glass substrate 92 is by the 1st holding member 493a of a pair and by a pair of 1st maintaining part
What the glass substrate 92 of the 2nd holding member 493b of part 493a clampings was constituted.That is, glass substrate unit 480 is by glass substrate
Unit made of 92 and the 1st holding member 493a is alternately laminated.
In fig. 13, the master as the glass substrate 92 for the 2nd holding member 493b for including in abrasive grain holding member 493
Surface 92b has effect identical with the 2nd forming face 394b of the 2nd holding member 393b of embodiment.Abrasive grain holding member
The 1st holding member 493a for including in 493 has the 1st forming face 494a.Glass substrate unit 480 has by being laminated as a result,
The 1st forming face of the main surface 92b of 2 adjacent glass substrates 92 and the 1st holding member 493a being sandwiched between on direction
The abrasive grain that 494a is formed keeps space 495.
In this variation, in the same manner as embodiment, glass substrate unit 480 is inserted into slurry 24, this grinds
Defibrination 24 is maintained in the flux concentrating space 27 of abrasive wheel 20.The magnetic substance abrasive grain for including in slurry 24 is maintained at magnetic
In logical centralized space 27 and rotate.The end face 92a for multiple glass substrates 92 for including in glass substrate unit 480 and rotation
Magnetic substance abrasive grain is contacted and is ground.
In addition, the glass substrate unit 480 for being alternately laminated glass substrate 92 and abrasive grain holding member 493 is inserted into
In slurry 24, the end face 92a of glass substrate 92 is processed, therefore, work in-process glass substrate 92 is not pliable.Cause
This, the manufacturing method of the glass substrate of this variation is suitable for having the thickness, such as 0.05mm~0.2mm for being less than 0.3mm
The processing of the end face 92a of the relatively thin glass substrate 92 of thickness.
Therefore, the manufacturing method of the glass substrate of this variation can once grind the end face of multiple glass substrates 92
92a, therefore, it is possible to improve the grinding efficiency of glass substrate 92.
(3-2) variation 2B
In the present embodiment, the 2nd holding member 393b for including in abrasive grain holding member 393 is the material by nonmagnetic material
Expect molding plate.But the 2nd holding member 393b can also be glass substrate 92.
(3-3) variation 2C
The grinding device 10 of present embodiment is the end face of the glass substrate 92 for carried out in grinding process S8
The device of the attrition process of 92a.But grinding device 10 can also be used as the glass for carried out in grinding process S7
The device of the chamfer machining of glass substrate 92 uses.
(3-4) variation 2D
The grinding device 10 of present embodiment grinds the end face 92a of glass substrate 92.But grinding device 10 can also be ground
Grind the end face of other plate-like articles such as metallic plate and ceramic wafer.
Claims (7)
1. a kind of manufacturing method of glass substrate, the magnetic substance mill in making to be maintained at the magnetic field formed by magnet field forming portion part
Grain together with the magnet field forming portion part in the state that rotary shaft rotates, make the ends of 1 or multiple glass substrates with it is described
Magnetic substance abrasive grain contacts, and is processed to the end, wherein the manufacturing method of the glass substrate has following process：
Preparatory process makes abrasive grain holding member be contacted respectively with a pair of of main surface of the glass substrate, utilizes a pair of mill
The glass substrate is clamped in grain holding member；And
Manufacturing procedure makes the end by the glass substrate of a pair of abrasive grain holding member clamping and the magnetic substance
Abrasive grain contacts, and is processed to the end,
It is formed with abrasive grain between the end and the abrasive grain holding member processed by the manufacturing procedure and keeps space,
The abrasive grain keeps space to be directed towards the outside recessed recess portion radially of the axis of rotation,
The abrasive grain holding member has is formed together the space forming face that the abrasive grain keeps space with the main surface,
The end of the glass substrate has the position being located at than the space forming face by the inside radially of the axis of rotation
Set the part at place.
2. the manufacturing method of glass substrate according to claim 1, wherein
In the manufacturing procedure, the end of glass substrate described in multiple is processed,
The glass substrate and the abrasive grain holding member are alternately laminated.
3. the manufacturing method of glass substrate according to claim 1, wherein
The abrasive grain holding member has：
1st holding member is contacted with the main surface, and has the 1st forming face；
2nd holding member is contacted with the 1st holding member, and has the 2nd forming face,
It is the space formed by the main surface, the 1st forming face and the 2nd forming face that the abrasive grain, which keeps space,.
4. the manufacturing method of glass substrate according to claim 3, wherein
In the manufacturing procedure, the end of glass substrate described in multiple is processed,
The glass substrate and the abrasive grain holding member are alternately laminated,
Had by the abrasive grain holding member of a pair of glass substrate clamping：
A pair of 1st holding member；And
The 2nd holding member being clamped by a pair of 1st holding member,
The 2nd holding member by a pair of 1st holding member clamping is with the institute processed by the manufacturing procedure
State the glass substrate of end.
5. the manufacturing method of the glass substrate according to any one in Claims 1 to 4, wherein
The glass substrate has the end for diagonally having carried out chamfering.
6. a kind of manufacturing method of plate-like articles, with following process：
Magnetic substance abrasive grain in making to be maintained at the magnetic field formed by magnet field forming portion part is together with the magnet field forming portion part
In the state that rotary shaft rotates, the end of 1 or multiple plate-like articles is set to be contacted with the magnetic substance abrasive grain, to the end
It is processed, wherein the manufacturing method of the plate-like articles has following process：
Preparatory process makes abrasive grain holding member be contacted respectively with a pair of of main surface of the plate-like articles, utilizes a pair of mill
The plate-like articles are clamped in grain holding member；And
Manufacturing procedure makes the end by the plate-like articles of a pair of abrasive grain holding member clamping and the magnetic substance
Abrasive grain contacts, and is processed to the end,
Between the end and the abrasive grain holding member processed by the manufacturing procedure, it is formed with abrasive grain and keeps empty
Between, which keeps space to be directed towards the outside recessed recess portion radially of the axis of rotation,
The abrasive grain holding member has is formed together the space forming face that the abrasive grain keeps space with the main surface,
The end of the plate-like articles has the position being located at than the space forming face by the inside radially of the axis of rotation
Set the part at place.
7. a kind of manufacturing device of glass substrate, has：
Rotary shaft；
Magnet field forming portion part, and the rotation axis connection, and rotated around the rotary shaft；
Magnetic substance abrasive grain, the magnetic field formed by the magnet field forming portion part are kept,
The magnetic substance abrasive grain is ground in the state of being rotated around the rotary shaft together with the magnet field forming portion part with by a pair
The end contact of the glass substrate of grain holding member clamping, is processed the end,
Keeping empty by between the end of the magnetic substance abrasive machining and the abrasive grain holding member, being formed with abrasive grain
Between, which keeps space to be directed towards the outside recessed recess portion radially of the axis of rotation,
There is the abrasive grain holding member main surface with the glass substrate to be formed together the space that the abrasive grain keeps space
Forming face,
The end of the glass substrate has the position being located at than the space forming face by the inside radially of the axis of rotation
Set the part at place.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014-199371 | 2014-09-29 | ||
| JP2014199371A JP6342768B2 (en) | 2014-09-29 | 2014-09-29 | Glass substrate manufacturing method, plate-shaped article manufacturing method, and glass substrate manufacturing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106031992A CN106031992A (en) | 2016-10-19 |
| CN106031992B true CN106031992B (en) | 2018-11-06 |
Family
ID=55866078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510124559.XA Active CN106031992B (en) | 2014-09-29 | 2015-03-20 | The manufacturing method of the manufacturing method of glass substrate, the manufacturing device of glass substrate and plate-like articles |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6342768B2 (en) |
| CN (1) | CN106031992B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6392634B2 (en) * | 2014-11-05 | 2018-09-19 | Hoya株式会社 | Nonmagnetic substrate manufacturing method and polishing apparatus |
| CN114102378A (en) * | 2021-11-08 | 2022-03-01 | 常熟市金诺精工模具有限公司 | High temperature resistant glass dish circulation apparatus for producing |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05237764A (en) * | 1992-02-26 | 1993-09-17 | Mitsubishi Materials Corp | Shaping method for inner periphery edge grinding wheel base metal |
| JP2001113447A (en) * | 1999-10-18 | 2001-04-24 | Ishii Hyoki Corp | Edge grinding device for semiconductor wafer |
| CN101249623A (en) * | 2007-02-20 | 2008-08-27 | 昭和电工株式会社 | Grinding method and grinding device of circular disk shape substrate |
| WO2014051127A1 (en) * | 2012-09-28 | 2014-04-03 | Hoya株式会社 | Method for manufacturing glass substrate for magnetic disk |
| CN103769956A (en) * | 2012-10-25 | 2014-05-07 | 安瀚视特控股株式会社 | Method for manufacturing glass substrate and magnetic fluid for polishing glass substrate |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014083647A (en) * | 2012-10-25 | 2014-05-12 | Avanstrate Inc | Magnetic fluid for glass substrate polishing |
-
2014
- 2014-09-29 JP JP2014199371A patent/JP6342768B2/en active Active
-
2015
- 2015-03-20 CN CN201510124559.XA patent/CN106031992B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05237764A (en) * | 1992-02-26 | 1993-09-17 | Mitsubishi Materials Corp | Shaping method for inner periphery edge grinding wheel base metal |
| JP2001113447A (en) * | 1999-10-18 | 2001-04-24 | Ishii Hyoki Corp | Edge grinding device for semiconductor wafer |
| CN101249623A (en) * | 2007-02-20 | 2008-08-27 | 昭和电工株式会社 | Grinding method and grinding device of circular disk shape substrate |
| WO2014051127A1 (en) * | 2012-09-28 | 2014-04-03 | Hoya株式会社 | Method for manufacturing glass substrate for magnetic disk |
| CN103769956A (en) * | 2012-10-25 | 2014-05-07 | 安瀚视特控股株式会社 | Method for manufacturing glass substrate and magnetic fluid for polishing glass substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6342768B2 (en) | 2018-06-13 |
| JP2016069214A (en) | 2016-05-09 |
| CN106031992A (en) | 2016-10-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102958644B (en) | Prepare the method for edge strengthening goods | |
| CN106031992B (en) | The manufacturing method of the manufacturing method of glass substrate, the manufacturing device of glass substrate and plate-like articles | |
| JP6836694B2 (en) | Glass substrate manufacturing method and magnetic disk manufacturing method | |
| CN106737129A (en) | The flat grinding device of adjustable rotating ratio | |
| JP2008105169A (en) | Paste material | |
| JP2016052704A (en) | Magnetic polishing method with use of magnet tool and magnetic polishing device | |
| JP2018507158A (en) | Method for reinforcing edges of laminated glass articles and laminated glass articles formed thereby | |
| JP5925539B2 (en) | Manufacturing method of glass plate | |
| JP5775049B2 (en) | Manufacturing method of glass substrate | |
| KR101925646B1 (en) | Method for manufacturing glass substrate and magnetic fluid for polishing glass substrate | |
| CN105312968B (en) | The manufacturing method of glass plate and the grinding device of glass plate | |
| JP6148345B2 (en) | Manufacturing method of non-magnetic substrate | |
| JP6299472B2 (en) | Alkali-free glass for magnetic recording media and glass substrate for magnetic recording media using the same | |
| JP5902914B2 (en) | Manufacturing method of glass substrate for magnetic disk | |
| JP6015876B1 (en) | Glass substrate for magnetic recording medium and method for manufacturing magnetic recording medium | |
| JP2014195850A (en) | Method for manufacturing plate-like article | |
| JP2014083647A (en) | Magnetic fluid for glass substrate polishing | |
| JP5569998B2 (en) | Paste material | |
| CN106030710B (en) | The manufacturing method of substrate for magnetic disc | |
| CN105431904B (en) | Glass substrate for disc, the manufacturing method of glass substrate for disc and disk | |
| JP2015010002A (en) | Manufacturing method of glass sheet and manufacturing apparatus of glass sheet | |
| JP2016091578A (en) | Manufacturing method for magnetic disk substrate | |
| Yin et al. | Research on Distribution of Magnetic Particles Based on Magnetic Field Control Grinding Wheel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |