CN106019425B - 光学部件的制备方法、光学部件和光学器件 - Google Patents

光学部件的制备方法、光学部件和光学器件 Download PDF

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Publication number
CN106019425B
CN106019425B CN201610195665.1A CN201610195665A CN106019425B CN 106019425 B CN106019425 B CN 106019425B CN 201610195665 A CN201610195665 A CN 201610195665A CN 106019425 B CN106019425 B CN 106019425B
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China
Prior art keywords
layer
substrate
film
optical component
liquid
Prior art date
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Expired - Fee Related
Application number
CN201610195665.1A
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English (en)
Chinese (zh)
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CN106019425A (zh
Inventor
水野祐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN106019425A publication Critical patent/CN106019425A/zh
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Publication of CN106019425B publication Critical patent/CN106019425B/zh
Expired - Fee Related legal-status Critical Current
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/40Optical elements or arrangements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/804Containers or encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/806Optical elements or arrangements associated with the image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/50Encapsulations or containers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Optical Filters (AREA)
CN201610195665.1A 2015-03-31 2016-03-31 光学部件的制备方法、光学部件和光学器件 Expired - Fee Related CN106019425B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-074498 2015-03-31
JP2015074498A JP2016195185A (ja) 2015-03-31 2015-03-31 光学部品の製造方法、光学部品、光学装置

Publications (2)

Publication Number Publication Date
CN106019425A CN106019425A (zh) 2016-10-12
CN106019425B true CN106019425B (zh) 2019-01-08

Family

ID=57017090

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610195665.1A Expired - Fee Related CN106019425B (zh) 2015-03-31 2016-03-31 光学部件的制备方法、光学部件和光学器件

Country Status (3)

Country Link
US (1) US10074756B2 (https=)
JP (1) JP2016195185A (https=)
CN (1) CN106019425B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020030247A (ja) * 2018-08-20 2020-02-27 株式会社タムロン 防汚層付光学素子
US11113494B2 (en) * 2019-11-11 2021-09-07 Apple Inc. Biometric key including a textured ceramic cover
CN119960558A (zh) * 2019-11-11 2025-05-09 苹果公司 计算设备
KR102801003B1 (ko) 2021-01-07 2025-04-29 현대모비스 주식회사 적층체 및 이의 제조방법
JP7838981B2 (ja) * 2022-03-09 2026-04-01 日本放送協会 治具、積層型固体撮像素子の製造方法、および接合型固体撮像素子の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6531341B1 (en) * 2000-05-16 2003-03-11 Sandia Corporation Method of fabricating a microelectronic device package with an integral window
US7033855B2 (en) * 2001-09-25 2006-04-25 Fuji Photo Film Co., Ltd. Optical component and method of manufacturing the same
JP2006177740A (ja) * 2004-12-22 2006-07-06 Nikon Corp 多層膜反射鏡及びeuv露光装置
JP2008034502A (ja) * 2006-07-27 2008-02-14 Epson Toyocom Corp 固体撮像素子カバー及び固体撮像装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7042662B2 (en) * 2002-12-26 2006-05-09 Canon Kabushiki Kaisha Light amount adjusting device, and optical device using the light amount adjusting device
CN100378475C (zh) 2003-06-26 2008-04-02 株式会社尼康 制造多层光学元件的方法
JP2005098930A (ja) 2003-09-26 2005-04-14 Nikon Corp 多層膜反射鏡、その再生方法及び露光装置
JP2007101349A (ja) 2005-10-04 2007-04-19 Nikon Corp 多層膜反射鏡、その再生方法および露光装置
JP2007127698A (ja) 2005-11-01 2007-05-24 Nikon Corp 多層膜反射鏡、その再生方法および露光装置
JP2007187987A (ja) 2006-01-16 2007-07-26 Nikon Corp 多層膜反射鏡、及びeuv露光装置
KR102221907B1 (ko) * 2013-07-11 2021-03-04 삼성디스플레이 주식회사 광학필름 어셈블리, 이를 갖는 표시장치 및 그 제조방법
US9581733B2 (en) * 2013-08-23 2017-02-28 Ricoh Imaging Company, Ltd. Anti-reflection coating and optical member comprising same
CN111432106B (zh) * 2013-12-27 2022-05-13 株式会社尼康 摄像单元以及摄像装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6531341B1 (en) * 2000-05-16 2003-03-11 Sandia Corporation Method of fabricating a microelectronic device package with an integral window
US7033855B2 (en) * 2001-09-25 2006-04-25 Fuji Photo Film Co., Ltd. Optical component and method of manufacturing the same
JP2006177740A (ja) * 2004-12-22 2006-07-06 Nikon Corp 多層膜反射鏡及びeuv露光装置
JP2008034502A (ja) * 2006-07-27 2008-02-14 Epson Toyocom Corp 固体撮像素子カバー及び固体撮像装置

Also Published As

Publication number Publication date
US10074756B2 (en) 2018-09-11
JP2016195185A (ja) 2016-11-17
CN106019425A (zh) 2016-10-12
US20160293780A1 (en) 2016-10-06

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