CN105862089A - 一种防止阳极结垢的生产电解铜箔用电解液及其制备方法 - Google Patents
一种防止阳极结垢的生产电解铜箔用电解液及其制备方法 Download PDFInfo
- Publication number
- CN105862089A CN105862089A CN201610437095.2A CN201610437095A CN105862089A CN 105862089 A CN105862089 A CN 105862089A CN 201610437095 A CN201610437095 A CN 201610437095A CN 105862089 A CN105862089 A CN 105862089A
- Authority
- CN
- China
- Prior art keywords
- copper
- carboxylic acid
- electrolyte
- copper foil
- acid solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 113
- 239000011889 copper foil Substances 0.000 title claims abstract description 67
- 238000000034 method Methods 0.000 title abstract description 19
- 239000008151 electrolyte solution Substances 0.000 title abstract 7
- 239000000243 solution Substances 0.000 claims abstract description 84
- 238000004519 manufacturing process Methods 0.000 claims abstract description 50
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910052802 copper Inorganic materials 0.000 claims abstract description 29
- 239000010949 copper Substances 0.000 claims abstract description 29
- 150000002500 ions Chemical class 0.000 claims abstract description 27
- 229910000365 copper sulfate Inorganic materials 0.000 claims abstract description 21
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims abstract description 21
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims abstract description 10
- 238000001914 filtration Methods 0.000 claims abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 150000001735 carboxylic acids Chemical class 0.000 claims description 101
- 239000003792 electrolyte Substances 0.000 claims description 82
- 238000002360 preparation method Methods 0.000 claims description 36
- 229910021645 metal ion Inorganic materials 0.000 claims description 35
- 238000000746 purification Methods 0.000 claims description 30
- 239000011259 mixed solution Substances 0.000 claims description 20
- 238000003756 stirring Methods 0.000 claims description 19
- 239000001117 sulphuric acid Substances 0.000 claims description 19
- 235000011149 sulphuric acid Nutrition 0.000 claims description 19
- OBDVFOBWBHMJDG-UHFFFAOYSA-N 3-mercapto-1-propanesulfonic acid Chemical compound OS(=O)(=O)CCCS OBDVFOBWBHMJDG-UHFFFAOYSA-N 0.000 claims description 18
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 claims description 18
- 239000004354 Hydroxyethyl cellulose Substances 0.000 claims description 18
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 claims description 18
- 108010010803 Gelatin Proteins 0.000 claims description 17
- 229920000159 gelatin Polymers 0.000 claims description 17
- 239000008273 gelatin Substances 0.000 claims description 17
- 235000019322 gelatine Nutrition 0.000 claims description 17
- 235000011852 gelatine desserts Nutrition 0.000 claims description 17
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 15
- 229910001431 copper ion Inorganic materials 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 12
- -1 carboxylate radical Chemical class 0.000 claims description 11
- 239000012535 impurity Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 7
- 239000008367 deionised water Substances 0.000 claims description 4
- 229910021641 deionized water Inorganic materials 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 4
- UGWKCNDTYUOTQZ-UHFFFAOYSA-N copper;sulfuric acid Chemical compound [Cu].OS(O)(=O)=O UGWKCNDTYUOTQZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000005868 electrolysis reaction Methods 0.000 abstract description 38
- 238000002156 mixing Methods 0.000 abstract description 6
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 5
- 150000004706 metal oxides Chemical class 0.000 abstract description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 3
- 239000007788 liquid Substances 0.000 description 21
- 239000010410 layer Substances 0.000 description 18
- 239000010936 titanium Substances 0.000 description 18
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 12
- 230000000694 effects Effects 0.000 description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 230000005611 electricity Effects 0.000 description 6
- 230000002045 lasting effect Effects 0.000 description 6
- 210000000952 spleen Anatomy 0.000 description 6
- 210000002784 stomach Anatomy 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000005684 electric field Effects 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 230000002028 premature Effects 0.000 description 4
- 238000010025 steaming Methods 0.000 description 4
- 238000010668 complexation reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 238000003912 environmental pollution Methods 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- 230000001988 toxicity Effects 0.000 description 3
- 231100000419 toxicity Toxicity 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000011260 aqueous acid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 238000003487 electrochemical reaction Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 241000292525 Titanio Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000012629 purifying agent Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
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CN201610437095.2A CN105862089B (zh) | 2016-06-17 | 2016-06-17 | 一种防止阳极结垢的生产电解铜箔用电解液及其制备方法 |
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CN201610437095.2A CN105862089B (zh) | 2016-06-17 | 2016-06-17 | 一种防止阳极结垢的生产电解铜箔用电解液及其制备方法 |
Publications (2)
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CN105862089A true CN105862089A (zh) | 2016-08-17 |
CN105862089B CN105862089B (zh) | 2018-07-06 |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106430281A (zh) * | 2016-09-26 | 2017-02-22 | 珠海格力电器股份有限公司 | 溶铜方法及装置 |
CN106521564A (zh) * | 2016-10-27 | 2017-03-22 | 建滔(连州)铜箔有限公司 | 一种用于生产低轮廓电解铜箔的复合添加剂及其沉积工艺 |
CN106757182A (zh) * | 2017-01-19 | 2017-05-31 | 昆山元天电子有限公司 | 一种pcb表面金属铜的循环再生利用工艺 |
CN110396704A (zh) * | 2019-08-12 | 2019-11-01 | 湖北中一科技股份有限公司 | 一种超薄电解铜箔及制备方法 |
CN110438531A (zh) * | 2019-08-12 | 2019-11-12 | 湖北中一科技股份有限公司 | 一种应用于锂电池的超薄铜箔制备方法及系统 |
CN114059105A (zh) * | 2021-11-08 | 2022-02-18 | 灵宝华鑫铜箔有限责任公司 | 一种铜镍钴合金箔工艺 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4877497A (en) * | 1986-05-26 | 1989-10-31 | Nkk Corporation | Acidic electro-galvanizing solution |
CN1380915A (zh) * | 2000-05-18 | 2002-11-20 | 三井金属鉱业株式会社 | 制备电解铜箔的电解装置和该装置制得的电解铜箔 |
CN102146574A (zh) * | 2011-03-18 | 2011-08-10 | 湖北中一科技有限公司 | 一种电解铜箔生产中超声波溶铜的生产工艺 |
CN102418117A (zh) * | 2011-11-29 | 2012-04-18 | 宁波蓝鼎电子科技有限公司 | 一种阴极铜火法炼铜电解精炼的方法 |
CN103276416A (zh) * | 2013-06-27 | 2013-09-04 | 灵宝华鑫铜箔有限责任公司 | 一种电解铜箔用添加剂及电解铜箔的生产工艺 |
-
2016
- 2016-06-17 CN CN201610437095.2A patent/CN105862089B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4877497A (en) * | 1986-05-26 | 1989-10-31 | Nkk Corporation | Acidic electro-galvanizing solution |
CN1380915A (zh) * | 2000-05-18 | 2002-11-20 | 三井金属鉱业株式会社 | 制备电解铜箔的电解装置和该装置制得的电解铜箔 |
CN102146574A (zh) * | 2011-03-18 | 2011-08-10 | 湖北中一科技有限公司 | 一种电解铜箔生产中超声波溶铜的生产工艺 |
CN102418117A (zh) * | 2011-11-29 | 2012-04-18 | 宁波蓝鼎电子科技有限公司 | 一种阴极铜火法炼铜电解精炼的方法 |
CN103276416A (zh) * | 2013-06-27 | 2013-09-04 | 灵宝华鑫铜箔有限责任公司 | 一种电解铜箔用添加剂及电解铜箔的生产工艺 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106430281A (zh) * | 2016-09-26 | 2017-02-22 | 珠海格力电器股份有限公司 | 溶铜方法及装置 |
CN106430281B (zh) * | 2016-09-26 | 2019-02-26 | 珠海格力电器股份有限公司 | 溶铜方法及装置 |
CN106521564A (zh) * | 2016-10-27 | 2017-03-22 | 建滔(连州)铜箔有限公司 | 一种用于生产低轮廓电解铜箔的复合添加剂及其沉积工艺 |
CN106757182A (zh) * | 2017-01-19 | 2017-05-31 | 昆山元天电子有限公司 | 一种pcb表面金属铜的循环再生利用工艺 |
CN110396704A (zh) * | 2019-08-12 | 2019-11-01 | 湖北中一科技股份有限公司 | 一种超薄电解铜箔及制备方法 |
CN110438531A (zh) * | 2019-08-12 | 2019-11-12 | 湖北中一科技股份有限公司 | 一种应用于锂电池的超薄铜箔制备方法及系统 |
CN110438531B (zh) * | 2019-08-12 | 2021-12-24 | 湖北中一科技股份有限公司 | 一种应用于锂电池的超薄铜箔制备方法及系统 |
CN114059105A (zh) * | 2021-11-08 | 2022-02-18 | 灵宝华鑫铜箔有限责任公司 | 一种铜镍钴合金箔工艺 |
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Publication number | Publication date |
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CN105862089B (zh) | 2018-07-06 |
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Denomination of invention: Electrolyte for electrolytic copper foil production and its preparation method for preventing anode scaling Effective date of registration: 20201222 Granted publication date: 20180706 Pledgee: Bank of Communications Limited Jiujiang Branch Pledgor: JIUJIANG DEFU TECHNOLOGY Co.,Ltd. Registration number: Y2020980009779 |
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Denomination of invention: An electrolyte for preventing anode scaling in the production of electrolytic copper foil and its preparation method Effective date of registration: 20231226 Granted publication date: 20180706 Pledgee: Jiujiang Bank Co.,Ltd. Pledgor: JIUJIANG DEFU TECHNOLOGY Co.,Ltd. Registration number: Y2023980074569 |
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