CN105862011B - 一种化学气相沉积设备专用挡板装置 - Google Patents
一种化学气相沉积设备专用挡板装置 Download PDFInfo
- Publication number
- CN105862011B CN105862011B CN201610416355.8A CN201610416355A CN105862011B CN 105862011 B CN105862011 B CN 105862011B CN 201610416355 A CN201610416355 A CN 201610416355A CN 105862011 B CN105862011 B CN 105862011B
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- Prior art keywords
- baffle
- connecting rod
- handle
- connect
- lever
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000126 substance Substances 0.000 title claims abstract description 19
- 230000008021 deposition Effects 0.000 claims abstract description 27
- 238000007789 sealing Methods 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims 1
- 238000000151 deposition Methods 0.000 abstract description 23
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 11
- 239000000758 substrate Substances 0.000 abstract description 10
- 238000004062 sedimentation Methods 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000010408 film Substances 0.000 description 12
- 238000002474 experimental method Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610416355.8A CN105862011B (zh) | 2016-06-14 | 2016-06-14 | 一种化学气相沉积设备专用挡板装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610416355.8A CN105862011B (zh) | 2016-06-14 | 2016-06-14 | 一种化学气相沉积设备专用挡板装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105862011A CN105862011A (zh) | 2016-08-17 |
CN105862011B true CN105862011B (zh) | 2018-08-24 |
Family
ID=56650305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610416355.8A Active CN105862011B (zh) | 2016-06-14 | 2016-06-14 | 一种化学气相沉积设备专用挡板装置 |
Country Status (1)
Country | Link |
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CN (1) | CN105862011B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110299420B (zh) * | 2019-07-09 | 2020-06-26 | 理想晶延半导体设备(上海)有限公司 | 晶硅太阳能电池的减反射膜沉积方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1465094A (zh) * | 2001-06-07 | 2003-12-31 | 埃姆科尔股份有限公司 | 具有可移动的百叶窗挡板的反应器 |
CN201648511U (zh) * | 2010-03-23 | 2010-11-24 | 东莞宏威数码机械有限公司 | 挡板冷却机构 |
CN201999987U (zh) * | 2011-01-25 | 2011-10-05 | 上海子创镀膜技术有限公司 | 一种冷却挡板装置 |
CN102560427A (zh) * | 2012-02-17 | 2012-07-11 | 南京航空航天大学 | 一种真空镀膜设备中的冷却挡板装置 |
CN203096165U (zh) * | 2012-12-22 | 2013-07-31 | 蚌埠玻璃工业设计研究院 | 制备太阳能电池的电热丝辅助化学气相沉积装置 |
CN103451630A (zh) * | 2012-05-29 | 2013-12-18 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 基片装载装置和pecvd设备 |
CN103469174A (zh) * | 2013-09-18 | 2013-12-25 | 河北科技大学 | 一种氰酸酯树脂薄膜的制备方法及其反应设备 |
CN103820772A (zh) * | 2014-02-12 | 2014-05-28 | 清华大学 | 去除pecvd装置的电荷的系统及其控制方法 |
CN204455284U (zh) * | 2015-01-30 | 2015-07-08 | 上海和辉光电有限公司 | 一种化学气相沉积系统 |
-
2016
- 2016-06-14 CN CN201610416355.8A patent/CN105862011B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1465094A (zh) * | 2001-06-07 | 2003-12-31 | 埃姆科尔股份有限公司 | 具有可移动的百叶窗挡板的反应器 |
CN201648511U (zh) * | 2010-03-23 | 2010-11-24 | 东莞宏威数码机械有限公司 | 挡板冷却机构 |
CN201999987U (zh) * | 2011-01-25 | 2011-10-05 | 上海子创镀膜技术有限公司 | 一种冷却挡板装置 |
CN102560427A (zh) * | 2012-02-17 | 2012-07-11 | 南京航空航天大学 | 一种真空镀膜设备中的冷却挡板装置 |
CN103451630A (zh) * | 2012-05-29 | 2013-12-18 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 基片装载装置和pecvd设备 |
CN203096165U (zh) * | 2012-12-22 | 2013-07-31 | 蚌埠玻璃工业设计研究院 | 制备太阳能电池的电热丝辅助化学气相沉积装置 |
CN103469174A (zh) * | 2013-09-18 | 2013-12-25 | 河北科技大学 | 一种氰酸酯树脂薄膜的制备方法及其反应设备 |
CN103820772A (zh) * | 2014-02-12 | 2014-05-28 | 清华大学 | 去除pecvd装置的电荷的系统及其控制方法 |
CN204455284U (zh) * | 2015-01-30 | 2015-07-08 | 上海和辉光电有限公司 | 一种化学气相沉积系统 |
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Publication number | Publication date |
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CN105862011A (zh) | 2016-08-17 |
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SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
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TR01 | Transfer of patent right |
Effective date of registration: 20220412 Address after: 433132 No. 37, West Yanhua 1st Road, Qianjiang Economic Development Zone, Qianjiang City, Hubei Province Patentee after: WUHAN XINGUI TECHNOLOGY QIANJIANG Co.,Ltd. Address before: 430074, No. 693 Xiong Chu street, Hongshan District, Hubei, Wuhan Patentee before: WUHAN INSTITUTE OF TECHNOLOGY |
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TR01 | Transfer of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A specialized baffle device for chemical vapor deposition equipment Granted publication date: 20180824 Pledgee: Bank of China Limited Qianjiang Branch Pledgor: WUHAN XINGUI TECHNOLOGY QIANJIANG Co.,Ltd. Registration number: Y2024980013384 |