CN105838260B - 一种新型纳米蓝宝石抛光液及其制备方法 - Google Patents
一种新型纳米蓝宝石抛光液及其制备方法 Download PDFInfo
- Publication number
- CN105838260B CN105838260B CN201610190211.5A CN201610190211A CN105838260B CN 105838260 B CN105838260 B CN 105838260B CN 201610190211 A CN201610190211 A CN 201610190211A CN 105838260 B CN105838260 B CN 105838260B
- Authority
- CN
- China
- Prior art keywords
- parts
- agent
- polishing liquid
- sapphire
- novel nano
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052594 sapphire Inorganic materials 0.000 title claims abstract description 62
- 239000010980 sapphire Substances 0.000 title claims abstract description 62
- 238000005498 polishing Methods 0.000 title claims abstract description 52
- 239000007788 liquid Substances 0.000 title claims abstract description 38
- 238000002360 preparation method Methods 0.000 title claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000004111 Potassium silicate Substances 0.000 claims abstract description 14
- 230000007935 neutral effect Effects 0.000 claims abstract description 14
- 229910052913 potassium silicate Inorganic materials 0.000 claims abstract description 14
- 235000019353 potassium silicate Nutrition 0.000 claims abstract description 14
- BHGADZKHWXCHKX-UHFFFAOYSA-N methane;potassium Chemical compound C.[K] BHGADZKHWXCHKX-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910001868 water Inorganic materials 0.000 claims abstract description 13
- 239000000080 wetting agent Substances 0.000 claims abstract description 13
- 239000002519 antifouling agent Substances 0.000 claims abstract description 11
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000002270 dispersing agent Substances 0.000 claims abstract description 10
- 239000004480 active ingredient Substances 0.000 claims abstract description 8
- 239000008139 complexing agent Substances 0.000 claims abstract description 7
- 239000012530 fluid Substances 0.000 claims abstract description 5
- 239000007864 aqueous solution Substances 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims abstract description 3
- 239000000843 powder Substances 0.000 claims abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 21
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical group [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 15
- 238000003756 stirring Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 239000000243 solution Substances 0.000 claims description 10
- BEGBSFPALGFMJI-UHFFFAOYSA-N ethene;sodium Chemical group [Na].C=C BEGBSFPALGFMJI-UHFFFAOYSA-N 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 230000003750 conditioning effect Effects 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims description 2
- 229910052906 cristobalite Inorganic materials 0.000 claims description 2
- 239000008367 deionised water Substances 0.000 claims description 2
- 229910021641 deionized water Inorganic materials 0.000 claims description 2
- 239000010437 gem Substances 0.000 claims description 2
- 229910001751 gemstone Inorganic materials 0.000 claims description 2
- 229910052682 stishovite Inorganic materials 0.000 claims description 2
- 229910052905 tridymite Inorganic materials 0.000 claims description 2
- 239000002932 luster Substances 0.000 abstract description 6
- 239000006185 dispersion Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- 235000021180 meal component Nutrition 0.000 abstract description 3
- 230000005923 long-lasting effect Effects 0.000 abstract description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 abstract 1
- 239000003292 glue Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000003643 water by type Substances 0.000 description 3
- 239000003109 Disodium ethylene diamine tetraacetate Substances 0.000 description 2
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- SYZKBMPNHSQNHG-UHFFFAOYSA-N [Na].CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.NCCN Chemical compound [Na].CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.NCCN SYZKBMPNHSQNHG-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 235000019301 disodium ethylene diamine tetraacetate Nutrition 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- -1 precision optics Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610190211.5A CN105838260B (zh) | 2016-03-30 | 2016-03-30 | 一种新型纳米蓝宝石抛光液及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610190211.5A CN105838260B (zh) | 2016-03-30 | 2016-03-30 | 一种新型纳米蓝宝石抛光液及其制备方法 |
Publications (2)
Publication Number | Publication Date |
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CN105838260A CN105838260A (zh) | 2016-08-10 |
CN105838260B true CN105838260B (zh) | 2018-03-27 |
Family
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Family Applications (1)
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CN201610190211.5A Active CN105838260B (zh) | 2016-03-30 | 2016-03-30 | 一种新型纳米蓝宝石抛光液及其制备方法 |
Country Status (1)
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CN (1) | CN105838260B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107164797A (zh) * | 2017-04-11 | 2017-09-15 | 浙江洋铭工贸有限公司 | 一种压铸铝采暖散热片的电泳工艺 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102311706A (zh) * | 2010-06-30 | 2012-01-11 | 中国科学院微电子研究所 | 一种纳米级抛光液及其调配方法 |
CN102911606A (zh) * | 2012-11-10 | 2013-02-06 | 长治虹源科技晶片技术有限公司 | 一种蓝宝石抛光液及配制方法 |
CN104830236A (zh) * | 2015-05-14 | 2015-08-12 | 蓝思科技(长沙)有限公司 | C向蓝宝石抛光液及其制备方法 |
CN105385358A (zh) * | 2015-12-11 | 2016-03-09 | 蓝思科技(长沙)有限公司 | 陶瓷粘接蓝宝石抛光用抛光液及其制备方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004331852A (ja) * | 2003-05-09 | 2004-11-25 | Tama Kagaku Kogyo Kk | 分散安定性に優れた研磨剤スラリー及び基板の製造方法 |
-
2016
- 2016-03-30 CN CN201610190211.5A patent/CN105838260B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102311706A (zh) * | 2010-06-30 | 2012-01-11 | 中国科学院微电子研究所 | 一种纳米级抛光液及其调配方法 |
CN102911606A (zh) * | 2012-11-10 | 2013-02-06 | 长治虹源科技晶片技术有限公司 | 一种蓝宝石抛光液及配制方法 |
CN104830236A (zh) * | 2015-05-14 | 2015-08-12 | 蓝思科技(长沙)有限公司 | C向蓝宝石抛光液及其制备方法 |
CN105385358A (zh) * | 2015-12-11 | 2016-03-09 | 蓝思科技(长沙)有限公司 | 陶瓷粘接蓝宝石抛光用抛光液及其制备方法 |
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Address after: No. 8, North Shou, Shangzhan Road, Sunji Town, Shanghe County, Jinan City, Shandong Province, 251600 Patentee after: Jinan Huisen New Material Factory Address before: 251600 Xushang Office, Shanghe County, Jinan City, Shandong Province, China, Houshimu Industrial Park Patentee before: JINAN HUICHUAN SILICA SOL FACTORY |
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CP03 | Change of name, title or address | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A novel nano sapphire polishing solution and its preparation method Effective date of registration: 20230706 Granted publication date: 20180327 Pledgee: Shandong Shanghe Huijin Village Bank Co.,Ltd. Pledgor: Jinan Huisen New Material Factory Registration number: Y2023980047569 |
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PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Granted publication date: 20180327 Pledgee: Shandong Shanghe Huijin Village Bank Co.,Ltd. Pledgor: Jinan Huisen New Material Factory Registration number: Y2023980047569 |