CN105619973A - 一种新型结构的保护膜及其制备方法 - Google Patents

一种新型结构的保护膜及其制备方法 Download PDF

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CN105619973A
CN105619973A CN201510927360.0A CN201510927360A CN105619973A CN 105619973 A CN105619973 A CN 105619973A CN 201510927360 A CN201510927360 A CN 201510927360A CN 105619973 A CN105619973 A CN 105619973A
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方友
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Guangdong Hongqing Electronic Material Technology Co Ltd
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Abstract

本发明涉及一种新型结构的保护膜,保护膜包括主膜、由下至上依次设置在主膜上表面的上副膜和外护膜、由上至下依次设置在主膜下表面的下副膜和剥离膜,主膜包括上基膜、下基膜、设置在上基膜和下基膜之间的功能介质层、控制上基膜和下基膜之间距离的控距珠;本发明改变了传统保护膜的结构,通过对主膜的结构进行改进,巧妙地解决了掺杂特殊功能化合物的难题。

Description

一种新型结构的保护膜及其制备方法
技术领域
本发明涉及膜结构技术领域,尤其是一种新型结构的保护膜及其制备方法。
背景技术
多功能的保护膜材料可以在商业空间装饰、酒店装潢、办公室隔断、投影展示、光学调制器、热敏及压敏器件、电控玻璃等领域有较广泛的应用。
在保护膜中,通常会加入较多的特殊功能化合物,会对保护膜的整体性能产生影响,如硬度、强度、抗撕拉度。同时,传统的保护膜中功能化合物的添加方法较为繁琐,不利于保护膜的多功能化发展。
发明内容
本发明需要解决的技术问题是提供一种新型结构的保护膜及其制备方法,改变现有保护膜的膜结构,简化保护膜中特殊功能化合物的添加方式,拓宽保护膜的功能类型。
为解决上述技术问题,本发明所采用的技术方案是:
一种新型结构的保护膜,所述保护膜包括主膜、由下至上依次设置在主膜上表面的上副膜和外护膜、由上至下依次设置在主膜下表面的下副膜和剥离膜,所述主膜包括上基膜、下基膜、设置在上基膜和下基膜之间的功能介质层、控制上基膜和下基膜之间距离的控距珠。
本发明技术方案的进一步改进在于:所述主膜中,上基膜、下基膜的材质为聚对苯二甲酸乙二醇酯,功能介质层为光固化材料,控距珠为直径相同且直径在5~50μm之间的刚性微珠,所述主膜的透光率大于90%,雾度小于2%。
本发明技术方案的进一步改进在于:所述光固化材料包括光固化预聚物、功能化合物添加剂以及光引发剂,所述光固化预聚物选自丙烯酸接枝聚氨酯类预聚物、丙烯酸接枝聚芳酯类预聚物、有机硅类预聚物和环氧类预聚物的其中一种或几种。
本发明技术方案的进一步改进在于:所述控距珠为玻璃微珠或掺杂玻璃微珠。
本发明技术方案的进一步改进在于:所述上副膜和主膜之间设置上软化层,所述上副膜和外护膜之间设置上胶层;所述下副膜和主膜之间设置下软化层,所述下副膜和剥离膜之间设置下胶层。
本发明技术方案还包括:
一种新型结构的保护膜的制备方法,所述制备方法包括如下工艺步骤,
A.制备主膜,
B.在主膜的其中一个表面依次涂布制备上软化层及上副膜,
C.在主膜的另一个表面依次涂布制备下软化层及下副膜,
D.在外护膜的其中一个表面涂布制备上胶层,将上胶层与上副膜贴合,
E.在剥离膜的其中一个表面涂布制备下胶层,将下胶层与下副膜贴合。
本发明技术方案的进一步改进在于:
所述主膜的制备过程为,
A1.对上基膜和下基膜的表面除水、除尘、除静电,并将下基膜平铺在涂布台上,
A2.配制光固化材料并将光固化材料均匀涂布在下基膜的上表面,
A3.将上基膜贴合到光固化材料表面,
A4.将主膜放在紫外固化机中固化处理。
本发明技术方案的进一步改进在于:所述涂布机速度设置为5~25mm/s。
本发明技术方案的进一步改进在于:所述紫外固化机中采用0.5mW~2.5mW/cm2的能量固化1~15min。
由于采用了上述技术方案,本发明取得的技术进步是:
本发明的一种新型结构的保护膜,改变了传统保护膜的结构,通过对主膜的结构进行改进,巧妙地解决了掺杂特殊功能化合物的难题,功能介质层可以选择较多种类的材质,以适应不同掺杂情况的需求,通过控距珠,可以精确控制功能介质层的厚度,防止涂布不均匀对保护膜性能带来的负面影响。当特殊功能化合物为有机类化合物时,可以掺杂到功能介质层的化合物内,当特殊功能化合物为无机类化合物时,可以掺杂到控距珠内。
附图说明
图1是本发明的保护膜的结构示意图;
图2是本发明的主膜的结构图;
其中,1、主膜,1-1、下基膜,1-2、上基膜,1-3、控距珠,1-4、功能介质层,2、上软化层,3、下软化层,4、上副膜,5、下副膜,6、上胶层,7、下胶层,8、外护膜,9、剥离膜。
具体实施方式
本发明公开了一种新型结构的保护膜,保护膜包括主膜1、由下至上依次设置在主膜1上表面的上副膜4和外护膜8、由上至下依次设置在主膜1下表面的下副膜5和剥离膜9,上副膜4和主膜1之间设置上软化层2,上副膜4和外护膜8之间设置上胶层6;下副膜5和主膜1之间设置下软化层3,下副膜4和剥离膜9之间设置下胶层7。
本发明的主膜1包括上基膜1-2、下基膜1-1、设置在上基膜1-2和下基膜1-1之间的功能介质层1-4、控制上基膜1-2和下基膜1-1之间距离的控距珠1-3。主膜1中,上基膜1-2、下基膜1-1的材质为聚对苯二甲酸乙二醇酯。
本发明的功能介质层1-4为光固化材料,包括光固化预聚物、功能化合物添加剂以及光引发剂,所述光固化预聚物选自丙烯酸接枝聚氨酯类预聚物、丙烯酸接枝聚芳酯类预聚物、有机硅类预聚物和环氧类预聚物的其中一种或几种。
优选地,功能化合物添加剂为抗静电剂、热稳定剂、光稳定剂、阻燃剂、紫外吸收剂。
优选地,光引发剂选自有机过氧化物引发剂、无机过氧化物引发剂、偶氮类引发剂、氧化还原引发剂的其中一种。
本发明的控距珠1-3为直径相同且直径在5~50μm之间的刚性微珠。控距珠1-3为玻璃微珠或掺杂玻璃微珠。
本发明的主膜1的透光率大于90%,雾度小于2%。
优选地,上副膜4、下副膜5的材料为聚氨酯丙烯酸酯、环氧丙烯酸酯及聚酯丙烯酸酯的其中一种或几种,上软化层2、下软化层3的材料为聚氨酯丙烯酸酯、环氧丙烯酸酯、聚酯丙烯酸酯的其中一种或几种。
本发明公开的一种新型结构的保护膜的制备方法,包括如下工艺步骤,
A.制备主膜1,主膜1的制备过程为,
A1.对上基膜1-2和下基膜1-1的表面除水、除尘、除静电,并将下基膜1-1平铺在涂布台上,
A2.配制光固化材料并将光固化材料均匀涂布在下基膜1-1的上表面,
A3.将上基膜1-2贴合到光固化材料表面,
A4.将主膜1放在紫外固化机中固化处理。
B.在主膜1的其中一个表面依次涂布制备上软化层2及上副膜4,
C.在主膜1的另一个表面依次涂布制备下软化层3及下副膜5,
D.在外护膜8的其中一个表面涂布制备上胶层6,将上胶层6与上副膜4贴合,
E.在剥离膜9的其中一个表面涂布制备下胶层7,将下胶层7与下副膜5贴合。
优选地,涂布机速度设置为5~25mm/s。紫外固化机中采用0.5mW~2.5mW/cm2的能量固化1~15min。
下面结合实施例对本发明做进一步详细说明:
实施例1
本实施例的一种新型结构的保护膜,具有良好的抗静电性能。
本实施例的保护膜包括主膜1、由下至上依次设置在主膜1上表面的上副膜4和外护膜8、由上至下依次设置在主膜1下表面的下副膜5和剥离膜9,上副膜4和主膜1之间设置上软化层2,上副膜4和外护膜8之间设置上胶层6;下副膜5和主膜1之间设置下软化层3,下副膜4和剥离膜9之间设置下胶层7。
本实施例的主膜1包括上基膜1-2、下基膜1-1、设置在上基膜1-2和下基膜1-1之间的功能介质层1-4、控制上基膜1-2和下基膜1-1之间距离的控距珠1-3。主膜1中,上基膜1-2、下基膜1-1的材质为聚对苯二甲酸乙二醇酯。
本实施例的的功能介质层1-4为具有抗静电性能的光固化材料,包括光固化预聚物、功能化合物添加剂以及光引发剂,光固化预聚物为丙烯酸接枝聚氨酯类预聚物。功能化合物添加剂为抗静电剂。光引发剂选自有机过氧化物引发剂。
本实施例的控距珠1-3为直径相同且直径在10μm的刚性微珠。控距珠1-3为玻璃微珠。
本实施例的上副膜4、下副膜5的材料为聚氨酯丙烯酸酯,上软化层2、下软化层3的材料为聚氨酯丙烯酸酯。
本发明的主膜1的透光率大于90%,雾度小于2%。
本实施例的的一种新型结构的保护膜的制备方法,包括如下工艺步骤,
A.制备主膜1,主膜1的制备过程为,
A1.对上基膜1-2和下基膜1-1的表面除水、除尘、除静电,并将下基膜1-1平铺在涂布台上,
A2.配制光固化材料并将光固化材料均匀涂布在下基膜1-1的上表面,
A3.将上基膜1-2贴合到光固化材料表面,
A4.将主膜1放在紫外固化机中固化处理。
B.在主膜1的其中一个表面依次涂布制备上软化层2及上副膜4,
C.在主膜1的另一个表面依次涂布制备下软化层3及下副膜5,
D.在外护膜8的其中一个表面涂布制备上胶层6,将上胶层6与上副膜4贴合,
E.在剥离膜9的其中一个表面涂布制备下胶层7,将下胶层7与下副膜5贴合。
优选地,涂布机速度设置为15mm/s。紫外固化机中采用2.5mW/cm2的能量固化8min。
实施例2
本实施例的一种新型结构的保护膜,具有良好的抗紫外性能。
本实施例的保护膜包括主膜1、由下至上依次设置在主膜1上表面的上副膜4和外护膜8、由上至下依次设置在主膜1下表面的下副膜5和剥离膜9,上副膜4和主膜1之间设置上软化层2,上副膜4和外护膜8之间设置上胶层6;下副膜5和主膜1之间设置下软化层3,下副膜4和剥离膜9之间设置下胶层7。
本实施例的主膜1包括上基膜1-2、下基膜1-1、设置在上基膜1-2和下基膜1-1之间的功能介质层1-4、控制上基膜1-2和下基膜1-1之间距离的控距珠1-3。主膜1中,上基膜1-2、下基膜1-1的材质为聚对苯二甲酸乙二醇酯。
本实施例的的功能介质层1-4为具有抗紫外性能的光固化材料,包括光固化预聚物、功能化合物添加剂以及光引发剂,光固化预聚物为环氧类预聚物。功能化合物添加剂为紫外吸收剂。光引发剂选自偶氮类引发剂。
本实施例的控距珠1-3为直径相同且直径在50μm的刚性微珠。控距珠1-3为玻璃微珠。
本实施例的上副膜4、下副膜5的材料为环氧丙烯酸酯,上软化层2、下软化层3的材料为环氧丙烯酸酯。
本发明的主膜1的透光率大于90%,雾度小于2%。
本实施例的的一种新型结构的保护膜的制备方法,包括如下工艺步骤,
A.制备主膜1,主膜1的制备过程为,
A1.对上基膜1-2和下基膜1-1的表面除水、除尘、除静电,并将下基膜1-1平铺在涂布台上,
A2.配制光固化材料并将光固化材料均匀涂布在下基膜1-1的上表面,
A3.将上基膜1-2贴合到光固化材料表面,
A4.将主膜1放在紫外固化机中固化处理。
B.在主膜1的其中一个表面依次涂布制备上软化层2及上副膜4,
C.在主膜1的另一个表面依次涂布制备下软化层3及下副膜5,
D.在外护膜8的其中一个表面涂布制备上胶层6,将上胶层6与上副膜4贴合,
E.在剥离膜9的其中一个表面涂布制备下胶层7,将下胶层7与下副膜5贴合。
优选地,涂布机速度设置为5mm/s。紫外固化机中采用2.5mW/cm2的能量固化15min。

Claims (9)

1.一种新型结构的保护膜,其特征在于:所述保护膜包括主膜(1)、由下至上依次设置在主膜(1)上表面的上副膜(4)和外护膜(8)、由上至下依次设置在主膜(1)下表面的下副膜(5)和剥离膜(9),所述主膜(1)包括上基膜(1-2)、下基膜(1-1)、设置在上基膜(1-2)和下基膜(1-1)之间的功能介质层(1-4)、控制上基膜(1-2)和下基膜(1-1)之间距离的控距珠(1-3)。
2.根据权利要求1所述的一种新型结构的保护膜,其特征在于:所述主膜(1)中,上基膜(1-2)、下基膜(1-1)的材质为聚对苯二甲酸乙二醇酯,功能介质层(1-4)为光固化材料,控距珠(1-3)为直径相同且直径在5~50μm之间的刚性微珠,所述主膜(1)的透光率大于90%,雾度小于2%。
3.根据权利要求2所述的一种新型结构的保护膜,其特征在于:所述光固化材料包括光固化预聚物、功能化合物添加剂以及光引发剂,所述光固化预聚物选自丙烯酸接枝聚氨酯类预聚物、丙烯酸接枝聚芳酯类预聚物、有机硅类预聚物和环氧类预聚物的其中一种或几种。
4.根据权利要求2所述的一种新型结构的保护膜,其特征在于:所述控距珠(1-3)为玻璃微珠或掺杂玻璃微珠。
5.根据权利要求1所述的一种新型结构的保护膜,其特征在于:所述上副膜(4)和主膜(1)之间设置上软化层(2),所述上副膜(4)和外护膜(8)之间设置上胶层(6);所述下副膜(5)和主膜(1)之间设置下软化层(3),所述下副膜(4)和剥离膜(9)之间设置下胶层(7)。
6.一种新型结构的保护膜的制备方法,其特征在于:所述制备方法包括如下工艺步骤,
A.制备主膜(1),
B.在主膜(1)的其中一个表面依次涂布制备上软化层(2)及上副膜(4),
C.在主膜(1)的另一个表面依次涂布制备下软化层(3)及下副膜(5),
D.在外护膜(8)的其中一个表面涂布制备上胶层(6),将上胶层(6)与上副膜(4)贴合,
E.在剥离膜(9)的其中一个表面涂布制备下胶层(7),将下胶层(7)与下副膜(5)贴合。
7.根据权利要求6所述的一种新型结构的保护膜的制备方法,其特征在于:所述主膜(1)的制备过程为,
A1.对上基膜(1-2)和下基膜(1-1)的表面除水、除尘、除静电,并将下基膜(1-1)平铺在涂布台上,
A2.配制光固化材料并将光固化材料均匀涂布在下基膜(1-1)的上表面,
A3.将上基膜(1-2)贴合到光固化材料表面,
A4.将主膜(1)放在紫外固化机中固化处理。
8.根据权利要求7所述的一种新型结构的保护膜的制备方法,其特征在于:所述涂布机速度设置为5~25mm/s。
9.根据权利要求7所述的一种新型结构的保护膜的制备方法,其特征在于:所述紫外固化机中采用0.5mW~2.5mW/cm2的能量固化1~15min。
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