CN105506670B - A kind of device and operation method of cupric electrolysis or copper electrodeposition - Google Patents
A kind of device and operation method of cupric electrolysis or copper electrodeposition Download PDFInfo
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- CN105506670B CN105506670B CN201510963409.8A CN201510963409A CN105506670B CN 105506670 B CN105506670 B CN 105506670B CN 201510963409 A CN201510963409 A CN 201510963409A CN 105506670 B CN105506670 B CN 105506670B
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/06—Operating or servicing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The invention provides a kind of cupric electrolysis or the device of copper electrodeposition, including：Electrolytic cell or Winning cell cell body, multiple minus plates and multiple positive plates, and the minus plate and positive plate are disposed on inside electrolytic cell or the Winning cell cell body；The lateral interior of the length of electrolytic cell or the Winning cell cell body is provided with feeding device, be provided with the feeding device it is multiple go out nozzle for liquid, be provided with out nozzle for liquid between each minus plate and each positive plate；The top setting of the two lateral cell walls of length of electrolytic cell or the Winning cell cell body is fluted, and the bottom surface of the groove is parallel with cell body bottom surface, and overfall is provided with the madial wall of the groove.The application can be effectively improved concentration polarization phenomenon by setting feeding device and two to grow lateral top setting groove in the side wall of copper electrolysis cells or copper Winning cell.
Description
Technical field
The present invention relates to cupric electrolysis technical field, more particularly to the device and operation method of a kind of cupric electrolysis or copper electrodeposition.
Background technology
At present, the electrolytic process of non-ferrous metal metallurgy of copper generally uses Permanent Stainless Steel Cathode Technology technology, technology electricity
Current density is up to 280-330A/m2, it has higher current efficiency height, yield, good product quality and Cu-CATH-1 qualification rate
The features such as high.But with the continuous expansion of cupper smelting in recent years, the continuous rise in price of raw material, smelting industry competition increasingly swashs
Strong, the processing charges of industry are also constantly shunk.Therefore, expand the scale of cupric electrolysis production, improve copper electrolyzing refining technology, improve labor
Dynamic productivity ratio turns into the inexorable trend of Copper making.According to the electrolysis principle of nonferrous metallurgy, this just needs the electric current for improving cupric electrolysis
Density.And, it is necessary to improve the endless form and device of electrolyte when producing at higher current densities.
The electrolysis of Non-ferrous Metallurgy is all based on electrochemical principle with electrolytic deposition process, by negative electrode, anode load electrolytic cell or
In Winning cell, after electrolytic cell or Winning cell are powered, different electrochemical reactions occurs in cathode and anode, constantly have metal from
Son separates out on negative electrode.Because the electrode potential of each metal ion species in solution is different, the order that they are separated out on negative electrode is just
Difference, the high metal ion of electrode potential can be separated out preferentially.It is golden on negative electrode with the raising of current density according to production practices
Category ion speed of separating out can accordingly accelerate, this concentration of metal ions for resulting near negative electrode constantly reduces, make the metal from
The electrode potential of son is reduced, and produces concentration polarization phenomenon, and the metal ion is just no longer preferential to be separated out, so as to cause other impurity members
The precipitation of element, and then influence product quality.Therefore, overcome concentration polarization phenomenon to be electrolysed in electrolysis or electrolytic deposition process, it is necessary to change
The round-robin method and device of liquid.
The electrolysis process of comparative maturity is Permanent Stainless Steel Cathode Technology technology at present, but the endless form of electrolyte is
In bottom of electrolytic tank feed liquor, the overflow of both ends top, concentration polarization phenomenon still can not be effectively reduced.
The content of the invention
Present invention solves the technical problem that it is to provide a kind of device of cupric electrolysis or electrodeposition.The cupric electrolysis that the application provides
Or electrowinning plant can be effectively improved concentration polarization phenomenon.
In view of this, this application provides a kind of cupric electrolysis or the device of copper electrodeposition, including：Electrolytic cell or Winning cell groove
Body, multiple minus plates and multiple positive plates, and the minus plate and positive plate are disposed on electrolytic cell or the Winning cell groove
Internal portion；
The lateral interior of the length of electrolytic cell or the Winning cell cell body is provided with feeding device, the feeding device
On be provided with it is multiple go out nozzle for liquid, be provided with out nozzle for liquid between each positive plate and each minus plate；
The top of the two lateral cell walls of length of electrolytic cell or the Winning cell cell body set it is fluted, the bottom surface of the groove with
Cell body bottom surface is parallel, and overfall is provided with the madial wall of the groove.
Preferably, height of the casing lower edge away from the electrolytic cell or Winning cell cell body bottom is the electrolysis or electrodeposition
/ 3rd of groove cell body height.
Preferably, the feeding device is stainless steel casing, it is described go out nozzle for liquid inner diameter be 6mm~10mm, outside
A diameter of 12~the 16mm of wall.
Preferably, it is described go out nozzle for liquid away from the minus plate lower edge be highly 100~200mm.
Preferably, the number of the overfall is 5~10.
Using the operation method of the device cupric electrolysis or copper electrodeposition of the cupric electrolysis described in such scheme or copper electrodeposition, including with
Lower step：
Load anode plate and cathode plate in electrolytic cell or Winning cell, entering for electrolytic cell or Winning cell is connected by feed tube
Liquid device；
Electrolyte enters feeding device by feed tube and sprayed through going out nozzle for liquid；Then electrolyte is entered recessed by overfall
Groove, last electrolyte, to liquid return hole, flow back into circulating slot by trough return current.
Preferably, the speed that the electrolyte edge goes out nozzle for liquid ejection is 0~0.5m/s, and the flow of the electrolyte is
0.1~0.9L/min.
Preferably, the minus plate is stainless steel cathode plate.
This application provides a kind of cupric electrolysis or the device of electrodeposition, it includes：Electrolytic cell or Winning cell cell body, multiple negative electrodes
Plate and multiple positive plates, and the minus plate and positive plate are disposed on inside electrolytic cell or the Winning cell cell body；It is described
The lateral interior of the length of electrolytic cell or Winning cell cell body is provided with feeding device, is provided with the feeding device multiple
Go out nozzle for liquid, nozzle for liquid is provided with out between each positive plate and each minus plate；Two length of electrolytic cell or the Winning cell cell body
The top setting of lateral cell wall is fluted, and the bottom surface of the groove is parallel with cell body bottom surface, is set on the madial wall of the groove
There is overfall.The application makes electrolyte by going out liquid on feeding device by setting feeding device in cell sidewall bottom
Nozzle uniformly, it is horizontal it is parallel go out liquid, electrolyte circulating in electrolytic cell or Winning cell, Jin Ergai can be significantly improved
Concentration polarization phenomenon in kind electrolysis or electrolytic deposition process, and the sedimentation of the earth of positive pole is not influenceed；Electrolyte is on cell body inwall simultaneously
Grow lateral flowing in portion two, by increasing capacitance it is possible to increase solution surface floats the mobility of the earth of positive pole, reduces the floating earth of positive pole of solution surface,
Reduce attachment of the floating earth of positive pole in cathode surface, and then improve the quality of tough cathode.
Brief description of the drawings
Fig. 1 is the structural representation of cupric electrolysis of the present invention or electrowinning plant；
Fig. 2 is the schematic diagram that sectional view of the present invention and solution flow；
Fig. 3 is the front view of present invention electrolysis flute length side wall；
Fig. 4 is the partial enlarged drawing of the stainless steel casing that electrolyte of the present invention enters and nozzle；
Fig. 5 is the sectional view of present invention electrolysis or electrowinning plant nozzle.
Embodiment
For a further understanding of the present invention, the preferred embodiment of the invention is described with reference to embodiment, still
It should be appreciated that these descriptions are simply further explanation the features and advantages of the present invention, rather than to the claims in the present invention
Limitation.
The embodiment of the invention discloses a kind of cupric electrolysis or the device of electrodeposition, including：It is electrolytic cell or Winning cell cell body, multiple
Minus plate and multiple positive plates, and the minus plate and positive plate are disposed on inside electrolytic cell or the Winning cell cell body；
The lateral interior of the length of electrolytic cell or the Winning cell cell body is provided with feeding device, the feeding device
On be provided with it is multiple go out nozzle for liquid, be provided with out nozzle for liquid between each positive plate and each minus plate；
The top of the two lateral cell walls of length of electrolytic cell or the Winning cell cell body set it is fluted, the bottom surface of the groove with
Cell body bottom surface is parallel, and overfall is provided with the madial wall of the groove.
As shown in figure 1, Fig. 1 is the structural representation of the cupric electrolysis that the application provides or electrowinning plant, 1 is anode in figure
Plate, 2 be minus plate, and 3 be nozzle for liquid, and 4 be main liquid return hole；Fig. 2 is the sectional view of the present invention and the schematic diagram of solution flowing, is schemed
In 5 be groove, 6 be stainless steel trough body.
This application provides a kind of cupric electrolysis or the device of copper electrodeposition, it includes：Electrolytic cell or Winning cell cell body, the electricity
It is cell body well known to those skilled in the art to solve groove or Winning cell cell body, for certain thickness electrolytic cell or Winning cell.
The electrolytic cell or Winning cell include minus plate and positive plate, according to the needs of actual production can select the minus plate with
The number of the positive plate, and the minus plate is disposed in electrolytic cell or the Winning cell cell body with the positive plate
Portion.
Cupric electrolysis or copper electrodeposition cell body well known to those skilled in the art is a kind of cell body with obvious long side and broadside,
Wherein long side those skilled in the art are referred to as long lateral.The lateral side of the length of herein described electrolytic cell or Winning cell cell body
Pars intramuralis is provided with feeding device, be provided with the feeding device it is multiple go out nozzle for liquid, and it is described go out nozzle for liquid be uniformly distributed
Between the positive plate and minus plate.Herein described feeding device is preferably stainless steel casing, and the stainless steel casing is excellent
/ 3rd that the height away from the electrolytic cell or Winning cell cell body bottom is the electrolytic cell or Winning cell cell body height are selected, with
Just can realize bottom of electrolytic tank it is parallel go out liquid, top side overflow endless form.The application is to the stainless steel trough body
The height of itself has no particular limits.It is herein described go out nozzle for liquid go out liquid mode be preferably nozzle it is parallel go out liquid, it is described
Go out the structural representation of nozzle for liquid as shown in Figure 4,5.It is described go out nozzle for liquid inner diameter be preferably 6mm~10mm, outer wall is straight
Footpath is preferably 12~16mm, it is described go out nozzle for liquid length be preferably 15~30mm；It is described go out nozzle for liquid electrolyte with 0~
0.5m/s flow velocity sprays, it is described go out nozzle for liquid electrolyte flow be 0.1~0.9L/min.It is herein described go out nozzle for liquid
Inner diameter and electrolyte have together decided on the flow of electrolyte going out the flow velocity at nozzle for liquid, and then determine each electrolysis
The flow of groove, therefore, go out the internal diameter of nozzle for liquid, electrolyte exceedes above range by going out the flow velocity of nozzle for liquid, it is impossible to meet
Requirement to electrolyte internal circulating load；Internal circulating load is too small, then concentration polarization occurs, and internal circulating load is excessive, then anode slime occurs
The other problemses such as difficulty.It is herein described go out nozzle for liquid it is highly preferred away from the minus plate lower edge be 100~200mm, go out liquid spray
Mouth position is too high, then is unfavorable for the circulation of minus plate bottom electrolyte, the too low uniformity for then influenceing electrolyte circulation in position, position
Put the too high or too low quality for being all unfavorable for tough cathode precipitation.
The application significantly improves electrolyte in electrolytic cell by setting feeding device in electrolytic cell or Winning cell cell body inwall
Or circulating in Winning cell, and then improve the concentration polarization phenomenon in electrolysis or electrolytic deposition process, and do not influence the earth of positive pole
Sedimentation.
The application is also fluted in the top setting of the electrolytic cell or the two lateral cell walls of length of Winning cell cell body, described recessed
The bottom surface of groove is parallel with cell body bottom surface, and overfall is provided with the madial wall of the groove.The depth of groove, reserve overfall
The data such as quantity are depending on specific production application situation.The application electrolyte grows lateral flowing, energy in cell body upper inside wall two
Enough increase the mobility of the electrolyte surface floating earth of positive pole, reduce the floating earth of positive pole of solution surface, reduce the floating earth of positive pole and exist
The attachment of tough cathode plate face.
Present invention also provides a kind of using the cupric electrolysis or the cupric electrolysis or electrodeposition operation method of copper electrowinning plant, bag
Include following steps：
Load anode plate and cathode plate in electrolysis or Winning cell, the casing of electrolysis or Winning cell is connected by feed tube；
Electrolyte enters feeding device by feed tube and sprayed along nozzle for liquid is gone out；Then electrolyte is entered recessed by overfall
Groove, last electrolyte, to liquid return hole, flow back into circulating slot by trough return current.
The application, directly to electrolytic cell feed flow, can meet larger electrolyte circulation using the power of frequency conversion type circulating pump
Amount, and flow is accurately adjusted using frequency conversion type pump, the regulation of electrolyte internal circulating load is easy to operate, quick.With electricity
The continuous progress of solution preocess, nearby copper ion concentration will constantly decline negative electrode, therefore, make the moon by big electrolyte internal circulating load
Copper ion concentration near pad-face is supplemented, and effectively eliminates concentration polarization phenomenon.After electrolytic cell internal circulating load increases, general meeting
The sedimentation of electrolytic process Anodic mud is influenceed, can solve the problem using the device in this patent and endless form.In electrolytic cell
Lower sidewall by go out nozzle for liquid uniformly, horizontal direction parallel go out liquid, will not conflict with the direction that the earth of positive pole settles downwards, to sun
The settlement influence of pole mud is little；Two are all uniformly distributed between every piece of minus plate and positive plate and goes out nozzle for liquid, electrolyte is by going out
Nozzle for liquid yin, yang pole plate bottom it is parallel go out liquid, top side overflow mode can ensure electrolyte circulation uniformity.
In using herein described cupric electrolysis or the device cupric electrolysis of electrodeposition or the operation method of electrodeposition, it is being electrolysed first
Load anode plate and cathode plate in groove or Winning cell, the feeding device of electrolysis or Winning cell is connected by feed tube；Then it is electrolysed
Liquid continues into feeding device by feed tube, and along nozzle for liquid ejection is gone out, electrolyte grows lateral overflow by upper part of the electrolytic cell
Head piece enters groove, and last electrolyte, to liquid return hole, flow to circulating slot by trough return current.
The cupric electrolysis or the device of copper electrodeposition that the application provides, it is set to improve circulation of the solution in electrolytic cell or Winning cell
Flowing, and then improve the concentration polarization phenomenon in electrolysis or electrolytic deposition process, and the sedimentation of the earth of positive pole is not influenceed；Solution can be achieved to exist
With smaller flow velocity feed liquor in electrolysis or Winning cell, reduce the energy consumption of circulating pump；Solution grows lateral stream in cell body upper inside wall two
It is dynamic, by increasing capacitance it is possible to increase solution surface floats the mobility of the earth of positive pole, reduces the floating earth of positive pole of solution surface, reduces the floating earth of positive pole
In the attachment of tough cathode plate face；Product quality can be improved, current density can be significantly increased, improve production efficiency；Can
Shorten the production cycle of product, improve all transfer efficients of fund, make the production and operation of enterprise more flexibly, actively.
For a further understanding of the present invention, with reference to embodiment to the device of cupric electrolysis provided by the invention or electrodeposition with
And the operation method of cupric electrolysis or copper electrodeposition is described in detail, protection scope of the present invention is not limited by the following examples.
Embodiment 1
Load 53 pieces of copper anodes and 52 pieces of stainless steel cathodes in electrolytic cell, connected by an input duct in electrolytic cell
The casing of stainless steel, the stainless steel casing that electrolyte is entered in electrolytic cell by feed liquid pipeline；In bottom of electrolytic tank 500mm height
Opening position fix stainless steel casing, go out the bottom that nozzle for liquid is located at casing, two be uniformly distributed in every piece of minus plate two bottom sides
It is individual go out nozzle for liquid, a diameter of Φ 8mm of nozzle inner walls, outer dia is Φ 14mm；Electrolyte is by going out nozzle for liquid with 0.4m/s's
Flow velocity sprays, and the flow for each going out nozzle for liquid is 0.85L/min；After electrolyte sprays, grown by upper part of the electrolytic cell two lateral recessed
The overfall backflow reserved at groove, is collected to main liquid return hole, flows back into circulating slot, complete the circulation of electrolyte.It is equipped with corresponding
After the circulatory system and electric power system, you can realize the cupric electrolysis production of high current density.
The current density of the electrolysis production is 400A/m2, concentric pole span is that (negative electrode to negative electrode, anode are into anode by 100mm
The heart), 720 electrolytic cells can produce 28.5 ten thousand tons of Cu-CATH-1 per year.
Embodiment 2
The application of copper electrodeposition, purification decopper(ing), removing impurities available for electrolyte
With the progress of electrolytic process, copper and impurity element are constantly enriched with, and need to handle a certain amount of waste electrolyte daily
Carry out decopper(ing) removing impurities；The waste electrolyte of main system is beaten to progress decopper(ing), removing impurities processing in net liquid process Winning cell by pump.
Load the anode that 24 pieces of insoluble chloride plates do copper electrodeposition in Winning cell, load 23 pieces of stainless steel cathode plates or residual
Extremely (totally 10 groove, preceding 3 groove load stainless steel cathode plate, the anode scrap that rear 7 groove loads after electrolysis to every group of Winning cell to the negative electrode of copper electrodeposition
Do the negative electrode of copper electrodeposition), the waste electrolyte of main system, into the stainless steel casing in Winning cell, passes through nozzle by feed liquid pipeline
To liquid；Go out the bottom that nozzle for liquid is located at casing, being uniformly distributed two in every piece of minus plate or anode scrap two bottom sides goes out nozzle for liquid, spray
Mouth inner diameter is Φ 6mm, and outer dia is Φ 10mm.Electrolyte is sprayed by going out nozzle for liquid with about 0.4m/s flow velocity, often
It is individual go out nozzle for liquid flow be 0.6L/min；After electrolyte sprays, overflow by what is reserved at two long lateral groove of upper part of the electrolytic cell
Head piece flows back, and is collected to main liquid return hole, flows back to adjacent next Winning cell, decopper(ing) end liquid bath is flow back into last groove,
Electrolyte after decopper(ing), removing impurities returns to electrolysis main system by whole liquid pump.
The current density of electrodeposition process about 260A/m2, the flow of electrolyte of each Winning cell is about 28L/min；First groove
Winning cell import cupric about 39~44g/L, in the outlet of the 3rd groove, cupric can be down to 15~20g/L, control the first groove import electrolysis
Liquid copper ion concentration and stability of flow, and it is aided with the additives such as gelatine, thiocarbamide, preceding 3 groove of Winning cell still can output 1# standards the moon
Pole copper, rear 7 groove can proceed with the further decopper(ing) removing impurities of electrolyte.
In traditional electrolyte technique, typically in 25~35L/ (min.cell), (Liter Per Minute is every for electrolyte list groove internal circulating load
Groove), electrolytic current density is in 260~300A/m2Left and right；Limited by electrolyte internal circulating load, electrolytic current density is more than 300A/
m2When, intereelectrode short-circuit will increasing fast, have a significant impact to product quality, while increase the energy consumption of product.Using this method
Electrolyte list groove internal circulating load can be made to increase to 90L/ (min.cell), even more high, 380~420A/m can be met2, even more high
Electrolysis production under current density.Under same device configuration, tough cathode output increased 50% or so can be made.
The explanation of above example is only intended to help the method and its core concept for understanding the present invention.It should be pointed out that pair
For those skilled in the art, under the premise without departing from the principles of the invention, the present invention can also be carried out
Some improvement and modification, these are improved and modification is also fallen into the protection domain of the claims in the present invention.
The foregoing description of the disclosed embodiments, professional and technical personnel in the field are enable to realize or using the present invention.
A variety of modifications to these embodiments will be apparent for those skilled in the art, as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, it is of the invention
The embodiments shown herein is not intended to be limited to, and is to fit to and principles disclosed herein and features of novelty phase one
The most wide scope caused.
Claims (7)
1. the device of a kind of cupric electrolysis or copper electrodeposition, including：Electrolytic cell or Winning cell cell body, multiple minus plates and multiple anodes
Plate, and the minus plate and positive plate are disposed on inside electrolytic cell or the Winning cell cell body；
The lateral interior of the length of electrolytic cell or the Winning cell cell body is provided with feeding device, is set on the feeding device
Be equipped with it is multiple go out nozzle for liquid, be provided with out nozzle for liquid between each positive plate and each minus plate；It is described go out nozzle for liquid away from described the moon
Pole plate lower edge is highly 100~200mm；
The top of the two lateral cell walls of length of electrolytic cell or the Winning cell cell body sets fluted, the bottom surface of the groove and cell body
Bottom surface is parallel, and overfall is provided with the madial wall of the groove.
2. device according to claim 1, it is characterised in that the feeding device lower edge is away from the electrolytic cell or Winning cell
The height of cell body bottom is 1/3rd of the electrolysis or Winning cell cell body height.
3. device according to claim 1, it is characterised in that the feeding device is stainless steel casing, it is described go out liquid spray
The inner diameter of mouth is 6mm~10mm, and outer diameter is 12~16mm.
4. device according to claim 1, it is characterised in that the number of the overfall is 5~10.
5. utilize the cupric electrolysis described in any one of Claims 1 to 44 or the device cupric electrolysis of copper electrodeposition or the operation side of copper electrodeposition
Method, comprise the following steps：
Load anode plate and cathode plate in electrolytic cell or Winning cell, the feed liquor that electrolytic cell or Winning cell are connected by feed tube fills
Put；
Electrolyte enters feeding device by feed tube and sprayed through going out nozzle for liquid；Then electrolyte enters groove by overfall,
Last electrolyte, to liquid return hole, flows back into circulating slot by trough return current.
6. operation method according to claim 5, it is characterised in that the electrolyte edge goes out the speed that nozzle for liquid sprays and is
0~0.5m/s, the flow of the electrolyte is 0.1~0.9L/min.
7. operation method according to claim 5, it is characterised in that the minus plate is stainless steel cathode plate.
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| CN106757152A (en) * | 2017-01-18 | 2017-05-31 | 浙江科菲科技股份有限公司 | A kind of composition brass positive plate electrolysis high and the device of low copper solution electrodeposition and electrolysis or electrodeposition method |
| JP7186950B2 (en) | 2019-02-08 | 2022-12-12 | 住友金属鉱山株式会社 | Electrolyte supply/drainage method |
| CN109811367A (en) * | 2019-04-08 | 2019-05-28 | 中南大学 | A kind of uniform vertical becomes a mandarin the electrolytic cell of charging |
| CN109930172A (en) * | 2019-04-10 | 2019-06-25 | 中国恩菲工程技术有限公司 | Copper electrodeposition equipment |
| CN109881199A (en) * | 2019-04-10 | 2019-06-14 | 深圳市铿东科技有限公司 | A kind of regenerating alkaline etching liquid and its copper recovery system |
| CN113073360B (en) * | 2021-03-30 | 2022-04-12 | 中南大学 | Industrial electrodeposition equipment and use method thereof |
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| CN1034957C (en) * | 1993-04-24 | 1997-05-21 | 王绍和 | Method for preparing electrolytic copper by direct electrolysis of copper sulfide ore and electrolytic bath thereof |
| US7410562B2 (en) * | 2003-08-20 | 2008-08-12 | Materials & Electrochemical Research Corp. | Thermal and electrochemical process for metal production |
| JP2008208441A (en) * | 2007-02-28 | 2008-09-11 | Sumitomo Metal Mining Co Ltd | Solvent extraction method for chloride aqueous solution |
| AT505700B1 (en) * | 2007-08-27 | 2009-12-15 | Mettop Gmbh | METHOD OF OPERATING COPPER ELECTROLYSIS CELLS |
| CN102260879A (en) * | 2011-07-27 | 2011-11-30 | 金川集团有限公司 | Treatment method of waste copper sulfate electrolyte |
| CN202705509U (en) * | 2012-07-31 | 2013-01-30 | 安徽嘉伟再生资源有限公司 | Electrolysis bath liquid outlet mechanism for producing electrolysis copper |
| CN103255443B (en) * | 2013-05-06 | 2015-11-25 | 阳谷祥光铜业有限公司 | Superhigh-current-density electrolysis or Winning cell |
| CN104032332B (en) * | 2014-06-04 | 2016-05-25 | 杭州三耐环保科技有限公司 | A kind of device and implementation method of bottom liquid inlet circulation high current density electrolysis plated metal |
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