CN106757152A - A kind of composition brass positive plate electrolysis high and the device of low copper solution electrodeposition and electrolysis or electrodeposition method - Google Patents
A kind of composition brass positive plate electrolysis high and the device of low copper solution electrodeposition and electrolysis or electrodeposition method Download PDFInfo
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- CN106757152A CN106757152A CN201710034929.XA CN201710034929A CN106757152A CN 106757152 A CN106757152 A CN 106757152A CN 201710034929 A CN201710034929 A CN 201710034929A CN 106757152 A CN106757152 A CN 106757152A
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- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
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Abstract
The invention discloses a kind of composition brass positive plate electrolysis high and the device of low copper solution electrodeposition and electrolysis or electrodeposition method, the device includes point liquid injection feed liquor system and two goes out liquid, the electrolytic cell of bottom emptying.A point liquid injection feed liquor system in cell body uses CPVC honeycomb ducts, CPVC liquid separation systems, special nozzle machine-shaping, and each jet is assembled by threaded nozzle.During production, cell body places negative electrode in the middle of every group of jet, and anode is placed between injection port group group.Anode is connected with positive pole copper bar, and negative electrode is connected with negative pole copper bar, both positive and negative polarity copper bar connection commutation system.Essential core of the present invention is point liquid injection feed liquor system and a liquid outlet system, processing method is efficient, remarkable in economical benefits, can be used for composition brass positive plate electrolysis production high and is produced with low concentration solution copper electrodeposition, and the tough cathode of output reaches the A grades of copper or No. 1 standard copper of the standards of GB/T 467 2010.
Description
Technical field
The invention belongs to metallurgy industry cupric electrolysis technical field, and in particular to a kind of composition brass positive plate electrolysis high is molten with low copper
The device of liquid electrodeposition and electrolysis or electrodeposition method, it efficiently solves composition brass positive plate high in metallurgy industry cupric electrolysis technical field
The difficult anodic passivity of electrolysis, low copper solution are difficult to the shortcoming of direct electrowinning, while the apparatus and method make to be eliminated in production process
Concentration polarization, carries out high current density operation, is the mode of a kind of efficient electrolysis and efficient electrodeposition.
Background technology
Cathode copper had significant modernization development in oneth century of past, i.e., in the electrolysis for having copper sulphate-sulfuric acid solution
Unpurified copper anode is electrochemically electrolysed in groove, copper ion is sent to negative electrode, and copper is rich with certain purity in negative electrode
Collection.Main electrochemical reaction includes：
Anode reaction： Cu（It is impure）→ Cu2++ 2e（ 1）
Cathode reaction： Cu2++ 2e → Cu（It is pure）（ 2）
Net reaction： Cu（It is impure）→ Cu（It is pure）（ 3）
Since the cupric electrolysis factory foundation of 19 end of the centurys, the production scale and production capacity of copper are significantly improved.
In past decades, by improving current efficiency, adjustment dispensing, purifying electrolysis liquid, the automation mechanized operation of technique and program control
The measures such as system considerably increase the yield of copper.56 conditions of work of business groove of the recent Moats et al. to global general-use
Evaluated.
Increase yield and improve Cathode Copper Quality fresh approach include using stainless steel cathode, improve activation electrolytic matter,
Monitoring additive and Anode machining unit.
Despite the development of these technologies, but anodic passivity still can occur in most modernization electrolysis,
Passivation because the formation of indissoluble material and suppress dissolving reaction generation, composition brass positive plate particularly high due to indissoluble material compared with
It is many, it is easier to which that anodic passivity occurs.Anodic passivity can cause the loss of production capacity, the increase of power consumption expense, the quality of tough cathode
Decline.
Therefore have that production capacity is low in cathode copper field, comprehensive energy consumption is high, funds tied up are big, composition brass electrolysis difficulty high etc.
Problem.
In terms of copper electrodeposition, mainly due to concentration polarization, the influence of ion concentration so that existing substantially in copper electrodeposition industry
Copper ion concentration is more than the efficient electrodeposition of 45 gram liters ability and obtains the product of high-quality.
In summary two kinds of situations, the bottleneck that production is restricted in fact is exactly anodic passivity and concentration polarization.Reduce anode blunt
Change the efficient production that miscellaneous anode cupric electrolysis high and low copper electrodeposition can be effectively solved with the influence for eliminating concentration polarization.
Therefore, minimum level is reduced to by by anodic passivity, the quality of global copper can be improved and production cost is reduced.
The content of the invention
For the above-mentioned problems in the prior art, it is electrolysed it is an object of the invention to provide a kind of composition brass positive plate high
With the device of low copper solution electrodeposition and electrolysis or electrodeposition method, it effectively solves miscellaneous anode copper anodic passivity high and low copper solution
The influence of concentration polarization, breaches miscellaneous anode cupric electrolysis high and low copper solution electrodeposition refining techniques bottleneck under high current density, real
The efficient electrolysis of miscellaneous anode copper high and the efficient electrodeposition of low copper solution are showed.
Described composition brass positive plate a kind of high is electrolysed the device with low copper solution electrodeposition, including cell body and point liquid injection
Feed liquor system, left and right two of cell body is provided with circulation liquid return hole, and bottom is provided with supernatant leakage fluid dram and earth of positive pole drain,
It is characterized in that a point liquid injection feed liquor system is connected and composed by honeycomb duct and solution distributor pipe, honeycomb duct hangs on electrolytic cell side
Wall, solution distributor pipe be located at cell body bottom, the multigroup special nozzle of interval setting on solution distributor pipe, electrolytic cell body sidewall it
On lay for the rubber with cell insulation, copper bar and insulating glass steel pad, every group of special spray between laying groove successively on rubber
Negative electrode is placed in the middle of mouth, anode is placed between the special nozzle of two adjacent groups, copper bar between anode, the end slot of negative electrode one, the other end is placed in
On insulating glass steel pad.
Described composition brass positive plate a kind of high is electrolysed the device with low copper solution electrodeposition, it is characterised in that copper bar includes between groove
Positive pole copper bar and negative pole copper bar, positive pole copper bar and negative pole copper bar are respectively placed on the avris wall of cell body two, and positive pole copper bar connects
The positive pole and anode of commutation system are connect, negative pole copper bar connects the negative pole and negative electrode of commutation system, both positive and negative polarity copper bar connection rectification system
System.
Described composition brass positive plate a kind of high is electrolysed the device with low copper solution electrodeposition, it is characterised in that on solution distributor pipe
One group of band internal thread connecting hole of interval setting, special nozzle one end is shower nozzle, and the other end is provided with what is matched with threaded connecting hole
M10 screw thread mouths, are connected through a screw thread on solution distributor pipe.
Described composition brass positive plate a kind of high is electrolysed the device with low copper solution electrodeposition, it is characterised in that negative electrode is placed in a point liquid
In the middle of every group of special nozzle of spraying system, spacing is 20 ~ 40mm between every group of special nozzle, and it is special that anode is placed in two adjacent groups
Between nozzle, spacing is 60 ~ 100mm between two groups of adjacent special nozzles.
The electrolysis of described device or electrodeposition method, it is characterised in that solution is entered by the conveying of pressure power by pipeline
Enter the honeycomb duct and solution distributor pipe of point liquid spraying system, the speed with 1 ~ 3m/s from the special nozzle on solution distributor pipe is entered
Row injection, forms upward, downward runner in electrolytic cell, while the metal ion of the electrolysis/electrodeposition in make-up solution in time.
Described electrolysis or electrodeposition method, it is characterised in that during Operational preparation, solution is first filled into electrolytic cell, make solution with
Circulation liquid return hole is flushed, and is easy to overflow circulating to return liquid, and when electrolysis or electrodeposition are produced, commutation system is analysed to electricity, copper ion in negative electrode
Go out, the electrolyte or electric effusion being filtered enter leading for point liquid spraying system by forcing dynamical system by pipe-line system
Runner, flows through solution distributor pipe, then is sprayed by special nozzle, is formed upwardly or downwardly between the anode and cathode of electrolytic cell
Two plume roads form sub-circular flowing, and the metal ion that electrolysis or electrodeposition lose is supplemented to upper runner, eliminate electrolysis or electrodeposition
During concentration polarization, downward runner forms inner loop, accelerates to eliminate concentration polarization and accelerate electrolytic process middle-jiao yang, function of the spleen and stomach
The sedimentation of pole mud, inner loop washes away anode, eliminates anodic passivity, while the circulation liquid return hole that solution passes through cell body two ends
Overflow efflux, forms the effect of outer loop, intensified electrolysis or electrodeposition, and after the completion of electrolysis or electrodeposition, copper ion is separated out in negative electrode,
Dress is carried out out, the tough cathode of output reaches the A grades of copper or No. 1 standard copper of GB/T 467-2010 standards.
Described electrolysis or electrodeposition method, it is characterised in that the flow that solution enters cell body is 5 ~ 20m3/h, solution
Hydrojet speed by special nozzle feed liquor is 1 ~ 3m/s, and the flow for circulating liquid return hole is 2.5 ~ 10 m3/h.
Described electrolysis or electrodeposition method, it is characterised in that honeycomb duct is by DN40's in described point of liquid injection feed liquor system
The pipe part assembled formation of CPVC materials, solution distributor pipe is made up of CPVC materials.
By using above-mentioned technology, compared with prior art, the invention has the advantages that：
1）The present invention sprays feed liquor system by using point liquid, and jet electrolytic liquid is entered into electrolytic cell with the speed of 1 ~ 3m/s, carries
For kinetic energy, cathode surface is moved upwards, and anode surface is moved downward, and electrolyte forms " interior circulation ", accelerating anode surface anode
Mud is settled, and eliminates anodic passivity phase film, while overflow is to electrolytic cell two ends liquid outlet, due to force the presence of power again with it is whole
System forming " outer circulation ", eliminates anodic passivity and concentration polarization in miscellaneous anode copper electrolytic process high and eliminates low copper
Concentration polarization phenomenon in solution electrolytic deposition process, breaches miscellaneous anode cupric electrolysis high and low copper solution electrodeposition essence under high current density
Refining technical bottleneck；
2）Device of the invention can be with other equipment such as solution microstrainer, solution transfer pump, point liquid bag, solution storage trough, pipeline
The composition automation PCL controls such as system, dc source, frequency-variable controller, Programmable Logic Controller, save manpower, portable complete
Device, modularization assembling can be compatible with other Waste Water Treatments, accomplishes " plug and play "；
3）The present invention is electrolysed the device with low copper solution electrodeposition by the described composition brass positive plate high obtained using above-mentioned technology,
It is its simple structure, easy to operate, solution is electrolysed using the device or electrodeposition treatment, concentration polarization is eliminated, ensureing
Electrolysis or the electrodeposition of high current density can be carried out in the case of product quality, current efficiency higher is reached, efficient electrolysis with
Electrodeposition mode, reduces production cost, improves labor productivity.
Brief description of the drawings
Fig. 1 is structural representation of the invention；
Fig. 2 is the structural representation that the present invention point liquid sprays feed liquor system；
Fig. 3 is mplifying structure schematic diagram at A-A in Fig. 2；
Fig. 4 is the schematic diagram of situation in electrolytic cell when the present invention is produced；
Electrolytic cell top view when Fig. 5 is for present invention production；
Fig. 6 is the reaction mechanism figure of elimination anodic passivity of the invention and concentration polarization.
In figure：1- cell bodies, 2- points of liquid injection feed liquor system, the special nozzles of 3-, 4- circulation liquid return holes, 5- supernatants are put
Eat dishes without rice or wine, 6- anode drains, 7- honeycomb ducts, 8- solution distributor pipes, 9- anodes, 10- negative electrodes, 11- rubber, copper bar between 12- grooves,
13- insulating glass steel pads.
Specific embodiment
Below in conjunction with Figure of description and embodiment, the invention will be further described, but protection scope of the present invention is simultaneously
It is not limited only to this：
As Figure 1-5, a kind of composition brass positive plate high of the invention is electrolysed the device with low copper solution electrodeposition, including cell body
1 sprays a feed liquor system 2 with point liquid, and the left and right two of cell body 1 is provided with circulation liquid return hole 4, and bottom is provided with supernatant leakage fluid dram 5
With earth of positive pole drain 6, it is characterised in that a point liquid injection feed liquor system 2 is connected and composed by honeycomb duct 7 and solution distributor pipe 8, is led
Runner 7 hangs on the side wall of cell body 1, and solution distributor pipe 8 is located at the bottom of cell body 1, and interval setting is more on solution distributor pipe 8
The special nozzle 3 of group, lays for the rubber 11 with cell insulation on the side wall of cell body 1, on rubber successively between laying groove
Copper bar 12 includes positive pole copper bar and negative pole copper bar, positive pole copper bar and negative pole copper bar point between copper bar 12 and insulating glass steel pad 13, groove
It is not placed on 1 liang of avris wall of cell body, negative electrode 10, spacing between every group of special nozzle 3 is placed in the middle of every group of special nozzle 3
It is 20 ~ 40mm, anode 9 is placed between the special nozzle 3 of two adjacent groups, anode 9 is placed between the special nozzle 3 of two adjacent groups, adjacent
Two groups of special nozzles 3 between spacing be 60 ~ 100mm.
The negative pole copper bar of copper bar 12 between the positive pole copper bar of copper bar 12 between one end link slot of anode 9, one end link slot of negative electrode 10,
The other end is placed on insulating glass steel pad 13, and positive pole copper bar connects the positive pole of commutation system, negative pole copper bar connection commutation system
Negative pole, both positive and negative polarity copper bar connection commutation system, honeycomb duct of the invention 7 is assembled into by the pipe part of the CPVC materials of DN40
Type, solution distributor pipe 8 is made up of CPVC materials, and honeycomb duct 7 is connected with solution distributor pipe 8 by flange, on solution distributor pipe 8 between
Every one group of band internal thread connecting hole of Φ 10 is set, the one end of special nozzle 3 is shower nozzle, and the other end is provided with and threaded connecting hole
The M10 screw thread mouths matched somebody with somebody, are connected through a screw thread on solution distributor pipe 8, as shown in Figure 3.
As shown in figures 1 to 6, the present invention is based on the electrolysis or the electrolysis of electrowinning plant or electrodeposition method, during Operational preparation, first
Solution is filled into electrolytic cell, make solution with circulation liquid return hole 4 flush, be easy to overflow circulating return liquid, commutation system to electricity, electrolysis or
When electrodeposition is produced, the electrolyte or electric effusion that are filtered force the conveying of power by delivery pump etc., are entered by pipeline
Enter the honeycomb duct 7 and solution distributor pipe 8 of point liquid spraying system 2, with 1 ~ 3m/s's in the special nozzle 3 from solution distributor pipe 8
Speed is sprayed, and upward, downward runner is formed in electrolytic cell and forms sub-circular flowing, to upper runner supplement electrolysis or
The metal ion of electrodeposition loss, eliminates the concentration polarization in electrolysis or electrolytic deposition process, and downward runner forms inner loop, accelerates
Eliminate concentration polarization and accelerate the sedimentation of electrolytic process Anodic mud, inner loop washes away anode, eliminates anodic passivity, while
Solution is overflow efflux by the circulation liquid return hole 4 at the two ends of cell body 1, forms the effect of outer loop, intensified electrolysis or electrodeposition,
After the completion of electrolysis or electrodeposition, copper ion is separated out in negative electrode 10, carries out out dress, and the tough cathode of output reaches GB/T 467-2010 marks
The flow that accurate A grades of copper or No. 1 standard copper, wherein solution enter cell body 1 is 5 ~ 20m3/h, and solution passes through special nozzle 3
The hydrojet speed of feed liquor is 1 ~ 3m/s, and the flow for circulating liquid return hole 4 is 2.5 ~ 10 m3/h.
As shown in fig. 6, composition brass positive plate high of the invention is electrolysed the original with low copper solution electrical integration liquid jetting device technology
Reason：
All of electrolysis tech is set up on electrochemistry basic theory, and cyclone electrolytic cell technology is no exception.Traditional electrolysis
Technology is that in the presence of electric field, anion is oriented to anode and moved in the cell body that anode and cathode is placed on slow flowing or is stagnated
Dynamic, to negative electrode displacement, by controlling certain technical conditions, the metal cation to be obtained obtains electricity to cation in negative electrode
Son deposition is separated out, so as to obtain electrolytic production.
Cathode reaction：
Metal ion obtains electronically forming metal in negative electrode
Me+ (aq) + e- →Me(S)
Anode reaction：
The electronics that negative electrode is obtained needs to lose electronics by anode to balance.Anode has several possible reactions, topmost anti-
Should be the water oxygenization generation oxygen in solution, react as follows：
2H2O → O2(g) + 4H+ + 4e-
When the metal concentration reduction in electrolyte, it is difficult to ensure that metal reacts in cathodic reduction without there are other.In metal
The chemical reaction that generation is easiest to when concentration is relatively low is the generation of hydrogen, as follows：
2H+(aq) + 2e- → H2(g)
Composition brass positive plate electrolysis high utilizes a point liquid jetting device with the device and method of low copper solution electrodeposition（DED）To solution in life
Produce in electrolytic cell from forming the inner loop of sub-circular runner to lower flow channel upwards, anode is washed away, on composition brass positive plate high
Indissoluble material moved with to lower flow channel, take bottom of electrolytic tank to, anodic passivity is eliminated, with time-division liquid jetting device（DED）
Due to there is pump etc. to force power to bring copper electrolyte or copper electric effusion, the outside systemic circulation of composition so that because electrolysis or electrodeposition are poor into
The copper ion of change is supplemented, and eliminates concentration polarization.
Composition brass positive plate electrolysis high and the device and method of low copper solution electrodeposition, eliminate concentration polarization, are ensureing product
Electrolysis or the electrodeposition of high current density can be carried out in the case of quality, current efficiency higher is reached, it is efficient to be electrolysed and electrodeposition
Mode, reduces production cost, improves labor productivity.
Embodiment 1：
（1）Composition brass positive plate electrolysis high
Composition brass positive plate average assay high
The copper anode plate impurity content of the composition is high, and copper content is far below general copper anode plate（General electrolytic copper anode plate
Copper content is more than 97%）, passivation phenomenon is easily caused during this kind high composition brass positive plate electrolysis, anodic passivity can cause to produce energy
The loss of power, power consumption expense increase, the Quality Down of tough cathode.
Therefore have that production capacity is low in cathode copper field, comprehensive energy consumption is high, funds tied up are big, composition brass electrolysis high is relatively stranded
It is difficult.
Using device and method of the invention, electrolytic cell is first installed into place completion by diagram（Cell body 1 and point liquid spray
Liquid system 2 is injected, the left and right two of cell body 1 is provided with circulation liquid return hole 4, and bottom is provided with supernatant leakage fluid dram 5 and the earth of positive pole is put
Eat dishes without rice or wine 6, a point liquid injection feed liquor system 2 is connected and composed by honeycomb duct 7 and solution distributor pipe 8, and honeycomb duct 7 hangs on cell body 1
Side wall, solution distributor pipe 8 is located at the bottom of cell body 1, the multigroup special nozzle 3 of interval setting, cell body on solution distributor pipe 8
Laid on 1 side wall for the rubber 11 with cell insulation, copper bar 12 and insulating glass steel pad between laying groove successively on rubber
13, copper bar 12 includes positive pole copper bar and negative pole copper bar between groove, and positive pole copper bar and negative pole copper bar are respectively placed in 1 liang of avris of cell body
On wall, negative electrode 10 is placed in the middle of every group of special nozzle 3, spacing is 20 ~ 40mm between every group of special nozzle 3, two adjacent groups are special
Anode 9 is placed between nozzle processed 3, anode 9 is placed between the special nozzle 3 of two adjacent groups, between two groups of adjacent special nozzles 3 between
Away from being 60 ~ 100mm.The negative pole of copper bar 12 between the positive pole copper bar of copper bar 12 between one end link slot of anode 9, one end link slot of negative electrode 10
Copper bar, the other end is placed on insulating glass steel pad 13, and positive pole copper bar connects the positive pole of commutation system, the connection rectification of negative pole copper bar
The negative pole of system, both positive and negative polarity copper bar connection commutation system, honeycomb duct of the invention 7 by DN40 CPVC materials pipe part group
Type is dressed up, solution distributor pipe 8 is made up of CPVC materials, and honeycomb duct 7 is connected with solution distributor pipe 8 by flange, solution distributor pipe 8
The band internal thread connecting hole of one group of Φ 10 of upper interval setting, one end of special nozzle 3 is shower nozzle, and the other end is provided with and threaded connection
The M10 screw thread mouths of hole matching, are connected through a screw thread on solution distributor pipe 8）, electrolyte（Copper ion concentration is in 45 gram liters
The copper-bath of left and right）Full of electrolytic cell and circulating slot, in main production process, electrolyte is by variable frequency pump from circulating slot
Extract out, plate type heat exchanger is delivered to by the power of pump, flow through point liquid bag and enter leading for point liquid spraying system 2 finally by pipeline
Runner 7 and solution distributor pipe 8, are sprayed in the special nozzle 3 from solution distributor pipe 8 with the speed of 1 ~ 3m/s, are ejected
Electrolyte form sub-circular flowing forming upward, downward runner in electrolytic cell, supplement electrolytic metal to upper runner
Ion, eliminates concentration polarization, and downward runner forms inner loop, accelerates to eliminate concentration polarization and accelerates electrolytic process middle-jiao yang, function of the spleen and stomach
The sedimentation of pole mud, inner loop washes away anode, eliminates anodic passivity, it is to avoid the generation of anodic passivity phenomenon so that production efficiency
Improve, product quality lifting.Solution is overflow efflux by the circulation liquid return hole 4 at the two ends of cell body 1 simultaneously, forms outside following
Ring, strengthen effect, be electrolysed certain hour, after the copper cycle for reaching tough cathode after, copper ion is separated out in negative electrode 10, is gone out
Dress, the tough cathode of output reaches A grades of copper of GB/T 467-2010 standards.Wherein solution enter the flow of cell body 1 for 5 ~
20m3/h, the hydrojet speed that solution passes through the feed liquor of special nozzle 3 is 1 ~ 3m/s, and the flow for circulating liquid return hole 4 is 2.5 ~ 10 m3/
h。
（2）Low copper solution electrodeposition
In the production of traditional copper electrodeposition, mainly due to concentration polarization, the influence of ion concentration so that existing substantially in copper electrodeposition industry
Copper ion concentration efficiently electrodeposition and could obtain the product of high-quality when being more than 30 gram liter.
Apparatus of the present invention and its method, can just obtain high-quality in copper ion concentration more than 12 ~ 15 gram liters and the above
Copper products.The invention device and its method, mainly accelerate solution flowing to eliminate the concentration polarization of low copper solution, weaken all the time
The dilution phenomenon in cathodic region, supplements copper ion in time.Specific implementation is that device first is installed into place（Ibid）, whole system is one
Individual big system, can directly from more than 45 gram liters down electrodeposition to 12 ~ 15 gram liters, it is also possible to the solution in electrolytic cell and circulating slot
All the time 12 ~ 15 gram liters are maintained, liquid inlet volume is controlled from feed liquor.As a example by maintaining 12 ~ 15 gram liter copper ion electrodeposition all the time.
After the solution of secondary filter is full of electrolytic cell and circulating slot, the solution of 12 ~ 15 gram liters is entered by heat exchanger by variable frequency pump
Heating, flows through a point liquid bag, the honeycomb duct 7 and solution distributor pipe 8 of point liquid spraying system 2 is entered by pipeline, from solution distributor pipe 8
On special nozzle 3 in sprayed with the speed of 1 ~ 3m/s, the electrodeposition circulation fluid for ejecting in electrolytic cell formed upwards,
Downward runner forms sub-circular flowing, and the copper ion being lost when supplementing cathodic region electrodeposition to upper runner eliminates concentration polarization,
Downward runner forms inner loop, accelerates to eliminate concentration polarization, cathodic region is maintained at copper ion abundance state as far as possible
Copper ions depletion is eliminated, production efficiency is improved, product quality lifting.Solution loops back liquid by the two ends of cell body 1 simultaneously
The excessive effluxes of mouth 4, form outer loop, strengthen effect.According to the quantity of electrolytic cell, and the amount of removing copper controls electrodeposition high
The supplement of copper solution, electrodeposition certain hour, after the copper cycle for reaching tough cathode after, copper ion is separated out in negative electrode 10, is gone out
Dress, the tough cathode of output reaches No. 1 copper of standard of GB/T 467-2010 standards.Wherein solution is into the flow of cell body 1
5 ~ 20m3/h, the hydrojet speed that solution passes through the feed liquor of special nozzle 3 is 1 ~ 3m/s, and the flow for circulating liquid return hole 4 is 2.5 ~ 10 m
³/h。
Claims (8)
1. a kind of composition brass positive plate high is electrolysed the device with low copper solution electrodeposition, including cell body（1）With a point liquid injection feed liquor
System（2）, cell body（1）Left and right two is provided with circulation liquid return hole（4）, bottom is provided with supernatant leakage fluid dram（5）And the earth of positive pole
Drain（6）, it is characterised in that point liquid injection feed liquor system（2）By honeycomb duct（7）With solution distributor pipe（8）Connect and compose, lead
Runner（7）Hang on cell body（1）Side wall, solution distributor pipe（8）Positioned at cell body（1）Bottom, solution distributor pipe（8）On
The multigroup special nozzle of interval setting（3）, cell body（1）Laid on the wall of side for the rubber with cell insulation（11）, glue
Copper bar between laying groove successively on skin（12）With insulating glass steel pad（13）, every group of special nozzle（3）Place negative electrode in centre（10）, phase
Adjacent two groups of special nozzles（3）Between place anode（9）, anode（9）, negative electrode（10）Copper bar between one end slot（12）, the other end is placed in
Insulating glass steel pad（13）On.
2. a kind of composition brass positive plate high according to claim 1 is electrolysed the device with low copper solution electrodeposition, it is characterised in that
Copper bar between groove（12）Including positive pole copper bar and negative pole copper bar, positive pole copper bar and negative pole copper bar are respectively placed in cell body（1）Both sides
On the wall of side, positive pole copper bar connects the positive pole and anode of commutation system（9）, the negative pole and negative electrode of negative pole copper bar connection commutation system
（10）, both positive and negative polarity copper bar connection commutation system.
3. a kind of composition brass positive plate high according to claim 1 is electrolysed the device with low copper solution electrodeposition, it is characterised in that
Solution distributor pipe（8）One group of band internal thread connecting hole of upper interval setting, special nozzle（3）One end is shower nozzle, the other end be provided with
The M10 screw thread mouths of threaded connecting hole matching, are connected through a screw thread installed in solution distributor pipe（8）On.
4. a kind of composition brass positive plate high according to claim 1 is electrolysed the device with low copper solution electrodeposition, it is characterised in that
Negative electrode（10）It is placed in a point liquid spraying system（2）Every group of special nozzle（3）Centre, every group of special nozzle（3）Between spacing be 20 ~
40mm, anode（9）It is placed in the special nozzle of two adjacent groups（3）Between, spacing is 60 ~ 100mm between two groups of adjacent special nozzles.
5. a kind of electrolysis or electrodeposition method based on claim 1 described device, it is characterised in that solution is by forcing power
Conveying, a point liquid spraying system is entered by pipeline（2）Honeycomb duct（7）With solution distributor pipe（8）, from solution distributor pipe（8）On
Special nozzle（3）In sprayed with the speed of 1 ~ 3m/s, upward, downward runner is formed in electrolytic cell, while in time
The metal ion of the electrolysis/electrodeposition in make-up solution.
6. it is according to claim 5 to be electrolysed or electrodeposition method, it is characterised in that during Operational preparation, solution first to be filled into electrolysis
Groove, makes solution with circulation liquid return hole（4）Flush, be easy to overflow circulating to return liquid, when electrolysis or electrodeposition are produced, commutation system gives electricity,
Copper ion is in negative electrode（10）Separate out, the electrolyte or electric effusion being filtered are entered by forcing dynamical system by pipe-line system
Enter a point liquid spraying system（2）Honeycomb duct（7）, flow through solution distributor pipe（8）, then by special nozzle（3）Sprayed, in electrolysis
The two plume roads for being formed between the anode and cathode of groove upwardly or downwardly form sub-circular flowing, and electrolysis or electrodeposition are supplemented to upper runner
The metal ion of loss, eliminates the concentration polarization in electrolysis or electrolytic deposition process, and downward runner forms inner loop, accelerates to eliminate
Concentration polarization and the sedimentation of acceleration electrolytic process Anodic mud, inner loop are washed away anode, anodic passivity are eliminated, while solution
By cell body（1）The circulation liquid return hole at two ends（4）Overflow efflux, forms the effect of outer loop, intensified electrolysis or electrodeposition,
After the completion of electrolysis or electrodeposition, copper ion is in negative electrode（10）Separate out, carry out out dress, the tough cathode of output reaches GB/T 467-2010
The A grades of copper or No. 1 standard copper of standard.
7. it is according to claim 6 to be electrolysed or electrodeposition method, it is characterised in that solution enters cell body（1）Flow be
5 ~ 20m3/h, solution passes through special nozzle（3）The hydrojet speed of feed liquor is 1 ~ 3m/s, circulates liquid return hole（4）Flow for 2.5 ~
10 m³/h。
8. it is according to claim 6 to be electrolysed or electrodeposition method, it is characterised in that described point of liquid sprays feed liquor system（2）In
Honeycomb duct（7）By the pipe part assembled formation of the CPVC materials of DN40, solution distributor pipe（8）It is made up of CPVC materials.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109487303A (en) * | 2018-12-19 | 2019-03-19 | 吉林紫金铜业有限公司 | A kind of circulation electrolysis unit and technique |
| CN110144616A (en) * | 2019-06-14 | 2019-08-20 | 厦门通富微电子有限公司 | A kind of anode used for electroplating mechanism and electroplanting device |
| CN111304694A (en) * | 2019-11-13 | 2020-06-19 | 铜陵有色金属集团股份有限公司 | Method for directly electrolyzing scrap copper |
| JP2020128580A (en) * | 2019-02-08 | 2020-08-27 | 住友金属鉱山株式会社 | Liquid feeding method of feeding electrolytic solution into electrolysis tank for electrorefining |
| CN113789564A (en) * | 2021-10-26 | 2021-12-14 | 盐城海德能水处理环保工程有限公司 | Plating line liquid supply system |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3966567A (en) * | 1974-10-29 | 1976-06-29 | Continental Oil Company | Electrolysis process and apparatus |
| US5492608A (en) * | 1994-03-14 | 1996-02-20 | The United States Of America As Represented By The Secretary Of The Interior | Electrolyte circulation manifold for copper electrowinning cells which use the ferrous/ferric anode reaction |
| US6398939B1 (en) * | 2001-03-09 | 2002-06-04 | Phelps Dodge Corporation | Method and apparatus for controlling flow in an electrodeposition process |
| CN102851709A (en) * | 2012-09-24 | 2013-01-02 | 杭州百斯特塑焊设备有限公司 | High current density circulating flow anode diaphragm electrolyzer |
| CN104032332A (en) * | 2014-06-04 | 2014-09-10 | 杭州三耐环保科技有限公司 | High-current density metal electrolytic deposition device with bottom inlet liquid circulation and realization method thereof |
| CN104404575A (en) * | 2014-11-28 | 2015-03-11 | 阳谷祥光铜业有限公司 | Metallic electrolytic cell and metal electrolysis process |
| CN105297079A (en) * | 2015-11-15 | 2016-02-03 | 杨伟燕 | Ultra-high current density parallel flow electrolytic cell and liquid outflow device thereof |
| CN105506670A (en) * | 2015-12-18 | 2016-04-20 | 阳谷祥光铜业有限公司 | Device for copper electrolysis or copper electrodeposition, and running method |
| CN206418208U (en) * | 2017-01-18 | 2017-08-18 | 浙江科菲科技股份有限公司 | A kind of high composition brass positive plate electrolysis and the device of low copper solution electrodeposition |
-
2017
- 2017-01-18 CN CN201710034929.XA patent/CN106757152A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3966567A (en) * | 1974-10-29 | 1976-06-29 | Continental Oil Company | Electrolysis process and apparatus |
| US5492608A (en) * | 1994-03-14 | 1996-02-20 | The United States Of America As Represented By The Secretary Of The Interior | Electrolyte circulation manifold for copper electrowinning cells which use the ferrous/ferric anode reaction |
| US6398939B1 (en) * | 2001-03-09 | 2002-06-04 | Phelps Dodge Corporation | Method and apparatus for controlling flow in an electrodeposition process |
| CN102851709A (en) * | 2012-09-24 | 2013-01-02 | 杭州百斯特塑焊设备有限公司 | High current density circulating flow anode diaphragm electrolyzer |
| CN104032332A (en) * | 2014-06-04 | 2014-09-10 | 杭州三耐环保科技有限公司 | High-current density metal electrolytic deposition device with bottom inlet liquid circulation and realization method thereof |
| CN104404575A (en) * | 2014-11-28 | 2015-03-11 | 阳谷祥光铜业有限公司 | Metallic electrolytic cell and metal electrolysis process |
| CN105297079A (en) * | 2015-11-15 | 2016-02-03 | 杨伟燕 | Ultra-high current density parallel flow electrolytic cell and liquid outflow device thereof |
| CN105506670A (en) * | 2015-12-18 | 2016-04-20 | 阳谷祥光铜业有限公司 | Device for copper electrolysis or copper electrodeposition, and running method |
| CN206418208U (en) * | 2017-01-18 | 2017-08-18 | 浙江科菲科技股份有限公司 | A kind of high composition brass positive plate electrolysis and the device of low copper solution electrodeposition |
Non-Patent Citations (2)
| Title |
|---|
| 朱云等: "《冶金设备》", 30 June 2009 * |
| 程永红等: "《铜电解精炼工（铜电解工、硫酸盐工）》", 31 July 2013 * |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109487303A (en) * | 2018-12-19 | 2019-03-19 | 吉林紫金铜业有限公司 | A kind of circulation electrolysis unit and technique |
| JP2020128580A (en) * | 2019-02-08 | 2020-08-27 | 住友金属鉱山株式会社 | Liquid feeding method of feeding electrolytic solution into electrolysis tank for electrorefining |
| JP7309123B2 (en) | 2019-02-08 | 2023-07-18 | 住友金属鉱山株式会社 | Method for supplying electrolyte to electrolytic cell for electrorefining |
| CN110144616A (en) * | 2019-06-14 | 2019-08-20 | 厦门通富微电子有限公司 | A kind of anode used for electroplating mechanism and electroplanting device |
| CN110144616B (en) * | 2019-06-14 | 2020-11-13 | 厦门通富微电子有限公司 | Anode mechanism for electroplating and electroplating device |
| CN111304694A (en) * | 2019-11-13 | 2020-06-19 | 铜陵有色金属集团股份有限公司 | Method for directly electrolyzing scrap copper |
| CN113789564A (en) * | 2021-10-26 | 2021-12-14 | 盐城海德能水处理环保工程有限公司 | Plating line liquid supply system |
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