CN105436138A - Sapphire cleaning device - Google Patents
Sapphire cleaning device Download PDFInfo
- Publication number
- CN105436138A CN105436138A CN201510792687.1A CN201510792687A CN105436138A CN 105436138 A CN105436138 A CN 105436138A CN 201510792687 A CN201510792687 A CN 201510792687A CN 105436138 A CN105436138 A CN 105436138A
- Authority
- CN
- China
- Prior art keywords
- cleaning
- sapphire
- cleaning device
- tank
- rinse bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a sapphire cleaning device. The sapphire cleaning device comprises a cleaning tank and a machine body shell connected with the cleaning tank. The cleaning tank comprises a first cleaning tank body and a second spraying tank. A mega-sonic transducer is arranged at the bottom of the first cleaning tank body. A spraying device is arranged above the second spraying tank. A liquid storage tank is arranged on the right side of the second spraying tank. The spraying device is connected with the liquid storage tank. A control panel is arranged on the machine body shell. In this way, the sapphire cleaning device is simple in structure. A mega-sonic cleaning mode and a spraying cleaning mode are adopted for cleaning a sapphire wafer completely, so that organic matter, metal impurities, contamination particles and fine particles adhering to the surface of the sapphire wafer are effectively removed, and cleaning is complete and effective.
Description
Technical field
The present invention relates to technical field of sapphire treatment, particularly relate to a kind of sapphire cleaning device.
Background technology
Sapphire has the advantages such as hardness is high, fusing point is high, light transmission is good, electrical insulating property is excellent, stable chemical performance, is widely used in the high-tech sectors such as machinery, optics, information.
Sapphire processing rear surface is covered with various foreign-matter contamination, the impurity be adsorbed on Sapphire wafer surface can be divided into molecule-type, ionic and atom type three kinds of situations, absorption affinity wherein between molecule-type impurity and Sapphire wafer surface is more weak, the impurity of ionic and atom type absorption belongs to chemisorbed impurity, its absorption affinity is all stronger, in the ordinary course of things, the amount of atom type adsorbing contaminant is less, therefore when cleaning, can after removing molecule-type impurity, first dispose ionic adsorbing contaminant, and then remove atomic impurity.
Summary of the invention
The technical problem that the present invention mainly solves is to provide a kind of sapphire cleaning device, can clean sapphire wafer comprehensively, effectively removes Sapphire wafer surface attachment organic matter, metal impurities, contamination particle and fine particles, clean effectively comprehensive.
For solving the problems of the technologies described above, the technical scheme that the present invention adopts is: provide a kind of sapphire cleaning device, it is characterized in that, comprise: rinse bath and the body fuselage be connected on rinse bath, described rinse bath comprises the first rinse bath, the second spray groove, the first described bottom of rinse bath is provided with megasonic transducer, spray equipment is provided with above the second described spray groove, the right side of the second spray groove is provided with reservoir, described spray equipment is connected with reservoir, described body fuselage is provided with a control panel.
In a preferred embodiment of the present invention, be closed structure between described body fuselage and rinse bath.
In a preferred embodiment of the present invention, described megasonic transducer is connected with described control panel by mega sonic wave generator.
In a preferred embodiment of the present invention, be deionized water in described reservoir.
In a preferred embodiment of the present invention, described spray equipment is connected with described control panel.
In a preferred embodiment of the present invention, described control panel is connected with power supply.
The invention has the beneficial effects as follows: structure of the present invention is simple, adopt mega sonic wave cleaning and cleaning showers two kinds of cleaning ways, sapphire wafer is cleaned comprehensively, effectively remove Sapphire wafer surface attachment organic matter, metal impurities, contamination particle and fine particles, clean comprehensively effective.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme in the embodiment of the present invention, below the accompanying drawing used required in describing embodiment is briefly described, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings, wherein:
Fig. 1 is the structural representation of a kind of sapphire cleaning device one of the present invention preferred embodiment;
In accompanying drawing, the mark of each parts is as follows: 1-body fuselage, 2-first rinse bath, 3-second spray groove, 4-megasonic transducer, 5-spray equipment, 6-reservoir, 7-control panel.
Detailed description of the invention
Be clearly and completely described to the technical scheme in the embodiment of the present invention below, obviously, described embodiment is only a part of embodiment of the present invention, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making other embodiments all obtained under creative work prerequisite, belong to the scope of protection of the invention.
Refer to Fig. 1, the embodiment of the present invention comprises:
A kind of sapphire cleaning device, it is characterized in that, comprise: rinse bath and the body fuselage 1 be connected on rinse bath, described rinse bath comprises the first rinse bath 2, second spray groove 3, be provided with megasonic transducer 4 bottom the first described rinse bath 2, be provided with spray equipment 5 above the second described spray groove 3, the right side of the second spray groove 3 is provided with reservoir 6, described spray equipment 5 is connected with reservoir 6, described body fuselage 1 is provided with a control panel 7.
Be different from prior art.
In another embodiment, be closed structure between described body fuselage 1 and rinse bath.
In another embodiment, described megasonic transducer 4 is connected with described control panel 7 by mega sonic wave generator, mega sonic wave can form fluid wave bump wafer surface at a high speed, the contamination that Sapphire wafer surface is adhered to and fine particles are forced to remove and enter into cleaning fluid, mega sonic wave cleaning can remove particle wafer surface being less than 0.2 μm, plays the effect that ultrasonic wave does not have.
In another embodiment, be deionized water in described reservoir 6, spray equipment 5 starts, and the deionized water in reservoir 6 is sprayed onto by spray mode on the sapphire wafer in spray groove.
In another embodiment, described spray equipment 5 is connected with described control panel 7.
In another embodiment, described control panel 7 is connected with power supply.
Structure of the present invention is simple, adopts mega sonic wave cleaning and cleaning showers two kinds of cleaning ways, cleans sapphire wafer comprehensively, the effective attachment of removal Sapphire wafer surface organic matter, metal impurities, and contamination particle and fine particles are clean comprehensively effective.
The foregoing is only embodiments of the invention; not thereby the scope of the claims of the present invention is limited; every utilize description of the present invention to do equivalent structure or equivalent flow process conversion; or be directly or indirectly used in other relevant technical field, be all in like manner included in scope of patent protection of the present invention.
Claims (6)
1. a sapphire cleaning device, it is characterized in that, comprise: rinse bath and the body fuselage be connected on rinse bath, described rinse bath comprises the first rinse bath, the second spray groove, the first described bottom of rinse bath is provided with megasonic transducer, and be provided with spray equipment above the second described spray groove, the right side of the second spray groove is provided with reservoir, described spray equipment is connected with reservoir, described body fuselage is provided with a control panel.
2. sapphire cleaning device according to claim 1, is characterized in that, is closed structure between described body fuselage and rinse bath.
3. sapphire cleaning device according to claim 1, is characterized in that, described megasonic transducer is connected with described control panel by mega sonic wave generator.
4. sapphire cleaning device according to claim 1, is characterized in that, is deionized water in described reservoir.
5. sapphire cleaning device according to claim 1, is characterized in that, described spray equipment is connected with described control panel.
6. sapphire cleaning device according to claim 1, is characterized in that, described control panel is connected with power supply.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510792687.1A CN105436138A (en) | 2015-11-18 | 2015-11-18 | Sapphire cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510792687.1A CN105436138A (en) | 2015-11-18 | 2015-11-18 | Sapphire cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105436138A true CN105436138A (en) | 2016-03-30 |
Family
ID=55547025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510792687.1A Pending CN105436138A (en) | 2015-11-18 | 2015-11-18 | Sapphire cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105436138A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108480294A (en) * | 2018-06-08 | 2018-09-04 | 深圳市艺中乐珠宝有限公司 | A kind of cleaning device convenient for jewelry cleaning personnel |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2337593A1 (en) * | 1976-01-12 | 1977-08-05 | Subtil Crepieux | Ultrasonic instrument cleaning equipment - uses single bowl for washing and rinsing with pump in drain pipe |
| US4778535A (en) * | 1982-09-28 | 1988-10-18 | Mccord James W | Vapor generating and recovery apparatus and process |
| JP2009202156A (en) * | 2009-06-05 | 2009-09-10 | Seiko Epson Corp | Cleaning apparatus |
| CN202427668U (en) * | 2011-12-23 | 2012-09-12 | 兴山县峡晶电子有限责任公司 | Equipment for cleaning artificial quartz wafers |
| CN203565412U (en) * | 2013-09-06 | 2014-04-30 | 柏林 | Aviation accessory washing machine |
| CN104550098A (en) * | 2014-12-18 | 2015-04-29 | 无锡科诺达电子有限公司 | Sapphire cleaning device |
| CN204396377U (en) * | 2014-12-16 | 2015-06-17 | 孙晓霞 | A kind of new type ultrasonic cleaning device |
| CN204564659U (en) * | 2015-03-28 | 2015-08-19 | 合肥汇通控股股份有限公司 | Spraying pretreatment ultrasonic cleaner |
| CN105034182A (en) * | 2015-07-13 | 2015-11-11 | 苏州爱彼光电材料有限公司 | Machining method for ultra-thin sapphire flaky bodies |
| CN205289107U (en) * | 2015-11-18 | 2016-06-08 | 无锡科诺达电子有限公司 | Sapphire belt cleaning device |
-
2015
- 2015-11-18 CN CN201510792687.1A patent/CN105436138A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2337593A1 (en) * | 1976-01-12 | 1977-08-05 | Subtil Crepieux | Ultrasonic instrument cleaning equipment - uses single bowl for washing and rinsing with pump in drain pipe |
| US4778535A (en) * | 1982-09-28 | 1988-10-18 | Mccord James W | Vapor generating and recovery apparatus and process |
| JP2009202156A (en) * | 2009-06-05 | 2009-09-10 | Seiko Epson Corp | Cleaning apparatus |
| CN202427668U (en) * | 2011-12-23 | 2012-09-12 | 兴山县峡晶电子有限责任公司 | Equipment for cleaning artificial quartz wafers |
| CN203565412U (en) * | 2013-09-06 | 2014-04-30 | 柏林 | Aviation accessory washing machine |
| CN204396377U (en) * | 2014-12-16 | 2015-06-17 | 孙晓霞 | A kind of new type ultrasonic cleaning device |
| CN104550098A (en) * | 2014-12-18 | 2015-04-29 | 无锡科诺达电子有限公司 | Sapphire cleaning device |
| CN204564659U (en) * | 2015-03-28 | 2015-08-19 | 合肥汇通控股股份有限公司 | Spraying pretreatment ultrasonic cleaner |
| CN105034182A (en) * | 2015-07-13 | 2015-11-11 | 苏州爱彼光电材料有限公司 | Machining method for ultra-thin sapphire flaky bodies |
| CN205289107U (en) * | 2015-11-18 | 2016-06-08 | 无锡科诺达电子有限公司 | Sapphire belt cleaning device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108480294A (en) * | 2018-06-08 | 2018-09-04 | 深圳市艺中乐珠宝有限公司 | A kind of cleaning device convenient for jewelry cleaning personnel |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160330 |