CN105436128A - Sapphire cleaner - Google Patents
Sapphire cleaner Download PDFInfo
- Publication number
- CN105436128A CN105436128A CN201510792551.0A CN201510792551A CN105436128A CN 105436128 A CN105436128 A CN 105436128A CN 201510792551 A CN201510792551 A CN 201510792551A CN 105436128 A CN105436128 A CN 105436128A
- Authority
- CN
- China
- Prior art keywords
- sapphire
- rinse bath
- cleaning
- cleaning tank
- tank body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
Abstract
The invention discloses a sapphire cleaner. The sapphire cleaner comprises a cleaning tank and a machine body shell connected with the cleaning tank in a covering mode. The cleaning tank comprises a first cleaning tank body, a second cleaning tank body, a third cleaning tank body and a drying tank. A cleaning agent bottle is connected above the first cleaning tank body. An ultrasonic transducer is arranged at the bottom of the second cleaning tank body. A mega-sonic transducer is arranged at the bottom of the third cleaning tank body. An electric heating wire is arranged at the bottom of the drying tank. In this way, the sapphire cleaner is simple in structure. Sapphire is cleaned for three times through a cleaning agent, ultrasonic waves and mega-sonic waves respectively to effectively remove organic matter and metal impurities adhere to a sapphire wafer surface. In addition, large contamination particles and fine particles smaller than 0.2 [mu]m on the sapphire wafer surface are removed through ultrasonic wave cleaning and the mega-sonic wave cleaning. Afterwards, heat conduction drying is conducted through the electric heating wire. The process is fast and free of pollution.
Description
Technical field
The present invention relates to technical field of sapphire treatment, particularly relate to a kind of sapphire washer.
Background technology
Sapphire has the advantages such as hardness is high, fusing point is high, light transmission is good, electrical insulating property is excellent, stable chemical performance, is widely used in the high-tech sectors such as machinery, optics, information.
In prior art, gem processing rear surface is covered with various foreign-matter contamination, if cleaned not in time, the quality of jewel will be affected, the impurity be adsorbed on Sapphire wafer surface can be divided into molecule-type, ionic and atom type three kinds of situations, absorption affinity wherein between molecule-type impurity and Sapphire wafer surface is more weak, the impurity of ionic and atom type absorption belongs to chemisorbed impurity, its absorption affinity is all stronger, in the ordinary course of things, the amount of atom type adsorbing contaminant is less, therefore when cleaning, can after removing molecule-type impurity, first dispose ionic adsorbing contaminant, and then remove atomic impurity.
Summary of the invention
The technical problem that the present invention mainly solves is to provide a kind of sapphire washer, can by repeatedly the effective organic matter removed on sapphire wafer of cleaning, metal impurities, bulk contamination particle are even less than 0.2 μm of fine particles.
For solving the problems of the technologies described above, the technical scheme that the present invention adopts is: provide a kind of sapphire washer, it is characterized in that, comprise: rinse bath and connection cover on the body fuselage on rinse bath, described rinse bath comprises the first rinse bath, the second rinse bath, the 3rd rinse bath and drying tank, a cleaning agent bottle is connected with above the first described rinse bath, the second described bottom of rinse bath is provided with ultrasonic transducer, the 3rd described bottom of rinse bath is provided with megasonic transducer, is provided with heating wire bottom described drying tank.
In a preferred embodiment of the present invention, be closed structure between described body fuselage and rinse bath.
In a preferred embodiment of the present invention, described ultrasonic transducer is connected with power supply by supersonic generator.
In a preferred embodiment of the present invention, described megasonic transducer is connected with power supply by mega sonic wave generator.
In a preferred embodiment of the present invention, in described rinse bath, be provided with cleaning platform.
The invention has the beneficial effects as follows: structure of the present invention is simple, cleaning agent, ultrasonic wave and mega sonic wave is utilized to carry out three cleanings respectively to sapphire, the effective attachment of removal Sapphire wafer surface organic matter, metal impurities, and remove the bulk contamination particle of Sapphire wafer surface by ultrasonic wave and mega sonic wave cleaning and be less than 0.2 μm of fine particles, then heating wire is adopted to carry out heat conduction oven dry, pollution-free fast.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme in the embodiment of the present invention, below the accompanying drawing used required in describing embodiment is briefly described, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings, wherein:
Fig. 1 is the structural representation of a kind of sapphire washer one of the present invention preferred embodiment;
In accompanying drawing, the mark of each parts is as follows: 1-body fuselage, 2-first rinse bath, 3-second rinse bath, 4-the 3rd rinse bath, 5-drying tank, 6-cleaning agent bottle, 7-ultrasonic transducer, 8-megasonic transducer, 9-heating wire.
Detailed description of the invention
Be clearly and completely described to the technical scheme in the embodiment of the present invention below, obviously, described embodiment is only a part of embodiment of the present invention, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making other embodiments all obtained under creative work prerequisite, belong to the scope of protection of the invention.
Refer to Fig. 1, the embodiment of the present invention comprises:
A kind of sapphire washer, it is characterized in that, comprise: rinse bath and connection cover on the body fuselage 1 on rinse bath, described rinse bath comprises the first rinse bath 2, second rinse bath 3, the 3rd rinse bath 4 and drying tank 5, a cleaning agent bottle 6 is connected with above the first described rinse bath 2, be provided with ultrasonic transducer 7 bottom the second described rinse bath 3, be provided with megasonic transducer 8 bottom the 3rd described rinse bath 4, bottom described drying tank 5, be provided with heating wire 9.
Be different from prior art.
In another embodiment, be closed structure between described body fuselage 1 and rinse bath.
In another embodiment, described ultrasonic transducer 7 is connected with power supply by supersonic generator, because ultrasonic wave is very not desirable for the removal effect of the molecule being less than 1 μm, so Ultrasonic Cleaning is used for the bulk contamination particle removing Sapphire wafer surface attachment.
In another embodiment, described megasonic transducer 8 is connected with power supply by mega sonic wave generator, mega sonic wave can form fluid wave bump wafer surface at a high speed, the contamination that Sapphire wafer surface is adhered to and fine particles are forced to remove and enter into cleaning fluid, mega sonic wave cleaning can remove particle wafer surface being less than 0.2 μm, plays the effect that ultrasonic wave does not have.
In another embodiment, cleaning platform is provided with in described rinse bath.
Structure of the present invention is simple, cleaning agent, ultrasonic wave and mega sonic wave is utilized to carry out three cleanings respectively to sapphire, the effective attachment of removal Sapphire wafer surface organic matter, metal impurities, and remove the bulk contamination particle of Sapphire wafer surface by ultrasonic wave and mega sonic wave cleaning and be less than 0.2 μm of fine particles, then heating wire is adopted to carry out heat conduction oven dry, pollution-free fast.
The foregoing is only embodiments of the invention; not thereby the scope of the claims of the present invention is limited; every utilize description of the present invention to do equivalent structure or equivalent flow process conversion; or be directly or indirectly used in other relevant technical field, be all in like manner included in scope of patent protection of the present invention.
Claims (5)
1. a sapphire washer, it is characterized in that, comprise: rinse bath and connection cover on the body fuselage on rinse bath, described rinse bath comprises the first rinse bath, the second rinse bath, the 3rd rinse bath and drying tank, a cleaning agent bottle is connected with above the first described rinse bath, the second described bottom of rinse bath is provided with ultrasonic transducer, and the 3rd described bottom of rinse bath is provided with megasonic transducer, is provided with heating wire bottom described drying tank.
2. sapphire washer according to claim 1, is characterized in that, is closed structure between described body fuselage and rinse bath.
3. sapphire washer according to claim 1, is characterized in that, described ultrasonic transducer is connected with power supply by supersonic generator.
4. sapphire washer according to claim 1, is characterized in that, described megasonic transducer is connected with power supply by mega sonic wave generator.
5. sapphire washer according to claim 1, is characterized in that, is provided with cleaning platform in described rinse bath.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510792551.0A CN105436128A (en) | 2015-11-18 | 2015-11-18 | Sapphire cleaner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510792551.0A CN105436128A (en) | 2015-11-18 | 2015-11-18 | Sapphire cleaner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105436128A true CN105436128A (en) | 2016-03-30 |
Family
ID=55547015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510792551.0A Pending CN105436128A (en) | 2015-11-18 | 2015-11-18 | Sapphire cleaner |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105436128A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1833816A (en) * | 2005-11-23 | 2006-09-20 | 周海 | Nano-glass supersmooth processing technique of sapphire crystal sheet |
| JP5530653B2 (en) * | 2009-04-22 | 2014-06-25 | 株式会社プレテック | Substrate holding jig and cleaning device |
| CN104190652A (en) * | 2014-08-11 | 2014-12-10 | 厦门润晶光电有限公司 | Cleaning device and method for medium and large-sized sapphire wafers after patterned etching process |
| CN104438214A (en) * | 2014-12-01 | 2015-03-25 | 中航电测仪器股份有限公司 | Continuous cleaning device and process for ultrathin coil strips |
| CN104842225A (en) * | 2015-04-22 | 2015-08-19 | 苏州爱彼光电材料有限公司 | Wet processing method for large-dimension sapphire substrate surface |
| CN205289100U (en) * | 2015-11-18 | 2016-06-08 | 无锡科诺达电子有限公司 | Sapphire purger |
-
2015
- 2015-11-18 CN CN201510792551.0A patent/CN105436128A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1833816A (en) * | 2005-11-23 | 2006-09-20 | 周海 | Nano-glass supersmooth processing technique of sapphire crystal sheet |
| JP5530653B2 (en) * | 2009-04-22 | 2014-06-25 | 株式会社プレテック | Substrate holding jig and cleaning device |
| CN104190652A (en) * | 2014-08-11 | 2014-12-10 | 厦门润晶光电有限公司 | Cleaning device and method for medium and large-sized sapphire wafers after patterned etching process |
| CN104438214A (en) * | 2014-12-01 | 2015-03-25 | 中航电测仪器股份有限公司 | Continuous cleaning device and process for ultrathin coil strips |
| CN104842225A (en) * | 2015-04-22 | 2015-08-19 | 苏州爱彼光电材料有限公司 | Wet processing method for large-dimension sapphire substrate surface |
| CN205289100U (en) * | 2015-11-18 | 2016-06-08 | 无锡科诺达电子有限公司 | Sapphire purger |
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Legal Events
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160330 |