CN105420254B - 大豆Glyma.04G253500抗病基因的用途 - Google Patents
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Abstract
本发明涉及基因工程技术领域,特别涉及大豆Glyma.04G253500抗病基因及其编码的蛋白质MEKK1与合成方法。具体而言,本发明公开了一种大豆Glyma.04G253500抗病基因的用途,用于提高大豆的抗病性能,包括抗大豆花叶病毒、抗大豆霜霉菌等;所述大豆Glyma.04G253500抗病基因cDNA核苷酸的序列如SEQ ID NO:1所述。
Description
技术领域
本发明涉及基因工程技术领域,特别涉及大豆Glyma.04G253500抗病基因及其编码的蛋白质MEKK1与合成方法。
背景技术
大豆原产于中国,在我国已有5000多年的栽培历史。然而自1996年至2010年间,大豆进口量从110万吨骤然飙升至5480万吨,已严重影响到我国的粮食安全。大豆在高温、高湿的环境中,易遭受多种病原物如病毒、真菌及线虫等的侵染。在我国,危害大豆生产的主要病原物有大豆花叶病毒、亚洲锈病、霜霉病及大豆孢囊线虫病。这些高发的大豆真菌病,病毒病致使我国每年的大豆产量减产高达10-30%。以大豆花叶病毒病为例,全国各地均有发生,侵染区的发生在70-95%以上。植株被病毒侵染后重病年损失10-20%,个别年份或少数地区产量损失可高达50%。病株不但减产而且降低种子质量(如萌发率、蛋白质含量及含油量的降低),从而影响种子商品价值。因此,提高大豆品种的抗病能力是目前大豆育种工作急需解决的关键问题之一。
MAPK通路的基本组成是一种从酵母到人类都保守的三级激酶模式,包括MAPK激酶激酶(MAP kinase kinase kinase,MKKK)、MAPK激酶(MAP kinase kinase,MKK)和MAPK,这三种激酶能依次激活,共同调节着细胞的生长、分化、对环境的应激适应、炎症反应等多种重要的细胞生理/病理过程。
发明内容
本发明要解决的技术问题是提供一种大豆Glyma.04G253500抗病基因的用途。
为了解决上述技术问题,本发明提供一种大豆Glyma.04G253500抗病基因的用途,用于提高大豆的抗病性能;所述大豆Glyma.04G253500抗病基因cDNA核苷酸的序列如SEQID NO:1所述。
作为本发明的大豆Glyma.04G253500抗病基因的用途的改进:所述抗病包括抗大豆花叶病毒(SMV)、抗大豆霜霉菌。
在本发明中,提供了大豆Glyma.04G253500抗病基因及其编码的蛋白质MEKK1与合成方法。
大豆Glyma.04G253500抗病基因的cDNA核苷酸的序列如SEQ ID NO:1所述。
大豆Glyma.04G253500抗病基因编码的蛋白质MEKK1的氨基酸序列如SEQ ID NO:2所述。
大豆Glyma.04G253500抗病基因的合成方法为:提取基因沉默型大豆的RNA,将RNA反转录为cDNA,再以cDNA为模板,以下述序列为引物,通过RT-PCR获得Glyma.04G253500的基因序列,所述引物的序列为:
Glyma.04G253500-F:5’-CCCGAATTCATGCATTACCTATCTCGGATTTT-3’;
Glyma.04G253500-R:5’-CCCGGATCCTTAACCCTTACGGCCGTGA-3’。
本发明还提供了一种MEKK1沉默植株。
本发明利用基因沉默及基因诱导技术,沉默大豆Glyma.04G253500基因,验证其增强大豆抗病的能力;并转入诱导型启动子,增强大豆抗病能力,改良抗病性状。
本发明的有益效果:大豆Glyma.04G253500抗病基因提高了大豆抗病性能;大豆Glyma.04G253500抗病基因的合成方法简单,合成效率高,可以实现工业化生产。
附图说明
下面结合附图对本发明的具体实施方式作进一步详细说明。
图1为Glyma.04G253500抗病基因全长cDNA序列的扩增结果。
图2为沉默GmMEKK1导致大豆植株局部和系统的超敏性细胞的死亡。
图2中:
A为未沉默GmMEKK1的对照组;
B为沉默GmMEKK1的实验组;B中的箭头代表沉默GmMEKK1产生的超敏性细胞坏死斑点;
C为未沉默GmMEKK1的对照组;
D为沉默GmMEKK1的实验组;
E为放大的沉默GmMEKK1的实验组;E中的箭头代表超敏性细胞坏死斑点;
F为放大的未沉默GmMEKK1的对照组;
G为台盼蓝染色的沉默GmMEKK1的实验组植株的系统叶片;G中的箭头代表超敏性细胞坏死斑点;
H为台盼蓝染色的未沉默GmMEKK1的实验组植株的系统叶片;
图3为沉默型大豆植株的MEKK1在转录水平上降低,PR基因诱导沉默植物MEKK1的表达。
图4为沉默GmMEKK1的大豆植株提高了对大豆花叶病毒(SMV)的抗性。
图4中,
A为BPMV-0and GmMEKK1GUS染色结果;
备注说明:下图为上图的局部放大示意图,箭头所指为GUS染色斑点;
B为BPMV-0and GmMEKK1GUS染色斑点直径统计。
图5为沉默GmMEKK1的大豆植物提高了对霜霉病的抗性。
图5中:
A为在BPMV-0植株叶片上检测出大豆霜霉病斑(图A左)。在GmMEKK1植株叶片上未检测出大豆霜霉病斑(图A右);
B为在BPMV-0植株叶肉细胞中观测到大豆霜霉病菌丝;
C为在沉默GmMEKK1植株叶肉细胞中未观测到大豆霜霉病菌丝;
D为在沉默GmMEKK1植株上附着胞和萌发管无法穿透叶表皮细胞;1、2、3代表附着胞,GT分别代表萌发管。
具体实施方式
下面结合图1至图5对本发明的优选实施例进行详细阐述,以使本发明的优点和特征能更易于被本领域技术人员理解,从而对本发明的保护范围做出更为清楚明确的界定。
实施例1.、Glyma.04G253500抗病基因序列合成
1、总RNA的提取,采用Trizol法提取总RNA:
(1)取大豆幼苗植株叶片,并将植株叶片剪碎,去掉叶柄和较粗的叶脉,放入到液氮中预冷的研钵内,向研钵内加液氮并研磨至粉末,将粉末转移至液氮中冷却处理过的1.5ml的离心管内。
(2)向1.5ml的离心管中加1ml TRIZOL,并使离心管漩涡震荡,每震荡一会儿对离心管进行开盖放气处理,防止离心管内的气压变大而使液体迸溅,从而制备得到研磨液。
(3)将制备得到的研磨液装入新的离心管内,将装好研磨液的离心管放在离心机上进行离心处理,该离心机的温度为4℃,转速为12000rpm,离心时间为10min。
(4)吸取离心处理后的离心管的上清液到一个新的离心管中,并将装有上清液的离心管室温放置5min。
(5)向装有上清液的离心管内加0.2ml氯仿,并对离心管盖紧盖子,强力震荡15秒后,室温放置2-3min。
(6)将上述离心管进行离心处理;离心温度为4℃,转速为12000rpm,离心时间为15min。
(7)离心后,离心管有液相和有机相,中间分层,将离心管倾斜45°,用100μl枪头向离心管内轻轻吸出最上面液相装入到新管中;不要吸到中间层和有机层。
(8)加0.5ml异丙醇于新管中,室温放置10min,离心温度为4℃,转速为12000rpm,离心时间10min。
(9)去除新管内的上清液,留沉淀于新管内。
(10)再向新管内加1ml 75%乙醇,将新管震荡,再将新管进行离心处理,离心温度为4℃,转速为7500rpm,离心时间为5min。
(11)再去除上清液,室温放置2-3min。
(12)用20-30μl Rnase-free water重悬,取1μl测浓度。
(13)提取出总RNA。
2、cRNA的合成
具体步骤:
(1)RNA的变性
把RNA放在65℃温度下热变性5min后,立即放于冰上冷却。
(2)反应液配制
(3)逆转录反应
37℃条件下进行15min的逆转录,然后在98℃条件下进行5min的酶失活反应,最后在4℃下保存。
3、以cRNA为模板合成目的片段
具体步骤:
(1)高保真PCR 50μl体系
(2)高保真PCR反应体系
将上述体系混匀,放入PCR仪中,进行反应。
①95℃,3min。
②98℃,10s
③55℃---60℃,15s
④72℃,1min/kb;
⑤72℃,10min。
⑥4℃,永久保存。
注意:②,③,④反应循环35次左右。
(3)琼脂糖凝胶电泳检测PCR结果。结果如图1所示。图左表示目的片段大小为1701bp,图右表示2000bp的DNA Maker。
所得大豆Glyma.04G253500抗病基因cDNA核苷酸的序列如SEQ ID NO:1所述。该大豆Glyma.04G253500抗病基因编码的蛋白质MEKK1的氨基酸序列如SEQ ID NO:2所述。
实施例2、BPMV-Glyma.04G253500载体的构建:
1、载体BPMV-RNA1的酶切
将离心管放置于37℃下酶切3小时,纯化,即,为在PCR、酶切、酶标、或测序反应液中,加3个体积的Buffer PCR-A(若Buffer PCR-A不足100μl,加至100μl);混匀后,转移到DNA制备管中,将DNA制备管置于2ml离心管中,12,000×g离心1min,弃滤液。将制备管置回2ml离心管,加0.7ml Buffer W2,12,000×g离心1min,弃滤液。将制备管置于洁净的1.5ml离心管中,在DNA制备膜正中央加20μl ddH2O,室温静置1min。12,000×g离心1min洗脱DNA。
2、基因片段Glyma.04G253500的酶切
将离心管放置于37℃下酶切3小时,纯化(纯化条件同上),加20μl ddH2O。
3、载体和基因片段的连接
试剂 | 使用量 |
BPMV-RNA1(步骤1所得) | 2μl |
目的基因片段(步骤2所得) | 6μl |
10×T4DNA Ligation | 1μl |
10×T4DNA Ligation Buffer | 1μl |
Total | 10μl |
4、热激转化、鉴定
将20μl重组质粒DNA制剂(步骤3所得)与200μl的感受态DH5α悬液温和混合,置转化管于冰浴30min,再经42℃水浴90s,然后移置冰水中2min。转化管内加入800μl LB培养基后,置37℃的摇床45min。从转化管内提取100ul转化细胞,均匀涂布于LB平板(含相应质粒抗性的抗生素,具体是浓度为50mg/ml的氨苄青霉素抗生素),将LB平板放于37℃过夜培养;生长的菌落基本确定为转化成功的菌株;之后进行质粒的提取鉴定,从而获得质粒BPMV-RNA1-Glyma.04G253500。
备注说明:质粒的提取鉴定按照常规的试剂盒离心提取法进行。具体方法可如下:
①取步骤4中的单菌落,放入5mlLB液体培养基中培养过夜(约12h)。
②取1-4ml在LB培养基中培养过夜的菌液(若使用丰富培养基,菌液体积应减半或更少),12,000×g离心1min,弃尽上清。
③加250μl Buffer S1悬浮细菌沉淀,悬浮需均匀,不应留有小的菌块。
④加250μl Buffer S2,温和并充分地上下翻转4-6次混合均匀使菌体充分裂解,直至形成透亮的溶液。此步骤不宜超过5min。
⑤加350μl Buffer S3,温和并充分地上下翻转混合6-8次,12,000×g离心10min。
⑥吸取步骤4中的离心上清并转移到制备管(置于2ml离心管(试剂盒内提供)中),12,000×g离心1min,弃滤液。
⑦将制备管置回离心管,加500μl Buffer W1,12,000×g离心1min,弃滤液。将制备管置回离心管,加700μl Buffer W2,12,000×g离心1min,弃滤液;以同样的方法再用700μl Buffer W2洗涤一次。弃滤液。
⑧将制备管置回2ml离心管中,12,000×g离心1min。将制备管移入新的1.5ml离心管(试剂盒内提供)中,在制备管膜中央加60-80μl Eluent或去离子水,室温静置1min。12,000×g离心1min。
实施例3、基因枪法创制大豆沉默植株
1、微弹的制备
(1)称取3mg的金粉(直径0.6μm),并放入到1.5mL的离心管内;
(2)向离心管内加50μL无水乙醇,涡旋振荡2~3min;
(3)再将涡旋振荡后的离心管冰浴静置5min并使金粉沉降,10000rpm,离心30s,弃上清液;
(4)重复(2),(3)步骤2次;
(5)加向离心管内加50μL无菌水,涡旋振荡2-3min,充分重悬;
(6)再将离心管冰浴静置5min,10000rpm,离心30s,弃上清液;
(8)重复(5),(6)步骤2次;
(9)再将离心管加50μL无菌水,涡旋1min,-20℃保存。
2、DNA包埋
(1)取步骤1制备得到的微弹放入离心管内并涡旋2-3min,使金粉充分重悬;
(2)向离心管内吸取100μL金粉悬液,分装成2管,每管50μL;
(3)向第一个离心管内加5μL构建成功的质粒BPMV-RNA1-Glyma.04G253500(实施例2所得)、5μL BPMV-RNA2,涡旋振荡3min;向第二个离心管内加5μL质粒BPMV-RNA1、5μLBPMV-RNA2,涡旋振荡3min。
(4)向2个离心管内均加50μL 2.5M CaCl2,涡旋振荡3min;
(5)向2个离心管内均加20μL 0.1M亚精胺,涡旋振荡3min;
(6)将2个离心管冰浴静置15min,10000rpm,离心30s,弃上清液;
(7)向2个离心管内均加250μL无水乙醇,轻轻吹打沉淀重悬,涡旋振荡2-3min,彻底重悬,10000rpm,离心1min,弃上清;
(8)向2个离心管内加60μL无水乙醇,涡旋振荡2-3min;
(9)每轰击一枪加10μL于微粒载片上。(以上步骤加样均在超净台中进行)
3、基因枪轰击
轰击过程按基因枪进行,操作都在超净台上进行,各装置都用75%酒精擦拭干净,可裂膜及微粒载片等均用酒精浸泡并在滤纸上干燥,具体操作步骤如下:
(1)打开真空泵和基因枪的电源开关;
(2)打开氦气瓶阀门,旋转氦气调节杆,使气压高于所选可裂膜压力200psi左右;
(3)旋下可裂膜挡盖,将可裂膜放在挡盖中央,旋上挡盖,用专用扳手加固(可裂膜选7.0MPa);
(4)把微粒发射装置移出轰击室,旋下盖子,放入阻挡网。取10μL步骤2第一管所得的微弹加于微粒载片中央,待其干燥,把微粒载片安装在固定槽中,旋上盖子,将微粒发射装置放回轰击室;
(5)将大豆植株放置在轰击室的适当位置(叶片距微粒发射装置6cm),关上轰击室门;
(6)按VAC开关抽真空。当真空表读数为所需值时(26~28in Hg),开关打到HOLD处,然后按住FIRE开关,当达到适当压力,可裂膜自动破裂后,松开FIRE开关,轰击完成;
(7)将开关打到VENT处,释放轰击室内的真空;
(8)打开轰击室门,取出样品盘;
(9)取出微粒发射装置,卸下微粒载片和阻挡网,阻挡网放入75%的酒精中浸泡;
(10)旋下可裂膜挡盖,清除可裂膜碎片;
(11)第二管微弹使用上述同样的方法操作。
(12)当PDS-1000/He使用完毕,关掉氦气瓶的主阀,按住FIRE开关,放掉气体加速管内的氦气压力,最后关掉一切电源。
4、将两株大豆植株放在黑暗环境中生长一天,之后正常光照培养。第一管微弹基因枪法所得植株即为BPMV-MEKK1(实验组),第二管微弹基因枪法所得植株为BPMV-0(对照组)。一般20-30天出现症状,如图2所示:A,C,F为BPMV-0植株叶片不同放大倍数的图像;B,D,E为BPMV-MEKK1植株叶片不同放大倍数的图像;G为BPMV-MEKK1植株叶片台盼蓝染色的结果;H为BPMV-0植株叶片台盼蓝染色的结果。
实施例4、实时荧光定量PCR
1、植株总RNA的提取,采用Trizol法提取。
(1)取实施例3所得的适量BPMV-MEKK1大豆幼苗植株叶片以及BPMV-0大豆幼苗植株叶片,剪碎去掉叶柄和较粗的叶脉,分别放入在液氮中预冷的研钵中,加液氮快速研磨充分至粉末,将粉末快速转移至1.5ml离心管中(离心管之前要在液氮中冷却)。
(2)向1.5ml的离心管中加1ml TRIZOL(戴手套),漩涡震荡,每震荡一会儿开盖放气,防止气压变大,液体迸溅。
(3)将装好研磨液的离心管放在离心机上离心(温度为4℃,转速12000rpm,离心10min)。
(4)吸取上清液到一个新的离心管中,室温放置5min。
(5)加0.2ml氯仿,盖紧盖子,强力震荡15秒后,室温放置2-3min。
(6)离心(温度为4℃,转速12000rpm,离心15min)。
(7)离心后,有液相和有机相,中间分层,倾斜45°,用100μl枪头轻轻吸出最上面液相转入到新管中(小心不要吸到中间层和有机层)。
(8)加0.5ml异丙醇于新管中,室温放置10min,离心(温度为4℃,转速12000rpm,离心10min)。
(9)去上清,留沉淀(小心吸取)。
(10)加1ml 75%乙醇,震荡,离心(温度为4℃,转速7500rpm,离心5min)。
(11)去上清,室温放置2-3min。
(12)用20-30μl Rnase-free water重悬,取1μl测浓度。
2、RNA质量检测
先用稀释用的Rnase-free水将分光光度计调零,然后取少量RNA溶液,读取其在分光光度计260nm和280nm处的吸收值,测定RNA溶液浓度和纯度。
3、cRNA的合成
以步骤2所得的2种RNA为模版,合成过程等同于实施例1步骤2的cRNA的合成方法。
4、Real Time PCR反应
以Glyma.04G253500为目标基因,GmELF1b做为内参。
按下列组份配制PCR反应液(反应液配制请在冰上进行)。
PCR反应所得结果分别为图3所示:BPMV-MEKK1叶片内基因Glyma.04G253500的表达量比BPMV-0叶片内基因Glyma.04G253500的表达量显著降低。
实施例5、沉默植株抗病毒、抗菌研究
1将SMV病毒通过基因枪接种在大豆叶片上,通过GUS染色检测大豆叶片抗病情况。GUS染色具体方法如下:
(1)X-Gluc,用N-N-二甲基酰胺配成20mM的贮存液,分装成每管100μL,保存于-20℃;
(2)底物溶液(染色液):1mM X-Gluc加入100mM磷酸钠缓冲液(pH=7.0),缓冲液中含10mM EDTA-Na2,1-5mM K3[Fe(CN)6](铁氰化钾),1-5mM K4[Fe(CN)6](亚铁氰化钾),0.001%(V/V)Triton X-100;
(3)将准备好的叶片放入小药瓶,加入染色液浸没试材,封好盖子;
(4)37℃培养箱中温育4小时;
(5)将浸染过的试材转入70%或95%乙醇中脱色2-3次(除去叶绿素),至阴性对照材料呈白色为止,观察实验组结果。
所得结果如图4所示;根据该结果我们能得知:MeKK1沉默体大豆抵抗SMV病毒的能力得到显著增强。
2大豆霜霉菌通过叶面创伤法感染大豆。具体操作步骤如下:
(1)活化菌种:将保存的大豆霜霉菌划线在固体平板培养基上,28℃培养3-5天。
(2)叶面接种:使用金刚砂轻微创伤大豆植株页表面。用打孔器从固体培养基平板上取下大豆霜霉菌菌丝,附菌面与叶片创伤面相贴。
于大豆正常培养条件下放置1h后,去掉页表面菌丝,继续培养2天。之后采用激光共聚焦显微镜观测结果,所述结果为图5,根据该结果我们能得知:MeKK1沉默体大豆抵抗大豆霜霉菌病毒的能力得到显著增强。
最后,还需要注意的是,以上列举的仅是本发明的若干个具体实施例。显然,本发明不限于以上实施例,还可以有许多变形。本领域的普通技术人员能从本发明公开的内容直接导出或联想到的所有变形,均应认为是本发明的保护范围。
Claims (2)
1.大豆Glyma.04G253500抗病基因的用途,其特征在于:用于提高大豆的抗病性能,所述大豆Glyma.04G253500抗病基因cDNA核苷酸的序列如SEQ ID NO:1所述,
所述抗病为抗大豆花叶病毒、抗大豆霜霉菌。
2.制备MEKK1沉默植株的方法,其特征在于:沉默大豆Glyma.04G253500基因,大豆Glyma.04G253500抗病基因cDNA核苷酸的序列如SEQ ID NO:1所述。
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