CN105405734B - 在透射带电粒子显微镜中执行光谱术的方法 - Google Patents

在透射带电粒子显微镜中执行光谱术的方法 Download PDF

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Publication number
CN105405734B
CN105405734B CN201510554068.9A CN201510554068A CN105405734B CN 105405734 B CN105405734 B CN 105405734B CN 201510554068 A CN201510554068 A CN 201510554068A CN 105405734 B CN105405734 B CN 105405734B
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sensor
charged particle
sample
detector
testing result
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Chinese (zh)
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CN105405734A (zh
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E.F.德荣格
S.拉扎
P.C.蒂伊梅杰
R.格尔恩克
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FEI Co
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FEI Co
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0455—Diaphragms with variable aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CN201510554068.9A 2014-09-04 2015-09-02 在透射带电粒子显微镜中执行光谱术的方法 Active CN105405734B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14183576.9 2014-09-04
EP14183576.9A EP2993682A1 (en) 2014-09-04 2014-09-04 Method of performing spectroscopy in a transmission charged-particle microscope

Publications (2)

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CN105405734A CN105405734A (zh) 2016-03-16
CN105405734B true CN105405734B (zh) 2018-03-02

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Country Link
US (1) US9524851B2 (enExample)
EP (2) EP2993682A1 (enExample)
JP (1) JP6162187B2 (enExample)
CN (1) CN105405734B (enExample)

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EP3070732A1 (en) * 2015-03-18 2016-09-21 Fei Company Apparatus and method of performing spectroscopy in a transmission charged-particle microscope
US10495516B2 (en) * 2015-06-30 2019-12-03 Imec Vzw Dedicated transformation spectroscopy
JP2019533819A (ja) * 2016-11-09 2019-11-21 アイメック・ヴェーゼットウェーＩｍｅｃ Ｖｚｗ 組み合わされたｓｔｅｍとｅｄｓの断層撮影のための装置
EP3444836B1 (en) * 2017-08-17 2020-01-29 FEI Company Diffraction pattern detection in a transmission charged particle microscope
US10522323B2 (en) * 2018-04-05 2019-12-31 Fei Company Electron energy loss spectroscopy with adjustable energy resolution
EP3564982A1 (en) * 2018-05-02 2019-11-06 FEI Company Eels detection technique in an electron microscope
US10699875B2 (en) * 2018-11-13 2020-06-30 Fei Company Confocal imaging technique in a charged particle microscope
US11508551B2 (en) * 2018-12-14 2022-11-22 Kla Corporation Detection and correction of system responses in real-time
CN111046325B (zh) * 2019-09-30 2021-11-19 西安交通大学 一种化合物材料电子非弹性散射截面的确定方法
JP2022034866A (ja) * 2020-08-19 2022-03-04 株式会社ニューフレアテクノロジー マルチ電子ビーム検査装置及びその調整方法
US12123816B2 (en) * 2021-06-21 2024-10-22 Fei Company Vibration-free cryogenic cooling
DE102021122388A1 (de) * 2021-08-30 2023-03-02 Carl Zeiss Microscopy Gmbh Teilchenstrahlsäule
US20250069847A1 (en) * 2023-08-22 2025-02-27 Fei Company Differential phase contrast microanalysis using energy loss spectrometers

Citations (5)

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JPS595869U (ja) * 1982-07-02 1984-01-14 日本電子株式会社 可変スリツト装置
JP2000348670A (ja) * 1999-06-08 2000-12-15 Ricoh Co Ltd 電子線分光装置および電子顕微鏡
JP2003114204A (ja) * 2001-10-03 2003-04-18 Canon Inc 状態検出装置および状態検出方法、走査型分析装置および元素分析方法
CN101523171A (zh) * 2005-07-11 2009-09-02 瑞沃瑞公司 用于非破坏性地确定薄膜中元素的分布轮廓的方法和系统
CN102262997A (zh) * 2010-05-12 2011-11-30 Fei公司 同时电子检测

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JPH09330681A (ja) * 1996-06-07 1997-12-22 Ricoh Co Ltd 高分解能電子エネルギー損失分光測定装置
JP2004214057A (ja) * 2003-01-06 2004-07-29 Hitachi High-Technologies Corp 電子線分光器、それを備えた電子顕微鏡及び分析方法
FR2874124B1 (fr) 2004-08-04 2006-10-13 Centre Nat Rech Scient Cnrse Dispositif pour l'acquisition d'images et/ou de spectres de pertes d'energie
JP5663717B2 (ja) * 2005-09-06 2015-02-04 カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ 荷電粒子システム
EP2132763B1 (en) * 2007-02-22 2014-05-07 Applied Materials Israel Ltd. High throughput sem tool
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JP5637841B2 (ja) * 2010-12-27 2014-12-10 株式会社日立ハイテクノロジーズ 検査装置
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Publication number Priority date Publication date Assignee Title
JPS595869U (ja) * 1982-07-02 1984-01-14 日本電子株式会社 可変スリツト装置
JP2000348670A (ja) * 1999-06-08 2000-12-15 Ricoh Co Ltd 電子線分光装置および電子顕微鏡
JP2003114204A (ja) * 2001-10-03 2003-04-18 Canon Inc 状態検出装置および状態検出方法、走査型分析装置および元素分析方法
CN101523171A (zh) * 2005-07-11 2009-09-02 瑞沃瑞公司 用于非破坏性地确定薄膜中元素的分布轮廓的方法和系统
CN102262997A (zh) * 2010-05-12 2011-11-30 Fei公司 同时电子检测

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US20160071689A1 (en) 2016-03-10
EP2993683B1 (en) 2017-04-26
JP2016057294A (ja) 2016-04-21
US9524851B2 (en) 2016-12-20
EP2993682A1 (en) 2016-03-09
JP6162187B2 (ja) 2017-07-12
EP2993683A1 (en) 2016-03-09
CN105405734A (zh) 2016-03-16

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