CN105349967B - 一种应用于薄膜沉积技术的气体分配器 - Google Patents

一种应用于薄膜沉积技术的气体分配器 Download PDF

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Publication number
CN105349967B
CN105349967B CN201510900815.XA CN201510900815A CN105349967B CN 105349967 B CN105349967 B CN 105349967B CN 201510900815 A CN201510900815 A CN 201510900815A CN 105349967 B CN105349967 B CN 105349967B
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China
Prior art keywords
gas
gas distribution
supervisor
mesh network
distribution supervisor
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Chinese (zh)
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CN105349967A (zh
Inventor
苏艳波
赵星梅
克雷格·伯考
兰云峰
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Beijing Naura Microelectronics Equipment Co Ltd
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Beijing North Microelectronics Co Ltd
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Priority to CN201510900815.XA priority Critical patent/CN105349967B/zh
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Priority to PCT/CN2016/108377 priority patent/WO2017097163A1/fr
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
CN201510900815.XA 2015-12-09 2015-12-09 一种应用于薄膜沉积技术的气体分配器 Active CN105349967B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201510900815.XA CN105349967B (zh) 2015-12-09 2015-12-09 一种应用于薄膜沉积技术的气体分配器
PCT/CN2016/108377 WO2017097163A1 (fr) 2015-12-09 2016-12-02 Distributeur de gaz pour utilisation avec une technique de dépôt de film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510900815.XA CN105349967B (zh) 2015-12-09 2015-12-09 一种应用于薄膜沉积技术的气体分配器

Publications (2)

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CN105349967A CN105349967A (zh) 2016-02-24
CN105349967B true CN105349967B (zh) 2018-02-27

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CN201510900815.XA Active CN105349967B (zh) 2015-12-09 2015-12-09 一种应用于薄膜沉积技术的气体分配器

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CN (1) CN105349967B (fr)
WO (1) WO2017097163A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105349967B (zh) * 2015-12-09 2018-02-27 北京北方华创微电子装备有限公司 一种应用于薄膜沉积技术的气体分配器
CN107904573A (zh) * 2017-12-23 2018-04-13 夏禹纳米科技（深圳）有限公司 一种真空化学气相沉积设备中的新型反应控制喷淋装置
CN111270221B (zh) * 2020-04-03 2022-07-22 北京北方华创微电子装备有限公司 半导体设备中的气体分配器和半导体设备
KR20230006543A (ko) * 2020-05-06 2023-01-10 어플라이드 머티어리얼스, 인코포레이티드 가스 분배 조립체
CN112941492B (zh) * 2021-01-19 2022-06-03 华中科技大学 原子层沉积装置与方法
CN115074701B (zh) * 2022-05-31 2023-10-27 北京北方华创微电子装备有限公司 半导体工艺设备的进气装置及半导体工艺设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5781693A (en) * 1996-07-24 1998-07-14 Applied Materials, Inc. Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween
EP1629522A4 (fr) * 2003-05-30 2008-07-23 Aviza Tech Inc Systeme de distribution de gaz
TWI318417B (en) * 2006-11-03 2009-12-11 Ind Tech Res Inst Hollow-type cathode electricity discharging apparatus
CN103194737B (zh) * 2012-01-05 2015-06-10 中国科学院微电子研究所 一种用于原子层沉积设备的气体分配器
US11326255B2 (en) * 2013-02-07 2022-05-10 Uchicago Argonne, Llc ALD reactor for coating porous substrates
CN104046960B (zh) * 2014-06-24 2016-08-17 北京七星华创电子股份有限公司 一种应用于薄膜沉积技术的气体分配器
CN205275699U (zh) * 2015-12-09 2016-06-01 北京七星华创电子股份有限公司 一种气体分配器
CN105349967B (zh) * 2015-12-09 2018-02-27 北京北方华创微电子装备有限公司 一种应用于薄膜沉积技术的气体分配器

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Publication number Publication date
WO2017097163A1 (fr) 2017-06-15
CN105349967A (zh) 2016-02-24

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