CN105319765B - 量子点显示面板的制作方法 - Google Patents
量子点显示面板的制作方法 Download PDFInfo
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- CN105319765B CN105319765B CN201510785942.XA CN201510785942A CN105319765B CN 105319765 B CN105319765 B CN 105319765B CN 201510785942 A CN201510785942 A CN 201510785942A CN 105319765 B CN105319765 B CN 105319765B
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- quantum dot
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- display panel
- membrane substrates
- color membrane
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G02F1/1336—Illuminating devices
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/10—Materials and properties semiconductor
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- G02F2202/00—Materials and properties
- G02F2202/36—Micro- or nanomaterials
Abstract
本发明提供一种量子点显示面板的制作方法,借由彩色滤光片的现有的黄光制程、或结合干法蚀刻制程将含有表面修饰的红色、绿色量子点的树脂组合物制作得到具有较为精细图形结构的量子点层,与其他现有的量子点显示面板的制作方法相比,具有原料制备及制作工艺简单、图形解析度高、可大规模量产等优点,节约了成本与制程时间,且将量子点引入彩色滤光片结构中,可有效提升显示装置的色饱和度与色域,增强显示面板的色彩表现能力。
Description
技术领域
本发明涉及显示技术领域,尤其涉及一种量子点显示面板的制作方法。
背景技术
随着显示技术的不断发展,人们对显示装置的显示质量要求也越来越高。量子点(Quantum Dots,简称QDs)通常是由Ⅱ-Ⅵ、或Ⅲ-Ⅴ族元素组成的球形或类球形的半导体纳米微粒,粒径一般在几纳米至数十纳米之间。由于QDs的粒径尺寸小于或者接近相应体材料的激子波尔半径,会产生量子限域效应,其能级结构从体材料的准连续变为量子点材料的离散结构,导致QDs展示出特殊的受激辐射发光的性能。随着QDs的尺寸减小,其能级带隙增加,相应的QDs受激所需要的能量以及QDs受激后回到基态放出的能量都相应的增大,表现为QDs的激发与荧光光谱的“蓝移”现象,通过控制QDs的尺寸,使其发光光谱可以覆盖整个可见光区域。如硒化镉(CdSe)的尺寸从6.6nm减小至2.0nm,其发光波长从红光区域635nm“蓝移”至蓝光区域的460nm。
量子点材料具有发光光谱集中,色纯度高、且发光颜色可通过量子点材料的尺寸、结构或成分进行简易调节等优点,利用这些优点将其应用在显示装置中可有效地提升显示装置的色域及色彩还原能力。如专利CN102944943A、及专利US20150002788A1均提出了用具有图案结构的量子点层替代彩色滤光膜(Color Filter)以达到彩色显示目的的技术方案,但是该些专利并未对量子点层图形化的方法进行说明。
专利CN103226260A提供了一种把量子点分散于光刻胶中,通过光刻工艺图形化量子点层的方法,但量子点分散于光刻胶中,由于光刻胶中具有起始剂(initiation)、聚合物单体(monomer)、聚合物(polymer)、添加剂(additive)等多种高分子材料,量子点的表面化学环境复杂,对量子点的发光效率影响很大。除上述方法以外,还可以通过转印、网印等方法来制作量子点图形,但是转印的方法所得到的量子点图形分辨率不高,图形边缘呈现锯齿状,并且量子点层与基体的黏着力有待提高;而喷墨打印形成图形化量子点层的方法对喷墨打印设备要求很高,如何保证喷墨墨滴的稳定性及打印精度仍有技术壁垒,仍不能大规模生产。
发明内容
本发明的目的在于提供一种量子点显示面板的制作方法,原料制备及制作工艺简单、图形解析度高、可大规模量产,节约成本与制程时间。
为实现上述目的,本发明提供了量子点显示面板的制作方法,包括如下步骤:
步骤1、将经表面修饰的红色量子点、经表面修饰的绿色量子点、碱可溶性树脂、溶剂、分散剂、及添加剂按一定比例混合均匀,得到量子点树脂组合物;
步骤2、提供彩膜基板,所述彩膜基板包括衬底基板、位于所述衬底基板上的黑色矩阵、及彩色滤光层,所述彩色滤光层包括红色色阻层、绿色色阻层、及透明光阻层;
采用旋涂或狭缝式涂布的方式将所述量子点树脂组合物均匀地涂布在所述彩膜基板的彩色滤光层的一侧,随后,将涂有所述量子点树脂组合物的彩膜基板在100-150℃的温度下进行预烘烤,去除量子点树脂组合物中的有机溶剂,得到量子点膜;
步骤3、采用黄光制程、或结合干法蚀刻制程对所述量子点膜进行图案化处理,去除掉所述量子点膜上对应所述透明光阻层的部分,得到量子点层,进而完成量子点彩膜基板的制作;
步骤4、提供TFT基板,在所述量子点彩膜基板与TFT基板上分别设置上偏光片与下偏光片;并经过液晶成盒制程后得到量子点显示面板;
所述量子点显示面板包括量子点彩膜基板、与所述量子点彩膜基板相对设置的TFT基板、密封于所述量子点彩膜基板与TFT基板之间的液晶层、位于所述量子点彩膜基板一侧的上偏光片、及位于所述TFT基板一侧的下偏光片。
所述步骤3中采用黄光制程对所述量子点膜进行图案化处理,所述步骤3具体包括以下步骤:
步骤31、采用旋涂或狭缝式涂布的方式在所述经预烘烤后得到量子点膜上均匀地涂布一层透明光刻胶材料;
步骤32、提供光罩,利用光罩对所述透明光刻胶材料进行曝光、显影,所述光罩包括对应所述红色色阻层和绿色色阻层的透光部分、及对应所述透明光阻层的不透光部分;在曝光过程中,位于所述透光部分下的透明光刻胶材料在光照下发生聚合反应而固化,位于所述不透光部分下的透明光刻胶材料不发生聚合反应而未固化,在显影过程时,该固化的透明光刻胶材料不会被显影液洗掉,对应的位于其下的量子点膜的部分也会被保留下来,而未固化的光刻胶材料及对应的位于其下的量子点膜的部分会被显影液清洗掉;从而得到图案化的量子点层及位于其上的光阻层;
步骤33、在150-250℃的温度下对所述彩膜基板进行烘烤处理,以对所述量子点层进行充分固化。
所述步骤3中采用黄光制程结合干法蚀刻制程对所述量子点膜进行图案化处理,所述步骤3具体包括以下步骤:
步骤31’、经步骤2的预烘烤后,再在200-250℃的温度下对所述彩膜基板进行烘烤处理,以使得所述量子点膜充分固化;
步骤32’、采用旋涂或狭缝式涂布的方式在所述量子点膜上均匀地涂布一层透明光刻胶材料;提供光罩,利用光罩对所述透明光刻胶材料进行曝光、显影,得到图案化的光阻层;所述光罩包括对应所述红色色阻层和绿色色阻层的透光部分、及对应所述透明光阻层的不透光部分;
步骤33’、以所述光阻层为遮蔽层,采用干法蚀刻工艺对所述彩膜基板进行处理,在干法蚀刻过程中,所述量子点膜的位于所述红色色阻层和绿色色阻层上的部分受到所述光阻层的覆盖保护从而在干法蚀刻过程不被蚀刻掉,而所述量子点膜的位于所述透明光阻层上的部分没有所述光阻层覆盖保护从而在干法蚀刻过程中被蚀刻掉,得到图案化的量子点层。
所述步骤1中,所述量子点树脂组合物中的红色量子点与绿色量子点为Ⅱ-Ⅵ族半导体材料、Ⅲ-Ⅴ族半导体材料、Ⅳ-Ⅵ族纳米半导体材料中的一种或多种,所述红色量子点与绿色量子点的粒径为1-10nm。
所述步骤1中,所述碱可溶性树脂由苯乙烯与马来酸酐共聚物组成、或由苯乙烯与芳香酸(甲基)丙烯酸半酯组成。
所述步骤1中,所述溶剂为甲酸、乙酸、氯仿、丙酮、丁酮、脂肪醇、乙二醇单甲醚、乙二醇单乙醚、乙二醇单丙醚、乙二醇单丁醚、二乙二醇二乙醚乙酸乙酯、甲乙酮、甲基异丁基酮、单甲基醚乙二醇酯、γ-丁内酯、丙酸-3-乙醚乙酯、丁基卡必醇、丁基卡必醇、醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯、环己烷、二甲苯和和异丙醇中的一种或多种组成。
所述步骤2中,在所述彩膜基板上涂布量子点树脂组合物的厚度为1μm-200μm。
所述步骤4中所得到的量子点显示面板中,所述上偏光片采用内置式,所述上偏光片设置于所述量子点彩膜基板面对所述TFT基板的一侧;所述上偏光片为染料系偏光片。
所述步骤4中所得到的量子点显示面板中,所述下偏光片采用内置式或外置式,所述下偏光片设置于所述TFT基板面对或远离所述量子点彩膜基板的一侧;所述下偏光片的偏振方向与上偏光片的偏振方向垂直。
所述步骤4中所得到的量子点显示面板用于背光为蓝光的显示装置中。
本发明的有益效果:本发明提供了一种量子点显示面板的制作方法,借由彩色滤光片的现有的黄光制程、或结合干法蚀刻制程将含有表面修饰的红色、绿色量子点的树脂组合物制作得到具有较为精细图形结构的量子点层,与其他现有的量子点显示面板的制作方法相比,具有原料制备及制作工艺简单、图形解析度高、可大规模量产等优点,节约了成本与制程时间,且将量子点引入彩色滤光片结构中,可有效提升显示装置的色饱和度与色域,增强显示面板的色彩表现能力。
附图说明
下面结合附图,通过对本发明的具体实施方式详细描述,将使本发明的技术方案及其他有益效果显而易见。
附图中,
图1为本发明的量子点显示面板的制作方法的流程示意图;
图2为本发明的量子点显示面板的制作方法的步骤2的示意图;
图3A为本发明的量子点显示面板的制作方法的第一实施例的步骤3中利用光罩对透明光刻胶材料进行曝光的示意图;
图3B为本发明的量子点显示面板的制作方法的第一实施例的步骤3中对透明光刻胶材料进行显影的示意图;
图4A为本发明的量子点显示面板的制作方法的第二实施例的步骤3中得到图案化的光阻层的示意图;
图4B为本发明的量子点显示面板的制作方法的第二实施例的步骤3中以光阻层为遮蔽层对量子点膜进行干法蚀刻的示意图;
图5为本发明的量子点显示面板的制作方法制得的量子点显示面板用于显示装置中进行彩色显示的示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果,以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图1,本发明提供一种量子点显示面板的制作方法,包括如下步骤:
步骤1、将经表面修饰的红色量子点、经表面修饰的绿色量子点、碱可溶性树脂、溶剂、分散剂、及添加剂按一定比例混合均匀,得到量子点树脂组合物;
具体的,所述量子点树脂组合物中的红色量子点与绿色量子点为Ⅱ-Ⅵ族半导体材料(如CdS、CdSe、HgTe、ZnS、ZnSe、ZnTe、HgS)、Ⅲ-Ⅴ族半导体材料(如InP、InAs、GaP、GaAs)、Ⅳ-Ⅵ族纳米半导体材料中的一种或多种,所述红色量子点与绿色量子点的粒径为1-10nm。
具体的,所述碱可溶性树脂由苯乙烯与马来酸酐共聚物组成、或由苯乙烯与芳香酸(甲基)丙烯酸半酯组成。
具体的,所述溶剂为甲酸、乙酸、氯仿、丙酮、丁酮、脂肪醇、乙二醇单甲醚、乙二醇单乙醚、乙二醇单丙醚、乙二醇单丁醚、二乙二醇二乙醚乙酸乙酯、甲乙酮、甲基异丁基酮、单甲基醚乙二醇酯、γ-丁内酯、丙酸-3-乙醚乙酯、丁基卡必醇、丁基卡必醇、醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯、环己烷、二甲苯和和异丙醇中的一种或多种组成。
步骤2、如图2所示,提供彩膜基板,所述彩膜基板包括衬底基板11、位于所述衬底基板11上的黑色矩阵12、及彩色滤光层13,所述彩色滤光层13包括红色色阻层131、绿色色阻层132、及透明光阻层133;所述红色色阻层131包括数个红色子像素单元,所述绿色色阻层132包括数个绿色子像素单元,所述透明光阻层133包括数个透明子像素单元;
采用旋涂(spin)或狭缝式涂布(slit coating)的方式将所述量子点树脂组合物均匀地涂布在所述彩膜基板的彩色滤光层13的一侧,随后,将涂有所述量子点树脂组合物的彩膜基板在100-150℃的温度下进行预烘烤,去除量子点树脂组合物中的有机溶剂,得到量子点膜14’;具体的,所述步骤2中,在所述彩膜基板上涂布量子点树脂组合物的厚度为1μm-200μm。
步骤3、采用黄光制程、或结合干法蚀刻制程对所述量子点膜14’进行图案化处理,去除掉所述量子点膜14’上对应所述透明光阻层133的部分,得到量子点层14,进而完成量子点彩膜基板10的制作;
步骤4、提供TFT基板20,在所述量子点彩膜基板10与TFT基板20上分别设置上偏光片41与下偏光片42;并经过液晶成盒制程后得到量子点显示面板;
所述量子点显示面板包括量子点彩膜基板10、与所述量子点彩膜基板10相对设置的TFT基板20、密封于所述量子点彩膜基板10与TFT基板20之间的液晶层30、位于所述量子点彩膜基板10一侧的上偏光片41、及位于所述TFT基板20一侧的下偏光片42。
具体的,所述步骤4中所得到的量子点显示面板中,所述上偏光片41采用内置式,所述上偏光片41设置于所述量子点彩膜基板10面对所述TFT基板20的一侧;所述上偏光片为染料系偏光片。所述步骤4中所得到的量子点显示面板中,所述下偏光片42采用内置式或外置式,所述下偏光片设置于所述TFT基板20面对或远离所述量子点彩膜基板10的一侧;所述下偏光片42的偏振方向与上偏光片41的偏振方向垂直。
具体的,如图5所示,所述步骤4中所得到的量子点显示面板用于背光为蓝光的显示装置中。背光模组2发出蓝光背光,在蓝色背光的激发下,混有红色与绿色量子点的量子点层14会发出半高宽很窄的红、绿混合光,该混合光随后经过红色色阻层131、绿色色阻层132后分别被滤成高纯度的红色与绿色单色光而分别显红色、绿色;而对应透明光阻层133位置由于没有量子点层覆盖而直接透过蓝色背光而显蓝色;最终提供了彩色显示所需的红、绿、蓝三原色,实现了彩色显示,并能够有效提高显示色域指数,且所述量子点层14内不包含蓝色量子点材料,将蓝光背光与透明光阻层的搭配使用,在提高光利用率的情况下同时缩减了材料成本。本发明的量子点显示面板的制作方法的第一实施例中,所述步骤3中采用黄光制程对所述量子点膜14’进行图案化处理,所述步骤3具体包括以下步骤:
步骤31、采用旋涂或狭缝式涂布的方式在所述经预烘烤后得到量子点膜14’上均匀地涂布一层透明光刻胶材料,如W光刻胶、PFA光刻胶等;
步骤32、如图3A-3B所示,提供光罩50,利用光罩50对所述透明光刻胶材料进行曝光、显影,所述光罩50包括对应所述红色色阻层131和绿色色阻层132的透光部分51、及对应所述透明光阻层133的不透光部分52;在曝光过程中,位于所述透光部分51下的透明光刻胶材料在光照下发生聚合反应而固化,位于所述不透光部分52下的透明光刻胶材料不发生聚合反应而未固化,在显影过程时,该固化的透明光刻胶材料不会被显影液洗掉,对应的位于其下的量子点膜14’的部分也会被保留下来,而未固化的光刻胶材料及对应的位于其下的量子点膜14’的部分会被显影液清洗掉;从而得到图案化的量子点层14及位于其上的光阻层15;
具体的,由于透明光刻胶材料中的光起始剂在紫外光的作用下促使聚合物单体发生聚合反应而使得透明光刻胶材料固化。
步骤33、在150-250℃的温度下对所述彩膜基板进行烘烤处理,以对所述量子点层14进行充分固化。
本发明的量子点显示面板的制作方法的第二实施例中,所述步骤3中采用黄光制程结合干法蚀刻制程对所述量子点膜14’进行图案化处理,所述步骤3具体包括以下步骤:
步骤31’、经步骤2的预烘烤后,再在200-250℃的温度下对所述彩膜基板进行烘烤处理,以使得所述量子点膜14’充分固化;
步骤32’、如图4A所示,采用旋涂或狭缝式涂布的方式在所述量子点膜14’上均匀地涂布一层透明光刻胶材料,如W光刻胶、PFA光刻胶等;提供光罩50,利用光罩50对所述透明光刻胶材料进行曝光、显影,得到图案化的光阻层15;所述光罩50包括对应所述红色色阻层131和绿色色阻层132的透光部分51、及对应所述透明光阻层133的不透光部分52;
步骤33’、如图4B所示,以所述光阻层15为遮蔽层,采用干法蚀刻工艺对所述彩膜基板进行处理,在干法蚀刻过程中,所述量子点膜14’的位于所述红色色阻层131和绿色色阻层132上的部分受到所述光阻层15的覆盖保护从而在干法蚀刻过程不被蚀刻掉,而所述量子点膜14’的位于所述透明光阻层133上的部分没有所述光阻层15覆盖保护从而在干法蚀刻过程中被蚀刻掉,得到图案化的量子点层14。
综上所述,本发明提供了一种量子点显示面板的制作方法,借由彩色滤光片的现有的黄光制程、或结合干法蚀刻制程将含有表面修饰的红色、绿色量子点的树脂组合物制作得到具有较为精细图形结构的量子点层,与其他现有的量子点显示面板的制作方法相比,具有原料制备及制作工艺简单、图形解析度高、可大规模量产等优点,节约了成本与制程时间,且将量子点引入彩色滤光片结构中,可有效提升显示装置的色饱和度与色域,增强显示面板的色彩表现能力。
以上所述,对于本领域的普通技术人员来说,可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形,而所有这些改变和变形都应属于本发明权利要求的保护范围。
Claims (10)
1.一种量子点显示面板的制作方法,包括如下步骤:
步骤1、提供量子点树脂组合物;
步骤2、提供彩膜基板,所述彩膜基板包括衬底基板(11)、位于所述衬底基板(11)上的黑色矩阵(12)及彩色滤光层(13);将所述量子点树脂组合物均匀地涂布在彩膜基板上,得到量子点膜(14’);
步骤3、对所述量子点膜(14’)进行处理,得到量子点层(14),进而完成量子点彩膜基板(10)的制作;
步骤4、提供TFT基板(20),在所述量子点彩膜基板(10)与TFT基板(20)上分别设置上偏光片(41)与下偏光片(42);并经过液晶成盒制程后得到量子点显示面板;
所述量子点显示面板包括量子点彩膜基板(10)、与所述量子点彩膜基板(10)相对设置的TFT基板(20)、密封于所述量子点彩膜基板(10)与TFT基板(20)之间的液晶层(30)、位于所述量子点彩膜基板(10)一侧的上偏光片(41)、及位于所述TFT基板(20)一侧的下偏光片(42);
其特征在于,
所述步骤1中,通过将经表面修饰的红色量子点、经表面修饰的绿色量子点、碱可溶性树脂、溶剂、分散剂、及添加剂按一定比例混合均匀,得到量子点树脂组合物;
所述步骤2中,所述彩色滤光层(13)包括红色色阻层(131)、绿色色阻层(132)及透明光阻层(133);采用旋涂或狭缝式涂布的方式将所述量子点树脂组合物均匀地涂布在所述彩膜基板的彩色滤光层(13)的一侧,随后,将涂有所述量子点树脂组合物的彩膜基板在100-150℃的温度下进行预烘烤,去除量子点树脂组合物中的有机溶剂,得到量子点膜(14’);
所述步骤3中,采用黄光制程、或结合干法蚀刻制程对所述量子点膜(14’)进行图案化处理,去除掉所述量子点膜(14’)上对应所述透明光阻层(133)的部分,得到量子点层(14),进而完成量子点彩膜基板(10)的制作。
2.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤3中采用黄光制程对所述量子点膜(14’)进行图案化处理,所述步骤3具体包括以下步骤:
步骤31、采用旋涂或狭缝式涂布的方式在所述经预烘烤后得到量子点膜(14’)上均匀地涂布一层透明光刻胶材料;
步骤32、提供光罩(50),利用光罩(50)对所述透明光刻胶材料进行曝光、显影,所述光罩(50)包括对应所述红色色阻层(131)和绿色色阻层(132)的透光部分(51)、及对应所述透明光阻层(133)的不透光部分(52);在曝光过程中,位于所述透光部分(51)下的透明光刻胶材料在光照下发生聚合反应而固化,位于所述不透光部分(52)下的透明光刻胶材料不发生聚合反应而未固化,在显影过程时,该固化的透明光刻胶材料不会被显影液洗掉,对应的位于其下的量子点膜(14’)的部分也会被保留下来,而未固化的光刻胶材料及对应的位于其下的量子点膜(14’)的部分会被显影液清洗掉;从而得到图案化的量子点层(14)及位于其上的光阻层(15);
步骤33、在150-250℃的温度下对所述彩膜基板进行烘烤处理,以对所述量子点层(14)进行充分固化。
3.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤3中采用黄光制程结合干法蚀刻制程对所述量子点膜(14’)进行图案化处理,所述步骤3具体包括以下步骤:
步骤31’、经步骤2的预烘烤后,再在200-250℃的温度下对所述彩膜基板进行烘烤处理,以使得所述量子点膜(14’)充分固化;
步骤32’、采用旋涂或狭缝式涂布的方式在所述量子点膜(14’)上均匀地涂布一层透明光刻胶材料;提供光罩(50),利用光罩(50)对所述透明光刻胶材料进行曝光、显影,得到图案化的光阻层(15);所述光罩(50)包括对应所述红色色阻层(131)和绿色色阻层(132)的透光部分(51)、及对应所述透明光阻层(133)的不透光部分(52);
步骤33’、以所述光阻层(15)为遮蔽层,采用干法蚀刻工艺对所述彩膜基板进行处理,在干法蚀刻过程中,所述量子点膜(14’)的位于所述红色色阻层(131)和绿色色阻层(132)上的部分受到所述光阻层(15)的覆盖保护从而在干法蚀刻过程不被蚀刻掉,而所述量子点膜(14’)的位于所述透明光阻层(133)上的部分没有所述光阻层(15)覆盖保护从而在干法蚀刻过程中被蚀刻掉,得到图案化的量子点层(14)。
4.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤1中,所述量子点树脂组合物中的红色量子点与绿色量子点为Ⅱ-Ⅵ族半导体材料、Ⅲ-Ⅴ族半导体材料、Ⅳ-Ⅵ族纳米半导体材料中的一种或多种,所述红色量子点与绿色量子点的粒径为1-10nm。
5.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤1中,所述碱可溶性树脂由苯乙烯与马来酸酐共聚物组成、或由苯乙烯与芳香酸(甲基)丙烯酸半酯组成。
6.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤1中,所述溶剂为甲酸、乙酸、氯仿、丙酮、丁酮、脂肪醇、乙二醇单甲醚、乙二醇单乙醚、乙二醇单丙醚、乙二醇单丁醚、二乙二醇二乙醚乙酸乙酯、甲乙酮、甲基异丁基酮、单甲基醚乙二醇酯、γ-丁内酯、丙酸-3-乙醚乙酯、丁基卡必醇、丁基卡必醇、醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯、环己烷、二甲苯和和异丙醇中的一种或多种组成。
7.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤2中,在所述彩膜基板上涂布量子点树脂组合物的厚度为1μm-200μm。
8.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤4中所得到的量子点显示面板中,所述上偏光片(41)采用内置式,所述上偏光片(41)设置于所述量子点彩膜基板(10)面对所述TFT基板(20)的一侧;所述上偏光片为染料系偏光片。
9.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤4中所得到的量子点显示面板中,所述下偏光片(42)采用内置式或外置式,所述下偏光片设置于所述TFT基板(20)面对或远离所述量子点彩膜基板(10)的一侧;所述下偏光片(42)的偏振方向与上偏光片(41)的偏振方向垂直。
10.如权利要求1所述的量子点显示面板的制作方法,其特征在于,所述步骤4中所得到的量子点显示面板用于背光为蓝光的显示装置中。
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US20180031909A1 (en) | 2018-02-01 |
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