WO2017084149A1 - 彩色滤光基板的制作方法 - Google Patents

彩色滤光基板的制作方法 Download PDF

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Publication number
WO2017084149A1
WO2017084149A1 PCT/CN2015/098507 CN2015098507W WO2017084149A1 WO 2017084149 A1 WO2017084149 A1 WO 2017084149A1 CN 2015098507 W CN2015098507 W CN 2015098507W WO 2017084149 A1 WO2017084149 A1 WO 2017084149A1
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Prior art keywords
quantum dot
sub
pixel regions
filter substrate
color filter
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PCT/CN2015/098507
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English (en)
French (fr)
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唐敏
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深圳市华星光电技术有限公司
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Priority to US14/908,551 priority Critical patent/US20170261849A1/en
Publication of WO2017084149A1 publication Critical patent/WO2017084149A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133617—Illumination with ultraviolet light; Luminescent elements or materials associated to the cell
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133614—Illuminating devices using photoluminescence, e.g. phosphors illuminated by UV or blue light
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133621—Illuminating devices providing coloured light
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/36—Micro- or nanomaterials

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a method for fabricating a color filter substrate.
  • TFT-LCD Thin Film Transistor-Liquid Crystal Display
  • OLED organic light-emitting diode
  • quantum dot displays Due to the extremely narrow wavelength range of Quantum Dots, the color is very pure, and fine adjustment can be realized.
  • the new display The screen also greatly increases the brightness and vividness of the screen while reducing energy consumption.
  • Quantum Dots also known as nanocrystals, are nanoparticles composed of II-VI or III-V elements.
  • the particle size of a quantum dot is generally between 1 and 20 nm. Since electrons and holes are quantum confined, the continuous band structure becomes a discrete energy level structure with molecular characteristics. Therefore, after being excited by blue-violet light, the quantum dots can be converted into high-purity monochromatic light, and the color can be controlled by the diameter of the quantum dots.
  • the panel display technology can effectively improve the color gamut of the panel, that is, the color reproduction capability.
  • quantum dots have been widely used in panel display technology to improve the color gamut of display panels.
  • the combination of quantum dots and photoresists has become a mainstream trend in the production of new color filters.
  • the quantum dot unit price is high, and the cost of fabricating a quantum dot color filter using the existing yellow light etching technique is too high because the utilization of quantum dots is low, and the quantum dots are easily quenched by the photoinitiator, losing light. Conversion function. Therefore, the use of inkjet printing technology (Ink-Jet Printing, IJP) to fabricate quantum dot color filters is considered to be the most feasible technique.
  • IJP Ink-Jet Printing
  • a retaining wall is generally required.
  • many patents have been used to form a black matrix (BM) 200, a photo spacer (PS), or other negative photoresist as a retaining wall on the substrate 100, as shown in FIG.
  • BM black matrix
  • PS photo spacer
  • FIG. 3 if the black matrix 200 is too low, the color mixing problem is easy to occur.
  • FIG. 3 if the black matrix 200 is too high, the liquid crystal arrangement in the vicinity is affected.
  • An object of the present invention is to provide a method for fabricating a color filter substrate, which can effectively solve the problem of color mixing caused by the free flow of quantum dots and the light leakage caused by disorder of liquid crystal arrangement, and the flat color filter substrate is prepared. Good degree.
  • the present invention provides a method for fabricating a color filter substrate, comprising the following steps:
  • Step 1 providing a substrate, forming a black matrix on the substrate, the black matrix enclosing a plurality of sub-pixel regions on the substrate;
  • Step 2 applying a positive photoresist on the black matrix and the substrate, and performing a photolithography process on the positive photoresist to form a light blocking wall on the black matrix;
  • Step 3 providing a quantum dot glue, respectively dropping the quantum dot glue into the plurality of sub-pixel regions;
  • Step 4 performing preliminary curing on the quantum dot glue in the plurality of sub-pixel regions
  • Step 5 performing ultraviolet light irradiation and development process on the light blocking wall, removing the light blocking wall, and solidifying the quantum dots in the plurality of sub-pixel regions to form a quantum dot layer;
  • Step 6 Apply a flat layer on the surface of the substrate, the black matrix, and the quantum dot layer to complete the fabrication of the color filter substrate.
  • the substrate in the step 1 is a transparent substrate.
  • the plurality of sub-pixel regions in the step 1 include a plurality of red sub-pixel regions, a plurality of green sub-pixel regions, and a plurality of blue sub-pixel regions.
  • the quantum dot glue provided in the step 3 includes a red quantum dot glue and a green quantum dot glue; a red quantum dot glue and a green quantum dot glue are respectively dropped into the red and green sub-pixel regions, and the blue sub-pixels are respectively The area remains blank.
  • the quantum dot layer in the step 5 includes a plurality of red quantum dot layers located in a plurality of red sub-pixel regions, and a plurality of green quantum dot layers located in the plurality of green sub-pixel regions.
  • the color filter substrate is used in combination with a blue backlight, and the red quantum dot layer and the green quantum dot layer respectively emit red light and green light under the excitation of the blue backlight; the blue backlight directly transmits The blue sub-pixel area emits blue light, thereby realizing red, green, and blue primary colors, thereby realizing color display.
  • the step 3 drops the quantum dot into the plurality of sub-pixel regions by an inkjet printing process.
  • the step 4 removes the solvent in the quantum dot by a vacuum drying process or a prebaking process to achieve preliminary curing of the quantum dot.
  • the temperature of the prebaking process is 80 to 100 °C.
  • step 5 the quantum dot glue is cured by a baking process.
  • the invention also provides a method for fabricating a color filter substrate, comprising the following steps:
  • Step 1 providing a substrate, forming a black matrix on the substrate, the black matrix enclosing a plurality of sub-pixel regions on the substrate;
  • Step 2 applying a positive photoresist on the black matrix and the substrate, and performing a photolithography process on the positive photoresist to form a light blocking wall on the black matrix;
  • Step 3 providing a quantum dot glue, respectively dropping the quantum dot glue into the plurality of sub-pixel regions;
  • Step 4 performing preliminary curing on the quantum dot glue in the plurality of sub-pixel regions
  • Step 5 performing ultraviolet light irradiation and development process on the light blocking wall, removing the light blocking wall, and solidifying the quantum dots in the plurality of sub-pixel regions to form a quantum dot layer;
  • Step 6 coating a flat layer on the surface of the substrate, the black matrix, and the quantum dot layer, thereby completing the fabrication of the color filter substrate;
  • the substrate in the step 1 is a transparent substrate
  • the plurality of sub-pixel regions in the step 1 includes a plurality of red sub-pixel regions, a plurality of green sub-pixel regions, and a plurality of blue sub-pixel regions;
  • the step 3 drops the quantum dot into the plurality of sub-pixel regions by an inkjet printing process
  • the step 4 uses a vacuum drying process or a pre-baking process to remove the solvent in the quantum dot to achieve preliminary curing of the quantum dot;
  • step 5 the quantum dot glue is cured by a baking process.
  • a light blocking wall is formed on the black matrix by using a positive photoresist to add quantum dot glue
  • the function of the retaining wall is achieved, and the light blocking wall is removed after the function of the retaining wall is realized, the color mixing problem caused by the free flow of the quantum dot due to the low height of the retaining wall in the existing method of manufacturing the color filter substrate is avoided.
  • the light leakage problem caused by the disorder of the liquid crystal arrangement due to the height of the retaining wall is too high, the process is simple, and the flatness of the obtained color filter substrate is good.
  • 1 is a schematic view showing a method of fabricating a conventional color filter substrate
  • FIG. 2 is a schematic view showing a color mixing of a quantum dot glue in a method of fabricating a conventional color filter substrate
  • FIG. 3 is a schematic view showing a light leakage caused by disorder of a liquid crystal arrangement in a conventional color filter substrate
  • FIG. 4 is a flow chart showing a method of fabricating a color filter substrate of the present invention.
  • FIG. 5 is a schematic view showing the first step of the method for fabricating a color filter substrate of the present invention
  • FIG. 6 is a schematic view showing a step 2 of a method of fabricating a color filter substrate of the present invention
  • FIG. 7 is a schematic view showing a step 3 of a method of fabricating a color filter substrate of the present invention.
  • FIG. 8 is a schematic view showing a step 4 of a method of fabricating a color filter substrate of the present invention.
  • FIG. 9 is a schematic view showing a step 5 of a method of fabricating a color filter substrate of the present invention.
  • Figure 10 is a schematic view showing the sixth step of the method of fabricating the color filter substrate of the present invention.
  • the present invention provides a method for fabricating a color filter substrate, comprising the following steps:
  • Step 1 as shown in FIG. 5, a substrate 1 is provided, on which a black matrix 2 is formed, and the black matrix 2 encloses a plurality of sub-pixel regions 10 on the substrate 1.
  • the substrate 1 is a transparent substrate, preferably a glass substrate.
  • the plurality of sub-pixel regions 10 include a plurality of red sub-pixel regions 11 , a plurality of green sub-pixel regions 12 , and a plurality of blue sub-pixel regions 13 .
  • Step 2 as shown in FIG. 6, applying a positive photoresist on the black matrix 2 and the substrate 1, and performing a photolithography process on the positive photoresist to form a light blocking on the black matrix 2.
  • Step 3 As shown in FIG. 7, a quantum dot glue 40 is provided, and the quantum dot glue 40 is dropped into the plurality of sub-pixel regions 10, respectively.
  • the quantum dot glue 40 is a mixture containing quantum dots, a gel material, and a solvent.
  • the rubber material is an aqueous rubber material
  • the solvent is a water-soluble solvent
  • the rubber material is an oil-based rubber material
  • the solvent is an oil-soluble solvent.
  • the quantum dot glue 40 includes a red quantum dot glue 41 and a green quantum dot glue 42. Red quantum dot 41 and green quantum dot 42 are dropped into the red and green sub-pixel regions 11, 12, respectively, and the blue sub-pixel region 13 is left blank.
  • the quantum dot glue 40 is dropped into the plurality of sub-pixel regions 10 by an inkjet printing process.
  • Step 4 As shown in FIG. 8, the quantum dot glue 40 in the plurality of sub-pixel regions 10 is initially cured.
  • the step 4 removes the solvent in the quantum dot 40 by a vacuum drying process or a pre-baking process to achieve preliminary curing of the quantum dot 40.
  • the temperature of the prebaking process is 80 to 100 °C.
  • Step 5 ultraviolet light irradiation and development process is performed on the light blocking wall 3, the light blocking wall 3 is removed, and the quantum dot glue 40 in the plurality of sub-pixel regions 10 is solidified. A quantum dot layer 400 is formed.
  • the quantum dot layer 400 includes a red quantum dot layer 401 located in the red sub-pixel region 11 and a green quantum dot layer 402 located in the green sub-pixel region 12.
  • the quantum dot glue 40 is cured by a baking process.
  • the temperature of the baking process is 100 to 150 °C.
  • Step 6 as shown in FIG. 10, the flat layer 5 is coated on the surface of the substrate 1, the black matrix 2, and the quantum dot layer 400, thereby completing the fabrication of the color filter substrate.
  • the flat layer 5 is made of a transparent material.
  • the color filter substrate can be used in combination with a blue backlight, and the red quantum dot layer 401 and the green quantum dot layer 402 respectively emit red light and green light under the excitation of the blue backlight;
  • the blue backlight directly emits blue light through the blue sub-pixel region 13, thereby realizing three colors of red, green and blue, thereby realizing color display.
  • the color filter substrate can be used for a planar conversion type, a vertical alignment type, or a twisted nematic liquid crystal display panel.
  • a light blocking wall is formed on the black matrix by using a positive photoresist to add quantum dot glue.
  • the function of retaining the wall and removing the light blocking wall after the function of the retaining wall is realized, thereby avoiding the color mixing problem caused by the free flow of the quantum dot due to the low height of the retaining wall in the existing method of manufacturing the color filter substrate, and The light leakage problem caused by the disorder of the liquid crystal arrangement due to the height of the retaining wall is too high, and the process is simple, and the flatness of the obtained color filter substrate is good.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

一种彩色滤光基板的制作方法。该彩色滤光基板的制作方法，在向子像素区域（10）滴加量子点胶（40）之前，利用正型光阻在黑色矩阵（2）上形成光阻挡墙（3），以在滴加量子点胶（40）时起到挡墙功能，并在实现挡墙功能之后将光阻挡墙（3）去除，避免了现有彩色滤光基板的制作方法中由于挡墙高度过低造成量子点胶自由流动而导致的混色问题，以及由于挡墙高度过高造成液晶排布紊乱而导致的漏光问题，工艺简单，所制得的彩色滤光基板的平坦度较好。

Description

彩色滤光基板的制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种彩色滤光基板的制作方法。
背景技术
近年来，随着科技的发展，液晶显示器技术也随之不断完善。TFT-LCD(Thin Film Transistor-Liquid Crystal Display，薄膜场效应晶体管-液晶显示器)以其图像显示品质好、能耗低、环保等优势占据着显示器领域的重要位置，但是其色彩很难覆盖完全的色域。近几年兴起的基于有机发光二极管(OLED)的显示技术也日益成熟，其构造简单，厚度薄，响应速度快，可以实现更加丰富的色彩。同时，随着量子点的诞生，量子点显示器也应运而生，由于量子点(Quantum Dots)发光波长范围极窄，颜色非常纯粹，还可实现精细调节，与目前的显示屏相比，新显示屏在大大提高了亮度和画面鲜艳度的同时，还减少了能耗。
量子点(Quantum Dots，QDs)又可以称纳米晶，是一种由II－VI族或III－V族元素组成的纳米颗粒。量子点的粒径一般介于1～20nm之间，由于电子和空穴被量子限域，连续的能带结构变成具有分子特性的分立能级结构。因此，量子点受到蓝紫光激发后，可转换成高纯度的单色光，颜色可通过量子点的直径控制，应用于面板显示技术可有效地提高面板的色域，即色彩再现能力。
目前量子点已被广泛应用于面板显示技术，用来提升显示面板的色域。其中，将量子点与光刻胶结合，制作成新型的彩色滤光片成为一种主流趋势。然而，量子点单价高，使用现有的黄光蚀刻技术制作量子点彩色滤光片的成本太高，因为量子点的利用率较低，而且量子点容易被光起始剂淬灭，失去光转换功能。因此，利用喷墨打印技术(Ink-Jet Printing，IJP)来制作量子点彩色滤光片被视为可行性最高的技术。
请参阅图1至图3，IJP制程中，为了防止量子点胶300自由流动导致混色，一般需要用到挡墙。如图1所示，已有许多专利利用在基板100上形成黑色矩阵(Black Matrix，BM)200、光阻间隔物(Photo Spacer，PS)、或者其他负型光阻作为挡墙，如图2所示，如果黑色矩阵200挡墙过低则易发生混色问题，如图3所示，如果黑色矩阵200挡墙过高则会影响到附近的液晶排布。
因此，有必要提供一种彩色滤光基板的制作方法，以解决上述问题。
发明内容
本发明的目的在于提供一种彩色滤光基板的制作方法，可有效解决由于量子点胶自由流动导致的混色问题以及液晶排布紊乱导致的漏光问题，且所制得的彩色滤光基板的平坦度较好。
为实现上述目的，本发明提供一种彩色滤光基板的制作方法，包括如下步骤：
步骤1、提供基板，在所述基板上形成黑色矩阵，所述黑色矩阵在所述基板上围出数个子像素区域；
步骤2、在所述黑色矩阵及基板上涂布正型光阻，并对所述正型光阻进行光刻制程，形成位于所述黑色矩阵上的光阻挡墙；
步骤3、提供量子点胶，将所述量子点胶分别滴入所述数个子像素区域；
步骤4、对所述数个子像素区域内的量子点胶进行初步固化；
步骤5、对所述光阻挡墙进行紫外光照射及显影制程，将所述光阻挡墙去除，并将所述数个子像素区域内的量子点胶固化，形成量子点层；
步骤6、在所述基板、黑色矩阵、及量子点层表面涂布平坦层，从而完成彩色滤光基板的制作。
所述步骤1中的基板为透明基板。
所述步骤1中的数个子像素区域包括数个红色子像素区域、数个绿色子像素区域、及数个蓝色子像素区域。
所述步骤3提供的量子点胶包括红色量子点胶、及绿色量子点胶；分别向所述红、绿色子像素区域滴入红色量子点胶、及绿色量子点胶，所述蓝色子像素区域保持空白。
所述步骤5中的量子点层包括位于数个红色子像素区域内的数个红色量子点层、及位于数个绿色子像素区域内的数个绿色量子点层。
所述彩色滤光基板与一蓝色背光源搭配使用，所述红色量子点层、及绿色量子点层在蓝色背光的激发下分别发出红光和绿光；所述蓝色背光直接透过蓝色子像素区域发出蓝光，从而实现红绿蓝三基色，进而实现彩色显示。
所述步骤3通过喷墨打印工艺将所述量子点胶滴入所述数个子像素区域。
所述步骤4利用真空干燥工艺或者预烘烤工艺将量子点胶中的溶剂去除以实现对量子点胶的初步固化。
所述预烘烤工艺的温度为80～100℃。
所述步骤5采用烘烤工艺对量子点胶进行固化。
本发明还提供一种彩色滤光基板的制作方法，包括如下步骤：
步骤1、提供基板，在所述基板上形成黑色矩阵，所述黑色矩阵在所述基板上围出数个子像素区域；
步骤2、在所述黑色矩阵及基板上涂布正型光阻，并对所述正型光阻进行光刻制程，形成位于所述黑色矩阵上的光阻挡墙；
步骤3、提供量子点胶，将所述量子点胶分别滴入所述数个子像素区域；
步骤4、对所述数个子像素区域内的量子点胶进行初步固化；
步骤5、对所述光阻挡墙进行紫外光照射及显影制程，将所述光阻挡墙去除，并将所述数个子像素区域内的量子点胶固化，形成量子点层；
步骤6、在所述基板、黑色矩阵、及量子点层表面涂布平坦层，从而完成彩色滤光基板的制作；
其中，所述步骤1中的基板为透明基板；
其中，所述步骤1中的数个子像素区域包括数个红色子像素区域、数个绿色子像素区域、及数个蓝色子像素区域；
其中，所述步骤3通过喷墨打印工艺将所述量子点胶滴入所述数个子像素区域；
其中，所述步骤4利用真空干燥工艺或者预烘烤工艺将量子点胶中的溶剂去除以实现对量子点胶的初步固化；
其中，所述步骤5采用烘烤工艺对量子点胶进行固化。
本发明的有益效果：本发明的彩色滤光基板的制作方法，在向子像素区域滴加量子点胶之前，利用正型光阻在黑色矩阵上形成光阻挡墙，以在滴加量子点胶时起到挡墙功能，并在实现挡墙功能之后将光阻挡墙去除，避免了现有彩色滤光基板的制作方法中由于挡墙高度过低造成量子点胶自由流动而导致的混色问题，以及由于挡墙高度过高造成液晶排布紊乱而导致的漏光问题，工艺简单，所制得的彩色滤光基板的平坦度较好。
附图说明
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图中，
图1为现有的彩色滤光基板的制作方法的示意图；
图2为现有的彩色滤光基板的制作方法中量子点胶自由流动导致混色的示意图；
图3为现有的彩色滤光基板导致液晶排布紊乱导致漏光的示意图；
图4为本发明的彩色滤光基板的制作方法的流程图；
图5为本发明的彩色滤光基板的制作方法的步骤1的示意图；
图6为本发明的彩色滤光基板的制作方法的步骤2的示意图；
图7为本发明的彩色滤光基板的制作方法的步骤3的示意图；
图8为本发明的彩色滤光基板的制作方法的步骤4的示意图；
图9为本发明的彩色滤光基板的制作方法的步骤5的示意图；
图10为本发明的彩色滤光基板的制作方法的步骤6的示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图4，本发明提供一种彩色滤光基板的制作方法，包括如下步骤：
步骤1、如图5所示，提供基板1，在所述基板1上形成黑色矩阵2，所述黑色矩阵2在所述基板1上围出数个子像素区域10。
具体地，所述基板1为透明基板，优选为玻璃基板。
具体地，所述数个子像素区域10包括数个红色子像素区域11、数个绿色子像素区域12、及数个蓝色子像素区域13。
步骤2、如图6所示，在所述黑色矩阵2及基板1上涂布正型光阻，并对所述正型光阻进行光刻制程，形成位于所述黑色矩阵2上的光阻挡墙3。
步骤3、如图7所示，提供量子点胶40，将所述量子点胶40分别滴入所述数个子像素区域10。
具体地，所述量子点胶40为含有量子点、胶材、及溶剂的混合物。
具体地，所述胶材为水性胶材，所述溶剂为水溶性溶剂，或者所述胶材为油性胶材，所述溶剂为油溶性溶剂。具体地，所述量子点胶40包括红色量子点胶41、及绿色量子点胶42。分别向所述红、绿色子像素区域11、12中滴入红色量子点胶41、及绿色量子点胶42，所述蓝色子像素区域13保持空白。
具体地，通过喷墨打印工艺将所述量子点胶40滴入所述数个子像素区域10。
步骤4、如图8所示，对所述数个子像素区域10内的量子点胶40进行初步固化。
具体地，所述步骤4利用真空干燥工艺或者预烘烤工艺将量子点胶40中的溶剂去除以实现对量子点胶40的初步固化。
具体地，所述预烘烤工艺的温度为80～100℃。
步骤5、如图9所示，对所述光阻挡墙3进行紫外光照射及显影制程，将所述光阻挡墙3去除，并将所述数个子像素区域10内的量子点胶40固化，形成量子点层400。
具体地，所述量子点层400包括位于红色子像素区域11的红色量子点层401、及位于绿色子像素区域12的绿色量子点层402。
具体地，所述步骤5采用烘烤工艺对量子点胶40进行固化。
具体地，所述烘烤工艺的温度为100～150℃。
步骤6、如图10所示，在所述基板1、黑色矩阵2、及量子点层400表面涂布平坦层5，从而完成彩色滤光基板的制作。
具体地，所述平坦层5由透明材料制成。
具体地，所述彩色滤光基板可与一蓝色背光源搭配使用，所述红色量子点层401、及绿色量子点层402在蓝色背光的激发下分别发出红光和绿光；所述蓝色背光直接透过蓝色子像素区域13发出蓝光，从而实现红绿蓝三基色，进而实现彩色显示。所述彩色滤光基板可用于平面转换型、垂直配向型、或扭曲向列型液晶显示面板。
综上所述，本发明的彩色滤光基板的制作方法，在向子像素区域滴加量子点胶之前，利用正型光阻在黑色矩阵上形成光阻挡墙，以在滴加量子点胶时起到挡墙功能，并在实现挡墙功能之后将光阻挡墙去除，避免了现有彩色滤光基板的制作方法中由于挡墙高度过低造成量子点胶自由流动而导致的混色问题，以及由于挡墙高度过高造成液晶排布紊乱而导致的漏光问题，工艺简单，所制得的彩色滤光基板的平坦度较好。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。

Claims (15)

  1. 一种彩色滤光基板的制作方法，包括如下步骤：
    步骤1、提供基板，在所述基板上形成黑色矩阵，所述黑色矩阵在所述基板上围出数个子像素区域；
    步骤2、在所述黑色矩阵及基板上涂布正型光阻，并对所述正型光阻进行光刻制程，形成位于所述黑色矩阵上的光阻挡墙；
    步骤3、提供量子点胶，将所述量子点胶分别滴入所述数个子像素区域；
    步骤4、对所述数个子像素区域内的量子点胶进行初步固化；
    步骤5、对所述光阻挡墙进行紫外光照射及显影制程，将所述光阻挡墙去除，并将所述数个子像素区域内的量子点胶固化，形成量子点层；
    步骤6、在所述基板、黑色矩阵、及量子点层表面涂布平坦层，从而完成彩色滤光基板的制作。
  2. 如权利要求1所述的彩色滤光基板的制作方法，其中，所述步骤1中的基板为透明基板。
  3. 如权利要求1所述的彩色滤光基板的制作方法，其中，所述步骤1中的数个子像素区域包括数个红色子像素区域、数个绿色子像素区域、及数个蓝色子像素区域。
  4. 如权利要求3所述的彩色滤光基板的制作方法，其中，所述步骤3提供的量子点胶包括红色量子点胶、及绿色量子点胶；分别向所述红、绿色子像素区域滴入红色量子点胶、及绿色量子点胶，所述蓝色子像素区域保持空白。
  5. 如权利要求4所述的彩色滤光基板的制作方法，其中，所述步骤5中的量子点层包括位于数个红色子像素区域内的数个红色量子点层、及位于数个绿色子像素区域内的数个绿色量子点层。
  6. 如权利要求5所述的彩色滤光基板的制作方法，其中，所述彩色滤光基板与一蓝色背光源搭配使用，所述红色量子点层、及绿色量子点层在蓝色背光的激发下分别发出红光和绿光；所述蓝色背光直接透过蓝色子像素区域发出蓝光，从而实现红绿蓝三基色，进而实现彩色显示。
  7. 如权利要求1所述的彩色滤光基板的制作方法，其中，所述步骤3通过喷墨打印工艺将所述量子点胶滴入所述数个子像素区域。
  8. 如权利要求1所述的彩色滤光基板的制作方法，其中，所述步骤4利用真空干燥工艺或者预烘烤工艺将量子点胶中的溶剂去除以实现对量子 点胶的初步固化。
  9. 如权利要求8所述的彩色滤光基板的制作方法，其中，所述预烘烤工艺的温度为80～100℃。
  10. 如权利要求1所述的彩色滤光基板的制作方法，其中，所述步骤5采用烘烤工艺对量子点胶进行固化。
  11. 一种彩色滤光基板的制作方法，包括如下步骤：
    步骤1、提供基板，在所述基板上形成黑色矩阵，所述黑色矩阵在所述基板上围出数个子像素区域；
    步骤2、在所述黑色矩阵及基板上涂布正型光阻，并对所述正型光阻进行光刻制程，形成位于所述黑色矩阵上的光阻挡墙；
    步骤3、提供量子点胶，将所述量子点胶分别滴入所述数个子像素区域；
    步骤4、对所述数个子像素区域内的量子点胶进行初步固化；
    步骤5、对所述光阻挡墙进行紫外光照射及显影制程，将所述光阻挡墙去除，并将所述数个子像素区域内的量子点胶固化，形成量子点层；
    步骤6、在所述基板、黑色矩阵、及量子点层表面涂布平坦层，从而完成彩色滤光基板的制作；
    其中，所述步骤1中的基板为透明基板；
    其中，所述步骤1中的数个子像素区域包括数个红色子像素区域、数个绿色子像素区域、及数个蓝色子像素区域；
    其中，所述步骤3通过喷墨打印工艺将所述量子点胶滴入所述数个子像素区域；
    其中，所述步骤4利用真空干燥工艺或者预烘烤工艺将量子点胶中的溶剂去除以实现对量子点胶的初步固化；
    其中，所述步骤5采用烘烤工艺对量子点胶进行固化。
  12. 如权利要求11所述的彩色滤光基板的制作方法，其中，所述步骤3提供的量子点胶包括红色量子点胶、及绿色量子点胶；分别向所述红、绿色子像素区域滴入红色量子点胶、及绿色量子点胶，所述蓝色子像素区域保持空白。
  13. 如权利要求12所述的彩色滤光基板的制作方法，其中，所述步骤5中的量子点层包括位于数个红色子像素区域内的数个红色量子点层、及位于数个绿色子像素区域内的数个绿色量子点层。
  14. 如权利要求13所述的彩色滤光基板的制作方法，其中，所述彩色滤光基板与一蓝色背光源搭配使用，所述红色量子点层、及绿色量子点层在蓝色背光的激发下分别发出红光和绿光；所述蓝色背光直接透过蓝色子 像素区域发出蓝光，从而实现红绿蓝三基色，进而实现彩色显示。
  15. 如权利要求11所述的彩色滤光基板的制作方法，其中，所述预烘烤工艺的温度为80～100℃。
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