CN105278235B - 图案生成方法以及信息处理装置 - Google Patents

图案生成方法以及信息处理装置 Download PDF

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Publication number
CN105278235B
CN105278235B CN201510434239.4A CN201510434239A CN105278235B CN 105278235 B CN105278235 B CN 105278235B CN 201510434239 A CN201510434239 A CN 201510434239A CN 105278235 B CN105278235 B CN 105278235B
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China
Prior art keywords
unit
pattern
auxiliary patterns
area
mask
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CN201510434239.4A
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Chinese (zh)
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CN105278235A (zh
Inventor
石井弘之
中山谅
荒井祯
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Kato Corp
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Kato Corp
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201510434239.4A 2014-07-22 2015-07-22 图案生成方法以及信息处理装置 Active CN105278235B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014149015A JP6415154B2 (ja) 2014-07-22 2014-07-22 パターンの作成方法、プログラムおよび情報処理装置
JP2014-149015 2014-07-22

Publications (2)

Publication Number Publication Date
CN105278235A CN105278235A (zh) 2016-01-27
CN105278235B true CN105278235B (zh) 2019-11-05

Family

ID=55147500

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510434239.4A Active CN105278235B (zh) 2014-07-22 2015-07-22 图案生成方法以及信息处理装置

Country Status (5)

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US (1) US9811623B2 (enExample)
JP (1) JP6415154B2 (enExample)
KR (1) KR101911993B1 (enExample)
CN (1) CN105278235B (enExample)
TW (1) TWI597561B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6238687B2 (ja) * 2013-11-12 2017-11-29 キヤノン株式会社 マスクパターン作成方法、光学像の計算方法
JP7741394B2 (ja) * 2022-03-18 2025-09-18 富士通株式会社 設計プログラム、設計方法及び設計装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003324149A (ja) * 2002-04-26 2003-11-14 Nec Electronics Corp ダミーパターンの自動発生方法
JP4040515B2 (ja) 2003-03-26 2008-01-30 株式会社東芝 マスクのセット、マスクデータ作成方法及びパターン形成方法
JP2004294664A (ja) * 2003-03-26 2004-10-21 Fujitsu Ltd レチクルの作成方法、およびレチクルの作成プログラム
JP3993545B2 (ja) 2003-09-04 2007-10-17 株式会社東芝 パターンの作製方法、半導体装置の製造方法、パターンの作製システム、セルライブラリ、フォトマスクの製造方法
JP4713962B2 (ja) * 2005-06-27 2011-06-29 株式会社東芝 パターン作成方法及び半導体装置製造方法
JP2007057849A (ja) * 2005-08-24 2007-03-08 Toshiba Microelectronics Corp パターン検査方法、露光用マスク、およびパターン検査プログラム
US7873929B2 (en) 2006-08-14 2011-01-18 The Regents Of The University Of California Method, apparatus and system for designing an integrated circuit including generating at least one auxiliary pattern for cell-based optical proximity correction
JP4829742B2 (ja) 2006-10-05 2011-12-07 富士通セミコンダクター株式会社 膜のパターニング方法及び露光用マスク
US8286107B2 (en) 2007-02-20 2012-10-09 Tela Innovations, Inc. Methods and systems for process compensation technique acceleration
US7763398B2 (en) * 2007-05-02 2010-07-27 Dongbu Hitek Co., Ltd. Layout method for mask
JP5106220B2 (ja) 2008-04-10 2012-12-26 キヤノン株式会社 原版データ生成プログラム、原版データ生成方法、照明条件決定プログラム、照明条件決定方法およびデバイス製造方法
US8413083B2 (en) 2009-05-13 2013-04-02 Globalfoundries Singapore Pte. Ltd. Mask system employing substantially circular optical proximity correction target and method of manufacture thereof
CN102738167B (zh) * 2011-03-31 2017-02-22 中国科学院微电子研究所 半导体器件及其形成方法
US8631360B2 (en) * 2012-04-17 2014-01-14 Taiwan Semiconductor Manufacturing Company, Ltd. Methodology of optical proximity correction optimization

Also Published As

Publication number Publication date
CN105278235A (zh) 2016-01-27
KR101911993B1 (ko) 2018-10-25
TW201604645A (zh) 2016-02-01
JP2016024372A (ja) 2016-02-08
US20160026743A1 (en) 2016-01-28
KR20160011586A (ko) 2016-02-01
US9811623B2 (en) 2017-11-07
JP6415154B2 (ja) 2018-10-31
TWI597561B (zh) 2017-09-01

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