CN1050934C - 集成电路的制造方法 - Google Patents
集成电路的制造方法 Download PDFInfo
- Publication number
- CN1050934C CN1050934C CN93118903A CN93118903A CN1050934C CN 1050934 C CN1050934 C CN 1050934C CN 93118903 A CN93118903 A CN 93118903A CN 93118903 A CN93118903 A CN 93118903A CN 1050934 C CN1050934 C CN 1050934C
- Authority
- CN
- China
- Prior art keywords
- layer
- floating grid
- sublayer
- oxidation
- drain region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 64
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 230000015654 memory Effects 0.000 claims abstract description 83
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 48
- 230000003647 oxidation Effects 0.000 claims abstract description 47
- 238000005516 engineering process Methods 0.000 claims description 25
- 239000010703 silicon Substances 0.000 claims description 25
- 229910052710 silicon Inorganic materials 0.000 claims description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 23
- 239000004065 semiconductor Substances 0.000 claims description 20
- 230000004888 barrier function Effects 0.000 claims description 14
- 238000005530 etching Methods 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000003990 capacitor Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 230000005669 field effect Effects 0.000 claims description 3
- 238000009413 insulation Methods 0.000 claims description 2
- 150000003376 silicon Chemical class 0.000 claims description 2
- 239000002784 hot electron Substances 0.000 abstract description 3
- 125000006850 spacer group Chemical group 0.000 abstract description 3
- 238000002347 injection Methods 0.000 abstract description 2
- 239000007924 injection Substances 0.000 abstract description 2
- 238000002513 implantation Methods 0.000 abstract 3
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 120
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 49
- 229920005591 polysilicon Polymers 0.000 description 40
- 230000000694 effects Effects 0.000 description 13
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 230000001590 oxidative effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000003071 parasitic effect Effects 0.000 description 3
- 239000002210 silicon-based material Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000007634 remodeling Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
- H10B41/40—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the peripheral circuit region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
- H10B41/40—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the peripheral circuit region
- H10B41/42—Simultaneous manufacture of periphery and memory cells
- H10B41/43—Simultaneous manufacture of periphery and memory cells comprising only one type of peripheral transistor
- H10B41/48—Simultaneous manufacture of periphery and memory cells comprising only one type of peripheral transistor with a tunnel dielectric layer also being used as part of the peripheral transistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/105—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP92203082 | 1992-10-07 | ||
EP92203082.0 | 1992-10-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1086045A CN1086045A (zh) | 1994-04-27 |
CN1050934C true CN1050934C (zh) | 2000-03-29 |
Family
ID=8210951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN93118903A Expired - Fee Related CN1050934C (zh) | 1992-10-07 | 1993-10-06 | 集成电路的制造方法 |
Country Status (7)
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW322591B (US07224749-20070529-P00002.png) * | 1996-02-09 | 1997-12-11 | Handotai Energy Kenkyusho Kk | |
TW347567B (en) * | 1996-03-22 | 1998-12-11 | Philips Eloctronics N V | Semiconductor device and method of manufacturing a semiconductor device |
US6429120B1 (en) | 2000-01-18 | 2002-08-06 | Micron Technology, Inc. | Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals |
TW332342B (en) * | 1996-11-11 | 1998-05-21 | Mos Electronics Taiwan Inc | Structure and fabrication method of split-gate flash memory |
TW360951B (en) * | 1997-04-01 | 1999-06-11 | Nxp Bv | Method of manufacturing a semiconductor device |
US5885871A (en) * | 1997-07-31 | 1999-03-23 | Stmicrolelectronics, Inc. | Method of making EEPROM cell structure |
US6297111B1 (en) * | 1997-08-20 | 2001-10-02 | Advanced Micro Devices | Self-aligned channel transistor and method for making same |
TW420874B (en) * | 1998-05-04 | 2001-02-01 | Koninkl Philips Electronics Nv | Method of manufacturing a semiconductor device |
US6159795A (en) * | 1998-07-02 | 2000-12-12 | Advanced Micro Devices, Inc. | Low voltage junction and high voltage junction optimization for flash memory |
US6309936B1 (en) * | 1998-09-30 | 2001-10-30 | Advanced Micro Devices, Inc. | Integrated formation of LDD and non-LDD semiconductor devices |
EP0993036A1 (en) * | 1998-10-09 | 2000-04-12 | STMicroelectronics S.r.l. | Method of manufacturing an integrated semiconductor device comprising a floating gate field-effect transistor and a logic-field effect transistor, and corresponding device |
JP2002539637A (ja) | 1999-03-17 | 2002-11-19 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | フローティングゲート電界効果型トランジスタの製造方法 |
US6074908A (en) * | 1999-05-26 | 2000-06-13 | Taiwan Semiconductor Manufacturing Company | Process for making merged integrated circuits having salicide FETS and embedded DRAM circuits |
US6235587B1 (en) * | 1999-10-13 | 2001-05-22 | Advanced Micro Devices, Inc. | Method of manufacturing a semiconductor device with reduced arc loss in peripheral circuitry region |
US6552396B1 (en) * | 2000-03-14 | 2003-04-22 | International Business Machines Corporation | Matched transistors and methods for forming the same |
DE10101270A1 (de) * | 2001-01-12 | 2002-07-25 | Infineon Technologies Ag | Verfahren zur Herstellung von eingebetteten nichtflüchtigen Halbleiterspeicherzellen |
KR100666615B1 (ko) * | 2004-04-14 | 2007-01-09 | 매그나칩 반도체 유한회사 | 플래쉬 메모리 소자 |
US8125044B2 (en) * | 2007-10-26 | 2012-02-28 | Hvvi Semiconductors, Inc. | Semiconductor structure having a unidirectional and a bidirectional device and method of manufacture |
US8133783B2 (en) * | 2007-10-26 | 2012-03-13 | Hvvi Semiconductors, Inc. | Semiconductor device having different structures formed simultaneously |
US7919801B2 (en) * | 2007-10-26 | 2011-04-05 | Hvvi Semiconductors, Inc. | RF power transistor structure and a method of forming the same |
WO2015033181A1 (en) * | 2013-09-05 | 2015-03-12 | Freescale Semiconductor, Inc. | A power field effect transistor, a power field effect transistor device and a method of manufacturing a power field effect transistor |
CN107425069B (zh) * | 2017-07-10 | 2020-04-24 | 东南大学 | 面向物联网的有热电转换的soi基ldmos功率管 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0390219A2 (en) * | 1989-03-31 | 1990-10-03 | Kabushiki Kaisha Toshiba | Semiconductor device and method of manufacturing the same |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5974677A (ja) * | 1982-10-22 | 1984-04-27 | Ricoh Co Ltd | 半導体装置及びその製造方法 |
IT1213249B (it) * | 1984-11-26 | 1989-12-14 | Ates Componenti Elettron | Processo per la fabbricazione distrutture integrate includenti celle di memoria non volatili con strati di silicio autoallineati ed associati transistori. |
US4598460A (en) * | 1984-12-10 | 1986-07-08 | Solid State Scientific, Inc. | Method of making a CMOS EPROM with independently selectable thresholds |
US4775642A (en) * | 1987-02-02 | 1988-10-04 | Motorola, Inc. | Modified source/drain implants in a double-poly non-volatile memory process |
IT1225873B (it) * | 1987-07-31 | 1990-12-07 | Sgs Microelettrica S P A Catan | Procedimento per la fabbricazione di celle di memoria eprom cmos con riduzione del numero di fasi di mascheratura. |
US4859619A (en) * | 1988-07-15 | 1989-08-22 | Atmel Corporation | EPROM fabrication process forming tub regions for high voltage devices |
-
1993
- 1993-10-04 DE DE69320582T patent/DE69320582T2/de not_active Expired - Lifetime
- 1993-10-04 CA CA002107602A patent/CA2107602C/en not_active Expired - Fee Related
- 1993-10-06 CN CN93118903A patent/CN1050934C/zh not_active Expired - Fee Related
- 1993-10-06 KR KR1019930020636A patent/KR100292159B1/ko not_active IP Right Cessation
- 1993-10-06 US US08/132,722 patent/US5395778A/en not_active Expired - Lifetime
- 1993-10-07 JP JP5276149A patent/JPH06236974A/ja active Pending
- 1993-10-14 TW TW082108516A patent/TW237564B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0390219A2 (en) * | 1989-03-31 | 1990-10-03 | Kabushiki Kaisha Toshiba | Semiconductor device and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
CA2107602A1 (en) | 1994-04-08 |
US5395778A (en) | 1995-03-07 |
DE69320582D1 (de) | 1998-10-01 |
JPH06236974A (ja) | 1994-08-23 |
TW237564B (US07224749-20070529-P00002.png) | 1995-01-01 |
CN1086045A (zh) | 1994-04-27 |
KR940010394A (ko) | 1994-05-26 |
CA2107602C (en) | 2004-01-20 |
DE69320582T2 (de) | 1999-04-01 |
KR100292159B1 (ko) | 2001-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: NXP CO., LTD. Free format text: FORMER OWNER: ROYAL PHILIPS ELECTRONICS CO., LTD. Effective date: 20090522 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20090522 Address after: Holland Ian Deho Finn Patentee after: Koninkl Philips Electronics NV Address before: Holland Ian Deho Finn Patentee before: Koninklike Philips Electronics N. V. |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20000329 Termination date: 20101006 |