CN105071202B - 一种一体化气体激光器 - Google Patents
一种一体化气体激光器 Download PDFInfo
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- CN105071202B CN105071202B CN201510501812.9A CN201510501812A CN105071202B CN 105071202 B CN105071202 B CN 105071202B CN 201510501812 A CN201510501812 A CN 201510501812A CN 105071202 B CN105071202 B CN 105071202B
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- 238000010168 coupling process Methods 0.000 claims abstract description 35
- 238000005859 coupling reaction Methods 0.000 claims abstract description 35
- 239000004744 fabric Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 abstract description 14
- 239000000428 dust Substances 0.000 abstract description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 238000010521 absorption reaction Methods 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 238000007789 sealing Methods 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
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- 230000009286 beneficial effect Effects 0.000 description 2
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- VQLYBLABXAHUDN-UHFFFAOYSA-N bis(4-fluorophenyl)-methyl-(1,2,4-triazol-1-ylmethyl)silane;methyl n-(1h-benzimidazol-2-yl)carbamate Chemical compound C1=CC=C2NC(NC(=O)OC)=NC2=C1.C=1C=C(F)C=CC=1[Si](C=1C=CC(F)=CC=1)(C)CN1C=NC=N1 VQLYBLABXAHUDN-UHFFFAOYSA-N 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical group [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
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- 230000001590 oxidative effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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CN201510501812.9A CN105071202B (zh) | 2015-08-14 | 2015-08-14 | 一种一体化气体激光器 |
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CN201510501812.9A CN105071202B (zh) | 2015-08-14 | 2015-08-14 | 一种一体化气体激光器 |
Publications (2)
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CN105071202A CN105071202A (zh) | 2015-11-18 |
CN105071202B true CN105071202B (zh) | 2017-12-22 |
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CN201510501812.9A Active CN105071202B (zh) | 2015-08-14 | 2015-08-14 | 一种一体化气体激光器 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109378683A (zh) * | 2018-10-09 | 2019-02-22 | 苏州紫光伟业激光科技有限公司 | 一种新型的气体激光器 |
US11183808B2 (en) * | 2019-03-20 | 2021-11-23 | Coherent Lasersystems Gmbh & Co. Kg | Excimer laser with uniform beam |
CN113872025A (zh) * | 2020-06-30 | 2021-12-31 | 北京科益虹源光电技术有限公司 | 准分子激光器放电腔的窗片结构及准分子激光器 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1150463A (en) * | 1965-10-14 | 1969-04-30 | Western Electric Co | Improvements in or relating to Gas Lasers |
US3952263A (en) * | 1974-10-04 | 1976-04-20 | The United States Of America As Represented By The United States Energy Research And Development Administration | Fission fragment excited laser system |
US4064466A (en) * | 1975-10-23 | 1977-12-20 | Nippon Electric Company, Ltd. | Linearly polarizing internal mirror type gas laser tube |
CN1595738A (zh) * | 2004-07-02 | 2005-03-16 | 中国科学院安徽光学精密机械研究所 | 波长自选的封离式co2激光谐振腔 |
CN101854023A (zh) * | 2010-05-24 | 2010-10-06 | 中国科学院长春光学精密机械与物理研究所 | 高功率气体co2激光器光学谐振腔 |
CN205212163U (zh) * | 2015-08-14 | 2016-05-04 | 中国科学院光电研究院 | 具有波纹管式腔镜调节装置的气体激光器 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0831640B2 (ja) * | 1986-09-26 | 1996-03-27 | 株式会社東芝 | ガスレ−ザ装置 |
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2015
- 2015-08-14 CN CN201510501812.9A patent/CN105071202B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1150463A (en) * | 1965-10-14 | 1969-04-30 | Western Electric Co | Improvements in or relating to Gas Lasers |
US3952263A (en) * | 1974-10-04 | 1976-04-20 | The United States Of America As Represented By The United States Energy Research And Development Administration | Fission fragment excited laser system |
US4064466A (en) * | 1975-10-23 | 1977-12-20 | Nippon Electric Company, Ltd. | Linearly polarizing internal mirror type gas laser tube |
CN1595738A (zh) * | 2004-07-02 | 2005-03-16 | 中国科学院安徽光学精密机械研究所 | 波长自选的封离式co2激光谐振腔 |
CN101854023A (zh) * | 2010-05-24 | 2010-10-06 | 中国科学院长春光学精密机械与物理研究所 | 高功率气体co2激光器光学谐振腔 |
CN205212163U (zh) * | 2015-08-14 | 2016-05-04 | 中国科学院光电研究院 | 具有波纹管式腔镜调节装置的气体激光器 |
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CN105071202A (zh) | 2015-11-18 |
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Effective date of registration: 20200806 Address after: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee after: Institute of Microelectronics of the Chinese Academy of Sciences Address before: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee before: Aerospace Information Research Institute,Chinese Academy of Sciences Effective date of registration: 20200806 Address after: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee after: Aerospace Information Research Institute,Chinese Academy of Sciences Address before: 100094, No. 9 Deng Nan Road, Beijing, Haidian District Patentee before: Academy of Opto-Electronics, Chinese Academy of Sciences |
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Effective date of registration: 20210311 Address after: 100176 building 10, 156 Jinghai 4th Road, Daxing Economic and Technological Development Zone, Beijing Patentee after: BEIJING RSLASER OPTO-ELECTRONICS TECHNOLOGY Co.,Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics of the Chinese Academy of Sciences |