CN105047512A - 具备多层载物能力的离子束刻蚀系统及其刻蚀方法 - Google Patents
具备多层载物能力的离子束刻蚀系统及其刻蚀方法 Download PDFInfo
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09239564A (ja) * | 1996-03-05 | 1997-09-16 | Toshiba Corp | イオンビーム加工装置、イオンビーム加工方法、マスク及びマスクの製造方法 |
EP1204133A2 (en) * | 2000-11-02 | 2002-05-08 | Hitachi, Ltd. | Method and apparatus for processing a micro sample |
JP2005116787A (ja) * | 2003-10-08 | 2005-04-28 | Canon Inc | イオンミリング装置 |
CN101174098A (zh) * | 2006-10-30 | 2008-05-07 | 应用材料股份有限公司 | 用于等离子体反应器系统的工件旋转装置 |
CN103367087A (zh) * | 2012-03-31 | 2013-10-23 | Fei公司 | 自动化离子束空闲 |
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- 2015-05-29 CN CN201510284879.1A patent/CN105047512B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09239564A (ja) * | 1996-03-05 | 1997-09-16 | Toshiba Corp | イオンビーム加工装置、イオンビーム加工方法、マスク及びマスクの製造方法 |
EP1204133A2 (en) * | 2000-11-02 | 2002-05-08 | Hitachi, Ltd. | Method and apparatus for processing a micro sample |
JP2005116787A (ja) * | 2003-10-08 | 2005-04-28 | Canon Inc | イオンミリング装置 |
CN101174098A (zh) * | 2006-10-30 | 2008-05-07 | 应用材料股份有限公司 | 用于等离子体反应器系统的工件旋转装置 |
CN103367087A (zh) * | 2012-03-31 | 2013-10-23 | Fei公司 | 自动化离子束空闲 |
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Effective date of registration: 20190506 Address after: Room 305, Building 2, No. 3877, Tingwei Road, Jinshan Industrial Park, Shanghai, 200540 Patentee after: Shanghai Fanfeng Vacuum Technology Co.,Ltd. Address before: 2004 No. 267 Yinlu, Baoshan City Industrial Park, Baoshan District, Shanghai Patentee before: Optorun (Shanghai) Co.,Ltd. |
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Effective date of registration: 20230810 Address after: No. 267 297, Chengyin Road, Baoshan City Industrial Park, Shanghai 200444 Patentee after: OPTORUN (SHANGHAI) Co.,Ltd. Address before: Room 305, Building 2, No. 3877, Tingwei Road, Jinshan Industrial Park, Shanghai, 200540 Patentee before: Shanghai Fanfeng Vacuum Technology Co.,Ltd. |