CN105043244B - A kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and measuring method - Google Patents

A kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and measuring method Download PDF

Info

Publication number
CN105043244B
CN105043244B CN201510289679.5A CN201510289679A CN105043244B CN 105043244 B CN105043244 B CN 105043244B CN 201510289679 A CN201510289679 A CN 201510289679A CN 105043244 B CN105043244 B CN 105043244B
Authority
CN
China
Prior art keywords
photodetector
interference
corner reflector
laser beam
reflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201510289679.5A
Other languages
Chinese (zh)
Other versions
CN105043244A (en
Inventor
张白
郑华
赵霞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Runxile Biotechnology (Yangzhou) Co.,Ltd.
Original Assignee
North Minzu University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by North Minzu University filed Critical North Minzu University
Priority to CN201510289679.5A priority Critical patent/CN105043244B/en
Publication of CN105043244A publication Critical patent/CN105043244A/en
Application granted granted Critical
Publication of CN105043244B publication Critical patent/CN105043244B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

The present invention relates to a kind of Precision Inspection and instrument field, more particularly to a kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and measuring method, the contrast anti-interference fine motion corner reflector laser interferometer, include lasing light emitter, fine motion corner reflector, interferometry photodetector, mobile corner reflector, it is divided microscope group and micromotion platform, the fine motion corner reflector is arranged on the micromotion platform, also include reflection measurement photodetector, laser beam is also formed with reflection laser beam after the mobile corner reflector reflexes to the light splitting microscope group, the reflection laser beam is to the reflection measurement photodetector.The laser interferometer of the application, because reflection measurement photodetector can measure the intensity of mobile corner reflector reflection laser beam, the interference state of laser interference light beam is determined according to the intensity of reflection laser beam, so realize the purpose of environment resistant interference.

Description

A kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and survey Amount method
Technical field
The present invention relates to a kind of Precision Inspection and instrument field, more particularly to a kind of contrast anti-interference fine motion angle is anti- Penetrate mirror laser interferometer and scaling method and measuring method.
Background technology
The appearance of laser, developed rapidly ancient interference technique, laser has brightness height, good directionality, list Color and the features such as good coherence, laser interferometry techniques comparative maturity.Laser interferometry system application is very wide It is general:The detection measured such as linear scale, grating, gauge block, precision lead screw of accurate length, angle;Detection and localization in precision instrument Control, the correction of system such as precision optical machinery;Position detecting system in large scale integrated circuit special equipment and detecting instrument;It is micro- Measurement of small size etc..At present, in most of laser interference length-measuring systems, Michelson's interferometer or similar is all employed Light channel structure, such as, currently used single frequency laser interferometer.
Single frequency laser interferometer is the light beam sent from laser, is divided into two-way by spectroscope after beam-expanding collimation, and divide Congregation is not reflected from stationary mirror and moving reflector produce interference fringe on spectroscope.When moving reflector moves When dynamic, the light intensity of interference fringe changes is converted to electric impulse signal by the photo-electric conversion element in receiver and electronic circuit etc., Input forward-backward counter calculates overall pulse number N after shaped, amplification, then presses calculating formula L=N × λ/2, formula by electronic computer Middle λ is optical maser wavelength, calculates the displacement L of moving reflector.
In actual use, inventors herein have recognized that, still there is not for above-mentioned measurement structure and measuring method Foot:
Also there is the problem of affected by environment serious in current single frequency laser interferometer, laser interferometer moveable mirror moves When dynamic, the light intensity of interference fringe changes is converted to electric impulse signal by the photo-electric conversion element in receiver and electronic circuit etc., When for most strong constructive interference when, the triggering level that signal exceedes counter is recorded, such as empty if environment changes Gas turbulent flow, impurity increases in air, lathe mist of oil, influence of cutting swarf during processing to laser beam so that the intensity of laser beam Reduce, now, even there is most strong constructive interference, it is also possible to which intensity is less than the triggering level of counter without being counted.
So based on above-mentioned deficiency, need badly at present it is a kind of i.e. can environment resistant interference, and can enough improves the sharp of measurement accuracy Optical interferometer.
The content of the invention
It is an object of the invention to the deficiency for current laser interferometer environment resistant interference performance difference, there is provided one kind can The laser interferometer of environment resistant interference.
In order to realize foregoing invention purpose, the invention provides following technical scheme:
A kind of contrast anti-interference fine motion corner reflector laser interferometer, include lasing light emitter, fine motion corner reflector, interference Measurement photodetector, mobile corner reflector, light splitting microscope group and micromotion platform, the fine motion corner reflector are arranged on the fine motion On platform, laser beam that the lasing light emitter projects is divided into first laser beam and second laser beam after the light splitting microscope group, and first Fine motion corner reflector described in laser beam directive, microscope group is divided described in directive again after fine motion corner reflector reflection, then pass through Interferometry photodetector described in directive after light splitting microscope group, second laser beam is to the mobile corner reflector, through the shifting Microscope group is divided described in directive again after dynamic corner reflector reflection, the interferometry photodetector described in directive after being divided microscope group, First laser beam interferes with second laser beam in interferometry photodetector described in directive, and the laser interferometer is also Include reflection measurement photodetector, the second laser beam as described in the mobile corner reflector directive after microscope group is divided It is also formed with reflection laser beam, the reflection laser beam is to the reflection measurement photodetector.
As further preferred scheme, the light splitting microscope group includes the first spectroscope and the second spectroscope, described to swash The laser beam that light source projects first is mapped to the first spectroscope, first laser beam is formed through the first dichroic mirror, through the first spectroscope Transmission forms second laser beam, and first laser beam is to the fine motion corner reflector, after reflection again first point described in directive Light microscopic, then again transmitted through first spectroscope, the second laser beam is to the mobile corner reflector, through the movement Second spectroscope described in directive after corner reflector reflection, the first spectroscope described in directive after second spectroscope transmission, and And the first laser beam with being transmitted from first spectroscope interferes, interferometry described in directive after interfering beam is formed Photodetector, second spectroscopical second laser beam is also by described second point as described in the mobile corner reflector directive Light microscopic reflects to form the reflection laser beam.
The laser interferometer of the application, because reflection measurement photodetector can measure mobile corner reflector reflection laser The intensity of beam, the interference state of laser interference light beam is determined according to the intensity of reflection laser beam, so realize environment resistant interference Purpose.
As further preferred scheme, the lasing light emitter, fine motion corner reflector, interferometry photodetector, point Laser beam in light microscopic group, reflection measurement photodetector between any two be arranged in closing space without with external environment condition Space contacts.In this application, lasing light emitter, fine motion corner reflector, interferometry photodetector, light splitting microscope group and reflection measurement Laser beam between these part any twos of photodetector is arranged in closing space so that in the process measured In, the laser beam between these above-mentioned parts can't be effected by environmental factors, and then ensure that the application laser interference The measurement accuracy of instrument.
As further preferred scheme, the laser beam between the light splitting microscope group and the mobile corner reflector is exposed to Among surrounding air.In actual use, mobile corner reflector is arranged on testee, is moved with testee, so In the application, among the laser beam being divided between microscope group and mobile corner reflector is exposed into surrounding air, this is so that first Apply for that laser interferometer is simple in construction, while also facilitate the arrangement of the application laser interferometer.
Disclosed herein as well is a kind of scaling method for above-mentioned laser interferometer structure,
A kind of scaling method for contrast anti-interference fine motion corner reflector laser interferometer, comprise the steps:
Step 1: position adjustment:Adjust lasing light emitter, fine motion corner reflector, light splitting microscope group, interferometry photodetection Device, reflection measurement photodetector, the position for moving corner reflector and micromotion platform;
Step 2: adjustment light path:Start the lasing light emitter, it is further accurate to adjust fine motion corner reflector, light splitting microscope group, do The position of measurement photodetector, reflection measurement photodetector, mobile corner reflector and micromotion platform is related to, makes laser interferometer Light path reach design requirement;
Step 3: generation is most capable and experienced to relate to database:The micromotion platform is controlled to move in the environment of air cleaning, when penetrating The micromotion platform is fixed when to the interfering beam of the interferometry photodetector being most strong constructive interference, record is now anti- Measurement photodetector reading and interferometry photodetector reading are penetrated, changing air ambient visits the reflection measurement photoelectricity The change of device reading is surveyed, while records several reflection measurement photodetector readings and corresponding interferometry photodetector Reading, obtain most capable and experienced relating to database.
The laser interferometer structure and scaling method of the application, in most strong constructive interference, change measuring environment, record Reflection measurement photodetector reading and interferometry photodetector reading formed it is most capable and experienced relate to database, actually measuring Cheng Zhong, if there is causing interferometry photodetector normally to detect most strong constructive interference due to environmental factor When, it can be related to according to reflection measurement photodetector reading and interferometry photodetector reading with most capable and experienced in database Data are compared, and if there is there is matched data, then the position is most strong constructive interference, so that the laser of the application is done Interferometer realizes the ability of environment resistant interference.
As further preferred scheme, the scaling method of the application also includes Step 4: generating most weak interference data Storehouse:The micromotion platform is controlled to move in the environment of air cleaning, when the interference of interferometry photodetector described in directive Light beam fixes the micromotion platform when being most weak destructive interference, record now reflection measurement photodetector reading and interferometry Photodetector reading, changing air ambient changes the reflection measurement photodetector reading, while it is anti-to record several Measurement photodetector reading and corresponding interferometry photodetector reading are penetrated, obtains most weak interference data storehouse.
As further preferred scheme, also include step 5, generate 1/n wavelength-interferometric databases, n is to be more than or wait 2 positive integer:The micromotion platform is controlled to move in the environment of air cleaning, when interferometry photodetector described in directive Interfering beam when being most strong constructive interference, be further continued for moving the distance of 1/2n wavelength, record now reflection measurement photodetection Device reading and interferometry photodetector reading, then changing air ambient becomes the reflection measurement photodetector reading Change, while record several reflection measurement photodetector readings and corresponding interferometry photodetector reading, obtain 1/n wavelength-interferometric databases.
When two beam laser interfere, the optical path difference between adjacent most strong constructive interference and most weak destructive interference is half Individual wavelength, in the scaling method of the application, most strong constructive interference, most weak destructive interference, 1/n wavelength-interferometrics are all marked It is fixed, that is to say, that, can be according to reflection measurement photodetector when carrying out actual measurement using the laser interferometer of the application Reading and interferometry photodetector reading relate to database, most weak interference data storehouse, 1/n wavelength-interferometric databases with most capable and experienced In data be compared, according to the match condition of data determine the position be most strong constructive interference, most weak destructive interference or 1/n wavelength-interferometrics.So that the laser interferometer of the application can not only environment resistant interference, and also improve measurement accuracy.
The invention also discloses a kind of using above-mentioned laser interferometer and the measuring method of scaling method,
It is a kind of using contrast anti-interference fine motion corner reflector laser interferometer and the measuring method of scaling method:
In actual measuring environment, if the signal reading that the reflection measurement photodetector measures is x, the interference The signal reading that measurement photodetector measurement obtains is y, and x values and y values are related into database, most weak interference data most capable and experienced It is compared in storehouse, 1/n wavelength-interferometric databases, when x values and y values match with the most capable and experienced a certain class value related in database, It is most strong constructive interference position then to think this position, when x values and y values match with a certain class value in most weak interference data storehouse, It is most weak destructive interference position then to think this position, when x values and y values and a certain class value phase in 1/n wavelength-interferometric databases Match somebody with somebody, then it is assumed that this position is 1/n wavelength-interferometrics position.
The measuring method of the application, the interference situation of current interfering beam is determined by x values and y values, anti-ring is realized with this The ability of border interference, while also improve measurement accuracy.
As further preferred scheme, the matching threshold △ of setting y values, if most capable and experienced relate to database, most weak interference number It is y ' according to numerical value corresponding to interferometry photodetector in storehouse, 1/n wavelength-interferometric databases, number is related to most capable and experienced according to x values According to storehouse, most weak interference data storehouse, 1/n wavelength-interferometrics database carry out y ' inquiry, make if there is y ' | y-y'|<△, then area The database divided where y ', if y ' is related in database most capable and experienced, then it is assumed that this position is most strong constructive interference position, if Y ' is in most weak interference data storehouse, then it is assumed that this position is most weak destructive interference position, if y ' is in 1/n wavelength-interferometric databases It is interior, then it is assumed that this position is 1/n wavelength-interferometrics position.
As further preferred scheme, if most capable and experienced relate to database, most weak interference data storehouse, 1/n wavelength-interferometric data Numerical value corresponding to reflection measurement photodetector is x ' in storehouse, in actually measuring, selects the x ' works closest to actual measured value x For matching value, database, most weak interference data storehouse, the progress y ' progress of 1/n wavelength-interferometrics database are related to most capable and experienced according to x ' values Inquiry, makes if there is y ' | y-y'|<△, the database where y ' is repartitioned, if y ' is related in database most capable and experienced, recognized It is most strong constructive interference position for this position, if y ' is in most weak interference data storehouse, then it is assumed that this position is that most weak cancellation is done Position is related to, if y ' is in 1/n wavelength-interferometric databases, then it is assumed that this position is 1/n wavelength-interferometrics position.
As further preferred scheme, the size of the matching threshold △ ensures, when carrying out data query, to work as satisfaction | y-y'|<During △, y ' is unique value.When matching threshold △ is larger, it is possible that one group of x value and y values match two groups or Multigroup x ' values and y ' values, make troubles to measurement, so first matching threshold △, makes one group of x value and y values in measurement process most One group of x ' value and y ' values are matched, is convenient for measuring.
As further preferred scheme, the size of the matching threshold △ is set according to the required precision actually measured Fixed, when needing high-precision measured value, using less matching threshold, when not needing high-acruracy survey value, use is larger Matching threshold.
As further preferred scheme, if △=5%.
In the measuring method of the application, by setting matching threshold △, according to the setting of the needs of Surveying Actual Precision Size with threshold value △, during being convenient for measuring with this, the match selection of data, reduce measurement difficulty.
Compared with prior art, beneficial effects of the present invention:
, can be by movement after setting reflection measurement photodetector, laser interferometry environment to change Corner reflector reflection laser intensity measures, and signal of the laser interference state no longer directly by interferometry photodetector is big Small determination, but together decided on by reflection measurement photodetector and interferometry photodetector, realize laser interferometer The ability of environment resistant interference.
The beneficial effect of other embodiments of the application:
The laser interferometer of the application, can not only determine the position of most strong constructive interference, but also can determine most weak The position and 1/n wavelength-interferometrics position of destructive interference, so so that the laser interferometer of the application can not only environment resistant do Disturb, and be engaged with fine motion corner reflector, further improve measurement accuracy.
Brief description of the drawings:
Fig. 1 is the light path schematic diagram of laser interferometer structure of the present invention;
Light path schematic diagram when Fig. 2 is mobile corner reflector movement,
Marked in figure:
1- lasing light emitters, 2- fine motion corner reflectors, 3- movement corner reflectors, 4- interferometry photodetectors, 5- spectroscopes Group, 6- reflection measurement photodetectors, 7- first laser beams, 8- second laser beams, 9- reflection laser beams, 10- micromotion platforms, The spectroscopes of 51- first, the spectroscopes of 52- second.
Embodiment
With reference to test example and embodiment, the present invention is described in further detail.But this should not be understood Following embodiment is only limitted to for the scope of the above-mentioned theme of the present invention, it is all that this is belonged to based on the technology that present invention is realized The scope of invention.
Embodiment 1, contrast anti-interference fine motion corner reflector laser interferometer, includes lasing light emitter 1, fine motion corner reflector 2nd, interferometry photodetector 4, mobile corner reflector 3, light splitting microscope group 5 and micromotion platform 10, the fine motion corner reflector 2 are set Put on the micromotion platform 10, the laser beam that the lasing light emitter 1 projects is divided into first laser beam 7 after the light splitting microscope group 5 With second laser beam 8, fine motion corner reflector 2 described in the directive of first laser beam 7, after the fine motion corner reflector 2 reflection again Microscope group 5, then the interferometry photodetector 4 described in directive after being divided microscope group 5, the directive of second laser beam 8 are divided described in directive The mobile corner reflector 3, microscope group 5 is divided described in directive again after the mobile corner reflector 3 reflects, through being divided microscope group 5 Interferometry photodetector 4 described in directive afterwards, first laser beam 7 is with second laser beam 8 in interferometry photoelectricity described in directive Interfered during detector 4, the contrast anti-interference fine motion corner reflector laser interferometer also includes reflection measurement photoelectricity Detector 6, the second laser beam 8 are also formed with reflection after microscope group 5 is divided as described in the mobile directive of corner reflector 3 and swashed Light beam 9, reflection measurement photodetector 6 described in the directive of reflection laser beam 9.
As the preferred scheme of the present embodiment, the light splitting microscope group 5 includes the first spectroscope 51 and the second spectroscope 52, The laser beam that the lasing light emitter 1 projects first is mapped to the first spectroscope 51, and first laser beam 7 is reflected to form through the first spectroscope 51, Transmitted through the first spectroscope 51 and form second laser beam 8, fine motion corner reflector 2 described in the directive of first laser beam 7, after reflection again First spectroscope 51 described in secondary directive, then again transmitted through first spectroscope 51, shifting described in the directive of second laser beam 8 Dynamic corner reflector 3, the second spectroscope 52 described in directive after the mobile corner reflector 3 reflects, through second spectroscope 52 First spectroscope 51 described in directive after transmission, and the first laser beam 7 with being transmitted from first spectroscope 51 occurs to do Relate to, interferometry photodetector 4 described in directive after interfering beam is formed, second as described in the mobile directive of corner reflector 3 The second laser beam 8 of spectroscope 52 also reflects to form the reflection laser beam 9 by second spectroscope 52.
The laser interferometer of the present embodiment, reflected because reflection measurement photodetector 6 can measure mobile corner reflector 3 The intensity of laser beam, the interference state of laser interference light beam is determined according to the intensity of reflection laser beam, so realizes that environment resistant is done The purpose disturbed.
As further preferred scheme, the lasing light emitter 1, fine motion corner reflector 2, interferometry photodetector 4, Light splitting microscope group 5, the laser beam in reflection measurement photodetector 6 between any two be arranged in closing space without with outside Environment space contacts.In this application, lasing light emitter 1, fine motion corner reflector 2, interferometry photodetector 4, light splitting microscope group 5 and Laser beam between these part any twos of reflection measurement photodetector 6 is arranged in closing space so that is being surveyed During amount, the laser beam between these above-mentioned parts can't be effected by environmental factors, and then ensure that the application The measurement accuracy of laser interferometer.
As further preferred scheme, the laser beam between the light splitting microscope group 5 and the mobile corner reflector 3 exposes Among surrounding air.In actual use, mobile corner reflector 3 is arranged on testee, is moved with testee, so In this application, the laser beam being divided between microscope group 5 and mobile corner reflector 3 is made first among surrounding air It is simple in construction to obtain the application laser interferometer, while also facilitates the arrangement of the application laser interferometer.
Embodiment 2, as shown, a kind of scaling method for contrast anti-interference fine motion corner reflector laser interferometer, Comprise the steps:
Step 1: position adjustment:Adjust lasing light emitter 1, fine motion corner reflector 2, light splitting microscope group 5, measured interference light electrical resistivity survey Survey the position of device 4, reflection measurement photodetector 6, mobile corner reflector 3 and micromotion platform 10;
Step 2: adjustment light path:Start the lasing light emitter 1, further accurate adjustment fine motion corner reflector 2, light splitting microscope group 5th, the position of interferometry photodetector 4, reflection measurement photodetector 6, mobile corner reflector 3 and micromotion platform 10, makes The light path of laser interferometer reaches design requirement;
Step 3: generation is most capable and experienced to relate to database:The micromotion platform 10 is controlled to move in the environment of air cleaning, when The interfering beam of interferometry photodetector 4 described in directive fixes the micromotion platform 10 when being most strong constructive interference, record The now reading of reflection measurement photodetector 6 and the reading of interferometry photodetector 4, changing air ambient surveys the reflection The change of the reading of photodetector 6 is measured, while records several readings of reflection measurement photodetector 6 and corresponding interferometry The reading of photodetector 4, obtain most capable and experienced relating to database.
The laser interferometer structure and scaling method of the present embodiment, in most strong constructive interference, change measuring environment, note The reading of record reflection measurement photodetector 6 and the reading of interferometry photodetector 4 formed it is most capable and experienced relate to database, in actual survey During amount, if there is causing interferometry photodetector 4 normally to detect most strong phase due to environmental factor During long interference, number can be related to most capable and experienced according to the reading of reflection measurement photodetector 6 and the reading of interferometry photodetector 4 It is compared according to the data in storehouse, if there is there is matched data, then the position is most strong constructive interference, so that this implementation The laser interferometer of example realizes the ability of environment resistant interference.
As the preferred scheme of the present embodiment, the scaling method of the present embodiment also includes Step 4: generating most weak interference Database:The micromotion platform 10 is controlled to move in the environment of air cleaning, when interferometry photodetector 4 described in directive Interfering beam fix the micromotion platform 10 when being most weak destructive interference, the record now reading of reflection measurement photodetector 6 With the reading of interferometry photodetector 4, changing air ambient changes the reading of reflection measurement photodetector 6, simultaneously Several readings of reflection measurement photodetector 6 and the corresponding reading of interferometry photodetector 4 are recorded, is obtained most weak dry Relate to database.
As further preferred scheme, the scaling method of the application also includes Step 5: generating 1/n wavelength-interferometric numbers According to storehouse, n is the positive integer for being more than or waiting 2:The micromotion platform movement 10 is controlled in the environment of air cleaning, when described in directive When the interfering beam of interferometry photodetector 4 is most strong constructive interference, it is further continued for moving the distance of 1/2n wavelength, records this When the reading of the reflection measurement photodetector 6 and reading of interferometry photodetector 4, then changing air ambient makes the reflection The change of the reading of photodetector 6 is measured, while records several readings of reflection measurement photodetector 6 and corresponding interference survey The reading of photodetector 4 is measured, obtains 1/n wavelength-interferometric databases.
When two beam laser interfere, the optical path difference between adjacent most strong constructive interference and most weak destructive interference is half Individual wavelength, in the scaling method of the application, most strong constructive interference, most weak destructive interference, 1/n wavelength-interferometrics are all marked It is fixed, that is to say, that, can be according to reflection measurement photodetector when carrying out actual measurement using the laser interferometer of the application 6 readings and the reading of interferometry photodetector 4 relate to database, most weak interference data storehouse, 1/n wavelength-interferometric data with most capable and experienced Data in storehouse are compared, according to the match condition of data determine the position be most strong constructive interference, most weak destructive interference also It is 1/n wavelength-interferometrics.So that the laser interferometer of the application can not only environment resistant interference, and also improve measurement accuracy.
Embodiment 3, it is a kind of using contrast anti-interference fine motion corner reflector laser interferometer and the measurement side of scaling method Method:
It is described dry if the signal reading that the reflection measurement photodetector 6 measures is x in actual measuring environment It is y to relate to measurement photodetector 4 and measure obtained signal reading, and x values and y values are related into database, most weak interference number most capable and experienced According to being compared in storehouse, 1/n wavelength-interferometric databases, when x values and y values and the most capable and experienced a certain class value phase related in database Match somebody with somebody, then it is assumed that this position is most strong constructive interference position, when x values and y values and a certain class value phase in most weak interference data storehouse Match somebody with somebody, then it is assumed that this position is most weak destructive interference position, when x values and y values and a certain class value phase in 1/n wavelength-interferometric databases Matching, then it is assumed that this position is 1/n wavelength-interferometrics position.
The measuring method of the present embodiment, the interference situation of current interfering beam is determined by x values and y values, is realized with this anti- The ability of environmental disturbances, while also improve measurement accuracy.
As the preferred scheme of the present embodiment, the matching threshold △ of setting y values, if most capable and experienced relate to database, most weak interference Numerical value corresponding to interferometry photodetector is y ' in database, 1/n wavelength-interferometric databases, is related to according to x values to most capable and experienced Database, the inquiry in most weak interference data storehouse, 1/n wavelength-interferometrics database progress y ', make if there is y ' | y-y'|<△, then The database where y ' is distinguished, if y ' is related in database most capable and experienced, then it is assumed that this position is most strong constructive interference position, such as Fruit y ' is in most weak interference data storehouse, then it is assumed that this position is most weak destructive interference position, if y ' is in 1/n wavelength-interferometric data In storehouse, then it is assumed that this position is 1/n wavelength-interferometrics position.
As further preferred scheme, if most capable and experienced relate to database, most weak interference data storehouse, 1/n wavelength-interferometric data Numerical value corresponding to reflection measurement photodetector is x ' in storehouse, in actually measuring, selects the x ' works closest to actual measured value x For matching value, database, most weak interference data storehouse, the progress y ' progress of 1/n wavelength-interferometrics database are related to most capable and experienced according to x ' values Inquiry, makes if there is y ' | y-y'|<△, the database where y ' is repartitioned, if y ' is related in database most capable and experienced, recognized It is most strong constructive interference position for this position, if y ' is in most weak interference data storehouse, then it is assumed that this position is that most weak cancellation is done Position is related to, if y ' is in 1/n wavelength-interferometric databases, then it is assumed that this position is 1/n wavelength-interferometrics position.
As the preferred scheme of the present embodiment, the size of the matching threshold △ ensures when carrying out data query, when full Foot | y-y'|<During △, y ' is unique value.When matching threshold △ is larger, it is possible that one group of x value and y values match two groups Or multigroup x ' values and y ' values, made troubles to measurement, so first matching threshold △, makes one group of x value and y values in measurement process At most one group of x ' value of matching and y ' values, are convenient for measuring.
As the preferred scheme of the present embodiment, the size of the matching threshold △ is carried out according to the required precision actually measured Setting, when needing high-precision measured value, using less matching threshold, when need not high-acruracy survey value and wish very fast During measurement, using larger matching threshold.
As further preferred scheme, if △=5%.
In the measuring method of the present embodiment, by setting matching threshold △, need to set according to Surveying Actual Precision Matching threshold △ size, during being convenient for measuring with this, the match selection of data, reduce measurement difficulty.
Above example only not limits technical scheme described in the invention to illustrate the present invention, although this explanation Book is with reference to above-mentioned each embodiment to present invention has been detailed description, but the present invention is not limited to above-mentioned specific implementation Mode, therefore any the present invention is modified or equivalent substitution;And the technical side of all spirit and scope for not departing from invention Case and its improvement, it all should cover among scope of the presently claimed invention.

Claims (8)

1. a kind of scaling method for contrast anti-interference fine motion corner reflector laser interferometer, described contrast anti-interference micro- Dynamic corner reflector laser interferometer, include lasing light emitter, fine motion corner reflector, interferometry photodetector, mobile corner reflection Mirror, light splitting microscope group and micromotion platform, the fine motion corner reflector are arranged on the micromotion platform, and what the lasing light emitter projected swashs Light beam is divided into first laser beam and second laser beam after the light splitting microscope group, and the first laser beam is anti-to the fine motion angle Mirror is penetrated, is divided microscope group described in directive again after fine motion corner reflector reflection, then interfere after be divided microscope group described in directive Photodetector is measured, the second laser beam is to the mobile corner reflector, after the mobile corner reflector reflection again Microscope group is divided described in secondary directive, the interferometry photodetector described in directive after being divided microscope group, the first laser beam and Dual-laser beam interferes in interferometry photodetector described in directive, and the contrast anti-interference fine motion corner reflector swashs Optical interferometer also includes reflection measurement photodetector, and the second laser beam is as described in the mobile corner reflector directive Reflection laser beam is also formed with after light splitting microscope group, and the reflection laser beam is to the reflection measurement photodetector;
The light splitting microscope group includes the first spectroscope and the second spectroscope, and the laser beam that the lasing light emitter projects first is mapped to first Spectroscope, first laser beam is formed through the first dichroic mirror, transmits to form second laser beam, first laser through the first spectroscope Beam is to the fine motion corner reflector, the first spectroscope described in directive again after reflection, then again transmitted through described first point Light microscopic, the second laser beam is to the mobile corner reflector, after the mobile corner reflector reflection second described in directive Spectroscope, the first spectroscope described in directive after second spectroscope transmission, and with being transmitted from first spectroscope First laser beam interfere, formed interfering beam after interferometry photodetector described in directive, it is anti-by the traveling angle Penetrate mirror and the reflection laser is also formed by second dichroic mirror to described second spectroscopical second laser beam Beam, it is characterised in that comprise the steps:
Step 1: position adjustment:Adjust lasing light emitter, fine motion corner reflector, light splitting microscope group, interferometry photodetector, anti- Penetrate the position of measurement photodetector, mobile corner reflector and micromotion platform;
Step 2: adjustment light path:Start the lasing light emitter, further accurate adjustment fine motion corner reflector, light splitting microscope group, interference is surveyed The position of photodetector, reflection measurement photodetector, mobile corner reflector and micromotion platform is measured, makes the light of laser interferometer Road reaches design requirement;
Step 3: generation is most capable and experienced to relate to database:The micromotion platform is controlled to move in the environment of air cleaning, when directive institute The interfering beam for stating interferometry photodetector fixes the micromotion platform when being most strong constructive interference, record now survey by reflection Photodetector reading and interferometry photodetector reading are measured, changing air ambient makes the reflection measurement photodetector Reading changes, while records several reflection measurement photodetector readings and the reading of corresponding interferometry photodetector Number, obtain most capable and experienced relating to database.
2. scaling method as claimed in claim 1, it is characterised in that also include Step 4: generating most weak interference data storehouse: The micromotion platform is controlled to move in the environment of air cleaning, when the interfering beam of interferometry photodetector described in directive To fix the micromotion platform during most weak destructive interference, now reflection measurement photodetector reading and interferometry photoelectricity are recorded Detector readings, changing air ambient changes the reflection measurement photodetector reading, while records several reflections and survey Photodetector reading and corresponding interferometry photodetector reading are measured, obtains most weak interference data storehouse.
3. scaling method as claimed in claim 2, it is characterised in that also include Step 5: generating 1/n wavelength-interferometric data Storehouse, n are the positive integer for being more than or waiting 2:The micromotion platform is controlled to move in the environment of air cleaning, when interference described in directive When the interfering beam for measuring photodetector is most strong constructive interference, it is further continued for moving the distance of 1/2n wavelength, record is now anti- Measurement photodetector reading and interferometry photodetector reading are penetrated, then changing air ambient makes the reflection measurement light Electric explorer reading changes, while records several reflection measurement photodetector readings and corresponding measured interference light electrical resistivity survey Device reading is surveyed, obtains 1/n wavelength-interferometric databases.
A kind of 4. measuring method of scaling method using described in claim 3, it is characterised in that in actual measuring environment, If the signal reading that the reflection measurement photodetector measures is x, what the interferometry photodetector measurement obtained Signal reading is y, and x values and y values are carried out in database, most weak interference data storehouse, 1/n wavelength-interferometric databases in most capable and experienced relate to Compare, when x values and y values match with the most capable and experienced a certain class value related in database, then it is assumed that this position is most strong constructive interference Position, when x values and y values match with a certain class value in most weak interference data storehouse, then it is assumed that this position is most weak destructive interference Position, when x values and y values match with a certain class value in 1/n wavelength-interferometric databases, then it is assumed that this position is that 1/n wavelength is done Relate to position.
5. measuring method as claimed in claim 4, it is characterised in that the matching threshold Δ of setting y values, if most strong interference data Numerical value corresponding to interferometry photodetector is y ' in storehouse, most weak interference data storehouse, 1/n wavelength-interferometric databases, according to x values To the most capable and experienced inquiry for relating to database, most weak interference data storehouse, 1/n wavelength-interferometrics database progress y ', make if there is y ' | y - y '|<Δ, the database where y ' is repartitioned, if y ' is related in database most capable and experienced, then it is assumed that this position is most strong phase Long interference position, if y ' is in most weak interference data storehouse, then it is assumed that this position is most weak destructive interference position, if y ' is 1/ In n wavelength-interferometric databases, then it is assumed that this position is 1/n wavelength-interferometrics position.
6. measuring method as claimed in claim 5, it is characterised in that set and most capable and experienced relate to database, most weak interference data storehouse, 1/ Numerical value corresponding to reflection measurement photodetector is x ' in n wavelength-interferometric databases, in actually measuring, is selected closest to actual Measured value x x ' is used as matching value, and database, most weak interference data storehouse, 1/n wavelength-interferometric data are related to most capable and experienced according to x ' values Storehouse carries out y ' and inquired about, and makes if there is y ' | y-y ' |<Δ, the database where y ' is repartitioned, if y ' is most strong In interference data storehouse, then it is assumed that this position is most strong constructive interference position, if y ' is in most weak interference data storehouse, then it is assumed that this Position is most weak destructive interference position, if y ' is in 1/n wavelength-interferometric databases, then it is assumed that this position is 1/n wavelength-interferometrics Position.
7. the measuring method as described in claim 5 or 6, it is characterised in that the size of the matching threshold Δ ensures carrying out During data query, work as satisfaction | y-y ' |<During Δ, y ' is unique value.
8. measuring method as claimed in claim 7, it is characterised in that the size of the matching threshold Δ is according to actually measuring Required precision is set, when needing high-precision measured value, using less matching threshold, when not needing high-acruracy survey During value, using larger matching threshold.
CN201510289679.5A 2015-05-29 2015-05-29 A kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and measuring method Active CN105043244B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510289679.5A CN105043244B (en) 2015-05-29 2015-05-29 A kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and measuring method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510289679.5A CN105043244B (en) 2015-05-29 2015-05-29 A kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and measuring method

Publications (2)

Publication Number Publication Date
CN105043244A CN105043244A (en) 2015-11-11
CN105043244B true CN105043244B (en) 2017-12-05

Family

ID=54449986

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510289679.5A Active CN105043244B (en) 2015-05-29 2015-05-29 A kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and measuring method

Country Status (1)

Country Link
CN (1) CN105043244B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4702603A (en) * 1985-07-23 1987-10-27 Cmx Systems, Inc. Optical phase decoder for interferometers
CN102016549A (en) * 2008-05-08 2011-04-13 佳能株式会社 Optical coherence tomographic imaging apparatus and optical coherence tomographic imaging method
CN102458226A (en) * 2009-06-25 2012-05-16 佳能株式会社 Image pickup apparatus and image pickup method using optical coherence tomography
CN102645269A (en) * 2012-05-18 2012-08-22 山东省科学院海洋仪器仪表研究所 Sound pressure monitoring device of ocean background noise
CN204988174U (en) * 2015-05-29 2016-01-20 北方民族大学 Anti -interference fine motion corner reflection mirror laser interferometer of comparison type

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6435303A (en) * 1987-07-31 1989-02-06 Hitachi Electr Eng Method and instrument for measurement of displacement
JP2714644B2 (en) * 1988-07-15 1998-02-16 株式会社アドバンテスト Optical spectrum analyzer
JP2003014416A (en) * 2001-07-05 2003-01-15 Yokogawa Electric Corp Laser length measuring apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4702603A (en) * 1985-07-23 1987-10-27 Cmx Systems, Inc. Optical phase decoder for interferometers
CN102016549A (en) * 2008-05-08 2011-04-13 佳能株式会社 Optical coherence tomographic imaging apparatus and optical coherence tomographic imaging method
CN102458226A (en) * 2009-06-25 2012-05-16 佳能株式会社 Image pickup apparatus and image pickup method using optical coherence tomography
CN102645269A (en) * 2012-05-18 2012-08-22 山东省科学院海洋仪器仪表研究所 Sound pressure monitoring device of ocean background noise
CN204988174U (en) * 2015-05-29 2016-01-20 北方民族大学 Anti -interference fine motion corner reflection mirror laser interferometer of comparison type

Also Published As

Publication number Publication date
CN105043244A (en) 2015-11-11

Similar Documents

Publication Publication Date Title
CN107727058B (en) Optical frequency comb six-degree-of-freedom measuring method and measuring system
CN105043242B (en) A kind of contrast anti-interference ladder planar reflector laser interference instrument and scaling method and measuring method
CN104697443B (en) A kind of stepped corner reflector laser interferometer of motion compensation formula cascade and measuring method
CN104964641B (en) A kind of magnetic micro-displacement platform formula cascade ladder corner reflector laser interferometer and scaling method and measuring method
CN104880147B (en) The scaling method and measuring method of a kind of magnetic micro-displacement platform formula corner reflector laser interferometer
CN105043241B (en) A kind of contrast anti-interference corner reflector laser interferometer and scaling method and measuring method
CN105004263B (en) A kind of contrast anti-interference fine motion planar reflector laser interference instrument and scaling method and measuring method
CN204757922U (en) Comparison type anti -interference fine motion cascading ladder corner reflection mirror laser interferometer
CN105180801B (en) A kind of contrast anti-interference stepped corner reflector laser interferometer and scaling method and measuring method
CN105043244B (en) A kind of contrast anti-interference fine motion corner reflector laser interferometer and scaling method and measuring method
CN105157559B (en) A kind of contrast anti-interference cascade ladder corner reflector laser interferometer and scaling method and measuring method
CN104848782B (en) A kind of contrast anti-interference fine motion cascade ladder corner reflector laser interferometer and scaling method and measuring method
CN105043245B (en) A kind of contrast anti-interference planar reflector laser interference instrument and scaling method and measuring method
CN105091739B (en) A kind of contrast anti-interference fine motion ladder corner reflector laser interferometer and scaling method and measuring method
CN204705316U (en) A kind of magnetic micro-displacement platform formula planar reflector laser interference instrument
CN204740001U (en) Anti -interference fine motion ladder corner reflection mirror laser interferometer of comparison type
CN204757920U (en) Anti -interference fine motion planar mirror laser interferometer of comparison type
CN204988175U (en) Anti -interference planar mirror laser interferometer of comparison type
CN204757921U (en) Anti -interference notch cuttype corner reflection mirror laser interferometer of comparison type
CN204988174U (en) Anti -interference fine motion corner reflection mirror laser interferometer of comparison type
CN204988173U (en) Anti -interference fine motion ladder planar mirror laser interferometer of comparison type
CN104897049B (en) The scaling method and measuring method of a kind of magnetic micro-displacement platform formula planar reflector laser interference instrument
CN204831174U (en) Anti -interference corner reflection mirror laser interferometer of comparison type
CN204740000U (en) Anti -interference ladder planar mirror laser interferometer of comparison type
CN105136020B (en) A kind of contrast anti-interference fine motion ladder planar reflector laser interference instrument and scaling method and measuring method

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20201217

Address after: Room 804-806, 8th floor, Binyang building, Binyang Avenue, Shouchun Town, Shouxian County, Huainan City, Anhui Province

Patentee after: Huainan Yiyong Electronic Technology Co.,Ltd.

Address before: 1607, building 49, No.3, Queshan Yunfeng Road, Gaofeng community, Dalang street, Longhua District, Shenzhen City, Guangdong Province

Patentee before: Shenzhen Hongyue Information Technology Co.,Ltd.

Effective date of registration: 20201217

Address after: 1607, building 49, No.3, Queshan Yunfeng Road, Gaofeng community, Dalang street, Longhua District, Shenzhen City, Guangdong Province

Patentee after: Shenzhen Hongyue Information Technology Co.,Ltd.

Address before: 750021 No. 204, Wenchang North Street, Xixia District, the Ningxia Hui Autonomous Region, Yinchuan

Patentee before: BEIFANG MINZU University

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20231113

Address after: 1246, Building 3, No. 9 Meihu Road, Hanjiang District, Yangzhou City, Jiangsu Province, 225000

Patentee after: Runxile Biotechnology (Yangzhou) Co.,Ltd.

Address before: Room 804-806, 8th floor, Binyang building, Binyang Avenue, Shouchun Town, Shouxian County, Huainan City, Anhui Province

Patentee before: Huainan Yiyong Electronic Technology Co.,Ltd.