CN105034183B - The inversion set of brittle substrate - Google Patents
The inversion set of brittle substrate Download PDFInfo
- Publication number
- CN105034183B CN105034183B CN201510131988.XA CN201510131988A CN105034183B CN 105034183 B CN105034183 B CN 105034183B CN 201510131988 A CN201510131988 A CN 201510131988A CN 105034183 B CN105034183 B CN 105034183B
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- China
- Prior art keywords
- microscope carrier
- substrate
- arm
- brittle substrate
- inversion set
- Prior art date
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26F—PERFORATING; PUNCHING; CUTTING-OUT; STAMPING-OUT; SEVERING BY MEANS OTHER THAN CUTTING
- B26F3/00—Severing by means other than cutting; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/03—Glass cutting tables; Apparatus for transporting or handling sheet glass during the cutting or breaking operations
Abstract
The present invention is on a kind of inversion set, for being reversed in longitudinal direction and transverse direction in the functional region of arrangement form in array and in addition to resin bed by the substrate of brisement.Its solution is：By substrate（20）It is held in end material separation microscope carrier（15）On.Hold material separation microscope carrier（15）, in arm（51）It is upper that there is chamber（52）With its top bottom plate（53）And elastic plate（54）.Arm（51）In can be with rotary shaft（55）Centered on and rotate freely.In addition, making extension microscope carrier from the substrate top kept（16）Contact.Then end material separation microscope carrier is made（15）With extension microscope carrier（16）In same rotary shaft toward equidirectional rotation, whereby while keeping substrate（20）While inverting it.
Description
Technical field
The invention relates to it is a kind of be used in reversion brittle substrate inversion set, the brittle substrate be
Resin bed is coated with the brittle substrates such as semiconductor substrate, ceramic substrate to form.
Background technology
In patent document 1, following substrate brisement device is referred to：By the substrate to being formed with score line, from shape
Into the back side in the face for having score line, pressed with face along score line and vertically using brisement bar and carry out brisement.As brisement
The substrate of object is semiconductor crystal wafer and is in the situation for being formed with multiple functional areas in array, first in substrate with function
It is interregional to form score line in longitudinal direction and transverse direction across equally spaced mode.Around brisement brittle substrate, taking-up
End material after, for disrumpent feelings resin bed to be completely separated into each chip, and be necessary to invert substrate.In patent document 2, take off
It is shown with the reversing device for inverting brittle substrate using mechanical arm.In the reverse turn operation, once by the substrate delineated
Pallet is configured at mechanical arm, inverted by supporting from below is changed.
Patent document 1：Japanese Unexamined Patent Publication 2004-39931 publications
Patent document 2：No. 3787489 publications of Japanese Patent Publication No.
As can be seen here, the inversion set of above-mentioned existing brittle substrate is upper with using in structure, it is clear that still suffered from
Inconvenience and defect, and be urgently further improved.In order to solve above-mentioned problem, relevant manufactures there's no one who doesn't or isn't painstakingly come
Seek solution, but have no that applicable design is developed completion always for a long time, and common product is without appropriate structure
Above mentioned problem is can solve the problem that, this is clearly the problem of related dealer is suddenly to be solved.
The content of the invention
It is an object of the invention to provide a kind of inversion set of brittle substrate, it can not make fragile material base
In the case that any portion of plate brisement comes off, the purpose inverted under state of remaining stationary is reached.In brittle substrate, example
As on ceramic substrate, multiple functional areas are formed with a determining deviation along x-axis and y-axis in manufacturing step, brisement device pair is used
The substrate filled with silicones carries out brisement on ceramic substrate, is now only capable of separating ceramic substrate layer along score line, silicon
Resin bed is still remained stationary state and remained, after inversion set proposed by the present invention, you can the substrate almost separated is in sight
It is to be inverted in the case that a part also will not fall off and stretch delineation in silicone layer.
The purpose of the present invention is realized using following technical scheme.According to a kind of fragile material base proposed by the present invention
The inversion set of plate, is that brittle substrate is inverted, wherein, the brittle substrate is that have functional areas in one side
Resin is coated with the brittle substrate in domain, and score line is formed with for the disjunction functional areas in the brittle substrate
Domain；The inversion set, possesses following part：The 1st microscope carrier that is arranged to rotate freely, using with the rotary shaft of the 1st microscope carrier as
The mode overlapped in identical rotary shaft with the 1st microscope carrier is arranged to the 2nd microscope carrier rotated freely and makes the 1st microscope carrier and be somebody's turn to do
2nd microscope carrier rotate independently of one another the 1st, the 2nd rotating mechanism；1st microscope carrier, with being rotated by the 1st rotating mechanism
The 1st arm freely and the elastic plate being arranged above the 1st arm；2nd microscope carrier, with being rotated by the 2nd rotating mechanism
The 2nd arm freely and the elastically supported plate for being installed on the 2nd arm.
The purpose of the present invention can be also applied to the following technical measures to achieve further.
Preferably, the inversion set of foregoing brittle substrate, wherein, the inversion set, with vacuum absorption device；
1st microscope carrier, possesses and is installed on the 1st arm and has the chamber of recess and be arranged on the chamber and with multiple openings
Bottom plate；The elastic plate, be installed on the bottom plate and it is corresponding with the opening of the bottom plate opening；The arm, has and this in arm
The conduit of chamber, and connected with the vacuum absorption device.
Preferably, the inversion set of foregoing brittle substrate, wherein, the brittle substrate is along with function
Region be located at center mode formed clathrate score line and brisement；The elastically supported plate of 2nd microscope carrier, with the fragility
The suitable width of material substrate, and with being arranged at by the guarantor of each center of the score line institute encircled area of the clathrate
Guard aperture.
By above-mentioned technical proposal, the inversion set of brittle substrate of the present invention at least has following advantages and beneficial effect
Really：
Brittle substrate is configured on the elastic component being arranged on the 1st microscope carrier, and be configured at portion from it
On the elastically supported plate of ledge opening comprising functional area, further, make the 2nd microscope carrier from upper contact.Moreover, energy
It is enough to make above-mentioned microscope carrier simultaneously toward equidirectional rotation by using coaxial rotating mechanism, and brittle substrate is remained stationary state
Ground is inverted.Now, due to sandwiching substrate between 2 microscope carriers, therefore, it is possible to obtain any portion of the same substrate in rotation
The effect that will not fall off.Described above is only the general introduction of technical solution of the present invention, in order to better understand the skill of the present invention
Art means, and being practiced according to the content of specification, and in order to allow the above and other purpose of the present invention, feature and excellent
Point can become apparent, below especially exemplified by preferred embodiment, and coordinate accompanying drawing, describe in detail as follows.
Brief description of the drawings
Fig. 1 is to represent to realize the stereogram being monolithically fabricated for the transport mechanism that the present invention implements structure.
Fig. 2 is to represent to realize the front view for the transport mechanism that the present invention implements structure.
Fig. 3 (a) and (b) are to represent to transport the front view of one of substrate and along A-A by the conveyance head of this implementation structure
The phantom of line.
Fig. 4 is to represent that the present invention implements the stereogram of the conveyance head of structure.
Fig. 5 is the front view of the conveyance head of this implementation structure.
Fig. 6 is the upward view of the conveyance head of this implementation structure.
Fig. 7 is a part for the conveyance head for cutting this implementation structure and the stereogram that represents.
Fig. 8 is to represent to be used in the stereogram of one of the precipitron of the carrying device of this implementation structure.
Fig. 9 is the stereogram of one for representing to be used in the push pedal (push plate) of this implementation structure.
Figure 10 is to represent that substrate inversion set of the present invention implements the side view of the end material separation microscope carrier and extension microscope carrier of structure.
Figure 11 is that the conveyance head for representing this implementation structure separates microscope carrier with end material and extends the sectional view of microscope carrier.
Figure 12 is that the conveyance head for representing this implementation structure separates the sectional view of a microscope carrier part with end material.
Figure 13 is the stereogram of the end material separation microscope carrier and extension microscope carrier that represent this implementation structure.
Figure 14 is to represent that this implementation structure sandwiches substrate and makes the stereogram of its rotation status.
Figure 15 be represent this implementation structure it is rotated after extension microscope carrier separate the side view of microscope carrier with end material.
【Main element symbol description】
10：Pedestal 11：Beam
12：Linear saddle 13：Transport head
14：Brisement microscope carrier 15：Hold material separation microscope carrier
16：Extend microscope carrier 17：Extension mechanism
20：Substrate 21：Ceramic substrate
22：Functional area 23：Silicones
24：Wire projection 31：Suspension bracket pedestal
32：Suspension bracket 33,34：Suspension bracket bracket
35：Linear saddle 40：Head
41：Bottom plate 42：Flexure strip
43：Conduit 44：Air blower
46：Latch mechanism 47：Push pedal
48：Cylinder 51：Arm
52：Chamber 53：Bottom plate
54：Elastic plate 55：Rotary shaft
61：Arm 62：Casket
63：Partition 64：Sponge
65：Extend rubber 67：Keep tool
Embodiment
Further to illustrate the present invention to reach the technological means and effect that predetermined goal of the invention is taken, below in conjunction with
Accompanying drawing and preferred embodiment, to according to a kind of embodiment of the inversion set of brittle substrate proposed by the present invention,
Structure, feature and its effect, are described in detail as after.
The transport mechanism that implementation structure for the inversion set of brittle substrate of the present invention is applicable is illustrated.Figure
1 is the stereogram being monolithically fabricated for representing to realize this implementation structure carrying device, and Fig. 2 is its front view.As shown in above-mentioned schema,
On pedestal 10, upper surface keeping parallelism of the beam 11 by pillar with pedestal 10 sets linear saddle in the side of this beam 11
12.Linear saddle 12 make conveyance first 13 along beam 11 it is comfortable act.On pedestal 10, as shown in Figure 1 and Figure 2, it is provided with to fragility
Material substrate (hereinafter referred to as substrate) carries out the brisement microscope carrier 14 of brisement, is used in and holds the 1st microscope carrier of material separation to hold material to separate
Microscope carrier 15 and be used in resin bed separation the 2nd microscope carrier extend microscope carrier 16.Conveyance first 13 picks up substrate simultaneously from brisement microscope carrier 14
Into figure, the end material separation microscope carrier 15 of right is transported.
Illustrated for the substrate for turning into inversion-object in the implementation structure of the present invention.Substrate 20, as shown in Figure 3
Front view and its phantom, are to be formed with ceramic substrate 21 in manufacturing step along x-axis with y-axis with certain spacing
The substrate of multiple functional areas 22.The functional area 22, for example, with the region as LED function, in each functional area, is used
Each surface is formed in LED rod-like crystal (lens).Silicones 23, but in order that the silicon tree are filled above the substrate
The indwelling of fat 23 is formed with compared with ceramic substrate in the scope for the functional area 22 for being formed with LED around the outside of functional area 22
The slightly higher wire projection 24 in 21 surface.When filling silicones 23, silicones 23 is had sometimes and reaches the upper of wire projection 24
Face or the situation on the outside of it.
Moreover, turn into LED wafer to carry out disjunction with regard to each functional area, before brisement is carried out to substrate 20, by
Scoring device is in the way of each functional area is located at center, and with the score line Sy1-Syn and the score line of transverse direction of longitudinal direction
Mode mutually orthogonal Sx1-Sxm is delineated.
Substrate 20 through delineation is in the brisement microscope carrier 14 shown in Fig. 2, to be formed with the face of crystal as above, and by not
The brisement device of diagram is along score line Sx1-Sxm, score line Sy1-Syn by its brisement.Substrate 20 after brisement is only ceramic
21 layers of substrate is along score line disjunction, and 23 layers of silicones is not yet by brisement.That is, substrate 20 is only by the relatively thin silicones in surface
23 layers and as the state of connection, and have in the inner side of wire projection 24 be arranged in x, the part of multiple functional areas of y-axis with
As outer circumference end material should not part.
Then, illustrated for the conveyance first 13 for picking up the substrate 20 and being transported.Fig. 4 is to represent to transport head
13 stereogram, Fig. 5 is its front view, and Fig. 6 is its upward view, and Fig. 7 is the solid for cutting off a part for conveyance first 13 and representing
Figure.
As shown in figure 4, conveyance first 13, is vertically connected with greatly in the suspension bracket pedestal 31 of the horizontal direction of substantially square shape
Cause the suspension bracket 32 of L-shaped.The suspension bracket bracket 33 of oblong-shaped is connected with the side of suspension bracket 32, in suspension bracket bracket 33 further
The suspension bracket bracket 34 of oblong-shaped is installed in the way of overlapping its face, the line that can be moved up and down freely is set in suspension bracket bracket 34
Property saddle 35.In the lower section of linear saddle 35, head 40 is set.Linear saddle 35 is that have to flow into sky respectively in upper and lower two direction
The inflow entrance of gas, flows into by it is switched and head 40 is moved up and down elevating mechanism freely.As long as in addition, linear saddle 35
It is that can lift head 40, also can is to utilize horse not only to move up and down it by the inflow of air stream
It is moved up and down up to grade.
Head 40 is for cavity, open underneath inside the basket of cubic, basket.And as shown in fig. 7, set below
Bottom set plate 41.Bottom plate 41 is the flat metal member of lower surface, for example, aluminum.Bottom plate 41 with the substrate 20 through brisement
The corresponding mode of functional area 22, be equally spaced in being arranged in multiple openings in xy directions in array.Above-mentioned opening
It is configured to the path length of respectively greater than crystal.In addition, it is same in part corresponding with the outer circumference end material of the functional area 22 of substrate 20,
It is provided with opening circumferentially.
Thin flexure strip 42 is mounted below in bottom plate 41, the flexure strip 42 is flat rubber system flat board.Moreover, as schemed
Shown in 6, in the corresponding mode of each functional area 22 with the substrate 20 as conveyance object, also in the x directions of flexure strip 42 and y
Direction equally spaced has opening, further has dimetric ring-type in part corresponding with the wire projection 24 around it
Recess.In addition, likewise, in part corresponding with the outer circumference end material of the functional area 22 of substrate 20, being set on the outside of annular recessed portion
It is equipped with opening circumferentially.Above-mentioned opening turns into same position when overlapping bottom plate 41 with flexure strip 42.Herein, bottom plate 41 is opened
The opening of mouth and flexure strip 42 is configured to the path length slightly larger compared with the path length for the LED crystal for being formed at functional area 22, and is picking up
During substrate 20 through brisement, the crystal for being configured to functional area 22 is not contacted directly with flexure strip 42.
Then, in the one side on the head 40, conduit 43 is installed, dust shown in Fig. 8 is linked with the front end of conduit 43
The air blower (blower) 44 of machine.Though in addition, the monomer of air blower 44 also can be used using precipitron here.In substrate 20
In the state of contact resilient piece 42, once blower 44 and by conduit 43 suck air, then from bottom plate 41, flexure strip
42 opening suction air, and substrate 20 can be picked up.In addition, air stream is switched from inflow by switching part (not shown)
Into outflow, the state for making air be sprayed from the opening of flexure strip 42 is allowed hand over into whereby.
Moreover, the side wall in the side of head 40 4 is provided with multiple latches (latch) mechanism 46.Latch mechanism 46 be in order to
Head 40 below by bottom plate 41 be set as being integrated with flexure strip 42 and be kept into it is detachable, and in the rubber of flexure strip 42
Can easily it be changed during the situation deteriorated.In addition, the latch mechanism 46 also can be located at least parallel offside of head 40
Wall.
Lower, outer perimeter on head 40, in the push pedal 47 for moving up and down frame-shaped freely shown in setting Fig. 9.Push pedal 47,
It is in the state of substrate 20 is held in head 40 and hold material to separate between microscope carrier 15, by push pedal 47 is declined, by base
Around plate 20 should not part separated as end material.Push pedal 47 is the size suitable with the end material part around substrate 20
Frame-shaped component.In addition as illustrated, it is above certain altitude to consist of, a pair it is relative to side 47a, 47b thickness it is thicker,
With this it is rectangular it is relative to two side 47c, 47d thinner thicknesses.
Then, illustrated for the elevating mechanism of push pedal 47.In the side wall on head 40, in the side except linking conduit 43
Be parallel to each other 2 side walls beyond wall, set cylinder 48 to be used as elevating mechanism.Cylinder 48, as shown in figure 5, with spiral shell
Bolt is fixed on the body part 48a of the side wall on head 40, moves up and down flat coupling member 48b freely and connect with it
The coupling member 48c of the frame-shaped connect.In addition, being in move up and down to be linked with push pedal 47 freely in coupling member 48c lower section.
Illustrated then for the end material separation microscope carrier 15 for being used in end material separation and substrate reversion.Hold material separation microscope carrier
15, as shown in Figure 10-Figure 12, on arm 51 bottom plate 53 on chamber 52 and its top with oblong-shaped and with this almost phase
The elastic plate 54 of similar shape.Big recess is formed with the middle body of chamber 52, and is connected with the conduit 51a that is formed inside arm 51
It is logical.Bottom plate 53 is the flat board of the oblong-shaped suitable with the global function region through brisement substrate, but is preferably slightly less than full work(
Can region.Bottom plate 53 is, for example, aluminum.In bottom plate 53 to be provided with the corresponding mode of each functional area 22 in arranging in array
Multiple openings in xy directions.
Elastic plate 54 is pasted with above bottom plate 53.Elastic plate 54 is the length with the global function region equivalent to substrate 20
The flat boards such as the rubber system of the suitable shape in square shape region, but preferably it is slightly less than global function region.In elastic plate 54 except 4
Outside the outer peripheral portion on side, the opening of bottom plate 53 is provided with that is, in mode corresponding with the functional area through brisement substrate in battle array
It is arranged in multiple openings in xy directions row.Preferably the part of the upper edge of elastic plate 54 is the construction of slight curvature.
In addition, the elastic plate 54 be configured to the opening of bottom plate 53 it is corresponding with each functional area 22, therefore, it is possible to weight
Extraneous air is set to circulate in the recess of chamber 52 by above-mentioned opening during conjunction.Conduit 51a inside arm 51 passes through not shown
Pipe and vacuum absorption device link, and by driving vacuum absorption device air can be made to be sprayed from the opening of elastic plate 54
Or suction.
In addition, the arm 51 is configured to be rotated in a clockwise direction freely from Figure 10 state centered on rotary shaft 55
180°.The rotating mechanism for making arm 51 be rotated together with the chamber 52, bottom plate 53 and elastic plate 54 on its top is provided with the axle.
Can be revolving cylinder as long as rotating mechanism can make arm 51 rotate 180 °, or also can be for by motor and reduction gearing institute
Constitute.
Then, it is directed to the reversion of substrate 20 and used extension microscope carrier 16 during brisement is carried out to silicone layer 23, makes
Illustrated with Figure 10, Figure 11, Figure 13.Microscope carrier 16 is extended, as shown in figure 11, with arm 61 and the straight cube shape for being installed on arm 61
Casket (cartridge) 62.Casket 62 is the columnar part for having L-shaped in its four corners, and maintains on the inside of it partition
(spacer) 63, sponge (sponge) 64 and extension rubber 65.Partition 63 and extension rubber 65 be suitable with functional substrate region
Size flat board, extension rubber 65 be rubber system elastically supported plate.Extension rubber 65 on, with through brisement substrate
The 20 corresponding mode of functional area 22, is equally spaced in the multiple openings for being arranged in xy directions in array.The opening
The path length slightly larger compared with the path length for the LED crystal for being formed at functional area 22 is configured to, and is configured to picking up the substrate through brisement
When 20, the crystal of functional area 22 is not contacted directly with extension rubber 65.
And in fig. 11, the flat pressing plate of the frame-shaped of shape almost identical with casket is set below extension rubber 65
66.Pressing plate 66 is connected by bolt with casket 62, is prevented partition 63 or sponge 64, is extended coming off for rubber 65.
In addition, be configured to can be with rotating freely 180 ° centered on the identical rotary shaft of rotary shaft 55 of arm 51 for arm 61.
And the rotating mechanism for making arm 61 be rotated together with casket 62 or partition 63, sponge 64 and extension rubber 65 is set.Rotating mechanism is only
Can be revolving cylinder if arm 61 can be made to rotate 180 °, also can be to be made up of motor with reduction gearing.Moreover, in base
On seat 10, as shown in figure 13, provided with holding tool 67.It is to be rotated in a clockwise direction the arm 61 of extension microscope carrier to keep tool 67
At 180 °, below its position supporting arm 61.
Then, for the substrate 20 is transported from brisement microscope carrier 14 toward end material separation microscope carrier 15, and the action for inverting it
Illustrate.First, make the surface movement of first 13 substrate 20 on brisement microscope carrier 14 of conveyance of carrying device, make head 40
Decline to be harmonious with substrate 20.And enter the opening of the flexure strip 42 of the foot of head 40 mode corresponding with LED crystal
Row positioning.Then, once blower 44 and sucking air by conduit 43, then inhaled from the opening of bottom plate 41, flexure strip 42
Enter air, and the substrate 20 contacted with flexure strip 42 can be picked up.Herein, when sucking air from the opening of flexure strip 42, i.e.,
Make to generate air leakage, air is also to flow into from opening toward internal all the time, therefore, it is possible to pick up substrate 20.Moreover, by general
Conveyance first 13, being capable of the past rising under state of remaining stationary by the substrate 20 through brisement toward rising.
Conveyance first 13 is moved integrally by linear saddle 12 in this condition, substrate 20 can be transported whereby to wanting
The position gone.In such a manner, head is made after conveyance first 13 is moved toward the surface of end material separation microscope carrier 15 as shown in Figure 10
Portion 40 declines by linear saddle 35.Then, the substrate 20 for being held in the bottom surface of head 40 separates the upper of microscope carrier 15 with end material
Portion is contacted, and its functional area 22 in the way of the opening correspondence position of elastic plate 54 by as respectively with positioning and stopping to decline.So
Afterwards, air is sucked by arm 51 in the state of the bottom surface of substrate 20 is contacted with elastic plate 54, whereby can be by substrate 20
It is held on the material separation microscope carrier 15 of end.The maintenance of air blower 44 can now acted, or can also stop it.
Action when then, for end material separation is illustrated.First, blown by the cylinder 48 from the elevating mechanism of push pedal 47
Go out air, can decline the push pedal 47 of the bottom of head 40.Once making push pedal 47 abreast to decline with substrate 20, then borrow first
Peripheral part elongated on the outside of the only functional area of substrate 20 is set to bear downward pressure by thickness thicker side 47a, 47b, point
From as end material.If further continuing to decline, make by two side 47c, 47d of thinner thickness outside the functional area of substrate 20
The elongated peripheral part in side bears the pressure declined and is separated into end material.Figure 13 represents separated 4 bit end material.With so side
End material around substrate 20, using the step-down operation once pressed with push pedal 47 etc, can be kept completely separate by formula.Now
Adjacent side is not separated into end material simultaneously around substrate 20.In addition, elastic plate 54 is slightly less than push pedal 47, its upper surface
Marginal portion bending.Therefore, it is possible to which in the case of the not functional area of wounded substrate 20, week is kept completely separate in a short time
The end material enclosed.
Afterwards, in the state of the suction air of arm 51, air is sprayed from air blower 44, head 40 is increased.Head whereby
Portion 40 is separated from substrate 20.In the state of head 40 is increased, conveyance first 13 is set to be moved toward Fig. 2 lefts by linear saddle 12
It is dynamic, script state is back to whereby.
Head 40 is set away from after, to make the turn of arm 61 of extension microscope carrier 16 from the top of end material separation microscope carrier 15 in such a manner,
Extension rubber 65 is set to be contacted with the upper surface of the substrate 20 on end material separation microscope carrier 15 top.Figure 13 is the schema for representing the state.
Now, positioned in the way of the opening inwall that crystal does not contact extension rubber 65.And substrate 20 is sandwiched into end material separation microscope carrier
Between 15 and extension microscope carrier 16.In this condition, arm 51 and arm 61 is made to be rotated as shown in figure 14 along same rotary shaft.Accordingly, energy
Enough reversions, the substrate in rotation way in the state of substrate 20 is fully kept using end material separation microscope carrier 15 and extension microscope carrier 16
20 will not fall off.Figure 15 is above-mentioned microscope carrier is rotated the state below 180 °, and extension microscope carrier 16 by keeping the supporting of tool 67.
Terminate in such a manner after rotation, by holding the conduit of arm 51 of material separation microscope carrier 15 to be sprayed from the opening of elastic plate 54
Go out air, substrate 20 is separated from end material separation microscope carrier 15.Then, end material separation microscope carrier 15 opposite direction is rotated 180 °, return
It is back to script position.Though keeping substrate 20 on extension microscope carrier 16 whereby, the top of substrate 20 is in open state.
In the implementation structure, though for making to possess the LED wafer in the LED-baseplate of the functional area above with crystal
The example of reversion is illustrated, but the chip of the invention for being applicable not only to have crystal on surface, is especially also applicable to have
There is not the chip of the functional area of any protrusion, be also applicable to possess with the functional area of thrust beyond crystal in addition
Brittle substrate.
Further in the implementation structure, though carried out for the brittle substrate that silicones is coated with ceramic substrate
Illustrate, but also can be the substrate of other various material layers.The layer such as also can have Polarizer for glass substrate lamination.
In addition, in above-mentioned implementation structure, in order to equally be used in the separation cut off with resin bed of end material, and by the 1st
Microscope carrier is set to end material separation microscope carrier, and the 2nd microscope carrier is set into extension microscope carrier is illustrated, but the situation for being only used for inverting then need not
Share end material separation or extend.
The present invention can be sandwiched the only substrate of the ceramic substrate of brisement brittle substrate and be made using a pair of microscope carriers
It is inverted, and can be used in substrate manufacture.
The above described is only a preferred embodiment of the present invention, any formal limitation not is made to the present invention, though
So the present invention is disclosed above with preferred embodiment, but is not limited to the present invention, any to be familiar with this professional technology people
Member, without departing from the scope of the present invention, when the technology contents using the disclosure above make a little change or modification
For the equivalent embodiment of equivalent variations, as long as being the content without departing from technical solution of the present invention, the technical spirit according to the present invention
Any simple modification, equivalent variations and the modification made to above example, in the range of still falling within technical solution of the present invention.
Claims (3)
1. a kind of inversion set of brittle substrate, is that brittle substrate is inverted, it is characterised in that：
The brittle substrate, is to be coated with resin on the brittle substrate for having functional area in one side, and in the fragility
Material substrate is formed with score line for the disjunction functional area；
The inversion set, possesses following part：
The 1st microscope carrier that is arranged to rotate freely,
Rotatably it is arranged to overlap with the 1st microscope carrier centered on the rotary shaft identical rotary shaft with the 1st microscope carrier
The 2nd microscope carrier,
And make the 1st, the 2nd rotating mechanism that the 1st microscope carrier and the 2nd microscope carrier rotate independently of one another；
1st microscope carrier, with the 1st arm rotated freely and the bullet being arranged above the 1st arm by the 1st rotating mechanism
Property plate；
2nd microscope carrier, with the 2nd arm rotated freely by the 2nd rotating mechanism and the elasticity branch for being installed on the 2nd arm
Board.
2. the inversion set of brittle substrate according to claim 1, it is characterised in that the inversion set, with true
Suction adsorption device；
1st microscope carrier, possesses and is installed on the 1st arm and has the chamber of recess and be arranged on the chamber and opened with multiple
The bottom plate of mouth；
The elastic plate, be installed on the bottom plate and it is corresponding with the opening of the bottom plate opening；
The arm, has the conduit with the chamber, and connect with the vacuum absorption device in arm.
3. the inversion set of brittle substrate according to claim 1, it is characterised in that the brittle substrate, is
Along by functional area be located at center in the way of formed clathrate score line and brisement；
The elastically supported plate of 2nd microscope carrier, with the width suitable with the brittle substrate, and with being arranged at by the grid
The protection hole of each center of the score line institute encircled area of shape.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014-092491 | 2014-04-28 | ||
| JP2014092491A JP6287547B2 (en) | 2014-04-28 | 2014-04-28 | Inverting device for brittle material substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105034183A CN105034183A (en) | 2015-11-11 |
| CN105034183B true CN105034183B (en) | 2017-10-20 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510131988.XA Expired - Fee Related CN105034183B (en) | 2014-04-28 | 2015-03-24 | The inversion set of brittle substrate |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6287547B2 (en) |
| KR (1) | KR20150124375A (en) |
| CN (1) | CN105034183B (en) |
| TW (1) | TWI640487B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6282176B2 (en) * | 2014-05-29 | 2018-02-21 | 三星ダイヤモンド工業株式会社 | Edge material separator for brittle material substrate |
| DE112020003292T5 (en) | 2019-07-10 | 2022-05-19 | Mitsubishi Electric Corporation | Thermoplastic resin composition, molded article and product |
| CN110405962B (en) * | 2019-07-23 | 2021-11-19 | 上海理工大学 | Automatic turnover type semiconductor cleavage device and processing method |
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- 2014-12-10 TW TW103142981A patent/TWI640487B/en not_active IP Right Cessation
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2015
- 2015-01-09 KR KR1020150003342A patent/KR20150124375A/en not_active Application Discontinuation
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| CN1856392A (en) * | 2003-09-24 | 2006-11-01 | 三星钻石工业株式会社 | Substrate dicing system, substrate manufacturing apparatus, and substrate dicing method |
| KR100749912B1 (en) * | 2006-11-01 | 2007-08-21 | 주식회사가야건축사사무소 | Crime prevention window |
| CN101987775A (en) * | 2009-07-31 | 2011-03-23 | 三星钻石工业股份有限公司 | Method and apparatus for processing brittle material substrate |
| EP2314548A2 (en) * | 2009-10-23 | 2011-04-27 | Mitsuboshi Diamond Industrial Co., Ltd. | Breaking apparatus and breaking method |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20150124375A (en) | 2015-11-05 |
| JP6287547B2 (en) | 2018-03-07 |
| CN105034183A (en) | 2015-11-11 |
| JP2015208935A (en) | 2015-11-24 |
| TW201540679A (en) | 2015-11-01 |
| TWI640487B (en) | 2018-11-11 |
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