CN104991427B - A kind of exposure device and exposure method - Google Patents
A kind of exposure device and exposure method Download PDFInfo
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- CN104991427B CN104991427B CN201510494605.5A CN201510494605A CN104991427B CN 104991427 B CN104991427 B CN 104991427B CN 201510494605 A CN201510494605 A CN 201510494605A CN 104991427 B CN104991427 B CN 104991427B
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Abstract
The present invention relates to technical field of lithography, discloses a kind of exposure device and exposure method, and exposure device includes frame and mask plate, in addition to：Be installed on frame, for taking up the baseplate carrier of substrate, baseplate carrier by can the material of deformation prepare, so that baseplate carrier has the deflection of setting；Distance measurement module, expose spacing amount for measuring to expose spacing between substrate and mask plate and calculate according to the exposure spacing of measurement and distance values set in advance；The drive module of baseplate carrier deformation is driven during action, drive module is connected with distance measurement module by signal and deformed, according to exposure spacing amount driving baseplate carrier so that the exposure spacing between substrate and mask plate is adjusted to setting range.In above-mentioned exposure device, when drive module acts, the distance between substrate and mask plate are adjusted, to adjust exposure spacing, therefore, above-mentioned exposure device can be exposed compensation, exposure spacing all close to setting value, is improved exposure quality.
Description
Technical field
The present invention relates to technical field of lithography, more particularly to a kind of exposure device and exposure method.
Background technology
At present, under the background that liquid crystal display pursues high-resolution, large scale and high-quality, substrate is as liquid crystal display
The main composition device of device, the exposure of substrate has a major impact to the resolution ratio of liquid crystal display, in the manufacturing process of substrate,
Exposure sources are exposed for base station, and the exposure sources used at present are exposure machines, especially close to formula exposure machine.
Exposure machine exposure spacing is that proximity printing ensures resolution ratio and the most important parameters of critical size, and existing close
Formula exposure machine ensures to be controlled by baseplate carrier flatness and the aspect of mask plate flexibility two to the homogeneity for exposing spacing, but existing
In some proximity printing machines, the rare special control for being related to exposure spacing homogeneity, baseplate carrier is flat under normal circumstances
A basic technology condition of the flexibility of degree and mask plate as proximity printing machine, will reach certain before exposure starts
Level, once and baseplate carrier and the fabrication and installation of mask plate supporting part are completed, the flatness and mask of exposure machine baseplate carrier
The flexibility of version will be unable to change, and now, exposure machine can not change exposure spacing in real time in exposure process, i.e., can not be exposed
Light compensates, and influences the exposure quality of substrate.
The content of the invention
The present invention provides a kind of exposure device and exposure method, using with can deformation baseplate carrier and distance measurement mould
Block, compensation is exposed, makes exposure spacing all close to setting value, to improve exposure quality.
To reach above-mentioned purpose, the present invention provides following technical scheme：
A kind of exposure device, including frame and mask plate, in addition to：
Be installed on the frame, for taking up the baseplate carrier of substrate, the baseplate carrier by can deformation material system
It is standby, so that the baseplate carrier have setting deflection；
Distance measurement module, spacing is exposed between the substrate and the mask plate and according to the exposure of measurement for measuring
Light spacing and distance values set in advance calculate exposure spacing amount；
For driving the drive module of the baseplate carrier deformation, the drive module and the distance measurement module by signal
It is connected and the baseplate carrier deformation is driven, to adjust the substrate and the mask plate according to the exposure spacing amount
Between exposure spacing.
In above-mentioned exposure device, distance measurement module measure setup is between the substrate and mask plate on baseplate carrier
Exposure spacing simultaneously according to the exposure spacing of measurement and presets distance values and calculates exposure spacing amount, drive module
Acted after the action signal of distance measurement module is received, can according to exposure spacing amount driving baseplate carrier deformation
Adjustment is arranged at the distance between substrate and mask plate on baseplate carrier, so as to adjust exposure spacing, until exposure spacing exists
In acceptable scope, to realize the compensation to exposing spacing；The some region of exposure spacing amount of baseplate carrier is timing,
Now, substrate and the distance between mask plate are excessive corresponding to this region of baseplate carrier, therefore, drive module driving baseplate carrier
Deform, so that the region of baseplate carrier should with baseplate carrier towards distance measurement block motion, and then in reduction substrate
The distance between position corresponding to region and mask plate, until exposure spacing, in tolerance interval, exposure spacing amount subtracts
When as little as zero, drive module action stops, position when drive module keeps resting on stopping action；When a certain area of baseplate carrier
When the exposure spacing amount in domain is bears, now, the substrate region and the distance between mask plate are too small, over-exposed, driving
Module first drives baseplate carrier overall and acted to the direction away from distance measurement module, so make between substrate and mask plate away from
From increase, exposure spacing increase, when the exposure spacing amount in the region is zero, drive module drives baseplate carrier again
Deformation so that baseplate carrier exposure spacing amount be positive region towards distance measurement block motion, until exposure spacing
In tolerance interval, when exposure spacing amount is decreased to zero, drive module action stops, and drive module keeps resting on stopping
Position when stop is made.
Therefore, above-mentioned exposure device can be exposed compensation, make exposure spacing all close to setting value, to improve exposure matter
Amount.
Preferably, the distance measurement module includes：
The distance measurement unit of spacing is exposed between the substrate and the mask plate for measuring；
The distance computation of exposure spacing amount is calculated according to the exposure spacing of measurement and distance values set in advance
Unit；
The distance measurement unit is connected with the distance computation cell signal.
Preferably, the drive module includes：
The first drive division that the baseplate carrier integral elevating is driven when the frame, action is installed on, described first drives
Dynamic portion is connected with the distance computation cell signal；
It is installed on the second drive division that the baseplate carrier deformation is driven when the frame, action, second drive division
It is connected with the distance computation cell signal.
Preferably, first driving part deviates from the side of substrate, and the baseplate carrier in the baseplate carrier
In four corners, each described corner is provided with first drive division.
Preferably, second drive division is multiple that each second driving part deviates from substrate in the baseplate carrier
Side and be in array distribution.
Preferably, second drive division includes：
The wedge that the baseplate carrier deviates from substrate side is fixed on, the wedge deviates from the one of the baseplate carrier
Face is inclined-plane；
The frame it can be slidably mounted to the frame and towards institute along perpendicular to the direction of the exposure spacing relatively
State the one side of baseplate carrier and sliding block that the inclined-plane of the wedge offsets, driven when the sliding block is relative to the housing slide
The wedge is moved to move along the exposure spacing direction；
Drive the drive mechanism of the slide block movement.
Preferably, the drive mechanism is servo motor.
Preferably, the distance measurement unit is multiple and corresponded with second drive division, between each is described
It is used for the exposure spacing of the region upper substrate for the baseplate carrier for detecting its corresponding second drive division driving away from measuring unit.
Preferably, the baseplate carrier has the scope of the deflection set as 10 μm~100 μm.
Preferably, the distance measurement unit is displacement transducer.
A kind of exposure method of exposure device, including：
The distance measurement unit measures exposes spacing, the distance computation unit between the substrate and the mask plate
Exposure spacing amount is calculated according to the exposure spacing of measurement and distance values set in advance, and exposure spacing amount
Signal is transmitted to drive module；
The drive module acted according to the exposure spacing amount that receives with drive the baseplate carrier act and
Deformation, is exposed spacing, so that the exposure distance values of the substrate all areas on baseplate carrier meet the exposure of setting
Spacing control range；
Remove the exposure distance measurement unit；
Processing is exposed to substrate；
Drive module is controlled to reset, so that baseplate carrier deformation recovers.
Preferably, when the drive module includes the first drive division and the second drive division, the first drive division driving
The baseplate carrier moves integrally, and second drive division drives the baseplate carrier deformation, until the exposure of substrate all areas
When light spacing meets the exposure spacing control range of setting, the second drive division action stops, and second drive division is protected
Hold and act stop position in second drive division.
Preferably, before processing is exposed to substrate, in addition to：
Gather Illumination Distribution information of the exposure machine on exposure plane；
The amount of pre-compensation of baseplate carrier deflection is determined according to Illumination Distribution information, so that photograph of the exposure machine on plane of exposure
Degree distributed intelligence meets exposure demand.
Preferably, the amount of pre-compensation that baseplate carrier deflection is determined according to Illumination Distribution information, is specifically included：
The Illumination Distribution information of collection is compared with the Illumination Distribution information set, the region correspondence position bigger than normal to illumination
Exposure spacing one amount of pre-compensation is set, baseplate carrier is carried out according to above-mentioned amount of pre-compensation after deformation adjustment again to collection
Illumination Distribution information and setting Illumination Distribution information compare：
When the Illumination Distribution information of collection meets exposure demand, it is determined that amount of pre-compensation now is final precompensation
Amount；
When the Illumination Distribution information of collection is unsatisfactory for exposure demand, repeat the above steps until the Illumination Distribution letter of collection
Breath meets exposure demand, and determines to make the Illumination Distribution information of collection meet that the amount of pre-compensation of exposure demand is final precompensation
Amount.
Brief description of the drawings
Fig. 1 is a kind of structural representation of exposure device provided by the invention；
Fig. 2 is a kind of structural representation of the drive module of exposure device provided by the invention；
Fig. 3 divides for a kind of distance measurement unit of exposure device provided by the invention, the second drive division and baseplate carrier
Butut；
Fig. 4 is a kind of a kind of distribution map preferably of the second drive division of exposure device provided by the invention；
Fig. 5 is a kind of distribution map of the second drive division another kind of exposure device provided by the invention preferably；
Fig. 6 is a kind of structural representation of the second drive division preferred embodiment of exposure device provided by the invention；
Fig. 7 is the spacing control flow chart of all positions in a kind of exposure method of exposure device provided by the invention；
Fig. 8 is the spacing control flow chart of single position in a kind of exposure method of exposure device provided by the invention；
Fig. 9 is a kind of flow chart of the exposure method of exposure device provided by the invention；
Figure 10 is a kind of method for compensating critical dimension flow chart provided by the invention.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
As shown in figure 1, a kind of exposure device provided in an embodiment of the present invention, including frame and mask plate 1, in addition to：
Be installed on frame, for taking up the baseplate carrier 3 of substrate 2, baseplate carrier 3 by can deformation material prepare, with
Make baseplate carrier 3 that there is the deflection of setting；
Distance measurement module 5, spacing is exposed between substrate 2 and mask plate 1 and according to the exposure spacing of measurement for measuring
And distance values set in advance calculate exposure spacing amount；
For drive baseplate carrier 3 deform drive module 4, drive module 4 be connected with the signal of distance measurement module 5 and
Deformed, according to exposure spacing amount driving baseplate carrier 3 to adjust the exposure spacing between substrate 2 and mask plate 1.
In above-mentioned exposure device, the measure setup of distance measurement module 5 in the substrate 2 on baseplate carrier 3 and mask plate 1 it
Between exposure spacing and according to the exposure spacing of measurement and preset distance values and calculate exposure spacing amount, driving
Module 4 acts after the action signal of distance measurement module 5 is received, and is become according to exposure spacing amount driving baseplate carrier 3
Shape, the distance between the substrate 2 being arranged on baseplate carrier 3 and mask plate 1 can be adjusted, so as to adjust exposure spacing, until
Spacing is exposed within the acceptable range, to realize the compensation to exposing spacing；The some region of exposure spacing of baseplate carrier 3 is mended
The amount of repaying is timing, and now, substrate 2 and the distance between mask plate 1 are excessive corresponding to this region of baseplate carrier 3, therefore, drives mould
Block 4 drives baseplate carrier 3 to deform, so that the region of baseplate carrier 3 is moved towards distance measurement module 5, and then reduces
The distance between position corresponding with the region of baseplate carrier 3 and mask plate 1 in substrate 2, until exposure spacing is in acceptable model
In enclosing, when exposure spacing amount is reduced to zero, the action of drive module 4 stops, when drive module 4 keeps resting on stopping action
Position；When some region of exposure spacing amount of baseplate carrier 3 for it is negative when, now, the region of substrate 2 and mask plate 1 it
Between distance it is too small, over-exposed, drive module 4 first drives baseplate carrier 3 is overall to be moved to the direction away from distance measurement module 5
Make, and then increase the distance between substrate 2 and mask plate 1, exposure spacing increases, and the exposure spacing amount in the region is
When zero, drive module 4 drive baseplate carrier 3 deform so that baseplate carrier 3 exposure spacing amount be positive region to
Distance measurement module 5 to move, until exposure spacing in tolerance interval, when exposure spacing amount is decreased to zero, drives
The action of module 4 stops, position when drive module 4 keeps resting on stopping action.
Therefore, above-mentioned exposure device can be exposed compensation, make exposure spacing all close to setting value, to improve exposure matter
Amount.
In a kind of preferred embodiment, in order to obtain exposure spacing amount, as shown in figure 1, distance measurement module 5 is wrapped
Include：
The distance measurement unit 51 of spacing is exposed between substrate 2 and mask plate 1 for measuring, because substrate 2 has necessarily
Face in thickness deviation, and there is certain flexibility, bent with the surface topography of baseplate carrier 3, therefore substrate 2 and mask plate
The distance between 1, distance measurement unit 51 is located at the top of mask plate 1, substrate 2 and mask when can measure diverse location
Spacing is exposed between version 1；
The distance computation of exposure spacing amount is calculated according to the exposure spacing of measurement and distance values set in advance
Unit 52, has preset distance values and exposure spacing range in distance computation unit 52, and exposure spacing amount is
Exposure spacing and the difference for presetting distance values；
Distance measurement unit 51 is connected with the signal of distance computation unit 52, the substrate 2 that distance measurement unit 51 measures
Expose spacing between mask plate 1 to be sent in distance computation unit 52, distance computation unit 52 is according to the exposure spacing of measurement
And distance values set in advance calculate exposure spacing amount.
It is above-mentioned obtain expose spacing amount after, expose spacing between substrate 2 and mask plate 1 to adjust, make exposure
Spacing is all close to setting value, and in a kind of preferred embodiment, as described in Figure 2, drive module 4 includes：
Be installed on frame, action when drive the integral elevating of baseplate carrier 3 the first drive division 41, the first drive division 41 and
Connected away from the signal of computing unit 52；
It is installed on the second drive division 42 for driving baseplate carrier 3 to deform when frame, action, the second drive division 42 and spacing meter
Calculate the connection of the signal of unit 52.
It is timing that distance computation unit 52, which calculates exposure spacing amount, and when spacing amount is excessive, first drives
Dynamic portion 41 drives baseplate carrier 3 to rise overally, so that baseplate carrier 3 moves towards distance measurement unit 51, and then reduces substrate 2
In the distance between with mask plate 1, when exposure compensation amount is decreased to close to zero, the second drive division 42 driving baseplate carrier 3 is sent out
Change shape, and then reduces the distance between position corresponding with the region of baseplate carrier 3 and mask plate 1 in substrate 2, until exposure
Spacing in tolerance interval, the first drive division 41 and the second drive division 42 action stop, and keep rest on stopping action when
Position；When exposure spacing amount is just, and exposure compensation amount is close to zero, the second drive division 42 driving baseplate carrier 3 is sent out
Change shape, and then reduces the distance between position corresponding with the region of baseplate carrier 3 and mask plate 1 in substrate 2, until exposure
In tolerance interval, the action of the second drive division 42 stops spacing, and keeps resting on position when stopping acts.
When calculating some region of exposure spacing amount of baseplate carrier 3 to bear, first drives distance computation unit 52
Dynamic portion 41 drives the entire lowering of baseplate carrier 3, so that baseplate carrier 3 moves away from the direction of distance measurement unit 51, enters
And the distance between increase in substrate 2 with mask plate 1, exposure spacing increase, the region exposure spacing amount for just or
When person is zero, the second drive division 42 drives baseplate carrier 3 to be acted to the direction away from distance measurement module 5, so that baseplate carrier
It is that positive region is moved towards distance measurement unit 51 that spacing amount is exposed between substrate 2 and mask plate 1, until between exposure
Away from tolerance interval, the first drive division 41 and the action of the second drive division 42 stop, and keep resting on when stopping acts
Position.Therefore, the integral elevating of baseplate carrier 3 is driven when the first drive division 41 acts, between being exposed between substrate 2 and mask plate 1
Away from overall preliminary regulation is carried out, driving baseplate carrier 3 deforms when the second drive division 42 acts, to being exposed between substrate 2 and mask plate 1
Light spacing carries out local precisely regulation.
Specifically, as shown in Fig. 2 the first drive division 41 is located at the side that baseplate carrier 3 deviates from substrate 2, and baseplate carrier 3
Four corners in, each corner is provided with first drive division 41, this distribution mode, can ensure the first drive division 41
After the exposure spacing amount that distance computation unit 52 is drawn is received, baseplate carrier 3 is moved integrally, realizes baseplate carrier 3
Moved integrally on the direction of baseplate carrier 3.
Specifically, as shown in figure 3, the second drive division 42 is multiple, each second drive division 42 is located at baseplate carrier 3 and deviates from base
The side of plate 2 and be in array distribution, can obtain spacing everywhere in exposure plane, maked corrections for overall spacing and provide measurement
Data, the position 6 of the second drive division 42 can also be distributed such as Fig. 4, when exposure device is multiple, the position of the second drive division 42
6 can also be distributed such as Fig. 5.
In order to which driving baseplate carrier 3 deforms when realizing the action of the second drive division 42, in a kind of preferred embodiment, such as Fig. 6
Shown, the second drive division 42 includes：
The wedge 7 that baseplate carrier 3 deviates from the side of substrate 2 is fixed on, wedge 7 is oblique away from the one side of baseplate carrier 3
Face, wedge 7 are fixed on baseplate carrier 3, and baseplate carrier 3 moves with the motion of wedge 7；
With respect to frame frame can be slidably mounted to along perpendicular to the direction of exposure spacing and towards the one of baseplate carrier 3
Face and the sliding block 8 to offset, wedge 7 is driven to be moved along exposure spacing direction when sliding block 8 is relative to housing slide, and wedge
7 are fixed on baseplate carrier 3, and baseplate carrier 3 moves along exposure spacing direction, realizes that baseplate carrier 3 deforms, to adjust substrate 2
Between being exposed between mask plate 1；
The drive mechanism 9 for driving sliding block 8 to move, drive mechanism 9 drives sliding block 8 relative to housing slide, due to wedge 7
Inclined-plane offseted with sliding block 8, drive wedge 7 to be moved along exposure spacing direction when sliding block 8 acts, and wedge 7 is fixed on base
On onboard 3, baseplate carrier 3 moves along exposure spacing direction, realizes that baseplate carrier 3 deforms, to adjust substrate 2 and mask plate 1
Between expose spacing.
Specifically, the drive mechanism 9 is servo motor, and servo motor can be realized and is precisely controlled, with realize substrate 2 with
Spacing is exposed between mask plate 1 and carries out local precisely regulation.
In a kind of preferred embodiment, as shown in figure 3, distance measurement unit 51 for it is multiple and with the second drive division 42 1
One correspondence, each distance measurement unit 51 are used for the region for detecting the baseplate carrier 3 that its corresponding second drive division 42 drives
The exposure spacing of upper substrate 2, the measurement feedback data for multiple positions that the second drive division 42 measures according to distance measurement unit 51
Driving baseplate carrier 3 deforms, until the distance values of regional are all in tolerance interval.
In a kind of preferred embodiment, baseplate carrier 3 has the scope of the deflection set as 10 μm~100 μm, substrate
Microscope carrier 3 is deformed upon in the presence of external force, and driving baseplate carrier 3 is lifted to adjust between substrate 2 and mask plate 1 between exposure
Away from the position when drive module 4 acts stopping, and drive module 4 keeps resting on stopping action, drive module 4 leaves substrate
After microscope carrier 3, the surface configuration of baseplate carrier 3 is restored.
In a kind of preferred embodiment, distance measurement unit 51 is displacement transducer, by measuring distance measurement unit 51
With the displacement between mask plate 1, substrate 2, the purpose that spacing is exposed between substrate 2 and mask plate 1 is measured to reach.
As shown in Fig. 7, Fig. 8, Fig. 9, a kind of exposure method of exposure device provided in an embodiment of the present invention, including：
Distance measurement unit 51 measures exposes spacing between substrate 2 and mask plate 1, and distance computation unit 52 is according to measurement
Exposure spacing and distance values set in advance calculate exposure spacing amount, and exposure spacing amount signal transmit to
Drive module 4；
Drive module 4 is acted according to the exposure spacing amount received to drive baseplate carrier 3 to act and deform, and is entered
Row exposure spacing, so that the exposure distance values of the substrate all areas on baseplate carrier 3 meet the exposure spacing control of setting
Scope processed；
Remove exposure distance measurement unit 51；
Processing is exposed to substrate 2；
Control drive module 4 resets, so that the deformation of baseplate carrier 3 recovers.
In the exposure method of above-mentioned exposure device, the exposure spacing between substrate 2 and mask plate 1 passes through distance measurement list
The measurement of member 51 obtains, and spacing draws exposure spacing amount according to unit 52 is calculated according to exposure spacing and distance values set in advance,
Drive module 4 drives baseplate carrier 3 to act, to adjust the exposure spacing between substrate 2 and mask plate 1, when exposure spacing is being controlled
When in the range of system, the action of drive module 4 stops, and is exposed, after end exposure, drive module 4 leaves baseplate carrier 3, base
Recover original shape for onboard 3.
Therefore, compensation can be exposed to the true above-mentioned exposure method of exposure device, makes exposure spacing all close to setting
Value, to improve exposure quality.
Spacing is exposed between substrate 2 and mask plate 1 in order to more accurately adjust, in a kind of preferred embodiment, is such as schemed
7th, shown in Fig. 8, when drive module 4 includes the first drive division 41 and the second drive division 42, the first drive division 41 driving substrate carries
Platform 3 moves integrally, until exposure spacing carries out entirety just in tolerance interval, to exposing spacing between substrate 2 and mask plate 1
Step section, the second drive division 42 driving baseplate carrier 3 are deformed, precisely adjusted to exposing spacing between substrate 2 and mask plate 1
Section, until when the exposure spacing of all areas of substrate 2 meets the exposure spacing control range of setting, the action of the second drive division 42 stops
Only, and the second drive division 42 is maintained at the second drive division 42 action stop position, is exposed processing, after end exposure, the
One drive division 41 and the second drive division 42 leave baseplate carrier 3, and baseplate carrier 3 recovers original shape.
In a kind of preferred embodiment, as shown in Figure 10, before processing is exposed to substrate 2, in addition to：
Gather Illumination Distribution information of the exposure machine on exposure plane；
The amount of pre-compensation of the deflection of baseplate carrier 3 is determined according to Illumination Distribution information, so that exposure machine is on plane of exposure
Illumination Distribution information meets exposure demand.
Specifically, by compensating partial exposure spacing, reach and offset the effect that Illumination Distribution brings key size deviation, such as
Shown in Figure 10, the amount of pre-compensation of the deflection of baseplate carrier 3 is determined according to Illumination Distribution information, including：
The Illumination Distribution information of collection is compared with the Illumination Distribution information set, the region correspondence position bigger than normal to illumination
Exposure spacing one amount of pre-compensation is set, baseplate carrier 3 is carried out according to above-mentioned amount of pre-compensation after deformation adjustment again to adopting
The Illumination Distribution information of collection compares with the Illumination Distribution information set：
When the Illumination Distribution information of collection meets exposure demand, it is determined that amount of pre-compensation now is final precompensation
Amount；
When the Illumination Distribution information of collection is unsatisfactory for exposure demand, repeat the above steps until the Illumination Distribution letter of collection
Breath meets exposure demand, and determines to make the Illumination Distribution information of collection meet that the amount of pre-compensation of exposure demand is final precompensation
Amount.
If under normal condition, it is spacing meter that the first drive division 41 or the second drive division 42 need mobile actuating quantity in theory
The exposure spacing amount that unit 52 calculates is calculated, then actual first drive division 41 or the second drive division 42 need the actuating quantity of movement
It is the amount of pre-compensation for exposing spacing amount+final.Each Partial controll portion initial position of baseplate carrier 3 can be arranged to most
Whole amount of pre-compensation position, when substrate 2 occurs, it is only necessary to moving exposure spacing.Can also be by each of baseplate carrier 3
Partial controll portion initial position is arranged to origin position, i.e., undeformed position, when substrate 2 occurs, exposure spacing amount+final
Amount of pre-compensation carry out simultaneously.
Obviously, those skilled in the art can carry out various changes and modification without departing from this hair to the embodiment of the present invention
Bright spirit and scope.So, if these modifications and variations of the present invention belong to the claims in the present invention and its equivalent technologies
Within the scope of, then the present invention is also intended to comprising including these changes and modification.
Claims (14)
1. a kind of exposure device, including frame and mask plate, it is characterised in that also include：
Be installed on the frame, for taking up the baseplate carrier of substrate, the baseplate carrier by can deformation material prepare, with
Make the baseplate carrier that there is the deflection of setting；
Distance measurement module, exposed for measuring between the substrate and the mask plate between spacing and exposure according to measurement
Away from and distance values set in advance calculate exposure spacing amount；
For driving the drive module of the baseplate carrier deformation, the drive module and the distance measurement module by signal phase
Even and according to the exposure spacing amount drive the baseplate carrier deformation, with adjust the substrate and the mask plate it
Between exposure spacing.
2. exposure device according to claim 1, it is characterised in that the distance measurement module includes：
The distance measurement unit of spacing is exposed between the substrate and the mask plate for measuring；
The distance computation unit of exposure spacing amount is calculated according to the exposure spacing of measurement and distance values set in advance；
The distance measurement unit is connected with the distance computation cell signal.
3. exposure device according to claim 2, it is characterised in that the drive module includes：
It is installed on the first drive division that the baseplate carrier integral elevating is driven when the frame, action, first drive division
It is connected with the distance computation cell signal；
It is installed on the second drive division that the baseplate carrier deformation is driven when the frame, action, second drive division and institute
State the connection of distance computation cell signal.
4. exposure device according to claim 3, it is characterised in that first driving part is carried on the back in the baseplate carrier
From the side of substrate, and in four corners of the baseplate carrier, each described corner is provided with first drive division.
5. exposure device according to claim 3, it is characterised in that second drive division is multiple, and each described second
Driving part away from the side of substrate and is in array distribution in the baseplate carrier.
6. exposure device according to claim 5, it is characterised in that second drive division includes：
The wedge that the baseplate carrier deviates from substrate side is fixed on, the wedge is away from the one side of the baseplate carrier
Inclined-plane；
The frame it can be slidably mounted to the frame and towards the base along perpendicular to the direction of the exposure spacing relatively
The sliding block that the inclined-plane of the one side of onboard and the wedge offsets, institute is driven when the sliding block is relative to the housing slide
Wedge is stated to move along the exposure spacing direction；
Drive the drive mechanism of the slide block movement.
7. exposure device according to claim 6, it is characterised in that the drive mechanism is servo motor.
8. exposure device according to claim 5, it is characterised in that the distance measurement unit for it is multiple and with it is described
Second drive division corresponds, and each described distance measurement unit is used to detect the described of its corresponding second drive division driving
The exposure spacing of the region upper substrate of baseplate carrier.
9. exposure device according to claim 1, it is characterised in that the baseplate carrier has the model of the deflection of setting
Enclose for 10 μm~100 μm.
10. exposure device according to claim 1, it is characterised in that the distance measurement unit is displacement transducer.
A kind of 11. exposure method of exposure device as described in claim any one of 1-10, it is characterised in that including：
The distance measurement unit, which measures, exposes spacing between the substrate and the mask plate, the distance computation unit according to
The exposure spacing and distance values set in advance of measurement calculate exposure spacing amount, and exposure spacing amount signal
Transmit to drive module；
The drive module is acted according to the exposure spacing amount received to drive the baseplate carrier to act and deform,
Spacing is exposed, so that the exposure distance values of the substrate all areas on baseplate carrier meet the exposure spacing control of setting
Scope processed；
Remove the exposure distance measurement unit；
Processing is exposed to substrate；
Drive module is controlled to reset, so that baseplate carrier deformation recovers.
12. exposure method according to claim 11, it is characterised in that when the drive module include the first drive division and
During the second drive division, first drive division drives the baseplate carrier to move integrally, and second drive division drives the base
Onboard deformation, until when the exposure spacing of substrate all areas meets the exposure spacing control range of setting, described second drives
Dynamic portion's action stops, and second drive division is maintained at the second drive division action stop position.
13. exposure method according to claim 11, it is characterised in that before processing is exposed to substrate, also wrap
Include：
Gather Illumination Distribution information of the exposure machine on exposure plane；
The amount of pre-compensation of baseplate carrier deflection is determined according to Illumination Distribution information, so that the exposure machine illumination on plane of exposure point
Cloth information meets exposure demand.
14. exposure method according to claim 13, it is characterised in that described to determine that substrate carries according to Illumination Distribution information
The amount of pre-compensation of platform deflection, is specifically included：
The Illumination Distribution information of collection is compared with the Illumination Distribution information set, the exposure of the region correspondence position bigger than normal to illumination
Light spacing sets an amount of pre-compensation, baseplate carrier is carried out according to above-mentioned amount of pre-compensation after deformation adjustment again to the photograph of collection
Degree distributed intelligence compares with the Illumination Distribution information set：
When the Illumination Distribution information of collection meets exposure demand, it is determined that amount of pre-compensation now is final amount of pre-compensation；
When the Illumination Distribution information of collection is unsatisfactory for exposure demand, repeat the above steps until the Illumination Distribution information of collection expires
Foot exposure demand, and determine to make the Illumination Distribution information of collection meet that the amount of pre-compensation of exposure demand is final amount of pre-compensation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510494605.5A CN104991427B (en) | 2015-08-12 | 2015-08-12 | A kind of exposure device and exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510494605.5A CN104991427B (en) | 2015-08-12 | 2015-08-12 | A kind of exposure device and exposure method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104991427A CN104991427A (en) | 2015-10-21 |
| CN104991427B true CN104991427B (en) | 2017-12-08 |
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| CN106527062B (en) * | 2017-01-11 | 2018-11-27 | 惠科股份有限公司 | A kind of exposure machine and its image shift control method and system |
| CN107167935B (en) * | 2017-05-09 | 2020-04-28 | 深圳市华星光电半导体显示技术有限公司 | Method and device for releasing film stress of array substrate |
| CN109581828A (en) * | 2019-01-23 | 2019-04-05 | 深圳市华星光电技术有限公司 | Exposure device and exposure method |
| CN112981329B (en) * | 2021-02-07 | 2022-10-28 | 京东方科技集团股份有限公司 | Adjusting device, evaporator and adjusting method |
| CN113442099A (en) * | 2021-06-29 | 2021-09-28 | Tcl华星光电技术有限公司 | Substrate processing carrying platform |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6381002B1 (en) * | 1998-07-09 | 2002-04-30 | Ushiodenki Kabushiki Kaisha | Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| CN101833246A (en) * | 2008-12-31 | 2010-09-15 | Asml控股股份有限公司 | Optically compensated unidirectional reticle bender |
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| JPS57204547A (en) * | 1981-06-12 | 1982-12-15 | Hitachi Ltd | Exposing method |
| JP4795899B2 (en) * | 2006-08-31 | 2011-10-19 | 東京エレクトロン株式会社 | Substrate mounting mechanism and substrate delivery method |
| JP5203992B2 (en) * | 2008-03-25 | 2013-06-05 | 株式会社ニューフレアテクノロジー | Electron beam drawing apparatus and electron beam drawing method |
| JP5380225B2 (en) * | 2009-09-24 | 2014-01-08 | 株式会社日立ハイテクノロジーズ | Glass substrate inspection equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6381002B1 (en) * | 1998-07-09 | 2002-04-30 | Ushiodenki Kabushiki Kaisha | Process for controlling a gap between a mask and a workpiece in proximity exposure and a proximity exposure device |
| CN101833246A (en) * | 2008-12-31 | 2010-09-15 | Asml控股股份有限公司 | Optically compensated unidirectional reticle bender |
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