CN104981435A - 彩色滤光片制造工序中的显影排水的处理方法 - Google Patents

彩色滤光片制造工序中的显影排水的处理方法 Download PDF

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Publication number
CN104981435A
CN104981435A CN201480007986.3A CN201480007986A CN104981435A CN 104981435 A CN104981435 A CN 104981435A CN 201480007986 A CN201480007986 A CN 201480007986A CN 104981435 A CN104981435 A CN 104981435A
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CN
China
Prior art keywords
coagulating agent
charged ion
draining
ion system
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201480007986.3A
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English (en)
Chinese (zh)
Inventor
小野德昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurita Water Industries Ltd
Original Assignee
Kurita Water Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurita Water Industries Ltd filed Critical Kurita Water Industries Ltd
Publication of CN104981435A publication Critical patent/CN104981435A/zh
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C02F1/54Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities using organic material
    • C02F1/56Macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C02F1/5236Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities using inorganic agents
    • C02F1/5245Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities using inorganic agents using basic salts, e.g. of aluminium and iron
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/66Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/722Oxidation by peroxides
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/10Inorganic compounds
    • C02F2101/20Heavy metals or heavy metal compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/30Organic compounds
    • C02F2101/308Dyes; Colorants; Fluorescent agents
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/40Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00Use of specific compounds during water treatment
    • C02F2305/02Specific form of oxidant
    • C02F2305/026Fenton's reagent
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F3/00Biological treatment of water, waste water, or sewage
    • C02F3/02Aerobic processes
    • C02F3/12Activated sludge processes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00Technologies for wastewater treatment
    • Y02W10/10Biological treatment of water, waste water, or sewage

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Separation Of Suspended Particles By Flocculating Agents (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Inorganic Chemistry (AREA)
CN201480007986.3A 2013-02-13 2014-02-12 彩色滤光片制造工序中的显影排水的处理方法 Pending CN104981435A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013025718A JP5828327B2 (ja) 2013-02-13 2013-02-13 カラーフィルター製造工程における現像排水の処理方法
JP2013-025718 2013-02-13
PCT/JP2014/053131 WO2014126081A1 (ja) 2013-02-13 2014-02-12 カラーフィルター製造工程における現像排水の処理方法

Publications (1)

Publication Number Publication Date
CN104981435A true CN104981435A (zh) 2015-10-14

Family

ID=51354081

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480007986.3A Pending CN104981435A (zh) 2013-02-13 2014-02-12 彩色滤光片制造工序中的显影排水的处理方法

Country Status (5)

Country Link
JP (1) JP5828327B2 (ja)
KR (1) KR20150118944A (ja)
CN (1) CN104981435A (ja)
TW (1) TW201439014A (ja)
WO (1) WO2014126081A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110015735A (zh) * 2019-04-10 2019-07-16 深圳市松柏实业发展有限公司 复合絮凝剂及其絮凝方法、循环再生利用方法与系统

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106915846A (zh) * 2017-04-10 2017-07-04 惠州市联谊印刷有限公司 一种印刷废水净化再利用方法
JP7237640B2 (ja) * 2018-03-26 2023-03-13 三菱ケミカルアクア・ソリューションズ株式会社 酸性凝集物含有廃液の処理方法および水処理装置
JP7083274B2 (ja) * 2018-05-14 2022-06-10 オルガノ株式会社 水処理方法および水処理装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101274809A (zh) * 2007-03-30 2008-10-01 栗田工业株式会社 有机性排水的处理装置
JP4743388B2 (ja) * 2005-03-18 2011-08-10 栗田工業株式会社 フォトレジスト含有排水の処理方法
JP2012096146A (ja) * 2010-10-29 2012-05-24 Kurita Water Ind Ltd フォトリソグラフィー工程排水の処理方法
CN102608878A (zh) * 2011-01-24 2012-07-25 栗田工业株式会社 彩色滤光片制造工艺中的显影排液的处理方法
CN102633321A (zh) * 2012-04-16 2012-08-15 成都新图新材料股份有限公司 一种平版印刷版材的碱性显影冲版废水处理方法、平版印刷版材的显影处理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000237760A (ja) * 1999-02-23 2000-09-05 Japan Organo Co Ltd 有機性廃水処理方法
JP2007029825A (ja) * 2005-07-25 2007-02-08 Daiki Ataka Engineering Co Ltd 廃水処理装置及びこの装置を用いた廃水処理方法
JP5106182B2 (ja) * 2008-03-05 2012-12-26 オルガノ株式会社 水処理方法および水処理装置
KR101955048B1 (ko) * 2011-07-22 2019-05-31 쿠리타 고교 가부시키가이샤 배수의 처리 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4743388B2 (ja) * 2005-03-18 2011-08-10 栗田工業株式会社 フォトレジスト含有排水の処理方法
CN101274809A (zh) * 2007-03-30 2008-10-01 栗田工业株式会社 有机性排水的处理装置
JP2012096146A (ja) * 2010-10-29 2012-05-24 Kurita Water Ind Ltd フォトリソグラフィー工程排水の処理方法
CN102608878A (zh) * 2011-01-24 2012-07-25 栗田工业株式会社 彩色滤光片制造工艺中的显影排液的处理方法
CN102633321A (zh) * 2012-04-16 2012-08-15 成都新图新材料股份有限公司 一种平版印刷版材的碱性显影冲版废水处理方法、平版印刷版材的显影处理方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
佟玉衡: "《废水处理》", 31 October 2004 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110015735A (zh) * 2019-04-10 2019-07-16 深圳市松柏实业发展有限公司 复合絮凝剂及其絮凝方法、循环再生利用方法与系统
CN110015735B (zh) * 2019-04-10 2022-03-22 深圳市松柏实业发展有限公司 复合絮凝剂及其絮凝方法、循环再生利用方法与系统

Also Published As

Publication number Publication date
JP5828327B2 (ja) 2015-12-02
TW201439014A (zh) 2014-10-16
JP2014151307A (ja) 2014-08-25
KR20150118944A (ko) 2015-10-23
WO2014126081A1 (ja) 2014-08-21

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Application publication date: 20151014